CN103469163A - Vacuum coating machine - Google Patents
Vacuum coating machine Download PDFInfo
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- CN103469163A CN103469163A CN2013104299107A CN201310429910A CN103469163A CN 103469163 A CN103469163 A CN 103469163A CN 2013104299107 A CN2013104299107 A CN 2013104299107A CN 201310429910 A CN201310429910 A CN 201310429910A CN 103469163 A CN103469163 A CN 103469163A
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Abstract
The invention discloses a vacuum coating machine. The vacuum coating machine comprises a vacuum chamber (1), wherein an electronic gun (2) and an auxiliary ion source (3) are arranged at the lower part of a cavity of the vacuum chamber (1), a substrate frame over against the electronic gun (2) and the auxiliary ion source (3) are arranged above the electronic gun (2) and the auxiliary ion source (3), a substrate heater (5) is arranged at the outer side of the substrate frame (4); a light-operated system (6) and a crystal-operated system (7) are arranged at a connecting part of the top of the substrate frame (4) and the cavity top of the vacuum chamber (1), the electronic gun (2), the auxiliary ion source (3), the light-operated system (6) and the crystal-operated system (7) are connected with a monitoring device through signal lines. The substrate heater is used for stably and uniformly heating the substrate before coating film so as to improve the compactness and the uniformity of the film; an ion beam is used for bombarding the growing film to form a film structure with uniform compactness, the stability and quality of the coated film are improved so that the aim of improving the optical and mechanical performances of the coated film is achieved.
Description
Technical field
The present invention relates to the coating technique field, specifically a kind of vacuum plating unit that improves coating quality and coatings stability.
Background technology
In the prior art, in use, the coating film thickness of substrate is wayward for vacuum plating unit, and the degree of adhering to of the quality of plated film and rete is not high, easily from substrate, comes off.
Summary of the invention
The objective of the invention is the problem existed for prior art, a kind of vacuum plating unit that improves coating quality and coatings stability is provided.
The objective of the invention is to solve by the following technical programs:
A kind of vacuum plating unit, comprise vacuum chamber, the inner chamber bottom that it is characterized in that described vacuum chamber is provided with electron beam gun and assisting ion source, above electron beam gun and assisting ion source, be provided with over against the substrate frame in electron beam gun and assisting ion source, the outside of substrate frame is provided with substrate heater corresponding thereto; The position that the top of described substrate frame is connected with the vacuum chamber inner cavity top is provided with light control system and brilliant control system, and electron beam gun, assisting ion source, light control system and brilliant control system are connected with monitoring equipment by signal wire.
Also be provided with vacuum evacuating system on described vacuum chamber, this vacuum evacuating system is comprised of dump pump and diffusion oil pump.
The optical thickness of plated film film is calculated in the variation of the transmissivity of described light control system by detecting the coating film and reflectivity.
Described brilliant control system is calculated the physical thickness of plated film film by the variation that detects the substrate natural frequency, and automatically regulates the size of the ion beam current energy in the stream of electrons energy of electron beam gun and assisting ion source according to the difference with substrate thickness.
The present invention has the following advantages compared to existing technology:
The present invention carries out stable and uniform heating to substrate by substrate heater before plated film, to improve rete compactness and homogeneity; When electron beam evaporation carries out, the assisting ion source produces ionic fluid, the rete of growing with ion beam bombardment, can form fine and close film layer structure uniformly, improve the stability of plated film rete, improved the quality of coatings, make it difficult drop-off, reach the purpose of improving plated film rete optics and mechanical property.
The vacuum evacuating system that the present invention adopts is comprised of dump pump and diffusion oil pump, at first by dump pump, slightly take out, make in vacuum chamber to reach low from normal atmosphere---vacuum, then by the diffusion oil pump, really take out, make in vacuum chamber to reach high---ultrahigh vacuum(HHV); This vacuum plating unit has characteristics simple in structure, easy to use and that coating quality is good, efficiency is high, suitable promoting the use of.
The accompanying drawing explanation
Accompanying drawing 1 is vacuum plating unit structural representation of the present invention.
Wherein: 1-vacuum chamber; 2-electron beam gun; 3-assisting ion source; 4-substrate frame; 5-substrate heater; 6-light control system; 7-brilliant control system; 8-vacuum evacuating system.
Embodiment
Below in conjunction with accompanying drawing and embodiment, the present invention is further illustrated.
As shown in Figure 1: a kind of vacuum plating unit, comprise vacuum chamber 1, be provided with electron beam gun 2 and assisting ion source 3 in the inner chamber bottom of vacuum chamber 1, above electron beam gun 2 and assisting ion source 3, be provided with over against the substrate frame 4 in electron beam gun 2 and assisting ion source 3, the outside of substrate frame 4 is provided with substrate heater 5 corresponding thereto, the position be connected with vacuum chamber 1 inner cavity top at the top of substrate frame 4 is provided with light control system 6 and brilliant control system 7, electron beam gun 2, assisting ion source 3, light control system 6 is connected with monitoring equipment by signal wire with brilliant control system 7, and the optical thickness of plated film film is calculated in the variation of the transmissivity of light control system 6 by detecting the coating film and reflectivity, brilliant control system 7 is calculated the physical thickness of plated film film by the variation that detects the substrate natural frequency, and the size of automatically regulating the ion beam current energy in the stream of electrons energy of electron beam gun 2 and assisting ion source 3 according to the difference with substrate thickness.Also be provided with in addition vacuum evacuating system 8 on vacuum chamber 1, this vacuum evacuating system 8 is comprised of dump pump and diffusion oil pump, during use, by dump pump, slightly take out, make to reach low from normal atmosphere in vacuum chamber 1---vacuum, then really take out by the diffusion oil pump, make in vacuum chamber 1 to reach high---ultrahigh vacuum(HHV).
The present invention carries out stable and uniform heating to substrate by substrate heater 5 before plated film, to improve rete compactness and homogeneity; When electron beam 2 thermal evaporations are carried out, assisting ion source 3 produces ionic fluid, the rete of growing with ion beam bombardment, can form fine and close film layer structure uniformly, improve the stability of plated film rete, improved the quality of coatings, make it difficult drop-off, reach the purpose of improving plated film rete optics and mechanical property; This vacuum plating unit has characteristics simple in structure, easy to use and that coating quality is good, efficiency is high, suitable promoting the use of.
Above embodiment only, for explanation technological thought of the present invention, can not limit protection scope of the present invention with this, every technological thought proposed according to the present invention, and any change of doing on the technical scheme basis, within all falling into protection domain of the present invention; The technology that the present invention does not relate to all can be realized by prior art.
Claims (4)
1. a vacuum plating unit, comprise vacuum chamber (1), the inner chamber bottom that it is characterized in that described vacuum chamber (1) is provided with electron beam gun (2) and assisting ion source (3), in the top of electron beam gun (2) and assisting ion source (3), be provided with over against the substrate frame (4) of electron beam gun (2) and assisting ion source (3), the outside of substrate frame (4) is provided with substrate heater (5) corresponding thereto; The position that the top of described substrate frame (4) is connected with vacuum chamber (1) inner cavity top is provided with light control system (6) and brilliant control system (7), and electron beam gun (2), assisting ion source (3), light control system (6) and brilliant control system (7) are connected with monitoring equipment by signal wire.
2. vacuum plating unit according to claim 1, is characterized in that on described vacuum chamber (1) also being provided with vacuum evacuating system (8); This vacuum evacuating system (8) is comprised of dump pump and diffusion oil pump.
3. vacuum plating unit according to claim 1, is characterized in that the variation of the transmissivity of described light control system (6) by detecting the coating film and reflectivity calculates the optical thickness of plated film film.
4. vacuum plating unit according to claim 1, it is characterized in that described brilliant control system (7) calculates the physical thickness of plated film film by the variation that detects the substrate natural frequency, and automatically regulate the size of the ion beam current energy of the stream of electrons energy of electron beam gun (2) and assisting ion source (3) according to the difference with substrate thickness.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013104299107A CN103469163A (en) | 2013-09-22 | 2013-09-22 | Vacuum coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013104299107A CN103469163A (en) | 2013-09-22 | 2013-09-22 | Vacuum coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103469163A true CN103469163A (en) | 2013-12-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2013104299107A Pending CN103469163A (en) | 2013-09-22 | 2013-09-22 | Vacuum coating machine |
Country Status (1)
| Country | Link |
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| CN (1) | CN103469163A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105887020A (en) * | 2016-06-30 | 2016-08-24 | 光驰科技(上海)有限公司 | Coating device with multiple evaporation sources and coating method thereof |
| CN106756864A (en) * | 2016-12-10 | 2017-05-31 | 中国科学院长春光学精密机械与物理研究所 | One kind prepares non-sensitive layer error control method and device in multilayer film element process |
| CN108624859A (en) * | 2018-07-18 | 2018-10-09 | 无锡爱尔华精机有限公司 | A kind of two-sided physical vapor deposition coating film equipment and its principle |
| CN108823540A (en) * | 2018-07-18 | 2018-11-16 | 无锡爱尔华精机有限公司 | A kind of Ion Aided Film Coating evaporation equipment |
| CN110129739A (en) * | 2019-06-19 | 2019-08-16 | 广东腾胜科技创新有限公司 | Equipment for evaporating terbium or dysprosium on the surface of magnetic materials |
| CN113355646A (en) * | 2021-06-10 | 2021-09-07 | 西华师范大学 | Film monitoring preparation device and method based on multi-source co-evaporation technology |
| CN115094388A (en) * | 2022-07-08 | 2022-09-23 | 广东信大科技有限公司 | Heating pipe coating method and rose gold pipe and gold pipe prepared by same |
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| CN1112293A (en) * | 1993-12-20 | 1995-11-22 | 佳能株式会社 | Method of and apparatus for fabrication of photovoltaic cell |
| CN1158912A (en) * | 1995-12-22 | 1997-09-10 | 佳能株式会社 | Deposited-film forming process and deposited-film forming apparatus |
| CN102365169A (en) * | 2009-03-31 | 2012-02-29 | 琳得科株式会社 | Gas barrier films and electronic devices |
| CN203559116U (en) * | 2013-09-22 | 2014-04-23 | 无锡启晖光电科技有限公司 | Vacuum coating machine |
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2013
- 2013-09-22 CN CN2013104299107A patent/CN103469163A/en active Pending
Patent Citations (4)
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| CN1112293A (en) * | 1993-12-20 | 1995-11-22 | 佳能株式会社 | Method of and apparatus for fabrication of photovoltaic cell |
| CN1158912A (en) * | 1995-12-22 | 1997-09-10 | 佳能株式会社 | Deposited-film forming process and deposited-film forming apparatus |
| CN102365169A (en) * | 2009-03-31 | 2012-02-29 | 琳得科株式会社 | Gas barrier films and electronic devices |
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| 王永杰等: "离子辅助沉积法制备纳米TiO2光催化薄膜", 《材料导报》, vol. 22, 31 May 2008 (2008-05-31), pages 60 - 62 * |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105887020A (en) * | 2016-06-30 | 2016-08-24 | 光驰科技(上海)有限公司 | Coating device with multiple evaporation sources and coating method thereof |
| CN105887020B (en) * | 2016-06-30 | 2019-04-02 | 光驰科技(上海)有限公司 | Multi-vaporizing-source coating apparatus and its film plating process |
| CN106756864A (en) * | 2016-12-10 | 2017-05-31 | 中国科学院长春光学精密机械与物理研究所 | One kind prepares non-sensitive layer error control method and device in multilayer film element process |
| CN108624859A (en) * | 2018-07-18 | 2018-10-09 | 无锡爱尔华精机有限公司 | A kind of two-sided physical vapor deposition coating film equipment and its principle |
| CN108823540A (en) * | 2018-07-18 | 2018-11-16 | 无锡爱尔华精机有限公司 | A kind of Ion Aided Film Coating evaporation equipment |
| CN110129739A (en) * | 2019-06-19 | 2019-08-16 | 广东腾胜科技创新有限公司 | Equipment for evaporating terbium or dysprosium on the surface of magnetic materials |
| CN113355646A (en) * | 2021-06-10 | 2021-09-07 | 西华师范大学 | Film monitoring preparation device and method based on multi-source co-evaporation technology |
| CN115094388A (en) * | 2022-07-08 | 2022-09-23 | 广东信大科技有限公司 | Heating pipe coating method and rose gold pipe and gold pipe prepared by same |
| CN115094388B (en) * | 2022-07-08 | 2024-02-09 | 广东信大科技有限公司 | Heating pipe coating method and rose gold pipe prepared by heating pipe coating method |
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Application publication date: 20131225 |