CN104142123B - It is applied to the Three Degree Of Freedom laser measurement system of plant equipment geometric error measurement - Google Patents
It is applied to the Three Degree Of Freedom laser measurement system of plant equipment geometric error measurement Download PDFInfo
- Publication number
- CN104142123B CN104142123B CN201310168047.4A CN201310168047A CN104142123B CN 104142123 B CN104142123 B CN 104142123B CN 201310168047 A CN201310168047 A CN 201310168047A CN 104142123 B CN104142123 B CN 104142123B
- Authority
- CN
- China
- Prior art keywords
- microscope group
- prism
- light
- degree
- plant equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005259 measurement Methods 0.000 title claims abstract description 40
- 230000010287 polarization Effects 0.000 claims abstract description 31
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 230000028161 membrane depolarization Effects 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 11
- 238000005286 illumination Methods 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 230000003667 anti-reflective effect Effects 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 7
- 230000008033 biological extinction Effects 0.000 claims description 3
- 230000001154 acute effect Effects 0.000 claims description 2
- 238000006073 displacement reaction Methods 0.000 abstract description 8
- 238000001514 detection method Methods 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 abstract description 4
- 230000003137 locomotive effect Effects 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 238000005388 cross polarization Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000009738 saturating Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention belongs to accurate laser measurement technology, and in particular to a kind of Three Degree Of Freedom laser measurement system for being applied to the measurement of plant equipment geometric error.The system includes light splitting microscope group, polarization spectro microscope group, moves reflective microscope group and fixed counter-mirror group.The technical scheme that the present invention is provided is based on double-frequency laser interference, 3 physical quantitys are measured simultaneously can, wherein 1 displacement, 2 rotation amounts can greatly shorten detection time, improve detection efficiency, and its tractability is strong, and sensing head is passive device, will not introduce hot interference, cable output signal is not needed, and then eliminates error caused by heat interference.Meanwhile, it is directed to specific demand, and moderate cost, high precision possess very strong application and market value, goes for the plant equipment of various complexity, such as electromotor, excavator, electromotor, locomotive and Digit Control Machine Tool etc..
Description
Technical field
The invention belongs to accurate laser measurement technology, and in particular to a kind of to be applied to the three of the measurement of plant equipment geometric error
Degree of freedom laser measurement system.
Background technology
With the development of modern processing and high-end equipment sophisticated manufacturing, the requirement on machining accuracy of Digit Control Machine Tool is got over
Come higher.The high accuracy precision machine tool for meeting Production requirement is assembled in order to produce, and makes lathe keep high-accuracy shape
State.Detection to lathe geometric error amount will become the problem that cannot avoid.The geometric error of lathe is detected only, could be really
Whether the lathe of product shy with strangers meets requirement, and the further machining accuracy of raising lathe, or the systematic error to existing lathe
Compensate.
In general, the process for debuging lathe needs to detect every geometric error, for debuging design accuracy.
Lathe dispatches from the factory to be needed to detect lathe global error, to confirm overall performance.During the use of lathe, need regular
The geometric error of lathe is detected, to guarantee that machine finish does not occur drift.It is several according to existing precision machine tool
What error-detecting means, can only once detect a margin of error, and for high-precision numerical control lathe, its margin of error will at least be detected
21, therefore, complete each margin of error for having detected lathe, required time are very tediously long, cause very considerable hidden
Property cost.
People attempt to solve this problem always, and have developed many measuring methods and technology.Sum up bag
Include：Traditional optical meanss, based on the method for diffraction of light, the method and laser interference based on laser traces and laser alignment phase
With reference to method.Wherein, based on laser interference and laser alignment be at present apply state-of-the-art method.
But existing detecting system bulky complex, laser interferometer cannot detect displacement and amount of spin, amount of spin simultaneously
If being detected by sensor PSD, it is impossible to accomplish to trace to the source, precision authority is low, and sensing head needs active device to carry out letter
Number transmission, its heating affect certainty of measurement.
The content of the invention
The technical problem to be solved is system complex, and measurement data can not be traced to the source, and active device heating is to surveying
Amount result is impacted, in order to overcome the above not enough, there is provided a kind of three freedom for being applied to the measurement of plant equipment geometric error
Degree laser measurement system.
In order to solve above-mentioned technical problem, the technical scheme is that：It is described to be applied to the survey of plant equipment geometric error
The Three Degree Of Freedom laser measurement system of amount includes light splitting microscope group, polarization spectro microscope group, moves reflective microscope group and fixed counter-mirror group,
Incident illumination is equally divided into incident parallel light but the first non-coplanar beamlet, the second beamlet and the 3rd by the light splitting microscope group
Beamlet, the polarization spectro microscope group are located in the light path of 3 beamlets, and each beamlet Jing polarization spectroscope components are reference
Light and measurement light, move reflective microscope group and are arranged in the light path of measurement light and are reflected back towards polarization spectro microscope group, and fixation is reflective
Microscope group is arranged in the light path of reference light and is reflected back towards polarization spectro microscope group, after the reference light being reflected back converges with measurement light
Formed and interfered, interference signal is used to calculate the Three Degree Of Freedom.
Further, arrange and orthogonal front parallelogram prism and rear parallel four before and after the light splitting microscope group includes
Side shape prism, four sides of each parallelogram prism are followed successively by the plane of incidence vertical with incident illumination and plane of incidence angle
For the light splitting surface of the acute angle reflecting surface relative with light splitting surface and the exit facet relative with the plane of incidence, rear parallelogram prism
The plane of incidence is relative with the light splitting surface of front parallelogram prism, the light splitting microscope group also include first three angle prism for arranging in front and back and
Vee formation prism, triangular prism hypotenuse place face are transmission plane, vertical with incident illumination for beamlet face, described first three angle prism
Transmission plane fit with the light splitting surface of front parallelogram prism, the beamlet face of first three angle prism and rear parallel four side
The plane of incidence of shape prism fits, and the transmission plane of Vee formation prism is fitted with the light splitting surface of rear parallelogram prism.
Further, the exit facet of the rear parallelogram prism and the Vee formation prism adjacent with the exit facet
Beamlet face, is fitted with the plane of incidence of the polarization spectro microscope group.
Further, parallelogram of the principal section of the parallelogram prism for 45 ° of pair of horns, the master of triangular prism
Section is isosceles right triangle.
Further, the light splitting surface of each parallelogram prism is provided with depolarization spectro-film, and the reflecting surface is provided with
High-reflecting film, other sides are provided with anti-reflective film.
Further, the splitting ratio of the depolarization spectro-film of the front parallelogram prism is 2:1, rear parallelogram rib
The splitting ratio of the depolarization spectro-film of mirror is 1:1.
Further, the light splitting surface plating High Extinction Ratio polarization beam splitter of the polarization spectro microscope group, remaining work surface plate anti-reflective
Penetrate film.
Further, the reflective microscope group of the motion includes 3 reflectors, and 3 reflectors are respectively positioned at the measurement of 3 beamlets
In the light path of light and it is reflected back polarization spectro microscope group, the fixed counter-mirror group structure is identical with reflective microscope group is moved, respectively position
In the light path of the reference light of 3 beamlets and it is reflected back polarization spectro microscope group.
Further, the plane of incidence coating anti reflection film of each reflector, reflecting surface plating depolarization reflectance coating.
Further, the reflector is prism of corner cube reflector.
The technical scheme that the present invention is provided is based on double-frequency laser interference, can measure 3 physical quantitys simultaneously, wherein 1 position
Shifting amount, 2 rotation amounts can greatly shorten detection time, improve detection efficiency, and its tractability is strong, and sensing head is
Passive device, will not introduce hot interference, it is not necessary to cable output signal, and then eliminate error caused by heat interference.Meanwhile, its pin
To specific demand, moderate cost, high precision, possess very strong application and market value, go for various complexity
Plant equipment, such as electromotor, excavator, electromotor, locomotive and Digit Control Machine Tool etc..
Description of the drawings
Fig. 1 is the structural representation of measuring system of the present invention；
Fig. 2 is the isolating construction figure of light splitting microscope group of the present invention；
Fig. 3 is the structural representation of the reflective microscope group of motion of the present invention；
Fig. 4 is light path process in measuring system test of the present invention；
Fig. 5 is the measuring method of present system Three Degree Of Freedom.
Shown in figure：
1- light splitting microscope groups, parallelogram prism before 11-, 111,111 '-plane of incidence, 112,112 '-light splitting surface, 113- are anti-
Penetrate face, 114,114 '-exit facet, parallelogram prism after 12-, 13- first three angle prism, 131,131 '-transmission plane, 132,
132 '-beamlet face, 14- Vee formation prisms；
2- polarization spectro microscope groups；
3- moves reflective microscope group, the first reflectors of 31-, the second reflectors of 32-, the 3rd reflectors of 33-；
4- fixed counter-mirror groups；
5- laser instrument, 51- incident illuminations, 52- beamlets, 521- primary optic axis, the second optical axises of 522-, the 3rd optical axises of 523-,
53- reference lighies, 54- measurement light；
6- bonders, 7- photoelectric accounters, 8- data processings and display device.
Specific embodiment
The present invention is described in detail below in conjunction with the accompanying drawings：
As shown in figure 1, the Three Degree Of Freedom laser measurement system for being applied to the measurement of plant equipment geometric error of the present invention
Including light splitting microscope group 1, polarization spectro microscope group 2, move reflective microscope group 3 and fixed counter-mirror group 4.
The optical path direction of incident illumination is X to X sets gradually light splitting microscope group, polarization spectro microscope group and motion illuminator upwards
Group, the fixed counter-mirror group are arranged in the Y-direction of polarization spectro microscope group.
As shown in Fig. 2 light splitting microscope group described in light splitting microscope group 1 includes front parallelogram prism 11, rear parallelogram rib
Mirror 12, first three angle prism 13 and Vee formation prism 14.
Front parallelogram prism 11 is identical with the structure of rear parallelogram prism 12, in the past parallelogram prism 11
As a example by.The principal section of the front parallelogram prism 11 for 45 ° of pair of horns parallelogram, its four sides be followed successively by with
X to the vertical plane of incidence 111, with the less light splitting surface 112 of 111 angle of the plane of incidence, and the relative reflecting surface 113 of light splitting surface 112
And the exit facet 114 relative with the plane of incidence 111.
First three angle prism 13 is identical with the structure of Vee formation prism 14, in the past as a example by triangular prism 13.The front triangle rib
The principal section of mirror 13 is isosceles right triangle, and hypotenuse place face is transmission plane 131, with X to vertical for beamlet face 132,
The transmission plane 131 of first three angle prism 13 is fitted with the light splitting surface 112 of front parallelogram prism 11, the front triangle rib
The beamlet face 132 of mirror 13 is fitted with the plane of incidence 111 ' of rear parallelogram prism 12, the Vee formation prism 14 it is saturating
The light splitting surface 112 ' that face 131 ' is penetrated with rear parallelogram prism 52 fits.
The front parallelogram prism 11 and rear parallelogram prism 12 are mutually perpendicular to, and rear parallelogram prism
The plane of incidence 111 ' it is relative with the light splitting surface 112 of front parallelogram prism.
The light splitting surface 112 and the coating splitting ratio of transmission plane 131 are 2:1 depolarization spectro-film, wherein 2/3 light intensity is saturating
Penetrate, 1/3 smooth strong reflection, light splitting surface 112 ' and the coating splitting ratio of transmission plane 131 ' are 1:1 depolarization spectro-film, half transmitting half are anti-
Penetrate, the coating HR high-reflecting films of the reflecting surface 113, other sides of prism coat AR anti-reflective films.
As shown in figure 1, in the rear parallelogram prism 12 exit facet 114 ' relative with the plane of incidence 111 ' and with this
The beamlet face 132 ' of the adjacent Vee formation prism 14 in face, is fitted with the plane of incidence of the polarization spectro microscope group 2, described
Polarization spectro microscope group 2 is PBS prisms, is made up of two triangular prisms, and High Extinction Ratio polarization spectro is plated in the middle of two triangular prisms
Film, remaining work surface plate AR anti-reflective films.
The modular construction adopted with fixed counter-mirror group 4 by the reflective microscope group of the motion 3 is identical with number of components, to move
As a example by reflective microscope group 3, as shown in figure 3, it include 3 corner cube prism reflectors be respectively the first reflector 31, and first reflection
Second reflector 32 arranged side by side of device 31 and overlay the 3rd reflector 33 above the first reflector 31, the plane of incidence of each reflector
Plating AR anti-reflective films, reflecting surface plating depolarization reflectance coating.
The fixed counter-mirror group 4 also includes three reflectors, in the same manner, the plane of incidence plating AR anti-reflective films of each reflector,
Reflecting surface plates depolarization reflectance coating.
As shown in figure 4, light path process is followed successively by test：The transmitting X of laser instrument 5 enters to cross-polarization double-frequency laser Shu Zuowei
Light 51 is penetrated, 51 Jing light splitting microscope group 1 of incident illumination is equally divided into three cross-polarization double frequency beamlets 52 parallel with incident illumination 51, had
Body is premenstrual parallelogram prism 11 and first three angle prism 13, and it is 2 that incident illumination 51 is divided into beam intensity ratio:1 two-beam.1/3 light
The first strong beamlet light 521 enter the light beam of 2,2/3 light intensity of polarization spectro microscope group enter rear parallelogram prism 12 and after
The light beam of 2/3 light intensity is further divided into beam intensity ratio for 1 by triangular prism 14:1 two beamlets, i.e. the second beamlet 522
With the 3rd beamlet 523.2 points of described each 52 Jing polarization spectros microscope group of beamlet is reference light 53 and measurement light 54, fixes anti-
Light microscope group 4 receives reference light 53 and is reflected back polarization spectro microscope group 2, moves reflective microscope group 2 and receives measurement light 54 and be reflected back partially
Shake light splitting microscope group 2, the reflected light of the reflected light and measurement light 54 of reference light 53 is incorporated to an optical interference circuit, and Jing bonders 6 are formed
Interference fringe, 7 pairs of the mobile of three groups of interference fringes count photoelectric accounter respectively, then Jing data processings and display device 8 are given
Go out X to displacement, Ry amounts of spin and Rz amounts of spin.
Specific data processing method is as follows：
As shown in figure 5, present system three equivalent measurements point a, b and c on testee, the first beamlet 521
The interference fringe of formation and the X of a points are to displacement XaIt is corresponding, the X of interference fringe and b points that the second beamlet 522 is formed to
Displacement XbCorresponding, the X of interference fringe and c points that the 3rd beamlet 523 is formed is to displacement XcIt is corresponding, the first beamlet
521 and second the centre-to-centre spacing between beamlet 522 be Ly, the centre-to-centre spacing between the first beamlet 521 and the 3rd beamlet 523 is
Lz.In order to preferably eliminate the impact of environmental error and vibration, X is respectively to displacement d, Ry amount of spin α and Rz amount of spin β：
D=(Xa+Xb+Xc)/3
α=arcsin ((Xb-Xa)/Ly)
β=arcsin ((Xc-Xa)/Lz)。
It is pointed out that X can also be adopteda、XbAnd XcIn some value as X to displacement.
Claims (9)
1. it is a kind of be applied to plant equipment geometric error measurement Three Degree Of Freedom laser measurement system, it is characterised in that including point
Light microscope group, polarization spectro microscope group, move reflective microscope group and fixed counter-mirror group, the light splitting microscope group by incident illumination be equally divided into
Incident parallel light but the first non-coplanar beamlet, the second beamlet and the 3rd beamlet, the polarization spectro microscope group are located at 3
In the light path of beamlet, each beamlet Jing polarization spectroscopes component is reference light and measurement light, moves reflective microscope group and is arranged on
In the light path of measurement light and be reflected back towards polarization spectro microscope group, fixed counter-mirror group be arranged in the light path of reference light and by its
Polarization spectro microscope group is reflected back, the reference light being reflected back and measurement light are formed after converging interferes, and interference signal is used to calculate described
Three Degree Of Freedom；The light splitting microscope group is arranged and orthogonal front parallelogram prism and rear parallelogram rib before and after including
Mirror, it is acute angle that four sides of each parallelogram prism are followed successively by the plane of incidence vertical with incident illumination and plane of incidence angle
The light splitting surface reflecting surface relative with light splitting surface and the exit facet relative with the plane of incidence, the plane of incidence of rear parallelogram prism
Relative with the light splitting surface of front parallelogram prism, the light splitting microscope group also includes first three angle prism and the Vee formation for arranging in front and back
Prism, triangular prism hypotenuse place face are transmission plane, vertical with incident illumination for beamlet face, the transmission of first three angle prism
Face is fitted with the light splitting surface of front parallelogram prism, the beamlet face of first three angle prism and rear parallelogram prism
The plane of incidence fit, the transmission plane of Vee formation prism is fitted with the light splitting surface of rear parallelogram prism.
It is 2. a kind of according to claim 1 to be applied to the Three Degree Of Freedom laser measurement system that plant equipment geometric error is measured,
Characterized in that, the sub-light of the exit facet of the rear parallelogram prism and the Vee formation prism adjacent with the exit facet
Beam face, is fitted with the plane of incidence of the polarization spectro microscope group.
It is 3. a kind of according to claim 1 to be applied to the Three Degree Of Freedom laser measurement system that plant equipment geometric error is measured,
Characterized in that, parallelogram of the principal section of the parallelogram prism for 45 ° of pair of horns, the principal section of triangular prism
For isosceles right triangle.
It is 4. a kind of according to claim 1 to be applied to the Three Degree Of Freedom laser measurement system that plant equipment geometric error is measured,
Characterized in that, the light splitting surface of each parallelogram prism is provided with depolarization spectro-film, the reflecting surface is provided with high anti-
Film, other sides are provided with anti-reflective film.
It is 5. a kind of according to claim 4 to be applied to the Three Degree Of Freedom laser measurement system that plant equipment geometric error is measured,
Characterized in that, the splitting ratio of the depolarization spectro-film of the front parallelogram prism is 2:1, rear parallelogram prism
The splitting ratio of depolarization spectro-film is 1:1.
It is 6. a kind of according to claim 1 to be applied to the Three Degree Of Freedom laser measurement system that plant equipment geometric error is measured,
Characterized in that, the light splitting surface plating High Extinction Ratio polarization beam splitter of the polarization spectro microscope group, remaining work surface coating anti reflection film.
It is 7. a kind of according to claim 1 to be applied to the Three Degree Of Freedom laser measurement system that plant equipment geometric error is measured,
Characterized in that, the reflective microscope group of the motion includes 3 reflectors, 3 reflectors are respectively positioned at the measurement light of 3 beamlets
In light path and it is reflected back polarization spectro microscope group, the fixed counter-mirror group structure is identical with reflective microscope group is moved, respectively positioned at 3
In the light path of the reference light of beamlet and it is reflected back polarization spectro microscope group.
It is 8. a kind of according to claim 7 to be applied to the Three Degree Of Freedom laser measurement system that plant equipment geometric error is measured,
Characterized in that, the plane of incidence coating anti reflection film of each reflector, reflecting surface plating depolarization reflectance coating.
It is 9. a kind of according to claim 7 to be applied to the Three Degree Of Freedom laser measurement system that plant equipment geometric error is measured,
Characterized in that, the reflector is prism of corner cube reflector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310168047.4A CN104142123B (en) | 2013-05-08 | 2013-05-08 | It is applied to the Three Degree Of Freedom laser measurement system of plant equipment geometric error measurement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310168047.4A CN104142123B (en) | 2013-05-08 | 2013-05-08 | It is applied to the Three Degree Of Freedom laser measurement system of plant equipment geometric error measurement |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104142123A CN104142123A (en) | 2014-11-12 |
| CN104142123B true CN104142123B (en) | 2017-04-05 |
Family
ID=51851377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310168047.4A Active CN104142123B (en) | 2013-05-08 | 2013-05-08 | It is applied to the Three Degree Of Freedom laser measurement system of plant equipment geometric error measurement |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104142123B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106979750A (en) * | 2017-04-11 | 2017-07-25 | 西南交通大学 | A kind of method for fast measuring and its device of lathe translation shaft geometric error |
| CN107121073B (en) * | 2017-06-09 | 2019-07-05 | 中国科学院光电技术研究所 | A high-precision three-degree-of-freedom real-time measurement method and device based on a laser interferometer |
| CN108180844A (en) * | 2017-12-21 | 2018-06-19 | 复旦大学 | A kind of multiple degrees of freedom precise displacement monitoring system based on double-frequency laser interference principle |
| CN109373906B (en) * | 2018-09-05 | 2020-07-28 | 三英精控（天津）仪器设备有限公司 | Method for simultaneously measuring distance, pitch and yaw |
| CN111189390B (en) * | 2020-01-09 | 2021-08-10 | 陕西科技大学 | Machine tool geometric error measuring device based on laser interference principle |
| CN111551114B (en) * | 2020-05-22 | 2021-07-27 | 华中科技大学 | A six-degree-of-freedom geometric error measuring device and method for linear guide rails |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1439864A (en) * | 2003-03-05 | 2003-09-03 | 北方交通大学 | Laser multiple degree-of-freedom measuring system and method |
| CN101344375A (en) * | 2008-07-31 | 2009-01-14 | 上海微电子装备有限公司 | High resolution heterodyne laser interference system and method for improving definition |
| CN102288104A (en) * | 2011-07-22 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Six-axis four-splitting interferometer |
| CN102721369A (en) * | 2012-06-01 | 2012-10-10 | 清华大学 | Device for measuring multi-degree-of-freedom displacement of wafer stage by laser interferometer |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7057739B2 (en) * | 2002-02-12 | 2006-06-06 | Zygo Corporation | Separated beam multiple degree of freedom interferometer |
-
2013
- 2013-05-08 CN CN201310168047.4A patent/CN104142123B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1439864A (en) * | 2003-03-05 | 2003-09-03 | 北方交通大学 | Laser multiple degree-of-freedom measuring system and method |
| CN101344375A (en) * | 2008-07-31 | 2009-01-14 | 上海微电子装备有限公司 | High resolution heterodyne laser interference system and method for improving definition |
| CN102288104A (en) * | 2011-07-22 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Six-axis four-splitting interferometer |
| CN102721369A (en) * | 2012-06-01 | 2012-10-10 | 清华大学 | Device for measuring multi-degree-of-freedom displacement of wafer stage by laser interferometer |
Non-Patent Citations (1)
| Title |
|---|
| 超精密工件台多维激光测量系统研究;周云飞 等;《机床与液压》;20060915(第9期);69-71 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104142123A (en) | 2014-11-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104142123B (en) | It is applied to the Three Degree Of Freedom laser measurement system of plant equipment geometric error measurement | |
| CN106461372B (en) | Single fiber-coupled dual-frequency laser six-degree-of-freedom error simultaneous measurement system | |
| US9036154B2 (en) | Four-axis four-subdividing interferometer | |
| JP2579226B2 (en) | Optical device for interferometer | |
| CN103309177B (en) | Workpiece platform system of photoetching machine | |
| CN107228638A (en) | The method and apparatus measured simultaneously based on the five degree of freedom error that beam drift is compensated | |
| CN110160471A (en) | A kind of error measuring system and method for high-precision linear guide | |
| CN107462210B (en) | Roll Angle Measuring Device for Linear Guides | |
| CN106595480A (en) | Laser measurement system used for measuring rotating-shaft six-degree-of-freedom geometric error and method thereof | |
| CN103424069B (en) | For the optical devices of many geometric errors measurement amount, interference system and measuring method | |
| CN102288104B (en) | Six axis 4 subdivision interferometer | |
| EP1779058A2 (en) | System and method for optical measurement | |
| Ren et al. | A novel enhanced roll-angle measurement system based on a transmission grating autocollimator | |
| CN116164673A (en) | Straightness interferometry method based on optical interference principle | |
| CN217930170U (en) | An Optical Detection Type Spindle Rotation Error Measuring Device | |
| CN115031630B (en) | Plane pose measuring device and measuring method for optical frequency comb dispersion interference | |
| CN113483726B (en) | Method and system for measuring three-dimensional angle motion error in miniaturized and high-precision manner | |
| CN102645178A (en) | Dual-frequency interference based facial contour measuring device and method | |
| US7187451B2 (en) | Apparatus for measuring two-dimensional displacement | |
| CN113091653A (en) | Device and method for measuring angle freedom degree error of linear guide rail based on pentaprism | |
| JP2023171867A (en) | Multi-axis laser interferometer | |
| CN105737758A (en) | Long trace profile | |
| Chen et al. | Effects of incident beam deviation from the center of a cat's eye retro-reflector on the measurement accuracy of a laser tracing system | |
| CN112747667B (en) | Differential interferometer apparatus | |
| CN114264235A (en) | Device and method capable of measuring horizontal and vertical displacement and deflection detection |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
|
| CP01 | Change in the name or title of a patent holder |