CN104309222A - Novel single-silver LOW-E coated glass - Google Patents

Abstract

A novel single-silver LOW-E coated glass comprises a glass substrate, wherein Si is sequentially arranged on the upper surface of the glass substrate from bottom to top_xN_yBase film layer, first TiO_xA film layer, a first AZO barrier layer, an Ag layer, a NiCr barrier layer, a second AZO barrier layer, and a second TiO_xFilm layer, and Si_xN_yA top film layer. The invention has better cohesiveness and mechanical strength, and can prolong the storage life.

Description

A new type of single silver LOW-E coated glass

Technical field:

The invention relates to a novel single silver LOW-E coated glass.

Background technique:

LOW-E glass is a high-end low-emissivity glass, which is a film system product composed of multi-layer metals and other compounds coated on the surface of the glass substrate. However, the existing LOW-E glass has poor film adhesion and poor mechanical strength, and is prone to quality defects such as peeling and oxidation. At the same time, the NiCr film layer is used as a barrier layer between the upper and lower surfaces of the Ag layer, which is easy to drop slag and cannot protect the Ag layer, so that the longest shelf life of LOW-E glass is only 6 months.

Therefore, it is necessary to improve the existing Low-E glass to provide a Low-E coated glass with better adhesion, better mechanical strength, and prolong shelf life.

Invention content:

The object of the present invention is to provide a novel single-silver LOW-E coated glass, which has better adhesion and better mechanical strength, and can prolong the shelf life.

A new type of single-silver LOW-E coated glass, including a glass substrate, the upper surface of the glass substrate is sequentially provided with a Six _{N y} base film layer, a first TiO _x film layer, a first AZO barrier layer, Ag layer, NiCr barrier layer, second AZO barrier layer, second TiO _x film layer, and Six _{N y} top film layer.

The present invention can be improved by following scheme:

The thickness of the Six _{N y} base film layer and the Six _{N y} top film layer is 20-35 nm.

The thickness of the first TiO _x film layer is 15-25 nm, and the thickness of the second TiO _x film layer is 25-35 nm.

The thickness of the first AZO barrier layer is 8-15 nm, and the thickness of the second AZO barrier layer is 15-30 nm.

The thickness of the Ag layer is 4-8nm.

The thickness of the NiCr barrier layer is 1-5 nm.

The _Six N _y base film layer and the _Six N _y top film layer are Si ₃ N ₄ protective layers.

The present invention has the following advantages: 1. Utilize _{Six Ny} as the base film layer and the top film layer, so that the film layer has better adhesion and better mechanical strength; meanwhile, utilize _TiOx to improve the light transmittance of glass, The first AZO barrier layer is used under the Ag layer, and the NiCr barrier layer and the second AZO barrier layer are used above the Ag layer. The AZO barrier layer has strong adhesion and is not easy to drop slag, which can better protect the Ag layer. The shelf life of LOW-E glass can be extended to 7-8 months. 2. The transmittance of this glass is ≥50%, the emissivity is ≤0.10, the reflectance is ≤15, and the shading coefficient SC is ≤0.43; the color of this glass is light blue, and the following color coordinate values can be measured by a colorimeter: a* =-2 to -3, b*=-6 to -7, good optical performance.

Description of drawings:

Fig. 1 is a cross-sectional view of the structure of the present invention.

Detailed ways:

As shown in the figure, a novel single-silver LOW-E coated glass includes a glass substrate 1, the upper surface of the glass substrate 1 is sequentially provided with a Six _{N y} base film layer 2, a first TiO _x film layer 3 , first AZO barrier layer 4 , Ag layer 5 , NiCr barrier layer 6 , second AZO barrier layer 7 , second TiO _x film layer 8 , and Six _{Ny top} film layer 9 .

Further, the thickness of the Six _{N y} base film layer 2 is 20-35 nm. It adopts the magnetron sputtering coating process, and uses AC intermediate frequency power supply, argon as the sputtering gas, and nitrogen as the reactive gas to sputter the silicon-aluminum target (silicon-aluminum mass percentage 92:8), where the argon-nitrogen ratio is ( 400SCCM～420SCCM): (450SCCM～500SCCM), the ratio of argon and nitrogen is the core of the film layer, which determines the quality of the film.

Still further, the thickness of the first TiO _x film layer 3 is 15-25 nm. It adopts the magnetron sputtering coating process and is prepared by using AC intermediate frequency power supply, argon as the sputtering gas and oxygen as the reaction gas to shoot ceramic titanium targets. Among them, the ratio of argon to oxygen is (400SCCM～420SCCM): ), the argon-oxygen ratio is the core of the film.

Furthermore, the thickness of the first AZO barrier layer 4 is 8-15 nm. It adopts magnetron sputtering coating process, sputters ceramic Zn (AZO) target with intermediate frequency AC power supply, uses argon as sputtering gas, and mixes a small amount of oxygen. Among them, the ratio of argon to oxygen is: (400SCCM～420SCCM) : (20~40SCCM). To pave the way for the Ag layer 5 to reduce the emissivity.

Still further, the thickness of the Ag layer 5 is 4-8 nm. It adopts the magnetron sputtering coating process, and it is prepared by sputtering a silver target with a DC power supply and using argon as a sputtering gas, and the gas flow rate is 500-550 SCCM.

Still further, the NiCr barrier layer 6 has a thickness of 1-5 nm. It adopts the magnetron sputtering coating process, and is prepared by sputtering nickel-chromium alloy with a DC power supply and using argon as the sputtering gas.

Still further, the thickness of the second AZO barrier layer 7 is 15-30 nm. It adopts magnetron sputtering coating process, sputters ceramic Zn (AZO) target with intermediate frequency AC power supply, uses argon as sputtering gas, and mixes a small amount of oxygen. Among them, the ratio of argon to oxygen is: (400SCCM～420SCCM) : (20~40SCCM).

Still further, the thickness of the second TiO _x film layer 8 is 25-35 nm. It adopts the magnetron sputtering coating process and is prepared by using AC intermediate frequency power supply, argon as the sputtering gas and oxygen as the reaction gas to shoot the ceramic titanium target. The ratio of argon to oxygen is (400SCCM～420SCCM): (50SCCM～60SCCM ), the argon-oxygen ratio is the core of the film.

Still further, the thickness of the Six _{N y} top film layer 9 is 20-35 nm. It adopts the magnetron sputtering coating process, and uses AC intermediate frequency power supply, argon as the sputtering gas, and nitrogen as the reactive gas to sputter the silicon-aluminum target (silicon-aluminum mass percentage 92:8), where the argon-nitrogen ratio is ( 400SCCM～420SCCM): (450SCCM～500SCCM), the ratio of argon and nitrogen is the core of the film layer, which determines the quality of the film.

Specifically, the _Six N _y base film layer 2 and the _Six N _y top film layer 9 are Si ₃ N ₄ protective layers.

The present invention utilizes _{Six Ny} as the base film layer and the top film layer, so that the film layer has better cohesiveness and better mechanical strength; at the same time, _TiOx is used to improve the light transmittance of the glass, and the first layer is used under the Ag layer. AZO barrier layer, NiCr barrier layer and the second AZO barrier layer are used on the Ag layer. The AZO barrier layer has strong adhesion and is not easy to drop slag, which can better protect the Ag layer and can be used for LOW-E glass The storage period is extended to 7-8 months. In addition, the transmittance of the present invention is ≥50%, the emissivity is ≤0.10, the reflectance is ≤15, and the shading coefficient SC is ≤0.43; the color of the present invention appears light blue, and the following color coordinate values can be measured by a colorimeter: a* =-2 to -3, b*=-6 to -7, good optical performance.

The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the implementation scope of the present invention. All equivalent changes and modifications made according to the scope of the patent of the present invention fall within the scope covered by the patent of the present invention.

Claims (7)

1. A novel single silver LOW-E coated glass, comprising a glass base material, is characterized in that: the upper surface of the glass base material is successively provided with a _Six N _y base film layer, the first TiO _x film layer, first AZO barrier layer, Ag layer, NiCr barrier layer, second AZO barrier layer, second TiO _x film layer, and Six _{N y} top film layer. 2. A new type of single-silver LOW-E coated glass according to claim 1, characterized in that: the thickness of the Six _{N y} base film layer and the _Six N _y top film layer is 20-35 nm. 3. A novel single-silver LOW-E coated glass according to claim 1, characterized in that: the thickness of the first TiO _x film layer is 15-25 nm, and the thickness of the second TiO _x film layer is 25 nm. ~35nm. 4. A new type of single silver LOW-E coated glass according to claim 1, characterized in that: the thickness of the first AZO barrier layer is 8-15nm, and the thickness of the second AZO barrier layer is 15-30nm . 5. A new type of single-silver LOW-E coated glass according to claim 1, characterized in that: the thickness of the Ag layer is 4-8 nm. 6. A new type of single-silver LOW-E coated glass according to claim 1, characterized in that: the thickness of the NiCr barrier layer is 1-5 nm. 7. A novel single silver LOW-E coated glass according to claim 1 or 2, characterized in that: said _Six N _y base film layer and said _Six N _y top film layer are Si3N4 protective layer .