CN104592935A - Accelerator used in grinding hard material - Google Patents
Accelerator used in grinding hard material Download PDFInfo
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- CN104592935A CN104592935A CN201510000557.XA CN201510000557A CN104592935A CN 104592935 A CN104592935 A CN 104592935A CN 201510000557 A CN201510000557 A CN 201510000557A CN 104592935 A CN104592935 A CN 104592935A
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Abstract
The invention discloses an accelerator used in grinding a hard material. The accelerator comprises the following components in parts by weight: 4-16 parts of an alcohol amine compound, 4-40 parts of an alcohol compound, 1-10 parts of polyacrylate, 10-50 parts of an acrylate polymer, 3-17 parts of a surfactant, 1-15 parts of a cellulosic polymer and 2-27 parts of water and has a pH value of 7-13. The accelerator has better suspension dispersion effect on a large-particle friction agent so that the prepared grinding fluid is difficult to deposit to the bottom of the machine during the circular processing, the chemical interaction between the grinding fluid and sapphire wafers can be enhanced, the hydration of the surface of the wafer is effectively promoted, the interfacial damage layer caused by the purely mechanical effect of the wafer is reduced and thus the grinding removal rate is greatly improved and the production efficiency is significantly increased.
Description
Technical field
The present invention relates to mechanically resistant material field of milling, particularly relate to a kind of mechanically resistant material grinding accelerator.
Background technology
On Vehicles Collected from Market, the grinding of the mechanically resistant material such as sapphire mainly adopts macrobead (5 ~ 100 μm) norbide, silicon carbide, cubic zirconia, boron nitride, aluminum oxide, quartz sand, Brown Alundum, silicon carbide or diamond dust as friction agent, adding certain dispersion agent, the lapping liquid of viscosity modifier preparation carries out attrition process.Lapping liquid due to the method preparation mainly relies on the high rigidity of friction agent, and the size of particle diameter controls the clearance of grinding, act as master with physical mechanical, clearance is lower, and darker affected layer easily appears in material surface, thus yield rate can be reduced and increase difficulty for rear road polishing.
Summary of the invention
The technical problem that the present invention mainly solves is to provide a kind of mechanically resistant material grinding accelerator, this accelerator has good suspended dispersed for macrobead friction agent on the one hand, most importantly macrobead friction agent can be allowed effectively to stick to abrasive disk surface, the centrifugal force that not easily the high rotating speed of polished dish brings throws away, effective and the material surface contact of friction agent can be made, greatly improve mechanical friction effect, and prevent material surface directly to contact brought scuffing with grinding cast iron plate, the chemical action with material can also be strengthened, effective promotion surface hydration, match with the physical mechanical effect of friction agent, promote grinding clearance, promote working (machining) efficiency, reduce costs.
For solving the problems of the technologies described above, the technical scheme that the present invention adopts is: provide a kind of mechanically resistant material grinding accelerator, this accelerator comprises alcohol amine compound, alcohol compound, polyacrylate, acrylic ester polymer, tensio-active agent, cellulose polymer compound and water, pH value is 7 ~ 13, the weight part of its each component is: alcohol amine compound 4 ~ 16 parts, alcohol compound 4 ~ 40 parts, polyacrylate 1 ~ 10 part, acrylic ester polymer 10 ~ 50 parts, 3 ~ 17 parts, tensio-active agent, cellulose polymer compound 1 ~ 15 part and 2 ~ 27 parts, water.
In a preferred embodiment of the present invention, described alcohol amine compound comprises thanomin and trolamine, and the weight proportion of thanomin and trolamine is 1:1.
In a preferred embodiment of the present invention, described alcohol compound comprises polyoxyethylene glycol, propylene glycol and polyvinyl alcohol, and the weight proportion of polyoxyethylene glycol, propylene glycol and polyvinyl alcohol is 1:1:2.
In a preferred embodiment of the present invention, described tensio-active agent is nonyl phenol polyethenoxy ether.
In a preferred embodiment of the present invention, described cellulose polymer compound is Natvosol.
In a preferred embodiment of the present invention, described polyacrylate is sodium polyacrylate.
In a preferred embodiment of the present invention, described acrylic ester polymer is acrylic acid and acrylic ester copolymers.
Mechanically resistant material grinding accelerator of the present invention can be used in the grinding of sapphire, silicon carbide wafer, zirconia ceramics or stainless steel mechanically resistant material.
The invention has the beneficial effects as follows: the present invention has good suspended dispersed effect for macrobead friction agent, joined lapping liquid is made not easily to deposit to robot base in the process of cyclic process, and macrobead friction agent can be allowed effectively to stick to abrasive disk surface, the centrifugal force that not easily the high rotating speed of polished dish brings throws away, thus make the effective and material surface contact of friction agent, greatly improve mechanical friction effect, and prevent material surface directly to contact brought scuffing with grinding cast iron plate, and the chemical action that can strengthen between the material such as lapping liquid and sapphire, effective promotion material surface aquation, the interface damage layer that lightening material causes because of pure physical mechanical effect, thus improve grinding clearance greatly, production efficiency is greatly improved.
Embodiment
Be clearly and completely described to the technical scheme in the embodiment of the present invention below, obviously, described embodiment is only a part of embodiment of the present invention, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making other embodiments all obtained under creative work prerequisite, belong to the scope of protection of the invention.
Embodiment 1
The preparation of mechanically resistant material grinding accelerator: take each raw material according to weight proportion, in 15 parts of water, adds 5 parts of thanomins successively, 5 parts of trolamines, 10 parts of polyoxyethylene glycol, 10 parts of propylene glycol, 15 parts of polyvinyl alcohol, 3 parts of sodium polyacrylates, 30 parts of acrylic acid and acrylic ester copolymers, 5 parts of nonyl phenol polyethenoxy ethers, 2 parts of Natvosols, after stirring, add nitric acid or sodium hydroxide solution adjust ph is 8.5.
Prepare four portions of lapping liquids, A, B, C, D:
0 part, 10 parts, 20 parts, 30 parts accelerators are respectively added in 85 parts, 75 parts, 65 parts, 55 parts water, respectively add the norbide that 15 parts of particle diameters are 320 orders (40 ~ 50 μm) after stirring, add nitric acid or sodium hydroxide solution after stirring and regulate pH to be 7.5.
Ground on the brilliant YJ2M16B-5L twin grinder of space by obtained sample, press down: 0.5psi, upper lower burrs rotating speed is 50RPM, lapping liquid flow: 300mL/min, and abrasive disk is cast iron plate, and grinding wafers is sapphire sheet.After grinding, sapphire sheet surface tear detects and is naked eyes, higher owing to grinding rear wafer surface roughness, slightly scratches invisible, and the scuffing standard shown in detected result is macroscopic severe and scratches.
This sapphire grinding and polishing the results are shown in Table 1.
Table 1
As can be seen from Table 1, along with the increase of accelerator content, sapphire grinding clearance is in rising trend, and surface tear reduces.
Embodiment 2
The preparation of mechanically resistant material grinding accelerator: take each raw material according to weight proportion, in 2 parts of water, adds 8 parts of thanomins successively, 8 parts of trolamines, 1 part of polyoxyethylene glycol, 1 part of propylene glycol, 2 parts of polyvinyl alcohol, 10 parts of sodium polyacrylates, 50 parts of acrylic acid and acrylic ester copolymers, 17 parts of nonyl phenol polyethenoxy ethers, 1 part of Natvosol, after stirring, add nitric acid or sodium hydroxide solution adjust ph is 8.5.
Prepare four portions of lapping liquids, A, B, C, D:
0 part, 10 parts, 20 parts, 30 parts accelerators are respectively added in 85 parts, 75 parts, 65 parts, 55 parts water, respectively add the norbide that 15 parts of particle diameters are 320 orders (40 ~ 50 μm) after stirring, add nitric acid or sodium hydroxide solution after stirring and regulate pH to be 7.5.
Ground on the brilliant YJ2M16B-5L twin grinder of space by obtained sample, press down: 0.5psi, upper lower burrs rotating speed is 50RPM, lapping liquid flow: 300mL/min, and abrasive disk is cast iron plate, and grinding wafers is sapphire sheet.After grinding, sapphire sheet surface tear detects and is naked eyes, higher owing to grinding rear wafer surface roughness, slightly scratches invisible, and the scuffing standard shown in detected result is macroscopic severe and scratches.
This sapphire grinding and polishing the results are shown in Table 2.
Table 2
As can be seen from Table 2, along with the increase of accelerator content, sapphire grinding clearance is in rising trend, and surface tear reduces, but acceleration amplification decreases relative to embodiment 1.
Embodiment 3
The preparation of mechanically resistant material grinding accelerator: take each raw material according to weight proportion, in 27 parts of water, adds 2 parts of thanomins successively, 2 parts of trolamines, 10 parts of polyoxyethylene glycol, 10 parts of propylene glycol, 20 parts of polyvinyl alcohol, 1 part of sodium polyacrylate, 10 parts of acrylic acid and acrylic ester copolymers, 3 parts of nonyl phenol polyethenoxy ethers, 15 parts of Natvosols, after stirring, add nitric acid or sodium hydroxide solution adjust ph is 8.5.
Prepare four portions of lapping liquids, A, B, C, D:
0 part, 10 parts, 20 parts, 30 parts accelerators are respectively added in 85 parts, 75 parts, 65 parts, 55 parts water, respectively add the norbide that 15 parts of particle diameters are 320 orders (40 ~ 50 μm) after stirring, add nitric acid or sodium hydroxide solution after stirring and regulate pH to be 7.5.
Ground on the brilliant YJ2M16B-5L twin grinder of space by obtained sample, press down: 0.5psi, upper lower burrs rotating speed is 50RPM, lapping liquid flow: 300mL/min, and abrasive disk is cast iron plate, and grinding wafers is sapphire sheet.After grinding, sapphire sheet surface tear detects and is naked eyes, higher owing to grinding rear wafer surface roughness, slightly scratches invisible, and the scuffing standard shown in detected result is macroscopic severe and scratches.
This sapphire grinding and polishing the results are shown in Table 3.
Table 3
As can be seen from Table 3, along with the increase of accelerator content, sapphire grinding clearance is in rising trend, and surface tear reduces, and accelerates amplification and reduces further relative to embodiment 2.
Embodiment 4
The preparation of mechanically resistant material grinding accelerator: take each raw material according to weight proportion, in 15 parts of water, adds 5 parts of thanomins successively, 5 parts of trolamines, 10 parts of polyoxyethylene glycol, 10 parts of propylene glycol, 15 parts of polyvinyl alcohol, 3 parts of sodium polyacrylates, 30 parts of acrylic acid and acrylic ester copolymers, 5 parts of nonyl phenol polyethenoxy ethers, 2 parts of Natvosols, after stirring, add nitric acid or sodium hydroxide solution adjust ph is 8.5.
Prepare four portions of lapping liquids, A, B, C, D:
0 part, 10 parts, 20 parts, 30 parts accelerators are respectively added in 85 parts, 75 parts, 65 parts, 55 parts water, respectively add the norbide that 15 parts of particle diameters are 320 orders (40 ~ 50 μm) after stirring, add nitric acid or sodium hydroxide solution after stirring and regulate pH to be 7.5.
Ground on the brilliant YJ2M16B-5L twin grinder of space by obtained sample, press down: 0.5psi, upper lower burrs rotating speed is 50RPM, lapping liquid flow: 300mL/min, and abrasive disk is cast iron plate, and grinding wafers is silicon carbide wafer.After grinding, sapphire sheet surface tear detects and is naked eyes, higher owing to grinding rear wafer surface roughness, slightly scratches invisible, and the scuffing standard shown in detected result is macroscopic severe and scratches.
This silicon carbide wafer grinding and polishing result 4.
Table 4
As can be seen from Table 4, along with the increase of accelerator content, silicon carbide whisker slice lapping clearance is in rising trend, and surface tear reduces.
Embodiment 5
The preparation of mechanically resistant material grinding accelerator: take each raw material according to weight proportion, in 15 parts of water, adds 5 parts of thanomins successively, 5 parts of trolamines, 10 parts of polyoxyethylene glycol, 10 parts of propylene glycol, 15 parts of polyvinyl alcohol, 3 parts of sodium polyacrylates, 30 parts of acrylic acid and acrylic ester copolymers, 5 parts of nonyl phenol polyethenoxy ethers, 2 parts of Natvosols, after stirring, add nitric acid or sodium hydroxide solution adjust ph is 8.5.
Prepare four portions of lapping liquids, A, B, C, D:
0 part, 10 parts, 20 parts, 30 parts accelerators are respectively added in 85 parts, 75 parts, 65 parts, 55 parts water, respectively add the norbide that 15 parts of particle diameters are 320 orders (40 ~ 50 μm) after stirring, add nitric acid or sodium hydroxide solution after stirring and regulate pH to be 7.5.
Ground on the brilliant YJ2M16B-5L twin grinder of space by obtained sample, press down: 0.5psi, upper lower burrs rotating speed is 50RPM, lapping liquid flow: 300mL/min, and abrasive disk is cast iron plate, and grinding wafers is zirconia ceramics sheet.After grinding, sapphire sheet surface tear detects and is naked eyes, higher owing to grinding rear wafer surface roughness, slightly scratches invisible, and the scuffing standard shown in detected result is macroscopic severe and scratches.
This zirconia ceramics slice lapping polish results is in table 5.
Table 5
As can be seen from Table 5, along with the increase of accelerator content, zirconia ceramics slice lapping clearance is in rising trend, and surface tear reduces.
Embodiment 6
The preparation of mechanically resistant material grinding accelerator: take each raw material according to weight proportion, in 15 parts of water, adds 5 parts of thanomins successively, 5 parts of trolamines, 10 parts of polyoxyethylene glycol, 10 parts of propylene glycol, 15 parts of polyvinyl alcohol, 3 parts of sodium polyacrylates, 30 parts of acrylic acid and acrylic ester copolymers, 5 parts of nonyl phenol polyethenoxy ethers, 2 parts of Natvosols, after stirring, add nitric acid or sodium hydroxide solution adjust ph is 8.5.
Prepare four portions of lapping liquids, A, B, C, D:
0 part, 10 parts, 20 parts, 30 parts accelerators are respectively added in 85 parts, 75 parts, 65 parts, 55 parts water, respectively add the norbide that 15 parts of particle diameters are 320 orders (40 ~ 50 μm) after stirring, add nitric acid or sodium hydroxide solution after stirring and regulate pH to be 7.5.
Ground on the brilliant YJ2M16B-5L twin grinder of space by obtained sample, press down: 0.5psi, upper lower burrs rotating speed is 50RPM, lapping liquid flow: 300mL/min, and abrasive disk is cast iron plate, and grinding wafers is stainless steel substrates.After grinding, sapphire sheet surface tear detects and is naked eyes, higher owing to grinding rear wafer surface roughness, slightly scratches invisible, and the scuffing standard shown in detected result is macroscopic severe and scratches.
This stainless steel substrates grinding and polishing the results are shown in Table 6.
Table 6
As can be seen from Table 6, along with the increase of accelerator content, stainless-steel grinding clearance is in rising trend, and surface tear reduces.
The present invention has good suspended dispersed effect for macrobead friction agent, joined lapping liquid is made not easily to deposit to robot base in the process of cyclic process, and macrobead friction agent can be allowed effectively to stick to abrasive disk surface, the centrifugal force that not easily the high rotating speed of polished dish brings throws away, thus make the effective and material surface contact of friction agent, greatly improve mechanical friction effect, and prevent material surface directly to contact brought scuffing with grinding cast iron plate, and the chemical action that can strengthen between lapping liquid and material, effective promotion wafer surface aquation, the interface damage layer that lightening material causes because of pure physical mechanical effect, thus improve grinding clearance greatly, production efficiency is greatly improved.
The foregoing is only embodiments of the invention; not thereby the scope of the claims of the present invention is limited; every utilize description of the present invention to do equivalent structure or equivalent flow process conversion; or be directly or indirectly used in other relevant technical field, be all in like manner included in scope of patent protection of the present invention.
Claims (8)
1. a mechanically resistant material grinding accelerator, it is characterized in that, this accelerator comprises alcohol amine compound, alcohol compound, polyacrylate, acrylic ester polymer, tensio-active agent, cellulose polymer compound and water, pH value is 7 ~ 13, and the weight part of its each component is: alcohol amine compound 4 ~ 16 parts, alcohol compound 4 ~ 40 parts, polyacrylate 1 ~ 10 part, acrylic ester polymer 10 ~ 50 parts, 3 ~ 17 parts, tensio-active agent, cellulose polymer compound 1 ~ 15 part and 2 ~ 27 parts, water.
2. mechanically resistant material grinding accelerator according to claim 1, it is characterized in that, described alcohol amine compound comprises thanomin and trolamine, and the weight proportion of thanomin and trolamine is 1:1.
3. mechanically resistant material grinding accelerator according to claim 1, it is characterized in that, described alcohol compound comprises polyoxyethylene glycol, propylene glycol and polyvinyl alcohol, and the weight proportion of polyoxyethylene glycol, propylene glycol and polyvinyl alcohol is 1:1:2.
4. mechanically resistant material grinding accelerator according to claim 1, is characterized in that, described tensio-active agent is nonyl phenol polyethenoxy ether.
5. mechanically resistant material grinding accelerator according to claim 1, is characterized in that, described cellulose polymer compound is Natvosol.
6. mechanically resistant material grinding accelerator according to claim 1, is characterized in that, described polyacrylate is sodium polyacrylate.
7. mechanically resistant material grinding accelerator according to claim 1, is characterized in that, described acrylic ester polymer is acrylic acid and acrylic ester copolymers.
8. mechanically resistant material grinding accelerator according to claim 1, is characterized in that, described accelerator is used for the grinding of sapphire, silicon carbide wafer, zirconia ceramics or stainless steel mechanically resistant material.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105111942A (en) * | 2015-09-10 | 2015-12-02 | 郑州磨料磨具磨削研究所有限公司 | Micro-crystallization sapphire polishing solution |
| CN105950115A (en) * | 2016-05-13 | 2016-09-21 | 盐城工学院 | Environment-friendly abrasive paste suitable for gallium oxide substrate and preparation method of environment-friendly abrasive paste |
| CN107057641A (en) * | 2016-12-31 | 2017-08-18 | 东莞市淦宏信息科技有限公司 | A kind of special-purpose grinding fluid of synthetic sapphire camera eyeglass |
| CN109988507A (en) * | 2017-12-29 | 2019-07-09 | 上海新安纳电子科技有限公司 | A kind of chemical mechanical polishing liquid for zirconia ceramics and its preparation method and use |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105111942A (en) * | 2015-09-10 | 2015-12-02 | 郑州磨料磨具磨削研究所有限公司 | Micro-crystallization sapphire polishing solution |
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| CN107057641A (en) * | 2016-12-31 | 2017-08-18 | 东莞市淦宏信息科技有限公司 | A kind of special-purpose grinding fluid of synthetic sapphire camera eyeglass |
| CN109988507A (en) * | 2017-12-29 | 2019-07-09 | 上海新安纳电子科技有限公司 | A kind of chemical mechanical polishing liquid for zirconia ceramics and its preparation method and use |
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