[go: up one dir, main page]

CN104384647B - For the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit - Google Patents

For the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit Download PDF

Info

Publication number
CN104384647B
CN104384647B CN201410531662.1A CN201410531662A CN104384647B CN 104384647 B CN104384647 B CN 104384647B CN 201410531662 A CN201410531662 A CN 201410531662A CN 104384647 B CN104384647 B CN 104384647B
Authority
CN
China
Prior art keywords
quartz substrate
indium
schottky diode
substrate thin
small schottky
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201410531662.1A
Other languages
Chinese (zh)
Other versions
CN104384647A (en
Inventor
宋志明
曹乾涛
王斌
李红伟
吴红
莫秀英
李万荣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CETC 41 Research Institute
Original Assignee
CETC 41 Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CETC 41 Research Institute filed Critical CETC 41 Research Institute
Priority to CN201410531662.1A priority Critical patent/CN104384647B/en
Publication of CN104384647A publication Critical patent/CN104384647A/en
Application granted granted Critical
Publication of CN104384647B publication Critical patent/CN104384647B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Engineering & Computer Science (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

本发明公开了用于超小肖特基二极管与石英基片薄膜电路吻合焊接方法,包括:在铟铅焊膏中选取锡珠在加热台上融成一个铟铅焊球;在石英基片薄膜电路的焊盘上点上助焊剂,助焊剂用于将要放在石英薄膜电路焊盘上的铟铅焊球粘住;将铟铅焊球放在石英基片薄膜电路的焊盘上,并且将铟铅焊球墩平;超小肖特基二极管放在墩平化的铟铅焊球上;通过加热台加热铟铅焊球将超小肖特基二极管与石英基片薄膜电路的焊盘熔焊在一起;对熔焊时形成的焊点进行检验,并且对超小肖特基二极管与石英基片薄膜电路的焊接进行电学测试。本发明方法简单,成本低廉,可行性强,并且有效的解决来只能采用昂贵的倒装焊接设备来焊接超小肖特基二极管的问题。

The invention discloses a welding method for an ultra-small Schottky diode and a quartz substrate thin film circuit. Point soldering flux on the soldering pad of the circuit, and the soldering flux is used to stick the indium-lead soldering ball to be placed on the soldering pad of the quartz thin-film circuit; place the indium-lead soldering ball on the soldering pad of the quartz substrate thin-film circuit, and place The indium-lead solder balls are flattened; the ultra-small Schottky diodes are placed on the flattened indium-lead solder balls; the ultra-small Schottky diodes are fused with the solder pads of the quartz substrate thin-film circuit by heating the indium-lead solder balls through the heating stage Solder together; inspect the solder joints formed during fusion welding, and conduct electrical tests on the welding of ultra-small Schottky diodes and quartz substrate thin-film circuits. The method of the invention is simple, low in cost and strong in feasibility, and effectively solves the problem that only expensive flip-chip welding equipment can be used to weld ultra-small Schottky diodes.

Description

用于超小肖特基二极管与石英基片薄膜电路吻合焊接方法A welding method for ultra-small Schottky diodes and thin-film circuits on quartz substrates

技术领域technical field

本发明涉及一种用于超小肖特基二极管与石英基片薄膜电路吻合焊接的方法。The invention relates to a method for coincident welding of an ultra-small Schottky diode and a thin film circuit of a quartz substrate.

背景技术Background technique

THz频段位于微波和红外之间,是一个非常重要的交叉前沿领域。由于其具有宽频带、窄脉冲、强穿透性及保密性好等特点,被广泛用于雷达、RCS特性缩比测试、射电天文、卫星通讯、安全检测和无损检测等领域,具有非常重要的经济和社会意义。The THz frequency band is located between microwave and infrared, and is a very important cross-frontier field. Due to its characteristics of wide frequency band, narrow pulse, strong penetration and good confidentiality, it is widely used in the fields of radar, RCS characteristic scaling test, radio astronomy, satellite communication, safety testing and non-destructive testing, etc., and has very important economic and social significance.

基于超薄微带片的太赫兹部件,具有集成度高、易生产和可靠性高等优势而得到广泛应用,但在具体的实现上首先要解决的一个关键工艺问题是如何实现超薄石英基片薄膜电路精密微组装。超薄石英基片薄膜电路精密微组装技术即通过人工或机械方法,实现微米量级安装误差的组装。肖特基二极管、石英基片均需要通过微组装工艺组装到金属腔体中,主要包括两步:一是石英基片薄膜电路与金属腔体的导电胶粘接;二是肖特基二极管与石英基片薄膜电路的锡焊互联。其中肖特基二极管的安装是整个工艺的关键点,直接决定太赫兹部件能否正常工作,在安装的过程中稍有不慎就会使得二极管短路。肖特基二极管长度在微米量级(大小一般在300μm×100μm),厚度一般在50μm甚至更薄,而且石英基片薄膜电路的厚度、焊盘宽度和焊盘间隔均在50μm量级,很难采用常规的方法进行焊接,因此肖特基二极管在石英基片薄膜电路上的焊接制约着整个太赫兹部件的发展。Terahertz components based on ultra-thin microstrips have been widely used due to their advantages of high integration, easy production and high reliability. However, a key process problem to be solved in the specific implementation is how to realize ultra-thin quartz substrates. Precision microassembly of thin-film circuits. Ultra-thin quartz substrate thin-film circuit precision micro-assembly technology is to realize the assembly of micron-level installation errors through manual or mechanical methods. Both the Schottky diode and the quartz substrate need to be assembled into the metal cavity through a micro-assembly process, which mainly includes two steps: one is the bonding of the thin film circuit of the quartz substrate to the conductive adhesive of the metal cavity; the other is the bonding of the Schottky diode with the metal cavity Soldering interconnection of thin film circuits on quartz substrates. Among them, the installation of Schottky diode is the key point of the whole process, which directly determines whether the terahertz components can work normally, and a little carelessness in the installation process will cause the diode to short circuit. The length of Schottky diodes is on the order of microns (the size is generally 300 μm × 100 μm), and the thickness is generally 50 μm or even thinner, and the thickness, pad width and pad spacing of the quartz substrate thin film circuit are all on the order of 50 μm. Conventional methods are used for welding, so the welding of Schottky diodes on the quartz substrate thin-film circuit restricts the development of the entire terahertz component.

在关于超小肖特基二极管与石英基片薄膜电路的吻合焊接方法上,专利申请号201010135506.5揭示了采用在二极管的背面粘贴一双面具有粘性的导电胶膜来实现二极管与引线框架的封装;专利申请号200710307524.5揭示了采用在二极管的焊盘上植一个金凸块来实现二极管与引线框架引脚互联的封装。Regarding the welding method of ultra-small Schottky diodes and quartz substrate thin-film circuits, patent application number 201010135506.5 discloses that a conductive adhesive film with double-sided stickiness is pasted on the back of the diode to realize the packaging of the diode and the lead frame; Patent application No. 200710307524.5 discloses a package in which a gold bump is planted on the pad of the diode to realize the interconnection between the diode and the lead frame pins.

专利申请号201010135506.5揭示了采用在二极管的背面粘贴一双面具有粘性的导电胶膜来实现二极管与引线框架的封装,此种方法也是肖特基二极管与基片封装普遍采用的方法。但这种方法的缺点是由于在封装时采用了掺有金属元素的导电薄膜,封装完成后二极管不管在散热特性还是在电学特性等方面要比钎焊封装的方法差很多;另一方面,由于肖特基二极管的焊盘太小,不易切割和焊盘大小一致的导电胶膜,而且容易造成二极管的短路。Patent application number 201010135506.5 discloses that a conductive adhesive film with double-sided adhesiveness is pasted on the back of the diode to realize the packaging of the diode and the lead frame. This method is also commonly used in the packaging of Schottky diodes and substrates. However, the disadvantage of this method is that due to the use of a conductive film doped with metal elements during packaging, the diode is much worse than the method of brazing packaging in terms of heat dissipation and electrical characteristics after packaging; on the other hand, due to The bonding pad of the Schottky diode is too small, it is difficult to cut the conductive adhesive film with the same size as the bonding pad, and it is easy to cause a short circuit of the diode.

另外,专利申请号200710307524.5揭示了采用在二极管的焊盘上植一个金凸块来实现二极管与引线框架引脚互联的封装,此种方法虽然让器件具有良好的导热性能及电学性能,但金凸块的制备需要昂贵的设备,而且金凸块与引线框架的焊接也不易操作。In addition, patent application No. 200710307524.5 discloses a package in which a gold bump is planted on the pad of the diode to realize the interconnection between the diode and the lead frame pins. Although this method allows the device to have good thermal conductivity and electrical performance, the gold bump The preparation of the bumps requires expensive equipment, and the soldering of the gold bumps to the lead frame is not easy to handle.

因此,需要开发一种新的简单易行的超小肖特基二极管与石英基片薄膜电路焊接的方法,不仅能够实现超小肖特基二极管与石英基片薄膜电路的无缺陷焊接,而且要解决焊接过程中不易操作的问题,并且要有很高的适用性。Therefore, it is necessary to develop a new simple method for welding ultra-small Schottky diodes and quartz substrate thin-film circuits, which can not only realize the defect-free welding of ultra-small Schottky diodes and quartz substrate thin-film circuits, but also requires Solve the problem of difficult operation in the welding process, and have high applicability.

发明内容Contents of the invention

为解决现有技术存在的不足,本发明公开了一种用于超小肖特基二极管与石英基片薄膜电路吻合焊接的方法,本发明的目的在于提供一种简单的方法来实现对超小肖特基二极管与石英基片薄膜电路的焊接,解决目前超小肖特基二极管与石英基片薄膜电路不易焊接的问题。In order to solve the deficiencies in the prior art, the present invention discloses a method for coincident welding of ultra-small Schottky diodes and quartz substrate thin-film circuits. The purpose of the present invention is to provide a simple method to realize the The welding of the Schottky diode and the thin-film circuit of the quartz substrate solves the problem that the current ultra-small Schottky diode and the thin-film circuit of the quartz substrate are not easy to weld.

为实现上述目的,本发明的具体方案如下:To achieve the above object, the specific scheme of the present invention is as follows:

用于超小肖特基二极管与石英基片薄膜电路吻合焊接方法,包括以下步骤:A welding method for an ultra-small Schottky diode and a quartz substrate thin-film circuit, comprising the following steps:

步骤一:在铟铅焊膏中选取2-4个铟铅焊珠在直流加热台上融成一个铟铅焊球,选取铟铅锡珠的数量要与超小肖特基二极管的焊盘的面积相匹配;Step 1: Select 2-4 indium-lead solder beads in the indium-lead solder paste and melt them into an indium-lead solder ball on a DC heating table. The area matches;

步骤二:在石英基片薄膜电路的焊盘上点上免清洗助焊剂;Step 2: Apply no-clean flux on the pad of the quartz substrate thin film circuit;

步骤三:将步骤一融成的铟铅焊球放在步骤二中点上助焊剂的石英基片薄膜电路的焊盘上,并且将铟铅焊球墩平;Step 3: Put the indium-lead soldering ball fused in step 1 on the welding pad of the quartz substrate thin-film circuit with flux on the middle point of step 2, and flatten the indium-lead soldering ball;

步骤四:把超小肖特基二极管放在墩平化的铟铅焊球上;Step 4: Place the ultra-small Schottky diode on the flattened indium-lead solder ball;

步骤五:通过直流加热台加热铟铅焊球将超小肖特基二极管与石英基片薄膜电路的焊盘熔焊在一起;Step 5: Heating indium-lead solder balls through a DC heating table to weld the ultra-small Schottky diode and the pad of the quartz substrate thin film circuit together;

步骤六:对步骤五熔焊时形成的焊点进行检验,并且对超小肖特基二极管与石英基片薄膜电路的焊接进行电学测试。Step 6: inspect the solder joints formed during the fusion welding in step 5, and conduct an electrical test on the welding of the ultra-small Schottky diode and the thin-film circuit of the quartz substrate.

所述步骤一中选取锡珠的数量与超小肖特基二极管的焊盘的面积相匹配,具体指锡珠熔成的铟铅焊球要能占满超小肖特基二极管焊盘的3/4。In said step one, the number of tin beads is selected to match the area of the pad of the ultra-small Schottky diode, specifically referring to the fact that the indium-lead solder balls formed by the melting of the tin beads should be able to occupy 30% of the pad of the ultra-small Schottky diode. /4.

所述步骤一中锡珠形成铟铅焊球的过程中,要求加热台的温度在210℃~220℃,时间在5S以内把形成的铟铅焊球移开加热台。In the process of forming indium-lead solder balls from tin beads in the first step, the temperature of the heating stage is required to be 210° C. to 220° C., and the formed indium-lead solder balls are removed from the heating stage within 5 seconds.

所述步骤一中铟铅焊球的直径大小在30μm~50μm;The diameter of the indium-lead solder ball in the step 1 is 30 μm to 50 μm;

所述步骤二中在石英基片薄膜电路的焊盘上点上助焊剂,具体为采用针尖在石英基片薄膜电路的焊盘上点上一滴助焊剂。In said step 2, spot flux on the welding pad of the quartz substrate thin-film circuit, specifically, use a needle tip to spot a drop of flux on the welding pad of the quartz substrate thin-film circuit.

所述步骤三中把融成的铟铅焊球通过镊子放在石英基片薄膜电路微带片的焊盘上,并且采用镊子把铟铅焊球墩平;把铟铅焊球墩平是为了保证超小肖特基二极管与石英基片薄膜电路有良好的接触。In the described step 3, the indium-lead soldering balls melted into are placed on the soldering pads of the quartz substrate film circuit microstrip sheet by tweezers, and the indium-lead soldering balls are flattened with tweezers; the indium-lead soldering balls are flattened for Ensure that the ultra-small Schottky diodes are in good contact with the thin-film circuit on the quartz substrate.

所述步骤五中熔焊时要求焊接的温度在230℃~245℃,焊接的时间在5S以内把焊好超小肖特基二极管的石英基片薄膜电路微带片移走。The fusion welding in the step 5 requires the welding temperature to be 230° C. to 245° C., and the welding time is within 5 seconds to remove the quartz substrate thin-film circuit microstrip that has welded the ultra-small Schottky diode.

所述步骤六中,首先要对焊点进行X光检测,来观察焊点是否有空洞缺陷;其次再进行电学性能测试时,因为超小肖特基二极管的焊盘很小,要在测试的探针上锡焊上18mm的金丝后再测试超小肖特基二极管的电学特性。In said step 6, firstly, X-ray detection will be carried out on the solder joints to observe whether there are void defects in the solder joints; secondly, when performing electrical performance testing, because the pads of the ultra-small Schottky diodes are very small, it is necessary to test the solder joints. Solder 18mm gold wire on the probe and then test the electrical characteristics of the ultra-small Schottky diode.

所述超小肖特基二极管主要用在实现太赫兹微波特性的太赫兹电路中。The ultra-small Schottky diode is mainly used in a terahertz circuit realizing terahertz microwave characteristics.

本发明的有益效果:Beneficial effects of the present invention:

本发明的目的是利用铟铅焊膏熔球的方法来有效解决超小肖特基二极管不易焊接到石英基片薄膜电路的问题。通过把加热台熔化形成的铟铅焊球放在石英薄膜电路的焊盘上,然后再把超小肖特基二极管对应放在焊球上,最后通过加热台加热实现两者的焊接,解决了超小肖特基二极管与石英基片薄膜电路不易焊接的问题。由于采用了简易的熔球方法来实现焊接,从而避免了采用昂贵的设备来完成两者的倒装焊接,降低了成本,提高了超小肖特基二极管焊接的成品率,并且此方法具有普遍的适用性。The purpose of the invention is to effectively solve the problem that ultra-small Schottky diodes are not easy to be welded to quartz substrate film circuits by using the method of indium-lead solder paste melting balls. Put the indium-lead solder balls formed by melting the heating table on the pads of the quartz thin film circuit, then place the ultra-small Schottky diodes on the solder balls, and finally heat the heating table to realize the welding of the two, and solve the problem The problem that the ultra-small Schottky diode and the thin-film circuit of the quartz substrate are not easy to weld. Due to the simple melting ball method to achieve welding, it avoids the use of expensive equipment to complete the flip-chip welding of the two, reduces the cost, and improves the yield of ultra-small Schottky diode welding, and this method has universal applicability.

采用铟铅焊膏熔球的方法,有效解决了超薄芯片不易焊接的问题,成本低廉,可行性强;铟铅焊球直接通过采用选取铟铅焊膏里的焊锡珠通过加热形成,方法简单,适用范围广。The method of melting balls of indium-lead solder paste effectively solves the problem that ultra-thin chips are not easy to solder, with low cost and strong feasibility; indium-lead solder balls are directly formed by heating solder beads in indium-lead solder paste, and the method is simple ,Wide range of applications.

附图说明Description of drawings

图1为本发明提供的一种用于超小肖特基二极管与石英基片薄膜电路吻合焊接的方法流程图;Fig. 1 is a kind of method flowchart that is used for ultra-small Schottky diode and quartz substrate film circuit anastomosis welding provided by the present invention;

图2为本发明提供的一种用于超小肖特基二极管与石英基片薄膜电路吻合焊接的方法工艺示意图。FIG. 2 is a schematic diagram of a method for coincident welding of an ultra-small Schottky diode and a quartz substrate thin-film circuit provided by the present invention.

具体实施方式:detailed description:

下面结合附图对本发明进行详细说明:The present invention is described in detail below in conjunction with accompanying drawing:

为使本发明的目的、技术方案和优点更加清楚明白,以下结合具体实施例,并参照附图,对本发明的超小肖特基二极管与石英基片薄膜电路吻合焊接的方法作进一步详细说明。In order to make the object, technical solution and advantages of the present invention clearer, the method for welding the ultra-small Schottky diode and the quartz substrate thin film circuit of the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

如图1所示,一种用于超小肖特基二极管与石英基片薄膜电路吻合焊接的方法,该方法包括以下步骤:首先在铟铅焊膏中选取4-5颗锡珠在加热台上融成一个小铟铅焊球,然后在石英基片薄膜电路的焊盘上点上助焊剂,目的是通过助焊剂把后面要放在石英薄膜电路焊盘上的铟铅焊球粘住,同时把融成的铟铅焊球通过镊子放在微带片的焊盘上,并且采用镊子轻轻的把铟铅焊球墩平;其次把超小肖特基二极管放在墩平的铟铅焊球上,通过加热的方法把肖特基二极管与石英基片薄膜焊接在一起;就是先把加热台的温度调整到230-240度,然后把有焊球的石英基片先放到加热台上,然后再把肖特基二极管反口到石英基片的焊盘,焊球融化就把两者融化在一起了。最后对焊点进行检验,并且对肖特基二极管与石英薄膜的焊接进行电学测试。As shown in Fig. 1, a kind of method that is used for super-small Schottky diode and quartz substrate thin-film circuit conformal welding, this method comprises the following steps: first select 4-5 tin beads in the indium-lead solder paste on the heating stage Melt into a small indium-lead solder ball, and then put flux on the pad of the quartz substrate thin-film circuit, the purpose is to stick the indium-lead solder ball that will be placed on the pad of the quartz thin-film circuit through the flux, At the same time, place the fused indium lead solder ball on the pad of the microstrip sheet through tweezers, and use the tweezers to gently flatten the indium lead solder ball; secondly, place the ultra-small Schottky diode on the flat indium lead solder ball On the solder ball, the Schottky diode and the quartz substrate film are welded together by heating; that is, first adjust the temperature of the heating table to 230-240 degrees, and then put the quartz substrate with the solder ball on the heating table first Then put the Schottky diode back on the pad of the quartz substrate, and the melting of the solder ball will melt the two together. Finally, the solder joints are inspected, and the electrical test is carried out on the welding of the Schottky diode and the quartz film.

其中形成铟铅焊球采用的加热温度为210℃~220℃,时间控制在5S左右;对超小肖特基二极管与石英薄膜电路的焊接采用的温度为230℃~245℃,焊接的时间控制在5S左右,整个焊接过程的工艺示意图如图2所示。Among them, the heating temperature used to form indium-lead solder balls is 210°C-220°C, and the time is controlled at about 5S; the temperature used for welding ultra-small Schottky diodes and quartz thin film circuits is 230°C-245°C, and the welding time is controlled At about 5S, the schematic diagram of the entire welding process is shown in Figure 2.

图2是超小肖特基二极管与石英基片薄膜电路吻合焊接的工艺示意图,其中:Fig. 2 is a schematic diagram of welding process of an ultra-small Schottky diode and a thin-film circuit of a quartz substrate, wherein:

1为在铟铅焊膏中选取4-5颗锡珠在加热台上融成一个小铟铅焊球;要求要根据超小肖特基二极管的焊盘大小来决定从铟铅焊膏中选取锡珠的个数,锡珠熔成的铟铅焊球要能占满超小肖特基二极管焊盘的3/4,并且在锡珠形成铟铅焊球中,要求加热台的温度在210℃~220℃,时间控制在5S左右;1 is to select 4-5 tin beads in the indium-lead solder paste and melt them into a small indium-lead solder ball on the heating table; it is required to determine the selection from the indium-lead solder paste according to the pad size of the ultra-small Schottky diode The number of tin beads, the indium-lead solder balls formed by tin beads must be able to occupy 3/4 of the pads of ultra-small Schottky diodes, and in the formation of indium-lead solder balls by tin beads, the temperature of the heating table is required to be at 210 ℃~220℃, the time is controlled at about 5S;

2为石英薄膜电路的焊盘;2 is the pad of the quartz thin film circuit;

3为在石英基片薄膜电路的焊盘上点上助焊剂,要求要采用针尖在石英基片薄膜电路的焊盘上点上一滴助焊剂;3 In order to apply flux on the pad of the quartz substrate thin film circuit, it is required to use a needle tip to point a drop of flux on the pad of the quartz substrate thin film circuit;

4为用镊子把铟铅焊球放在石英薄膜电路的焊盘上,要求要用镊子把铟铅焊球墩平;4. To place the indium-lead solder balls on the pads of the quartz thin-film circuit with tweezers, it is required to use tweezers to flatten the indium-lead solder balls;

5为把超小肖特基二极管通过镊子放在墩平的铟铅焊球上进行焊接,要求焊接的温度为230℃~245℃,焊接的时间控制在5S左右。5. In order to solder the ultra-small Schottky diodes on the flat indium-lead solder balls through tweezers, the soldering temperature is required to be 230°C to 245°C, and the soldering time is controlled at about 5S.

综上所述,本发明的用于超小肖特基二极管与石英基片薄膜电路吻合焊接的方法中,由于采用通过铟铅焊膏中的焊珠形成铟铅焊球的方法来实现对肖特基二极管与石英基片薄膜电路的吻合倒装焊接,方法简单,成本低廉,可行性强,并且有效的解决来只能采用昂贵的倒装焊接设备来焊接超小肖特基二极管的问题,适用范围广。To sum up, in the method for welding ultra-small Schottky diodes and quartz substrate thin-film circuits of the present invention, due to the method of forming indium-lead solder balls through solder beads in indium-lead solder paste to achieve alignment The coincident flip-chip welding of Tertky diodes and quartz substrate thin-film circuits is simple, low-cost, and highly feasible, and effectively solves the problem that only expensive flip-chip welding equipment can be used to weld ultra-small Schottky diodes. Wide range of applications.

Claims (7)

1., for the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit, it is characterized in that, comprise the following steps:
Step one: choosing 2-4 indium slicker solder pearl in indium lead welding cream and melt into an indium lead welding ball on DC heating platform, the quantity choosing indium slicker solder pearl to match with the area of the pad of extra small Schottky diode;
Step 2: no-clean scaling powder on putting on the pad of quartz substrate thin flm circuit;
Step 3: indium lead welding ball step one melted is placed on the pad of quartz substrate thin flm circuit of scaling powder on step 2 midpoint, and indium lead welding ball pier is put down;
Step 4: extra small Schottky diode is placed on the indium lead welding ball of pier graduation;
Step 5: heat indium lead welding ball by DC heating platform and the pad of extra small Schottky diode Yu quartz substrate thin flm circuit is welded together;
Step 6: the solder joint formed during to step 5 melting welding is tested, and the pad of extra small Schottky diode Yu quartz substrate thin flm circuit is carried out electrical testing;
The area choosing the quantity of indium slicker solder pearl and the pad of extra small Schottky diode in described step one matches, and refers specifically to the indium lead welding ball that indium slicker solder pearl is melt into and wants to take the 3/4 of extra small Schottky diode pad;
In described step one, indium slicker solder pearl is formed in the process of indium lead welding ball, it is desirable to the temperature of warm table is at 210 DEG C~220 DEG C, and the time controls within 5S.
2. as claimed in claim 1 for the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit, it is characterized in that, in described step one, the diameter of indium lead welding ball is at 30 μm~50 μm.
3. as claimed in claim 1 for the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit, it is characterized in that, scaling powder on putting on the pad of quartz substrate thin flm circuit in described step 2, is specially employing needle point and puts a scaling powder on the pad of quartz substrate thin flm circuit.
4. as claimed in claim 1 for the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit, it is characterized in that, described step 3 is placed on, by tweezers, the indium lead welding ball melted on the pad of quartz substrate thin flm circuit, and adopts tweezers that indium lead welding ball pier is put down.
5. as claimed in claim 1 for the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit, it is characterized in that, requiring during melting welding in described step 5 that the temperature welded is at 230 DEG C~245 DEG C, the time of welding controls within 5S.
6. as claimed in claim 1 for the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit, it is characterized in that, in described step 6, butt welding point carries out X-ray check, observes whether solder joint has cavity blemish.
7. as claimed in claim 1 for the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit, it is characterized in that, in described step 6, when carrying out electrical performance testing, on the probe of test in soldering length be 18mm spun gold after the electrology characteristic of the extra small Schottky diode of re-test.
CN201410531662.1A 2014-10-10 2014-10-10 For the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit Expired - Fee Related CN104384647B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410531662.1A CN104384647B (en) 2014-10-10 2014-10-10 For the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410531662.1A CN104384647B (en) 2014-10-10 2014-10-10 For the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit

Publications (2)

Publication Number Publication Date
CN104384647A CN104384647A (en) 2015-03-04
CN104384647B true CN104384647B (en) 2016-06-29

Family

ID=52602656

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410531662.1A Expired - Fee Related CN104384647B (en) 2014-10-10 2014-10-10 For the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit

Country Status (1)

Country Link
CN (1) CN104384647B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105719977A (en) * 2015-05-28 2016-06-29 中国电子科技集团公司第四十一研究所 Interconnection method for buckling terahertz Schottky diode and quartz film circuit
JP6673268B2 (en) * 2017-03-14 2020-03-25 オムロン株式会社 Management device, control method of management device, information processing program, and recording medium
CN112687570B (en) * 2020-12-28 2023-02-28 中国电子科技集团公司第十三研究所 Test method for testing welding performance of welding pad of ceramic shell

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5818697A (en) * 1997-03-21 1998-10-06 International Business Machines Corporation Flexible thin film ball grid array containing solder mask
JP2000077842A (en) * 1998-08-31 2000-03-14 Matsushita Electric Ind Co Ltd Soldering method and structure
US20070284412A1 (en) * 2006-05-31 2007-12-13 Prakash Anna M Solder flux composition
US20080157303A1 (en) * 2006-12-28 2008-07-03 Advanced Chip Engineering Technology Inc. Structure of super thin chip scale package and method of the same
CN101807531A (en) * 2010-03-30 2010-08-18 上海凯虹电子有限公司 Ultra-thin chip packaging method and packaged body
KR20130017511A (en) * 2011-08-11 2013-02-20 서울과학기술대학교 산학협력단 Low temperature joining method using pb-free solder nanoparticles
CN104078371A (en) * 2013-03-29 2014-10-01 天水天光半导体有限责任公司 Reballing method for inverted packaging of semiconductor integrated circuit or discrete device

Also Published As

Publication number Publication date
CN104384647A (en) 2015-03-04

Similar Documents

Publication Publication Date Title
JP2012174332A (en) Conductive jointing material, method of jointing conductor, and method of manufacturing semiconductor
CN104384647B (en) For the identical welding method of extra small Schottky diode and quartz substrate thin flm circuit
CN102136436B (en) Welding column welding method for integrated circuit package
TWI443761B (en) Manufacturing method for flip chip packaging
CN108109949B (en) A chip packaging method and packaging structure
CN110289340A (en) Flip-chip LED chip bonding pad and preparation method thereof
CN103926430A (en) Through-silicon via patch board testing method
JPWO2021019877A1 (en) How to manufacture electronic component equipment
Lee et al. Sn58Bi Solder Interconnection for Low‐Temperature Flex‐on‐Flex Bonding
CN105033387B (en) It is a kind of to weld the preparation method for pulling out pin
US8342385B2 (en) Process for mapping formic acid distribution
CN105719977A (en) Interconnection method for buckling terahertz Schottky diode and quartz film circuit
CN116844982A (en) Encapsulation method of photo MOS relay
US11942432B2 (en) Method for packaging COF
CN112242477A (en) Easy-to-solder flip-chip Mini/Micro-LED chip, preparation method and packaging method thereof
CN105693094B (en) A kind of pre-burning low-melting sealing glass piece and preparation method thereof
TW200836315A (en) Electronic package structure and method thereof
Nakamura et al. Dynamic characteristics evaluation on NCF under challenging conditions and its application
JP6995621B2 (en) Electrical connection tape
Xinmeng et al. Effect of Solder Particle Size on the Mechanical and Thermal Reliability of Au/Sn Ag Cu/Cu Solder Joints
Li et al. Research on Packaging Reliability of LTCC High Density Packaging Substrate with High-CTE
Kieler et al. Development of flip-chip technology for the optical drive of superconducting circuits
KR101214061B1 (en) Method of manufacturing electric connecting structure using low price anisotropic conductive paste
CN104752402A (en) Meltback lifting inversion meltback welding process method used for infrared detector
TWI299400B (en) Method of bump test

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160629

Termination date: 20201010

CF01 Termination of patent right due to non-payment of annual fee