CN103965790B - Zr-Al-Ce polishing solution and preparation method thereof - Google Patents
Zr-Al-Ce polishing solution and preparation method thereof Download PDFInfo
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- 238000005498 polishing Methods 0.000 title claims abstract description 73
- 238000002360 preparation method Methods 0.000 title claims description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 62
- 239000000843 powder Substances 0.000 claims abstract description 61
- 239000011521 glass Substances 0.000 claims abstract description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000000227 grinding Methods 0.000 claims abstract description 9
- 239000012530 fluid Substances 0.000 claims description 30
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 24
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 19
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 19
- WLLURKMCNUGIRG-UHFFFAOYSA-N alumane;cerium Chemical compound [AlH3].[Ce] WLLURKMCNUGIRG-UHFFFAOYSA-N 0.000 claims description 19
- 229910052726 zirconium Inorganic materials 0.000 claims description 19
- 229910052684 Cerium Inorganic materials 0.000 claims description 14
- 239000006185 dispersion Substances 0.000 claims description 14
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 13
- 239000012752 auxiliary agent Substances 0.000 claims description 12
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 11
- 239000003795 chemical substances by application Substances 0.000 claims description 10
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical group CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 7
- 238000003756 stirring Methods 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 6
- 229920002125 Sokalan® Polymers 0.000 claims description 4
- 239000004584 polyacrylic acid Substances 0.000 claims description 4
- 230000003595 spectral effect Effects 0.000 claims description 4
- 229920005575 poly(amic acid) Polymers 0.000 claims description 3
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 3
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- 239000008367 deionised water Substances 0.000 claims description 2
- 229910021641 deionized water Inorganic materials 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 239000002002 slurry Substances 0.000 abstract description 12
- 230000007797 corrosion Effects 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 9
- 238000005520 cutting process Methods 0.000 abstract description 8
- 238000007517 polishing process Methods 0.000 abstract description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000725 suspension Substances 0.000 abstract description 3
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 abstract description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 abstract description 2
- 239000000654 additive Substances 0.000 abstract 1
- 239000002131 composite material Substances 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 230000007547 defect Effects 0.000 abstract 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 12
- 229910000420 cerium oxide Inorganic materials 0.000 description 8
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 8
- 239000003082 abrasive agent Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 241000276425 Xiphophorus maculatus Species 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011122 softwood Substances 0.000 description 3
- 238000005482 strain hardening Methods 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- RCFVMJKOEJFGTM-UHFFFAOYSA-N cerium zirconium Chemical compound [Zr].[Ce] RCFVMJKOEJFGTM-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- VPJQDYNOVJRQLN-UHFFFAOYSA-N [O-2].[La+3].[Ce+3].[F].[O-2].[O-2] Chemical compound [O-2].[La+3].[Ce+3].[F].[O-2].[O-2] VPJQDYNOVJRQLN-UHFFFAOYSA-N 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
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Abstract
The invention belongs to the technical field of polishing solutions, aims to overcome the defects in the prior art, and provides a polishing solution for soft thin glass materials. Especially, the polishing solution is prepared by compounding zirconia powder, ceria polishing powder, alumina polishing powder, ferric oxide powder, composite additives and water. The polishing solution is mild in polishing process, the surface of the glass after polishing is smooth, and the glass surface finish is high. The polishing solution improves the suspension stability of a slurry system, reduces the viscosity of zirconia grinding materials, improves the fluidity and the cutting speed, shortens the corrosion time, prevents the scratch and water stain phenomena, reduces the surface tension, improves the compatibility, and solves the industrial technical problems of corrosion and water stain.
Description
Technical field
The invention belongs to the production technical field of polishing fluid, relate to a kind of polishing fluid and preparation method thereof, particularly a kind of zirconium aluminium cerium polishing fluid and preparation method thereof.
Background technology
Along with optical field requires more and more higher to the unicity of light, require that the specific refractory power of glass is more and more higher, glass material or ultra-soft, ultra-thin, opticglass cold working belongs to labor-intensive enterprises, throws softwood matter glass and requires to produce cut, ensure stronger rate of cutting again, be convenient to cleaning after polishing, can not washmarking be remained.
CMP chemically machinery polished is the combination technique of mechanical mill and chemical corrosion, its grinding by ultramicron and the chemical corrosion effect of polishing slurries, in the alternation procedure of chemical membrane and mechanical striping, remove the layer of material of polished dielectric surface, realize the processing of ultraprecise planarized surface.Abrasive material in polishing fluid (slurry), mainly can form a class material of crystalline structure, mainly contain diamond, silicon carbide, ferric oxide, aluminum oxide, titanium oxide, zirconium white, cerium oxide etc.The polishing fluid sold in the market is cerium oxide, zirconium white, silicon oxide, diamond polishing liquid mainly.Wherein the most applicable opticglass polishing is cerium oxide polishing slurry, Mohs' hardness 7.0-7.5, and rate of cutting is strong, is suitable for large lens and harder material glass.Silicon dioxide polishing solution is nano level, and surface quality is high, but rate of cutting is too slow.Current high quality optical element all uses pitch polishing, but due to the seriously polluted cleaning difficulty of pitch complicated component; And adopt CeO2, Al2O3 abrasive material to grind, the problems such as this abrasive material generally adopts disintegrating process to make, and there is particle uneven, adopts this abrasive material also to there is seriously polluted not easy cleaning, and simultaneously operation is loaded down with trivial details.
Patent CN100497508C discloses a kind of production method of high-cerium rare-earth polishing powder, the fluorine cerium lanthanum oxide polishing powder of polymolecularity is obtained by introducing JZPD capsule in polishing powder building-up process, but described crystal seed needs previously prepared, and described polishing powder is formulated as the polishing slurries of specified chemical composition further.Patent CN101899281 discloses a kind of manufacture method of polishing powder, but described polishing powder particle size is comparatively large, and polishing precision is lower.
summary of the invention:
The object of the invention is to overcome the deficiencies in the prior art, provide a kind of polishing fluid meeting soft thin glass material, its polishing process is gentle, and surface of polished is smooth, and glass surface finishes is high.
Particularly, the present invention is achieved through the following technical solutions:
A kind of zirconium aluminium cerium polishing fluid provided by the invention, is prepared from according to certain weight by water, zirconia powder, cerium rouge, aluminum oxide polishing powder, ferric oxide powder, comprehensive auxiliary agent etc.
Preferably, zirconium aluminium cerium polishing fluid of the present invention, it is characterized in that containing water 400-700 weight part, zirconia powder 240-260 part, cerium rouge 5-10 part, aluminum oxide polishing powder 0.1-2 part, account for the ferric oxide powder of zirconia powder weight part 0.25-0.5% and account for the comprehensive auxiliary agent of zirconia powder weight part 16-32%.
Preferably, the specific surface area of described zirconia powder is 2-6m
2/ g.
Preferably, the purity of described cerium rouge is between 99-99.9%.
Preferably, described zirconia powder and cerium rouge hardness be 5.5-6.0.
Preferably, described aluminum oxide polishing powder is purity is 99.9-99.99%, and outward appearance is the α-aluminum oxide of platy structure.
Preferably, described comprehensive auxiliary agent is a kind of functional agent for dispersion agent, alcohol mixture and deionized water composition.
Preferably, described dispersion agent: alcohol mixture: the weight ratio of water is 1:2:20.
Preferably, described dispersion agent is the water-soluble high-molecular compound of pH 5.0-8.0, and most preferably, described dispersion agent is the one in polyvidone, polyacrylic acid or poly amic acid.
Preferably, described alcohol mixture is arbitrary two kinds in ethanol, ethylene glycol, propylene glycol, glycerol, Virahol, and particularly preferably, described alcohol mixture is Virahol and ethylene glycol, and wherein the ratio of Virahol and ethylene glycol is 1:(1-2).
Present invention also offers a kind of preparation method of zirconium aluminium cerium polishing fluid, specifically comprise following steps:
Step 1) adds zirconia powder 240-260 part of autonomous roasting in 400-700 part water of high speed dispersion, is uniformly dispersed;
Step 2) add the aluminum oxide polishing powder of 5-10 part cerium rouge and 0.1-2 part, be equipped with the ferric oxide powder accounting for oxidation powder weight part 0.25-0.5%, be uniformly dispersed;
Step 3) enters Ball-stirring mill grinding, and rounding compounded abrasive being worn into certain granularity is spherical;
Step 4) adds the comprehensive auxiliary agent modulation accounting for zirconia powder weight 16-32% and evenly namely obtains zirconium aluminium cerium polishing fluid.
Preferably, the granularity described in above-mentioned steps 3 is D50:0.5-1.30um, D97≤3.60um.
The present invention's above-mentioned zirconium aluminium cerium polishing fluid can be applicable to space flight and aviation devitrified glass, accurate liquid crystal conductive glass, planar wave glass, optical spherical surface, optical lens glass, spectral filter, spectral window, and the aspect such as the precise finiss polishing of glass substrate.
The present invention compared with prior art has the following advantages:
1. select partially soft zirconium white as the main abrasive material of polishing fluid, well solve fine scratches phenomenon.Zirconic Mohs' hardness selected by the present invention is between 5.5-6.0, partially softer than cerium oxide, higher with the consistency of glass, is suitable for the polishing compared with softwood matter and ultra-thin glass material, can effectively solves fine scratches phenomenon.
2. the present invention's autonomous roasting of adopting specified weight part to form cerium oxide and introduce the alumina powder composition compounded abrasive of suitable stiffness.
3. the cerium oxide of creationary interpolation specified weight part composition and aluminum oxide are as auxiliary abrasive, improve rate of cutting, reduce polishing time, namely reduce the crevice corrosion time of polished glass and slurry, effectively alleviate washmarking and the orange peel phenomenon of glass surface, also reduce the cost of labor of cold working process.
4. the present invention add the effect that aqueous high molecular auxiliary agent and glycerol mixed aid play stable slurry system.
5. add the alcohol mixture of Virahol and ethylene glycol, reduce the surface tension of slurry, solve the viscosity of slurry and glass surface, efficiently solve the corrosion washmarking phenomenon of polished and cleaned process, solve a technical difficult problem for glass cold working industry.
6. add ferric oxide first as tinting material, play the effect of blast slurry, and zirconic viscosity can be reduced, easily clean, reduce washmarking phenomenon; Make the concentration of the slurries in polishing process keep stable, light stable circle is played a role.
The present invention achieves technique effect unexpected as follows:
1. this product uses a kind of superfine zirconia, cerium oxide, aluminum oxide mixing polishing powder as main abrasive material, and overcome existing zirconium cerium aluminium polishing fluid, polishing characteristic is partially soft, poor stability, deposit clumps, and viscosity is strong, the shortcomings such as rate of cutting is weak.The stability of mixed polishing solution of the present invention takes on a new look greatly, can long storage time, and keeps loose, can Eddy diffusion after fully stirring.
2. this product with the addition of a small amount of aluminum oxide and cerium oxide, improves cutting speed, shortens glass and polishing fluid duration of contact, decreases corrosion washmarking phenomenon to a certain extent; Reduce the cold worked cost of labor of opticglass.
3. this product with the addition of appropriate Virahol and ethylene glycol.Solve corrosion washmarking that glass polishing particularly easily occurs in softwood matter glass polishing process than phenomenon, effectively solve the industry difficult problem in domestic and international grinding and polishing.
4. this product adopts zirconium white to make main abrasive material, and ferric oxide carries out modification to whole polishing fluid system.The product that adds of ferric oxide improves the stability of polishing fluid suspension system and submissive color and luster.
Zirconium cerium aluminium polishing fluid of the present invention in a word, the suspension stability of slurry system strengthens greatly, reduces the viscosity of zirconia, improves mobility and rate of cutting, decreases etching time, solves cut and washmarking phenomenon; Reduce surface tension, improve consistency, solve an industry technology difficult problem for corrosion washmarking phenomenon.
Embodiment
The present invention is further described below by specific embodiment; but described embodiment is illustrative instead of determinate; several embodiments can be listed according to institute's limited range, therefore in the change do not departed under general plotting of the present invention and amendment, should belong within protection scope of the present invention.
embodiment 1
The specific surface area of autonomous roasting is added at 2-6m in 700 parts of water of high speed dispersion
2the zirconia powder of/g 240 parts, after being uniformly dispersed, adding the α-aluminum oxide polishing powder of the platy structure of 6 parts of cerium rouges and 0.2 part, is equipped with the ferric oxide powder accounting for zirconia powder weight part 0.25%, is uniformly dispersed; Enter Ball-stirring mill grinding, compounded abrasive being worn into granularity is that the rounding of D50:0.5-1.30um, D97≤3.60um is spherical; Then add the comprehensive auxiliary agent (wherein polyvidone: ethanol: propylene glycol: the weight ratio of water is 1:1:1:20) accounting for zirconia powder weight 16%, namely modulation evenly obtains zirconium aluminium cerium polishing fluid.
embodiment 2
The specific surface area of autonomous roasting is added at 2-6m in 600 parts of water of high speed dispersion
2the zirconia powder of/g 260 parts, after being uniformly dispersed, adds the α-aluminum oxide polishing powder of 10 parts of cerium rouges and 2 parts of platy structures, is equipped with the ferric oxide powder accounting for oxidation powder weight part 0.5%, is uniformly dispersed; Enter Ball-stirring mill grinding, compounded abrasive being worn into granularity is that the rounding of D50:0.5-1.30um, D97≤3.60um is spherical; Then add the comprehensive auxiliary agent (wherein polyacrylic acid: ethanol: ethylene glycol: the weight ratio of water is 1:1:1:20) accounting for zirconia powder weight 32%, namely modulation evenly obtains zirconium aluminium cerium polishing fluid.
embodiment 3
The specific surface area of autonomous roasting is added at 2-6m in 650 parts of water of high speed dispersion
2the zirconia powder of/g 250 parts, after being uniformly dispersed, adds the α-aluminum oxide polishing powder of 8 parts of cerium rouges and 1 part of platy structure, is equipped with the ferric oxide powder accounting for oxidation powder weight part 0.4%, is uniformly dispersed; Enter Ball-stirring mill grinding, compounded abrasive being worn into granularity is that the rounding of D50:0.5-1.30um, D97≤3.60um is spherical; Then add the comprehensive auxiliary agent (wherein polyacrylic acid: ethanol: glycerol: the weight ratio of water is 1:1:1:20) accounting for zirconia powder weight 25%, namely modulation evenly obtains zirconium aluminium cerium polishing fluid.
embodiment 4
The specific surface area of autonomous roasting is added at 2-6m in 680 parts of water of high speed dispersion
2the zirconia powder of/g 260 parts, after being uniformly dispersed, adds the α-aluminum oxide polishing powder of the platy structure of 9 parts of cerium rouges and 1.5 parts, is equipped with the ferric oxide powder accounting for oxidation powder weight part 0.3%, is uniformly dispersed; Enter Ball-stirring mill grinding, compounded abrasive being worn into granularity is that the rounding of D50:0.5-1.30um, D97≤3.60um is spherical; Then add the comprehensive auxiliary agent (wherein poly amic acid: ethanol: glycerol: the weight ratio of water is 1:1:1:20) accounting for zirconia powder weight 20%, namely modulation evenly obtains zirconium aluminium cerium polishing fluid.
Claims (7)
1. a zirconium aluminium cerium polishing fluid, it is characterized in that, containing water 400-700 weight part, zirconia powder 240-260 weight part, cerium rouge 5-10 weight part, aluminum oxide polishing powder 0.1-2 weight part and the ferric oxide powder accounting for zirconia powder weight part 0.25-0.5%, accounting for the comprehensive auxiliary agent of zirconia powder weight part 16-32%;
Described comprehensive auxiliary agent is the functional agent for dispersion agent, alcohol mixture and deionized water composition, wherein said dispersion agent: alcohol mixture: the weight ratio of water is 1:2:20;
Described dispersion agent is the one in polyvidone, polyacrylic acid or poly amic acid;
Described alcohol mixture is Virahol and ethylene glycol, and wherein the ratio of Virahol and ethylene glycol is 1:(1-2).
2. a kind of zirconium aluminium cerium polishing fluid as claimed in claim 1, is characterized in that the specific surface area of described zirconia powder is 2-6m
2/ g.
3. a kind of zirconium aluminium cerium polishing fluid as claimed in claim 1, is characterized in that the purity of described cerium rouge and aluminum oxide polishing powder is 99-99.9%.
4. a kind of zirconium aluminium cerium polishing fluid as claimed in claim 1, it is characterized in that described zirconia powder and cerium rouge hardness be 5.5-6.0.
5. a kind of zirconium aluminium cerium polishing fluid as claimed in claim 1, is characterized in that described dispersion agent is the water-soluble high-molecular compound of pH5.0-8.0.
6. the preparation method of a kind of zirconium aluminium cerium polishing fluid as claimed in claim 1, is characterized in that comprising following steps:
Step 1) adds zirconia powder 240-260 part of autonomous roasting in 400-700 part water of high speed dispersion, is uniformly dispersed;
Step 2) add the aluminum oxide polishing powder of 5-10 part cerium rouge and 0.1-2 part, be equipped with the ferric oxide powder accounting for zirconia powder weight part 0.25-0.5%, be uniformly dispersed;
Step 3) enters Ball-stirring mill grinding, and rounding compounded abrasive being worn into certain granularity is spherical;
Step 4) adds the comprehensive auxiliary agent modulation accounting for zirconia powder weight 16-32% and evenly namely obtains zirconium aluminium cerium polishing fluid;
Wherein, the granularity described in step 3 is D50:0.5-1.30um, D97≤3.60um.
7. the purposes of zirconium aluminium cerium polishing fluid in space flight and aviation devitrified glass, accurate liquid crystal conductive glass, planar wave glass, optical spherical surface, optical lens glass, spectral filter, spectral window, the polishing of glass substrate precise finiss as described in as arbitrary in claim 1-5.
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| CN104403575B (en) * | 2014-12-23 | 2016-09-21 | 包头市华辰稀土材料有限公司 | A kind of preparation method of high accuracy aluminum oxide polishing powder |
| CN107254259A (en) * | 2017-06-08 | 2017-10-17 | 包头海亮科技有限责任公司 | Novel rare-earth polishing powder and preparation method thereof |
| CN108165177B (en) * | 2017-12-20 | 2020-09-22 | 重庆超硅半导体有限公司 | Stability control method for semiconductor silicon wafer grinding fluid |
| CN108192506A (en) * | 2018-02-09 | 2018-06-22 | 东莞华拓研磨材料有限公司 | A kind of metal surface grinding with polishing agent and preparation method |
| CN108864949B (en) * | 2018-08-29 | 2020-07-28 | 德米特（苏州）电子环保材料有限公司 | Rare earth polishing solution for polishing glass and preparation method thereof |
| CN109439282A (en) * | 2018-10-23 | 2019-03-08 | 蓝思科技（长沙）有限公司 | Composite Nano abrasive material, polishing fluid and preparation method thereof, chip glass and electronic equipment |
| CN111454666A (en) * | 2020-05-25 | 2020-07-28 | 安徽禾臣新材料有限公司 | High-suspension polishing powder and preparation method thereof |
| CN111929337A (en) * | 2020-06-17 | 2020-11-13 | 宁波锦越新材料有限公司 | EBSD sample preparation method of Al-Zn-Mg-Cu alloy and EBSD sample |
| CN113897177A (en) * | 2021-09-03 | 2022-01-07 | 永州市湘江稀土有限责任公司 | Composite oxide abrasive particle and preparation method thereof |
| CN114591687A (en) * | 2022-03-18 | 2022-06-07 | 深圳市瑞来稀土材料有限公司 | Rare earth polishing powder for semiconductor wafer polishing treatment and preparation method thereof |
| CN115785818B (en) * | 2022-11-10 | 2023-06-20 | 湖北五方光电股份有限公司 | A kind of polishing liquid and its preparation method and application |
| CN115961318B (en) * | 2022-12-20 | 2025-03-18 | 宁波韵升股份有限公司 | A treatment method for increasing the dyne value of the nickel coating on the surface of NdFeB magnetic steel |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101649183A (en) * | 2009-09-01 | 2010-02-17 | 永州皓志稀土材料有限公司 | A kind of production technology of zirconia grinding liquid |
| CN102250585A (en) * | 2011-08-19 | 2011-11-23 | 永州皓志稀土材料有限公司 | A kind of preparation method of zirconia grinding liquid |
| CN102358826A (en) * | 2011-08-19 | 2012-02-22 | 永州皓志稀土材料有限公司 | A kind of preparation method of aluminum-doped zirconia composite polishing powder |
| WO2012102180A1 (en) * | 2011-01-27 | 2012-08-02 | 株式会社 フジミインコーポレーテッド | Polishing material and polishing composition |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012092361A2 (en) * | 2010-12-28 | 2012-07-05 | Saint-Gobain Ceramics & Plastics, Inc. | Polishing slurry including zirconia particles and a method of using the polishing slurry |
-
2014
- 2014-04-25 CN CN201410169996.9A patent/CN103965790B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101649183A (en) * | 2009-09-01 | 2010-02-17 | 永州皓志稀土材料有限公司 | A kind of production technology of zirconia grinding liquid |
| WO2012102180A1 (en) * | 2011-01-27 | 2012-08-02 | 株式会社 フジミインコーポレーテッド | Polishing material and polishing composition |
| CN102250585A (en) * | 2011-08-19 | 2011-11-23 | 永州皓志稀土材料有限公司 | A kind of preparation method of zirconia grinding liquid |
| CN102358826A (en) * | 2011-08-19 | 2012-02-22 | 永州皓志稀土材料有限公司 | A kind of preparation method of aluminum-doped zirconia composite polishing powder |
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