CN104730737A - Red omnidirectional structural color made from metal and dielectric layers - Google Patents

Abstract

The present invention discloses an omnidirectional structural color of red made from metal and dielectric layers. A multilayer stack that exhibits red omnidirectional structural color. The multilayer stack includes a reflector layer, a dielectric layer extending across the reflector layer, and an absorber layer extending across the dielectric layer. The dielectric layer reflects more than 70 percent of incident white light having a wavelength greater than 580 nanometers (nm). In addition, the absorbing layer absorbs more than 70% of incident white light having a wavelength of less than 580 nm. When combined, the reflector layer, dielectric layer, and absorber layer form an omnidirectional reflector that reflects a narrow band of electromagnetic radiation having a center wavelength between 580 nm and 680 nm, having a width less than 200 nm wide, and A color shift of less than 100 nm when the reflector is viewed from an angle between 0 and 45 degrees.

Description

Omnidirectional structural color of red made of metallic and dielectric layers

Cross References to Related Applications

This application is a continuation-in-part (CIP) of U.S. Patent Application Serial No. 13/913,402, filed June 8, 2013, which is a CIP of U.S. Patent Application Serial No. 13/760,699, filed February 6, 2013 , application 13/760,699 followed by CIP of 13/572,071 filed August 10, 2012, application 13/572,071 followed by CIP of US Patent Application Serial No. 13/021,730, filed February 5, 2011, application 13/021,730 This was followed by CIP of application 12/793,772 filed June 4, 2010, application 12/793,772 followed by CIP of US patent application serial number 12/388,395 filed February 18, 2009, application 12/388,395 followed by 2007 CIP of US Patent Application Serial No. 11/837,529 (US Patent 7,903,339), filed August 12. US Patent Application Serial No. 13/021,730, filed February 5, 2011, is also a CIP of 11/837,529, filed August 12, 2007 (US Patent 7,903,339). US Patent Application Serial No. 13/760,699, filed February 6, 2013, is also a CIP of 12/467,656, filed May 18, 2009, the entire contents of all of which are hereby incorporated by reference.

technical field

The present invention relates to omnidirectional structural color, and more particularly to the omnidirectional structural color of red provided by a multilayer stack having an absorber layer and a dielectric layer.

Background technique

Pigments made with multilayer structures are known. In addition, colorants that exhibit or provide omnidirectional structural colors of high chroma are also known. However, this prior art colorant requires as many as 39 film layers in order to obtain the desired color characteristics.

It will be appreciated that the costs associated with the production of thin film multilayer colorants are proportional to the number of layers required. Therefore, the costs associated with the production of high chroma omnidirectional structural colors using multilayer stacks of dielectric materials may be prohibitive. Therefore, high chroma omnidirectional structural colors requiring a minimum number of film layers are desirable.

Contents of the invention

Multi-layer stacks that provide omnidirectional structural color in red are provided. The multilayer stack includes a reflector layer, a dielectric layer extending across the reflector layer, and an absorber layer extending across the dielectric layer. The dielectric layer in combination with the reflector layer reflects more than 70 percent of incident white light having a wavelength greater than 550 nanometers (nm). Additionally, the absorber layer absorbs more than 70% of incident white light having a wavelength typically less than 550 nm. When combined, the reflector layer, dielectric layer, and absorber layer form an omnidirectional reflector that (1) reflects a narrow band (reflection peak) of visible electromagnetic radiation having a center wavelength between 550 nm and 700 nm and a width less than 200 nm wide. or belt); (2) when the omnidirectional reflector is viewed from an angle between 0 degrees and 45 degrees, it has a color shift (color shift) of less than 100 nm. In some examples, the narrow band of reflected visible electromagnetic radiation has a width of less than 175 nm, preferably less than 150 nm, more preferably less than 125 nm, and even more preferably less than 100 nm.

The reflector layer has a thickness between 50nm and 200nm and is made of metals such as aluminum, silver, platinum, tin and their alloys.

In some examples, the dielectric layer has an optical thickness of 0.1 to 2.0 quarter waves (QW) of the desired reflected center wavelength. In other examples, the dielectric layer has an optical thickness greater than 2.0 QW of the desired reflected center wavelength. The dielectric layer also has a refractive index greater than 1.6 and contains materials such as zinc sulfide (ZnS), titanium dioxide (TiO ₂ ), hafnium oxide (HfO ₂ ), niobium oxide (Nb ₂ O ₅ ), tantalum oxide (Ta ₂ O ₅ ), which combination of other dielectric materials. The dielectric layer may also contain colored dielectric materials such as iron oxide (Fe ₂ O ₃ ), cuprous oxide (Cu ₂ O), combinations thereof, and the like.

The absorber layer, also referred to herein as the absorber layer, may or may not be a colored or selective absorber layer. For example, neutral or non-selective absorber layers may include layers made of chromium, silver, platinum, and the like. In the alternative, the absorber layer may be a colored or selective absorber layer made of copper, gold, alloys such as bronze and brass, or the like. In another alternative, the colored or selective absorber layer comprises a colored dielectric material such as _Fe2O3 , _Cu2O , _combinations thereof, or the like.

It will be appreciated that the selective absorber layer is selected to absorb a desired range of wavelengths within the white light spectrum and reflect another desired range of the white light spectrum. For example, a selective absorber layer can be designed and fabricated such that it absorbs electromagnetic radiation having wavelengths corresponding to violet, blue, green, yellow (e.g., 400 nm to 550 nm) and also reflects electromagnetic radiation associated with red (i.e., 580 nm). to the infrared (IR) range) corresponding to electromagnetic radiation.

In some examples, the multilayer stack includes, in addition to the previously mentioned dielectric layer (i.e., the first dielectric layer), a second dielectric layer extending across the absorber layer and disposed opposite the first dielectric layer with respect to the absorber layer . Additionally, other embodiments are provided that include a second absorber layer, a third dielectric layer, and the like. However, the multilayer stacks disclosed herein have an overall thickness of less than 2 micrometers (μm), in some examples less than 1.5 μm, in other examples less than 1.0 μm, and in still other examples less than 0.75 μm.

Description of drawings

1A is a schematic diagram of zero or near-zero electric field points within a ZnS dielectric layer exposed to electromagnetic radiation (EMR) having a wavelength of 500 nm;

FIG. 1B is a plot of the absolute value of the electric field squared (|E| ² ) versus the thickness of the ZnS dielectric layer shown in FIG. 1A when exposed to EMR having wavelengths of 300 nm, 400 nm, 500 nm, 600 nm, and 700 nm;

2 is a schematic diagram of a dielectric layer extending over a substrate or reflector layer and exposed to electromagnetic radiation at an angle θ with respect to the normal direction of the outer surface of the dielectric layer;

3 is a schematic diagram of a ZnS dielectric layer with a Cr absorber layer located within the ZnS dielectric layer at a point of zero or near zero electric field for incident EMR having a wavelength of 434 nm;

4 is a graph of percent reflectance versus reflected EMR wavelength for a multilayer stack without a Cr absorber layer (e.g., FIG. 1A ) and a multilayer stack with a Cr absorber layer (e.g., FIG. 3A ) exposed to white light. graphic representation;

Figure 5A is a diagram of the first and second harmonics presented by a ZnS dielectric layer (e.g., Figure 1A) extending on an Al absorber layer;

5B is a graph of percent reflectance versus reflected for a multilayer stack having a ZnS dielectric layer extending throughout the Al reflector layer plus a Cr absorber layer within the ZnS dielectric layer such that the second harmonic shown in FIG. Graphical illustration of the EMR wavelength of ;

Figure 5C is the percent reflectance versus reflected EMR for a multilayer stack having a ZnS dielectric layer extending throughout the Al reflector layer plus a Cr absorber layer within the ZnS dielectric layer such that the first harmonic shown in Figure 5A is absorbed Diagram of wavelength;

Figure 6A is a plot of electric field squared versus dielectric layer thickness showing the angular dependence of the electric field for a Cr absorber layer exposed to incident light at 0 and 45 degrees;

Figure 6B is a graph of the percent absorbance of the Cr absorber layer versus reflected EMR wavelength when exposed to white light at 0 and 45 degrees (0° being normal to the surface) relative to the normal to the outer surface;

Figure 7A is a schematic diagram of a red omni-directional structural color multilayer stack according to an embodiment of the present invention;

Figure 7B is a graph of the percent absorbance of the Cu absorber layer shown in Figure 7A versus reflected EMR wavelength for the multilayer stack shown in Figure 7A exposed to white light at incident angles of 0 and 45°;

Figure 8 is a proof of concept red omnidirectional structural color multilayer stack for exposure to white light at an incident angle of 0° between calculated/simulated and experimental data for percent reflectance versus reflected EMR wavelength Graphical comparison between;

9 is a schematic diagram of an omnidirectional structural color multilayer stack according to an embodiment of the present invention;

10 is a schematic diagram of an omnidirectional structural color multilayer stack according to an embodiment of the present invention;

Figure 11 is a schematic diagram of an omnidirectional structural color multilayer stack according to an embodiment of the invention; and

Figure 12 is a schematic diagram of an omnidirectional structured color multilayer stack according to an embodiment of the present invention;

13 is a scanning electron microscope (SEM) image of a flake or colorant having a multilayer laminate structure according to an embodiment of the present invention;

Figure 14 is an SEM image of a cross-section of a single flake shown in Figure 13;

Figure 15A is a schematic illustration of a panel painted with a colorant designed and fabricated in accordance with an embodiment of the present invention and having a hue of 36° orange on the color map shown in Figure 15D;

Figure 15B is a schematic illustration of a panel painted with a stain designed and fabricated in accordance with an embodiment of the present invention and having a shade of deep red at 26° on the color chart shown in Figure 15D;

Figure 15C is a schematic illustration of a panel painted with a stain designed and fabricated in accordance with an embodiment of the present invention and having a hue of bright pink at 354° on the color chart shown in Figure 15D;

Figure 15D is an a*b* colormap using the CIELAB color space;

Figure 15E is a schematic diagram of an eleven-layer design for the colorants in the pigments exemplified in Figures 15A to 15C;

Figure 16A is a schematic diagram of a seven-layer stack according to an embodiment of the invention;

Figure 16B is a schematic diagram of a seven-layer stack according to an embodiment of the invention;

Figure 16C is a schematic diagram of a seven-layer stack according to an embodiment of the invention;

Figure 16D is a schematic diagram of a seven layer stack according to an embodiment of the invention;

Figure 17 is a graphical representation of a portion of the a*b* color diagram using the CIELAB color space, where chroma and hue shift are compared between conventional pigments and the pigments used to paint the panel shown in Figure 15B;

Figure 18 is a graph of reflectance versus wavelength for a seven-layer design according to an embodiment of the invention; and

Figure 19 is a graph of reflectance versus wavelength for a seven-layer design according to an embodiment of the invention.

Detailed ways

A multi-layer stack that can provide an omnidirectional structural color, such as an omnidirectional color of red, is provided. Thus, the multilayer laminate has utility as a paint pigment, a film providing a desired color, and the like.

A multilayer stack that can provide omnidirectional structural color includes a reflector layer and a dielectric layer extending across the reflector layer. The reflector layer and the dielectric layer reflect more than 70% of incident white light having a wavelength greater than 550 nm. It will be appreciated that the thickness of the dielectric layer may be predefined such that wavelengths at which more than 70% of incident white light is reflected are greater than 550nm, 560nm, 580nm, 600nm, 620nm, 640nm, 660nm, 680nm, or wavelengths in between. In other words, the thickness of the dielectric layer can be selected and produced such that a specific color having a desired hue, chroma and/or brightness on the Lab color system diagram is reflected and observed by the human eye.

In some examples, the multi-layer stack has hues between 315° and 45° in lab color space. In addition, the multilayer stack has a chroma greater than 50 and a hue shift of less than 30°. In other examples, the chroma is greater than 55, preferably greater than 60, and more preferably greater than 65, and/or the hue shift is less than 25°, preferably less than 20°, more preferably less than 15° and still more preferably less than 10°.

An absorbing layer extends throughout the dielectric layer, the absorbing layer absorbing more than 70% of incident white light for all wavelengths generally smaller than the wavelength corresponding to the desired reflection wavelength of the dielectric layer. For example, if the dielectric layer has a thickness such that more than 70% of incident white light having wavelengths greater than 600 nm is reflected, an absorbing layer extending across the dielectric layer absorbs more than 70% of incident white light having wavelengths generally less than 600 nm. In this way, sharp reflection peaks with wavelengths in the red color space are provided. In some examples, the reflector layer and dielectric layer reflect more than 80% of incident white light having a wavelength greater than 550 nm, and in other examples more than 90%. Additionally, in some examples, the absorber layer absorbs more than 80%, and in other examples, more than 90%, of wavelengths that are generally less than the wavelength corresponding to the desired reflection wavelength of the dielectric layer.

It is to be appreciated that the term "generally" in this context refers to plus and/or minus 20nm in some instances, plus and/or minus 30nm in other instances, plus and/or minus 40nm in some other instances and plus and/or minus 40nm in other instances and Examples are plus and/or minus 50nm.

The reflector layer, the dielectric layer and the absorbing layer form an omnidirectional reflector that reflects a narrow band (hereinafter referred to as reflection peak or band) of electromagnetic radiation having the visible- A central wavelength between the infrared fringes, a reflection band less than 200 nm in width, and a color shift of less than 100 nm when the omnidirectional reflector is exposed to white light and viewed from an angle between 0 and 45 degrees. The color shift may be in the form of a shift in the center wavelength of the reflection band, or in the alternative a UV-sided edge of the reflection band. For the purposes of the present invention, the width of the reflection band of electromagnetic radiation is defined as the width of the reflection band at half the reflection height of the wavelength of maximum reflection within the visible spectrum. Additionally, the narrow band of electromagnetic radiation that is reflected, the "color" of the omnidirectional reflector, has a hue shift of less than 25 degrees. In some examples, the reflector layer has a thickness between 50 nm and 200 nm and is made of or includes a metal such as aluminum, silver, platinum, tin, alloys thereof, or the like.

With respect to the dielectric layer extending throughout the reflector layer, the dielectric layer has an optical thickness between 0.1 QW and 2.0 QW. In some examples, the dielectric layer has an optical thickness between 0.1 QW and 1.9 QW, while in other examples, the dielectric layer has a thickness between 0.1 QW and 1.8 QW. In other examples, the dielectric layer has an optical thickness of less than 1.9 QW, such as less than 1.8 QW, less than 1.7 QW, less than 1.6 QW, less than 1.5 QW, less than 1.4 QW, less than 1.3 QW, less than 1.2 QW or less than 1.1 QW. In the alternative, the dielectric layer may have an optical thickness greater than 2.0 QW.

The dielectric layer has a refractive index greater than 1.60, 1.62, 1.65 or 1.70 and can be made of a dielectric material such as ZnS, TiO ₂ , HfO ₂ , Nb ₂ O ₅ , Ta ₂ O ₅ , combinations thereof. In some examples, the dielectric layer is _a colored or selective dielectric layer made of a colored dielectric material such as _Fe2O3 , _Cu2O , or the like. For the purposes of the present invention, the term "colored dielectric material" or "colored dielectric layer" refers to a dielectric material or layer that reflects a portion of incident white light while transmitting another portion of the white light. For example, a colored dielectric layer may transmit electromagnetic radiation having a wavelength between 400 nm and 600 nm and reflect wavelengths greater than 600 nm. Thus, the colored dielectric material or the colored dielectric layer has an orange, red and/or reddish-orange visible appearance.

In addition to the dielectric layer, the omnidirectional reflector may comprise a selective absorber layer having a thickness between 5nm and 200nm. In some examples, a colored absorber layer replaces or replaces the absorber layer described above. Similar to the description above, the selective absorber layer may absorb light having wavelengths associated with violet, blue, yellow, green, etc., and also reflect wavelengths corresponding to orange, red, reddish-orange, etc. In some examples, the colored absorber layer comprises or is made of colored metals such as copper, gold, and alloys thereof such as bronze and brass. In other examples, the colored absorber layer may comprise or be made of colored dielectric materials such as _Fe2O3 , _Cu2O , and the _like .

The absorber layer is positioned such that a zero or near zero energy interface occurs between the absorber layer and the dielectric layer. In other words, the dielectric layer has a thickness such that the zero or near zero energy field is located at the dielectric layer-absorber layer interface. It is to be appreciated that the thickness of the dielectric layer where the zero or near zero energy field occurs is a function of the incident EMR wavelength. Additionally, it is also to be appreciated that wavelengths corresponding to zero or near zero electric field will be transmitted through the dielectric layer-absorber layer interface, whereas wavelengths not corresponding to zero or near zero electric field at the interface will not be transmitted through the interface. Accordingly, the thickness of the dielectric layer is designed and fabricated such that the desired wavelength of incident white light is transmitted through the dielectric layer-absorber layer interface, reflected off the reflector layer, and then transmitted back through the dielectric layer-absorber layer interface. Likewise, the thickness of the dielectric layer is made such that undesired wavelengths of incident white light are not transmitted through the dielectric layer-absorber layer interface.

In view of the above, wavelengths that do not correspond to the desired zero or near-zero electric field interface are absorbed by the absorber layer and thus are not reflected. In this way, the desired "vibrant" color, also called structural color, is provided. In addition, the thickness of the dielectric layer is such that the desired reflection of the first and/or second harmonic is produced in order to provide a reddish colored surface which also has an omni-directional appearance.

The multilayer stack may comprise, in addition to the previously mentioned dielectric layer (also referred to as first dielectric layer), a second dielectric layer extending throughout the absorber layer. Furthermore, the second dielectric layer is arranged opposite the mentioned first dielectric layer with respect to the absorber layer.

Regarding the thickness of the dielectric layer and the point of zero or near zero electric field mentioned above, FIG. 1A is a schematic diagram of a ZnS dielectric layer extending across an Al reflector layer. The ZnS dielectric layer has a total thickness of 143 nm, and a point of zero or near zero energy occurs at 77 nm for incident electromagnetic radiation having a wavelength of 500 nm. In other words, the ZnS dielectric layer exhibits zero or near-zero electric field at a distance of 77 nm from the Al reflector layer for incident EMR having a wavelength of 500 nm. Additionally, Figure IB provides a graphical representation of the energy field across a ZnS dielectric layer for a number of different incident EMR wavelengths. As shown in the figure, the dielectric layer has a zero electric field at a thickness of 77 nm for a wavelength of 500 nm, but a non-zero electric field at 77 nm for EMR wavelengths of 300, 400, 600 and 700 nm.

Without being bound by theory, calculations for zero or near-zero energy point thicknesses for dielectric layers, such as the dielectric layer shown in FIG. 1A , are discussed below.

Referring to Figure 2, there is shown a dielectric layer 4 having a total thickness 'D', an incremental thickness 'd' and a refractive index 'n' on a substrate or core layer 2 having a refractive index _ns . Incident light strikes the outer surface 5 of the dielectric layer 4 at an angle θ with respect to the straight line 6 , which is perpendicular to the outer surface 5 , and is reflected from the outer surface 5 at the same angle. Incident light is transmitted through the outer surface 5 and enters the dielectric layer 4 at an angle θ _F with respect to the line 6 and strikes the surface 3 of the substrate layer 2 at an angle θ _s .

For a single dielectric layer, θ _s =θ _F and the energy field/electric field (E) when z=d can be expressed as E(z). According to Maxwell's equation, for s-polarization, the electric field can be expressed as:

and for p-polarization can be expressed as:

in And λ is the desired wavelength to be reflected. Furthermore, α = n _s sin θ _s , where 's' corresponds to the substrate in Figure 1, and As a function of z is the dielectric constant of the layer. Therefore, for s-polarization:

|E(d)| ² ＝|u(z)| ² exp(2ikαy)| _z＝d (3)

For p-polarization:

${<span\; class="notranslate">\; |</span>\mathrm{<span\; class="notranslate">\; E.</span>}<span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; d</span>}<span\; class="notranslate">\; )</span><span\; class="notranslate">\; |</span>}^{\mathrm{<span\; class="notranslate">\; 2</span>}}<span\; class="notranslate">\; =</span><span\; class="notranslate">\; [</span>{<span\; class="notranslate">\; |</span>\mathrm{<span\; class="notranslate">\; u</span>}<span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; z</span>}<span\; class="notranslate">\; )</span><span\; class="notranslate">\; |</span>}^{\mathrm{<span\; class="notranslate">\; 2</span>}}<span\; class="notranslate">\; +</span>{<span\; class="notranslate">\; |</span>\frac{\mathrm{<span\; class="notranslate">\; \&alpha;</span>}}{\sqrt{\mathrm{<span\; class="notranslate">\; no</span>}}}\mathrm{<span\; class="notranslate">\; v</span>}<span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; z</span>}<span\; class="notranslate">\; )</span><span\; class="notranslate">\; |</span>}^{\mathrm{<span\; class="notranslate">\; 2</span>}}<span\; class="notranslate">\; ]</span>\mathrm{<span\; class="notranslate">\; exp</span>}<span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; 2</span>}\mathrm{<span\; class="notranslate">\; ik\&alpha;y</span>}<span\; class="notranslate">\; )</span>{<span\; class="notranslate">\; |</span>}_{\mathrm{<span\; class="notranslate">\; z</span>}<span\; class="notranslate">\; =</span>\mathrm{<span\; class="notranslate">\; d</span>}}<span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; 4</span>}<span\; class="notranslate">\; )</span>$

It will be appreciated that the electric field variation along the Z direction of the dielectric layer 4 can be estimated by calculating the unknown parameters u(z) and v(z), wherein the calculation can be shown as:

Of course, 'i' is the square root of -1. Using the boundary conditions u| _z＝0 ＝1,v| _z＝0 ＝q _s , then there are the following relations:

For s-polarization: q _s = n _s cosθ _s (6)

For p-polarization: q _s = n _s /cosθ _s (7)

For s-polarization: q = n cos θ _F (8)

For p-polarization: q=n/cosθ _F (9)

u(z) and v(z) can be expressed as:

as well as

So, in In the case of s-polarization:

And, for p-polarization:

in:

α=n _s sinθ _s =n sinθ _F (15)

${\mathrm{<span\; class="notranslate">\; q</span>}}_{\mathrm{<span\; class="notranslate">\; the\; s</span>}}<span\; class="notranslate">\; =</span>\frac{{\mathrm{<span\; class="notranslate">\; no</span>}}_{\mathrm{<span\; class="notranslate">\; the\; s</span>}}}{\mathrm{<span\; class="notranslate">\; cos</span>}{\mathrm{<span\; class="notranslate">\; \&theta;</span>}}_{\mathrm{<span\; class="notranslate">\; the\; s</span>}}}<span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; 16</span>}<span\; class="notranslate">\; )</span>$

and

${\mathrm{<span\; class="notranslate">\; q</span>}}_{\mathrm{<span\; class="notranslate">\; the\; s</span>}}<span\; class="notranslate">\; =</span>\frac{\mathrm{<span\; class="notranslate">\; no</span>}}{\mathrm{<span\; class="notranslate">\; cos</span>}{\mathrm{<span\; class="notranslate">\; \&theta;</span>}}_{\mathrm{<span\; class="notranslate">\; f</span>}}}<span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; 17</span>}<span\; class="notranslate">\; )</span>$

So for the simple case of θ _F =0 or normal incidence, and α=0:

It takes into account the thickness 'd' to be solved for, i.e. the position or location within the dielectric layer where the electric field is zero.

Referring now to FIG. 3, Equation 19 is used to calculate that the point of zero or near-zero electric field in the ZnS dielectric layer shown in FIG. 1A is at 70 nm (instead of 77 nm for a wavelength of 500 nm) when exposed to EMR having a wavelength of 434 nm. ). Additionally, a 15 nm thick Cr absorber layer was inserted at a thickness of 70 nm from the Al reflector layer to provide a zero or near zero electric field ZnS-Cr interface. This inventive structure allows light with a wavelength of 434nm to pass through the Cr-ZnS interface, but absorbs light that does not have a wavelength of 434nm. In other words, the Cr-ZnS interface has zero or near-zero electric field with respect to light having a wavelength of 434 nm, so the 434 nm light passes through the interface. However, the Cr-ZnS interface has no zero or near-zero electric field for light not having a wavelength of 434nm, so such light is absorbed by the Cr absorber layer and/or the Cr-ZnS interface and not reflected by the Al reflector layer.

It will be appreciated that a certain proportion of the light within +/- 10nm of the desired 434nm will pass through the Cr-ZnS interface. However, it is also to be appreciated that this narrow band of reflected light, eg 434 +/- 10nm, still provides vivid structural color to the human eye.

The results for the Cr absorber layer of the multilayer stack in Fig. 3 are illustrated in Fig. 4, where the percent reflectance is shown versus reflected EMR wavelength. As shown by the dashed line corresponding to the ZnS dielectric layer shown in Fig. 3 without the Cr absorber layer, a narrow reflection peak appears at about 400 nm, but a much broader peak appears at about 550+nm. In addition, a considerable amount of light is still reflected in the 500nm wavelength region. Thus, a doublet occurs which prevents the multilayer stack from having or exhibiting a structural color.

In contrast, the solid line in Figure 4 corresponds to the structure shown in Figure 3 in the presence of a Cr absorber layer. As shown in the figure, a sharp peak appears at about 434 nm and a sharp drop in reflectivity for wavelengths greater than 434 nm is provided by the Cr absorber layer. It will be appreciated that sharp peaks represented by solid lines appear visually as distinct/structural colors. Furthermore, Figure 4 illustrates where the width of the reflection peak or band is measured, ie the bandwidth is determined at 50% of the reflectance at the wavelength of maximum reflection, also called width at half maximum (FWHM).

Regarding the omni-directional performance of the multilayer structure shown in Fig. 3, the thickness of the ZnS dielectric layer can be designed or arranged such that only the first harmonic of the reflected light is provided. It will be appreciated that this is sufficient for the "blue" color, but the generation of the "red" color requires additional consideration. For example, the control of angular independence for red is difficult because thicker dielectric layers are required, which in turn leads to higher harmonic designs where the presence of second and possibly third harmonics is unavoidable. Also, the tonal space of crimson is very narrow. Therefore, red multilayer stacks have higher angular variance.

To overcome the higher angular variance for red, the present application discloses a unique, novel design/structure that can provide angle independent red color. For example, Figure 5A illustrates a dielectric layer exhibiting first and second harmonics for incident white light when the outer surface of the dielectric layer is viewed from 0 and 45 degrees. As shown in this graphical representation, the low angular dependence (small Δλ _c ) is provided by the thickness of the dielectric layer, however, this multilayer stack has a combination of blue (first harmonic) and red (second harmonic) And thus not suitable for the desired "single red" color. Therefore, the concept/structure of using absorber layers to absorb unwanted harmonic systems has been developed. Figure 5A also illustrates examples of the location of the reflection band center wavelength (λ _c ) and the difference or shift in center wavelength (Δλ _c ) when the sample is viewed from 0 and 45 degrees for a given reflection peak.

Turning now to FIG. 5B, a Cr absorber layer at a suitable dielectric layer thickness (eg, 72nm) is used to absorb the second harmonic shown in FIG. 5A and provide a vivid blue color. More importantly for the present invention, Figure 5C illustrates that the red color is provided by absorbing the first harmonic with a Cr absorber layer at a different dielectric layer thickness (eg, 125nm). However, FIG. 5C also illustrates that the use of Cr absorber layers through a multilayer stack still results in a more than desired angular dependence, ie greater than desired Δλ _c .

It will be appreciated that the relatively large shift in _λc for red compared to blue is due to the very narrow magenta hue space and the absorption of the Cr absorber layer at wavelengths associated with a non-zero electric field (i.e., when the electric field is zero or the fact that light is not absorbed when near zero). Thus, Figure 6A illustrates that zero or non-zero points are different for different incident angles of light wavelengths. This factor results in the angle-dependent absorbance shown in Figure 6B, ie the difference in the 0° and 45° absorbance curves. Therefore in order to further improve the multilayer stack design and angle independence performance absorber layers are used which absorb eg blue light irrespective of the electric field being zero.

In particular, Figure 7A shows a multilayer stack with a Cu absorber layer instead of a Cr absorber layer extending across the dielectric ZnS layer. The results of using such a "colorful" or "selective" absorber layer are shown in Figure 7B, which demonstrates the "compactness" of the 0° and 45° absorbance curves for the multilayer stack shown in Figure 7A Much more agglomeration. Thus, a comparison between Figure 6B and Figure 7B illustrates a significant improvement in angular independence of absorptivity when using a selective absorber layer rather than a non-selective absorber layer.

Based on the above, a proof of concept multilayer laminate structure was designed and fabricated. In addition, the calculation/simulation results on the proof of concept samples are compared with actual experimental data. Specifically, and as shown in the graph in Figure 8, a vivid red color is produced (wavelengths greater than 700 nm cannot typically be seen by the human eye) and between the calculated/simulated light data and the experimental light data obtained from real samples Very good agreement was obtained. In other words, calculations/simulations may and/or be used to simulate results of multilayer stack designs and/or prior art multilayer stacks according to one or more embodiments of the present invention.

A list of simulated and/or actual fabricated multilayer stack samples is provided in Table 1 below. As shown in the table, the inventive designs disclosed herein include at least 5 different layered structures. In addition, samples are simulated and/or fabricated from many different materials. Samples showing high chroma, low hue shift, and excellent reflectivity are provided. In addition, the three-layer and five-layer samples have a total thickness between 120nm and 200nm; the seven-layer sample has a total thickness between 350nm and 600nm; the nine-layer sample has a total thickness between 440nm and 500nm; and the eleven-layer sample has a total thickness of Total thickness between 600nm and 660nm.

Table 1

Regarding the actual layer sequence, FIG. 9 illustrates at 10 one half of a five-layer design. The omnidirectional reflector 10 has a reflector layer 100 , a dielectric layer 110 extending over the reflector layer 100 and an absorber layer 120 extending over the dielectric layer 110 . It is to be appreciated that another dielectric layer and another absorber layer may be positioned oppositely with respect to reflector layer 100 to provide a five layer design.

Reference numeral 20 in FIG. 10 illustrates one half of a seven-layer design, wherein a further dielectric layer 130 extends 120 across the absorber layer such that the dielectric layer 130 is disposed opposite to the dielectric layer 110 with respect to the absorber layer 120 .

FIG. 11 illustrates one half of a nine-layer design in which the second absorber layer 105 is located between the reflector layer 100 and the dielectric layer 110 . Finally, FIG. 12 illustrates one half of an eleven-layer design with another absorber layer 140 extending over the dielectric layer 130 and a further dielectric layer 150 extending over the absorber layer 140 .

A scanning electron microscope (SEM) image of a plurality of colorants having a multilayer structure according to an embodiment of the present invention is shown in FIG. 13 . Figure 14 is a SEM image of one of the colorants at a higher magnification showing the multilayer structure. This colorant was used to make three different red pigments which were then applied to three panels for testing. Figures 15A to 15C are schematic illustrations of actual painted panels, as actual photographs of panels appear grey/black when printed and reproduced in black and white. FIG. 15A represents orange with a 36° hue on the color chart shown in FIG. 15D , FIG. 15B represents deep red with a 26° hue and FIG. 15C represents bright pink with a 354° hue. Furthermore, the magenta panel represented in Figure 15B has a lightness L* of 44 and a chromaticity C* of 67.

Figure 15E is a schematic representation of the eleven layer design of the colorants used to coat the panels shown in Figures 15A to 15C. With regard to exemplary thicknesses for the various layers, Table 2 provides the actual thicknesses for each of the corresponding multilayer stacks/colorants. As shown by the thickness values in Table 2, the total thickness of the eleven layer design is less than 2 microns and can be less than 1 micron.

Table 2

color => orange dark red bright pink layer↓↓ Layer thickness (nm) Layer thickness (nm) Layer thickness (nm) ZnS 28 31 twenty three Cu 25 28 28 ZnS 141 159 40 Cu 32 36 72 ZnS 55 63 41 Al 80 80 80 ZnS 55 63 41 Cu 32 36 72 ZnS 141 159 40 Cu 25 28 28 ZnS 28 31 twenty three

It is to be appreciated that seven layer designs and seven layer multilayer stacks can be used to make this colorant. Four examples of seven-layer multilayer stacks are shown in Figures 16A to 16D. Figure 16A illustrates a seven-layer stack having: (1) a reflector layer 100; (2) a pair of dielectric layers 110 extending 100 across the reflector layer and disposed oppositely with respect to the reflector layer 100; (3) a pair of a selective absorber layer 120a extending across the outer surfaces of the pair of dielectric layers 110; and (4) a pair of dielectric layers 130 extending across the outer surfaces of the pair of selective absorber layers 120a.

Naturally, the thickness of the dielectric layer 110 and the selective absorber layer 120a is such that the interface between the selective absorber layer 120a and the dielectric layer 110 and the interface between the selective absorber layer 120a and the dielectric layer 130 are relative to the Desired wavelengths of light (315°<hue<45° and/or 550nm< _λc <700nm) in the pink-red-orange region of the color diagram shown in 15D exhibit zero or near-zero electric fields. In this manner, the desired red light passes through layers 130-120a-110, reflects off layer 100, and passes back through layers 110-120a-130. In contrast, non-red light is absorbed by selective absorber layer 120a. Furthermore, as discussed above and shown in Figures 7A-7B, the selective absorber layer 120a has an angle-independent absorbance for non-red light.

It will be appreciated that the thickness of the dielectric layers 100 and/or 130 is such that the reflection of red light by the multilayer stack is omnidirectional. Omni-directional reflection is measured or determined from the small Δλ _c of the reflected light. For example, in some instances, Δλ _c is less than 120 nm. In other examples, Δλ _c is less than 100 nm. In still other examples, Δλ _c is less than 80 nm, preferably less than 60 nm, more preferably less than 50 nm, and even more preferably less than 40 nm.

Omni-directional reflectance can also be measured by low hue shift. For example, tints made with multilayer stacks according to embodiments of the present invention had hue shifts of 30° or less, as shown in FIG. 17 (see Δθ ₁ ), and in some instances, hue shifts of 25° or less, preferably less than 20°, more preferably less than 15° and even more preferably less than 10°. In contrast, conventional colorants exhibit a hue shift of 45° or more (see Δθ ₂ ).

Figure 16B illustrates a seven-layer stack having: (1) a selective reflector layer 100a; (2) a pair of dielectric layers 110 extending 100a across the reflector layer and positioned oppositely with respect to the reflector layer 100a; (3) A pair of selective absorber layers 120a extending across the outer surfaces of the pair of dielectric layers 110; and (4) a pair of dielectric layers 130 extending across the outer surfaces of the pair of selective absorber layers 120a.

Figure 16C illustrates a seven-layer stack having: (1) a selective reflector layer 100a; (2) a pair of dielectric layers 110 extending 100a across the reflector layer and positioned oppositely with respect to the reflector layer 100a; (3) A pair of non-selective absorber layers 120 extending across the outer surfaces of the pair of dielectric layers 110 ; and (4) a pair of dielectric layers 130 extending across the outer surfaces of the pair of absorber layers 120 .

Figure 16D illustrates a seven-layer stack having: (1) a reflector layer 100; (2) a pair of dielectric layers 110 extending 100 across the reflector layer and positioned oppositely with respect to the reflector layer 100; (3) a pair of An absorber layer 120 extending across the outer surfaces of the pair of dielectric layers 110 ; and (4) a pair of dielectric layers 130 extending across the outer surfaces of the pair of selective absorber layers 120 .

Turning now to FIG. 18 , a graph of percent reflectance versus reflected EMR wavelength is shown for a seven layer design omnidirectional reflector when exposed to white light at angles of 0 and 45° relative to the reflector's surface. As shown in this graph, both the 0° and 45° curves illustrate the very low reflectance, eg, less than 10%, provided by the omnidirectional reflector for wavelengths less than 550 nm. However, as the curve shows, the reflector provides a sharp increase at wavelengths between 560 and 570 nm and reaches a maximum of approximately 90% at 700 nm. It will be appreciated that the portion or area of the graph on the right hand side (IR side) of the curve represents the IR portion of the reflection band provided by the reflector.

The sharp increase in reflectivity provided by the omnidirectional reflector is characterized by the UV side edge of each curve extending from the low reflectivity portion at wavelengths below 550 nm up to the high reflectivity portion (eg >70%). The linear portion 200 of the UV side edge is inclined at an angle (β) greater than 60° with respect to the X-axis, has a length L of about 40 on the reflectivity axis and has a slope of 1.4. In some instances, the linear portion is inclined at an angle greater than 70° relative to the X-axis, while in other instances β is greater than 75°. Additionally, the reflection bands have a visible FWHM of less than 200 nm, and in some instances have a visible FWHM of less than 150 nm, and in other instances have a visible FWHM of less than 100 nm. In addition, the center wavelength λ _c for the visible reflection band as shown in FIG. 18 is defined as a wavelength that is equidistant from the UV side edge of the reflection band and the IR edge of the IR spectrum at the visible FWHM.

It is to be appreciated that the term "visible FWHM" refers to the width of the reflection band between the UV side edge of the curve and the edge of the IR spectral range, beyond which the reflectivity provided by omnidirectional reflectors is not significant to the human eye. is invisible. In this way, the inventive designs and multilayer stacks disclosed herein use the invisible IR portion of the electromagnetic radiation spectrum to provide vivid or structural color. In other words, the omnidirectional reflectors disclosed herein utilize the invisible IR portion of the electromagnetic radiation spectrum in order to provide a narrow band of visible light that is reflected, despite the fact that the reflector may reflect a much broader band of electromagnetic radiation extending into the IR region. bring.

Referring now to FIG. 19 , a graph of percent reflectance versus wavelength is shown for another seven layer design omnidirectional reflector when exposed to white light at angles of 0 and 45° relative to the reflector's surface. Additionally, a definition or characterization of the omnidirectional properties provided by the omnidirectional reflectors disclosed herein is shown. Specifically, and when the reflection band provided by the inventive reflector has _{a maximum (i.e., a peak), as shown in the figure, each curve has a center wavelength λ c defined} to exhibit or The wavelength that experiences maximum reflectance. The term maximum reflection wavelength can also be used for λ _c .

As shown in FIG. 19, when the outer surface of the omnidirectional reflector is observed from a 45° angle (λ _c (45°)) (for example, the outer surface is inclined at 45° relative to the human eye viewing the surface), compared to the When a surface is viewed from an angle of 0° (λ _c (0°)), ie normal to the surface, there is an offset or displacement of λ _c . This shift in λ _c (Δλ _c ) provides a measure of the omnidirectional properties of the omnidirectional reflector. Of course, zero offset, ie no offset at all, is a perfectly omnidirectional reflector. However, the omnidirectional reflectors disclosed herein can provide a _Δλc of less than 100 nm, which can appear to the human eye as if the surface of the reflector has not changed color, and thus the reflector is practically omnidirectional . In some examples, the omnidirectional reflectors disclosed herein can provide a Δλ _c of less than 75 nm, in other examples can provide a Δλ _c of less than 50 nm, and in still other examples can provide a Δλ _c of less than 25 nm, and in yet Some examples provide Δλ _c of less than 15 nm. Such a shift in _Δλc can be determined by a plot of the actual reflectivity versus wavelength for the reflector, and/or in the alternative, by modeling of the reflector if the material and layer thicknesses are known.

Another definition or characterization of the omnidirectional properties of a reflector may be determined by the offset of the side edges of the reflective bands for a given set of angles. For example, the reflectance (S _L (0°)) for an omnidirectional reflector viewed from 0° compared to the UV side edge of the reflectance ( _SL (45°)) for the same reflector viewed from 0° The offset or displacement of the UV side edge of )) provides a measure of the omnidirectional properties of the omnidirectional reflector. In addition _, for example, for a reflector that provides a reflection band similar to that shown in FIG. A measure of omnidirectionality may be better than using Δλ _c . It is to be appreciated that the offset (ΔS _L ) of the UV side edge is, and/or can be measured, in the visible FWHM.

Of course, zero offset, ie no offset at all (ΔS _L =0 nm), would characterize a perfectly omnidirectional reflector. However, the omnidirectional reflectors disclosed herein can provide a ΔS _L of less than 100 nm, which appears to the human eye as if the reflector's surface has not changed color, and thus is omnidirectional from a practical standpoint. In some examples, the omnidirectional reflectors disclosed herein can provide a ΔS _L of less than 75 nm, in other embodiments can provide a ΔS _L of less than 50 nm, and in still other examples can provide a ΔS _L of less than 25 nm, while at Still other examples provide ΔS _L of less than 15 nm. Such a shift in ΔS _L can be determined by a plot of the actual reflectivity versus wavelength for the reflector, and/or in the alternative, by modeling of the reflector if the material and layer thicknesses are known.

Methods for producing the multilayer stacks disclosed herein may be any method or process known to, or not yet known to, those skilled in the art. Typical known methods include wet methods such as sol gel processing, layer-by-layer processing, spin coating, and the like. Other known dry methods include chemical vapor deposition processes and physical vapor deposition processes such as sputtering, electron beam deposition, and the like.

The multilayer stacks disclosed herein can be used in virtually any color application, such as tints for pigments, films applied to surfaces, and the like.

The above examples and embodiments are for illustrative purposes only, and variations, modifications, etc. will be apparent to those skilled in the art and fall within the scope of the invention. Accordingly, the scope of the invention is defined by the claims and all equivalents thereof.

Claims (31)

1. one kind shows the multilayer laminated of red omnirange schemochrome, comprising:

Reflector layer;

Dielectric layer, it extends throughout described reflector layer, and described reflector layer and described dielectric layer reflection having more than 70% are greater than the incident white light of the wavelength of 550nm; And

Selectively absorbing layers, it extends throughout described dielectric layer, and described selectively absorbing layers absorbs the described incident white light that having more than 70% is less than the wavelength of 550nm;

Described reflector layer, dielectric layer and selectively absorbing layers form omnirange reflecting body, and described omnirange reflecting body reflects the arrowband of such both visible electromagnetic radiation: it has centre wavelength between 550nm to 700nm, be less than the wide width of 200nm and be less than the gamut of 100nm when described omnirange reflecting body is watched by the angle between from 0 and 45 degree.

2. multilayer laminated as claimed in claim 1, wherein said reflector layer has the thickness between 50nm to 200nm.

3. multilayer laminated as claimed in claim 2, wherein said dielectric layer has the thickness between 30nm to 300nm.

4. multilayer laminated as claimed in claim 3, wherein said selectively absorbing layers has the thickness between 20nm to 80nm.

5. multilayer laminated as claimed in claim 4, wherein said omnirange reflecting body has the gross thickness being less than 2 microns.

6. multilayer laminated as claimed in claim 4, wherein said gross thickness is less than 1 micron.

7. multilayer laminated as claimed in claim 2, wherein said reflector layer comprises the metal selected the group formed from Al, Ag, Pt, Cr, Cu, Zn, Au, Sn and their alloy.

8. multilayer laminated as claimed in claim 1, wherein said centre wavelength has the hue shift being less than 30 degree.

9. multilayer laminated as claimed in claim 1, wherein said dielectric layer has and is greater than 0.1 QW and the optical thickness being less than 3.0 QW.

10. multilayer laminated as claimed in claim 9, wherein said optical thickness is less than 2.0 QW.

11. is multilayer laminated as claimed in claim 1, wherein said dielectric layer have be greater than 1.6 refractive index and comprise the dielectric substance selected from the group of ZnS, TiO2, HfO2, Nb2O5, Ta2O5 and combination composition thereof.

12. is multilayer laminated as claimed in claim 1, and wherein said dielectric layer comprises the colored dielectric material selected the group formed from Fe2O3, Cu2O and combination thereof.

13. is multilayer laminated as claimed in claim 1, and wherein said selectively absorbing layers comprises the chromatic metallic selected the group formed from Cu, Au, Zn, Sn and their alloy.

14. is multilayer laminated as claimed in claim 1, and the absorption layer of wherein said colour comprises the colored dielectric material selected the group formed from Fe2O3, Cu2O and combination thereof.

15. is multilayer laminated as claimed in claim 1, except described dielectric layer noted earlier, also comprise the second dielectric layer, described second dielectric layer extends throughout described selectively absorbing layers and relatively arranges about described selectively absorbing layers with described dielectric layer;

Described reflector layer, dielectric layer, selectively absorbing layers and the second dielectric layer form described omnirange reflecting body.

16. is multilayer laminated as claimed in claim 1, and wherein said second dielectric layer has the thickness between 30nm to 300nm.

17. is multilayer laminated as claimed in claim 16, except described selectively absorbing layers noted earlier, also comprise the second selectively absorbing layers, described second selectively absorbing layers extends throughout described second dielectric layer and relatively arranges about described second dielectric layer with described selective absorbing body;

Described reflector layer, dielectric layer, selectively absorbing layers, the second dielectric layer and the second selectively absorbing layers form described omnirange reflecting body.

18. is multilayer laminated as claimed in claim 17, and wherein said second selectively absorbing layers has the thickness between 10nm to 80nm.

19. is multilayer laminated as claimed in claim 18, also comprises the 3rd dielectric layer, and described 3rd dielectric layer extends throughout described second absorption layer and relatively arranges about described second selectively absorbing layers with described second dielectric layer;

Described reflector layer, dielectric layer, selectively absorbing layers, the second dielectric layer, the second selectively absorbing layers and the 3rd dielectric layer form described omnirange reflecting body.

20. multilayer laminated as claimed in claim 19, wherein said 3rd dielectric layer has the thickness between 10nm to 300nm.

21. is multilayer laminated as claimed in claim 1, except the described selectively absorbing layers mentioned before, also comprise the second selectively absorbing layers, and described second selectively absorbing layers extends between described reflector layer and described dielectric layer;

Described reflector layer, dielectric layer, selectively absorbing layers and the second selectively absorbing layers form described omnirange reflecting body.

22. is multilayer laminated as claimed in claim 21, except the described dielectric layer mentioned before, also comprise the second dielectric layer, described second dielectric layer extends throughout described selectively absorbing layers and relatively arranges about described selectively absorbing layers with described dielectric layer;

Described reflector layer, dielectric layer, selectively absorbing layers, the second selectively absorbing layers and the second dielectric layer form described omnirange reflecting body.

23. is multilayer laminated as claimed in claim 22, also comprises the 3rd selectively absorbing layers, and described 3rd selectively absorbing layers extends throughout described second dielectric layer and relatively arranges about described second dielectric layer with described selectively absorbing layers;

Described reflector layer, dielectric layer, selectively absorbing layers, the second selectively absorbing layers, the second dielectric layer and the 3rd selectively absorbing layers form described omnirange reflecting body.

24. is multilayer laminated as claimed in claim 23, also comprises the 3rd dielectric layer, and described 3rd dielectric layer extends throughout described 3rd selectively absorbing layers and relatively arranges about described 3rd selectively absorbing layers with described second dielectric layer;

Described reflector layer, dielectric layer, selectively absorbing layers, the second selectively absorbing layers, the second dielectric layer, the 3rd selectively absorbing layers and the 3rd dielectric layer form described omnirange reflecting body.

25. is multilayer laminated as claimed in claim 24, and wherein said omnirange reflecting body has the gross thickness being less than 2 microns.

26. is multilayer laminated as claimed in claim 25, and wherein said gross thickness is less than 1 micron.

27. is multilayer laminated as claimed in claim 1, and the arrowband of wherein said both visible electromagnetic radiation is the zone of reflections with UV lateral edges, when described omnirange reflecting body is less than 100nm by described UV lateral edges skew during angle viewing between from 0 and 45 degree.

28. is multilayer laminated as claimed in claim 27, wherein when described omnirange reflecting body is less than 75nm by the described UV lateral edges skew of described zone of reflections during angle viewing between from 0 and 45 degree.

29. is multilayer laminated as claimed in claim 28, wherein when described omnirange reflecting body is less than 50nm by the described UV lateral edges skew of described zone of reflections during angle viewing between from 0 and 45 degree.

The pigment colorant of 30. 1 kinds of multilayer laminated forms, described pigment colorant comprises:

Reflector layer;

Dielectric layer, it extends throughout described reflector layer, and described reflector layer and described dielectric layer reflection having more than 70% are greater than the incident white light of the wavelength of 550nm; And

Selectively absorbing layers, it extends throughout described dielectric layer, and described selectively absorbing layers absorbs the described incident white light that having more than 70% is less than the wavelength of 550nm;

Described absorption layer, dielectric layer and selectively absorbing layers form omnirange reflecting body, and described omnirange reflecting body reflects the arrowband of such both visible electromagnetic radiation: it has centre wavelength between 550nm to 700nm, be less than the wide width of 100nm and be less than the gamut of 100nm when described omnirange reflecting body is watched by the angle between from 0 and 45 degree.

The pigment colorant of 31. 1 kinds of multilayer laminated forms, described pigment colorant comprises:

Reflector layer;

Dielectric layer, it extends throughout described reflector layer, and described reflector layer and described dielectric layer reflection having more than 70% are greater than the incident white light of the wavelength of 550nm; And

Selectively absorbing layers, it extends throughout described dielectric layer, and described selectively absorbing layers absorbs the described incident white light that having more than 70% is less than the wavelength of 550nm;

Described reflector layer, dielectric layer and selectively absorbing layers form omnirange reflecting body, the reflection of described omnirange reflecting body has the arrowband of the both visible electromagnetic radiation of UV lateral edges and IR spectral edges, and the arrowband of described both visible electromagnetic radiation has the skew being less than the wide width of 200nm and being less than the described UV lateral edges of 100nm when described omnirange reflecting body is watched by the angle between from 0 and 45 degree.