CN104587936B - Photochemical reaction system - Google Patents

Abstract

The invention discloses a photochemical reaction system, which comprises an LED photochemical engine, a chemical reaction container, a control unit, a reaction sensor and a reaction unit, wherein the control unit is electrically connected with the LED photochemical engine, the chemical reaction container and the reaction sensor, controls the starting, the stopping and the adjustment of the LED photochemical engine and controls the circulation of the reaction unit in the chemical reaction container through the control unit, and the etching and deposition degrees in the chemical reaction container are fed back to the control unit through the reaction sensor; the reaction unit at least comprises a first reactant and a second reactant, the first reactant is used as a substrate needing etching and deposition, and the second reactant is used as a solvent for etching and depositing the first reactant; the first reactant is soaked in the second reactant.

Description

A photochemical reaction system

technical field

The invention relates to the technical fields of semiconductor and photochemistry, in particular to a photochemical reaction system.

Background technique

The so-called photochemical reaction refers to the chemical reaction caused by the absorption of a photon by an atom, molecule, free radical or ion. Commonly used photochemical reactions are carried out using light waves with wavelengths below 400 nanometers and above 800 nanometers, that is, ultraviolet and infrared rays as invisible light.

Indium tin oxide (ITO) is a transparent conductive oxide semiconductor material with stable chemical properties, excellent light transmission, and good electrical conductivity. It is widely used in solar cells, flat panel displays, frost-proof glass, energy-saving building windows, and aviation fields. Applications.

The ITO film acts as a transparent conductive film on the LED epitaxial wafer, and the roughness of the ITO surface is of great help to the improvement of the brightness. In order to achieve this roughness, it is traditionally necessary to etch ITO after applying photoresist, and after heat treatment with a high content of oxygen > 100 sccm at a temperature of 100°C to 600°C, the surface of ITO will locally accumulate into sub-particles of indium oxide and tin oxide , and then etch indium oxide or/and tin oxide with a corresponding solvent to achieve roughness.

In addition to energy consumption, high-temperature heating is often accompanied by harm to the body after the raw liquid volatilizes after heating, which cannot meet the requirements of modern enterprises for environmentally friendly production and reduces the competitiveness of enterprises.

Contents of the invention

The technical problem to be solved in the present invention is to provide a photochemical reaction system for the above-mentioned deficiencies in the prior art, which realizes etching and deposition processing using visible light LEDs without heating, and achieves energy saving, environmental protection, and pure effects, and is harmless to the human body. Harmful.

In order to solve the above-mentioned technical problems, the technical scheme adopted by the present invention is: a kind of photochemical reaction system, comprises LED photochemical engine, chemical reaction container, control unit, reaction sensor and reaction unit, and this control unit and described LED photochemical engine, chemical The reaction container and the reaction sensor are electrically connected, and the control unit controls the start-stop and adjustment of the LED photochemical engine, and controls the circulation of the reaction unit in the chemical reaction container, and the chemical reaction is controlled by the reaction sensor. The etching and deposition levels in the container are fed back to the control unit; the reaction unit includes at least a first reactant and a second reactant, the first reactant serves as the substrate to be etched and deposited, and the first reactant The second reactant is used as a solvent for etching and depositing the first reactant; the first reactant is soaked in the second reactant.

In the above technical solution, the reaction sensor uses the first reactant or the second reactant as an object, and uses an electron microscope, a mass spectrometer or an optical transceiver as a way to conduct etching and deposition to the control unit. feedback; and the reaction sensor is disposed outside or inside the chemical reaction vessel.

In the above technical solution, the chemical reaction container is further communicated with a delivery pipeline, and the delivery pipeline communicates with a plurality of reaction sub-containers.

In the above technical solution, the wavelength of light used by the LED photochemical engine is 400 nanometers to 800 nanometers.

In the above technical solution, the second reactant is acid liquid, which is oxalic acid or phosphoric acid.

The beneficial effects of the present invention are: the first reactant is etched and deposited by using the LED photochemical engine to perform an excited state reaction on the first reactant, and the second reactant reacts with the element generated by the excited state reaction. Etching and deposition of semiconductors can be carried out without high temperature heating, which is beneficial to energy saving and environmental protection. And do not produce substances harmful to the human body, and the safety is guaranteed. There will also be no impurities attached to the first reactants, so that the first reactants that are etched and deposited are relatively pure.

Description of drawings

Fig. 1 is a structural schematic diagram of the present invention.

In the figure, 1. LED photochemical engine; 2. Chemical reaction container; 3. First reactant; 4. Second reactant; 5. Delivery pipeline; 6. Valve; 7. Reactor container.

detailed description

The present invention will be described in further detail below in conjunction with the accompanying drawings.

As shown in Figure 1, a kind of photochemical reaction system comprises LED photochemical engine 1, chemical reaction container 2, control unit, reaction sensor and reaction unit, and this control unit and described LED photochemical engine 1, chemical reaction container 2, reaction sensor Electrically connected, and through the control unit to control the start-stop and adjustment of the LED photochemical engine 1, and to control the flow of the reaction unit in the chemical reaction container 2, through the reaction sensor to the chemical reaction container 2 The etching and deposition levels are fed back to the control unit; the reaction unit includes at least a first reactant 3 and a second reactant 4, the first reactant 3 serves as the substrate to be etched and deposited, the The second reactant 4 is used as a solvent for etching and depositing the first reactant 3 ; the first reactant 3 is immersed in the second reactant 4 .

Wherein, the LED photochemical engine 1 can be composed of one or more LEDs connected in series or in parallel, and the use of LEDs can save energy and increase working stability. The irradiation range of the LED photochemical engine 1 to the first reactant 3 is limited to the part where the first reactant 3 is soaked.

Wherein, the chemical reaction container 2 can be a chemical reaction tank, a chemical reaction chamber or a chemical reaction chamber. Since the present invention does not need to use high temperature heating, the stock solution will not volatilize, and the chemical reaction tank can be used to facilitate operation.

Wherein, the reaction sensor uses the first reactant 3 or the second reactant 4 as an object, and uses an electron microscope, a mass spectrometer or an optical transceiver as a way to provide feedback on the degree of etching and deposition to the control unit and the reaction sensor is arranged outside or inside the chemical reaction container 2 . The etching and deposition degree on the surface of the substrate is observed by electron microscope and fed back to the control unit. The detection light wave is emitted to the surface of the substrate through the light transmitter of the optical transceiver, and then reflected to the corresponding light receiver, and the etching degree of the substrate surface is judged according to the strength of the reflected detection light wave, forming etching, and detecting the light wave Diffuse reflection will occur at the position of etching and deposition, so that the detection light wave received by the light receiver is weakened, and the degree of attenuation is marked as the degree of etching and deposition. When the detection light wave received by the light receiver is weakened. The mass spectrometer can measure the composition of the first reactant 3 or the second reactant 4, and transmit it to the control unit, and the control unit analyzes and compares the composition data before the reaction, so as to realize whether the required etching and deposition levels are achieved.

Wherein, the chemical reaction container 2 is also communicated with a conveying pipeline 5 , and the conveying pipeline 5 communicates with a plurality of reaction sub-containers 7 . Different reactants are stored in the plurality of reaction sub-containers 7 , and a valve 6 controlled by the control unit is arranged between the reaction sub-containers 7 and the delivery pipeline 5 .

Wherein, the light wavelength used by the LED photochemical engine 1 is 400 nm to 800 nm. The wavelength of light from 400 nm to 800 nm is visible light.

Wherein, the second reactant 4 is an acid solution, such as oxalic acid or phosphoric acid.

Working principle of the present invention, embodiment: the first reactant 3 is ITO, and the second reactant 4 is the above-mentioned oxalic acid or phosphoric acid. The LED photochemical engine 1 is vertically arranged in the chemical reaction tank, the first reactant 3 is vertically hung in the chemical reaction tank, and a plurality of LEDs on the LED photochemical engine 1 shines on the surface of the first reactant 3 in parallel, The wavelength of the irradiated light wave uses visible light. When the light wave is irradiated on the surface of the first reactant 3, the indium and tin elements will generate excited state indium molecules or tin molecules, and the indium molecules or tin molecules will leave the surface of the first reactant 3 and React with the second reactant 4 to cause etching on the surface of the first reactant 3 . Then, the reaction sensor performs feedback on the etching and deposition degree on the surface of the first reactant 3, and the control unit will control the LED photochemical engine 1, the chemical reaction tank and the valve 6 to perform corresponding actions after receiving the feedback data. For example, the second reactants 4 are discharged and poured into clean water for cleaning, and after cleaning, different reactants are injected to carry out chain etching, deposition or subsequent processes.

The above embodiments are only intended to illustrate rather than limit the present invention, so all equivalent changes or modifications made according to the methods described in the scope of the patent application of the present invention are included in the scope of the patent application of the present invention.

Claims (5)

1. A kind of photochemical reaction system, it is characterized in that: comprise LED photochemical engine, chemical reaction container, control unit, reaction sensor and reaction unit, this control unit is electrically connected with described LED photochemical engine, chemical reaction container, reaction sensor, And through the control unit to control the start-stop and adjustment of the LED photochemical engine, and to control the circulation of the reaction unit in the chemical reaction container, the reaction sensor is used to control the etching and deposition levels in the chemical reaction container. The control unit performs feedback; the reaction unit includes at least a first reactant and a second reactant, the first reactant serves as the substrate to be etched and deposited, and the second reactant serves as The solvent of the first reactant; the first reactant is soaked in the second reactant. 2. A kind of photochemical reaction system according to claim 1, characterized in that: the reaction sensor uses the first reactant or the second reactant as an object, and uses an electron microscope, a mass spectrometer or an optical transceiver as an object. The method is to provide feedback to the control unit for the degree of etching and deposition; and the reaction sensor is arranged outside or inside the chemical reaction container. 3. A photochemical reaction system according to claim 1, characterized in that: the chemical reaction container is also connected with a delivery pipeline, and the delivery pipeline is connected with a plurality of reaction sub-containers. 4 . The photochemical reaction system according to claim 1 , wherein the wavelength of light used by the LED photochemical engine is 400 nanometers to 800 nanometers. 5. A photochemical reaction system according to claim 1, characterized in that: the second reactant is acid liquid, which is oxalic acid or phosphoric acid.