[go: up one dir, main page]

CN103765585A - Solid-state radiation sensor device with flip-chip mounted solid-state radiation sensor and associated systems and methods - Google Patents

Solid-state radiation sensor device with flip-chip mounted solid-state radiation sensor and associated systems and methods Download PDF

Info

Publication number
CN103765585A
CN103765585A CN201280041684.9A CN201280041684A CN103765585A CN 103765585 A CN103765585 A CN 103765585A CN 201280041684 A CN201280041684 A CN 201280041684A CN 103765585 A CN103765585 A CN 103765585A
Authority
CN
China
Prior art keywords
transmission support
support component
radiation transducer
ssrt
support assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201280041684.9A
Other languages
Chinese (zh)
Other versions
CN103765585B (en
Inventor
萨米尔·S·瓦德哈维卡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micron Technology Inc
Original Assignee
Micron Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micron Technology Inc filed Critical Micron Technology Inc
Publication of CN103765585A publication Critical patent/CN103765585A/en
Application granted granted Critical
Publication of CN103765585B publication Critical patent/CN103765585B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/857Interconnections, e.g. lead-frames, bond wires or solder balls
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/40Optical elements or arrangements
    • H10F77/496Luminescent members, e.g. fluorescent sheets
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/50Encapsulations or containers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/8506Containers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/851Wavelength conversion means
    • H10H20/8515Wavelength conversion means not being in contact with the bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/851Wavelength conversion means
    • H10H20/8516Wavelength conversion means having a non-uniform spatial arrangement or non-uniform concentration, e.g. patterned wavelength conversion layer or wavelength conversion layer with a concentration gradient
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/852Encapsulations
    • H10H20/853Encapsulations characterised by their shape
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/855Optical field-shaping means, e.g. lenses
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0361Manufacture or treatment of packages of wavelength conversion means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0362Manufacture or treatment of packages of encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0363Manufacture or treatment of packages of optical field-shaping means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0364Manufacture or treatment of packages of interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/851Wavelength conversion means
    • H10H20/8514Wavelength conversion means characterised by their shape, e.g. plate or foil
    • H10W74/15
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/52PV systems with concentrators

Landscapes

  • Led Device Packages (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Light Receiving Elements (AREA)

Abstract

The invention discloses a solid state radiation sensor (SSRT) device and a method for manufacturing and using the same. One embodiment of the SSRT device includes: radiation sensors (e.g., light emitting diodes); and a transmissive support assembly including a transmissive support member, such as a transmissive support member including a converter material. Leads may be positioned at a backside of the transmissive support member. The radiation sensor may be flip-chip mounted to the transmissive support assembly. For example, a solder connection may exist between a contact of the radiation sensor and the lead of the transmissive support assembly.

Description

具有倒装芯片式安装的固态辐射传感器的固态辐射传感器装置及其相关联系统及方法Solid-state radiation sensor device with flip-chip mounted solid-state radiation sensor and associated systems and methods

技术领域technical field

本技术涉及一种固态辐射传感器装置及固态辐射传感器装置的制造方法。特定来说,本技术涉及具有倒装芯片式安装的固态辐射传感器的固态辐射传感器装置及其相关联系统及方法。The technology relates to a solid-state radiation sensor device and a manufacturing method of the solid-state radiation sensor device. In particular, the present technology relates to solid state radiation sensor devices having flip chip mounted solid state radiation sensors and associated systems and methods.

背景技术Background technique

许多移动电子装置(例如移动电话、个人数字助理、数码相机及MP3播放器)及其它装置(例如电视、计算机监视器及汽车)将发光二极管(“LED”)、有机发光二极管(“OLED”)、聚合物发光二极管(“PLED”)及其它固态辐射传感器(“SSRT”)用于背光照明。SSRT还用于标识、室内照明、室外照明及其它类型的一般照明。为在此类应用中运行,SSRT一般须与其它组件封装在一起以形成SSRT装置。常规SSRT装置可包含(例如)SSRT的背侧支撑件(例如安装件)、散热器、装置引线、将SSRT连接到所述装置引线的导线、光学组件(例如磷光体)及囊封剂。这些组件中每一者可提供若干功能中的一者或一者以上,其包含:(1)支撑SSRT;(2)保护SSRT;(3)在SSRT的操作期间散热;(4)修改来自SSRT的发射(例如改变SSRT发射的色彩);及(5)将SSRT与外部系统的电路集成。Many mobile electronic devices (such as mobile phones, personal digital assistants, digital cameras, and MP3 players) and other devices (such as televisions, computer monitors, and automobiles) incorporate light-emitting diodes (“LEDs”), organic light-emitting diodes (“OLEDs”) , Polymer Light Emitting Diodes ("PLEDs") and other Solid State Radiation Sensors ("SSRTs") are used for backlighting. SSRTs are also used for signage, interior lighting, exterior lighting, and other types of general lighting. To operate in such applications, SSRTs typically must be packaged with other components to form an SSRT device. A conventional SSRT device may include, for example, a backside support for the SSRT such as a mount, a heat sink, device leads, wires connecting the SSRT to the device leads, optical components such as phosphors, and an encapsulant. Each of these components may provide one or more of several functions, including: (1) supporting the SSRT; (2) protecting the SSRT; (3) dissipating heat during operation of the SSRT; (4) modifying the SSRT from the SSRT (for example, changing the color emitted by the SSRT); and (5) integrating the SSRT with the circuits of the external system.

常规倒装芯片式安装方法通常将固态组件连接到其它装置组件而无需使用接线或其它导线。通常,在这些方法中,处理设备将焊料凸块沉积到固态组件的接触件上、使所述焊料凸块与其它装置组件的电极对准、将所述焊料凸块放置到其它装置组件的对应电极上及回焊所述焊料凸块。通常将底部填充材料安置在所安装固态组件与其它装置组件之间的空间中。Conventional flip-chip mounting methods typically connect solid-state components to other device components without the use of wires or other wires. Typically, in these methods, processing equipment deposits solder bumps onto contacts of solid state components, aligns the solder bumps with electrodes of other device components, places the solder bumps on corresponding electrodes of other device components. electrodes and reflow the solder bumps. Underfill material is typically placed in the space between the installed solid state components and other device components.

使用线接合(相比于倒装芯片式安装)来将常规SSRT连接到其它装置组件。然而,线接合具有若干缺点。例如,接线需要大量实体空间。这可在小型化应用及多个SSRT紧密集合的应用中成为问题。另外,接线形成是需要在昂贵设备上花时间的复杂过程。一旦形成,接线就成为SSRT封装的最不可靠部分中的一者。例如,导线与SSRT的差异热膨胀可随时间逝去而压迫导线且最终导致故障。鉴于常规SSRT装置的这些及/或其它缺陷,此领域仍需创新。Conventional SSRTs are connected to other device components using wire bonding (as opposed to flip-chip mounting). However, wire bonding has several disadvantages. For example, wiring requires a lot of physical space. This can become a problem in miniaturized applications and applications where multiple SSRTs are tightly packed. In addition, wiring formation is a complicated process requiring time spent on expensive equipment. Once formed, the wiring becomes one of the least reliable parts of the SSRT package. For example, differential thermal expansion of the wire and the SSRT can stress the wire over time and eventually lead to failure. In view of these and/or other deficiencies of conventional SSRT devices, there remains a need for innovation in this area.

附图说明Description of drawings

可参考以下图式而更好地了解本发明的许多方面。图式中的组件未必按比例绘制。而是,重点在于清楚地说明本发明的原理。在图式中,相同参考数字标示全部若干视图中的对应部件。Many aspects of the invention can be better understood with reference to the following drawings. Components in the drawings are not necessarily drawn to scale. Rather, emphasis is placed upon clearly illustrating the principles of the invention. In the drawings, like reference numerals designate corresponding parts throughout the several views.

图1为根据本技术的实施例的SSRT装置的示意横截面图。Figure 1 is a schematic cross-sectional view of an SSRT device in accordance with an embodiment of the present technology.

图2为图1中所展示的SSRT装置内的辐射传感器的示意横截面图。2 is a schematic cross-sectional view of a radiation sensor within the SSRT device shown in FIG. 1 .

图3为一系统的示意横截面图,其包含初级组件的外部系统安装件上的图1中所展示的SSRT装置。Figure 3 is a schematic cross-sectional view of a system comprising the SSRT device shown in Figure 1 on an external system mount of a primary assembly.

图4为根据本技术的另一实施例的SSRT装置的示意横截面图。4 is a schematic cross-sectional view of an SSRT device according to another embodiment of the present technology.

图5为根据本技术的另一实施例的SSRT装置的示意横截面图。5 is a schematic cross-sectional view of an SSRT device according to another embodiment of the present technology.

图6为根据本技术的另一实施例的SSRT装置的示意横截面图。6 is a schematic cross-sectional view of an SSRT device according to another embodiment of the present technology.

图7为根据本技术的另一实施例的SSRT装置的示意横截面图。7 is a schematic cross-sectional view of an SSRT device according to another embodiment of the present technology.

图8为根据本技术的另一实施例的SSRT装置的示意横截面图。8 is a schematic cross-sectional view of an SSRT device according to another embodiment of the present technology.

图9为根据本技术的另一实施例的SSRT装置的示意横截面图。9 is a schematic cross-sectional view of an SSRT device according to another embodiment of the present technology.

图10为根据本技术的另一实施例的SSRT装置的示意横截面图。10 is a schematic cross-sectional view of an SSRT device according to another embodiment of the present technology.

图11A到11E为说明根据本技术的实施例的SSRT装置的形成过程的示意横截面图。11A-11E are schematic cross-sectional views illustrating the formation process of an SSRT device in accordance with an embodiment of the present technology.

具体实施方式Detailed ways

下文中描述固态传感器(“SSRT”)装置及其相关联系统及方法的若干实施例的具体细节。术语“SSRT”及“辐射传感器”一般是指裸片或其它结构,其包含半导体材料作为有源媒体以将电能转换为可见光谱、紫外线光谱、红外线光谱及/或其它光谱内的电磁辐射。例如,SSRT包含固态发光体(例如LED、激光二极管等等)及/或除电丝极、等离子体或气体以外的其它发射源。替代地,SSRT可包含将电磁辐射转换为电的固态装置。另外,术语“衬底”可根据其所使用的上下文而指代晶片级衬底或单一化装置级衬底。相关领域的技术人员还应了解,本技术可具有额外实施例且可在无需以下参考图1到11而描述的实施例的若干细节的情况下实践本技术。Specific details of several embodiments of solid state sensor ("SSRT") devices and their associated systems and methods are described below. The terms "SSRT" and "radiation sensor" generally refer to a die or other structure that includes semiconductor material as an active medium to convert electrical energy into electromagnetic radiation in the visible, ultraviolet, infrared, and/or other spectra. For example, SSRTs include solid state light emitters (eg, LEDs, laser diodes, etc.) and/or sources of emission other than filaments, plasmas, or gases. Alternatively, an SSRT may comprise a solid-state device that converts electromagnetic radiation into electricity. Additionally, the term "substrate" may refer to a wafer-level substrate or a singulated device-level substrate, depending on the context in which it is used. Those skilled in the relevant art will also appreciate that the technology may have additional embodiments and that the technology may be practiced without several of the details of the embodiments described below with reference to FIGS. 1-11 .

在某些应用中,常规SSRT封装的许多功能是不必要的。例如,一些常规SSRT装置被并入到具有用于足够支撑、保护及散热的组件的系统中,从而导致常规SSRT封装的此类组件变得多余。此外,常规SSRT封装的某些组件可导致可靠性问题。例如,SSRT以高温操作且SSRT的不同组件的不同膨胀及收缩可导致SSRT与导线(其通常用以将SSRT连接到装置引线)之间的连接故障。本技术的若干实施例无需接线及不必要的封装元件,同时以倒装芯片式安装保留完整功能性。In some applications, many of the functions encapsulated by conventional SSRTs are unnecessary. For example, some conventional SSRT devices are incorporated into systems with components for adequate support, protection, and heat dissipation, rendering such components of conventional SSRT packages redundant. Additionally, certain components of conventional SSRT packages can cause reliability issues. For example, SSRTs operate at high temperatures and differential expansion and contraction of the different components of the SSRT can lead to connection failures between the SSRT and wires (which are typically used to connect the SSRT to device leads). Several embodiments of the present technology eliminate the need for wiring and unnecessary packaging components, while retaining full functionality with flip-chip mounting.

图1为根据本技术的实施例的SSRT装置100的示意横截面图。在一个实施例中,SSRT装置100包含:辐射传感器102,其在图2中更详细说明;及透射支撑组合件104,其通过倒装芯片式安装形式而电及机械地耦合到辐射传感器。透射支撑组合件104的至少一部分足以透射辐射传感器102产生或接收的辐射。透射支撑组合件104还具足够刚性,或具机械强度使得其在处置及实施期间保护及支撑辐射传感器102。常规辐射传感器及其它固态组件通常倒装芯片式安装到不透明支撑结构上的引线。相比之下,如图1中所展示,本技术的实施例可包含倒装芯片式安装到具至少部分透射性的结构(例如透射支撑组合件104)的辐射传感器102。此配置无需线接合及/或背侧支撑,同时仍提供光修改及与外部系统的电路的兼容性。Figure 1 is a schematic cross-sectional view of an SSRT device 100 in accordance with an embodiment of the present technology. In one embodiment, SSRT device 100 includes: a radiation sensor 102, which is described in more detail in FIG. 2; and a transmissive support assembly 104, which is electrically and mechanically coupled to the radiation sensor by flip-chip mounting. At least a portion of support assembly 104 is sufficiently transmissive to radiation generated or received by radiation sensor 102 . The transmissive support assembly 104 is also sufficiently rigid, or mechanically strong, such that it protects and supports the radiation sensor 102 during handling and implementation. Conventional radiation sensors and other solid-state components are typically flip-chip mounted to leads on an opaque support structure. In contrast, as shown in FIG. 1 , embodiments of the present technology may include a radiation sensor 102 flip-chip mounted to an at least partially transmissive structure, such as a transmissive support assembly 104 . This configuration eliminates the need for wire bonding and/or backside support, while still providing optical modification and circuit compatibility with external systems.

如图2中所展示,辐射传感器102包含传感器结构106,其具有第一半导体材料108、作用区110及第二半导体材料112。第一半导体材料108可为P型半导体材料,例如P型氮化镓(“P-GaN”)。第二半导体材料112可为N型半导体材料,例如N型氮化镓(“N-GaN”)。第一半导体材料108及第二半导体材料112可除N-GaN外还个别地包含砷化镓(GaAs)、砷化铝镓(AlGaAs)、磷化镓砷(GaAsP)、磷化镓(III)(GaP)、硒化锌(ZnSe)、氮化硼(BN)、氮化铝镓(AlGaN)及/或其它适合的半导体材料中的至少一者,或包含以上中的至少一者取代N-GaN。作用区110可包含单量子阱(“SQW”)、多量子阱(“MQW”)及/或块状半导体材料。术语“块状半导体材料”一般是指具有约10纳米与约500纳米之间的厚度的单颗粒半导体材料(例如氮化铟镓(“InGaN”))。在某些实施例中,作用区110可包含InGaN SQW、MQW或氮化镓/氮化铟镓(GaN/InGaN)块状材料。在其它实施例中,作用区110可包含磷化铝镓铟(AlGaInP)、氮化铝镓铟(AlGaInN)及/或其它适合的材料或配置。As shown in FIG. 2 , radiation sensor 102 includes a sensor structure 106 having a first semiconductor material 108 , an active region 110 and a second semiconductor material 112 . The first semiconductor material 108 may be a P-type semiconductor material, such as P-type gallium nitride (“P-GaN”). The second semiconductor material 112 can be an N-type semiconductor material, such as N-type gallium nitride (“N-GaN”). The first semiconductor material 108 and the second semiconductor material 112 may individually include gallium arsenide (GaAs), aluminum gallium arsenide (AlGaAs), gallium arsenide phosphide (GaAsP), gallium (III) phosphide in addition to N-GaN (GaP), zinc selenide (ZnSe), boron nitride (BN), aluminum gallium nitride (AlGaN) and/or at least one of other suitable semiconductor materials, or at least one of the above is substituted for N- GaN. Active region 110 may include single quantum wells ("SQW"), multiple quantum wells ("MQW"), and/or bulk semiconductor material. The term "bulk semiconductor material" generally refers to a single grain of semiconductor material, such as indium gallium nitride ("InGaN"), having a thickness between about 10 nanometers and about 500 nanometers. In some embodiments, the active region 110 may comprise InGaN SQW, MQW or gallium nitride/indium gallium nitride (GaN/InGaN) bulk material. In other embodiments, the active region 110 may include aluminum gallium indium phosphide (AlGaInP), aluminum gallium indium nitride (AlGaInN), and/or other suitable materials or configurations.

图2中所说明的辐射传感器102为侧向类型且包含分别连接到第一半导体材料108及第二半导体材料112的第一接触件114及第二接触件116。第一接触件114及第二接触件116可包含金属,例如镍(Ni)、银(Ag)、铜(Cu)、铝(Al)及钨(W)。电介质材料118使第二接触件116与第一半导体材料108及作用区110隔离。电介质材料118可包含二氧化硅(SiO2)及/或氮化硅(SiN)。辐射传感器102还可包含第二半导体材料112处的载体衬底120。载体衬底120可为(例如)金属(例如镍(Ni)或金(Au))、硅、氮化铝或蓝宝石。辐射传感器102具有作用侧122及背侧124。为在载体衬底120不具反射性时改善来自作用侧122的发射,可将反射器(例如包含金属(例如镍(Ni)或金(Au))的反射器)定位在第二半导体材料112与载体衬底120之间。The radiation sensor 102 illustrated in FIG. 2 is of the lateral type and includes a first contact 114 and a second contact 116 connected to the first semiconductor material 108 and the second semiconductor material 112 , respectively. The first contact 114 and the second contact 116 may include metals such as nickel (Ni), silver (Ag), copper (Cu), aluminum (Al) and tungsten (W). The dielectric material 118 isolates the second contact 116 from the first semiconductor material 108 and the active region 110 . The dielectric material 118 may include silicon dioxide (SiO 2 ) and/or silicon nitride (SiN). The radiation sensor 102 may also include a carrier substrate 120 at the second semiconductor material 112 . The carrier substrate 120 can be, for example, a metal such as nickel (Ni) or gold (Au), silicon, aluminum nitride, or sapphire. The radiation sensor 102 has an active side 122 and a backside 124 . To improve emission from the active side 122 when the carrier substrate 120 is not reflective, a reflector, for example one comprising a metal such as nickel (Ni) or gold (Au), can be positioned between the second semiconductor material 112 and between the carrier substrates 120 .

虽然已结合图2中所展示的特定辐射传感器102来说明所揭示技术的实施例,但所揭示技术的实施例可与几乎任何辐射传感器102(其包含具有各种接触件结构的辐射传感器(例如垂直及侧向辐射传感器)以及具有各种尺寸及形状的辐射传感器)一起使用。本技术的实施例还可与单一辐射传感器或多个辐射传感器(例如一个或一个以上辐射传感器阵列)一起使用。载体衬底120也是任选的。如果载体衬底120存在,那么载体衬底120通常位于辐射传感器102的背侧124上(如图2中所展示的辐射传感器中),但在一些情况中,载体衬底可位于辐射传感器的作用侧122上。当载体衬底120定位在辐射传感器102的作用侧122上时,载体衬底120可由透明材料(例如蓝宝石)制成。Although embodiments of the disclosed technology have been described in connection with the particular radiation sensor 102 shown in FIG. vertical and lateral radiation sensors) and radiation sensors of various sizes and shapes). Embodiments of the present technology may also be used with a single radiation sensor or with multiple radiation sensors, such as one or more radiation sensor arrays. The carrier substrate 120 is also optional. If present, the carrier substrate 120 is typically located on the backside 124 of the radiation sensor 102 (as in the radiation sensor shown in FIG. 2 ), but in some cases the carrier substrate may be located in the role of the radiation sensor. on side 122. When the carrier substrate 120 is positioned on the active side 122 of the radiation sensor 102, the carrier substrate 120 may be made of a transparent material such as sapphire.

在本技术的若干实施例中,辐射传感器102的背侧124为SSRT装置100的外表面。这与SSRT被完全围封在封装内的常规SSRT装置不同。考虑到这一点,并入有具有由非常适合于直接暴露于外部系统的材料(例如具有良好耐蚀性及耐久性的材料)制成的载体衬底120的SSRT 100可能是有效的。使载体衬底120包含具有高导热率以改善散热性的材料也可能是有效的。尤其适合于载体衬底120的材料的实例包含金(Au)及氮化铝(AlN)。In several embodiments of the present technology, backside 124 of radiation sensor 102 is the outer surface of SSRT device 100 . This is different from conventional SSRT devices where the SSRT is completely enclosed within the package. With this in mind, it may be effective to incorporate an SSRT 100 having a carrier substrate 120 made of a material well suited for direct exposure to external systems, such as a material with good corrosion resistance and durability. It may also be effective for the carrier substrate 120 to comprise a material with high thermal conductivity to improve heat dissipation. Examples of materials that are particularly suitable for carrier substrate 120 include gold (Au) and aluminum nitride (AlN).

返回参考图1,SSRT装置100的所说明实施例进一步包含辐射传感器102与透射支撑组合件104之间的底部填充物126。透射支撑组合件104包含透射支撑部件128及边缘反射器130。透射支撑部件128可包含基质材料132(例如聚合材料)及转换器材料134(例如掺铈(III)钇铝石榴石(YAG),其在基质材料中具有特定浓度以在光致发光下发出从绿色到黄色及到红色的色彩范围)。在其它实施例中,转换器材料134可包含掺钕YAG、钕铬双掺YAG、掺铒YAG、掺镱YAG、钕铈双掺YAG、钬铬铥三掺YAG、掺铥YAG、掺铬(IV)YAG、掺镝YAG、掺钐YAG、掺铽YAG及/或其它适合的波长转换材料。来自传感器结构106(图2)的发射(例如光)可照射转换器材料134,且经照射转换器材料可发出具有某一质量(例如色彩、暖和度、强度等等)的光。边缘反射器130可防止或减少通过透射支撑组合件104的边缘的光管道及发射损失。适合于边缘反射器130的材料包含银(Ag)及金(Au)。Referring back to FIG. 1 , the illustrated embodiment of the SSRT device 100 further includes an underfill 126 between the radiation sensor 102 and the transmissive support assembly 104 . The transmissive support assembly 104 includes a transmissive support member 128 and an edge reflector 130 . The transmissive support member 128 may comprise a matrix material 132, such as a polymeric material, and a transducer material 134, such as cerium(III) doped yttrium aluminum garnet (YAG), at a concentration in the matrix material to emit light from color range from green to yellow to red). In other embodiments, the converter material 134 may comprise neodymium-doped YAG, neodymium-chromium double-doped YAG, erbium-doped YAG, ytterbium-doped YAG, neodymium-cerium double-doped YAG, holmium-chromium-thulium triple-doped YAG, thulium-doped YAG, chromium-doped ( IV) YAG, dysprosium-doped YAG, samarium-doped YAG, terbium-doped YAG and/or other suitable wavelength conversion materials. Emission (eg, light) from sensor structure 106 (FIG. 2) may illuminate converter material 134, and the illuminated converter material may emit light with a certain quality (eg, color, warmth, intensity, etc.). The edge reflectors 130 can prevent or reduce light piping and emission losses through the edges of the transmissive support assembly 104 . Suitable materials for the edge reflector 130 include silver (Ag) and gold (Au).

在图1所说明的SSRT装置100的实施例中,透射支撑组合件104包含单一透射支撑部件128及透射支撑部件中的单一类型的转换器材料134。其它实施例可在透射支撑组合件104内具有一个以上透射支撑部件128。每一透射支撑部件128可不具有转换器材料134、具有一个转换器材料或具有多个转换器材料。例如,本技术的若干实施例可配置为红色-白色-绿色-蓝色(“RWGB”)装置。此类实施例的透射支撑组合件104可包含三个转换器材料134。第一转换器材料134可为黄色磷光体,其与由传感器结构106发出的蓝光混合以形成白色像素。第二及第三转换器材料134可分别为红色及绿色磷光体,其完全转换来自传感器结构的蓝光以形成对应红色及绿色像素。传感器结构106可产生蓝色发射且无需转换。RWGB装置可用在显示器、监视器、电视及/或其它适合的多色应用中。In the embodiment of the SSRT device 100 illustrated in FIG. 1 , the transmissive support assembly 104 includes a single transmissive support member 128 and a single type of converter material 134 in the transmissive support member. Other embodiments may have more than one transmissive support member 128 within the transmissive support assembly 104 . Each transmissive support member 128 may have no converter material 134 , one converter material or multiple converter materials. For example, several embodiments of the present technology may be configured as a red-white-green-blue ("RWGB") device. The transmissive support assembly 104 of such embodiments may include three converter materials 134 . The first converter material 134 may be a yellow phosphor that mixes with the blue light emitted by the sensor structure 106 to form white pixels. The second and third converter materials 134 may be red and green phosphors, respectively, that fully convert blue light from the sensor structure to form corresponding red and green pixels. The sensor structure 106 can produce blue emission without conversion. RWGB devices can be used in displays, monitors, televisions, and/or other suitable multi-color applications.

透射支撑组合件104还可包含具有图案化在透射支撑部件128上的多个引线136的导电选路。例如,引线136可为具有光图案化在透射支撑部件128的背侧138上的垫的铜(Cu)或铝(Al)迹线。在若干实施例中,引线各自包含经定尺寸以接纳垫之间的焊料凸块及迹线的两个或两个以上垫。透射支撑组合件104可进一步包含焊接掩模140,其图案化在引线136及透射支撑部件128的背侧138上以在引线136的垫上具有开口。焊接掩模140可包含电介质材料,例如二氧化硅(SiO2)、氮化硅(SiN)及/或其它适合d电介质材料。The transmissive support assembly 104 may also include conductive routing with a plurality of leads 136 patterned on the transmissive support member 128 . For example, the leads 136 may be copper (Cu) or aluminum (Al) traces with pads photopatterned on the backside 138 of the transmissive support member 128 . In several embodiments, the leads each include two or more pads sized to receive solder bumps and traces between the pads. The transmissive support assembly 104 may further include a solder mask 140 patterned on the leads 136 and the backside 138 of the transmissive support member 128 to have openings on the pads of the leads 136 . Solder mask 140 may include a dielectric material such as silicon dioxide (SiO 2 ), silicon nitride (SiN), and/or other suitable dielectric materials.

辐射传感器102有效封装在透射支撑组合件104上。例如,SSRT装置100可包含:焊料连接142,其介于辐射传感器102的作用侧122上的接合垫(图中未展示)与透射支撑部件128的背侧138上的引线136之间;及外部焊料凸块144,其在焊接掩模140的开口内被部分隔离。在所说明实施例中,外部焊料凸块144为SSRT装置100的唯一外部电极。其它实施例可具有额外外部电极或另一电极配置。例如,在若干实施例中,辐射传感器102为垂直装置且辐射传感器的背侧124包含额外外部电极。这些实施例可在辐射传感器102的背侧124上包含额外焊料以促进辐射传感器的背侧到外部系统的电连接。Radiation sensor 102 is operatively packaged on transmissive support assembly 104 . For example, SSRT device 100 may include: solder connections 142 between bond pads (not shown) on active side 122 of radiation sensor 102 and leads 136 on backside 138 of transmissive support member 128; and external The solder bumps 144 are partially isolated within the openings of the solder mask 140 . In the illustrated embodiment, the external solder bump 144 is the only external electrode of the SSRT device 100 . Other embodiments may have additional external electrodes or another electrode configuration. For example, in several embodiments, the radiation sensor 102 is a vertical device and the backside 124 of the radiation sensor includes additional external electrodes. These embodiments may include additional solder on the backside 124 of the radiation sensor 102 to facilitate electrical connection of the backside of the radiation sensor to external systems.

焊料连接142及外部焊料凸块144可包含半导体制造技术中已知的任何焊接材料。在若干实施例中,焊料连接142及外部焊料凸块144包含金(Au)、镍(Ni)、铜(Cu)、铝(Al)、钨(W)及/或其它适合的导电材料。焊料连接142及外部焊料凸块144还可包含导电聚合物(例如聚乙炔、聚吡咯或聚苯胺)。由于焊料连接142及引线136可定位在辐射传感器102的作用侧122上,所以可通过使用透明导电材料而潜在地改善来自SSRT装置100的输出。例如,焊料连接142及/或引线136可包含氧化铟锡(ITO)。Solder connection 142 and outer solder bump 144 may comprise any solder material known in the art of semiconductor manufacturing. In several embodiments, solder connections 142 and outer solder bumps 144 include gold (Au), nickel (Ni), copper (Cu), aluminum (Al), tungsten (W), and/or other suitable conductive materials. Solder connections 142 and outer solder bumps 144 may also include conductive polymers such as polyacetylene, polypyrrole, or polyaniline. Since the solder connections 142 and leads 136 can be positioned on the active side 122 of the radiation sensor 102, the output from the SSRT device 100 can potentially be improved through the use of transparent conductive materials. For example, solder connections 142 and/or leads 136 may comprise indium tin oxide (ITO).

底部填充物126包围焊料连接142且占用辐射传感器102与透射支撑组合件104之间的剩余空间。底部填充物126可(例如)吸收由辐射传感器102及透射支撑组合件104的差异热膨胀及收缩引起的应力。这防止此膨胀及收缩导致焊料连接142受损,焊料连接142受损可导致装置故障。适合于底部填充物126的材料包含实质上透光材料,例如实质上透光聚硅氧或实质上透光环氧树脂。在若干实施例中,底部填充材料与透射支撑组合件104的一个或一个以上透射支撑部件128的基质材料132相同。The underfill 126 surrounds the solder connection 142 and occupies the remaining space between the radiation sensor 102 and the transmissive support assembly 104 . The underfill 126 can, for example, absorb stresses caused by differential thermal expansion and contraction of the radiation sensor 102 and the transmissive support assembly 104 . This prevents this expansion and contraction from causing damage to the solder connection 142, which could lead to device failure. Suitable materials for the underfill 126 include substantially light-transmitting materials, such as substantially light-transmitting silicone or substantially light-transmitting epoxy. In several embodiments, the underfill material is the same as the matrix material 132 of the one or more transmissive support components 128 of the transmissive support assembly 104 .

图3说明与初级组件147(例如可与SSRT装置100集成的灯、电器、车辆或其它产品)的外部系统安装件146的一个实例连接的SSRT装置100。外部系统安装件146包含衬底148、安装件150及两个系统电极152。为将SSRT装置100连接到外部系统安装件146,SSRT装置可被放置在外部系统安装件上使得外部焊料凸块144与系统电极152对准。接着,可回焊外部焊料凸块144。辐射传感器102可搁置在安装件150上、接合到安装件(例如经由黏着剂)或悬浮在安装件附近。在某些外部系统安装件146中,安装件150包含用于支撑辐射传感器102的托架或其它凹座。外部系统安装件146还可不包含安装件150且由外部焊料凸块144的回焊形成的焊料接合可向SSRT装置100提供机械支撑。FIG. 3 illustrates the SSRT device 100 connected to one example of an external system mount 146 of a primary component 147 , such as a light, appliance, vehicle, or other product that may be integrated with the SSRT device 100 . The external system mount 146 includes a substrate 148 , a mount 150 and two system electrodes 152 . To connect SSRT device 100 to external system mount 146 , the SSRT device may be placed on the external system mount such that external solder bumps 144 are aligned with system electrodes 152 . Next, the outer solder bumps 144 may be reflowed. Radiation sensor 102 may rest on mount 150 , be bonded to the mount (eg, via an adhesive), or be suspended near the mount. In some external system mounts 146 , mount 150 includes a bracket or other recess for supporting radiation sensor 102 . The external system mount 146 may also not include the mount 150 and the solder joint formed by the reflow of the external solder bump 144 may provide mechanical support to the SSRT device 100 .

在具有侧向型辐射传感器102的所说明SSRT装置100中,外部焊料凸块144中的一者为P型连接且另一外部焊料凸块为N型连接。如图3中所展示,这些外部焊料凸块144分别连接到P型(+)及N型(-)系统电极。在辐射传感器102包含背侧接触件的实施例中,安装件150可包含额外系统电极。例如,在包含垂直型辐射传感器102的实施例中,辐射传感器的背侧接触件可焊接到安装件150上的系统电极或代替安装件150。在此类实施例中,与辐射传感器102的背侧124连接的系统电极可为P型且其它电极可为N型,或与辐射传感器的背侧连接的系统电极可为N型且其它电极可为P型。In the illustrated SSRT device 100 with side-facing radiation sensor 102, one of the outer solder bumps 144 is a P-type connection and the other outer solder bump is an N-type connection. As shown in FIG. 3, these external solder bumps 144 are connected to P-type (+) and N-type (-) system electrodes, respectively. In embodiments where radiation sensor 102 includes backside contacts, mount 150 may include additional system electrodes. For example, in embodiments including vertical radiation sensors 102 , the backside contacts of the radiation sensors may be soldered to system electrodes on mount 150 or in place of mount 150 . In such embodiments, the system electrode connected to the backside 124 of the radiation sensor 102 can be P-type and the other electrodes can be N-type, or the system electrode connected to the backside of the radiation sensor can be N-type and the other electrodes can be N-type. It is P type.

图2中所展示的辐射传感器102的第一接触件114与第二接触件116在辐射传感器的作用侧122上实质上共面。此配置促进倒装芯片式安装,这是因为可使用具有实质上相同尺寸的焊料连接142来将一个表面上的两个或两个以上实质上共面接触件连接到另一表面上的两个或两个以上实质上共面引线。然而,此特征不是必需的。若干实施例包含具有作用侧122上的非共面接触件的辐射传感器102。在这些实施例中,不同尺寸焊料连接142可存在于辐射传感器102与透射支撑组合件104的引线136之间。替代地,可非对称地形成SSRT装置100的其它部分以接纳辐射传感器102上的不同接触位置。例如,引线136可具有不同厚度或被放置在一个或一个以上间隔层上。The first contact 114 and the second contact 116 of the radiation sensor 102 shown in FIG. 2 are substantially coplanar on the active side 122 of the radiation sensor. This configuration facilitates flip-chip mounting because two or more substantially coplanar contacts on one surface can be connected to two on the other surface using solder connections 142 having substantially the same size. or two or more substantially coplanar leads. However, this feature is not required. Several embodiments include radiation sensor 102 with non-coplanar contacts on active side 122 . In these embodiments, different sized solder connections 142 may exist between the radiation sensor 102 and the leads 136 of the transmissive support assembly 104 . Alternatively, other portions of SSRT device 100 may be formed asymmetrically to accommodate different contact locations on radiation sensor 102 . For example, leads 136 may have different thicknesses or be placed on one or more spacer layers.

SSRT装置100的外部焊料凸块144实质上为对称的且远离透射支撑组合件104而延伸到与辐射传感器102的背侧124实质上平齐的平面。此配置适合于将SSRT装置100连接到外部系统安装件146(其中安装件150与系统电极152实质上共面,例如图3中所展示的外部系统安装件146)。为连接到具有不同配置的外部系统安装件146,外部焊料凸块144可具不同尺寸以(例如)延伸到相对于辐射传感器102的背侧124的不同垂直位置。SSRT装置100的其它部分也可经不同配置以具有例如上述特征(其用于接纳具有不同垂直位置的辐射传感器102的接触件)的特征。例如,可通过延长或缩短引线136而容易地修改外部焊料凸块144的水平位置。为具更大变通性,还可用其它电连接类型(例如导线)替换外部焊料凸块144。用以替代外部焊料凸块144的导线可比常规SSRT装置中用以将SSRT连接到其它装置组件的导线可靠。用以替代外部焊料凸块144的导线(例如)可在组成上类似于引线136,且因此不经受由差异热膨胀引起的应力。The outer solder bumps 144 of the SSRT device 100 are substantially symmetrical and extend away from the transmissive support assembly 104 to a plane that is substantially flush with the backside 124 of the radiation sensor 102 . This configuration is suitable for connecting SSRT device 100 to an external system mount 146 (where mount 150 is substantially coplanar with system electrode 152, such as external system mount 146 shown in FIG. 3). For connection to external system mounts 146 having different configurations, external solder bumps 144 may be of different sizes to, for example, extend to different vertical positions relative to backside 124 of radiation sensor 102 . Other portions of the SSRT device 100 may also be configured differently with features such as those described above for receiving contacts of radiation sensors 102 having different vertical positions. For example, the horizontal position of the external solder bumps 144 can be easily modified by lengthening or shortening the leads 136 . For greater flexibility, the outer solder bumps 144 can also be replaced with other types of electrical connections, such as wires. The wires used to replace the external solder bumps 144 may be more reliable than the wires used in conventional SSRT devices to connect the SSRT to other device components. Wires used in place of outer solder bumps 144, for example, may be similar in composition to leads 136, and thus not subject to stresses caused by differential thermal expansion.

在本技术的若干实施例中,形成与辐射传感器102分离的透射支撑组合件104。相比而言,许多常规SSRT装置的透射组件直接形成于辐射传感器上(例如通过将材料沉积到辐射传感器的表面上)。分离地形成透射支撑组合件104可具有利性,这是因为某些形成过程(例如模制)难以直接在辐射传感器表面执行。特定来说,可使用模制来形成具有各种有效形状及表面特性的透射支撑组合件104的部分(例如图1中所展示的透射支撑部件128)。在常规设计中,直接形成于辐射传感器上的透射组件会被限制尺寸及形状。相比之下,本技术的实施例可包含透射支撑部件128,其尺寸及形状确定与辐射传感器102的尺寸及形状或阵列中辐射传感器的数目无关。因此,通常可根据SSRT装置100将被并入到的外部系统的次级光学组件或其它结构的规格而设定这些实施例的透射支撑部件128的尺寸及形状。例如,一些外部系统包含反射器腔、菲涅耳(Fresnel)透镜及/或枕形透镜以修改来自SSRT装置100的发射。可根据此类结构的规格而设定本技术的若干实施例的透射支撑部件128的尺寸及形状,使得SSRT装置100与此类结构有效集成。例如,本技术的若干实施例的透射支撑部件128经定尺寸及定形以支撑外部系统的某些组件(例如某些次级光学组件)或配合在其内部。In several embodiments of the present technology, the transmissive support assembly 104 is formed separate from the radiation sensor 102 . In contrast, the transmissive components of many conventional SSRT devices are formed directly on the radiation sensor (eg, by depositing materials onto the surface of the radiation sensor). Forming the transmissive support assembly 104 separately may be advantageous because certain forming processes, such as molding, are difficult to perform directly on the radiation sensor surface. In particular, molding can be used to form portions of the transmissive support assembly 104 (such as the transmissive support member 128 shown in FIG. 1 ) having various effective shapes and surface properties. In conventional designs, the transmissive elements formed directly on the radiation sensor are limited in size and shape. In contrast, embodiments of the present technology may include a transmissive support member 128 that is sized and shaped independently of the size and shape of radiation sensors 102 or the number of radiation sensors in the array. Thus, the size and shape of the transmissive support member 128 of these embodiments may generally be set according to the specifications of the secondary optical components or other structures of the external system into which the SSRT device 100 will be incorporated. For example, some external systems include reflector cavities, Fresnel lenses, and/or pincushion lenses to modify the emission from the SSRT device 100 . The transmissive support member 128 of several embodiments of the present technology may be sized and shaped according to the specifications of such structures such that the SSRT device 100 is effectively integrated with such structures. For example, the transmissive support member 128 of several embodiments of the present technology is sized and shaped to support or fit within certain components of the external system, such as certain secondary optical components.

如(例如)图1中所展示,可用介入空间中的焊料连接142及底部填充材料126来隔开透射支撑组合件104与辐射传感器102。以此方式隔开透射支撑部件128与辐射传感器102可具有利性。例如,可能难以在透射组件直接形成于辐射传感器表面上时形成相对较厚、尺寸均匀且/或转换器浓度均匀的此类透射组件。一阵列中的多个辐射传感器还可安装到与所述辐射传感器阵列隔开的透射支撑部件128。此外,有效用于透射组件的一些材料(例如某些聚合物)可能因操作期间与辐射传感器直接接触产生的热而变暗或以其它方式受损。使这些材料与辐射传感器隔开可防止此损害发生。As shown, for example, in FIG. 1 , the transmissive support assembly 104 and the radiation sensor 102 may be separated by a solder connection 142 and an underfill material 126 in the intervening space. Separating the transmissive support member 128 from the radiation sensor 102 in this manner may be advantageous. For example, it may be difficult to form such transmissive components that are relatively thick, uniform in size, and/or of uniform concentration of converters when such transmissive components are formed directly on the radiation sensor surface. Multiple radiation sensors in an array may also be mounted to a transmissive support member 128 spaced apart from the radiation sensor array. Additionally, some materials effective for use in transmissive components, such as certain polymers, may darken or otherwise be damaged by heat generated from direct contact with the radiation sensor during operation. Isolating these materials from the radiation sensor prevents this damage from occurring.

图4说明SSRT装置200,其包含具有透射支撑部件204的透射支撑组合件202,透射支撑部件204实质上呈半球形且在SSRT装置的几乎整个表面上延伸。图5说明SSRT装置250,其包含具有透射支撑部件254的透射支撑组合件252,透射支撑部件254在边缘附近实质上呈平坦状且在SSRT装置的中心部分上实质上呈半球形。4 illustrates an SSRT device 200 comprising a transmissive support assembly 202 having a transmissive support member 204 that is substantially hemispherical and extends over substantially the entire surface of the SSRT device. 5 illustrates an SSRT device 250 comprising a transmissive support assembly 252 having a transmissive support member 254 that is substantially flat near the edges and substantially hemispherical over the central portion of the SSRT device.

在图4及5的SSRT装置200、250中,透射支撑部件204、254包含实质上均匀分布的转换器材料134。在其它实施例中,转换器材料134在透射支撑部件中的分布可不均匀。图6说明与图4的SSRT装置200类似的SSRT装置300,但其中透射支撑组合件302具有包含不均匀分布的转换器材料134的透射支撑部件304。图7说明与图5的SSRT装置250类似的SSRT装置350,但其中透射支撑组合件352具有包含不均匀分布的转换器材料134的透射支撑部件354。图6的透射支撑部件304包含:第一部分306,其具有低浓度的转换器材料134或不具有转换器材料;及第二部分308,其具有相对较高浓度的转换器材料。类似地,图7的透射支撑部件354包含:第一部分356,其具有低浓度的转换器材料134或不具有转换器材料;及第二部分358,其具有相对较高浓度的转换器材料。在图6及7中,用虚线指示透射支撑部件308、358的第一部分306、356与透射支撑部件304、354的第二部分308、358之间的界限,这是因为第一及第二部分位于相同透射支撑部件内。其它实施例可包含具有不同浓度的转换器材料的分离的透射支撑部件,例如与图6及7中所展示的透射支撑部件304、354的第一部分306、356及第二部分308、358相似的分离的透射支撑部件。In the SSRT devices 200 , 250 of FIGS. 4 and 5 , the transmissive support members 204 , 254 include a substantially uniform distribution of the converter material 134 . In other embodiments, the distribution of converter material 134 in the transmissive support member may not be uniform. FIG. 6 illustrates an SSRT device 300 similar to SSRT device 200 of FIG. 4 , but wherein the transmissive support assembly 302 has a transmissive support member 304 comprising a non-uniform distribution of converter material 134 . FIG. 7 illustrates an SSRT device 350 similar to SSRT device 250 of FIG. 5 , but in which the transmissive support assembly 352 has a transmissive support member 354 comprising a non-uniform distribution of converter material 134 . The transmissive support member 304 of FIG. 6 comprises a first portion 306 having a low concentration of converter material 134 or no converter material and a second portion 308 having a relatively higher concentration of converter material. Similarly, the transmissive support member 354 of FIG. 7 comprises a first portion 356 having a low concentration of converter material 134 or no converter material and a second portion 358 having a relatively higher concentration of converter material. In FIGS. 6 and 7, the boundary between the first portion 306, 356 of the transmissive support member 308, 358 and the second portion 308, 358 of the transmissive support member 304, 354 is indicated by a dashed line because the first and second portions within the same transmissive support. Other embodiments may comprise separate transmissive support members with different concentrations of converter material, eg similar to the first portion 306, 356 and second portion 308, 358 of the transmissive support members 304, 354 shown in FIGS. 6 and 7 Separate transmissive support components.

图8说明SSRT装置400,其具有包含第一透射支撑部件404及第二透射支撑部件406的透射支撑组合件402。第一透射支撑部件404包含转换器材料134。第二透射支撑部件406为定位在辐射传感器102与第一透射支撑部件404之间的过渡层。其它实施例可包含作为唯一透射支撑部件的过渡层、透射支撑组合件内的不同位置处的过渡层或透射支撑组合件内的多个过渡层。第二透射支撑部件406可由具有折射率的材料制成,所述折射率介于辐射传感器102的传感器结构106的折射率与比第二透射支撑部件更远离辐射传感器定位的第一透射支撑部件404的折射率之间。在若干实施例中,透射支撑部件(其为过渡层)具有从约1.6到约1.9的折射率。来自辐射传感器102的发射穿过此材料通常通过减少折射及其相关联背部反射而改善SSRT装置400的输出。适合于第二透射支撑部件406的材料的实例包含玻璃、三乙酰纤维素、聚对苯二甲酸乙二酯及聚碳酸酯。FIG. 8 illustrates an SSRT device 400 having a transmissive support assembly 402 comprising a first transmissive support member 404 and a second transmissive support member 406 . The first transmissive support member 404 contains converter material 134 . The second transmissive support member 406 is a transition layer positioned between the radiation sensor 102 and the first transmissive support member 404 . Other embodiments may include a transition layer as the only transmissive support component, transition layers at different locations within the transmissive support assembly, or multiple transition layers within the transmissive support assembly. The second transmissive support member 406 may be made of a material having a refractive index intermediate that of the sensor structure 106 of the radiation sensor 102 and the first transmissive support member 404 positioned farther from the radiation sensor than the second transmissive support member. between the refractive indices. In several embodiments, the transmissive support member, which is the transition layer, has a refractive index of from about 1.6 to about 1.9. Transmission from radiation sensor 102 through this material generally improves the output of SSRT device 400 by reducing refraction and its associated back reflections. Examples of materials suitable for the second transmissive support member 406 include glass, triacetyl cellulose, polyethylene terephthalate, and polycarbonate.

在本技术的若干实施例中,可使透射支撑组合件的外表面或透射支撑组合件内的界面粗糙化及/或纹理化。图9说明SSRT装置450,其具有含透射支撑部件454(其具有纹理化表面456)的透射支撑组合件452。包含纹理化表面(例如纹理化表面456)可通过(例如)减少透射支撑组合件452内的全内反射而改善来自SSRT装置450的输出。纹理化可包含规则图案化、随机图案化、微图案化及/或宏图案化。纹理化方法包含在形成透射支撑部件之后光刻、蚀刻及磨蚀。也可使用模制(下文中更详细论述)来改动本技术的实施例中的透射支撑部件的表面特性。In several embodiments of the present technology, the outer surface of the transmissive support assembly or the interface within the transmissive support assembly can be roughened and/or textured. FIG. 9 illustrates an SSRT device 450 having a transmissive support assembly 452 comprising a transmissive support member 454 having a textured surface 456 . Inclusion of a textured surface such as textured surface 456 may improve output from SSRT device 450 by, for example, reducing total internal reflection within transmissive support assembly 452 . Texturing can include regular patterning, random patterning, micropatterning and/or macropatterning. Texturing methods include photolithography, etching, and abrasion after forming the transmissive support member. Molding (discussed in more detail below) can also be used to modify the surface properties of the transmissive support members in embodiments of the present technology.

图10说明SSRT装置500,其包含围绕SSRT装置的背侧的大部分的囊封剂502。囊封剂502可保护SSRT装置500的辐射传感器102及其它部分以及在操作期间消散来自辐射传感器的热。适合于囊封剂502的材料包含聚合材料,例如透明及不透明环氧树脂。外部焊料凸块504大于图1及图3到9中所展示的外部焊料凸块144以便延伸超出囊封剂502的外表面。当将SSRT装置500连接到外部系统安装件146时,囊封剂502的底面可搁置在安装件150上、接合到安装件(例如经由黏着剂)或悬浮在安装件附近。如果辐射传感器102包含背侧接触件,那么电极可延伸穿过囊封剂502以连接到外部电极。Figure 10 illustrates an SSRT device 500 comprising an encapsulant 502 surrounding a majority of the backside of the SSRT device. The encapsulant 502 can protect the radiation sensor 102 and other portions of the SSRT device 500 as well as dissipate heat from the radiation sensor during operation. Materials suitable for encapsulant 502 include polymeric materials such as transparent and opaque epoxies. The outer solder bump 504 is larger than the outer solder bump 144 shown in FIGS. 1 and 3-9 so as to extend beyond the outer surface of the encapsulant 502 . When connecting SSRT device 500 to external system mount 146, the bottom surface of encapsulant 502 may rest on mount 150, be bonded to the mount (eg, via an adhesive), or be suspended near the mount. If radiation sensor 102 includes backside contacts, electrodes may extend through encapsulant 502 to connect to external electrodes.

图11A到11E说明根据本技术的实施例的SSRT装置100的形成过程。图11A展示已在形成衬底550上形成透射支撑部件128后的过程的阶段。形成衬底550可为具足够刚性或足够机械强度以支撑透射支撑部件128的任何衬底。例如,形成衬底550可为硅晶片、聚合物、玻璃或其它类型的晶片或薄片。透射支撑部件128可通过技术(例如模制、喷墨、旋转涂覆、化学气相沉积(“CVD”)或物理气相沉积(“PVD”))而形成于形成衬底550上。此外,模制通常非常适合于制造较厚透射支撑部件128,例如具有大于约150微米的厚度的透射支撑部件。旋转涂覆及其它沉积工艺通常更适合于制造较薄透射支撑部件128,例如具有小于约150微米的厚度的透射支撑部件。具有转换器材料134的较厚透射支撑部件128通常可实现与具有较低浓度的转换器材料的较薄透射支撑部件相同的转换程度。因此,可在较薄透射支撑部件需要超过饱和度的转换器材料浓度时使用具有转换器材料134的较厚透射支撑部件128。作为制造具有转换器材料134的透射支撑部件128的替代方案,可从(例如)Shin-Etsu Chemical有限公司(日本东京)购得具有转换器材料的预制透射支撑部件。11A-11E illustrate the formation process of an SSRT device 100 in accordance with an embodiment of the present technology. FIG. 11A shows the stages of the process after the transmissive support member 128 has been formed on the formation substrate 550 . Forming substrate 550 may be any substrate that is rigid enough or mechanically strong enough to support transmissive support member 128 . For example, forming substrate 550 may be a silicon wafer, polymer, glass, or other type of wafer or sheet. The transmissive support member 128 may be formed on the forming substrate 550 by techniques such as molding, inkjet, spin coating, chemical vapor deposition ("CVD"), or physical vapor deposition ("PVD"). Furthermore, molding is generally well suited for making thicker transmissive support members 128, such as transmissive support members having a thickness greater than about 150 microns. Spin-coating and other deposition processes are generally more suitable for making thinner transmissive support members 128, such as those having a thickness of less than about 150 microns. A thicker transmissive support member 128 with converter material 134 can generally achieve the same degree of conversion as a thinner transmissive support member with a lower concentration of converter material. Thus, a thicker transmissive support member 128 with converter material 134 may be used when a thinner transmissive support member requires a converter material concentration above saturation. As an alternative to fabricating the transmissive support member 128 with converter material 134, prefabricated transmissive support members with converter material are commercially available from, for example, Shin-Etsu Chemical Co., Ltd. (Tokyo, Japan).

在本技术的若干实施例中,前驱体材料沉积在形成衬底550上且接着经固化(例如通过超音波或热)以形成透射支撑组合件104的一个或一个以上透射支撑部件128。适合的前驱体材料包含液体及/或粉末以及聚合及/或非聚合材料。适合于具有转换器材料134的透射支撑部件128的前驱体材料包含含有磷光体颗粒的环氧树脂。前驱体材料也可经模制(例如射出模制),而非简单沉积。如果使用模制,那么形成衬底550可为模具的一部分。模制允许形成具有各种形状及尺寸的透射支撑部件,例如图1及图4到8中所展示的透射支撑部件128、204、254、304、354、404、406。还可使用模制来形成具有不同表面特性的透射支撑部件,例如图9中所展示的透射支撑部件454(其具有纹理化表面456)。例如,可将纹理图案并入到模具的一部分中。In several embodiments of the present technology, precursor materials are deposited on the forming substrate 550 and then cured (eg, by ultrasound or heat) to form the one or more transmissive support members 128 of the transmissive support assembly 104 . Suitable precursor materials include liquids and/or powders as well as polymeric and/or non-polymeric materials. A suitable precursor material for the transmissive support member 128 with converter material 134 comprises an epoxy resin containing phosphor particles. Precursor materials may also be molded (eg, injection molded) rather than simply deposited. If molding is used, the forming substrate 550 may be part of a mold. Molding allows for the formation of transmissive support members of various shapes and sizes, such as the transmissive support members 128 , 204 , 254 , 304 , 354 , 404 , 406 shown in FIGS. 1 and 4-8 . Molding can also be used to form a transmissive support member with different surface properties, such as the transmissive support member 454 (which has a textured surface 456 ) shown in FIG. 9 . For example, a textured pattern can be incorporated into a portion of the mold.

可使用一些模制技术来形成具有不同部分及不同浓度的转换器材料134的透射支撑部件,例如图6及7的透射支撑部件304、354。例如,前驱体材料可经模制且接着被允许在固化前的周期期间静止,同时重力导致转换器材料134的颗粒沉降。使用重力,经模制前驱体材料在固化前的周期期间相对于重力方向的定向确定最终透射支撑部件的配置。替代地,可将经模制前驱体材料放置在离心机中,且经模制前驱体材料在固化前的周期期间相对于离心力方向的定向确定最终透射支撑部件的配置。适合于模制本技术的实施例中所使用的透射支撑部件的机器包含TOWA公司(日本京都)的型号LCM1010及FFT1030W。Several molding techniques may be used to form transmissive support members with different portions and different concentrations of converter material 134 , such as the transmissive support members 304 , 354 of FIGS. 6 and 7 . For example, the precursor material may be molded and then allowed to rest during the pre-cure cycle while gravity causes the particles of converter material 134 to settle. Using gravity, the orientation of the molded precursor material during the pre-cure cycle with respect to the direction of gravity determines the configuration of the final transmissive support member. Alternatively, the molded precursor material can be placed in a centrifuge, and the orientation of the molded precursor material relative to the direction of centrifugal force during the cycle prior to curing determines the configuration of the final transmissive support member. Machines suitable for molding the transmissive supports used in embodiments of the present technology include models LCM1010 and FFT1030W from TOWA Corporation (Kyoto, Japan).

图11B展示已在透射支撑部件128上形成引线136后的过程的阶段,且图11C展示已在引线136上形成焊接掩模140后的阶段。可使用半导体制造技术中已知的任何沉积及图案化技术(例如CVD、PVD或原子层沉积(“ALD”))随后使用光刻来形成引线136及焊接掩模140。FIG. 11B shows a stage of the process after leads 136 have been formed on transmissive support member 128 , and FIG. 11C shows a stage after solder mask 140 has been formed on leads 136 . Leads 136 and solder mask 140 may be formed using any deposition and patterning technique known in the art of semiconductor fabrication, such as CVD, PVD, or atomic layer deposition ("ALD") followed by photolithography.

与图11A到11C中所展示的步骤分离,焊料球沉积到辐射传感器102的作用侧122上的接触件上。接着,辐射传感器102经翻转且被放置在图11C中所展示的结构上,其中辐射传感器的焊料球与引线136对准。接着,焊料经回焊(例如通过超音波或热)以产生具有图11D中所展示的焊料连接142的结构。替代地,焊料球可被放置在引线136上且辐射传感器102被放置到焊料球上。如图11E中所展示,底部填充物126接着被引入到透射支撑部件128与辐射传感器102之间的区域中。这可通过(例如)从图11D中所展示的结构的侧部注入经加热底部填充材料且接着固化所述底部填充材料(例如经由微波辐射)而完成。接着,外部焊料凸块144被沉积在焊接掩模140的开口中。最后,形成衬底550与透射支撑部件128分离以形成图1中所展示的SSRT装置100。虽然图11A到11E中未说明,但可(例如)通过蚀刻一阵列的SSRT装置内的个别SSRT装置之间及其周围的沟槽且在形成焊接掩模140之前将反射材料(例如银(Ag))沉积到所述沟槽中而形成边缘反射器130。一旦完成,就可沿所述沟槽的中心切割所述SSRT装置阵列使得所述反射材料的一部分保留在每一SSRT装置的边缘上。Separately from the steps shown in FIGS. 11A-11C , solder balls are deposited onto the contacts on the active side 122 of the radiation sensor 102 . Next, radiation sensor 102 is flipped over and placed on the structure shown in FIG. 11C with the radiation sensor's solder balls aligned with leads 136 . Next, the solder is reflowed (eg, by ultrasound or heat) to produce a structure with solder connection 142 shown in FIG. 11D . Alternatively, a solder ball may be placed on lead 136 and radiation sensor 102 placed onto the solder ball. As shown in FIG. 11E , an underfill 126 is then introduced into the region between the transmissive support member 128 and the radiation sensor 102 . This can be done, for example, by injecting heated underfill material from the side of the structure shown in FIG. 11D and then curing the underfill material (eg, via microwave radiation). Next, external solder bumps 144 are deposited in the openings of solder mask 140 . Finally, the formation substrate 550 is separated from the transmissive support member 128 to form the SSRT device 100 shown in FIG. 1 . Although not illustrated in FIGS. 11A through 11E , a reflective material such as silver (Ag )) is deposited into the trench to form the edge reflector 130. Once complete, the array of SSRT devices can be cut along the center of the trench such that a portion of the reflective material remains on the edge of each SSRT device.

可使用除参考图11A到11E而描述的过程以外的各种过程来制造根据本技术的实施例的SSRT装置100。例如,在若干实施例中,不使用形成衬底550。相反,SSRT装置100可形成于预形成的自行支撑透射支撑部件128(例如,包含转换器材料134的透射支撑部件或作为过渡层的透射支撑部件)上。当使用形成衬底550时,可在所述过程期间的各个时间移除形成衬底。例如,透射支撑组合件104可形成于形成衬底550上且接着在安装辐射传感器102之前从形成衬底移除。此外,辐射传感器102可安装到透射支撑组合件104或透射支撑组合件可安装到辐射传感器。The SSRT device 100 according to embodiments of the present technology may be manufactured using various processes other than those described with reference to FIGS. 11A to 11E . For example, in several embodiments, forming substrate 550 is not used. Instead, the SSRT device 100 may be formed on a pre-formed self-supporting transmissive support member 128 (eg, a transmissive support member comprising converter material 134 or as a transition layer). When using the forming substrate 550, the forming substrate may be removed at various times during the process. For example, transmissive support assembly 104 may be formed on forming substrate 550 and then removed from the forming substrate prior to mounting radiation sensor 102 . Additionally, radiation sensor 102 may be mounted to transmissive support assembly 104 or the transmissive support assembly may be mounted to the radiation sensor.

应从前述内容将了解,虽然本文中已出于说明的目的而描述本技术的特定实施例,但可在不背离本技术的情况下做出各种修改。例如,图1到11中所说明的实施例包含两个焊料连接142。本技术的其它实施例可包含一个、三个、四个、五个或更多数目的焊料连接142。可在其它实施例中组合或消除特定实施例的上下文中所描述的本技术的某些方面。例如,图1中所展示实施例的透射支撑组合件104可包含图8中所展示实施例的第二透射支撑部件406。此外,虽然已在那些实施例的上下文中描述与本技术的某些实施例相关联的优点,但其它实施例也可展现此类优点,且未必全部实施例均需要展现落在本技术的范围内的此类优点。因此,本发明及其相关联技术可涵盖本文中未明确展示或描述的其它实施例。From the foregoing it will be appreciated that, although specific embodiments of the technology have been described herein for purposes of illustration, various modifications may be made without departing from the technology. For example, the embodiment illustrated in FIGS. 1-11 includes two solder connections 142 . Other embodiments of the present technology may include one, three, four, five or greater numbers of solder connections 142 . Certain aspects of the technology described in the context of a particular embodiment may be combined or eliminated in other embodiments. For example, the transmissive support assembly 104 of the embodiment shown in FIG. 1 may include the second transmissive support member 406 of the embodiment shown in FIG. 8 . Furthermore, while advantages associated with certain embodiments of the present technology have been described in the context of those embodiments, other embodiments may exhibit such advantages as well, and not necessarily all embodiments need exhibit to fall within the scope of the technology such advantages within. Accordingly, the present invention and its associated technology may encompass other embodiments not explicitly shown or described herein.

Claims (24)

1. a solid state radiation transducer SSRT device, it comprises:
Radiation transducer, it comprises the active region between the first semi-conducting material, the second semi-conducting material and described the first semi-conducting material and described the second semi-conducting material; And
Transmission support assembly, it is attached to described radiation transducer, wherein said transmission support assembly comprises the transmission support component with dorsal part, described transmission support assembly makes through location arrive at or pass described transmission support assembly from the described dorsal part place of the described transmission support component of being transmitted in of described radiation transducer, and described transmission support assembly comprises the lead-in wire being electrically connected to the contact of described radiation transducer.
2. SSRT device according to claim 1, wherein said transmission support component has veining side.
3. SSRT device according to claim 1, at least a portion of a side of wherein said transmission support component is convex.
4. SSRT device according to claim 1, wherein said radiation transducer chip upside-down mounting type is arranged on described transmission support assembly.
5. SSRT device according to claim 1, it further comprises the underfill of printing opacity in fact between described radiation transducer and described transmission support assembly.
6. SSRT device according to claim 1, it further comprises that the first scolder connects and the second scolder connects, wherein said lead-in wire is the first lead-in wire, described contact is the first contact, described transmission support assembly further comprises the second lead-in wire, described radiation transducer further comprises the second contact, described the first scolder connects described the first lead-in wire that described first contact of described radiation transducer is connected to described transmission support assembly, described the second scolder connects described the second lead-in wire that described second contact of described radiation transducer is connected to described transmission support assembly, and described the first scolder connect with described the first lead-in wire between interface with described the second scolder, be connected and the described second interface between going between coplanar in fact.
7. SSRT device according to claim 1, wherein said transmission support component is the first transmission support component, described transmission support assembly comprises the second transmission support component being positioned between described the first transmission support component and described radiation transducer, described the first transmission support component comprises converter material, and described the second transmission support component has the refractive index between the refractive index of described radiation transducer and the refractive index of described the first transmission support component.
8. SSRT device according to claim 7, wherein said the second transmission support component has from approximately 1.6 to approximately 1.9 refractive index.
9. SSRT device according to claim 1, wherein said transmission support component comprises intramatrical converter material.
10. SSRT device according to claim 9, the first that wherein said transmission support component comprises the converter material with the first concentration and the second portion with the converter material of the second concentration, and described the first converter material concentration is higher than described the second converter material concentration.
11. 1 kinds of solid state sensor SSRT devices, it comprises that chip upside-down mounting type is installed to the radiation transducer of transmission support assembly, described radiation transducer has the active region between the first semi-conducting material, the second semi-conducting material, described the first semi-conducting material and described the second semi-conducting material, and is electrically connected to described the first semi-conducting material and is surface mounted to the contact of the lead-in wire of described transmission support assembly.
12. SSRT devices according to claim 11, the transmission of wherein said transmission support assembly is arrived at or from the radiation of described radiation transducer.
13. SSRT devices according to claim 11, wherein said transmission support assembly comprises converter material.
14. SSRT devices according to claim 11, wherein said radiation transducer is light-emitting diode.
15. SSRT devices according to claim 11, wherein said radiation transducer is photovoltaic cell.
16. 1 kinds of methods of manufacturing solid state radiation transducer SSRT device, it comprises radiation transducer chip upside-down mounting type is installed on transmission support assembly, the lead-in wire at the described dorsal part place that the working flank that makes described radiation transducer is electrically coupled to described transmission support component to the dorsal part of transmission support component and the contact of described radiation transducer of described transmission support assembly.
17. methods according to claim 16, it further comprises printing opacity underfill is in fact placed between described radiation transducer and described transmission support component.
18. methods according to claim 16, wherein said transmission support component is the first transmission support component, described transmission support assembly comprises the second transmission support component, described the first transmission support component comprises converter material, described the second transmission support component has the refractive index between the refractive index of described radiation transducer and the refractive index of described the first transmission support component, and described radiation transducer chip upside-down mounting type is installed on described transmission support assembly and comprises described radiation transducer chip upside-down mounting type is installed on described transmission support assembly described the second transmission support component is positioned between described radiation transducer and described the first transmission support component.
19. methods according to claim 16, it further comprises the described transmission support component of formation, wherein form described transmission support component and comprise the persursor material rotary coating that comprises the converter material in host material and described host material to substrate, and solidify described persursor material.
20. methods according to claim 16, it further comprises the described transmission support component of formation, wherein forms described transmission support component and comprises a side veining that makes described transmission support component.
21. methods according to claim 16, it further comprises the described transmission support component of formation, wherein forms described transmission support component and comprises the molded persursor material that comprises the converter material in host material and described host material.
22. methods according to claim 21, wherein molded described persursor material comprises described persursor material is incorporated in mould, wherein said mould comprises texturizing surfaces, and described transmission support component comprises the texturizing surfaces corresponding with the described texturizing surfaces of described mould.
23. methods according to claim 21, wherein molded described persursor material comprises described persursor material is incorporated in mould, and wherein said mould comprises concave surface, and described transmission support component comprises the convex surface corresponding with the described concave surface of described mould.
24. methods according to claim 21, it further comprises and solidifies described persursor material and assembled described converter material before solidifying described persursor material, wherein assembles described converter material and comprises the sedimentation or power is applied to described persursor material so that the described persursor material displacement in described host material under Action of Gravity Field of the described persursor material that allows in described host material.
CN201280041684.9A 2011-08-26 2012-08-20 Solid-state radiation sensor device with flip-chip mounted solid-state radiation sensor and associated systems and methods Active CN103765585B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/219,530 US8952402B2 (en) 2011-08-26 2011-08-26 Solid-state radiation transducer devices having flip-chip mounted solid-state radiation transducers and associated systems and methods
US13/219,530 2011-08-26
PCT/US2012/051608 WO2013032766A2 (en) 2011-08-26 2012-08-20 Solid-state radiation transducer devices having flip-chip mounted solid-state radiation transducers and associated systems and methods

Publications (2)

Publication Number Publication Date
CN103765585A true CN103765585A (en) 2014-04-30
CN103765585B CN103765585B (en) 2018-04-06

Family

ID=47742365

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280041684.9A Active CN103765585B (en) 2011-08-26 2012-08-20 Solid-state radiation sensor device with flip-chip mounted solid-state radiation sensor and associated systems and methods

Country Status (7)

Country Link
US (5) US8952402B2 (en)
EP (1) EP2748851B1 (en)
JP (1) JP2014525675A (en)
KR (1) KR101588151B1 (en)
CN (1) CN103765585B (en)
TW (1) TWI504009B (en)
WO (1) WO2013032766A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150380113A1 (en) * 2014-06-27 2015-12-31 Nonlinear Ion Dynamics Llc Methods, devices and systems for fusion reactions
US8952402B2 (en) 2011-08-26 2015-02-10 Micron Technology, Inc. Solid-state radiation transducer devices having flip-chip mounted solid-state radiation transducers and associated systems and methods
US9627229B2 (en) * 2013-06-27 2017-04-18 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming trench and disposing semiconductor die over substrate to control outward flow of underfill material
EP2950358B1 (en) * 2014-05-29 2021-11-17 Suzhou Lekin Semiconductor Co., Ltd. Light emitting device package
KR102209035B1 (en) * 2014-08-22 2021-01-28 엘지이노텍 주식회사 Light emitting device package
DE102014111106A1 (en) 2014-08-05 2016-02-11 Osram Opto Semiconductors Gmbh Electronic component, optoelectronic component, component arrangement and method for producing an electronic component
US9836095B1 (en) * 2016-09-30 2017-12-05 Intel Corporation Microelectronic device package electromagnetic shield
KR102739650B1 (en) * 2017-02-10 2024-12-09 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 Lighting emitting module
CN107170773B (en) * 2017-05-23 2019-09-17 深圳市华星光电技术有限公司 Micro- LED display panel and preparation method thereof
TWI763270B (en) * 2021-01-21 2022-05-01 茂丞科技股份有限公司 Array-typed ultrasonic sensor
CN115995404A (en) * 2021-10-18 2023-04-21 群创光电股份有限公司 Electronic device and manufacturing method thereof
DE102022132967A1 (en) * 2022-12-12 2024-06-13 Infineon Technologies Ag Fan-out wafer-level packages and related manufacturing processes

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030209714A1 (en) * 2000-10-12 2003-11-13 General Electric Company Solid state lighting device with reduced form factor including led with directional emission and package with microoptics
US20050274970A1 (en) * 2004-06-14 2005-12-15 Lumileds Lighting U.S., Llc Light emitting device with transparent substrate having backside vias
US20070252227A1 (en) * 2006-04-28 2007-11-01 Toshiyuki Fukuda Optical apparatus and optical module using the same
CN101268554A (en) * 2005-09-19 2008-09-17 皇家飞利浦电子股份有限公司 Color-variable light-emitting device and control method thereof
US20100038670A1 (en) * 2008-08-18 2010-02-18 Luminus Devices, Inc. Illumination assembly including chip-scale packaged light-emitting device
CN101771117A (en) * 2010-02-02 2010-07-07 孙润光 Light-emitting device and manufacturing method thereof
CN102104107A (en) * 2009-12-22 2011-06-22 株式会社东芝 Light emitting device

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2879773B2 (en) * 1993-05-31 1999-04-05 京セラ株式会社 IMAGE DEVICE AND ITS MANUFACTURING METHOD
US6028011A (en) 1997-10-13 2000-02-22 Matsushita Electric Industrial Co., Ltd. Method of forming electric pad of semiconductor device and method of forming solder bump
JP3738824B2 (en) * 2000-12-26 2006-01-25 セイコーエプソン株式会社 OPTICAL DEVICE, ITS MANUFACTURING METHOD, AND ELECTRONIC DEVICE
US6541800B2 (en) * 2001-02-22 2003-04-01 Weldon Technologies, Inc. High power LED
US6885107B2 (en) * 2002-08-29 2005-04-26 Micron Technology, Inc. Flip-chip image sensor packages and methods of fabrication
US20040211972A1 (en) * 2003-04-22 2004-10-28 Gelcore, Llc Flip-chip light emitting diode
TWI223880B (en) * 2003-06-03 2004-11-11 Gigno Technology Co Ltd Optoelectronics processing module and method for manufacturing thereof
US6982491B1 (en) * 2004-01-20 2006-01-03 Asat Ltd. Sensor semiconductor package and method of manufacturing the same
JP4134942B2 (en) * 2004-04-26 2008-08-20 日本電気株式会社 Optical module
KR101161384B1 (en) 2005-03-29 2012-07-02 서울반도체 주식회사 Led package mounting a led having an array of light emitting cells coupled in series
EP1864339A4 (en) 2005-03-11 2010-12-29 Seoul Semiconductor Co Ltd LIGHT-EMITTING DIODE DIODE WITH PHOTO-EMITTING CELL MATRIX
EP1887021A4 (en) * 2005-05-17 2010-02-03 Asahi Glass Co Ltd CURABLE COMPOSITION AND NEW ADAMANTANE COMPOUND
KR100665219B1 (en) 2005-07-14 2007-01-09 삼성전기주식회사 Wavelength Converting LED Package
JP2007109948A (en) * 2005-10-14 2007-04-26 Toyoda Gosei Co Ltd Light emitting device and manufacturing method thereof
JP5073946B2 (en) 2005-12-27 2012-11-14 新光電気工業株式会社 Semiconductor device and manufacturing method of semiconductor device
KR100665372B1 (en) 2006-02-21 2007-01-09 삼성전기주식회사 Light emitting diode package structure with high light extraction efficiency and its manufacturing method
US20110041898A1 (en) * 2009-08-19 2011-02-24 Emcore Solar Power, Inc. Back Metal Layers in Inverted Metamorphic Multijunction Solar Cells
TWI331413B (en) * 2007-02-16 2010-10-01 Epistar Corp Led flip chip package structure and manufacture method thereof
JP2008251561A (en) * 2007-03-29 2008-10-16 Toyoda Gosei Co Ltd Display device
KR20080092719A (en) 2007-04-13 2008-10-16 우리이티아이 주식회사 Light emitting device and manufacturing method
JP2008288440A (en) * 2007-05-18 2008-11-27 Toyoda Gosei Co Ltd Integrated display device
US20090032827A1 (en) 2007-07-30 2009-02-05 Philips Lumileds Lighting Company, Llc Concave Wide Emitting Lens for LED Useful for Backlighting
US20090140279A1 (en) * 2007-12-03 2009-06-04 Goldeneye, Inc. Substrate-free light emitting diode chip
US8575641B2 (en) * 2011-08-11 2013-11-05 Goldeneye, Inc Solid state light sources based on thermally conductive luminescent elements containing interconnects
JP2009212281A (en) * 2008-03-04 2009-09-17 Panasonic Corp Semiconductor light-emitting device
US20090230409A1 (en) * 2008-03-17 2009-09-17 Philips Lumileds Lighting Company, Llc Underfill process for flip-chip leds
US20090242923A1 (en) * 2008-03-28 2009-10-01 M/A-Com, Inc. Hermetically Sealed Device with Transparent Window and Method of Manufacturing Same
TWI364858B (en) 2008-06-19 2012-05-21 Silitek Electronic Guangzhou Photoelectric semiconductor device capable of generating uniform compound lights
US20100209670A1 (en) * 2009-02-17 2010-08-19 Nitto Denko Corporation Sheet for photosemiconductor encapsulation
US7851819B2 (en) * 2009-02-26 2010-12-14 Bridgelux, Inc. Transparent heat spreader for LEDs
US20110031516A1 (en) 2009-08-07 2011-02-10 Koninklijke Philips Electronics N.V. Led with silicone layer and laminated remote phosphor layer
US8471280B2 (en) * 2009-11-06 2013-06-25 Koninklijke Philips Electronics N.V. Silicone based reflective underfill and thermal coupler
CN201680292U (en) * 2009-12-12 2010-12-22 金芃 Side-entrance-type light-emitting component of LED backlight adopting light guide plate with oblique side
KR100976812B1 (en) * 2010-02-08 2010-08-20 옵토팩 주식회사 Electronic device package and method of manufacturing the same
KR100976813B1 (en) * 2010-04-23 2010-08-20 옵토팩 주식회사 Eectronic device package and method of manufacturing the same
KR101618029B1 (en) * 2010-12-06 2016-05-09 삼성전자주식회사 Light Emitting Device Package and Manufacturing Method thereof
US8952402B2 (en) 2011-08-26 2015-02-10 Micron Technology, Inc. Solid-state radiation transducer devices having flip-chip mounted solid-state radiation transducers and associated systems and methods

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030209714A1 (en) * 2000-10-12 2003-11-13 General Electric Company Solid state lighting device with reduced form factor including led with directional emission and package with microoptics
US20050274970A1 (en) * 2004-06-14 2005-12-15 Lumileds Lighting U.S., Llc Light emitting device with transparent substrate having backside vias
CN101268554A (en) * 2005-09-19 2008-09-17 皇家飞利浦电子股份有限公司 Color-variable light-emitting device and control method thereof
US20070252227A1 (en) * 2006-04-28 2007-11-01 Toshiyuki Fukuda Optical apparatus and optical module using the same
US20100038670A1 (en) * 2008-08-18 2010-02-18 Luminus Devices, Inc. Illumination assembly including chip-scale packaged light-emitting device
CN102104107A (en) * 2009-12-22 2011-06-22 株式会社东芝 Light emitting device
CN101771117A (en) * 2010-02-02 2010-07-07 孙润光 Light-emitting device and manufacturing method thereof

Also Published As

Publication number Publication date
KR20140088153A (en) 2014-07-09
US10541355B2 (en) 2020-01-21
US20150132874A1 (en) 2015-05-14
WO2013032766A2 (en) 2013-03-07
JP2014525675A (en) 2014-09-29
EP2748851A2 (en) 2014-07-02
TWI504009B (en) 2015-10-11
CN103765585B (en) 2018-04-06
US20200098965A1 (en) 2020-03-26
US11929456B2 (en) 2024-03-12
US8952402B2 (en) 2015-02-10
US9647167B2 (en) 2017-05-09
WO2013032766A3 (en) 2013-05-02
EP2748851A4 (en) 2015-03-11
US20170222111A1 (en) 2017-08-03
US20180358526A1 (en) 2018-12-13
US20130049039A1 (en) 2013-02-28
EP2748851B1 (en) 2022-10-12
US10079333B2 (en) 2018-09-18
KR101588151B1 (en) 2016-01-22
TW201324827A (en) 2013-06-16

Similar Documents

Publication Publication Date Title
CN103765585B (en) Solid-state radiation sensor device with flip-chip mounted solid-state radiation sensor and associated systems and methods
JP6138458B2 (en) Light emitting device and light emitting device having the same
TWI606618B (en) Illuminating device
CN102800775B (en) Light emitting device and light emitting device having the same
US8759865B2 (en) Light emitting diode chip, light emitting diode package structure, and method for forming the same
US9343505B2 (en) Wafer level reflector for LED packaging
US20120181559A1 (en) Light-emitting device package
US20130309789A1 (en) Batwing LED with Remote Phosphor Configuration
KR102332218B1 (en) Lihgt emitting device and camera module having thereof
KR20190031094A (en) Light emitting device package and lighting apparatus
KR101210028B1 (en) Light emitting device, light emitting module and fabricating method for light emitting device
CN102272951A (en) Multi-Chip LED Module
TW201436293A (en) Method for packaging light-emitting diode and light-emitting diode package structure
CN103026512A (en) Component and method for producing a component
CN102142500B (en) Light emitting diode, package and lighting system incorporating the same
KR101262509B1 (en) Light emitting device, light emitting module and fabricating method for light emitting device
KR20180040073A (en) Light emitting device, light emitting device package and lighting apparatus
KR20190065011A (en) Light emitting device package
KR20190050546A (en) Light emitting device package and lighting apparatus
KR20190010353A (en) Light emitting device package
KR20190025330A (en) Light emitting device package
KR20190010352A (en) Light emitting device package and manufacturing method of light emitting device package

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant