CN104269334A - Electron gun producing tape-shaped or high-ellipticity electron beams - Google Patents
Electron gun producing tape-shaped or high-ellipticity electron beams Download PDFInfo
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- CN104269334A CN104269334A CN201410494069.4A CN201410494069A CN104269334A CN 104269334 A CN104269334 A CN 104269334A CN 201410494069 A CN201410494069 A CN 201410494069A CN 104269334 A CN104269334 A CN 104269334A
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- 238000010894 electron beam technology Methods 0.000 title claims abstract description 48
- 239000002184 metal Substances 0.000 claims description 4
- 238000010276 construction Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 3
- 238000009792 diffusion process Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 239000003574 free electron Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/02—Electrodes; Magnetic control means; Screens
- H01J23/06—Electron or ion guns
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/02—Electrodes; Magnetic control means; Screens
- H01J23/08—Focusing arrangements, e.g. for concentrating stream of electrons, for preventing spreading of stream
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Abstract
该发明公开了一种产生带状或高椭圆率电子注的电子枪,属于真空电子技术领域。首先,按照所需带状电子注的厚度作为直径,通过成熟的方法设计合适的圆柱形电子注电子枪,然后将电子枪的聚焦极和阳极平均剖分两半,中间加入和剖分截面相同的展宽部分,展宽部分的长度根据所需的电子注宽度决定。此时,聚焦极就形成了两端为半圆环,中间为一展宽部分的扁圆形电子枪聚焦极、阳极,其中该聚焦极聚焦阴极发射的带状电子注或高椭圆率电子注时,其聚焦场和电子注的空间电荷场拓扑结构一致,不会出现背景技术所述的某些角度扩散,某些角度交错的问题,不会打断带状电子注的层流性,使电子注顺利的到达阳极。
The invention discloses an electron gun for producing banded or high ellipticity electron beams, which belongs to the technical field of vacuum electrons. Firstly, according to the thickness of the required strip-shaped electron beam as the diameter, a suitable cylindrical electron beam electron gun is designed by a mature method, and then the focusing electrode and the anode of the electron gun are evenly divided into two halves, and the same widening as the split section is added in the middle part, the length of the extended part is determined according to the required width of the electron note. At this time, the focusing pole forms a semicircular ring at both ends, and an oblate electron gun focusing pole and anode in the middle of which is a widened part. Its focus field is consistent with the topological structure of the space charge field of the electron beam, and the problem of certain angle diffusion and certain angle staggering mentioned in the background technology will not occur, and the laminar flow of the ribbon electron beam will not be interrupted, so that the electron beam successfully reached the anode.
Description
技术领域technical field
本发明属于真空电子技术领域,涉及行波管、返波管、返波振荡器、速调管、自由电The invention belongs to the technical field of vacuum electronics, and relates to traveling wave tubes, back wave tubes, back wave oscillators, klystrons, free electric
子激光、奥罗管等真空电子器件。Vacuum electronic devices such as sub-lasers and Oro tubes.
背景技术Background technique
随着科技的进步,对真空电子器件的需求趋向于更高的功率和频率,因此能够产生大电流,大功率,高频率输出的带状电子注或高椭圆率电子注真空电子器件成为了国内外的研究热点。然而,带状电子注行波管、返波管、速调管、自由电子激光、奥罗管等应用带状电子注的真空电子器件都面临一个关键问题——如何实现高质量带状电子注的发射。现有的圆柱形或称铅笔形电子注聚焦极为圆环状结构,其中心孔为漏斗状,圆柱形的阴极位于环状结构聚焦极的漏斗状中心孔底部,阴极发射电子,经过聚焦极聚焦后通过带有环形孔的阳极,从而形成圆柱形电子注。带状电子注为矩形阴极或椭圆形阴极发射形成,当其利用常规的圆形聚焦极聚焦该带状电子注时,由于带状电子注在截面上空间电荷力沿角度分布不同,而圆形聚焦极在其截面上聚焦力沿角度各个方向相同,从而使得电子注在聚焦力大于空间电荷力的角度方向上相交错,而在聚焦力小于空间电荷力的角度方向上扩散,无法实现带状电子注的聚焦和稳定。With the advancement of science and technology, the demand for vacuum electronic devices tends to be higher in power and frequency. Therefore, strip-shaped electron beams or high ellipticity electron beam vacuum electronic devices that can generate high current, high power, and high frequency output have become the domestic other research hotspots. However, vacuum electronic devices using ribbon electron beams, such as ribbon electron beam traveling wave tubes, back wave tubes, klystrons, free electron lasers, and Oro tubes, all face a key problem—how to realize high-quality ribbon beam beams. launch. The existing cylindrical or pencil-shaped electron focusing pole has a ring-shaped structure, and its central hole is funnel-shaped. The cylindrical cathode is located at the bottom of the funnel-shaped central hole of the focusing pole of the ring structure, and the cathode emits electrons, which are focused by the focusing pole. Afterwards, it passes through the anode with a circular hole, thus forming a cylindrical electron beam. The ribbon-shaped electron beam is formed by the emission of a rectangular cathode or an elliptical cathode. When the conventional circular focusing pole is used to focus the ribbon-shaped electron beam, the space charge force on the cross-section of the ribbon-shaped electron beam is distributed differently along the angle, while the circular electron beam The focusing force of the focusing pole is the same in all directions of the angle on its cross section, so that the electron beams intersect in the angle direction where the focusing force is greater than the space charge force, and diffuse in the angle direction where the focusing force is smaller than the space charge force, and it is impossible to realize the band Focusing and stabilization of the electronic note.
发明内容Contents of the invention
为了实现带状电子注的聚焦和控制,针对背景技术的不足本发明提出了一种节能、高效的带状或高椭圆率电子注真空电子器件的电子枪。In order to realize the focusing and control of the ribbon-shaped electron beam, the present invention proposes an energy-saving, high-efficiency electron gun for ribbon-shaped or high ellipticity electron beam vacuum electronic devices.
本发明所采用的技术方案是:首先,按照所需带状电子注的厚度作为直径,通过成熟的方法设计合适的圆柱形电子注电子枪,然后将电子枪的聚焦极和阳极平均剖分两半,中间加入和剖分截面相同的展宽部分,展宽部分的长度根据所需的电子注宽度决定。此时,聚焦极就形成了两端为半圆环,中间为一展宽部分的扁圆形电子枪聚焦极、阳极,其中该聚焦极聚焦阴极发射的带状电子注或高椭圆率电子注时,其聚焦场和电子注的空间电荷场拓扑结构一致,不会出现背景技术所述的某些角度扩散,某些角度交错的问题,不会打断带状电子注的层流性,使电子注顺利的到达阳极,从而能够实现高质量带状电子注的发射,这也就是本发明目的。The technical solution adopted in the present invention is: firstly, according to the thickness of the required strip-shaped electron beam as the diameter, design a suitable cylindrical electron injection gun through a mature method, and then divide the focusing pole and the anode of the electron gun into two halves on average, Add the same widening part as the split section in the middle, and the length of the widening part is determined according to the required electron beam width. At this time, the focusing pole forms a semicircular ring at both ends, and a flattened circular electron gun focusing pole and anode in the middle. Its focusing field is consistent with the topological structure of the space charge field of the electron beam, and the problem of certain angle diffusion and certain angle staggering mentioned in the background technology will not occur, and the laminar flow of the ribbon electron beam will not be interrupted, so that the electron beam Smoothly reach the anode, so that the emission of high-quality band-shaped electron beams can be realized, which is the purpose of the present invention.
因而本发明提出的一种产生带状或高椭圆率电子注的电子枪包括:阴极、聚焦极、阳极,其特征在于,聚焦极的外观为椭圆环状的柱形结构,该椭圆中段平行,两端为两个半圆环,聚焦极环状结构的中心孔为漏斗状;阳极为椭圆形环状结构,其中心孔各处截面相同;阴极为金属片,设置于聚焦极漏斗状中心孔底部。Therefore a kind of electron gun that the present invention proposes to produce banded or high ellipticity electron beam comprises: cathode, focusing pole, anode, it is characterized in that, the outward appearance of focusing pole is the cylindrical structure of ellipse ring, and the middle section of this ellipse is parallel, two The ends are two semi-circular rings, the central hole of the focusing pole ring structure is funnel-shaped; the anode is an elliptical ring structure, and the cross-section of the central hole is the same everywhere; the cathode is a metal sheet, which is set at the bottom of the funnel-shaped central hole of the focusing pole .
所述阴极为矩形或两端为半圆中间为矩形的金属片,其面积小于聚焦极中心孔底面的面积。The cathode is a metal sheet with a rectangle or a semicircle at both ends and a rectangle in the middle, and its area is smaller than that of the bottom surface of the center hole of the focusing pole.
优点:由于该聚焦极是扁圆形结构,形成的聚焦电场也是扁圆形,即和带状电子注或高椭圆率电子注的空间电荷场拓扑结构一致,故而用该聚焦极结构时,不打断带状电子注的层流性,能够获得高质量的电子注。而采用传统的圆形聚焦极聚焦带状电子注时,由于聚焦场和空间电荷力场不相匹配,使得聚焦场大于空间电荷场的方向,即电子注宽边方向,电子变窄发生交错。而聚焦场小于空间电荷场的方向,即电子注厚度方向,电子注发生扩散,无法获得高质量电子注。Advantages: Since the focusing pole has an oblate structure, the formed focusing electric field is also oblate, that is, it is consistent with the space charge field topology of the banded electron beam or the high ellipticity electron beam, so when using the focusing pole structure, no Breaking the laminarity of the ribbon-shaped electron beam can obtain a high-quality electron beam. However, when the traditional circular focusing pole-focusing strip electron beam is used, due to the mismatch between the focusing field and the space charge force field, the focusing field is larger than the direction of the space charge field, that is, the direction of the electron beam width, and the electrons become narrower and staggered. However, the focus field is smaller than the direction of the space charge field, that is, the direction of the thickness of the electron beam, and the electron beam diffuses, so high-quality electron beam cannot be obtained.
其次,由于本聚焦极产生电子注质量较好,故而在相同的电真空器件中,电子注的流通率较高,能够产生更高的输出,具有更高的效率。Secondly, because the quality of the electron beam generated by the focusing electrode is better, in the same electric vacuum device, the flow rate of the electron beam is higher, which can generate higher output and have higher efficiency.
第三,采用一体化加工的聚焦极也具有成本低,装配容易的优点。Thirdly, the focusing pole with integrated processing also has the advantages of low cost and easy assembly.
附图说明Description of drawings
图1是带状电子注聚焦极示意图;Fig. 1 is a schematic diagram of the focal point of the ribbon electron focus;
图2是带状电子注聚焦极剖面图;Fig. 2 is a sectional view of a strip-shaped electron focusing focal pole;
图3是11mm*1mm带状电子注聚焦极的示意图;Figure 3 is a schematic diagram of a 11mm*1mm strip-shaped electron focus electrode;
图4是12mm*1mm带状电子注聚焦极的示意图。Fig. 4 is a schematic diagram of a 12mm*1mm strip-shaped electron focus electrode.
图中:1.阴极,2.展宽部分,3.延伸面,4.斜面。In the figure: 1. cathode, 2. widening part, 3. extension surface, 4. slope.
具体实施方式Detailed ways
根据所需电子注厚度,电压,电流等参数,选择一成熟的圆环柱形电子注聚焦极,该圆环柱形聚焦极注腰等于所需要带状电子注厚度。将该聚焦极剖分,剖分截面可分为两部分:1)与阴极面成约157.5度的斜面。2)为控制阴极表面电场强度的延伸面。计算出斜面的长度、延伸面的长度和厚度。根据所需带状电子注的宽度,加工和截面一致的展宽结构,展宽结构的长度就等于所需的带状电子注宽度。这样由展宽结构及两端的两个半圆环聚焦极就构成了应用于带状电子注聚焦的聚焦极。阴极采用中段为矩形两端为半圆形,阳极采用中段平行,两端为半圆环的环状结构,中心孔各处截面相同。显然,展宽结构及两端的半圆环聚焦极如果可以一体加工形成聚焦极,也属于本专利保护范围之内。According to the required electron beam thickness, voltage, current and other parameters, select a mature circular cylindrical focus electrode, the waist of which is equal to the required strip electron beam thickness. The focusing pole is split, and the split section can be divided into two parts: 1) The inclined plane forming about 157.5 degrees with the cathode surface. 2) is an extension surface for controlling the electric field intensity on the surface of the cathode. Calculate the length of the slope, the length and thickness of the extended face. According to the width of the required ribbon-shaped electron beam, a widened structure with consistent cross-section is processed, and the length of the expanded structure is equal to the required width of the ribbon-shaped electron beam. In this way, the widening structure and the two semicircular focusing poles at both ends constitute the focusing pole applied to the focusing of the belt-shaped electron beam. The cathode adopts a rectangular middle section with semicircular ends, the anode adopts a ring structure with a parallel middle section and semicircular rings at both ends, and the cross section of the center hole is the same everywhere. Apparently, if the widening structure and the semicircular focusing poles at both ends can be integrally processed to form the focusing pole, it also falls within the protection scope of this patent.
实施例1:如图3,聚焦极斜面(角度60°,高5mm),延伸面(高7mm),展宽结构长10mm,相对应的圆柱形聚焦极能够实现0.5mm半径圆柱形电子注,故而该带状电子注能够实现宽度为11mm,厚度为1mm的带状电子注。Embodiment 1: as shown in Figure 3, focusing pole slope (angle 60 °, high 5mm), extension surface (high 7mm), widening structure length 10mm, corresponding cylindrical focusing pole can realize 0.5mm radius cylindrical electron injection, so The strip-shaped electron beam can realize a strip-shaped electron beam with a width of 11 mm and a thickness of 1 mm.
实施例2:如图4,聚焦极斜面(角度50°,高4mm),延伸面(高6mm)展宽结构长12mm,相对应的圆柱形聚焦极能够实现0.5mm半径圆柱形电子注,为了实现完全矩形面发射,原有的圆柱形阴极部分由聚焦极代替,故而该带状电子注能够实现宽度为12mm,厚度为1mm的带状电子注。Embodiment 2: as shown in Figure 4, the focusing pole slope (angle 50 °, high 4mm), the extended surface (high 6mm) widening structure is long 12mm, and the corresponding cylindrical focusing pole can realize the cylindrical electron injection of 0.5mm radius, in order to realize Completely rectangular surface emission, the original cylindrical cathode part is replaced by the focusing electrode, so the strip-shaped electron beam can realize a strip-shaped electron beam with a width of 12mm and a thickness of 1mm.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3719830A1 (en) * | 2019-04-05 | 2020-10-07 | L3 Electron Devices Inc. | Sheet beam electron gun using axially-symmetric spherical cathode |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101728182A (en) * | 2008-10-24 | 2010-06-09 | 中国科学院电子学研究所 | Structure of electron gun for generating elliptical ribbon-like electron beams |
CN103606505A (en) * | 2013-11-26 | 2014-02-26 | 电子科技大学 | Cold cathode electronic gun modulated by microwave |
CN204088255U (en) * | 2014-09-24 | 2015-01-07 | 电子科技大学 | A kind of electron gun producing band shape or high ellipticity electron beam |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101728182A (en) * | 2008-10-24 | 2010-06-09 | 中国科学院电子学研究所 | Structure of electron gun for generating elliptical ribbon-like electron beams |
CN103606505A (en) * | 2013-11-26 | 2014-02-26 | 电子科技大学 | Cold cathode electronic gun modulated by microwave |
CN204088255U (en) * | 2014-09-24 | 2015-01-07 | 电子科技大学 | A kind of electron gun producing band shape or high ellipticity electron beam |
Non-Patent Citations (1)
Title |
---|
党博等: "《W波段带状注电子枪的仿真研究》", 《真空电子技术》, no. 03, 30 June 2013 (2013-06-30) * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3719830A1 (en) * | 2019-04-05 | 2020-10-07 | L3 Electron Devices Inc. | Sheet beam electron gun using axially-symmetric spherical cathode |
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