CN112501578A - Coating quality control method of gradient coating machine - Google Patents
Coating quality control method of gradient coating machine Download PDFInfo
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- CN112501578A CN112501578A CN201911278479.4A CN201911278479A CN112501578A CN 112501578 A CN112501578 A CN 112501578A CN 201911278479 A CN201911278479 A CN 201911278479A CN 112501578 A CN112501578 A CN 112501578A
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- 239000011248 coating agent Substances 0.000 title claims abstract description 40
- 238000000576 coating method Methods 0.000 title claims abstract description 40
- 238000003908 quality control method Methods 0.000 title claims abstract description 11
- 239000013078 crystal Substances 0.000 claims abstract description 20
- 239000000523 sample Substances 0.000 claims abstract description 18
- 239000007888 film coating Substances 0.000 claims abstract description 17
- 238000009501 film coating Methods 0.000 claims abstract description 17
- 238000004544 sputter deposition Methods 0.000 claims abstract description 12
- 238000009500 colour coating Methods 0.000 claims abstract description 11
- 238000005086 pumping Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 14
- 238000003825 pressing Methods 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 4
- 239000000498 cooling water Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 238000001771 vacuum deposition Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 47
- 150000002500 ions Chemical class 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 239000002103 nanocoating Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a coating quality control method of a gradient color coating machine, wherein the coating machine is provided with a film thickness instrument, the film thickness instrument comprises a crystal oscillator probe and a film thickness control instrument host, the crystal oscillator probe is fixed on the side surface of a workpiece rotating stand, the film thickness instrument monitors the film thickness in real time, and after each layer of coating, if the film thickness instrument detects that the film thickness is less than the preset film thickness, the same color system sputtering is continued; and if the film thickness detected by the film thickness meter is within the preset film thickness range, performing film coating on the next layer. The invention provides a coating quality control method of a gradient color coating machine, which can more accurately monitor the film thickness, feed back detection data in real time, correct the detection data at any time and improve the coating quality.
Description
Technical Field
The invention relates to the technical field of sputtering coating, in particular to a coating quality control method of a gradient color coating machine.
Background
The vacuum coating machine mainly refers to a coating machine which needs to be carried out under a higher vacuum degree, and specifically comprises various types, including vacuum ion evaporation, magnetron sputtering, MBE molecular beam epitaxy, PLD laser sputtering deposition and the like.
Sputtering-type coating is simply understood as bombarding a target material with electrons or high-energy laser, and causing surface components to be sputtered out in the form of atomic groups or ions and finally deposited on the surface of a substrate, and subjected to a film-forming process to finally form a thin film.
Magnetron sputtering is one type of Physical Vapor Deposition (PVD). The general sputtering method can be used for preparing multi-materials such as metal, semiconductor, insulator and the like, and has the advantages of simple equipment, easy control, large film coating area, strong adhesive force and the like. The magnetron sputtering method developed in the last 70 th century realizes high speed, low temperature and low damage. Since the high-speed sputtering is performed under a low pressure, it is necessary to effectively increase the ionization rate of the gas. Magnetron sputtering increases the sputtering rate by introducing a magnetic field at the surface of the target cathode, using the confinement of the magnetic field to charged particles to increase the plasma density.
The film coating machine generally adopts a film thickness meter to monitor the change of film thickness in the film coating process, and the traditional method of fixing the probe above the furnace has the most convenient installation, transmission and use, but has larger monitoring error. Later, vertical film plating machines have appeared, which employ vertical sputtering targets for sputter deposition, and after monitoring, the unqualified products are picked up, resulting in longer process time.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: aiming at the technical problems in the prior art, the invention provides a coating quality control method of a gradient color coating machine.
In order to solve the technical problems, the technical scheme provided by the invention is as follows:
a coating quality control method of a gradient color coating machine is characterized in that the coating machine is provided with a film thickness instrument, the film thickness instrument comprises a crystal oscillator probe and a film thickness control instrument host, the crystal oscillator probe is fixed on the side surface of a workpiece rotating stand, the film thickness instrument monitors the film thickness in real time, and after each layer of coating film is coated, if the film thickness detected by the film thickness instrument is smaller than the preset film thickness, the same color series sputtering is continuously carried out; and if the film thickness detected by the film thickness meter is within the preset film thickness range, performing film coating on the next layer.
The further improvement of the technical scheme is as follows:
in the above technical solution, preferably, the surface of the crystal oscillator piece of the crystal oscillator probe and the plated surface of the workpiece need to be on the same plane.
In the above technical scheme, preferably, the electrical lead and the signal wire of the crystal oscillator probe penetrate through the furnace body to be connected with the film thickness controller host, and the film thickness controller host is provided with the WiFi wireless transmission module for transmitting the data monitored by the crystal oscillator probe to a computer beside the furnace in real time.
In the above technical solution, preferably, during the film coating, a baffle is added between the target and the workpiece.
In the above technical solution, preferably, the method comprises the following steps:
step 1, preheating stage:
(1) providing compressed air and cooling water for the vacuum unit;
(2) the power is turned on and the maintenance pump is started.
Step 2, working stage
(1) After the film coating chamber is filled with the atmosphere, opening a gate, closing the gate filled with the piece to be coated and the coating material, and fastening a door lock;
(2) when the vacuum pressure is less than 2Pa, closing the rough pumping valve; after the rough pumping valve is closed, pressing a fine pumping valve opening button to perform fine pumping on the coating chamber;
(3) setting the rotating speed of the workpiece; when the preset vacuum coating pressure is reached, coating starts;
(4) the film thickness meter monitors the film thickness in real time, and after each layer of film is coated, if the film thickness meter detects that the film thickness is smaller than the preset film thickness, the same-color sputtering is continued; and if the film thickness detected by the film thickness meter is within the preset film thickness range, performing film coating on the next layer.
Compared with the prior art, the coating quality control method of the gradient color coating machine provided by the invention has the following advantages:
the film coating quality control method of the gradient color film coating machine has the advantages of simple structure of the film thickness instrument, easy manufacture, upgrading by modifying the existing film thickness monitoring device, and complete compatibility with the original film coating source and film coating process. The film thickness meter and the workpiece rotate together, so that the film thickness is monitored more accurately, detection data are fed back in real time, correction is carried out at any time, and the quality of a coated film is improved.
Drawings
FIG. 1 is a schematic diagram of the structure of the application and implementation of the invention.
FIG. 2 is a schematic diagram of the effect of coating at different positions when the present invention is applied.
Detailed Description
The following describes in detail specific embodiments of the present invention. It should be understood that the detailed description and specific examples, while indicating the present invention, are given by way of illustration and explanation only, not limitation.
Fig. 1 shows an embodiment of the coating quality control method of the gradient color coating machine of the invention, the coating machine comprises a crystal oscillator probe and a film thickness control instrument host, the crystal oscillator probe is fixed on the side surface of a workpiece rotating stand, and the crystal oscillator piece surface of the crystal oscillator probe and the coating surface of the workpiece need to be on the same plane. The electric lead and the signal wire of the crystal oscillator probe penetrate out of the furnace body to be connected with the film thickness control instrument host, and the WiFi wireless transmission module is arranged on the film thickness control instrument host and used for transmitting data monitored by the crystal oscillator probe to a computer beside the furnace in real time.
The control method of the invention is plating pretreatment → charging → vacuumizing → target washing and ion cleaning → plating → cooling and discharging → post-treatment. When the gradient color coating is carried out, a baffle plate is additionally arranged between the target material and the workpiece, the thickness of the film deposited at the position corresponding to the large area of the baffle plate is small, and the thickness deposited at the position corresponding to the small area of the baffle plate is large.
As shown in fig. 2, the film formation angles a > B > C at the points a, B and C and the distance da < db < dc between the film formation region and the evaporation source finally cause the thicknesses of the three points a, B and C to be significantly different, the thicknesses of the film formation regions at the three points are different, and the macroscopic result, namely the transmitted light after reflection is different, so that the iridescent effect is formed. And adjusting process parameters in different sections to bombard different targets, and changing the thickness and the layer number of the coating.
The control method comprises the following steps:
step 1, preheating stage:
(1) providing compressed air and cooling water for the vacuum unit;
(2) the power is turned on and the maintenance pump is started.
Step 2, working stage
(1) After the film coating chamber is filled with the atmosphere, opening a gate, closing the gate filled with the piece to be coated and the coating material, and fastening a door lock;
(2) starting a rough pumping pump and a slide valve pump;
(3) opening a rough pumping valve to carry out rough pumping on the coating chamber;
(4) when the vacuum pressure is less than 2Pa, closing the rough pumping valve; after the rough pumping valve is closed, pressing a fine pumping valve opening button to perform fine pumping on the coating chamber;
(5) setting the rotating speed of the workpiece; when the preset vacuum coating pressure is reached, coating starts;
(6) the film thickness meter monitors the film thickness in real time, and after one layer of film is coated, if the film thickness meter detects that the film thickness is smaller than the preset film thickness, the same-color sputtering is continued; and if the film thickness detected by the film thickness meter is within the preset film thickness range, performing film coating on the next layer.
When coating, bombarding a specific target material by using ultrahigh-speed electrons, shielding one part of ion cloud by using a specific shade, and only allowing the other part of ion cloud to be attached to the surface of glass to form an extremely thin nano coating. By controlling the thickness of the plating layer, a nanometer-level thickness difference is formed, and then the ground color is sprayed.
Step 3, shutdown phase
(1) After the plated part is taken out, the control mode knob is required to be in a manual position, a gate is closed, and a door lock is fastened;
(2) pressing a diffusion pump off button, turning off a diffusion pump power supply, and maintaining the pump to continuously work;
(3) opening a rough pumping button, and starting pumping the vacuum chamber;
(4) after the atmosphere in the vacuum chamber is basically exhausted (about 10 minutes), pressing a rough pumping valve closing button, and closing the rough pumping valve;
(5) after about 2 hours, the lower end of the diffusion pump shell is generally cooled to below 60 ℃, a maintenance pump turn-off button is pressed, and the maintenance pump is stopped;
(6) turning off the control power supply;
(7) and (4) turning off a main power switch, turning off a main power supply, stopping supplying cooling water and compressed air, and stopping working of the equipment.
The above embodiments are merely preferred embodiments of the present invention, which is not intended to limit the present invention in any way. Although the present invention has been described with reference to the preferred embodiments, it is not intended to be limited thereto. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention should fall within the protection scope of the technical scheme of the present invention, unless the technical spirit of the present invention departs from the content of the technical scheme of the present invention.
Claims (5)
1. A coating quality control method of a gradient color coating machine is characterized in that the coating machine is provided with a film thickness instrument, the film thickness instrument comprises a crystal oscillator probe and a film thickness control instrument host, the crystal oscillator probe is fixed on the side surface of a workpiece rotating stand, the film thickness instrument monitors the film thickness in real time, and after each layer of coating, if the film thickness instrument detects that the film thickness is smaller than a preset film thickness, the same color system sputtering is continued; and if the film thickness detected by the film thickness meter is within the preset film thickness range, performing film coating on the next layer.
2. The method of claim 1, wherein the surface of the crystal plate of the crystal probe and the surface of the workpiece are in the same plane.
3. The method for controlling the coating quality of a gradient color coating machine according to claim 2, wherein the electrical lead and the signal wire of the crystal oscillator probe penetrate through the furnace body to be connected with the main machine of the film thickness control instrument, and the main machine of the film thickness control instrument is provided with a WiFi wireless transmission module for transmitting the data monitored by the crystal oscillator probe to a computer beside the furnace in real time.
4. The method of claim 3, wherein a baffle is added between the target and the workpiece during coating.
5. The method for controlling the coating quality of a gradient color coating machine according to claim 4, comprising the following steps:
step 1, preheating stage:
(1) providing compressed air and cooling water for the vacuum unit;
(2) switching on a power supply, and starting a maintaining pump;
step 2, working stage
(1) After the film coating chamber is filled with the atmosphere, opening a gate, closing the gate filled with the piece to be coated and the coating material, and fastening a door lock;
(2) when the vacuum pressure is less than 2Pa, closing the rough pumping valve; after the rough pumping valve is closed, pressing a fine pumping valve opening button to perform fine pumping on the coating chamber;
(3) setting the rotating speed of the workpiece; when the preset vacuum coating pressure is reached, coating starts;
(4) the film thickness meter monitors the film thickness in real time, and after each layer of film is coated, if the film thickness meter detects that the film thickness is smaller than the preset film thickness, the same-color sputtering is continued; and if the film thickness detected by the film thickness meter is within the preset film thickness range, performing film coating on the next layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911278479.4A CN112501578A (en) | 2019-12-13 | 2019-12-13 | Coating quality control method of gradient coating machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911278479.4A CN112501578A (en) | 2019-12-13 | 2019-12-13 | Coating quality control method of gradient coating machine |
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| CN112501578A true CN112501578A (en) | 2021-03-16 |
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| CN201911278479.4A Pending CN112501578A (en) | 2019-12-13 | 2019-12-13 | Coating quality control method of gradient coating machine |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114664684A (en) * | 2022-03-25 | 2022-06-24 | 成都海威华芯科技有限公司 | A method for measuring the thickness of metal layers in the production of semiconductor devices |
| CN115406489A (en) * | 2022-11-01 | 2022-11-29 | 山东申华光学科技有限公司 | Monitoring and early warning method and system for film coating of film coating machine |
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2019
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| JP2005042160A (en) * | 2003-07-22 | 2005-02-17 | Matsushita Electric Ind Co Ltd | Method and device for controlling film thickness |
| CN102888591A (en) * | 2012-10-31 | 2013-01-23 | 上海膜林科技有限公司 | Discrete crystal control film thickness control device |
| CN103469172A (en) * | 2013-08-31 | 2013-12-25 | 上海膜林科技有限公司 | Control method of coating thickness of quartz crystal and coating device of quartz crystal |
| CN104131261A (en) * | 2014-07-08 | 2014-11-05 | 东莞市汇成真空科技有限公司 | Vacuum optical coating machine capable of moving along with workpiece and in-place dynamically monitoring membrane thickness |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114664684A (en) * | 2022-03-25 | 2022-06-24 | 成都海威华芯科技有限公司 | A method for measuring the thickness of metal layers in the production of semiconductor devices |
| CN115406489A (en) * | 2022-11-01 | 2022-11-29 | 山东申华光学科技有限公司 | Monitoring and early warning method and system for film coating of film coating machine |
| CN115406489B (en) * | 2022-11-01 | 2023-01-24 | 山东申华光学科技有限公司 | Monitoring and early warning method and system for film coating of film coating machine |
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