CN105140375A - Substrate and Light Emitting Diode Device - Google Patents
Substrate and Light Emitting Diode Device Download PDFInfo
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- CN105140375A CN105140375A CN201510661338.6A CN201510661338A CN105140375A CN 105140375 A CN105140375 A CN 105140375A CN 201510661338 A CN201510661338 A CN 201510661338A CN 105140375 A CN105140375 A CN 105140375A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
- H10H20/841—Reflective coatings, e.g. dielectric Bragg reflectors
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- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/49105—Connecting at different heights
- H01L2224/49107—Connecting at different heights on the semiconductor or solid-state body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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Abstract
本发明提供一种基板以及发光二极管装置。基板包括基底、金属反射层以及抗氧化层。基底具有相对的第一表面与第二表面。金属反射层配置于基底的第一表面上。抗氧化层覆盖金属反射层。金属反射层位于抗氧化层与基底的第一表面之间。至少一发光二极管芯片适于共晶接合于基板上。一种发光二极管装置亦被提出,其包括上述基板以及配置基板上的发光二极管芯片,其在高温制程中具有良好的良率。
The present invention provides a substrate and a light-emitting diode device. The substrate includes a substrate, a metal reflective layer and an anti-oxidation layer. The substrate has a first surface and a second surface opposite to each other. The metal reflective layer is disposed on the first surface of the substrate. The anti-oxidation layer covers the metal reflective layer. The metal reflective layer is located between the anti-oxidation layer and the first surface of the substrate. At least one light-emitting diode chip is suitable for eutectic bonding on the substrate. A light-emitting diode device is also proposed, which includes the above-mentioned substrate and the light-emitting diode chip disposed on the substrate, and has a good yield in a high-temperature process.
Description
本发明是2011年09月29日所提出的申请号为201110295442.X、发明名称为《基板》的发明专利申请的分案申请。The present invention is a divisional application of the invention patent application with the application number 201110295442.X and the invention title "Substrate" filed on September 29, 2011.
技术领域technical field
本发明涉及一种基板,尤其涉及一种适于与发光二极管芯片共晶接合的基板以及发光二极管装置。The invention relates to a substrate, in particular to a substrate suitable for eutectic bonding with a light emitting diode chip and a light emitting diode device.
背景技术Background technique
在环保意识高涨的今日,人们除了积极地寻找再生能源之外,亦不断地投入节能产品的开发。以照明产品为例,一种节能环保的光源,即发光二极管(lightemittingdiode,LED)芯片,已被开发出来。发光二极管芯片藉由在P-N接面中重组电子与电洞来发光。相较于传统光源,发光二极管芯片具有低消耗功率(powerconsumption)及长寿命等优点,因此已被广泛地运用在各领域中。Today, with the rising awareness of environmental protection, in addition to actively looking for renewable energy, people are also constantly investing in the development of energy-saving products. Taking lighting products as an example, an energy-saving and environment-friendly light source, that is, a light emitting diode (LED) chip, has been developed. LED chips emit light by recombining electrons and holes in the P-N junction. Compared with traditional light sources, LED chips have the advantages of low power consumption and long life, and thus have been widely used in various fields.
发光二极管芯片是一种电流驱动元件,其需藉由适当的驱动电路驱动之。一般而言,发光二极管芯片会封装于具有驱动电路的基板上。发光二极管芯片封装于基板上的技术主要可分为打线技术(wirebonding)与覆晶(flip-chip)技术。打线技术是将发光二极管芯片利用银胶或是共晶技术将发光二极管芯片背面固定于基板上,再利用打线的方式让发光二极管芯片利用金属线与基板上的连结点连接。覆晶技术,也称倒晶封装法,是将发光二极管芯片正面与基板利用金球或共晶技术固定于基板上。上述共晶技术是将发光二极管芯片正/背面蒸镀或溅镀上一层共晶焊料(eutecticsolder)。接着,在基板的焊垫上镀上一层黄金。然后,将基板置于加热板上加热至共晶焊料的熔点之后,再将发光二极管芯片压合于焊垫上并使焊垫上的黄金与发光二极管芯片上的共晶焊料结合在一起。之后,将基板的温度下降至共晶焊料的熔点之下,而使共晶焊料固化,即完成固晶(diebonding)作业。然而,为增加发光二极管芯片的光利用效率,现有基板的最外层多设有金属反射层。当发光二极管芯片以上述的共晶技术进行封装时,基板的金属反射层会曝露在高温的环境中,而易与外界气体作用,进而发生氧化的问题。The light-emitting diode chip is a current-driven element, which needs to be driven by an appropriate driving circuit. Generally, LED chips are packaged on a substrate with a driving circuit. The technology of LED chip packaging on the substrate can be mainly divided into wire bonding technology and flip-chip technology. The wire bonding technology is to fix the back of the LED chip on the substrate using silver glue or eutectic technology, and then use the wire bonding method to connect the LED chip to the connection point on the substrate using metal wires. Flip-chip technology, also known as flip-chip packaging method, is to fix the front surface of the light-emitting diode chip and the substrate on the substrate using gold balls or eutectic technology. The aforementioned eutectic technology is to evaporate or sputter a layer of eutectic solder on the front/back of the LED chip. Next, a layer of gold is plated on the pads of the substrate. Then, the substrate is placed on the heating plate and heated to the melting point of the eutectic solder, and then the light-emitting diode chip is pressed onto the welding pad to combine the gold on the welding pad with the eutectic solder on the light-emitting diode chip. Afterwards, the temperature of the substrate is lowered below the melting point of the eutectic solder, so that the eutectic solder is solidified, that is, the diebonding operation is completed. However, in order to increase the light utilization efficiency of the light-emitting diode chip, the outermost layer of the existing substrate is usually provided with a metal reflective layer. When the light-emitting diode chip is packaged by the above-mentioned eutectic technology, the metal reflective layer of the substrate will be exposed to a high-temperature environment, and it is easy to interact with the outside gas, thereby causing oxidation.
发明内容Contents of the invention
本发明提供一种基板,其可改善高温制程中金属反射层易被氧化的问题。The invention provides a substrate, which can improve the problem that the metal reflective layer is easily oxidized in the high-temperature process.
本发明提供一种发光二极管,其在高温制程中具有良好的良率。The invention provides a light emitting diode with good yield rate in high temperature process.
本发明的其他目的和优点可以从本发明所揭示的技术特征中得到进一步的了解。Other purposes and advantages of the present invention can be further understood from the technical features disclosed in the present invention.
本发明的实施例的发光二极管装置包括基板以及配置于基板上的发光二极管芯片。基板包括基底、金属反射层以及抗氧化层。基板具有相对的一第一表面与一第二表面。金属反射层配置于基底的第一表面上且具有一第一线路结构以及与第一线路结构电性连接的多个第一接垫。抗氧化层覆盖金属反射层且暴露出这些第一接垫,而金属反射层位于抗氧化层与基底的第一表面之间。金属反射层暴露出部分的第一表面,抗氧化层覆盖且直接地连接至被金属反射层暴露出的部分的第一表面。发光二极管芯片以覆晶方式或以打线方式透过这些第一接垫与第一线路结构电性连接。The light emitting diode device of the embodiment of the present invention includes a substrate and a light emitting diode chip disposed on the substrate. The substrate includes a base, a metal reflection layer and an anti-oxidation layer. The substrate has a first surface and a second surface opposite to each other. The metal reflective layer is disposed on the first surface of the substrate and has a first circuit structure and a plurality of first pads electrically connected to the first circuit structure. The anti-oxidation layer covers the metal reflection layer and exposes the first pads, and the metal reflection layer is located between the anti-oxidation layer and the first surface of the substrate. The metal reflective layer exposes a part of the first surface, and the anti-oxidation layer covers and is directly connected to the part of the first surface exposed by the metal reflective layer. The light emitting diode chip is electrically connected to the first circuit structure through the first pads by flip-chip or wire bonding.
本发明的实施例的发光二极管装置包括基板以及配置于基板上的发光二极管芯片。基板包括、金属反射层以及抗氧化层。基底具有相对的一第一表面与一第二表面。金属反射层配置于基底的第一表面上。抗氧化层覆盖金属反射层,而金属反射层位于抗氧化层与基底的第一表面之间。金属反射层具有多个第一接垫,抗氧化层暴露出这些第一接垫。金属反射层暴露出部分的第一表面,抗氧化层覆盖且直接地连接至被金属反射层暴露出的部分的第一表面。发光二极管芯片以覆晶方式或以打线方式与这些第一接垫电性连接。The light emitting diode device of the embodiment of the present invention includes a substrate and a light emitting diode chip disposed on the substrate. The substrate includes a metal reflective layer and an anti-oxidation layer. The base has a first surface and a second surface opposite to each other. The metal reflective layer is configured on the first surface of the base. The anti-oxidation layer covers the metal reflection layer, and the metal reflection layer is located between the anti-oxidation layer and the first surface of the substrate. The metal reflective layer has a plurality of first pads, and the anti-oxidation layer exposes these first pads. The metal reflective layer exposes a part of the first surface, and the anti-oxidation layer covers and is directly connected to the part of the first surface exposed by the metal reflective layer. The LED chips are electrically connected to the first pads by flip-chip or wire bonding.
本发明的实施例的发光二极管装置包括基板以及配置在基板的发光二极管。基板包括基底、导线层以及反射层。基底具有第一表面。导线层配置于基底上并暴露出部分第一表面,导线层具有多个接垫。反射层配置于基底上,且反射层覆盖在被导线层所暴露出的部分的第一表面上并暴露出这些接垫且与导线层电性绝缘。发光二极管电性连接这些接垫。A light emitting diode device according to an embodiment of the present invention includes a substrate and a light emitting diode disposed on the substrate. The substrate includes a base, a wire layer and a reflective layer. The base has a first surface. The wire layer is configured on the base and exposes part of the first surface, and the wire layer has a plurality of pads. The reflective layer is disposed on the base, and the reflective layer covers the first surface of the portion exposed by the wire layer, exposes the pads, and is electrically insulated from the wire layer. The LEDs are electrically connected to these pads.
本发明的实施例的发光二极管装置包括基板以及发光二极管芯片。基板包括基底、导线层以及反射层。基底具有第一表面。导线层配置于基底上并暴露出部分第一表面,且导线层具有线路结构及与线路结构电性连接的多个接垫。反射层配置于基底上,且反射层覆盖导线层并暴露出这些接垫且与导线层电性绝缘,且反射层覆盖在被导线层所暴露出的部分的第一表面上。发光二极管芯片与这些接垫电性连接。A light emitting diode device according to an embodiment of the present invention includes a substrate and a light emitting diode chip. The substrate includes a base, a wire layer and a reflective layer. The base has a first surface. The wire layer is disposed on the base and exposes part of the first surface, and the wire layer has a circuit structure and a plurality of pads electrically connected to the circuit structure. The reflective layer is disposed on the base, and the reflective layer covers the wire layer and exposes the pads and is electrically insulated from the wire layer, and the reflective layer covers the first surface of the part exposed by the wire layer. The LED chips are electrically connected to the pads.
本发明的实施例的适于供发光二极管芯片配置的基板包括基底、导线层以及反射层。基底具有第一表面及第二表面。具有多个接垫的导线层配置于基底上并暴露出部分第一表面。反射层配置于基底上,反射层覆盖在被导线层所暴露出的部分的第一表面上并暴露出这些接垫且与导线层绝缘。这些接垫适于与发光二极管电性连接。According to the embodiment of the present invention, the substrate suitable for disposing the LED chip includes a base, a wire layer and a reflective layer. The base has a first surface and a second surface. The wiring layer with a plurality of pads is disposed on the base and exposes part of the first surface. The reflective layer is disposed on the base, the reflective layer covers the first surface of the part exposed by the wire layer, exposes the pads and is insulated from the wire layer. These pads are suitable for electrical connection with the LEDs.
本发明的实施例的适于供至少一发光二极管芯片配置的基板包括基底、导线层以及反射层。基底具有第一表面及第二表面。导线层配置于基底上并暴露出部分第一表面,且导线层具有线路结构及与线路结构电性连接的多个接垫。反射层配置于基底上,反射层覆盖导线层并暴露出这些接垫,反射层与导线层绝缘并覆盖在被导线层所暴露出的部分的第一表面上。这些接垫适于与发光二极管电性连接。The substrate suitable for at least one light emitting diode chip according to the embodiment of the present invention includes a base, a wire layer and a reflective layer. The base has a first surface and a second surface. The wire layer is disposed on the base and exposes part of the first surface, and the wire layer has a circuit structure and a plurality of pads electrically connected to the circuit structure. The reflective layer is disposed on the base, the reflective layer covers the wire layer and exposes the pads, the reflective layer is insulated from the wire layer and covers the first surface of the part exposed by the wire layer. These pads are suitable for electrical connection with the LEDs.
本发明的实施例的发光二极管装置包括基板以及发光二极管。基板包括基底、导线层以及绝缘层。基底具有第一表面,导线层配置于基底上并暴露出部分第一表面。导线层具有多个接垫,配置在基底上的绝缘层覆盖在被导线层所暴露出的部分的第一表面上并暴露出这些接垫。发光二极管配置在基板且与这些接垫电性连接。A light emitting diode device according to an embodiment of the present invention includes a substrate and a light emitting diode. The substrate includes a base, a wire layer and an insulating layer. The base has a first surface, and the wiring layer is disposed on the base and exposes a part of the first surface. The wire layer has a plurality of pads, and the insulating layer disposed on the base covers the first surface of the part exposed by the wire layer and exposes the pads. The LEDs are disposed on the substrate and electrically connected to the pads.
本发明的实施例的发光二极管装置包括基板以及发光二极管芯片。基板包括基底、导线层以及绝缘层。基底具有一第一表面,导线层配置于基底上并暴露出部分第一表面。导线层具有一线路结构及与线路结构电性连接的多个接垫,配置在基底上的绝缘层覆盖导线层并暴露出这些接垫以及覆盖在被导线层所暴露出的部分的第一表面上。发光二极管芯片配置在基板上且与这些接垫电性连接。A light emitting diode device according to an embodiment of the present invention includes a substrate and a light emitting diode chip. The substrate includes a base, a wire layer and an insulating layer. The base has a first surface, and the wire layer is arranged on the base and exposes a part of the first surface. The wiring layer has a wiring structure and a plurality of pads electrically connected to the wiring structure. The insulating layer disposed on the base covers the wiring layer and exposes the pads and covers the first surface of the part exposed by the wiring layer. superior. The LED chips are disposed on the substrate and electrically connected to the pads.
本发明的实施例的适于供发光二极管芯片配置的基板包括基底、导线层以及绝缘层。基底具有第一表面及第二表面。导线层配置于基底上并暴露出部分第一表面。导线层具有多个接垫,配置於基底上的绝缘层覆盖在被导线层所暴露出的部分的第一表面上且暴露出这些接垫。这些接垫适于与发光二极管电性连接。According to the embodiment of the present invention, the substrate suitable for disposing the LED chip includes a base, a wire layer and an insulating layer. The base has a first surface and a second surface. The wire layer is configured on the base and exposes part of the first surface. The wire layer has a plurality of pads, and the insulating layer disposed on the base covers the first surface of the portion exposed by the wire layer and exposes the pads. These pads are suitable for electrical connection with the LEDs.
本发明的实施例的适于供至少一发光二极管芯片配置的基板包括基底、导线层以及绝缘层。基底具有第一表面及第二表面。导线层配置于基底上并暴露出部分第一表面。导线层具有一线路结构及与线路结构电性连接的多个接垫,配置于基底上的绝缘层覆盖导线层并暴露出这些接垫以及覆盖在被导线层所暴露出的部分的第一表面上。这些接垫适于与发光二极管电性连接。The substrate suitable for at least one light emitting diode chip according to the embodiment of the present invention includes a base, a wire layer and an insulating layer. The base has a first surface and a second surface. The wire layer is configured on the base and exposes part of the first surface. The wiring layer has a wiring structure and a plurality of pads electrically connected to the wiring structure. The insulating layer disposed on the base covers the wiring layer and exposes the pads and covers the first surface of the part exposed by the wiring layer. superior. These pads are suitable for electrical connection with the LEDs.
基于上述,本发明一实施例的基板藉由在金属反射层上配置抗氧化层,而使得金属反射层在高温制程中不易发生氧化的问题。本发明一实施例的抗氧化层除了具有防止金属反射层氧化的功能外,同时还兼具反射光束的功效。Based on the above, the substrate according to one embodiment of the present invention makes the metal reflective layer less likely to be oxidized during the high temperature process by disposing the anti-oxidation layer on the metal reflective layer. In an embodiment of the present invention, the anti-oxidation layer not only has the function of preventing oxidation of the metal reflective layer, but also has the function of reflecting light beams.
为让本发明的上述特征和优点能更明显易懂,下文特举实施例,并配合附图作详细说明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail with reference to the accompanying drawings.
附图说明Description of drawings
图1为本发明第一实施例的基板的剖面示意图;1 is a schematic cross-sectional view of a substrate according to a first embodiment of the present invention;
图2为图1的抗氧化层的放大示意图;Figure 2 is an enlarged schematic view of the anti-oxidation layer of Figure 1;
图3示出本发明第一实施例的基板与另一种形式的发光二极管芯片接合的情形;Fig. 3 shows the situation that the substrate of the first embodiment of the present invention is bonded to another form of LED chip;
图4为本发明第二实施例的基板的剖面示意图;4 is a schematic cross-sectional view of a substrate according to a second embodiment of the present invention;
图5示出本发明第二实施例的基板与另一种形式的发光二极管芯片接合的情形。FIG. 5 shows the bonding situation of the substrate of the second embodiment of the present invention and another type of LED chip.
附图标记说明:Explanation of reference signs:
100、100A:基板;100, 100A: Substrate;
102:基底;102: base;
102a、102b:基底的表面;102a, 102b: the surface of the substrate;
104:金属反射层;104: metal reflective layer;
104a、108a:线路结构;104a, 108a: line structure;
104b、108b:接垫;104b, 108b: pads;
106:抗氧化层;106: anti-oxidation layer;
106a:高折射率层;106a: high refractive index layer;
106b:低折射率层;106b: low refractive index layer;
108:导电层;108: conductive layer;
110:绝缘层;110: insulating layer;
200:覆晶式发光二极管芯片;200: flip-chip light-emitting diode chip;
202:第一型掺杂半导体层;202: a first type doped semiconductor layer;
204:第二型掺杂半导体层;204: the second type doped semiconductor layer;
206:发光层;206: light-emitting layer;
208、210:电极;208, 210: electrodes;
300:固晶结构;300: solid crystal structure;
400:打线式发光二极管芯片;400: wire-bonded light-emitting diode chip;
400a:背面;400a: back;
410:导线;410: wire;
D1、D2:厚度;D1, D2: thickness;
L:光束。L: light beam.
具体实施方式Detailed ways
第一实施例first embodiment
图1为本发明第一实施例的基板的剖面示意图。请参照图1,至少一覆晶(flipchip)式发光二极管芯片200适于配置于本实施例的基板100上。在图1中显示一个覆晶式发光二极管芯片200作为代表,然而本发明的基板并不限制其可承载的覆晶式发光二极管芯片的数量。换言之,本发明的基板100可承载多个覆晶式发光二极管芯片200。在本实施例中,覆晶(flipchip)式发光二极管芯片200包括第一型掺杂半导体层202、第二型掺杂半导体层204、发光层206、第一电极208以及第二电极210。发光层206配置于第一型掺杂半导体层202与第二型掺杂半导体层204之间。第一电极208与第二电极210分别配置于第一型掺杂半导体层202与第二型掺杂半导体层204上。第一电极208与第二电极210面向基板100,并通过固晶结构300与基板100连接。FIG. 1 is a schematic cross-sectional view of a substrate according to a first embodiment of the present invention. Referring to FIG. 1 , at least one flip chip type light emitting diode chip 200 is suitable to be disposed on the substrate 100 of this embodiment. A flip-chip LED chip 200 is shown as a representative in FIG. 1 , however, the substrate of the present invention does not limit the number of flip-chip LED chips it can carry. In other words, the substrate 100 of the present invention can carry a plurality of flip-chip LED chips 200 . In this embodiment, the flip chip LED chip 200 includes a first type doped semiconductor layer 202 , a second type doped semiconductor layer 204 , a light emitting layer 206 , a first electrode 208 and a second electrode 210 . The light emitting layer 206 is disposed between the first type doped semiconductor layer 202 and the second type doped semiconductor layer 204 . The first electrode 208 and the second electrode 210 are respectively disposed on the first-type doped semiconductor layer 202 and the second-type doped semiconductor layer 204 . The first electrode 208 and the second electrode 210 face the substrate 100 and are connected to the substrate 100 through the die-bonding structure 300 .
在本实施例中,第一型掺杂半导体层202例如为N型半导体层,而第二型掺杂半导体层204例如为P型半导体层。发光层206例如为氮化镓(galliumnitride,GaN)层与氮化铟镓(indiumgalliumnitride,InGaN)层交替堆叠的多重量子阱结构(MultipleQuantumWell,MQW)。第一电极208与第二电极210的材质为导电材料可选自于金、银、铂、铜、铬、铝、其他导电材料及其组合,但本发明不以上述为限。In this embodiment, the first-type doped semiconductor layer 202 is, for example, an N-type semiconductor layer, and the second-type doped semiconductor layer 204 is, for example, a P-type semiconductor layer. The light emitting layer 206 is, for example, a multiple quantum well structure (Multiple Quantum Well, MQW) in which gallium nitride (GaN) layers and indium gallium nitride (InGaN) layers are stacked alternately. The materials of the first electrode 208 and the second electrode 210 are conductive materials, which can be selected from gold, silver, platinum, copper, chromium, aluminum, other conductive materials and combinations thereof, but the present invention is not limited thereto.
本实施例的基板100包括基底102、金属反射层104以及抗氧化层106。基底102具有相对的第一表面102a与第二表面102b。在本实施例中,第一表面102a的粗糙度(roughness)可小于0.3微米,以使金属反射层104可平整地铺设于第一表面102a上进而达到良好的的反射功能。值得一提的是,当第一表面102a的粗糙度越小时,金属反射层104的反射效果越佳。举例而言,当第一表面102a的粗糙度达到0.01微米以下时,金属反射层104则可呈现镜面反射的效果。在本实施例中,基底102的材质可为陶瓷(ceramic)、蓝宝石(sapphire)、硅(Si)或碳化硅(SiC),但本发明不以上述为限。The substrate 100 of this embodiment includes a base 102 , a metal reflective layer 104 and an anti-oxidation layer 106 . The base 102 has a first surface 102a and a second surface 102b opposite to each other. In this embodiment, the roughness of the first surface 102a may be less than 0.3 microns, so that the metal reflective layer 104 can be evenly laid on the first surface 102a to achieve a good reflective function. It is worth mentioning that when the roughness of the first surface 102a is smaller, the reflective effect of the metal reflective layer 104 is better. For example, when the roughness of the first surface 102a is less than 0.01 micron, the metal reflective layer 104 can exhibit a specular reflection effect. In this embodiment, the material of the substrate 102 may be ceramic, sapphire, silicon (Si) or silicon carbide (SiC), but the present invention is not limited thereto.
本实施例的金属反射层104配置于基底102的第一表面102a上。在本实施例中,金属反射层104除了可反射覆晶式发光二极管芯片200所发出的部分光束L而使其远离基底102之外,金属反射层104本身亦可为线路层。详言之,本实施例的金属反射层104可具有线路结构104a以及与线路结构104a连接的多个接垫104b,其中接垫104b被抗氧化层106所曝露。覆晶式发光二极管芯片200可通过接垫104b与线路结构104a电性连接。在本实施例中,金属反射层104对于覆晶式发光二极管芯片200所发出的部分光束L的反射率高于90%,其材质可选自于银、铝、金、铜或其组合。The metal reflective layer 104 of this embodiment is disposed on the first surface 102 a of the substrate 102 . In this embodiment, the metal reflective layer 104 can not only reflect part of the light beam L emitted by the flip-chip LED chip 200 so as to keep it away from the substrate 102 , but the metal reflective layer 104 itself can also be a circuit layer. In detail, the metal reflective layer 104 of this embodiment may have a circuit structure 104 a and a plurality of pads 104 b connected to the circuit structure 104 a, wherein the pads 104 b are exposed by the anti-oxidation layer 106 . The flip-chip LED chip 200 can be electrically connected to the circuit structure 104a through the pad 104b. In this embodiment, the metal reflective layer 104 has a reflectivity higher than 90% for the part of the light beam L emitted by the flip-chip LED chip 200 , and its material can be selected from silver, aluminum, gold, copper or a combination thereof.
本实施例的抗氧化层106覆盖金属反射层104,而金属反射层104位于抗氧化层106与基底102的第一表面102a之间。在本实施例中,抗氧化层106的材质可选自于硅(Si)、五氧化二钽(Ta2O5)、二氧化钛(TiO2)、五氧化三钛(Ti3O5)、五氧化二铌(Nb2O5)、二氧化硅(SiO2)、氟化镁(MgF2)或其组合。值得一提的是,由于本实施例的抗氧化层106覆盖了金属反射层104,因此当覆晶式发光二极管芯片200以共晶制程(制程温度约摄氏280度)与基板100接合时,金属反射层104不易与外界气体接触而发生氧化或迁移的问题。如此一来,在共晶制程完成后,金属反射层104便可保有原本的良好的反射特性,进而提高覆晶式发光二极管芯片200的光利用效率。In this embodiment, the anti-oxidation layer 106 covers the metal reflective layer 104 , and the metal reflective layer 104 is located between the anti-oxidation layer 106 and the first surface 102 a of the substrate 102 . In this embodiment, the material of the anti-oxidation layer 106 can be selected from silicon (Si), tantalum pentoxide (Ta2O5), titanium dioxide (TiO2), trititanium pentoxide (Ti3O5), niobium pentoxide (Nb2O5), Silicon dioxide (SiO2), magnesium fluoride (MgF2), or combinations thereof. It is worth mentioning that since the anti-oxidation layer 106 of this embodiment covers the metal reflective layer 104, when the flip-chip LED chip 200 is bonded to the substrate 100 by a eutectic process (the process temperature is about 280 degrees Celsius), the metal The reflective layer 104 is not easy to be oxidized or migrated due to contact with outside air. In this way, after the eutectic process is completed, the metal reflective layer 104 can maintain the original good reflective properties, thereby improving the light utilization efficiency of the flip-chip LED chip 200 .
值得特别注意的是,本实施例的抗氧化层106除了具有防止金属反射层氧化的功能外,同时还兼具反射光束的功效。覆晶式发光二极管芯片200所发出的部分光束L可能会朝向往基板100的方向传递,而无法被使用者所利用。然而,本实施例的抗氧化层106反射光束L,而使光束L往远离基板100的方向行进,进而提高覆晶式发光二极管芯片200的光利用效率。具体而言,相较于现有技术中仅具金属反射层的基板,本实施例的抗氧化层106可将基板100的反射率由90%提升至98%以上。It is worth noting that the anti-oxidation layer 106 in this embodiment not only has the function of preventing oxidation of the metal reflective layer, but also has the function of reflecting light beams. Part of the light beam L emitted by the flip-chip LED chip 200 may be transmitted towards the direction of the substrate 100 and cannot be utilized by the user. However, the anti-oxidation layer 106 of the present embodiment reflects the light beam L so that the light beam L travels away from the substrate 100 , thereby improving the light utilization efficiency of the flip-chip LED chip 200 . Specifically, compared with the prior art substrate with only a metal reflective layer, the anti-oxidation layer 106 of this embodiment can increase the reflectivity of the substrate 100 from 90% to over 98%.
图2为图1的抗氧化层的放大示意图。请参照图2,举例而言,本实施例的抗氧化层106可为分散式布拉格反射层(distributedBraggreflector,DBR)。更进一步地说,本实施例的抗氧化层106包括多个高折射率层106a以及多个低折射率层106b,其中高折射率层106a与低折射率层106b可交替堆叠,每一高折射率层106a或低折射率层106b的光穿透度均高于92%。在本实施例中,高折射率层106a的折射率可大于或等于2,而低折射率层106b的折射率可小于或等于1.7。高折射率层106a的材料是可选自于硅(Si)、五氧化二钽(Ta2O5)、二氧化钛(TiO2)、五氧化三钛(Ti3O5)或五氧化二铌(Nb2O5),而低折射率层106b的材料可选自于二氧化硅(SiO2)或氟化镁(MgF2)。另外,若覆晶式发光二极管芯片200所发出的光束L的中心波长为λ,则每一高折射率层106a的厚度D1以及每一低折射率层106b的厚度D2可设计为λ/4,而使本实施的抗氧化层106的反射效果佳。但本发明不以上述为限,在其他实施例中,抗氧化层106亦可是单一材质的抗氧化层,或采用其他适当的结构。FIG. 2 is an enlarged schematic view of the anti-oxidation layer in FIG. 1 . Please refer to FIG. 2 , for example, the anti-oxidation layer 106 of this embodiment may be a distributed Bragg reflector (distributed Bragg reflector, DBR). Furthermore, the anti-oxidation layer 106 of this embodiment includes a plurality of high-refractive index layers 106a and a plurality of low-refractive-index layers 106b, wherein the high-refractive-index layers 106a and the low-refractive-index layers 106b can be stacked alternately, and each high-refractive index layer The light transmittance of the index layer 106a or the low index layer 106b is higher than 92%. In this embodiment, the refractive index of the high refractive index layer 106a may be greater than or equal to 2, and the refractive index of the low refractive index layer 106b may be less than or equal to 1.7. The material of the high refractive index layer 106a can be selected from silicon (Si), tantalum pentoxide (Ta2O5), titanium dioxide (TiO2), trititanium pentoxide (Ti3O5) or niobium pentoxide (Nb2O5), and the low refractive index The material of layer 106b can be selected from silicon dioxide (SiO2) or magnesium fluoride (MgF2). In addition, if the center wavelength of the light beam L emitted by the flip-chip LED chip 200 is λ, the thickness D1 of each high refractive index layer 106a and the thickness D2 of each low refractive index layer 106b can be designed as λ/4, Therefore, the reflection effect of the anti-oxidation layer 106 in this embodiment is improved. However, the present invention is not limited to the above. In other embodiments, the anti-oxidation layer 106 can also be an anti-oxidation layer of a single material, or adopt other appropriate structures.
值得一提的是,图1中是以覆晶式发光二极管芯片200与本实施例的基板100接合为示例。但,本发明并不特别限定与基板接合的发光二极管芯片的种类。图3示出本发明第一实施例的基板与另一种形式的发光二极管芯片接合的情形。请参照图3,举例而言,本实施例的基板100亦可与打线式(wirebonding)发光二极管芯片400接合。打线式发光二极管芯片400可通过导线410(材质例如为金属)与金属反射层104的接垫104b与金属反射层104的线路结构104a电性连接。另一方面,打线式发光二极管芯片400的背面400a可通过固晶结构300与抗氧化层106连接,进而使打线式发光二极管芯片400固定在基板100上。It is worth mentioning that, in FIG. 1 , the flip-chip LED chip 200 is bonded to the substrate 100 of this embodiment as an example. However, the present invention does not particularly limit the type of the light emitting diode chip bonded to the substrate. FIG. 3 shows the bonding situation of the substrate of the first embodiment of the present invention and another type of LED chip. Please refer to FIG. 3 , for example, the substrate 100 of this embodiment may also be bonded to a wirebonding LED chip 400 . The wire-bonded LED chip 400 can be electrically connected to the pad 104b of the metal reflective layer 104 and the circuit structure 104a of the metal reflective layer 104 through a wire 410 (material such as metal). On the other hand, the back surface 400 a of the wire-bonded LED chip 400 can be connected to the anti-oxidation layer 106 through the die-bonding structure 300 , so that the wire-bonded LED chip 400 is fixed on the substrate 100 .
第二实施例second embodiment
图4为本发明第二实施例的基板的剖面示意图。请参照图4,本实施例的基板100A与第一实施例的基板100类似。因此与图1相同的元件以相同的符号表示。两者相异之处仅在于本实施例的线路结构与接垫并非制作在金属反射层104中,而是制作于位于第一表面102a与金属反射层104之间的导电层108中。以下就两者相异之处做说明,相同之处便不再重述。FIG. 4 is a schematic cross-sectional view of a substrate according to a second embodiment of the present invention. Referring to FIG. 4 , the substrate 100A of this embodiment is similar to the substrate 100 of the first embodiment. The same elements as in FIG. 1 are therefore denoted by the same symbols. The difference between the two is only that the circuit structure and the pads in this embodiment are not fabricated in the metal reflective layer 104 , but are fabricated in the conductive layer 108 between the first surface 102 a and the metal reflective layer 104 . The differences between the two are described below, and the similarities will not be repeated.
请参照图4,至少一覆晶式发光二极管芯片200适于配置于本实施例的基板100A上。本实施例的基板100A包括基底102、金属反射层104以及抗氧化层106。基底102具有相对的第一表面102a与第二表面102b。金属反射层104配置于基底102的第一表面102a上。抗氧化层106覆盖金属反射层104,而金属反射层104位于抗氧化层106与基底102的第一表面102a之间。Referring to FIG. 4 , at least one flip-chip LED chip 200 is suitable to be disposed on the substrate 100A of this embodiment. The substrate 100A of this embodiment includes a base 102 , a metal reflective layer 104 and an anti-oxidation layer 106 . The base 102 has a first surface 102a and a second surface 102b opposite to each other. The metal reflective layer 104 is disposed on the first surface 102 a of the substrate 102 . The anti-oxidation layer 106 covers the metal reflective layer 104 , and the metal reflective layer 104 is located between the anti-oxidation layer 106 and the first surface 102 a of the substrate 102 .
与第一实施例不同的是,本实施例的基板100A可进一包括导电层108。本实施例的导电层108配置于基底102的第一表面102a与金属反射层104之间。此外,本实施例的基板100A可进一包括绝缘层110,绝缘层110配置于导电层108与金属反射层104之间,而使导电层108与金属反射层104电性绝缘。本实施例的导电层108具有线路结构108a与多个接垫108b,其中抗氧化层106、金属反射层104以及绝缘层110曝露出接垫108b。覆晶式发光二极管芯片200通过接垫108b与线路结构108a电性连接。本实施例的基板100A与第一实施例的基板100具有类似的功效及优点,于此便不再重述。Different from the first embodiment, the substrate 100A of this embodiment may further include a conductive layer 108 . The conductive layer 108 in this embodiment is disposed between the first surface 102 a of the substrate 102 and the metal reflective layer 104 . In addition, the substrate 100A of this embodiment may further include an insulating layer 110 disposed between the conductive layer 108 and the metal reflective layer 104 to electrically insulate the conductive layer 108 from the metal reflective layer 104 . The conductive layer 108 in this embodiment has a circuit structure 108a and a plurality of pads 108b, wherein the anti-oxidation layer 106, the metal reflective layer 104 and the insulating layer 110 expose the pads 108b. The flip-chip LED chip 200 is electrically connected to the circuit structure 108a through the pad 108b. The substrate 100A of this embodiment has functions and advantages similar to those of the substrate 100 of the first embodiment, which will not be repeated here.
值得一提的是,图4中是以覆晶式发光二极管芯片200与本实施例的基板100A接合为示例。但,本发明并不特别限定与基板接合的发光二极管芯片的种类。图5示出本发明第二实施例的基板与另一种形式的发光二极管芯片接合的情形。请参照图5,举例而言,本实施例的基板100A亦可与打线式(wirebonding)发光二极管芯片400接合。发光二极管芯片400可通过导线410(材质例如为金属)与导电层108的接垫108b与导电层108的线路结构108a电性连接。另一方面,打线式发光二极管芯片400的背面400a可通过固晶结构300与抗氧化层106连接,进而使打线式发光二极管芯片400固定在基板100A上。It is worth mentioning that, in FIG. 4 , the bonding of the flip-chip LED chip 200 and the substrate 100A of this embodiment is taken as an example. However, the present invention does not particularly limit the type of the light emitting diode chip bonded to the substrate. FIG. 5 shows the bonding situation of the substrate of the second embodiment of the present invention and another type of LED chip. Please refer to FIG. 5 , for example, the substrate 100A of this embodiment may also be bonded to a wirebonding LED chip 400 . The LED chip 400 can be electrically connected to the pad 108 b of the conductive layer 108 and the circuit structure 108 a of the conductive layer 108 through a wire 410 (material such as metal). On the other hand, the back surface 400 a of the wire-bonded LED chip 400 can be connected to the anti-oxidation layer 106 through the die-bonding structure 300 , so that the wire-bonded LED chip 400 is fixed on the substrate 100A.
综上所述,本发明一实施例的基板藉由在金属反射层上配置抗氧化层,而使得金属反射层于共晶制程中不易发生氧化的问题。本发明一实施例的抗氧化层除了具有防止金属反射层氧化的功能外,同时还兼具反射光束的功效。本发明一实施例的抗氧化层可将覆晶式发光二极管芯片所发出的部分光束反射往向远离基板的方向,进而提高覆晶式发光二极管芯片的光利用效率。To sum up, the substrate according to an embodiment of the present invention makes the metal reflective layer less likely to be oxidized during the eutectic process by disposing an anti-oxidation layer on the metal reflective layer. In an embodiment of the present invention, the anti-oxidation layer not only has the function of preventing oxidation of the metal reflective layer, but also has the function of reflecting light beams. The anti-oxidation layer in an embodiment of the present invention can reflect part of the light beam emitted by the flip-chip LED chip to a direction away from the substrate, thereby improving the light utilization efficiency of the flip-chip LED chip.
虽然本发明已以覆晶式发光二极管芯片当作实施例揭示如上,然其并非用以限定本发明,正面或是背面共晶固晶等技术领域均属本发明的保护范围。任何所属技术领域的普通技术人员,当可作些许更动与润饰,而不脱离本发明的精神和范围。Although the present invention has been disclosed above with a flip-chip light-emitting diode chip as an embodiment, it is not intended to limit the present invention, and technical fields such as front or back eutectic die bonding belong to the protection scope of the present invention. Those skilled in the art may make some changes and modifications without departing from the spirit and scope of the present invention.
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CN114765241A (en) * | 2021-01-13 | 2022-07-19 | 京东方科技集团股份有限公司 | Light-emitting substrate and display device |
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