CN104059539B - A kind of high-efficiency diamond polishing agent and preparation method thereof - Google Patents
A kind of high-efficiency diamond polishing agent and preparation method thereof Download PDFInfo
- Publication number
- CN104059539B CN104059539B CN201410244503.3A CN201410244503A CN104059539B CN 104059539 B CN104059539 B CN 104059539B CN 201410244503 A CN201410244503 A CN 201410244503A CN 104059539 B CN104059539 B CN 104059539B
- Authority
- CN
- China
- Prior art keywords
- diadust
- polishing
- superfinishing
- agent
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 60
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 32
- 239000010432 diamond Substances 0.000 title claims abstract description 29
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 29
- 238000002360 preparation method Methods 0.000 title claims description 9
- 239000002994 raw material Substances 0.000 claims abstract description 15
- 239000002270 dispersing agent Substances 0.000 claims abstract description 14
- 238000012986 modification Methods 0.000 claims abstract description 13
- 230000004048 modification Effects 0.000 claims abstract description 13
- 239000000080 wetting agent Substances 0.000 claims abstract description 13
- 239000002245 particle Substances 0.000 claims abstract description 12
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims abstract description 10
- 238000003756 stirring Methods 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 12
- 238000000227 grinding Methods 0.000 claims description 12
- 238000013467 fragmentation Methods 0.000 claims description 10
- 238000006062 fragmentation reaction Methods 0.000 claims description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical group OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 8
- 239000003595 mist Substances 0.000 claims description 7
- 238000004945 emulsification Methods 0.000 claims description 6
- 239000011259 mixed solution Substances 0.000 claims description 6
- 235000021355 Stearic acid Nutrition 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 claims description 5
- 238000003801 milling Methods 0.000 claims description 5
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 claims description 5
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 5
- 239000008117 stearic acid Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 239000004115 Sodium Silicate Substances 0.000 claims description 4
- 235000011187 glycerol Nutrition 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- 235000019795 sodium metasilicate Nutrition 0.000 claims description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 4
- 239000003002 pH adjusting agent Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 17
- 230000000694 effects Effects 0.000 abstract description 11
- 239000004094 surface-active agent Substances 0.000 abstract description 11
- 239000002904 solvent Substances 0.000 abstract description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 9
- 239000002253 acid Substances 0.000 abstract description 8
- 229910000677 High-carbon steel Inorganic materials 0.000 abstract description 6
- 230000003750 conditioning effect Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 abstract description 4
- 239000011247 coating layer Substances 0.000 abstract description 3
- 239000010977 jade Substances 0.000 abstract description 3
- 239000007769 metal material Substances 0.000 abstract description 3
- 239000010453 quartz Substances 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 238000007493 shaping process Methods 0.000 abstract description 2
- -1 during polishing Substances 0.000 abstract 1
- 238000004458 analytical method Methods 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 239000011651 chromium Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- RCEAADKTGXTDOA-UHFFFAOYSA-N OS(O)(=O)=O.CCCCCCCCCCCC[Na] Chemical compound OS(O)(=O)=O.CCCCCCCCCCCC[Na] RCEAADKTGXTDOA-UHFFFAOYSA-N 0.000 description 2
- 238000004500 asepsis Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002113 nanodiamond Substances 0.000 description 2
- 239000007779 soft material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a kind of high-efficiency diamond polishing agent, it is prepared from by the raw material of following percentage by weight: superfinishing diadust 5-20%, tetraethoxysilane 10-20%, solvent 20-30%, strong acid 0.2-0.8%, surfactant 10-30%, wetting agent 10-25%, dispersant 5-15%, PH conditioning agent 0.1-5%.The present invention is by carrying out surface modification treatment with tetraethoxysilane to diadust, and make the surface of diadust form coated with silica layer, during polishing, coating layer can play cushioning effect to the diadust of internal layer; And by carrying out repeatedly the technique of broken shaping and improvement surface modification to diadust, make the pattern of diadust octahedra closer to waiting, obtained polishing agent not only has good polishing effect to the contour hard metal material of high-carbon steel, and to Cr
2o
3, pottery, jade, the hard brittle material such as quartz also have good polishing effect, can avoid the damage to polishing material surface completely, do not produce cut during polishing, stain, particle surface remain.
Description
Technical field
The present invention relates to a kind of high-efficiency diamond polishing agent and preparation method thereof.
Background technology
Diamond Mohs' hardness is 10, and its hardness is far away higher than other materials.Diamond is widely used in high speed, high efficient grinding and the field such as precision, superfine grinding as a kind of superhard material, diadust is except for except the material processing field such as cutting tool, also more and more universal in the application of grinding and polishing technical field, be characterized in that grinding speed is fast, the mass defects such as cut, stain, particle surface be residual that can prevent polished surface from producing in polishing process, have the characteristics such as corrosion-free, cost is low, environment-protecting asepsis simultaneously.
CN102391789A discloses a kind of nano diamond polishing liquid, this polishing fluid can be used for the polishing of the soft materials such as glass, solve the agglomeration traits of Nano diamond, its stable suspersion in water can be made, but this invention does not solve the quality problems of polishing well, this invention can not be used for the polishing of the soft material such as the contour hard metal material of high-carbon steel and pottery in addition, and the scope of application is very narrow.
CN1940003A discloses a kind of water-based diamond polishing liquid, and this polishing agent can stable suspersion not sedimentation, but does not still solve quality of finish problem well.
CN103525314A discloses a kind of high-efficiency diamond lubrication polishing fluid, and this polishing fluid is with silicon carbide micro-powder, alumina powder, chromium oxide micro mist for grinding aid, and obtained polishing agent is mainly used in the polishing of metal metallographic specimen, and this polishing agent is to Cr
2o
3, pottery, jade, the material such as quartz lithofacies analysis polishing effect still not good enough.
Summary of the invention
The object of the invention is for above-mentioned defect, there is provided one can not only stable suspersion, and the polishing of various metallographic and petrofacies product can be applicable to, and quality of finish is good, cut, stain is not had after polishing, the high-efficiency diamond polishing agent of particle surface noresidue, the present invention also provides the preparation method of this polishing agent.
Above-mentioned purpose is achieved through the following technical solutions:
A kind of high-efficiency diamond polishing agent, it is prepared from by the raw material of following percentage by weight:
The granularity of described superfinishing diadust is 0.5-40 μm;
Described solvent is water or ethanol or ethanol water;
Described surfactant is one or more in sodium metasilicate, NPE, AEO, when for time multiple, can adopt arbitrary proportion;
Described wetting agent is one or more in stearic acid, acetone, benzinum, when for time multiple, can adopt arbitrary proportion;
Described dispersant is one or more in polymine, glycerine, polyvinyl alcohol, polyethylene glycol, lauryl sodium sulfate, when for time multiple, can adopt arbitrary proportion.
Preferably, described superfinishing diadust is prepared from by the following method:
1) select single-crystal diamond to be raw material, utilize spray formula airflow milling broken;
2) the Buddha's warrior attendant building stones after fragmentation are put into electromagnetic ball grinding machine broken again, chemical cleaning method and rinsing classification will be carried out after the diamond micro mist reshaping after fragmentation;
3) diadust that classification is good is put into microwave drying oven dry, obtain the superfinishing diadust that particle diameter is 0.5-40 μm.
A kind of method preparing described high-efficiency diamond polishing agent, comprise the following steps: by described solvent, strong acid and superfinishing diadust are inserted in continuous powdery surface modification machine in proportion, after mixing, be heated to 50-70 DEG C of mix and blend, then gently tetraethoxysilane was added drop-wise in mixed solution in 1-3 hour while stirring, be warmed up to 60-80 DEG C to continue to stir 10-60 minute, then 30-50 DEG C is cooled to, add surfactant in proportion again, wetting agent, dispersant, with PH conditioning agent, pH value is adjusted to 6-8, be ultrasonic emulsification 5-30 minute under the condition of 20-50KHz in frequency by above-mentioned mixed liquor after stirring, obtain.
Preferably, described preparation method comprises the following steps: by described solvent, strong acid and superfinishing diadust are inserted in continuous powdery surface modification machine in proportion, after mixing, be heated to 60 DEG C of mix and blends, then gently tetraethoxysilane was added drop-wise in mixed solution in 2 hours while stirring, be warmed up to 80 DEG C and continue stirring 30 minutes, then 40 DEG C are cooled to, add surfactant in proportion again, wetting agent, dispersant, with PH conditioning agent, pH value is adjusted to 7, be ultrasonic emulsification 20 minutes under the condition of 28KHz in frequency by above-mentioned mixed liquor after stirring, obtain.
Further preferably, the particle diameter of described superfinishing diadust is 28 μm.Not only polishing effect is better but also production cost is lower to adopt this particle diameter.
Further preferably, described strong acid is hydrochloric acid.
The invention has the beneficial effects as follows:
1) the present invention is by carrying out surface modification treatment with tetraethoxysilane to diadust, and make the surface of diadust form coated with silica layer, the principle of surface modification is:
First, there is hydrolysis in a solvent in tetraethoxysilane Si (OEt) 4:
The surface that the silicon dioxide generated is adsorbed in superfinishing diadust under the effect of high temperature grinding, stirring forms coating layer.
During polishing, coating layer can play cushioning effect to the diadust of internal layer; And by carrying out repeatedly the technique of broken shaping and improvement surface modification to diadust, make the pattern of diadust octahedra closer to waiting.Obtained polishing agent not only has good polishing effect to the contour hard metal material of high-carbon steel, and to Cr
2o
3, pottery, jade, the hard brittle material such as quartz also have good polishing effect, can avoid the damage to polishing material surface completely, do not produce cut during polishing, stain, particle surface remain.
2) the present invention is by improving pattern, the density of diadust cladding, and regulate the charged situation of powder surface by dispersant, increase intergranular electrostatic attraction effect, make its dispersion of polishing agent still can keep good stability at higher concentrations, and be not subject to the impact of pH value and salinity, not easily condense.
3) the present invention is when carrying out grinding and polishing to metal and nonmetallic materials, can obtain higher polishing speed.There is corrosion-free, the characteristic such as cost is low, environment-protecting asepsis.
Accompanying drawing explanation
Fig. 1 is that the present invention is to Cr
2o
3lithofacies analysis design sketch after material finish.
Fig. 2 is that CN1940003A polishing agent is to Cr
2o
3lithofacies analysis design sketch after material finish.
Fig. 3 is that the present invention is to the Metallographic Analysis design sketch after high-carbon steel material polishing.
Fig. 4 is that CN1940003A polishing agent is to the Metallographic Analysis design sketch after high-carbon steel material polishing.
Fig. 5 is the present invention to the lithofacies analysis design sketch after ceramic polished.
Fig. 6 is CN1940003A polishing agent to the lithofacies analysis design sketch after ceramic polished.
Embodiment
Below by specific embodiment, the present invention is described in detail.
Embodiment 1
A kind of high-efficiency diamond polishing agent, it is prepared from by the raw material of following percentage by weight:
The granularity of described superfinishing diadust is 28 μm;
Described solvent to be mass concentration be 20% ethanol water;
Described surfactant is sodium metasilicate and NPE, and its mass ratio is 1: 1;
Described wetting agent is acetone and stearic acid, and its mass ratio is 2: 1;
Described dispersant is glycerine and polymine, and its mass ratio is 2: 1;
Described strong acid is concentrated hydrochloric acid.
Described superfinishing diadust is prepared from through the following step:
1) select single-crystal diamond to be raw material, utilize spray formula airflow milling broken;
2) the Buddha's warrior attendant building stones after fragmentation are put into electromagnetic ball grinding machine broken again, chemical cleaning method and rinsing classification will be carried out after the diamond micro mist reshaping after fragmentation;
3) diadust that classification is good is put into microwave drying oven dry, obtain the superfinishing diadust that particle diameter is 28 μm.
The preparation method of described high-efficiency diamond polishing agent is: take each raw material in proportion, by 20% ethanol water, concentrated hydrochloric acid and superfinishing diadust are inserted in continuous powdery surface modification machine, be heated to 60 DEG C of mix and blends, then gently tetraethoxysilane was added drop-wise in mixed solution in 2 hours while stirring, be warmed up to 80 DEG C and continue stirring 30 minutes, then 40 DEG C are cooled to, add surfactant in proportion again, wetting agent, dispersant, with NaOH, pH value is adjusted to 7, be ultrasonic emulsification 20 minutes under the condition of 28KHz in frequency by above-mentioned mixed liquor after stirring, obtain.
Embodiment 2
A kind of high-efficiency diamond polishing agent, it is prepared from by the raw material of following percentage by weight:
The granularity of described superfinishing diadust is 10 μm;
Described solvent is water;
Described surfactant is NPE;
Described wetting agent is acetone and benzinum, and its mass ratio is 1: 1;
Described dispersant is polyvinyl alcohol;
Described strong acid is concentrated hydrochloric acid.
Described superfinishing diadust is prepared from through the following step:
1) select single-crystal diamond to be raw material, utilize spray formula airflow milling broken;
2) the Buddha's warrior attendant building stones after fragmentation are put into electromagnetic ball grinding machine broken again, chemical cleaning method and rinsing classification will be carried out after the diamond micro mist reshaping after fragmentation;
3) diadust that classification is good is put into microwave drying oven dry, obtain the superfinishing diadust that particle diameter is 10 μm.
The preparation method of described high-efficiency diamond polishing agent is: take each raw material in proportion, by water, concentrated hydrochloric acid and superfinishing diadust are inserted in continuous powdery surface modification machine, be heated to 50 DEG C of mix and blends, then gently tetraethoxysilane was added drop-wise in 1 hour in the mixed solution of superfinishing diadust, be warmed up to 60 DEG C and surface modification treatment is carried out 60 minutes to superfinishing diadust, then 30 DEG C are cooled to, add surfactant again, wetting agent, dispersant, with NaOH, pH value is adjusted to 6, be ultrasonic emulsification 30 minutes under the condition of 20KHz in frequency by above-mentioned mixed liquor after stirring, obtain.
Embodiment 3
A kind of high-efficiency diamond polishing agent, it is prepared from by the raw material of following percentage by weight:
The granularity of described superfinishing diadust is 40 μm;
Described solvent is ethanol;
Described surfactant is AEO;
Described wetting agent is stearic acid and benzinum, and its mass ratio is 9: 1;
Described dispersant is lauryl sodium sulfate and polyethylene glycol, and its mass ratio is 5: 7;
Described strong acid is sulfuric acid.
Described superfinishing diadust is prepared from through the following step:
1) select single-crystal diamond to be raw material, utilize spray formula airflow milling broken;
2) the Buddha's warrior attendant building stones after fragmentation are put into electromagnetic ball grinding machine broken again, chemical cleaning method and rinsing classification will be carried out after the diamond micro mist reshaping after fragmentation;
3) diadust that classification is good is put into microwave drying oven dry, obtain the superfinishing diadust that particle diameter is 40 μm.
The preparation method of described high-efficiency diamond polishing agent is: take each raw material in proportion, by ethanol, sulfuric acid and superfinishing diadust are inserted in continuous powdery surface modification machine, 70 DEG C of mix and blends are heated to after mixing, then gently tetraethoxysilane was added drop-wise in 3 hours in the mixed solution of solvent and superfinishing diadust, be warmed up to 80 DEG C and surface modification treatment is carried out 10 minutes to superfinishing diadust, then 50 DEG C are cooled to, add surfactant again, wetting agent, dispersant, with PH conditioning agent, pH value is adjusted to 8, be ultrasonic emulsification 5 minutes under the condition of 50KHz in frequency by above-mentioned mixed liquor after stirring, obtain.
Embodiment 4
A kind of high-efficiency diamond polishing agent, it is prepared from by the raw material of following percentage by weight:
The granularity of described superfinishing diadust is 0.5 μm;
Described solvent is 90% ethanol water;
Described surfactant is sodium metasilicate, NPE, AEO mixture, and its mass ratio is 3: 1: 2;
Described wetting agent is stearic acid;
Described dispersant is glycerine, polyvinyl alcohol, polyethylene glycol, sodium dodecyl sulfate mixture, and its mass ratio is 8: 4: 1: 1.
Described strong acid is nitric acid.
Embodiment 5 test example
Adopt above-mentioned polishing agent respectively to Cr
2o
3petrofacies material, high-carbon steel metallographic material, ceramic material carry out polishing, and carry out plasma and micro mist interference detection to the material after polishing, the results are shown in Figure 1-Fig. 6.As can be seen from testing result, compared with polishing agent disclosed in CN1940003A, adopt material surface no marking after polishing agent polishing of the present invention, stain, particle surface noresidue, its quality of finish is obviously better than CN1940003A.The polishing effect of embodiment 1 is better than other three embodiments.
Claims (1)
1. a preparation method for high-efficiency diamond polishing agent, is characterized in that comprising the following steps:
Be the ethanol water of 20% by mass concentration, concentrated hydrochloric acid and superfinishing diadust are inserted in continuous powdery surface modification machine in proportion, after mixing, be heated to 60 DEG C of mix and blends, then gently tetraethoxysilane was added drop-wise in mixed solution in 2 hours while stirring, be warmed up to 80 DEG C and continue stirring 30 minutes, then 40 DEG C are cooled to, add sodium metasilicate in proportion again, NPE, wetting agent, dispersant, by pH adjusting agent, pH value is adjusted to 7, be ultrasonic emulsification 20 minutes under the condition of 28KHz in frequency by above-mentioned mixed liquor after stirring, obtain,
The percentage by weight of each raw material is:
The granularity of described superfinishing diadust is 28 μm;
Described wetting agent is acetone and stearic acid, and its mass ratio is 2: 1;
Described dispersant is glycerine and polymine, and its mass ratio is 2: 1;
Described superfinishing diadust is prepared from by the following method:
1) select single-crystal diamond to be raw material, utilize spray formula airflow milling broken;
2) the Buddha's warrior attendant building stones after fragmentation are put into electromagnetic ball grinding machine broken again, chemical cleaning method and rinsing classification will be carried out after the diamond micro mist reshaping after fragmentation;
3) diadust that classification is good is put into microwave drying oven dry, obtain the superfinishing diadust that particle diameter is 28 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410244503.3A CN104059539B (en) | 2014-06-04 | 2014-06-04 | A kind of high-efficiency diamond polishing agent and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410244503.3A CN104059539B (en) | 2014-06-04 | 2014-06-04 | A kind of high-efficiency diamond polishing agent and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104059539A CN104059539A (en) | 2014-09-24 |
| CN104059539B true CN104059539B (en) | 2015-07-29 |
Family
ID=51547479
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410244503.3A Active CN104059539B (en) | 2014-06-04 | 2014-06-04 | A kind of high-efficiency diamond polishing agent and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104059539B (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107304347A (en) * | 2016-04-18 | 2017-10-31 | 云南民族大学 | A kind of method that utilization ultrasonic wave prepares diamond paste |
| CN106190025A (en) * | 2016-06-30 | 2016-12-07 | 禹州市远大塑料电器有限责任公司 | A kind of crystal face agent for quartz polishing and preparation technology thereof |
| CN106757041B (en) * | 2016-12-16 | 2019-07-09 | 安徽宝恒新材料科技有限公司 | Polishing fluid is used in a kind of processing of stainless steel |
| CN107621400A (en) * | 2017-08-16 | 2018-01-23 | 河南四方达超硬材料股份有限公司 | A kind of dispersant for being used to make diadust Shape measure sample |
| CN114437633A (en) * | 2020-11-03 | 2022-05-06 | 天津金相检测科技有限公司 | Special polishing agent for coal rock and preparation method thereof |
| CN114426809A (en) * | 2022-02-17 | 2022-05-03 | 上海映智研磨材料有限公司 | Silicon oxide modified nano diamond abrasive particles and preparation method and application thereof |
| CN115011255B (en) * | 2022-06-27 | 2023-03-17 | 中国地质大学（北京） | High-precision polishing agent of monocrystalline diamond added with nano metal and preparation method thereof |
| CN116875195B (en) * | 2023-07-07 | 2024-02-27 | 深圳市朗纳研磨材料有限公司 | Monocrystalline diamond polishing solution doped with metal nano particles and preparation method thereof |
| CN119220222B (en) * | 2024-10-08 | 2025-04-29 | 东莞市柯林奥半导体材料有限公司 | A method for preparing agglomerated diamond |
| CN119955379A (en) * | 2025-03-25 | 2025-05-09 | 淮安科博新材料科技有限公司 | A preparation process of diamond paint coating |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1560161A (en) * | 2004-03-01 | 2005-01-05 | 长沙矿冶研究院 | Water-based nano diamond polishing solution and preparation method thereof |
| CN102391789A (en) * | 2011-08-19 | 2012-03-28 | 永州皓志稀土材料有限公司 | A kind of preparation method of nano-diamond polishing liquid |
-
2014
- 2014-06-04 CN CN201410244503.3A patent/CN104059539B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1560161A (en) * | 2004-03-01 | 2005-01-05 | 长沙矿冶研究院 | Water-based nano diamond polishing solution and preparation method thereof |
| CN102391789A (en) * | 2011-08-19 | 2012-03-28 | 永州皓志稀土材料有限公司 | A kind of preparation method of nano-diamond polishing liquid |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104059539A (en) | 2014-09-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104059539B (en) | A kind of high-efficiency diamond polishing agent and preparation method thereof | |
| CN102391789B (en) | A kind of preparation method of nano-diamond polishing liquid | |
| Saraswathamma et al. | Experimental investigation into ball end magnetorheological finishing of silicon | |
| CN103013345B (en) | Oily diamond grinding liquid and preparation method thereof | |
| CN103571333B (en) | CMP (Chemical-Mechanical Polishing) polishing liquid with mixed grinding materials for alkaline sapphire substrate and preparation method thereof | |
| CN106145946B (en) | A kind of method that liquid phase feed technology prepares vitrified bonded grinding wheel | |
| CN104708525B (en) | A kind of polishing method of small ceramic product | |
| CN102343547A (en) | Thermochemistry mechanical polishing method of sapphire substrate material and polishing solution | |
| CN105647394A (en) | Water-based diamond polishing solution and preparation method thereof | |
| CN105400435A (en) | Alkaline nano ceramic polishing solution and preparation method thereof | |
| Duan et al. | Surface roughness of optical quartz substrate by chemical mechanical polishing | |
| CN102250582A (en) | Method for preparing submicron polycrystalline diamond abrasive with narrow particle size distribution | |
| Shiou et al. | Surface finish of bulk metallic glass using sequential abrasive jet polishing and annealing processes | |
| CN105038608A (en) | Glass polishing agent | |
| Zhang et al. | Mechanism analysis and modeling of surface roughness for CeO2 slurry-enhanced grinding BK7 optics | |
| US20110203185A1 (en) | Painted surface treating composition, a painted surface treating method and a painted surface patching method | |
| CN104017501B (en) | A kind of ultrasonic atomizatio type polishing fluid being applicable to TFT-LCD glass substrate | |
| CN108081038A (en) | The polishing method of small ceramic | |
| KR20140059046A (en) | Preparation method of magnetic particle coated with abrasive anf the abrasive filler for magnetic abrasion | |
| CN107717765B (en) | A kind of grinding wheel and preparation method thereof applied to the grinding of ceramic insertion core concentricity | |
| CN101269975A (en) | Preparation Method of Heterogeneous Nucleation of LaPO4 Coated α-Al2O3 Powder | |
| CN107652899A (en) | A kind of ceramic sapphire polishing Liquid diamond and its manufacture method | |
| CN113004805B (en) | High-efficiency polishing slurry for fused quartz magnetorheological polishing and preparation method thereof | |
| CN113814799A (en) | Polishing method for low-index crystal face of single crystal diamond | |
| CN109015204A (en) | A kind of polishing method suitable for CR39 resin lens |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20160120 Address after: 430074, East Lake Wuhan New Technology Development Zone, Optics Valley Avenue, No. 1, international business center, No. four, 1, 8, 01, 02, Patentee after: Wuhan Sanling new material limited liability company Address before: 430074 Wuhan East Lake Development Zone, Hubei, Optics Valley Road, No. 1 International Enterprise Center Patentee before: Wuhan three clever scientific and technological industry limited-liability company |