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CN101437977A - Antimicrobial coating methods - Google Patents

Antimicrobial coating methods Download PDF

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CN101437977A
CN101437977A CNA2007800103843A CN200780010384A CN101437977A CN 101437977 A CN101437977 A CN 101437977A CN A2007800103843 A CNA2007800103843 A CN A2007800103843A CN 200780010384 A CN200780010384 A CN 200780010384A CN 101437977 A CN101437977 A CN 101437977A
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silver
matrix
metal
antimicrobial
film
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丹尼尔·M·斯托里
戴德雷·休厄尔
约翰·H·彼得森
特伦斯·S·麦格拉思
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Chameleon Scientific Corp
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Abstract

The invention is directed to efficient methods for depositing highly adherent anti not microbial materials onto a wide range of surfaces. A controlled cathodic arc process is described, which results in enhanced adhesion of silver oxide to polymers and other surfaces, such as surfaces of medical devices. Deposition of anti-microbial materials directly onto the substrates is possible in a cost-effective manner that maintains high anti-microbial activity over several weeks when the coated devices are employed in vivo.

Description

抗菌性涂层方法 Antimicrobial Coating Method

本申请要求2006年1月27日提交的美国临时申请序列号No.60/762,769、2006年1月30日提交的美国临时申请序列号No.60/763,262、2006年2月25日提交的美国临时申请序列号No.60/776,537、2006年3月6日提交的美国临时申请序列号No.60/779,917的优先权,这些临时申请文件的公开内容结合于此以供参考。本申请是2003年12月18日提交的美国专利申请序列号No.10/741,015(其要求2002年12月18日提交的美国临时申请序列号No.60/434,784的优先权)的部分继续申请,并且其公开的内容结合于此以供参考。This application claims U.S. Provisional Application Serial No. 60/762,769 filed January 27, 2006, U.S. Provisional Application Serial No. 60/763,262 filed January 30, 2006, U.S. Provisional Application Serial No. 60/763,262 filed February 25, 2006 Provisional Application Serial No. 60/776,537, priority to US Provisional Application Serial No. 60/779,917, filed March 6, 2006, the disclosures of which are hereby incorporated by reference. This application is a continuation-in-part of U.S. Patent Application Serial No. 10/741,015, filed December 18, 2003, which claims priority to U.S. Provisional Application Serial No. 60/434,784, filed December 18, 2002 , and its disclosure is hereby incorporated by reference.

技术领域 technical field

本发明涉及用于制造改性的金属涂层的阴极电弧离子等离子体(ion plasma)沉积工艺,该改性的金属涂层可用于在用于医疗应用的装置及材料的表面上形成抗菌性表面。特别地,本发明涉及一种用于在高度可控的条件下沉积银(Ag)、和其他抗菌性金属、或它们的组合物的工艺,以形成具有改善的粘附性和在延长的时间段内保持活性的抗菌性涂层。The present invention relates to a cathodic arc ion plasma (ion plasma) deposition process for the manufacture of modified metal coatings which can be used to form antimicrobial surfaces on the surfaces of devices and materials for medical applications . In particular, the present invention relates to a process for depositing silver (Ag), and other antimicrobial metals, or combinations thereof, under highly controlled conditions to form Antimicrobial coating that remains active within the segment.

背景技术 Background technique

已经证明了金属如银、锌、铌、钽、铪、锆、钛、铬、镍、铜、铂及金的杀菌特性。这些金属中,离子或化合物形式的银是最广为人知并最广泛使用的抗菌性金属。单质银(elemental silver)具有一定的抗菌性优点,但是通常其对于大多数抗菌性应用不起作用。如对银的氧化物进行涂层和涂墨导致它们的反应活性及溶解性的降低的观察中所示出的,人们认为氧化形式的银作为抗菌物更具活性。The germicidal properties of metals such as silver, zinc, niobium, tantalum, hafnium, zirconium, titanium, chromium, nickel, copper, platinum and gold have been demonstrated. Of these metals, silver in ionic or compound form is the best known and most widely used antimicrobial metal. Elemental silver has some antimicrobial benefits, but it is generally ineffective for most antimicrobial applications. The oxidized form of silver is believed to be more active as an antimicrobial, as shown in the observation that coating and ink of silver oxides results in a reduction in their reactivity and solubility.

人们已经试图利用公认的基于溶液的化学方法,通过银的氧化物及银与其他材料的组合物的使用来改善银的反应性。美国专利No.4,828,832描述了诸如硝酸银盐水溶液的金属银盐溶液与诸如过氧化苯甲酰的氧化剂组合在治疗皮肤传染中的应用。Attempts have been made to improve silver reactivity through the use of silver oxides and combinations of silver with other materials using well-established solution-based chemistries. US Patent No. 4,828,832 describes the use of a metallic silver salt solution, such as an aqueous silver nitrate salt solution, in combination with an oxidizing agent, such as benzoyl peroxide, in the treatment of skin infections.

美国专利No.5,824,267披露了在塑料制品的表面嵌入银金属颗粒及陶瓷或碱金属颗粒以赋予塑料制品抗菌特性。极其细小的银金属颗粒是通过化学沉积法从银金属盐水溶液中得到的。US Patent No. 5,824,267 discloses embedding silver metal particles and ceramic or alkali metal particles on the surface of plastic products to impart antibacterial properties to plastic products. The extremely fine silver metal particles are obtained by chemical deposition from aqueous solutions of silver metal salts.

尽管产生银颗粒的溶液方法能够提供具有抗菌活性的银,但对得到的银颗粒结构的控制很小,因此这些方法被限制在它们的应用中。而且,诸如硝酸银水溶液的一些离子型物质,由于潜在的对皮肤的刺激性,所以对于大多数应用而言是活性过高的,因此必须仔细地监控和控制。基于溶液的化学方法的另一个问题是在不产生有害副产物的情况下形成稳定的组合物。结合到浆料、涂料、聚合物或凝胶中的银离子趋向于具有短的储藏寿命,部分是因为在基于水的溶液中发生的与各种组分的副反应。Although solution methods for generating silver particles are able to provide silver with antimicrobial activity, there is little control over the structure of the resulting silver particles, thus these methods are limited in their applications. Also, some ionic species, such as aqueous silver nitrate solutions, are too active for most applications due to potential skin irritation and must therefore be carefully monitored and controlled. Another problem with solution-based chemistries is forming stable compositions without producing harmful by-products. Silver ions incorporated into pastes, paints, polymers, or gels tend to have short shelf lives, in part because of side reactions with the various components that occur in water-based solutions.

对于能够产生抗菌性金属离子持续性释放的抗菌性表面存在明显的需求。产生抗菌性离子的持续性释放的表面能力在手术及创伤敷料及绷带、手术缝合线、导管及其他医疗装置、植入物、修复体(prosthetics)、口腔应用物(dental application)及组织再生中是特别有用的。其他也能从抗菌性材料的持续释放中获益的装置包括:医疗用具及表面、饭店表面(restaurant surface)、面罩、服装、门栓及其他固定物、游泳池、热盆(hot tub)、饮用水过滤器、冷却系统、多孔亲水性材料、加湿器及空气调节系统。There is a clear need for antimicrobial surfaces capable of producing sustained release of antimicrobial metal ions. Surface ability to produce sustained release of antimicrobial ions in surgical and wound dressings and bandages, surgical sutures, catheters and other medical devices, implants, prosthetics, dental applications and tissue regeneration is particularly useful. Other devices that would also benefit from sustained release of antimicrobial materials include: medical appliances and surfaces, restaurant surfaces, face masks, clothing, door latches and other fixtures, swimming pools, hot tubs, drinking Water filters, cooling systems, porous hydrophilic materials, humidifiers and air conditioning systems.

在美国专利No.4,886,505中描述了用于产生金属离子的持续性释放的方法。根据该方法,用诸如银的第一金属以及通过开关(switch)连接于第一金属的诸如铂的第二金属涂覆该装置。在体液的存在下,银金属及铂金属的存在导致了产生电偶效应(galvanicaction),其用于释放或释出银离子。通过在装置外部操作的开关来控制离子的释放。Methods for producing sustained release of metal ions are described in US Patent No. 4,886,505. According to this method, the device is coated with a first metal, such as silver, and a second metal, such as platinum, connected to the first metal by a switch. In the presence of body fluids, the presence of silver metal and platinum metal results in a galvanic action which serves to release or release silver ions. The release of ions is controlled by a switch operated externally to the device.

向涂覆银的伤口敷料或医疗装置中施加电流的技术也是美国专利No.4,219,125及No.4,411,648的主题。尽管外部开关控制器或外部电流的使用可以提高金属离子释放的速率,但是这种外部控制器或电流并不是对各种应用是可行的。Techniques for applying electrical current to silver-coated wound dressings or medical devices are also the subject of US Patent Nos. 4,219,125 and 4,411,648. Although the use of an external switch controller or an external current can increase the rate of metal ion release, such an external controller or current is not feasible for a variety of applications.

美国专利No.6,365,220描述了用于制造一种可提供持续性释放抗菌性离子且无需外部电流维持该释放的抗菌性表面的方法。根据该披露内容,通过溅射或蒸发工艺,将多层金属薄膜沉积在基体(substrate)上。通过针对不同的层应用不同的金属组合物,并采用蚀刻技术以使得层的表面粗糙化或具有纹理,可产生多重微层(microlayer)界面。当暴露于体液时,多重界面可通过电偶及非电偶效应提供离子的释放。US Patent No. 6,365,220 describes a method for making an antimicrobial surface that provides a sustained release of antimicrobial ions and does not require an external electrical current to maintain the release. According to this disclosure, a multilayer metal thin film is deposited on a substrate by a sputtering or evaporation process. By applying different metal compositions to different layers and employing etching techniques to roughen or texture the surface of the layers, multiple microlayer interfaces can be created. When exposed to body fluids, multiple interfaces can provide for the release of ions through galvanic and non-galvanic effects.

美国专利No.5,837,275还披露了提供持续释放的抗菌性离子的抗菌性涂层。通过利用特定沉积参数的溅射技术来制备涂层。涂层被描述为呈现“原子杂乱”的金属薄膜,且称其对于金属离子的持续释放是必要的。US Patent No. 5,837,275 also discloses antimicrobial coatings that provide sustained release of antimicrobial ions. Coatings are produced by sputtering techniques using specific deposition parameters. The coating is described as exhibiting an "atomically haphazard" metallic film, which it says is necessary for the sustained release of metal ions.

据称,四氧化四银(Ag4O4)的有序单晶作为抗菌剂可用于皮肤疾病治疗(美国专利No.6,258,385)。但是除局部使用之外,这种复合物并不实用,且其可在长时期内(即,若干天)提供抗菌性材料的持续释放的能力还未得到证实。Ordered single crystals of silver tetroxide (Ag 4 O 4 ) are said to be useful in the treatment of skin diseases as antibacterial agents (US Patent No. 6,258,385). However, such complexes are not practical except for topical use, and their ability to provide sustained release of antimicrobial materials over long periods of time (ie, days) has not been demonstrated.

通常,抗菌性材料的沉积限于用于制备银及氧化银涂层的三种独特方法中的一个。这些方法中的每一种均具有严重的缺点,且没有一种已经开发成能够在医疗装置及器械的表面有效地制备具有高粘附性且分布均匀的抗菌性薄膜。通常使用的工艺情况,诸如溅射、浸渍及离子束辅助沉积,制备出对于柔性衬底或弹性设备具有有限粘附性的涂层。在花费大量的处理时间中,为了增大粘附力,额外的层有时是必须的。Typically, the deposition of antimicrobial materials is limited to one of three unique methods used to prepare silver and silver oxide coatings. Each of these methods has serious drawbacks, and none has been developed to effectively produce highly adherent and uniformly distributed antimicrobial films on the surfaces of medical devices and instruments. Commonly used process conditions, such as sputtering, dipping, and ion beam assisted deposition, produce coatings with limited adhesion to flexible substrates or elastic devices. Additional layers are sometimes necessary in order to increase adhesion while spending considerable processing time.

在真空中通过阴极电弧将金属材料沉积在基体上在本领域中是已知的。对比其他的等离子体蒸发沉积方法,离子等离子体沉积(IPD)能够制备高纯度的密集的多组分涂层,如在美国专利申请公开号No.2004/0185182中所描述的。但是,传统的阴极电弧沉积方法具有某些缺点。由于靶材料的无效使用及缺乏颗粒控制造成了昂贵材料的浪费。缺乏对待沉积材料的控制造成了不同尺寸的颗粒的形成,这就导致了非均匀涂层的沉积。通常,阴极电弧工艺还要求将基体表面加热至很高的温度,这能够破坏基体材料,并严重限制了基体的选择。Deposition of metallic materials on substrates by cathodic arcing in vacuum is known in the art. In contrast to other plasma evaporative deposition methods, ion plasma deposition (IPD) is capable of producing dense multi-component coatings of high purity, as described in US Patent Application Publication No. 2004/0185182. However, conventional cathodic arc deposition methods have certain disadvantages. Expensive material is wasted due to ineffective use of target material and lack of particle control. The lack of control over the material to be deposited leads to the formation of particles of different sizes, which leads to the deposition of non-uniform coatings. Typically, the cathodic arc process also requires heating the substrate surface to very high temperatures, which can damage the substrate material and severely limit substrate options.

发明内容 Contents of the invention

本发明满足了对于可粘结至任意表面,并具有可控的释放率及寿命,且在所需的应用中是无毒的抗菌性材料的持续的需要。如本发明所描述的,可利用新的阴极电弧IPD沉积工艺,将具有这些特性的抗菌性涂层沉积在多种基体表面上。The present invention fulfills the continuing need for an antimicrobial material that can be bonded to any surface, has a controlled release rate and lifetime, and is non-toxic in the desired application. Antimicrobial coatings with these properties can be deposited on a variety of substrate surfaces using a novel cathodic arc IPD deposition process as described in the present invention.

本发明的目的是提供一种通过利用离子等离子体沉积工艺将抗菌性材料沉积到基体上,以形成离散的抗菌性颗粒层的方法。It is an object of the present invention to provide a method of depositing an antimicrobial material onto a substrate using an ion plasma deposition process to form a discrete layer of antimicrobial particles.

本发明进一步的目的是提供一种用于在任何完成的产品上制备抗菌性表面的方法,因此消除了采用复杂的化学、制浆、涂覆及胶接技术(bonding technology)的需要。A further object of the present invention is to provide a method for preparing an antimicrobial surface on any finished product, thus eliminating the need to employ complex chemical, pulping, coating and bonding technologies.

本发明的另一个目的是提供抗菌性表面,其在体内在延长的时间段内,提供了以治疗有效水平持续释放的抗菌剂。Another object of the present invention is to provide antimicrobial surfaces which provide sustained release of antimicrobial agents at therapeutically effective levels over extended periods of time in vivo.

本发明的另一个目的是为了金属离子的持续释放,通过将一种或多种元素的分散的(dispersed)金属和/或金属/金属氧化物注入(impregnating)或沉积至基体中来提供抗菌性表面。Another object of the present invention is to provide antimicrobial properties by impregnating or depositing dispersed metals and/or metal/metal oxides of one or more elements into a matrix for sustained release of metal ions surface.

因此,在特别优选的实施方式中,本发明提供了银及其他金属离子的沉积、渗透或铺层(layering),所述银及其他金属键合(结合)至纳米级、超微米级、及微米级晶体金属及金属氧化物的固态结构(其被设计为分散至表面中或其上的单价、双价及多价氧化物的组合物)。然后由于酶的活性可通过与病原体接触来释放阴离子,或者通过添加水或与体液接触而释放阴离子。Thus, in particularly preferred embodiments, the present invention provides for the deposition, infiltration or layering of silver and other metal ions that bond (bond) to nanoscale, ultramicroscale, and Solid-state structures of micron-sized crystalline metals and metal oxides designed as compositions of monovalent, divalent and multivalent oxides dispersed into or on surfaces. Anions can then be released by contact with pathogens due to enzymatic activity, or by addition of water or contact with body fluids.

所披露的工艺可用于需要一种可控组合物的各种装置的制造中,但是特别适用于需要杀菌的、灭菌的、生物杀灭的或抗菌表面的小面积至很大面积的卷形物(roll),诸如绷带,或独立的部件,诸如导管、干轴(stem)或植入物的制造。该工艺形成了对将要与离子化的氧气或其它气体结合的离子化材料的数量、颗粒尺寸及能量的控制,并且可应用于单价、双价、及多价氧化物和氮化物以及多个层的组合的广阔范围。The disclosed process can be used in the manufacture of a variety of devices requiring a controlled composition, but is particularly suitable for small to large area rolls requiring a sterilizing, sterilizing, biocidal or antimicrobial surface Manufacturing of rolls, such as bandages, or individual components, such as catheters, stems or implants. The process creates control over the amount, particle size, and energy of the ionized material to be combined with the ionized oxygen or other gas, and can be applied to monovalent, divalent, and multivalent oxides and nitrides as well as multiple layers a wide range of combinations.

该工艺可用于制造抗菌性产品或对已有产品及原材料进行表面处理。该工艺可以用于产生小规格(scale)的能量设备以提高抗菌活性或为其他的纳米技术装置提供能量(power);例如,氧化银电池为微泵、植入物、电偶表面(galvanic surface)及其他需要能量的装置提供能量。This process can be used to manufacture antibacterial products or to carry out surface treatment on existing products and raw materials. The process can be used to generate small-scale energy devices to enhance antimicrobial activity or to provide power for other nanotechnology devices; for example, silver oxide batteries power micropumps, implants, galvanic surfaces ) and other devices that require energy to provide energy.

因此,本发明的一个方面是提供一种用于在基体上沉积抗菌性表面的方法,包括以下步骤:将包括潜在抗菌的金属的阴极靶放置到真空室中,向阴极提供动力以在阴极上产生电弧,其将负极金属电离为离子化粒子的等离子体;将诸如氧气的反应性气体引入真空室,以便使得该气体与离子化等离子体粒子发生反应,并通过在沉积工艺中以一种可控的方式移动基体靠近或进一步远离靶来控制等离子体粒子在基体上的沉积。Accordingly, one aspect of the present invention is to provide a method for depositing an antimicrobial surface on a substrate comprising the steps of: placing a cathode target comprising a potentially antimicrobial metal into a vacuum chamber, powering the cathode to deposit an antimicrobial surface on the cathode An electric arc is generated that ionizes the negative metal into a plasma of ionized particles; a reactive gas such as oxygen is introduced into the vacuum chamber so that the gas reacts with the ionized plasma particles, and The deposition of plasma particles on the substrate is controlled by moving the substrate closer to or further away from the target in a controlled manner.

通过控制电弧的手段可实现沉积工艺的进一步控制,由此,调节供应到负极上的动力以改变电弧产生的速度。Further control of the deposition process can be achieved by means of controlling the arc, whereby the power supplied to the negative electrode is adjusted to vary the rate at which the arc occurs.

本发明的另一个方面是在基体上提供包括金属氧化物粒子分散体的抗菌性表面,其中,金属选自由银、镍、锌、铜、金、铂、铌、钽、铪、锆、钛、铬、及它们的组合组成的组。Another aspect of the present invention is to provide an antimicrobial surface on a substrate comprising a dispersion of metal oxide particles, wherein the metal is selected from the group consisting of silver, nickel, zinc, copper, gold, platinum, niobium, tantalum, hafnium, zirconium, titanium, Chromium, and combinations thereof.

本发明涉及一种在所选的基体材料上沉积抗菌性材料的工艺。该基体可以是任意材料,诸如金属、陶瓷、塑料、玻璃、柔性片(flexible sheet)、多孔纸、陶器或它们的组合。尽管基体可包含多种装置中的任何一种,但是特别优选医疗装置。这些医疗装置包括导管、植入物、支架、气管导管、矫形销(orthopedic pin)、分流器、引流器、假肢器官装置、牙种植体、敷料及伤口闭合器(woundclosures)。然而,应当理解,本发明并不限于这些装置,可扩展至其他用于医疗领域的装置,诸如面罩、服装、手术用具及表面(surface)。The present invention relates to a process for depositing an antimicrobial material on a selected base material. The substrate can be any material such as metal, ceramic, plastic, glass, flexible sheet, porous paper, pottery or combinations thereof. Although the substrate may comprise any of a variety of devices, medical devices are particularly preferred. These medical devices include catheters, implants, stents, endotracheal tubes, orthopedic pins, shunts, drains, prosthetic devices, dental implants, dressings, and wound closures. However, it should be understood that the present invention is not limited to these devices, but may be extended to other devices used in the medical field, such as masks, garments, surgical tools and surfaces.

关于植入感染有两个重要的因素:在植入手术过程中细菌的引入;以及手术之后的皮肤开口。经皮装置(transdermal device)是主要的感染区域。因为装置与皮肤相分离,在皮肤与装置之间形成了缝隙,便发生了细菌污染。There are two important factors regarding implant infection: the introduction of bacteria during the implant procedure; and the skin opening after the procedure. Transdermal devices are the main area of infection. Bacterial contamination occurs because the device separates from the skin, creating a gap between the skin and the device.

本发明的另一方面涉及用于将已调谐的(tuned)抗菌性表面或其它成分提供到用于人体和兽类医疗装置以及其它应用中的改进的且更经济的方法。Another aspect of the invention relates to improved and more economical methods for providing tuned antimicrobial surfaces or other compositions for use in human and veterinary medical devices and other applications.

抗菌性材料可以是任何固体材料或具有抗菌特性的材料的组合。优选的材料是具有潜在抗菌特性及生物相容性(即,在目的环境中不受损坏)的金属。这些金属包括银、锌、铌、钽、铪、锆、钛、铬、镍、铜、铂及金(在本文中也称为“抗菌性金属”)。术语“潜在的抗菌特性”指这种情况:这些单质形态的金属通常不具反应活性,以致于不能作为有效的抗菌物。然而,当该金属被电离后具有更强的抗菌效果。因此,在实施金属电离之后,该抗菌性金属具有潜在的抗菌特性。电离时,抗菌性金属也可以与各种反应性气体例如氮气或氧气结合,以形成氮化物、氧化物,和/或它们的组合的化合物。The antimicrobial material can be any solid material or combination of materials with antimicrobial properties. Preferred materials are metals with potential antimicrobial properties and biocompatibility (ie, not damaged in the intended environment). These metals include silver, zinc, niobium, tantalum, hafnium, zirconium, titanium, chromium, nickel, copper, platinum, and gold (also referred to herein as "antimicrobial metals"). The term "potential antimicrobial properties" refers to the fact that these metals in elemental form are generally not reactive enough to be effective antimicrobials. However, when the metal is ionized it has a stronger antibacterial effect. Therefore, the antimicrobial metal has potential antimicrobial properties after metal ionization. When ionized, antimicrobial metals can also combine with various reactive gases, such as nitrogen or oxygen, to form nitrides, oxides, and/or compounds of combinations thereof.

定义definition

离子等离子体沉积是一种通过利用阴极电弧在靶材料上放电,而产生高能等离子体的方法。Ion plasma deposition is a method of generating a high-energy plasma by using a cathodic arc to discharge a target material.

阴极电弧,也称为真空电弧,是一种用于从固体金属产生等离子体的装置。电弧碰撞在金属上,电弧的高能量密度使该金属蒸发并电离,产生了持续电弧的等离子体。真空电弧与高压电弧不同,因为金属蒸气本身是离子化的,而不是环境气体。A cathodic arc, also known as a vacuum arc, is a device used to generate plasma from solid metal. The arc strikes the metal, and the high energy density of the arc vaporizes and ionizes the metal, creating a plasma that sustains the arc. Vacuum arcs differ from high voltage arcs because the metal vapor itself is ionized rather than the ambient gas.

巨大的或大粒子是大于单个离子的粒子;毫微(或小)粒子是尺寸约为100纳米的粒子;中等大的粒子为100纳米至约1微米;很大的粒子为大于1微米的颗粒。Colossal or macroparticles are particles larger than a single ion; nano (or small) particles are particles about 100 nanometers in size; moderately large particles are 100 nanometers to about 1 micrometer; very large particles are particles larger than 1 micrometer .

当足够强的能量破坏原子团(诸如气体团、物体、或靶目标的)时,则发生库仑爆炸,这样能源的电场驱使一些或全部电子离开原子。如果没有了电子,离子团会因为正电荷的库仑排斥而发生爆炸。A Coulomb explosion occurs when a sufficiently strong energy destroys a group of atoms (such as a gas mass, object, or target), such that the electric field of the energy source drives some or all of the electrons away from the atom. Without electrons, the cluster of ions explodes due to Coulomb repulsion of positive charges.

等离子体气相沉积(PVD)是在气相中沉积薄膜的工艺,其中源材料在真空中物理地转化到基体上,而不涉及任何化学反应。这种类型的沉积包括热蒸发电子束沉积及溅射沉积。IPD工艺是物理气相沉积的子类型。Plasma Vapor Deposition (PVD) is a process of depositing thin films in the gas phase in which source materials are physically transformed onto a substrate in a vacuum without involving any chemical reactions. This type of deposition includes thermal evaporation electron beam deposition and sputter deposition. The IPD process is a subtype of physical vapor deposition.

本文中所使用的术语“医疗装置”是为了广泛地扩展至医疗领域中所使用的所有装置,包括支架、导管、各种植入物等,而无论制造其的材料如何。本文中涉及的医疗装置及其他医疗参考物被理解为还包括兽医用装置及应用。The term "medical device" as used herein is intended to broadly extend to all devices used in the medical field, including stents, catheters, various implants, etc., regardless of the material from which they are made. References herein to medical devices and other medical references are understood to also include veterinary devices and applications.

术语“潜在的抗菌特性”是指这种情况:即,这些单质形态的金属通常不具反应活性,以致于不能作为有效的抗菌物,但是可能,当该金属被电离后表现出更强的抗菌效果。因此,在许多情况下被实施金属电离之后,该抗菌性金属具有潜在的抗菌特性。电离时,抗菌性金属也可以与各种反应性气体例如氮气或氧气结合,以形成氮化物、氧化物,和/或它们的组合的化合物。The term "potential antimicrobial properties" refers to the situation where these metals in elemental form are generally not reactive enough to be effective antimicrobials, but may, when the metal is ionized, exhibit a stronger antimicrobial effect . Therefore, the antimicrobial metal has potential antimicrobial properties after being subjected to metal ionization in many cases. When ionized, antimicrobial metals can also combine with various reactive gases, such as nitrogen or oxygen, to form nitrides, oxides, and/or compounds of combinations thereof.

本文中所用的“多化合价”是指一个或多个化合价形态,且应当被理解为是指离子上的电荷或基于其电子状态(electronic state)被分配给特定离子的电荷。"Multiple valency" as used herein refers to one or more valence species and should be understood to refer to a charge on an ion or a charge assigned to a particular ion based on its electronic state.

除非另外说明,氧化银定义为氧化银(AgO)的单线态形式。Unless otherwise stated, silver oxide is defined as the singlet form of silver oxide (AgO).

本文所用的术语“约”是为了说明具体数目不需要精确,可通过所采用的具体的过程或方法来决定,该数目可以偏高或偏低。The term "about" used herein is to illustrate that the specific number does not need to be precise, it can be determined by the specific process or method adopted, and the number can be higher or lower.

PEEK-聚醚醚酮PEEK-Polyetheretherketone

PTFE-聚四氟乙烯PTFE-Polytetrafluoroethylene

EPIFE-发泡聚四氟乙烯EPIFE-expanded polytetrafluoroethylene

UNMWPE是超高分子量聚乙烯UNMWPE is Ultra High Molecular Weight Polyethylene

应理解的是,用于限定权利要求的“一个”不是必要限制于一个单一的物质。It should be understood that the use of "a" or "an" to define a claim is not necessarily limited to a single substance.

附图说明 Description of drawings

图1是IPD设备的草图。1.靶材料,2.被涂覆的基体,3.用于移动基体靠近或远离靶标的机构,4.真空室,及5.用于靶的电源。Figure 1 is a sketch of an IPD device. 1. The target material, 2. the substrate being coated, 3. the mechanism for moving the substrate closer to or away from the target, 4. the vacuum chamber, and 5. the power supply for the target.

图2是IPD设备的另一个实施方式。1.靶材料,2.被涂覆的基体,3.具有移动基体靠近或远离靶标能力的机构,4.真空室,及5.靶的电源,6.决定电弧速度的电弧控制器。Fig. 2 is another embodiment of an IPD device. 1. Target material, 2. Substrate to be coated, 3. Mechanism with ability to move the substrate closer to or away from the target, 4. Vacuum chamber, and 5. Power source for the target, 6. Arc controller which determines the arc speed.

具体实施方式 Detailed ways

本发明提供了一些优于本领域抗菌性涂层及用于沉积抗菌性涂层工艺的其他状态的优点,包括:可控制地释放、使涂层嵌入基体中、对于某些材料的较低的运行温度、相比于传统的阴极电弧工艺在加工效率上的显著改善的生产量、可测量性、以及可应用于更宽范围的基体材料。The present invention offers several advantages over antimicrobial coatings in the art and other state of the art processes for depositing antimicrobial coatings, including: controlled release, embedding the coating into the matrix, lower Operating temperature, significantly improved throughput in process efficiency compared to conventional cathodic arc processes, scalability, and applicability to a wider range of substrate materials.

另外,已经获得了利用传统的IPD方法难以获得的优良涂层,包括氧化银、氧化铜及氮化铪涂层。相比于更昂贵的方法(诸如在美国专利No.5,454,886中概括的,其引入与此作为参考),在相当的厚度下,这些材料具有更高的抗菌活性。因此,通过采用新的基于IPD的方法,可实现具有相同抗菌成效的更薄的涂层及更短的处理时间。更高的生产量是可能的,其可导致生产成本的节约,并且尤其对于医药工业而言这是非常有意义的优点。In addition, excellent coatings that are difficult to obtain using traditional IPD methods have been obtained, including silver oxide, copper oxide, and hafnium nitride coatings. At comparable thicknesses, these materials have higher antimicrobial activity than more expensive methods such as outlined in US Patent No. 5,454,886, which is incorporated herein by reference. Thus, by adopting the new IPD-based approach, thinner coatings with the same antimicrobial efficacy and shorter treatment times can be achieved. Higher throughputs are possible, which can lead to savings in production costs, and this is a very significant advantage especially for the pharmaceutical industry.

将该优越性赋予利用所披露的工艺而获得的薄膜的因素是发现新的IPD工艺产生了大离子沉积的增加(而非降低)其实际上改进了薄膜的质量。多年来对于技术人员而言,在传统阴极电弧沉积工艺的使用中,最显著的趋势是减少大颗粒的沉积,以便产生更洁净且更均匀的薄膜。工业中传统的认识是,通常大颗粒对于沉积薄膜的质量是不利的。A factor that confers this advantage on films obtained with the disclosed process is the discovery that the new IPD process produces an increase (rather than a decrease) in macroion deposition that actually improves film quality. For technicians over the years, the most significant trend in the use of conventional cathodic arc deposition processes has been to reduce the deposition of large particles in order to produce cleaner and more uniform films. Conventional wisdom in the industry is that generally large particles are detrimental to the quality of deposited films.

本发明涉及一种在所选的基体材料上沉积抗菌性材料的工艺。该基体可以是任意材料,诸如金属、陶瓷、塑料、玻璃、柔性片、多孔纸、陶器或它们的组合。尽管基体可包含多种装置中的任何一种,但是特别优选医疗装置。这些医疗装置包括导管、植入物、支架、气管导管、矫形销、分流器、引流器、假肢器官装置、牙种植体、敷料及伤口闭合器(wound closures)。然而,应当理解,本发明并不限于这些装置,可扩展至其他用于医疗领域的装置,诸如面罩、服装、手术用具及表面。The present invention relates to a process for depositing an antimicrobial material on a selected base material. The substrate can be any material such as metal, ceramic, plastic, glass, flexible sheet, porous paper, pottery or combinations thereof. Although the substrate may comprise any of a variety of devices, medical devices are particularly preferred. These medical devices include catheters, implants, stents, endotracheal tubes, orthopedic pins, shunts, drains, prosthetic devices, dental implants, dressings, and wound closures. However, it should be understood that the present invention is not limited to these devices, but extends to other devices used in the medical field, such as masks, garments, surgical implements and surfaces.

关于植入感染有两个重要的因素:在植入手术过程中细菌的引入;以及手术之后的皮肤开口。经皮装置(transdermal device)是主要的感染区域。因为装置与皮肤相分离,在皮肤与装置之间形成了缝隙,便发生了细菌污染。There are two important factors regarding implant infection: the introduction of bacteria during the implant procedure; and the skin opening after the procedure. Transdermal devices are the main area of infection. Bacterial contamination occurs because the device separates from the skin, creating a gap between the skin and the device.

本发明的另一方面涉及用于将已调谐的抗菌性表面或其它成分提供到用于人体和兽类医疗装置以及其它应用上的改进且更经济的方法。抗菌性材料可以是任何固体材料或具有抗菌特性的材料的组合。优选的材料是具有潜在抗菌特性和生物相容性(即,在目的环境中不受损坏)的金属。这些金属包括银、锌、铌、钽、铪、锆、钛、铬、镍、铜、铂及金(在本文中也称为“抗菌性金属”)。根据本发明,通过在真空中将靶金属的负极电离成微粒组分的等离子体,使抗菌性金属沉积到基体表面之上或之中。离子等离子体沉积装置,例如在国际专利申请公开号WO 03-044240中所描述的那些(其内容引入于此以供参考),可根据本发明进行修改,且用于根据所描述的方法实施抗菌性材料的可控性沉积。Another aspect of the invention relates to improved and more economical methods for providing tuned antimicrobial surfaces or other compositions to human and veterinary medical devices and other applications. The antimicrobial material can be any solid material or combination of materials with antimicrobial properties. Preferred materials are metals with potential antimicrobial properties and biocompatibility (ie, not damaged in the intended environment). These metals include silver, zinc, niobium, tantalum, hafnium, zirconium, titanium, chromium, nickel, copper, platinum, and gold (also referred to herein as "antimicrobial metals"). According to the present invention, the antimicrobial metal is deposited on or into the surface of the substrate by ionizing the negative electrode of the target metal into a plasma of particulate components in vacuum. Ion plasma deposition apparatus, such as those described in International Patent Application Publication No. WO 03-044240, the contents of which are incorporated herein by reference, can be modified in accordance with the present invention and used to implement antimicrobial Controlled deposition of non-volatile materials.

将该优越性赋予利用所披露的工艺而获得的薄膜的因素是发现新的IPD工艺产生了大离子沉积的增加(而非降低)其实际上改进了薄膜的质量。多年来对于技术人员而言,在传统阴极电弧沉积工艺的使用中,最显著的趋势是减少大颗粒的沉积,以便产生更洁净且更均匀的薄膜。工业中传统的认识是,通常大颗粒对于沉积薄膜的质量是不利的。A factor that confers this advantage on films obtained with the disclosed process is the discovery that the new IPD process produces an increase (rather than a decrease) in macroion deposition that actually improves film quality. For technicians over the years, the most significant trend in the use of conventional cathodic arc deposition processes has been to reduce the deposition of large particles in order to produce cleaner and more uniform films. Conventional wisdom in the industry is that generally large particles are detrimental to the quality of deposited films.

相比之下,已经发现了大颗粒含量的增加形成了控制氧化银薄膜的抗菌活性的有效途径。为了将银迅速释放至周围组织,可采用厚的完全不含大颗粒的纯AgO涂层。为了进一步调谐的释放,利用了延时释放方案(time-release scheme)。In contrast, an increase in the content of large particles has been found to form an effective route to control the antimicrobial activity of silver oxide films. For rapid release of silver into surrounding tissue, a thick pure AgO coating completely free of large particles can be used. For further tuned release, a time-release scheme is utilized.

当利用阴极电弧将涂层沉积在基体上时,可控制从靶标喷射出的大粒子的相应的量。大粒子是从靶标喷射出而未完全气化的金属滴(blob)。这些金属滴是密集的,并由纯的靶标材料组成。通常,这些金属滴的表面是带电的,而大多数材料则呈电中性。When a cathodic arc is used to deposit a coating on a substrate, the corresponding amount of macroparticles ejected from the target can be controlled. Large particles are metal droplets (blobs) ejected from the target without being completely vaporized. These metal droplets are dense and consist of pure target material. Typically, the surfaces of these metal droplets are charged, whereas most materials are electrically neutral.

当大粒子通过等离子体时,其外表面被氧化,形成了一种颗粒外部具有AgO涂层而内部为纯银的“包裹的糖”状的结构。这就起到类似延时释放的胶囊的作用。As the large particles pass through the plasma, their outer surfaces are oxidized, forming a "coated sugar"-like structure with AgO coatings on the outside of the particles and pure silver inside. This acts like a time-release capsule.

由于内在的AgO外“壳”的不稳定形以及较稳定的纯银内“壳”产生了延时释放的效果。氧化银外部涂层相对迅速地释放其抗菌活性,杀死了周围区域中的任何细菌。在释放过程中,内部纯银被氧化并缓慢地释放以便在一段时间内维持抗菌活性。时间的长短由大粒子的尺寸所决定。因此,可以设计特定尺寸大颗粒的特定涂层,以在所选的时间段内维持抗菌活性。根据需要维持活性的时间的长短,通常大粒子的尺寸范围为10nm至10微米。Due to the instability of the inner AgO outer "shell" and the more stable inner "shell" of sterling silver, the delayed release effect is produced. The silver oxide exterior coating releases its antimicrobial activity relatively quickly, killing any bacteria in the surrounding area. During release, the inner sterling silver is oxidized and released slowly to maintain antimicrobial activity over a period of time. The length of time is determined by the size of the macroparticle. Therefore, specific coatings of specific sized macroparticles can be designed to maintain antimicrobial activity for a selected period of time. Typically macroparticles range in size from 10 nm to 10 microns, depending on how long they need to be active.

在抗菌活性中洗脱是一个重要因素;然而洗脱出的银的含量与Ag/AgO涂覆装置的抗菌活性相关。为了有效地对抗感染和形成生物膜,洗脱率必须以一定的水平发生。最低洗脱率为约每平方英寸0.005mg的Ag(0.0048mg/平方英寸)。在至少60天内,通过本文中所披露的方法制备的氧化银涂层的抗菌活性将按此洗脱率洗脱。通过其他方法制备的银/氧化银涂层不会以恒定率洗脱超过7天。Elution is an important factor in antimicrobial activity; however, the amount of eluted silver correlates with the antimicrobial activity of Ag/AgO-coated devices. To effectively fight infection and form biofilms, the elution rate must occur at a certain level. The minimum elution rate was about 0.005 mg Ag per square inch (0.0048 mg/square inch). The antimicrobial activity of the silver oxide coatings prepared by the methods disclosed herein will elute at this elution rate for at least 60 days. Silver/silver oxide coatings prepared by other methods did not elute at a constant rate for more than 7 days.

本发明另一个重要的特征是将氧化银涂层嵌入装置表面的能力,因此相比于通过其他沉积方法沉积的涂层,获得了更优良的粘附性。可在相距靶标特定的距离处,通过利用电弧控制方法来控制嵌入工艺,以便获得对于塑料可达到100nm以及更大的,对于金属及陶瓷可达到10nm以及更深的嵌入涂层。Another important feature of the present invention is the ability to embed the silver oxide coating on the surface of the device, thus achieving superior adhesion compared to coatings deposited by other deposition methods. The embedding process can be controlled by using arc control methods at a specific distance from the target in order to obtain embedding coatings down to 100 nm and greater for plastics and 10 nm and deeper for metals and ceramics.

图1中示出了用于实施离子等离子体沉积工艺的合适的装置。如图1所示,将靶材料的阴极1在真空室4中进行沉积。通过由应用到该阴极上的能源5所提供能量,在该阴极上通过产生电荷而使得阴极1电离。通过移动基体2靠近或远离靶1的控制机构3来选择、控制等离子体组分或使其指向基体。A suitable apparatus for carrying out an ion plasma deposition process is shown in FIG. 1 . As shown in FIG. 1 , a cathode 1 of target material is deposited in a vacuum chamber 4 . The cathode 1 is ionized by generating an electric charge at the cathode, provided by energy supplied by the energy source 5 applied to the cathode. The plasma components are selected, controlled or directed towards the substrate by the control mechanism 3 moving the substrate 2 closer to or away from the target 1 .

如图2所示还可以利用电源6的额外控制,以通过控制电弧速度进一步提供对等离子体组分的控制。Additional control of the power supply 6 may also be utilized as shown in Figure 2 to provide further control over the plasma composition by controlling the arc speed.

例如,在所期望的抗菌金属为银的情况下,将银阴极与所选的基体置于离子等离子体沉积装置的真空室中。尽管也可以使用低纯度的银金属,用作阴极的银优选为医用级银(即,纯度为99.99%),以避免任何潜在的毒性物质。For example, where the desired antimicrobial metal is silver, the silver cathode and the selected substrate are placed in the vacuum chamber of an ion plasma deposition apparatus. The silver used as the cathode is preferably medical grade silver (ie, 99.99% pure) to avoid any potentially toxic substances, although lower purity silver metal can also be used.

将真空室抽吸至适宜的工作压力,通常范围为0.1mT至30mT;然而,IPD工艺进行有效制造具有持久释放率的抗菌性表面的能力并不依赖于任何通常范围为0.1mT至30mT的特定工作压力。类似地,离子等离子体沉积工艺并不依赖于操作温度。通常操作温度的范围为25℃至75℃,这个范围中的任意温度均适用于制造抗菌性表面。The vacuum chamber is pumped to a suitable working pressure, typically in the range of 0.1mT to 30mT; however, the IPD process's ability to efficiently manufacture antimicrobial surfaces with sustained release rates does not depend on any specific pressure, typically in the range of 0.1mT to 30mT. work pressure. Similarly, ion plasma deposition processes are not dependent on operating temperature. Typical operating temperatures range from 25°C to 75°C, any temperature within this range is suitable for making antimicrobial surfaces.

基体可以相对于沉积材料进入轨道的任何方向旋转的(如在转盘上)或卷绕穿过沉积区域。向阴极供应电能以在阴极产生电弧。在适合于源材料的电压下,该电能是范围在几安培至几百安培的电流。通常,电压范围为12伏特至60伏特,并对应源材料的尺寸进行适宜的调节,该尺寸可以为几英寸至若干英尺。电弧将银金属阴极电离为银离子的等离子体、电中性的粒子及电子。通常,以10sccm至1000sccm的速率将氧气引入到等离子体中,并与银离子结合以形成氧化银粒子。根据所需的离子释放率及基体的最终用途,氧化银粒子可具有范围为从小于1纳米至约50微米的粒子尺寸。The substrate may be rotated (eg, on a turntable) or wound through the deposition zone in any direction relative to the deposition material entry track. Electrical energy is supplied to the cathode to generate an arc at the cathode. This electrical energy is a current in the range of a few amperes to hundreds of amperes at a voltage suitable for the source material. Typically, the voltage ranges from 12 volts to 60 volts and is suitably adjusted for the size of the source material, which can be from a few inches to several feet. The arc ionizes the silver metal cathode into a plasma of silver ions, electrically neutral particles and electrons. Typically, oxygen gas is introduced into the plasma at a rate of 10 sccm to 1000 sccm, and combines with silver ions to form silver oxide particles. Depending on the desired rate of ion release and the end use of the substrate, the silver oxide particles can have a particle size ranging from less than 1 nanometer to about 50 microns.

为了获得一段持续时间内的有效释放率,还可以控制抗菌性表面的金属离子释放率。通过将各种结构的氧化物(包括单价、双价及多价氧化物)的组合物沉积在基体上,获得了这种可控的金属释放。氧化物的组合呈现不同的离子释放率,其导致了用于提高抗菌活性的对离子浓度及金属离子的持续性释放的控制。由于它们在等离子体中被氧化,多价氧化物还可以在中性金属粒子上形成。可通过形成各种尺寸及价态的氧化物的组合物来进一步增强了沉积材料的持续释放。这种组合物的益处是在较长的时间周期内离子释放的增长。然后氧化银颗粒以氧化银颗粒分散体的形式沉积在基体表面。The release rate of metal ions from the antimicrobial surface can also be controlled in order to obtain an effective release rate over a sustained period of time. This controlled release of metals is achieved by depositing a combination of oxides of various structures, including monovalent, divalent, and multivalent oxides, on the substrate. Combinations of oxides exhibit different ion release rates, which lead to control of ion concentration and sustained release of metal ions for enhanced antibacterial activity. Multivalent oxides can also form on neutral metal particles as they are oxidized in the plasma. Sustained release of the deposited material can be further enhanced by forming a composition of oxides of various sizes and valence states. The benefit of this composition is the increased release of ions over a longer period of time. Silver oxide particles are then deposited on the surface of the substrate in the form of a dispersion of silver oxide particles.

抗菌性表面在传递抗菌响应(anti-microbial)中的有效性依赖于用于形成该抗菌性表面的处理时间。从5秒至若干分钟的较长的处理时间形成了具有不同抗菌响应的抗菌性表面。The effectiveness of an antimicrobial surface in delivering an anti-microbial is dependent on the treatment time used to form the antimicrobial surface. Longer treatment times from 5 seconds to several minutes formed antimicrobial surfaces with different antimicrobial responses.

还可通过将不同金属氧化物的组合物沉积在基体上而得到可控的金属释放。这些组合物包括银和钛、银和金、银和铜、银铜和金。其他的材料可作为共沉积金属、合金或作为在各种组合中的交替的多个层而结合。等离子体环境的控制及适应性允许了更大范围的组合物,以及相应地,一个宽范围的定制涂层。Controlled metal release can also be obtained by depositing a combination of different metal oxides on the substrate. These compositions include silver and titanium, silver and gold, silver and copper, silver copper and gold. Other materials may be combined as co-deposited metals, alloys, or as alternating layers in various combinations. Control and adaptability of the plasma environment allows for a greater range of compositions and, correspondingly, a wide range of custom coatings.

通过下列非限制性实施例来进一步说明本发明。The invention is further illustrated by the following non-limiting examples.

实施例Example

材料和方法Materials and methods

试样洗脱测试-进行洗脱测试以确定涂覆的聚丙烯试样的银洗脱分布。银洗脱测试提供了一种用于确定一段特定时间周期内从测试制品中释放的银的含量的定量方法。根据现行的FDA实验室实习规则(Good Laboratory Practice,GLP,Standards)21CFR,第58部分来实施本发明。在温度37±1℃的温度下,将每个测试制品从用于注射的USP 0.9%NaCl溶液中萃取出来以便通过电感耦合等离子体光谱(ICP)进行银洗脱分析。分别将每个试样置于10mL的USP 0.9%NaCl中保持特定时间段。在该研究中所用的时间段为15min、30min、1hr、2hr、4hr、8hr、24hr、2-7天、10天、15天、20天、25天及30天。在每个时间点上,将试样周围的液体移入洁净的玻璃容器中,并将新鲜的NaCl添加至试样容器中。用去离子水使移出的液体达到50mL的总体积,然后进行酸浸渍(digeste)并通过ICP检测银含量。Sample Elution Test - An elution test was performed to determine the silver elution profile of the coated polypropylene coupons. The silver elution test provides a quantitative method for determining the amount of silver released from a test article over a specified period of time. The present invention is practiced in accordance with current FDA Good Laboratory Practice (GLP, Standards) 21 CFR, Part 58. Each test article was extracted from USP 0.9% NaCl solution for injection at a temperature of 37±1° C. for silver elution analysis by inductively coupled plasma spectroscopy (ICP). Each sample was placed in 10 mL of USP 0.9% NaCl for a specific period of time. The time periods used in this study were 15 min, 30 min, 1 hr, 2 hr, 4 hr, 8 hr, 24 hr, 2-7 days, 10 days, 15 days, 20 days, 25 days and 30 days. At each time point, the liquid surrounding the sample was removed into a clean glass container and fresh NaCl was added to the sample container. The liquid removed was brought up to a total volume of 50 mL with deionized water, then digested and assayed for silver content by ICP.

试样抑菌圈(ZOI)测试-ZOI测试是一种容易的24小时测试抗菌活性的方法。该测试不是定量的,仅能提供足够的信息来指出是否连续的稀释测试是被允许的。该测试不提供关于组织再生或坏死的信息。Specimen Zone of Inhibition (ZOI) Test - The ZOI test is an easy 24 hour test for antimicrobial activity. The test is not quantitative and only provides enough information to indicate whether serial dilution testing is permitted. This test does not provide information on tissue regeneration or necrosis.

试样连续稀释测试-连续稀释测试提供了对单位所给体积的细菌的数量的精确测量。当相比于对照样品时,其可提供了对抗菌性涂层活性的定量测量。Sample Serial Dilution Test - The serial dilution test provides an accurate measurement of the number of bacteria per unit of a given volume. This provides a quantitative measure of the activity of the antimicrobial coating when compared to a control sample.

由0.5McFarland标准制备标准的细菌溶液。将该标准校准为在625nm下读数在0.08OD至0.1OD之间,其得到的标准细菌数为1.5×108cfu/mL。Standard bacterial solutions were prepared from 0.5 McFarland standard. This standard was calibrated to read between 0.08 OD and 0.1 OD at 625 nm, which gave a standard bacterial count of 1.5 x 108 cfu/mL.

虽然详细描述了本发明的下列实施方式,本领域技术人员对那些实施方式作出修改与调整是显而易见的。应当理解这些修改包含在本发明的保护范围之内。While the following embodiments of the present invention are described in detail, modifications and adaptations to those embodiments will be apparent to those skilled in the art. It should be understood that these modifications are included within the protection scope of the present invention.

实施例1.银涂覆的导管(公开的方法)Example 1. Silver-Coated Catheters (Disclosed Method)

利用与美国专利No.5,454,886的实施例6中所描述的相同的步骤(procedure)制备涂覆银的(solver-coated)导管。利用磁控溅射将银金属沉积在双腔乳胶球囊导管的2.5cm长的多个片段上。尽可能地基于公开实施例来实施操作条件;即,沉积率为每分钟200A°;氩工作气压为30m Torr;基体温度与涂层金属银的熔点的比例(T/Tm)为0.30。在这个实施例中,由于基体是圆的且是粗糙的,所以入射角是变化的;即,入射角沿圆周而变化,并在精确的范围内越过众多表面部件的侧部及上部。通过抑菌圈测试了对金黄色葡萄球菌(S.aureus)的抗菌效果,(表1)。A solver-coated catheter was prepared using the same procedure as described in Example 6 of US Patent No. 5,454,886. Silver metal was deposited on 2.5 cm long segments of a dual lumen latex balloon catheter using magnetron sputtering. Operating conditions were implemented as closely as possible based on the disclosed examples; namely, deposition rate 200 A° per minute; argon working pressure 30 m Torr; ratio of substrate temperature to melting point of coating metallic silver (T/Tm) 0.30. In this embodiment, since the substrate is round and rough, the angle of incidence varies; that is, the angle of incidence varies around the circumference and across the sides and top of the numerous surface members within precise limits. The antibacterial effect against Staphylococcus aureus (S. aureus) was tested by zone of inhibition, (Table 1).

表1Table 1

  专利5,454,886所报道的结果 实验结果 抑菌圈 0.5mm T/Tm 0.38 抑菌圈 16mm <1mm T/Tm 0.30 0.30 Results reported in patent 5,454,886 Experimental results Zone of inhibition 0.5mm T/Tm 0.38 Zone of inhibition 16mm <1mm T/Tm 0.30 0.30

在与先前公开的相同的T/Tm条件下,并重复与专利5,454,889的实施例6中设定的相同的条件,所观察到的围绕管的抑菌圈(ZOI)明显小于所报告的ZOI。该ZOI测试是如在专利5,454,886的实施例1中所报告的,利用金黄色葡萄球菌(S.aureus)而进行。Under the same T/Tm conditions as previously disclosed, and repeating the same conditions set forth in Example 6 of patent 5,454,889, the observed zone of inhibition (ZOI) around the tube was significantly smaller than the reported ZOI. The ZOI test was performed using Staphylococcus aureus (S. aureus) as reported in Example 1 of patent 5,454,886.

实施例2.DC磁控溅射抗菌涂层(公开的方法)。Example 2. DC magnetron sputtering antimicrobial coating (published method).

按照专利5,454,886中的实施例7的方法。在以下条件下:0.5kW功率、40mTorr Ar/O2、20摄氏度的初始基体温度、100mm的阴极/阳极距离,并且最终薄膜的厚度为300nm,利用DC磁控溅射使得纯度为99.99%的银涂敷在特氟纶涂覆的双腔乳胶球囊导管上,。所用的工作气体为可商购的Ar及99/1 wt%Ar/O2The method of Example 7 in Patent 5,454,886 was followed. Under the following conditions: 0.5 kW power, 40 mTorr Ar/O 2 , initial substrate temperature of 20 degrees Celsius, 100 mm cathode/anode distance, and a final film thickness of 300 nm, 99.99% pure silver was obtained using DC magnetron sputtering Applied on a Teflon-coated double lumen latex balloon catheter. The working gases used were commercially available Ar and 99/1 wt% Ar/ O2 .

通过抑菌圈测试来检测涂层的抗菌效果。将酸水解酪蛋白琼脂分散在陪替氏培养皿中。在用Staphylococcus aureus ATCC#25923菌苔进行接种之前,干燥琼脂板的表面。由Bactrol Discs(Disco,M.)制备接种体,其经制造者的指示进行重构。同时,在培养之后,将待测试的涂覆的材料置于琼脂表面。在37℃下对培养皿进行24hr的孵育。孵育后,测量ZOI,并按照如下进行校正抑菌圈的计算:校正抑菌圈=抑菌圈-接触琼脂的测试材料的直径。公开的结果示出,对于未涂覆的试样不存在抑菌圈。对于在40mTorr的工作气压,99/1wt%Ar/O2中溅射的导管,报道了具有11mm的校正的抑菌圈。The antibacterial effect of the coating was tested by the zone of inhibition test. Disperse the acid hydrolyzed casein agar in a Petri dish. The surface of the agar plate was dried prior to inoculation with a lawn of Staphylococcus aureus ATCC #25923. Inoculum was prepared from Bactrol Discs (Disco, M.), which were reconstituted according to the manufacturer's instructions. Simultaneously, after incubation, the coated material to be tested was placed on the agar surface. The dishes were incubated at 37°C for 24 hrs. After incubation, the ZOI was measured and the calculation of the corrected zone of inhibition was performed as follows: corrected zone of inhibition = zone of inhibition - diameter of the test material in contact with the agar. The published results show that no zone of inhibition exists for the uncoated samples. For catheters sputtered in 99/1 wt% Ar/ O2 at a working gas pressure of 40 mTorr, a corrected zone of inhibition of 11 mm was reported.

在表2中列出了在公开条件下重复实施实验。观察到小于1mm的小的ZOI。In Table 2 the experiments were repeated under the disclosed conditions. Small ZOIs of less than 1 mm were observed.

表2Table 2

Figure A200780010384D00221
Figure A200780010384D00221

在重复上述公开条件中,实验结果示出了小于1mm的小的ZOI。In repeating the above disclosed conditions, the experimental results show a small ZOI of less than 1 mm.

实施例3.复合银抗菌性薄膜(公开方法)Embodiment 3. Composite silver antibacterial film (disclosed method)

如专利5,454,886的实施例11中所发现的,本实施例表明了用于制备通过反应性溅射形成的复合抗菌性涂层的本领域方法的情况。表3列出了公开的溅射条件及比较性研究(相比于通过以下公开方法中的步骤所获得的实验结果)中所用的条件。As found in Example 11 of patent 5,454,886, this example demonstrates the state of the art process for preparing composite antimicrobial coatings formed by reactive sputtering. Table 3 lists the published sputtering conditions and the conditions used in the comparative study (compared to the experimental results obtained by following the steps in the published method).

表3table 3

                           溅射条件公开的                                             试验 靶标              99.99%  Ag                      99.99% 工作气体          80/20% Ar/O2                   80/20%  ArO2 工作气压          2.5-50mTorr                      40mTorr 电源              0.1-2.5kW                        0.5kW Open test of sputtering conditions Target 99.99% Ag 99.99% Working gas 80/20% Ar/O 2 80/20% ArO 2 Working air pressure 2.5-50mTorr 40mTorr Power 0.1-2.5kW 0.5kW

  基体温度               -5℃至20℃                   20℃ 阳极/阴极距离          40mm至100mm                  100mm 底部气压(base P)       <4×104Torr                  <4×104Torr ZOI                    6mm-12mm                     0mm-2mm Substrate temperature -5°C to 20°C 20°C Anode / cathode distance 40mm to 100mm 100mm Bottom air pressure (base P) <4×10 4 Torr <4×10 4 Torr ZOI 6mm-12mm 0mm-2mm

实施例4.氧化银涂覆导管的体外测试Example 4. In Vitro Testing of Silver Oxide Coated Catheters

本实施例表明了抗菌性涂层在革兰阳性及革兰阴性生物体范围内的有效性。用于一般抑菌圈测试的生物体为:革兰阳性细菌粪肠球菌(E.faecalis)、金黄色葡萄球菌(S.aureus MR)、及S.epidermis。革兰阴性细菌是大肠杆菌(E.coli)、肺炎克雷伯菌(K pneumoniae)和P.aerugosia。This example demonstrates the effectiveness of antimicrobial coatings in a range of Gram-positive and Gram-negative organisms. The organisms used for the general zone of inhibition test are: Gram-positive bacteria Enterococcus faecalis (E. faecalis), Staphylococcus aureus (S. aureus MR), and S. epidermis. Gram-negative bacteria are Escherichia coli (E. coli), K pneumoniae (K pneumoniae) and P. aerugosia.

进行ZOI测试所用的方法为最多(maximum)4天的逐板转移。每一种细菌平铺在胰酶大豆琼脂上。将预制的板接种细菌,分为三个相等的部分,并且培养后,将涂覆有200nm氧化银的一英寸长的双腔气囊导管试样置于每个部分的中心。在37℃下将试样置于培养器中,在24小时、48小时、72小时及96小时测量ZOI。The method used to perform the ZOI assay was a maximum of 4 days of plate-by-plate transfer. Each bacterium was plated on tryptic soy agar. Prefabricated plates were inoculated with bacteria, divided into three equal sections, and after incubation, a one inch long double lumen balloon catheter coupon coated with 200 nm silver oxide was placed in the center of each section. The samples were placed in an incubator at 37°C, and the ZOI was measured at 24 hours, 48 hours, 72 hours and 96 hours.

将总ZOI定义为ZOI减去试样的宽度。对于这个实验,进行了总ZOI的测量,并将其分为两份。如果没有可测的ZOI及没有生物膜,且生物体没有生长越过或连接到试样,则将测量记录为0.0mm。当观察到生物膜时,将其记录为1.0mm。重复逐板转移,直至记录到了生物膜或对于2次转移记录到0.0mm的测量值。每一种生物体具有三个板,对于并排的试样以及对照导管每一个板具有三个数据点。每天都进行测量。取每个板的三个测量值的平均值以得到每天的板ZOI。作这些是为了补偿浓度过重或过轻的冲击(swipe)。所有记录的测量值均以mm计。0.0测量值表明生物体生长在银试样,但并未在银试样导管上粘附或产生生物膜。所有的对照试样从第1天起均毫无例外地具有生物膜。结果在表4中示出。The total ZOI is defined as the ZOI minus the width of the specimen. For this experiment, the measurement of the total ZOI was performed and divided in two. If there is no measurable ZOI and no biofilm, and no organisms grow across or attach to the specimen, the measurement is recorded as 0.0 mm. When biofilm was observed, it was recorded as 1.0 mm. Plate-by-plate transfers were repeated until biofilm was recorded or a measurement of 0.0 mm was recorded for 2 transfers. There were three plates for each organism, with three data points per plate for the side-by-side sample and control catheters. Measurements are taken every day. The average of the three measurements for each plate was taken to obtain the plate ZOI for each day. This is done to compensate for the swipe of too heavy or too light a concentration. All recorded measurements are in mm. A measurement of 0.0 indicates that the organisms grew on the silver coupon, but did not adhere to or form a biofilm on the silver coupon conduits. All control samples without exception had biofilm from day 1 onwards. The results are shown in Table 4.

表4Table 4

第一天first day

Figure A200780010384D00241
Figure A200780010384D00241

Figure A200780010384D00251
Figure A200780010384D00251

实施例5 氧化银涂覆导管的体内测试Example 5 In Vivo Testing of Silver Oxide Coated Catheters

本实施例表明两段相同的具有200nm氧化银涂层的导管材料的兔体内测试。测试装置是ETO-灭菌的。对于两段导管中的每一个,制成四个导管抗菌性部分片段(长度约为4英寸)。使用该测试装置并保持在室温下。This example demonstrates the in vivo testing of two identical segments of catheter material with a 200 nm silver oxide coating. The test device is ETO-sterilized. For each of the two lengths of catheter, four catheter antimicrobial partial segments (approximately 4 inches in length) were made. Use the test device and keep it at room temperature.

将总共八个导管片段(每个导管材料四个片段)植入进雌性新西兰白兔中。在植入第1天之前,称重并静脉注射0.1mL/kg的克他命/甲苯噻嗪鸡尾酒(87mg/mL克他命,13mg/mL甲苯噻嗪)进行麻醉。动物为23-25周大,且在第1天称重为2.63kg。A total of eight catheter segments (four segments of each catheter material) were implanted into female New Zealand White rabbits. Prior to implantation day 1, mice were weighed and anesthetized with an intravenous injection of 0.1 mL/kg of ketamine/xylazine cocktail (87 mg/mL ketamine, 13 mg/mL xylazine). Animals were 23-25 weeks old and weighed 2.63 kg on day 1.

导管植入后的一周,将感染性(攻击性,challenge)生物体(金黄色葡萄球菌或大肠杆菌)置于每个导管进入位点周围的皮肤上(每个导管材料的两个片段受金黄色葡萄球菌感染而每个导管材料的剩余的两个片段受大肠杆菌感染)。在细菌感染48小时后处死动物。One week after catheter implantation, infectious (challenge) organisms (Staphylococcus aureus or Escherichia coli) were placed on the skin around each catheter entry site (two pieces of each catheter material protected by gold Staphylococcus aureus infection while the remaining two segments of each catheter material were infected with E. coli). Animals were sacrificed 48 hours after bacterial infection.

处理的参数在下面表5中进行描述。按照所采取的方案,细菌感染发生在第8天。The parameters of the treatments are described in Table 5 below. Bacterial infection occurred on day 8 according to the adopted protocol.

表5table 5

Figure A200780010384D00261
Figure A200780010384D00261

椎旁区利用电动剪毛机进行修剪,并利用聚维酮碘及70%的乙醇进行准备。动物沿其背部具有八个植入位置。每个位置距中线2.5cm-5.0cm,且位置相距约2.5cm。植入位置利用永久标记进行标识。The paraspinal area was trimmed with an electric shearer and prepared with povidone-iodine and 70% ethanol. Animals have eight implantation locations along their backs. Each location is 2.5cm-5.0cm from the midline, and the locations are about 2.5cm apart. The implantation site is identified with a permanent marker.

在每个植入位点,用16号针刺穿皮肤进入到肌肉中。将导管片段沿针的ID穿进肌肉中,并将针移走,使得导管片段的一半通过皮肤进入肌肉而被植入。在每个位点植入导管材料的一个部分。将相同两段中的每一个的四个片段,总共八个植入物植入兔子。将暴露的导管片段用无菌敷料覆盖。表6中确定了在动物背部上的植入位点的位置。At each implantation site, a 16-gauge needle was pierced through the skin and into the muscle. The catheter segment is inserted into the muscle along the ID of the needle and the needle is removed so that half of the catheter segment is implanted through the skin into the muscle. One portion of catheter material is implanted at each site. Four segments of each of the same two segments, for a total of eight implants, were implanted in rabbits. Cover the exposed catheter segment with a sterile dressing. The location of the implantation site on the back of the animals is identified in Table 6.

表6Table 6

Figure A200780010384D00271
Figure A200780010384D00271

在第8天,将无菌敷料从每个暴露的导管片段移除。每个导管进入位置周围的皮肤接受1mL包含2.2×105CFU/mL金黄色葡萄球菌及5.10×102CFU/mL大肠杆菌的悬浮液的表面滴注。用金黄色葡萄球菌感染每个导管材料中的一个片段,用大肠杆菌感染每个导管材料中的一个片段。在接种后,用无菌敷料再覆盖导管片段。表7中列出了每个位点使用的接种的生物体。On day 8, a sterile dressing was removed from each exposed catheter segment. The skin around each catheter entry site received a topical instillation of 1 mL of a suspension containing 2.2 x 105 CFU/mL S. aureus and 5.10 x 102 CFU/mL E. coli. One segment of each catheter material was infected with S. aureus and one segment of each catheter material was infected with E. coli. After inoculation, the catheter segment is re-covered with a sterile dressing. The inoculated organisms used for each site are listed in Table 7.

表7Table 7

  位置号 区域 植入的材料 接种的生物体 注释 1 头颅 3659-16 金黄色葡萄球菌 通常给予1mL细菌悬浮液 2 头颅中部 3659-16 N/A1 N/A 3 头颅中部 3659-17 N/A1 N/A 4 脊椎尾端 3659-17 N/A1 N/A 5 头颅 3659-16 N/A1 N/A 6 头颅中部 3659-16 大肠杆菌 局部地给予1mL细菌悬浮液 7 脊椎尾端中部 3659-17 大肠杆菌 局部地给予1mL细菌悬浮液 8 脊椎尾端 3659-17 金黄色葡萄球菌 局部地给予1mL细菌悬浮液 location number side area Implanted material inoculated organism note 1 Left head 3659-16 Staphylococcus aureus Usually 1 mL of bacterial suspension 2 Left middle of skull 3659-16 N/A 1 N/A 3 Left middle of skull 3659-17 N/A 1 N/A 4 Left end of spine 3659-17 N/A 1 N/A 5 right head 3659-16 N/A 1 N/A 6 right middle of skull 3659-16 Escherichia coli Topically administer 1 mL of bacterial suspension 7 right mid caudal spine 3659-17 Escherichia coli Topically administer 1 mL of bacterial suspension 8 right end of spine 3659-17 Staphylococcus aureus Topically administer 1 mL of bacterial suspension

N/A=不施加N/A = not applied

在第10天,根据脑化学最优化程序协议(Brain ChemistryOptimization Program protocol)01-11-21-22-02-026,静脉注射商购的安乐死溶液使动物安乐死。对整个植入物进行无菌收集,并进行定量细菌测定。在肌肉和皮肤的管道区域上标有表面标签。由于多个导管已经被收回并且植入管道是不可见的,所以本研究中未收集标签。将植入痕迹周围的肌肉部分置于10%中性缓冲的福尔马林中,并提交给Colorado Histo-Prep(Fort Collins,CO),由广受好评的兽医病理专家进行评价。对于8个植入位点中的4个(第1,6,7,及8号位点),分别将植入物的内部及外部部分收集到胰酶大豆肉汤(Tryptic Soy Broth)中。这些是仍具有处于皮肤之外的导管的一部分的位点。On day 10, animals were euthanized intravenously with a commercially available euthanasia solution according to Brain Chemistry Optimization Program protocol 01-11-21-22-02-026. Whole implants were aseptically collected and quantitative bacterial assays were performed. Surface labels are placed on the duct area of the muscle and skin. Tags were not collected in this study because multiple catheters had been withdrawn and the implanted conduit was not visible. Muscle sections surrounding the implantation marks were placed in 10% neutral buffered formalin and submitted to Colorado Histo-Prep (Fort Collins, CO) for evaluation by acclaimed veterinary pathologists. For 4 of the 8 implantation sites (Site Nos. 1, 6, 7, and 8), the internal and external portions of the implants were collected into Tryptic Soy Broth, respectively. These are sites that still have a portion of the catheter outside the skin.

临床观察示出兔子保持了健康,且未示出感染的迹象,如表8中所示。Clinical observations showed that the rabbits remained healthy and showed no signs of infection, as shown in Table 8.

表8  兔子健康的临床观察Table 8 Clinical Observations of Rabbit Health

Figure A200780010384D00281
Figure A200780010384D00281

解释:explain:

G0=看起来正常;机灵、警觉并反应迅速G0 = Appears normal; alert, alert and responsive

S0=粪便正常S0 = normal stool

S1=粪便软(soft)S1 = soft feces (soft)

A0=消耗正常量的食物A0 = normal amount of food consumed

对于每个测试材料,一个植入位点接种金黄色葡萄球菌,一个植入位点接种大肠杆菌进行培养(第1,6,7,及8号位点)。对于接种的位点,对标识为内部及外部的两个植入物的位置进行了微生物生长及识别的评价。皮肤以上的导管部分标识为外部植入位点,皮肤以下的导管部分标识为内部植入位点。For each test material, one implantation site was inoculated with Staphylococcus aureus, and one implantation site was inoculated with Escherichia coli for culture (sites 1, 6, 7, and 8). For the inoculated sites, the two implant locations identified as internal and external were evaluated for microbial growth and identification. The portion of the catheter above the skin is identified as the external implantation site, and the portion of the catheter below the skin is identified as the internal implantation site.

对于剩余的四个植入位点(第2-5号位置),不实施接种,同时在接种当天(第8天),皮肤外部不存在可见的植入物。对于这些位点,对导管的皮下部分进行关于微生物的生长及识别的评价。For the remaining four implantation sites (sites 2-5), no inoculation was performed and no implants were visible outside the skin on the day of inoculation (day 8). For these sites, the subcutaneous portion of the catheter was evaluated for growth and recognition of microorganisms.

对于用3659-16导管材料进行植入并用金黄色葡萄球菌进行感染的位点(第1号位点),在内部及外部植入位点识别感染生物体的正生长(positive growth)。对于用3659-16导管材料进行植入并用大肠杆菌进行感染的位置(第6号位置),在内部植入位点存在识别为Staphylococcushominis的细菌生长;这种生长归因于环境污染。在这个位点,在内部或外部植入位点没有识别到感染性生物体(大肠杆菌)的生长。For the site implanted with 3659-16 catheter material and infected with S. aureus (Site No. 1 ), positive growth of the infecting organism was identified at the internal and external implant sites. For the site implanted with 3659-16 catheter material and infected with E. coli (Site No. 6), there was bacterial growth identified as Staphylococcushominis at the internal implant site; this growth was attributed to environmental contamination. At this site, no growth of infectious organisms (E. coli) was recognized at the internal or external implantation site.

对于用3659-17导管材料进行植入并用金黄色葡萄球菌进行感染的位点(第8号位置),仅在外植入位点识别到感染生物体的正增长。对于用3659-17导管材料进行植入并用大肠杆菌进行感染的位点(第7号位点),在内部或外部植入位点不存在生长。For the site implanted with 3659-17 catheter material and infected with S. aureus (site no. 8), positive growth of the infecting organism was identified only at the site of the external implant. For the site implanted with 3659-17 catheter material and infected with E. coli (Site No. 7), there was no growth at the internal or external implant site.

对于剩余的四个未接种的植入位点(第2-5号位置),不存在细菌生长。见表9。For the remaining four non-inoculated implantation sites (positions 2-5), there was no bacterial growth. See Table 9.

表9Table 9

来自植入位置的微生物生长结果Microbial growth results from implant site

Figure A200780010384D00291
Figure A200780010384D00291

Figure A200780010384D00301
Figure A200780010384D00301

N/A=不可施加N/A = not applicable

在任何植入位点均不存在组织反应或感染的明显可见的证据。对于所有的植入位点,在植入位置的皮下筋膜及肌肉存在黑至灰的变色。结果在表10中进行总结。There was no overtly visible evidence of tissue reaction or infection at any implantation site. For all implant sites, there was black to gray discoloration in the subcutaneous fascia and muscle at the implant site. The results are summarized in Table 10.

                      表10Table 10

                   尸体检测观察                                               

                             尸体检测观察Dead body detection and observation

组    动物  植入   植入       位置条件                  常规观察2 Group Animal Implantation Implantation Position Condition Routine Observation2

      号    位置   材料No. Location Material

A     17    1      3659-16    从肌肉中拉出的导管        无组织反应或感染A 17 1 3659-16 Catheter pulled from muscle No tissue reaction or infection

                                                        的明显可见的证据Visibly Visible Evidence

            2      3659-16    肌肉中的导管部分,被收    无组织反应或感染                                                                                                  No tissue reaction or infection

                              回一半(back out halfway)  的明显可见的证据Clearly visible evidence of back out halfway

            3      3659-17    肌肉中的导管部分          无组织反应或感染                                                                                                                                                             

                                                        的明显可见的证据Visibly Visible Evidence

            4      3659-17    仍在肌肉中的导管部分      无组织反应或感染                                                                     

                                                        的明显可见的证据Visibly Visible Evidence

            5      3659-16    仍在肌肉中的导管部分      无组织反应或感染5 3659-16 Portion of catheter still in muscle No tissue reaction or infection

                                                        的明显可见的证据Visibly Visible Evidence

            6      3659-16    从肌肉中拉出的导管        无组织反应或感染                                                                                                                                           

                                                        的明显可见的证据Visibly Visible Evidence

            7      3659-17    从肌肉中拉出的导管        无组织反应或感染                                                                                                                                                             

                                                        的明显可见的证据Visibly Visible Evidence

            8      3659-17    从肌肉中拉出的导管        无组织反应或感染                                                                                                                            

                                                        的明显可见的证据Visibly Visible Evidence

N/A=不施加N/A = not applied

结果示出了浸渍了银/氧化银的抗菌导管避免了细菌、菌落、及生物膜的形成。所有的植入位点的抗菌成效都是一致的,即使在用大肠杆菌或金黄色葡萄球菌细菌感染后的第8天抗菌性涂层也仍然是有效的。未观察到坏死。病变与肌肉中的异物反应相一致,且具有在皮下组织中更剧烈的炎症反应。The results show that silver/silver oxide impregnated antimicrobial catheters avoid the formation of bacteria, colonies, and biofilms. Antimicrobial efficacy was consistent across all implant sites, with the antimicrobial coating remaining effective even at day 8 after infection with E. coli or S. aureus bacteria. Necrosis was not observed. The lesions were consistent with a foreign body reaction in the muscle, with a more intense inflammatory response in the subcutaneous tissue.

实施例6 氧化银涂层的洗脱Example 6 The Elution of Silver Oxide Coating

总共二十个试样,对用典型的氧化银涂层涂覆的1cm2的聚丙烯进行评价。从两个实验组中的十个不同的试样中均选取两个试样。利用电感耦合等离子体进行该测试两次,以确定在每个时间点上存在的银的含量。然后对于每一个测试组,对总的十个得到的值取得平均值。洗脱值按mg/试样示出,在这种情况下,其为mg/平方英寸。A total of twenty samples were evaluated on 1 cm2 of polypropylene coated with a typical silver oxide coating. Two specimens were selected from ten different specimens in each of the two experimental groups. The test was performed twice using inductively coupled plasma to determine the amount of silver present at each time point. Then for each test group, an average of the ten obtained values was taken. Elution values are shown in mg/sample, which in this case is mg/in2.

在第一个24小时内,在NaCl溶液中所有的试样都呈现出一致的行为。在这些值在24小时时间点附近达到平稳(leveled off)之前,在四小时时间点附近出现一个小峰。During the first 24 hours, all samples showed consistent behavior in NaCl solution. A small peak appeared around the four hour time point before the values leveled off around the 24 hour time point.

所有的试样均具有非常一致的行为。从第1天至第5天,这些值均相当稳定;然后在第6天的时间点附近出现峰值,接着从第7天至第30天达到平稳。All samples had very consistent behavior. These values were fairly stable from day 1 to day 5; then peaked around the time point of day 6 and then plateaued from day 7 to day 30.

在所有时间点,对于涂覆的聚丙烯试样的平均洗脱值为每平方英寸约0.005mg(0.0048mg/平方英寸)。在本研究的整个过程中,在生理盐水中,对于聚丙烯试样利用洗脱值及每平方英寸约1.05mg的总银值(由外部测试获得),表现出相当一致的银洗脱,在4小时时间点以及6天后发现微小峰值。The average elution value for the coated polypropylene samples was about 0.005 mg per square inch (0.0048 mg/square inch) at all time points. Throughout the course of this study, in normal saline, the polypropylene samples showed fairly consistent silver elution using elution values and a total silver value of approximately 1.05 mg per square inch (obtained by external testing). A small peak was found at the 4 hour time point as well as after 6 days.

实施例7 ePTFE涂覆基体的体内愈合测试Example 7 In Vivo Healing Test of ePTFE Coated Substrates

通过体内测试,本实施例表明了200nm氧化银涂层不能造成坏死。利用标准的200nm氧化银涂层涂敷1cm2的ePTFE试样,并按照与上述实施例6所概括的,将其皮下植入兔子中。在第9天及第22天移出基体,以研究在植入的氧化银涂覆部分周围的组织的愈合。结果在表11中进行概括。Through in vivo testing, this example shows that the 200nm silver oxide coating does not cause necrosis. A 1 cm2 sample of ePTFE was coated with a standard 200nm silver oxide coating and implanted subcutaneously in rabbits as outlined in Example 6 above. The substrates were removed on days 9 and 22 to study the healing of the tissue surrounding the silver oxide-coated portion of the implant. The results are summarized in Table 11.

表11-对于200nm氧化银的历史记录Table 11 - Historical records for 200nm silver oxide

  处理组 植入维持时间,天数     ePTFE//内脏表面 ePTFE//网状物表面 银粒子/粒子观察    对照组未涂覆网装物 9 一至若干个mps层;具有ncf的sscs 10+层               MF:被具有occ gcs并具有ncf网状物的mps围绕:由具有ncf的mps填充;occ pmns&baso           22 在胶原质母体中的由成纤维细胞(梭形细胞)组成的适当小的纤维化响应。界面处的巨噬细胞和occ巨细胞             在ePTFE表面的纤维化响应以及网状物内的持续的纤维化响应,并围绕单丝成分 氧化银涂覆的网状物试样1200nm 9 一至若干个大的mps层。纤维化叠层提示核的丢失。核增生。明显的gcs。 MF:mps的Dec nos网状物:稀疏的细胞纤维蛋白网状物。组织碎片。坏死碎片的病灶区 具有occ较大银颗粒的部分的明显gcs,连续的具有部分-可见(vis)表面的mps的薄层。  22 观察到代表性的纤维化响应。在有响应的巨噬细胞中观察到黑ppt(与可折射碎片相配)。在界面处的具有mps & gcs的可折射的碎片 在TFE表面的纤维化响应。响应中大量的baso/肥大细胞。观察到occ黑ppt(可折射碎片)。在界面处的具有mps & gcs的可折射碎片 在纤维化响应及TFE界面内,观察到与折射碎片相配的具有mps &gcs的黑ppt。      treatment group Implantation duration, days ePTFE // visceral surface ePTFE // mesh surface Silver Particle/Particle Observation Control group uncoated mesh 9 One to several mps layers; sscs 10+ layers with ncf MF: surrounded by mps with occ gcs and with ncf mesh: populated by mps with ncf; occ pmns & baso none twenty two Properly small fibrotic response consisting of fibroblasts (spindle cells) in the collagen matrix. Macrophages and occ giant cells at the interface Fibrillation response at the ePTFE surface and sustained fibrillation response within the mesh and surrounding monofilament components none Silver oxide coated mesh sample 1200nm 9 One to several large mps layers. Fibrotic stacks suggest loss of nuclei. Nuclear hyperplasia. Obvious gcs. MF: Dec nos network of mps: Sparse cellular fibrin network. Tissue fragments. Foci of necrotic debris Obvious gcs with portions of occ larger silver grains, continuous thin layer of mps with partially-visible (vis) surface. twenty two A representative fibrotic response was observed. Dark ppts (matched with refractable fragments) were observed in responding macrophages. Refractable fragments with mps & gcs at the interface Fibrillation response on TFE surface. A large number of baso/mast cells in response. Occ black ppt (refractive fragments) was observed. Refractable fragments with mps & gcs at the interface Black ppts with mps & gcs matching the refraction fragments were observed in the fibrosis response as well as within the TFE interface.

  氧化银涂覆网装物试样2200nm 9 一至若干层适度ncf的mps MF:由具有occ gcs的mps围绕//略微减少的网装物:适度ncf具有mps;明显的脉管响应 具有mps的freq Ag颗粒。大部分细胞内纤维化薄层(可见表面)-具有mps的部分  22 观察到代表性的纤维化响应。分散的具有黑ppt的mps(可折射碎片)和具有包含黑ppt的mps的薄层。由mps wo碎片排成行的TFE表面                 在TFE表面的纤维化响应。Occ分散的具有黑ppt的mps 具有网状物响应及内脏响应的具有mps的分散的ppt Silver oxide coated mesh sample 2200nm 9 One to several layers of mps with moderate ncf MF: surrounded by mps with occ gcs // slightly reduced mesh: moderate ncf with mps; pronounced vascular response freq Ag particles with mps. Mostly intracellular fibrotic lamina (visible surface) - section with mps twenty two A representative fibrotic response was observed. Scattered mps (refractive fragments) with black ppt and thin layers with mps containing black ppt. TFE surface lined by mps wo fragments Fibrillation response on TFE surface. Occ scattered mps with black ppt Scattered ppt with mps with mesh response and visceral response

表11中所用的缩写如下:The abbreviations used in Table 11 are as follows:

Occ    偶然的Occ accidental

PMSs   多形核细胞PMSs polymorphonuclear cells

Mps    粘多糖Mps mucopolysaccharide

SSCs   核形细胞SSCs nucleated cells

MF     超细纤维MF Microfiber

Baso   嗜碱性粒细胞Baso Basophils

Ncf    中性粒细胞趋化因子Ncf Neutrophil chemotactic factor

实施例8-具有可移动基体的阴极电弧沉积Example 8 - Cathodic arc deposition with movable substrate

本实施例表明了可移动基体是如何影响大颗粒尺寸,因而控制氧化银的释放的。This example demonstrates how a mobile matrix affects the large particle size, thereby controlling the release of silver oxide.

将基体(基体一)置于与靶标具有30英寸距离的可移动支持件上。将室内抽吸至5E-4 Torr的水平。用100amps及16伏特的电流引发电弧。将氧气以200 SCCM的速率引入室中。以每15秒一英寸的速度使基体更接近靶标。持续进行,直至基体与靶标相距8英寸。The substrate (substrate one) was placed on a movable support at a distance of 30 inches from the target. Pump the chamber to a level of 5E-4 Torr. The arc was initiated with a current of 100 amps and 16 volts. Oxygen was introduced into the chamber at a rate of 200 SCCM. Bring the substrate closer to the target at a rate of one inch every 15 seconds. Continue until the substrate is 8 inches from the target.

在比较性实施方案中,在相同的电流、电压、总时间及氧气流速下,将基体(基体二)置于相距靶30英寸的距离处。这一次,基体保持静止。In a comparative embodiment, the substrate (substrate two) was placed at a distance of 30 inches from the target under the same current, voltage, total time, and oxygen flow rate. This time, the substrate remains stationary.

初始的ZOI测试示出在24小时时间段内具有相同尺寸的圈。针对若干细菌实施板转移,结果在表12中示出。可看出,在沉积工艺中被移向靶标的基体相比保持静止的基体能在更长的时间段内表现出抗菌活性。Initial ZOI testing showed circles of the same size over a 24 hour period. Plate transfers were performed for several bacteria and the results are shown in Table 12. It can be seen that substrates that are moved towards the target during the deposition process exhibit antimicrobial activity for a longer period of time than substrates that remain stationary.

除ZOI测试之外,还利用SEM分析法检测两个基体的横截面。在样品一中,大颗粒的数量及尺寸随着薄膜的厚度而增大;即,有更少的且更小的大颗粒靠近基体,并且数目及尺寸随着薄膜厚度的增长而增大。相反地,试样二中的横截面具有很少的大颗粒并且是均匀的。In addition to ZOI testing, cross-sections of the two substrates were also examined using SEM analysis. In sample one, the number and size of large particles increased with film thickness; that is, there were fewer and smaller large particles close to the matrix, and the number and size increased with film thickness. In contrast, the cross section in sample two had few large particles and was uniform.

表12Table 12

第一天first day

Figure A200780010384D00341
Figure A200780010384D00341

Figure A200780010384D00351
Figure A200780010384D00351

Figure A200780010384D00361
Figure A200780010384D00361

实施例9-电弧控制Example 9 - Arc Control

本实施例说明了电弧控制器如何与所产生的大颗粒的尺寸及频率相关。在该实施例中,使得两个试样运行。首先,试样三,不具有电弧控制器,且将基体置于相距靶标12英寸的距离处。第二,试样四,具有电弧控制器,且也将基体置于相距靶标12英寸的距离处。将两个试样均放置于室中,对不同的运行实施不同的次数,并抽吸至5E-4Torr。按照对于所有电供应以100Amps开始来设置电弧。每个靶标具有两个供应源以得到200amps的起始总量。试样三在没有电弧控制器的情况下运行五分钟。试样四在优选的300赫兹电流转换速率下运行。This example illustrates how the arc controller is related to the size and frequency of the large particles produced. In this example, two samples were run. First, Sample Three, had no arc controller, and the substrate was placed at a distance of 12 inches from the target. The second, Sample Four, had an arc controller and also placed the substrate at a distance of 12 inches from the target. Both samples were placed in the chamber, performed different times for different runs, and pumped to 5E-4 Torr. The arc was set to start with 100 Amps for all electrical supplies. Each target had two supplies for a starting total of 200 amps. Sample three was run for five minutes without the arc controller. Sample four was run at the preferred 300 Hz current slew rate.

靶标上的转换总是保持在200amps,但是每个电源均会出现高低变化(ramped up and down),所以在任何时间,在供应源上的电流并不均等。这就迫使电弧在特定的时间移动特定的距离,从而控制大颗粒的密度及尺寸。The switching on the target is always kept at 200amps, but each power supply will be ramped up and down, so at any time, the current on the supply source is not equal. This forces the arc to travel a specific distance at a specific time, thereby controlling the density and size of the large particles.

在试样三和四上实施SEM横截面分析。可观察到,尽管薄膜贯穿其整个厚度是均匀的,相比较试样三,试样四具有更大的大颗粒尺寸及密度的平均值。试样三中的大颗粒平均尺寸约为一微米,密度为103/cm2。试样四中的大颗粒平均尺寸约为三微米,密度为104/cm2SEM cross-sectional analysis was performed on samples three and four. It can be observed that although the film is uniform throughout its thickness, sample 4 has a larger average value of macrograin size and density compared to sample 3. The large particles in sample three have an average size of about one micron and a density of 10 3 /cm 2 . The large particles in sample four have an average size of about three microns and a density of 10 4 /cm 2 .

实施例10-金属上的氧化银的体外测试Example 10 - In Vitro Testing of Silver Oxide on Metal

本实施例表明了在Ti-6-4及CoCrMo上的AgO涂层的有效性。利用常用方法清洗试样五和六,并将其置于真空室中并且与靶标相距12英寸的距离。将典型的氧化银涂层沉积在片上,并用三天的时间进行ZOI测试。试样五为Ti-6-4,试样六为CoCrMo。结果在表13中进行了总结。This example demonstrates the effectiveness of AgO coatings on Ti-6-4 and CoCrMo. Samples five and six were cleaned using conventional methods and placed in a vacuum chamber at a distance of 12 inches from the target. Typical silver oxide coatings were deposited on wafers and tested for ZOI over a period of three days. Sample five is Ti-6-4, and sample six is CoCrMo. The results are summarized in Table 13.

表13Table 13

第一天first day

Figure A200780010384D00371
Figure A200780010384D00371

Figure A200780010384D00381
Figure A200780010384D00381

尽管本发明已参照其具体的实施例进行了描述,本领域技术人员应当理解的是,在不违背本发明的真正精神和保护范围的情况下,可以作出各种变化及修改,以及等同替换方式,特别地,还要理解的是,由本领域的一个普通技术人员在不背离本发明的保护范围的情况下,每一个设计中的化学及制药细节可以具有细微差别,或修改。所有这些修改均应处于所附的权利要求书的范围之内。Although the present invention has been described with reference to its specific embodiments, those skilled in the art should understand that various changes, modifications, and equivalent replacements can be made without departing from the true spirit and protection scope of the present invention. In particular, it is to be understood that the chemical and pharmaceutical details of each design may have minor differences, or modifications, by one of ordinary skill in the art without departing from the scope of the invention. All such modifications are intended to come within the scope of the appended claims.

Claims (26)

1. cathode arc ion plasma deposition method that is used to prepare the antiseptic paint on matrix comprises:
Selected matrix is positioned between anode and the negative electrode target, and described target comprises ionizable metal;
The oxygen introducing is held in the vacuum chamber of described negative electrode target and described matrix, wherein, described chamber is pressurized to about 0.1mTorr to about 30mTorr;
Between described anode and described negative electrode target, produce arc-over, wherein, be fed to electric energy on the described electric arc alternatively by variable control, so that the preparation scope is at the particle of 1nm to 50 μ m; And
In arc discharge process, in a scheduled time under the temperature between about 25 ℃ to about 75 ℃, about 1 inch adjust to about 50 inches scope described matrix near or away from the motion of described target, with the thickness that has in deposition on the described matrix at about 50nm high-density, adhesivity antiseptic paint in about 5 mu m ranges extremely.
2. method according to claim 1, wherein, the described electric energy that is fed on the electric arc carries out external control by independent variable power supply or by at least two independently variable power supplies that are connected to described negative electrode target with opposite location.
3. method according to claim 2 wherein, in the process of deposition 100-200nm coating, is adjusted to about 12 volts extremely about 60 volts so that the electric current between 5 amperes to about 500 amperes to be provided with the described electric energy that is fed on the electric arc on described matrix.
4. method according to claim 1, wherein, described ionizable metal is the metal that is selected from the group of being made up of silver, gold, platinum, copper, tantalum, titanium, zirconium, hafnium and zinc.
5. method according to claim 4, wherein, described metal is a silver.
6. method according to claim 1, wherein, described matrix comprises metal.
7. method according to claim 6, wherein, described matrix is selected from by titanium, steel, chromium, zirconium, nickel, their alloy and the group formed of their combination.
8. method according to claim 1, wherein, described matrix comprises polymkeric substance or pottery.
9. method according to claim 8, wherein, described polymkeric substance is polypropylene, urethane, EPTFE, PTFE, polyimide, polyester, PEEK, UHMWPE or nylon or their combination.
10. method according to claim 9, wherein, described polymkeric substance is PEEK or polyethylene.
11. a high-adhesiveness Ag/AgO germ resistance film that is deposited on the metallic matrix, wherein, described Ag/AgO infiltrates the degree of depth that described matrix reaches about 10 nanometers.
12. a high-adhesiveness Ag/AgO germ resistance film that is deposited on the polymeric matrix, wherein, described Ag/AgO infiltrates the degree of depth that described surface reaches about 100 nanometers.
13. Ag/AgO germ resistance film according to claim 11, it deposits to and is selected from by in titanium, steel, chromium, zirconium, nickel, their combination and the metal of the group of alloy composition.
14. Ag/AgO germ resistance film according to claim 12, it deposits on the polymeric matrix that comprises the polymkeric substance that is selected from the group of being made up of polypropylene, urethane, EPTFE, PTFE, polyimide, polyester, PEEK, UHMWPE or nylon and their combination.
15. matrix according to claim 1, it comprises the device that is selected from the group of being made up of conduit, lobe, support and implant.
16. matrix according to claim 15, wherein, described device is a conduit.
17. matrix according to claim 15, wherein, described conduit, lobe, support and implant comprise polymkeric substance, metal, pottery or their combination.
18. matrix according to claim 16, wherein, described conduit comprises polymkeric substance.
19. matrix according to claim 18, wherein, described polymkeric substance is selected from by polypropylene, urethane, EPTFE, PTFE, polyimide, polyester, PEEK, UHMWPE, reaches the group that nylon is formed.
20. cathode arc ion plasma deposition method that is used for improving the anti-microbial activity of silver/silver suboxide ion plasma deposition film, comprise the distance of adjusting between matrix and the cathode arc target, and the monitoring quantity that deposits to silver in described film relevant with the distance of described matrix and described target, wherein, the reduction of the silver/silver suboxide ratio in the anti-microbial activity of the raising of described film and the described film is associated.
21. method according to claim 20 further comprises the particle size of adjusting arc speed and monitoring sedimentary silver/silver suboxide, wherein, the increase of macrobead number has improved the anti-microbial activity of described film.
22. coating by method preparation according to claim 21.
23., further comprise increasing depositing time to obtain required film thickness according to claim 20 or 21 described methods.
24. silver/silver suboxide germ resistance film that is deposited on metal, polymkeric substance or the ceramic surface, wherein, described silver/silver suboxide is embedded into described metallic surface reaches the degree of depth of about 10nm to about 10nm, described film has the thickness between about 5 μ m at about 50nm, and it can be after use reaches at least in time of 28 days and keep anti-microbial activity.
25. silver according to claim 24/silver suboxide germ resistance film, it deposits on the surface of metal, polymkeric substance or ceramic medical treatment device.
26. film according to claim 25, wherein, described medical treatment device is conduit, support, implant or lobe.
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101991876A (en) * 2009-08-14 2011-03-30 机械科学研究总院先进制造技术研究中心 Manufacture method of prosthesis with self-antibacterial action
TWI499683B (en) * 2011-11-21 2015-09-11 Ever Brite Technology Products Inc A method of forming an antibacterial film on the surface of an object by means of a cathodic arc method and a magnetron sputtering method
CN105343938A (en) * 2011-09-30 2016-02-24 先健科技(深圳)有限公司 Medical instrument
CN111744752A (en) * 2020-05-27 2020-10-09 河北复朗施纳米科技有限公司 Technological method for spraying antibacterial wear-resistant material on surface of intelligent lock
CN113636870A (en) * 2021-07-13 2021-11-12 广东富强陶瓷有限公司 Production process of antibacterial wear-resistant anti-skid glazed ceramic tile
CN116115836A (en) * 2023-02-02 2023-05-16 扬州钛博医疗器械科技有限公司 A surface coating for improving the antibacterial performance of pure titanium or titanium alloy surface, preparation method and application
CN116180492A (en) * 2023-03-06 2023-05-30 江苏卫星新材料股份有限公司 Silver ion antibacterial paper and preparation method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101991876A (en) * 2009-08-14 2011-03-30 机械科学研究总院先进制造技术研究中心 Manufacture method of prosthesis with self-antibacterial action
CN105343938A (en) * 2011-09-30 2016-02-24 先健科技(深圳)有限公司 Medical instrument
TWI499683B (en) * 2011-11-21 2015-09-11 Ever Brite Technology Products Inc A method of forming an antibacterial film on the surface of an object by means of a cathodic arc method and a magnetron sputtering method
CN111744752A (en) * 2020-05-27 2020-10-09 河北复朗施纳米科技有限公司 Technological method for spraying antibacterial wear-resistant material on surface of intelligent lock
CN113636870A (en) * 2021-07-13 2021-11-12 广东富强陶瓷有限公司 Production process of antibacterial wear-resistant anti-skid glazed ceramic tile
CN116115836A (en) * 2023-02-02 2023-05-16 扬州钛博医疗器械科技有限公司 A surface coating for improving the antibacterial performance of pure titanium or titanium alloy surface, preparation method and application
CN116180492A (en) * 2023-03-06 2023-05-30 江苏卫星新材料股份有限公司 Silver ion antibacterial paper and preparation method thereof
CN116180492B (en) * 2023-03-06 2024-02-23 江苏卫星新材料股份有限公司 Silver ion antibacterial paper and preparation method thereof

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