CN104608434B - A low-emissivity film - Google Patents
A low-emissivity film Download PDFInfo
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- 239000010410 layer Substances 0.000 claims abstract description 67
- 230000000737 periodic effect Effects 0.000 claims abstract description 43
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910052709 silver Inorganic materials 0.000 claims abstract description 29
- 239000004332 silver Substances 0.000 claims abstract description 29
- 239000011241 protective layer Substances 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 239000010408 film Substances 0.000 claims description 141
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 26
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 18
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052681 coesite Inorganic materials 0.000 claims description 3
- 229910052906 cristobalite Inorganic materials 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 229910052682 stishovite Inorganic materials 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 229910052905 tridymite Inorganic materials 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 abstract description 40
- 230000005540 biological transmission Effects 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 8
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- 238000000034 method Methods 0.000 abstract description 3
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- 235000014612 sandwich biscuits Nutrition 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
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- 230000000007 visual effect Effects 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/414—Translucent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/42—Polarizing, birefringent, filtering
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Abstract
本发明公开了一种低辐射薄膜，包括基底、覆盖于基底之上的单银层和覆盖于单银层之上的周期性多层膜，薄膜厚度为1325nm～1575.8nm；其中，单银层由两层保护层和Ag膜构成，厚度为29nm～92nm；周期性多层膜由高折射率材料和低折射率材料交替叠加而成，厚度为1275nm～1490nm。本发明公开的低辐射薄膜采用金属薄银层来抑制长波长红外波和短波长紫外波的透射，采用周期性结构来增强可见光波段的透射；对可见光的透射率达到70～96％，对紫外波段的透射率降低到15％、对780nm～1200nm红外波段的透射率降低到10％以下、对1200nm～3000nm红外波段的透射率降低到25％以下，层数显著降低，很大程度上缩减了成本，简化了工艺流程。
The invention discloses a low-radiation film, which comprises a substrate, a single silver layer covering the substrate, and a periodic multilayer film covering the single silver layer, and the thickness of the film is 1325nm-1575.8nm; wherein, the single silver layer It consists of two protective layers and Ag film, with a thickness of 29nm to 92nm; the periodic multilayer film is formed by alternately superimposing high refractive index materials and low refractive index materials, with a thickness of 1275nm to 1490nm. The low-radiation film disclosed by the invention uses a metal thin silver layer to suppress the transmission of long-wavelength infrared waves and short-wavelength ultraviolet waves, and uses a periodic structure to enhance the transmission of visible light bands; the transmittance to visible light reaches 70-96%, and the transmittance to ultraviolet The transmittance of the wavelength band is reduced to 15%, the transmittance of the infrared band from 780nm to 1200nm is reduced to less than 10%, the transmittance of the infrared band from 1200nm to 3000nm is reduced to less than 25%, the number of layers is significantly reduced, and the cost and simplify the process flow.
Description
技术领域technical field
本发明涉及一种薄膜结构，更具体地，涉及一种低辐射薄膜结构。The present invention relates to a thin film structure, more specifically, to a low-radiation thin film structure.
背景技术Background technique
低辐射薄膜(Low-Emissivity Film，Low-E Film)是一种对红外、紫外具有高反射而对可见光具有良好透过率的薄膜，可以实现调节阳光和热力、节约能源、改善环境等功能。Low-Emissivity Film (Low-E Film) is a film with high reflection to infrared and ultraviolet rays and good transmittance to visible light, which can realize functions such as regulating sunlight and heat, saving energy, and improving the environment.
目前市场上已有的低辐射薄膜大致分为：单银低辐射薄膜(Single Low-E Film)、双银低辐射薄膜(Double Low-E Film)和周期性多层低辐射薄膜(Photonic Crystal Low-E Film)；其中，银系低辐射薄膜的可见光透过率仅为50％～80％，且由于银系膜包括保护层、阻挡层、组合层等，对应着不同材料、不同厚度、不同光学性能的膜层，各异的物理化学工艺参数导致在薄膜制造和参数检测上存在困难；Low-E films currently on the market are roughly divided into: Single Silver Low-E Film (Single Low-E Film), Double Silver Low-E Film (Double Low-E Film) and Periodic Multilayer Low-E Film (Photonic Crystal Low-E Film) -E Film); Among them, the visible light transmittance of the silver-based low-emissivity film is only 50% to 80%, and because the silver-based film includes a protective layer, a barrier layer, a combination layer, etc., it corresponds to different materials, different thicknesses, different The film layer with optical properties and different physical and chemical process parameters lead to difficulties in film manufacturing and parameter detection;
周期性多层低辐射薄膜对紫外透射率均值约30％、对红外的透射率在波长800nm～1200nm范围内低于10％，在大于波长1200nm范围内均值约85％，膜层数在30～40层，厚度大；由于周期性多层膜需要反复30多次膜层沉积覆盖，导致制备工艺复杂且生产成本较高。The periodic multi-layer low-emissivity film has an average UV transmittance of about 30%, an infrared transmittance of less than 10% in the wavelength range of 800nm to 1200nm, and an average value of about 85% in the wavelength range of greater than 1200nm. 40 layers, large thickness; since the periodic multilayer film needs to be deposited and covered more than 30 times, the preparation process is complicated and the production cost is high.
发明内容Contents of the invention
针对现有技术的以上缺陷或改进需求，本发明提供了一种低辐射薄膜，其目的在于采用金属薄银层抑制长波长红外波和短波长紫外波的透射，采用周期性多层膜增强可见光波段的透射，提高低辐射薄膜对可见光的透射率,并降低对紫外和红外的透射率。In view of the above defects or improvement needs of the prior art, the present invention provides a low-emissivity film, the purpose of which is to use a thin metal silver layer to suppress the transmission of long-wavelength infrared waves and short-wavelength ultraviolet waves, and to use periodic multilayer films to enhance visible light. The transmission of the wavelength band increases the transmittance of the low-emissivity film to visible light and reduces the transmittance to ultraviolet and infrared.
为实现上述目的，按照本发明的一个方面，提供了一种由TiO2作为保护层的单银层结构与周期性的TiO2/SiO2结构相匹配的结型结构低辐射薄膜，包括基底、覆盖于基底之上的单银层和覆盖于单银层之上的周期性多层膜；In order to achieve the above object, according to one aspect of the present invention, a kind of TiO2 is provided as a single silver layer structure of the protective layer and a periodic TiO2 / SiO2 structure matching junction structure low-emissivity film, including substrate, A single silver layer overlying the substrate and a periodic multilayer film overlying the single silver layer;
其中，单银层为类似夹心饼干的3层结构：中间一层为Ag膜，Ag膜上下两表面分别紧贴一层TiO2保护层；TiO2保护层用于提高Ag膜与其他膜层的附着力，并具有防止Ag膜被氧化腐蚀的作用，同时还具有调节膜系光学性能的作用，体现在降低Ag膜膜面的反射，增强可见光的透射上；Among them, the single silver layer is a three-layer structure similar to sandwich biscuits: the middle layer is Ag film, and the upper and lower surfaces of the Ag film are respectively attached to a TiO 2 protective layer; the TiO 2 protective layer is used to improve the Ag film and other film layers. Adhesion, and has the function of preventing the Ag film from being oxidized and corroded, and also has the function of adjusting the optical properties of the film system, which is reflected in reducing the reflection of the Ag film surface and enhancing the transmission of visible light;
单银层中TiO2保护层厚度在10nm～40nm；随着保护层厚度的增加，可见光透射峰有明显的红移，可以实现对可见光的增透，厚度过薄无法起到保护和连接作用，厚度过厚则会制约可见光高透射；在该厚度范围的TiO2保护层既具有较好的保护作用，又不影响Ag膜的光学特性；The thickness of the TiO 2 protective layer in the single silver layer is between 10nm and 40nm; with the increase of the thickness of the protective layer, the visible light transmission peak has an obvious red shift, which can realize the anti-reflection of visible light, and the thickness is too thin to play the role of protection and connection. If the thickness is too thick, it will restrict the high transmittance of visible light; the TiO2 protective layer in this thickness range not only has a better protective effect, but also does not affect the optical properties of the Ag film;
其中，周期性多层膜为10层结构，是5个TiO2/SiO2结型结构的叠加，所述TiO2/SiO2结型结构为一层TiO2膜上覆盖一层SiO2膜形成的结构；该周期性多层膜结构在可见光380nm～780nm范围内透射率为70～96％，且可见光大部分波段的透射率在85％以上。Among them, the periodic multilayer film has a 10-layer structure, which is the superposition of five TiO 2 /SiO 2 junction structures, and the TiO 2 /SiO 2 junction structure is formed by covering a layer of SiO 2 film on a TiO 2 film The structure; the transmittance of the periodic multilayer film structure in the range of 380nm-780nm of visible light is 70-96%, and the transmittance of most bands of visible light is above 85%.
优选的，低辐射薄膜的厚度为1325nm～1575.8nm，不包括基底的情况下层数为13层，相比于现有技术的低辐射薄膜，显著的减少了层数和厚度。Preferably, the thickness of the low-emissivity film is 1325nm-1575.8nm, and the number of layers is 13 without including the substrate. Compared with the low-emissivity film of the prior art, the number of layers and the thickness are significantly reduced.
优选的，单银层中Ag膜厚度在9.2nm～9.8nm或10nm～12nm；Ag膜在该厚度范围内具有最好的光谱特性，既满足对可见光的高透射，又能起到对紫外和红外辐射的阻挡作用。Preferably, the thickness of the Ag film in the single silver layer is 9.2nm to 9.8nm or 10nm to 12nm; the Ag film has the best spectral characteristics in this thickness range, which not only satisfies the high transmission of visible light, but also plays a role in ultraviolet and The blocking effect of infrared radiation.
优选的，周期性多层膜厚度为1275nm～1490nm。Preferably, the thickness of the periodic multilayer film is 1275nm-1490nm.
优选的，周期性多层膜中TiO2膜的厚度为100nm～117nm。Preferably, the thickness of the TiO 2 film in the periodic multilayer film is 100nm-117nm.
优选的，周期性多层膜中SiO2膜的厚度为155nm～181nm。Preferably, the thickness of the SiO 2 film in the periodic multilayer film is 155nm-181nm.
优选的，周期性多层膜的中心波长λ0为900nm～1050nm；调节周期性多层膜的中心波长可以改变峰值位置和展宽带隙；在该中心波长范围内，实现可见光380nm～780nm范围内为透射谱高峰。Preferably, the central wavelength λ0 of the periodic multilayer film is 900nm to 1050nm; adjusting the central wavelength of the periodic multilayer film can change the peak position and broaden the bandgap; within the central wavelength range, visible light within the range of 380nm to 780nm is the peak of the transmission spectrum.
由于本发明提供的低辐射薄膜的低辐射特性由附着于基底上的单银层和周期性多层膜实现，对于基底无材料类别和厚度限制，可根据应用领域选择，如果为民用，多选用玻璃材料；若为实验室需要，也可以选用其他的透明基底材料。Since the low-emission properties of the low-emission film provided by the present invention are realized by the single silver layer and the periodic multilayer film attached to the substrate, there is no material type and thickness limitation for the substrate, and it can be selected according to the application field. Glass material; if required by the laboratory, other transparent substrate materials can also be used.
总体而言，通过本发明所构思的以上技术方案与现有技术相比，能够取得下列有益效果：Generally speaking, compared with the prior art, the above technical solutions conceived by the present invention can achieve the following beneficial effects:
(1)由于本发明提供的低辐射薄膜的Ag膜厚度在9nm～12nm，在该厚度范围内具有最好的光谱特性，既满足对可见光的高透射，又能起到对紫外和红外辐射的阻挡作用；(1) Since the Ag film thickness of the low-radiation film provided by the present invention is at 9nm～12nm, it has the best spectral characteristics in this thickness range, which not only satisfies the high transmission of visible light, but also plays a role in ultraviolet and infrared radiation. blocking effect;
(2)由于本发明提供的低辐射薄膜的TiO2保护层厚度为10nm～40nm，在该厚度范围的TiO2保护层既具有较好的保护作用，又不影响Ag膜膜层的光学特性；( 2 ) because the TiO of the low-radiation film provided by the present invention The thickness of the protective layer is 10nm～40nm, the TiO in this thickness range The protective layer has a good protective effect, and does not affect the optical properties of the Ag film layer;
(3)由于本发明采用的周期性多层膜具有光子带隙特性，调节中心波长和周期可以改变峰值位置和展宽带隙，使得本发明提供的低辐射薄膜对可见光的透射率达到70～96％，且对可见光大部分波段的透射率在85％以上，相较于现有技术的银系低辐射薄膜50～80％的可见光透射率有显著的提高；相对更高的透射率在自然光采集上具有明显优势；(3) Since the periodic multilayer film adopted in the present invention has photonic bandgap characteristics, adjusting the central wavelength and period can change the peak position and broaden the bandgap, so that the transmittance of the low-emissivity film provided by the present invention to visible light reaches 70 to 96 %, and the transmittance to most bands of visible light is more than 85%, which is significantly improved compared with the 50-80% visible light transmittance of the silver-based low-emissivity film in the prior art; the relatively higher transmittance is collected in natural light have obvious advantages;
(4)由于本发明提供的低辐射薄膜采用单银层与周期性多层膜结合的结构，其中3层结构的单银层主要用于实现对红外和紫外的低辐射，10层结构的周期性多层膜主要用于实现可见光的高透射，与现有技术的周期性多层低辐射薄膜30～40层的层数相比，层数显著降低，很大程度上缩减了成本，简化了膜层沉积工序流程，提高了生产效率；(4) Since the low-radiation film provided by the present invention adopts a structure in which a single silver layer is combined with a periodic multilayer film, the single silver layer of the 3-layer structure is mainly used to realize low radiation to infrared and ultraviolet rays, and the periodicity of the 10-layer structure The periodic multilayer film is mainly used to achieve high transmittance of visible light. Compared with the 30-40 layers of the periodic multilayer low-emissivity film in the prior art, the number of layers is significantly reduced, which greatly reduces the cost and simplifies the process. The film deposition process flow improves the production efficiency;
(5)由于本发明采用的金属Ag膜在对可见光透射的条件下，对于波长较长的红外波具有良好的低透过率特性；且由于采用周期性多层膜与金属Ag膜结合的结构，增强了周期性多层膜对红外和紫外的限制作用；本发明提供的低辐射薄膜与周期性多层膜相比，在紫外、红外波段的透射率有了明显的降低，紫外区域降低约15％，达到15％，对780nm～1200nm红外波段的透射率降低到10％以下、对1200nm～3000nm红外波段的透射率降低60％，达到25％以下，从而起到紫外、红外低辐射的作用；本发明提供的低辐射薄膜在紫外、红外屏蔽，维持膜层两侧紫外和红外辐射差方面具有优异的性能；(5) Because the metal Ag film adopted in the present invention has good low transmittance characteristics for infrared waves with longer wavelengths under the condition of visible light transmission; , which strengthens the confinement effect of the periodic multilayer film on infrared and ultraviolet; compared with the periodic multilayer film, the low-emissivity film provided by the present invention has significantly reduced transmittance in the ultraviolet and infrared bands, and the ultraviolet region has reduced by about 15%, reaching 15%, the transmittance of the infrared band from 780nm to 1200nm is reduced to below 10%, and the transmittance of the infrared band from 1200nm to 3000nm is reduced by 60%, reaching below 25%, thus playing the role of low radiation in ultraviolet and infrared ; The low-emissivity film provided by the present invention has excellent performance in ultraviolet and infrared shielding, maintaining the difference between ultraviolet and infrared radiation on both sides of the film layer;
(6)由于单银层里采用了保护层，将金属Ag膜与基底和周期性多层膜的最底层在不影响光学性能的基础上完美衔接，并起到防止金属Ag膜腐蚀的作用。(6) Since the protective layer is used in the single silver layer, the metal Ag film is perfectly connected with the substrate and the bottom layer of the periodic multilayer film without affecting the optical performance, and it plays a role in preventing the corrosion of the metal Ag film.
附图说明Description of drawings
图1是本发明提供的低辐射薄膜结构示意图；Fig. 1 is the structural representation of the low radiation film provided by the present invention;
图2是本发明实施例1的效果图；Fig. 2 is the effect drawing of embodiment 1 of the present invention;
图3是本发明实施例2的效果图；Fig. 3 is the effect drawing of embodiment 2 of the present invention;
图4是本发明实施例3的效果图；Fig. 4 is the effect drawing of embodiment 3 of the present invention;
图5是本发明实施例4的效果图；Fig. 5 is the effect drawing of embodiment 4 of the present invention;
图6是本发明实施例5的效果图；Fig. 6 is the effect drawing of embodiment 5 of the present invention;
图7是本发明实施例6的效果图；Fig. 7 is the effect drawing of embodiment 6 of the present invention;
图8是本发明实施例7的效果图。Fig. 8 is an effect diagram of Embodiment 7 of the present invention.
在所有附图中，相同的附图标记用来表示相同的元件或结构，其中：A1为SiO2膜，A2为TiO2膜，B1为TiO2保护层，B2为Ag膜。In all drawings, the same reference numerals are used to denote the same elements or structures, wherein: A1 is SiO2 film, A2 is TiO2 film, B1 is TiO2 protective layer, B2 is Ag film.
具体实施方式detailed description
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进行进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。此外，下面所描述的本发明各个实施方式中所涉及到的技术特征只要彼此之间未构成冲突就可以相互组合。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.
如图1所示，本发明提供的低辐射薄膜为13层结构(不包括基底层)，厚度为1325nm～1575.8nm，包括单银层和周期性多层膜层；单银层为类似夹心饼干的结构：中间一层为Ag膜，厚度在9nm～12nm；所述Ag膜上下两表面分别紧贴一层TiO2保护层；TiO2保护层厚度在10nm～40nm；单银层总厚度为29nm～92nm；周期性多层膜为10层结构，即5个TiO2/SiO2结型结构的叠加，其中，一个TiO2/SiO2结型结构为一层SiO2膜上覆盖一层TiO2膜形成的结构，TiO2膜的厚度为100nm～117nm，SiO2膜的厚度为155nm～181nm；周期性多层膜厚度为1275nm～1490nm，中心波长λ0为900nm～1050nm。As shown in Figure 1, the low-radiation film provided by the present invention is a 13-layer structure (excluding the base layer), with a thickness of 1325nm to 1575.8nm, including a single silver layer and a periodic multilayer film layer; the single silver layer is similar to a sandwich biscuit Structure: the middle layer is an Ag film with a thickness of 9nm to 12nm; the upper and lower surfaces of the Ag film are respectively attached to a layer of TiO 2 protective layer; the thickness of the TiO 2 protective layer is 10nm to 40nm; the total thickness of the single silver layer is 29nm ~92nm; the periodic multilayer film has a 10-layer structure, that is, the superposition of 5 TiO 2 /SiO 2 junction structures, and one TiO 2 /SiO 2 junction structure is a layer of SiO 2 film covered with a layer of TiO 2 The structure formed by the film, the thickness of the TiO 2 film is 100nm-117nm, the thickness of the SiO 2 film is 155nm-181nm; the thickness of the periodic multilayer film is 1275nm-1490nm, and the central wavelength λ 0 is 900nm-1050nm.
图1中所示的周期性多层膜结构A中，高折射率膜层TiO2与低折射率膜层SiO2的光学厚度为1/4的设计波长，第一层膜层A1对应的物理厚度为：λ0/4nL，第二层膜层A2对应的物理厚度为：λ0/4nH；其中nH为TiO2膜层A2的折射率，nL为SiO2膜层A1的折射率，周期性多层膜A的λ0为900nm～1050nm。In the periodic multilayer film structure A shown in Fig. 1, the optical thickness of the high-refractive index film layer TiO2 and the low-refractive index film layer SiO2 is 1/4 of the design wavelength, and the corresponding physical The thickness is: λ 0 /4n L , the physical thickness corresponding to the second layer A2 is: λ 0 /4n H ; where n H is the refractive index of TiO 2 film A2, and n L is the refraction of SiO 2 film A1 rate, and the λ 0 of the periodic multilayer film A is 900nm to 1050nm.
以下结合具体实施例做进一步阐述：Do further elaboration below in conjunction with specific embodiment:
实施例1：Example 1:
实施例1提供的低辐射薄膜厚度为1410nm，包括单银层和周期性多层膜，具体的，Ag膜厚度为10nm，TiO2保护层厚度为25nm；周期性多层膜中，TiO2膜厚度为106nm，SiO2膜厚度为164nm；周期性多层膜的中心波长λ0为950nm。The thickness of the low-radiation film provided by embodiment 1 is 1410nm, including a single silver layer and a periodic multilayer film. Specifically, the thickness of the Ag film is 10nm, and the thickness of the TiO2 protective layer is 25nm; in the periodic multilayer film, the TiO2 film The thickness of the SiO 2 film is 106nm, and the thickness of the SiO 2 film is 164nm; the central wavelength λ 0 of the periodic multilayer film is 950nm.
图2所示为本发明实施例1提供的低辐射薄膜的透射率效果图，可见光透过率为70～96％，且可见光大部分波段的透射率在85％以上，紫外区域波段的透射率低于15％，对780nm～1200nm红外波段的透射率低于10％，对1200nm～3000nm红外波段的透射率达到25％。Figure 2 shows the effect diagram of the transmittance of the low-emissivity film provided by Example 1 of the present invention, the transmittance of visible light is 70-96%, and the transmittance of most bands of visible light is above 85%, and the transmittance of ultraviolet region bands The transmittance of the 780nm-1200nm infrared band is lower than 10%, and the transmittance of the 1200nm-3000nm infrared band reaches 25%.
实施例2～7：Embodiment 2～7:
实施例2～7提供的低辐射薄膜包括单银层和周期性多层膜，具体参数如表1所示，实施例2～7提供的低辐射薄膜的各波段透射率如表2所示：The low-emissivity films provided in Examples 2-7 include a single silver layer and a periodic multilayer film, and the specific parameters are as shown in Table 1. The transmittances of the low-emissivity films provided in Examples 2-7 are shown in Table 2:
表1实施例2～7的膜层参数列表The film layer parameter list of table 1 embodiment 2～7
表2实施例2～7的各波段透射率表Table 2 The transmittance table of each band of embodiment 2～7
分析实施例1～7提供的低辐射薄膜对各波段透射率数据发现，金属Ag膜B2厚度为9nm～12nm、保护层B1 TiO2厚度为10nm～40nm和中心波长λ0在900nm～1050nm范围的低辐射薄膜，其透射特性在可控范围内波动，可见光透过率范围为63％～96％，且可见光大部分波段的透射率在80％以上，紫外区域平均透射率为10％～18％，780nm～1200nm红外波段透射率均低于10％，在1200nm～3000nm红外波段平均透射率为18％～27％。Analysis of the low-emissivity films provided by Examples 1 to 7 finds that the transmittance data of each band is that the metal Ag film B2 has a thickness of 9nm to 12nm, the protective layer B1 TiO2 has a thickness of 10nm to 40nm and the central wavelength λ0 is in the range of 900nm to 1050nm Low-emissivity film, its transmittance fluctuates within a controllable range, the transmittance of visible light ranges from 63% to 96%, and the transmittance of most bands of visible light is above 80%, and the average transmittance in the ultraviolet region is 10% to 18%. , 780nm ~ 1200nm infrared band transmittance is lower than 10%, the average transmittance in 1200nm ~ 3000nm infrared band is 18% ~ 27%.
在金属Ag膜B2和保护层B1厚度范围的选取上主要考虑以下因素：金属Ag膜要对可见光的透射率达到最高而对红外、紫外的透射率最低；针对不同厚度的Ag膜进行红外传输特性测试发现，其厚度在9nm～12nm，对可见光透明，且对紫外、红外波段透射降低明显；随着保护层厚度的增加，可见光透射峰有明显的红移，可以实现对可见光的增透，厚度过薄无法起到保护和连接作用，厚度过厚则会制约可见光高透射，所以保护层厚度选择10nm～40nm；The following factors are mainly considered in the selection of the thickness range of the metal Ag film B2 and the protective layer B1: the metal Ag film should have the highest transmittance to visible light and the lowest transmittance to infrared and ultraviolet rays; the infrared transmission characteristics of Ag films with different thicknesses The test found that its thickness is between 9nm and 12nm, it is transparent to visible light, and the transmission of ultraviolet and infrared bands decreases significantly; with the increase of the thickness of the protective layer, the visible light transmission peak has a significant red shift, which can achieve anti-reflection of visible light. If it is too thin, it will not be able to protect and connect, and if it is too thick, it will restrict the high transmission of visible light, so the thickness of the protective layer should be 10nm to 40nm;
在中心波长λ0、周期性膜层A1和A2厚度范围选取上主要考虑以下因素：周期性多层结构在透射光谱中存在一定宽度(nH和nL分别为两种材料的折射率)的透射高峰，这个高峰位置随着中心波长λ0变化而发生移动，若要实现可见光380nm～780nm范围内为透射谱高峰，则中心波长λ0范围为900nm～1050nm；周期性结构材料光学厚度(nd)为中心波长的1/4，即n1d1＝n2d2＝λ0/4，在已知材料折射率n1和n2的情况下，即可确定膜层A1和A2的物理厚度d1和d2的范围。The following factors are mainly considered in the selection of the central wavelength λ 0 and the thickness range of the periodic layers A1 and A2: the periodic multilayer structure has a certain width in the transmission spectrum (n H and n L are the refractive indices of the two materials respectively), the peak position of this peak moves with the change of the central wavelength λ 0 , if it is to realize the peak of the transmission spectrum in the range of 380nm to 780nm for visible light, the central wavelength The range of λ 0 is 900nm～1050nm; the optical thickness (nd) of the periodic structure material is 1/4 of the central wavelength, that is, n 1 d 1 =n 2 d 2 =λ 0 /4, when the refractive index n 1 and In the case of n 2 , the ranges of the physical thickness d 1 and d 2 of the film layers A1 and A2 can be determined.
由图2～8以及表2的数据分析可知，Ag膜厚度在9nm～12nm范围均满足本发明提供的低辐射薄膜的透射要求；TiO2保护层厚度在10nm～40nm范围均满足本发明提供的低辐射薄膜的透射要求；周期性膜层A1和A2在比例不变情况下改变A1和A2的厚度，在中心波长在900nm～1050nm范围，即低折射率膜层SiO2膜厚度在155nm～181nm、高折射率膜层TiO2膜厚度在100nm～117nm范围，均满足本发明提供的低辐射薄膜的透射要求。From Fig. 2～8 and the data analysis of table 2 , it can be seen that the Ag film thickness meets the transmission requirements of the low-emissivity film provided by the present invention in the range of 9nm～12nm; The transmission requirements of low-emissivity films; the periodic film layers A1 and A2 change the thickness of A1 and A2 under the condition of constant ratio, and the central wavelength is in the range of 900nm-1050nm, that is, the thickness of the low-refractive index film layer SiO 2 is 155nm-181nm 1. The thickness of the TiO 2 film of the high refractive index film layer is in the range of 100nm to 117nm, all of which meet the transmission requirements of the low-emissivity film provided by the present invention.
本发明提供的低辐射薄膜可用在民用玻璃的表面，起到调节居室温度和节能环保的作用；还可用作建筑物幕墙，起到消除光污染的作用；还可用在汽车玻璃上，在不影响驾驶员视觉观察的前提上减少对车内的热量辐射，提高车内舒适度，同时减少内部空调热量与外界的交换，达到节约资源的目的；另外，在医用照明灯设计中，本发明提供的低辐射薄膜可以消除红外、紫外对医疗手术灯环境的光污染；在实验室科研、工厂生产条件下，可以对特定设备进行低红外、紫外的保护，以提高实验效果；总的来说，在需要尽量隔绝红外、紫外，又需要可视或者利用可见光的场合，本发明提供的低辐射薄膜是很好的选择，且相关性能越好，其利用价值越大。The low-emissivity film provided by the invention can be used on the surface of civil glass to regulate room temperature and energy saving and environmental protection; it can also be used as a building curtain wall to eliminate light pollution; it can also be used on automobile glass without affecting On the premise of the driver's visual observation, the heat radiation to the car can be reduced, the comfort in the car can be improved, and the heat exchange between the internal air conditioner and the outside world can be reduced, so as to achieve the purpose of saving resources; in addition, in the design of medical lighting lamps, the invention provides The low-emissivity film can eliminate infrared and ultraviolet light pollution to the environment of medical operation lamps; under the conditions of laboratory research and factory production, it can protect specific equipment with low infrared and ultraviolet to improve the experimental effect; in general, when needed The low-emissivity film provided by the present invention is a good choice for the occasions where infrared and ultraviolet are isolated as much as possible and visible or visible light is required, and the better the related performance is, the greater its utilization value is.
本领域的技术人员容易理解，以上所述仅为本发明的较佳实施例而已，并不用以限制本发明，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。Those skilled in the art can easily understand that the above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention, All should be included within the protection scope of the present invention.
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