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CN103413797B - A kind of power semiconductor modular of three-dimensional structure unit assembling - Google Patents

A kind of power semiconductor modular of three-dimensional structure unit assembling Download PDF

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CN103413797B
CN103413797B CN201310323097.5A CN201310323097A CN103413797B CN 103413797 B CN103413797 B CN 103413797B CN 201310323097 A CN201310323097 A CN 201310323097A CN 103413797 B CN103413797 B CN 103413797B
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metal layer
power semiconductor
semiconductor chip
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metal
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CN103413797A (en
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王春雷
郑利兵
方化潮
靳鹏云
韩立
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Institute of Electrical Engineering of CAS
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/33Structure, shape, material or disposition of the layer connectors after the connecting process of a plurality of layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Inverter Devices (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

一种三维结构单元组装的功率半导体模块,由多个三维结构单元(6)通过机械装配而成。一个三维结构单元的发射极通过连接端子与另外一个三维结构单元的集电极串联作为一个半桥单元,多个半桥单元并联。每个功率半导体模块的三维结构单元(6)由全控型功率半导体芯片(10a)、不控型功率半导体芯片(10b)、第一衬底(1)、第二衬底(5)组成;所述的全控型功率半导体芯片(10a)和不控型功率半导体芯片(10b)位于第一衬底(1)和第二衬底(5)之间,并列布置。全控型功率半导体芯片(10a)的栅极(10a2)位于不控型功率半导体芯片(10a)芯片边角处。所述的功率半导体模块通入绝缘冷却液体冷却。

A power semiconductor module assembled with three-dimensional structural units, which is mechanically assembled from a plurality of three-dimensional structural units (6). The emitter of one three-dimensional structure unit is connected in series with the collector of another three-dimensional structure unit through the connection terminal to form a half-bridge unit, and multiple half-bridge units are connected in parallel. The three-dimensional structural unit (6) of each power semiconductor module is composed of a fully controlled power semiconductor chip (10a), an uncontrolled power semiconductor chip (10b), a first substrate (1), and a second substrate (5); The fully controlled power semiconductor chip (10a) and the uncontrolled power semiconductor chip (10b) are located between the first substrate (1) and the second substrate (5) and arranged side by side. The grid (10a2) of the fully controlled power semiconductor chip (10a) is located at the chip corner of the uncontrolled power semiconductor chip (10a). The power semiconductor module is cooled by passing through an insulating cooling liquid.

Description

一种三维结构单元组装的功率半导体模块A power semiconductor module assembled by three-dimensional structural unit

技术领域technical field

本发明涉及一种三维封装的功率半导体模块。The invention relates to a three-dimensional packaged power semiconductor module.

背景技术Background technique

近年来,随着新能源技术的发展,大功率的变流器得到了广泛的应用。逆变器的散热能力成为一个共同关注的核心问题。功率半导体模块在工作中芯片的结温可能达到175℃甚至更高,过高的芯片结温大大的降低了功率半导体模块的循环次数进而会降低模块的使用寿命。In recent years, with the development of new energy technology, high-power converters have been widely used. The heat dissipation capability of the inverter becomes a core issue of common concern. The junction temperature of the chip of the power semiconductor module may reach 175°C or even higher during operation. Excessively high chip junction temperature will greatly reduce the number of cycles of the power semiconductor module and further reduce the service life of the module.

当前功率半导体模块中对于IGBT和二极管之间的连接采用金属键合线的方法,此方法在高温条件下由于热疲劳容易引起键合线的剥离,极大的降低了模块的可靠性。这种传统的封装结构中芯片正面采用了键合引线进行电气互连,因此作为热源的芯片只能通过在背面焊接DBC以及铜底板结构进行散热,而传统的单面散热结构的散热效率十分有限。In current power semiconductor modules, metal bonding wires are used for the connection between IGBTs and diodes. This method is likely to cause peeling of bonding wires due to thermal fatigue under high temperature conditions, which greatly reduces the reliability of the module. In this traditional packaging structure, bonding wires are used on the front side of the chip for electrical interconnection. Therefore, the chip as a heat source can only dissipate heat by soldering DBC and copper base plate structure on the back side, while the heat dissipation efficiency of the traditional single-sided heat dissipation structure is very limited. .

此外,高热通量功率器件由于自身不均匀的冷却通道结构使得热源芯片表面温度分布不均现象更加突出。当前的模块普遍采用直接焊接到铜底板的方式进行封装,这使得某个单元失效导致整个模块报废,其它完好的单元部分不能进一步利用,使得使用成本增加。In addition, due to the uneven cooling channel structure of high heat flux power devices, the uneven temperature distribution on the surface of the heat source chip is more prominent. The current modules are generally packaged by direct soldering to the copper base plate, which causes the failure of a certain unit to cause the entire module to be scrapped, and other intact unit parts cannot be further used, which increases the cost of use.

美国专利US0138452A1以及US7005743B2提出的功率半导体模块采用了双面冷却的方法,提高了模块的冷却效果,但是该专利所述的功率半导体芯片的栅极采用的是键合引线引出,整个封装过程仍然没有摆脱对键合线的依赖,增加了封装的工艺复杂度。The power semiconductor modules proposed in US patents US0138452A1 and US7005743B2 adopt the method of double-sided cooling, which improves the cooling effect of the module, but the gate of the power semiconductor chip described in this patent is drawn out by bonding wires, and the entire packaging process is still not Getting rid of the dependence on bonding wires increases the process complexity of packaging.

发明内容Contents of the invention

本发明的目的是克服现有技术的缺点,提出一种无引线键合工艺的三维结构单元组装而成的功率半导体模块。本发明一方面可降低芯片结壳热阻、降低芯片的结温,同时可降低模块的杂散参数,进而提高功率半导体模块的功率密度。The purpose of the present invention is to overcome the disadvantages of the prior art, and propose a power semiconductor module assembled from three-dimensional structural units without wire bonding process. On the one hand, the invention can reduce the thermal resistance of the junction of the chip and the junction temperature of the chip, and at the same time can reduce the stray parameters of the module, thereby increasing the power density of the power semiconductor module.

本发明功率半导体模块由多个三维结构单元组成,每个三维结构单元通过机械固定的方式安装在绝缘底板上面,各三维结构单元可以灵活装卸,避免因其中某个单元故障导致模块整体失效的问题,同时功率半导体模块能够有效提高模块的散热性能。The power semiconductor module of the present invention is composed of a plurality of three-dimensional structural units, and each three-dimensional structural unit is installed on the insulating base plate by means of mechanical fixing, and each three-dimensional structural unit can be loaded and unloaded flexibly, so as to avoid the failure of the whole module due to the failure of one of the units , and at the same time, the power semiconductor module can effectively improve the heat dissipation performance of the module.

本发明的功率半导体模块中,一个三维结构单元的发射极通过连接端子与另外一个三维结构单元的集电极串联作为一个半桥单元,然后根据不同的电路需求选择不同数目的半桥单元进行并联。功率半导体模块中三维结构单元的数目由芯片的电压、电流等级以及要实现的电路结构确定。In the power semiconductor module of the present invention, the emitter of one three-dimensional structural unit is connected in series with the collector of another three-dimensional structural unit as a half-bridge unit, and then a different number of half-bridge units are selected for parallel connection according to different circuit requirements. The number of three-dimensional structural units in a power semiconductor module is determined by the voltage and current level of the chip and the circuit structure to be realized.

每个三维结构单元由全控型功率半导体芯片、不控型功率半导体芯片、第一衬底、第二衬底、第一金属垫片、第二金属垫片以及第三金属垫片组成,第一金属垫片焊接到全控型功率半导体芯片的栅极,第二金属垫片焊接到全控型功率半导体芯片的栅极,第三金属垫片焊接到不控型功率半导体芯片的正极。第一衬底由三层组成:位于上面的第一金属层,位于中间的第一电绝缘层和位于下面的第二金属层。所述的第一金属层通过刻蚀工艺形成相互不连接的两部分:第一金属层栅极侧和第一金属层发射极侧。所述的第二金属层通过刻蚀工艺形成两部分:第二金属层栅极侧和第二金属层发射极侧。第一金属层栅极侧与第二金属层栅极侧的位置上下对应,第一金属层发射极侧与第二金属层发射极侧上下对应。位于中间的第一电绝缘层有一个金属化通孔,第一金属层栅极侧与第二金属层栅极侧通过所述的金属化通孔连接。第一金属层发射极侧与第二金属层发射极侧之间电气绝缘。Each three-dimensional structural unit is composed of a fully controlled power semiconductor chip, an uncontrolled power semiconductor chip, a first substrate, a second substrate, a first metal pad, a second metal pad and a third metal pad. A metal gasket is welded to the grid of the full-control power semiconductor chip, a second metal gasket is welded to the grid of the full-control power semiconductor chip, and a third metal gasket is welded to the positive electrode of the uncontrolled power semiconductor chip. The first substrate consists of three layers: a first metal layer on top, a first electrically insulating layer in the middle and a second metal layer on the bottom. The first metal layer forms two parts that are not connected to each other through an etching process: the gate side of the first metal layer and the emitter side of the first metal layer. The second metal layer is formed into two parts through an etching process: the gate side of the second metal layer and the emitter side of the second metal layer. The gate side of the first metal layer corresponds vertically to the gate side of the second metal layer, and the emitter side of the first metal layer corresponds vertically to the emitter side of the second metal layer. The first electrical insulating layer in the middle has a metallized through hole, and the gate side of the first metal layer is connected with the gate side of the second metal layer through the metallized through hole. The emitter side of the first metal layer is electrically insulated from the emitter side of the second metal layer.

第二衬底由三层组成:位于上面的第三金属层,位于中间的第二电绝缘层和位于下面的第四金属层。第三金属层通过刻蚀工艺形成不连接的两部分:第三金属层集电极侧和第三金属层发射极侧,第三金属层集电极侧和第三金属层发射极侧不连接。The second substrate consists of three layers: a third metal layer on top, a second electrically insulating layer in the middle and a fourth metal layer on the bottom. The third metal layer forms two disconnected parts through an etching process: the collector side of the third metal layer and the emitter side of the third metal layer, and the collector side of the third metal layer and the emitter side of the third metal layer are not connected.

第一金属层、第二金属层和第三金属层均具有电路结构。The first metal layer, the second metal layer and the third metal layer all have a circuit structure.

两个衬底的电绝缘层采用氧化铝、氮化铝或者氮化硅等高导热材料制作,两个衬底的金属层的材料为铜﹑铝或铜的合金等。全控型功率半导体芯片和不控型功率半导体芯片通过两个衬底的金属层的电路结构实现互连。The electrical insulating layers of the two substrates are made of high thermal conductivity materials such as aluminum oxide, aluminum nitride or silicon nitride, and the metal layers of the two substrates are made of copper, aluminum or copper alloys. The fully controlled power semiconductor chip and the uncontrolled power semiconductor chip are interconnected through the circuit structure of the metal layer of the two substrates.

第一衬底位于整个三维结构单元的顶部,第二衬底位于整个三维结构单元的底部,全控型功率半导体芯片和不控型功率半导体芯片并列焊接在第一衬底第二金属层与第二衬底第三金属层之间,全控型功率半导体芯片的栅极与第二金属层栅极侧相对应,全控型功率半导体芯片的发射极、不控型功率半导体芯片的正极与第二金属层集电极侧相对应。The first substrate is located on the top of the entire three-dimensional structural unit, and the second substrate is located at the bottom of the entire three-dimensional structural unit. The fully controlled power semiconductor chip and the uncontrolled power semiconductor chip are soldered side by side on the second metal layer of the first substrate and the second metal layer. Between the second substrate and the third metal layer, the gate of the full-control power semiconductor chip corresponds to the gate side of the second metal layer, the emitter of the full-control power semiconductor chip, the positive electrode of the uncontrolled power semiconductor chip and the second metal layer. The collector sides of the two metal layers correspond to each other.

全控型功率半导体芯片为IGBT等,不控型功率半导体芯片为硅基二极管或碳化硅基二极管等。The fully controlled power semiconductor chip is an IGBT, etc., and the uncontrolled power semiconductor chip is a silicon-based diode or a silicon carbide-based diode.

所述的全控型功率半导体芯片的栅极通过第一金属垫片与第一衬底的第二金属层栅极侧焊接,第一衬底第二金属层栅极侧通过电绝缘层金属化通孔与第一衬底第一金属层栅极侧相连;全控型功率半导体芯片的发射极以及不控型功率半导体芯片的正极分别通过第二金属垫片和第三金属垫片与第一衬底的第二金属层发射极侧焊接。全控型功率半导体芯片的集电极和不控型功率半导体芯片的负极分别与第三金属层的集电极侧焊接;第二金属层发射极侧通过第四金属垫片与第三金属层发射极侧焊接。The gate of the fully-controlled power semiconductor chip is welded to the gate side of the second metal layer of the first substrate through the first metal pad, and the gate side of the second metal layer of the first substrate is metallized through an electrical insulating layer The through hole is connected to the gate side of the first metal layer of the first substrate; the emitter of the fully-controlled power semiconductor chip and the positive electrode of the uncontrolled power semiconductor chip are respectively connected to the first metal pad through the second metal pad and the third metal pad. The second metal layer of the substrate is soldered on the emitter side. The collector of the fully-controlled power semiconductor chip and the negative electrode of the uncontrolled power semiconductor chip are respectively welded to the collector side of the third metal layer; the emitter side of the second metal layer is connected to the emitter of the third metal layer through the fourth metal pad side welded.

功率半导体模块通过直接浸润绝缘冷却循环液体进行冷却。The power semiconductor modules are cooled by direct immersion in the insulating cooling circuit liquid.

本发明增强了功率半导体模块的散热能力,提高了模块功率密度,同时又实现了三维结构单元在功率半导体模块绝缘底板上的灵活装卸,因此本发明特别适用于大型风能、太阳能发电站等高热通量场合。本发明功率半导体芯片之间的互联通过金属层电路焊接来实现,摆脱了对键合工艺的依赖,提高了功率半导体模块的可靠性。The invention enhances the heat dissipation capability of the power semiconductor module, improves the power density of the module, and at the same time realizes the flexible loading and unloading of three-dimensional structural units on the insulating base plate of the power semiconductor module, so the invention is especially suitable for high heat flux such as large-scale wind energy and solar power stations. volume occasions. The interconnection between the power semiconductor chips of the present invention is realized through metal layer circuit welding, which gets rid of the dependence on the bonding process and improves the reliability of the power semiconductor module.

附图说明Description of drawings

图1a为三维结构单元的截面图;Figure 1a is a cross-sectional view of a three-dimensional structural unit;

图1b为三维结构单元的左视图;Figure 1b is a left view of the three-dimensional structural unit;

图2为三维结构单元的第一衬底的俯视图;Fig. 2 is the top view of the first substrate of three-dimensional structure unit;

图3为三维结构单元第一衬底的仰视图;Fig. 3 is the bottom view of the first substrate of the three-dimensional structure unit;

图4为三维结构单元第二衬底的俯视图;4 is a top view of a second substrate of a three-dimensional structure unit;

图5为三维结构单元装配图;Fig. 5 is an assembly diagram of a three-dimensional structural unit;

图6a为本发明实施例的内部装配图;Figure 6a is an internal assembly diagram of an embodiment of the present invention;

图6b为本发明实施例的外壳图。Fig. 6b is a housing diagram of an embodiment of the present invention.

具体实施方式Detailed ways

以下结合附图和具体实施方式进一步说明本发明。The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

本发明功率半导体模块由多个三维结构单元组成,每个三维结构单元固定安装在绝缘底板上面。一个三维结构单元的发射极通过连接端子与另外一个三维结构单元的集电极串联作为一个半桥单元,多个半桥单元并联。The power semiconductor module of the present invention is composed of multiple three-dimensional structural units, and each three-dimensional structural unit is fixedly installed on the insulating base plate. The emitter of one three-dimensional structure unit is connected in series with the collector of another three-dimensional structure unit through the connection terminal to form a half-bridge unit, and multiple half-bridge units are connected in parallel.

如图1a所示,三维结构单元6包括全控型功率半导体芯片10a、不控型功率半导体芯片10b、第一衬底1、第二衬底5、第一金属垫片8a、第二金属垫片9a,以及第三金属垫片9b。所述的全控型功率半导体芯片10a和不控型功率半导体芯片10b位于第一衬底1和第二衬底5之间,并列布置。As shown in Figure 1a, the three-dimensional structure unit 6 includes a fully controlled power semiconductor chip 10a, an uncontrolled power semiconductor chip 10b, a first substrate 1, a second substrate 5, a first metal pad 8a, a second metal pad sheet 9a, and the third metal gasket 9b. The fully controlled power semiconductor chip 10a and the uncontrolled power semiconductor chip 10b are located between the first substrate 1 and the second substrate 5 and arranged side by side.

如图3所示,三维结构单元6中不控型功率半导体芯片10b位于远离全控型功率半导体芯片10a栅极10a2的一侧,全控型功率半导体芯片10a、不控型功率半导体芯片10b与第二衬底的左侧边缘对齐。所述的全控型功率半导体芯片10a的栅极10a2位于全控型功率半导体芯片边角处。As shown in Figure 3, the uncontrolled power semiconductor chip 10b in the three-dimensional structure unit 6 is located on the side away from the gate 10a2 of the fully controlled power semiconductor chip 10a, the fully controlled power semiconductor chip 10a, the uncontrolled power semiconductor chip 10b and the The left edge of the second substrate is aligned. The gate 10a2 of the full-control power semiconductor chip 10a is located at the corner of the full-control power semiconductor chip.

第一衬底1和第二衬底5均由三层结构组成:中间一层为电绝缘层,电绝缘层的上面和下面为金属层。Both the first substrate 1 and the second substrate 5 are composed of a three-layer structure: the middle layer is an electrical insulating layer, and the upper and lower layers of the electrical insulating layer are metal layers.

第一衬底1由第一金属层、第一电绝缘层1b和第二金属层组成;位于第一电绝缘层1b上面的第一金属层分为第一金属层发射极侧1a1和第一金属层栅极侧1a2两部分,所述的第一金属层发射极侧1a1与第一金属层栅极侧1a2之间不导通;位于第一电绝缘层1b下面的第二金属层分为第二金属层发射极侧1c1和第一金属层栅极侧1c2两部分,所述的第二金属层发射极侧1c1与第二金属层栅极侧1c2之间不导通;第一金属层栅极侧1a2与第二金属层栅极侧1c2通过位于第一绝缘层1b的一个金属化通孔7c连接。The first substrate 1 is composed of a first metal layer, a first electrically insulating layer 1b and a second metal layer; the first metal layer located above the first electrically insulating layer 1b is divided into the emitter side 1a1 of the first metal layer and the first There are two parts on the gate side 1a2 of the metal layer, the emitter side 1a1 of the first metal layer is not connected to the gate side 1a2 of the first metal layer; the second metal layer located under the first electrical insulating layer 1b is divided into two parts: The emitter side 1c1 of the second metal layer and the gate side 1c2 of the first metal layer are two parts, the emitter side 1c1 of the second metal layer and the gate side 1c2 of the second metal layer are not conductive; the first metal layer The gate side 1a2 is connected to the gate side 1c2 of the second metal layer through a metallized via hole 7c located in the first insulating layer 1b.

所述的全控型功率半导体芯片10a的栅极10a2与第二金属层栅极侧1c2相对应,全控型功率半导体芯片10a的发射极10a1、不控型功率半导体芯片的正极10b1与第二金属层的集电极侧1c1相对应。第二衬底5由第三金属层、第二电绝缘层5b以及第四金属层5c组成;第三金属层和第四金属层5c分别位于第二电绝缘层5b的上面和下面;第三金属层通过刻蚀工艺形成第三金属层集电极侧5a1与第三金属层发射极侧5a2两部分,第三金属层集电极侧5a1与第三金属层发射极侧5a2之间不导通。The grid 10a2 of the fully-controlled power semiconductor chip 10a corresponds to the gate side 1c2 of the second metal layer, the emitter 10a1 of the fully-controlled power semiconductor chip 10a, the positive electrode 10b1 of the uncontrolled power semiconductor chip and the second metal layer. The collector side 1c1 of the metal layer corresponds. The second substrate 5 is made up of a third metal layer, a second electrical insulating layer 5b and a fourth metal layer 5c; the third metal layer and the fourth metal layer 5c are respectively located above and below the second electrical insulating layer 5b; the third The metal layer is formed by an etching process into two parts, the third metal layer collector side 5a1 and the third metal layer emitter side 5a2, and the third metal layer collector side 5a1 and the third metal layer emitter side 5a2 are not conductive.

如图2、图3、图4所示,第一金属层、第二金属层和第三金属层均具有电路结构。As shown in FIG. 2 , FIG. 3 and FIG. 4 , the first metal layer, the second metal layer and the third metal layer all have a circuit structure.

如图1a所示,全控型功率半导体芯片10a的发射极10a1、不控型功率半导体芯片的负极10b2焊接于第三金属层发射极侧5a1上;全控型功率半导体芯片10a的发射极10a1、栅极10a2以及不控型功率半导体芯片的正极10b1分别和第一金属垫片8a、第二金属垫片9a以及第三金属垫片9b焊接;第一金属垫片8a与第一衬底1的第二金属层栅极侧1c2焊接,并通过金属化通孔7c与第一衬底1的第一金属层栅极侧1a2相连;第二金属垫片9a和第三金属垫片9b与第一衬底1的第二金属层发射极侧1c1焊接。As shown in Figure 1a, the emitter 10a1 of the fully-controlled power semiconductor chip 10a and the negative electrode 10b2 of the uncontrolled power semiconductor chip are welded on the emitter side 5a1 of the third metal layer; the emitter 10a1 of the fully-controlled power semiconductor chip 10a , the grid 10a2 and the positive electrode 10b1 of the uncontrolled power semiconductor chip are welded to the first metal pad 8a, the second metal pad 9a and the third metal pad 9b respectively; the first metal pad 8a is connected to the first substrate 1 The second metal layer gate side 1c2 of the second metal layer is soldered, and is connected to the first metal layer gate side 1a2 of the first substrate 1 through the metallized through hole 7c; the second metal pad 9a and the third metal pad 9b are connected to the first metal layer gate side 1a2 of the first substrate 1 The emitter side 1c1 of the second metal layer of a substrate 1 is soldered.

如图1b所示,第一衬底1的第二金属层发射极侧1c1通过第四金属垫片11与第二衬底5的第三金属层发射极侧5a2相连。As shown in FIG. 1b , the emitter side 1c1 of the second metal layer of the first substrate 1 is connected to the emitter side 5a2 of the third metal layer of the second substrate 5 through a fourth metal pad 11 .

如图6a所示,第一三维结构单元的发射极e2与第二三维结构单元的集电极e3通过连接端子22串联形成一个半桥单元;第三三维结构单元的发射极f2与第四三维结构单元的集电极f3通过连接端子22串联形成一个半桥单元,第五三维结构单元的发射极g2与第六三维结构单元的集电极g3通过连接端子22串联作为一个半桥单元;三个半桥单元中的第一、第三、第五三维结构单元集电极e1、f1、g1固定于绝缘底板17的正极端子20a上,第二、第四、第六三维结构单元的发射极e4、f4、g4固定于绝缘底板17的负极端子20b上,三组半桥单元通过正极端子20a以及负极端子20b实现并联。As shown in Figure 6a, the emitter e2 of the first three-dimensional structure unit and the collector e3 of the second three-dimensional structure unit are connected in series through the connection terminal 22 to form a half-bridge unit; the emitter f2 of the third three-dimensional structure unit is connected to the fourth three-dimensional structure unit The collector f3 of the unit is connected in series through the connection terminal 22 to form a half-bridge unit, and the emitter g2 of the fifth three-dimensional structure unit and the collector g3 of the sixth three-dimensional structure unit are connected in series through the connection terminal 22 as a half-bridge unit; The collectors e1, f1, g1 of the first, third, and fifth three-dimensional structure units in the unit are fixed on the positive terminal 20a of the insulating base plate 17, and the emitters e4, f4, and f4 of the second, fourth, and sixth three-dimensional structure units g4 is fixed on the negative terminal 20b of the insulating base plate 17, and the three groups of half-bridge units are connected in parallel through the positive terminal 20a and the negative terminal 20b.

所述的绝缘底板17表面有金属化图形的电极:正极端子20a、负极端子20b,以实现多个三维结构单元的电路连接。The surface of the insulating bottom plate 17 has metallized patterned electrodes: positive terminal 20a, negative terminal 20b, so as to realize the circuit connection of multiple three-dimensional structural units.

以下结合附图描述本发明的实施例的结构,该实施例的全控型功率半导体芯片为IGBT,不控型功率半导体芯片为硅基二极管或碳化硅基二极管。The structure of the embodiment of the present invention will be described below with reference to the accompanying drawings. The fully controlled power semiconductor chip in this embodiment is an IGBT, and the uncontrolled power semiconductor chip is a silicon-based diode or a silicon carbide-based diode.

如图1a所示,所述的IGBT芯片集电极10a3以及二极管芯片负极10b2通过无铅或者含铅软焊料焊接于第二衬底5的第三金属层集电极侧5a1上;As shown in Figure 1a, the IGBT chip collector 10a3 and the diode chip cathode 10b2 are soldered to the collector side 5a1 of the third metal layer of the second substrate 5 through lead-free or lead-containing soft solder;

如图1b所示,第四金属垫片11的底面与第三金属层发射极侧5a2焊接。As shown in FIG. 1b, the bottom surface of the fourth metal pad 11 is welded to the emitter side 5a2 of the third metal layer.

如图1a所示,IGBT芯片的栅极10a2与第一金属垫片8a焊接;IGBT芯片发射极10a1、二极管芯片的正极10b1分别与第二金属垫片9a、第三金属垫片9b焊接;第一金属垫片8a的正面焊接于第一衬底1的第二金属层栅极侧1c,第二金属垫片9a、第三金属垫片9b、第四金属垫片11的顶面焊接于第一衬底的第二金属层发射极侧1c1;第一衬底1和第二衬底5的金属层材料为铜﹑铝或铜的合金,电绝缘层为氧化铝,氮化铝或者氮化硅等高导热材料制作,电绝缘层和金属层之间采用烧结连接。As shown in Figure 1a, the gate 10a2 of the IGBT chip is welded to the first metal pad 8a; the emitter 10a1 of the IGBT chip and the anode 10b1 of the diode chip are respectively welded to the second metal pad 9a and the third metal pad 9b; The front side of a metal pad 8a is welded to the second metal layer gate side 1c of the first substrate 1, and the top surfaces of the second metal pad 9a, the third metal pad 9b, and the fourth metal pad 11 are welded to the first substrate 1. The emitter side 1c1 of the second metal layer of a substrate; the metal layer material of the first substrate 1 and the second substrate 5 is copper, aluminum or copper alloy, and the electrical insulating layer is aluminum oxide, aluminum nitride or nitride It is made of high thermal conductivity materials such as silicon, and the electrical insulation layer and the metal layer are connected by sintering.

如图4所示,第三金属层5a被分割为两部分:第三金属层集电极侧5a1与第三金属层发射极侧5a2。第三金属层集电极侧5a1与IGBT芯片的集电极10a3焊接,焊接层为14a1;第三金属层发射极侧5a2通过第四金属垫片11与IGBT芯片的发射极10a1连接;第四金属垫片11与第三金属层发射极侧5a2通过焊接互连;As shown in FIG. 4 , the third metal layer 5a is divided into two parts: the collector side 5a1 of the third metal layer and the emitter side 5a2 of the third metal layer. The collector side 5a1 of the third metal layer is welded to the collector 10a3 of the IGBT chip, and the welding layer is 14a1; the emitter side 5a2 of the third metal layer is connected to the emitter 10a1 of the IGBT chip through the fourth metal pad 11; the fourth metal pad The sheet 11 is interconnected with the emitter side 5a2 of the third metal layer by soldering;

如图1a所示,第一金属垫片8a、第二金属垫片9a以及第三金属垫片9b分别与IGBT芯片的栅极10a2、发射极10a1以及二极管芯片的正极10b1焊接;As shown in Figure 1a, the first metal pad 8a, the second metal pad 9a and the third metal pad 9b are respectively welded to the gate 10a2 of the IGBT chip, the emitter 10a1 and the anode 10b1 of the diode chip;

如图5所示,所述的第一金属垫片8a与IGBT芯片的栅极10a2焊接,第一金属垫片8a与第一衬底1的第二金属层栅极侧1c2焊接,第一衬底1的第二金属层栅极侧1c2通过电绝缘层金属化通孔7c与第一金属层栅极侧1a2的连接。第二金属垫片9a、第三金属垫片、第四金属垫片11与第一衬底1的第二金属层发射极侧1c1焊接,如此实现三维结构单元的封装。As shown in Figure 5, the first metal pad 8a is welded to the gate 10a2 of the IGBT chip, the first metal pad 8a is welded to the second metal layer gate side 1c2 of the first substrate 1, and the first substrate 1 The second metal layer gate side 1c2 of the bottom 1 is connected to the first metal layer gate side 1a2 through an electrically insulating layer metallized via 7c. The second metal pad 9a, the third metal pad, and the fourth metal pad 11 are welded to the emitter side 1c1 of the second metal layer of the first substrate 1, thus realizing the packaging of the three-dimensional structural unit.

如图6a所示,本实施例的三维结构单元组装功率半导体模块是一种全桥结构,由六个三维结构单元通过连接端子22以及螺母24固定在绝缘底板17上。三维结构单元组装功率半导体模块的交流输出端19a、19b、19c通过外部端子经过三维结构单元组装功率半导体模块的外壳16的顶部出口24引出,顶部出口24与三维结构单元组装功率半导体模块的交流输出端19a、19b、19c之间的孔隙密封处理。As shown in FIG. 6 a , the power semiconductor module assembled with three-dimensional structural units in this embodiment is a full-bridge structure, and six three-dimensional structural units are fixed on the insulating base plate 17 through connection terminals 22 and nuts 24 . The AC output terminals 19a, 19b, 19c of the three-dimensional structural unit assembled power semiconductor module are drawn through the top outlet 24 of the shell 16 of the three-dimensional structural unit assembled power semiconductor module through the external terminal, and the top outlet 24 is connected with the AC output of the three-dimensional structural unit assembled power semiconductor module Pore sealing treatment between ends 19a, 19b, 19c.

如图6b所示,三维结构单元组装功率半导体模块的外壳16与绝缘底板17通过铆钉穿过绝缘底板17上的通孔18装配固定,并对外壳16与绝缘底板17通过装配中的接触缝隙进行密封处理。As shown in Figure 6b, the housing 16 and the insulating base plate 17 of the three-dimensional structural unit assembled power semiconductor module are assembled and fixed through the through holes 18 on the insulating base plate 17 through rivets, and the housing 16 and the insulating base plate 17 are carried out through the contact gap in the assembly. Sealed.

本发明通入绝缘冷却液体冷却,可由外接的制冷压缩设备通过与该功率半导体模块的入口21a以及出口21b相连接进行浸润式散热。In the present invention, the insulating cooling liquid is used for cooling, and the external refrigeration compression equipment can be connected with the inlet 21a and the outlet 21b of the power semiconductor module to perform immersion heat dissipation.

Claims (5)

1.一种三维结构单元组装的功率半导体模块,其特征在于,所述的功率半导体模块由多个三维结构单元组成,每个三维结构单元固定安装在绝缘底板(17)上;一个三维结构单元的发射极通过连接端子与另外一个三维结构单元的集电极串联作为一个半桥单元,多个半桥单元并联;1. A power semiconductor module assembled by a three-dimensional structural unit, characterized in that, said power semiconductor module is made up of a plurality of three-dimensional structural units, and each three-dimensional structural unit is fixedly mounted on an insulating base plate (17); a three-dimensional structural unit The emitter of the emitter is connected in series with the collector of another three-dimensional structure unit as a half-bridge unit through the connection terminal, and multiple half-bridge units are connected in parallel; 每个三维结构单元由全控型功率半导体芯片(10a)、不控型功率半导体芯片(10b)、第一衬底(1)、第二衬底(5)、第一金属垫片(8a)、第二金属垫片(9a),以及第三金属垫片(9b)组成,第一金属垫片(8a)焊接在全控型功率半导体芯片的栅极(10a2),第二金属垫片(9a)焊接在全控型功率半导体芯片的发射极(10a1),第三金属垫片(9b)焊接在不控型功率半导体芯片(10b)的正极(10b1);所述的全控型功率半导体芯片(10a)和不控型功率半导体芯片(10b)位于第一衬底(1)和第二衬底(5)之间,并列布置;Each three-dimensional structural unit consists of a fully controlled power semiconductor chip (10a), an uncontrolled power semiconductor chip (10b), a first substrate (1), a second substrate (5), and a first metal pad (8a) , the second metal pad (9a), and the third metal pad (9b), the first metal pad (8a) is welded to the grid (10a2) of the full-control type power semiconductor chip, the second metal pad ( 9a) welded on the emitter (10a1) of the fully-controlled power semiconductor chip, and the third metal pad (9b) is welded on the positive pole (10b1) of the uncontrolled power semiconductor chip (10b); the fully-controlled power semiconductor The chip (10a) and the uncontrolled power semiconductor chip (10b) are located between the first substrate (1) and the second substrate (5) and arranged side by side; 所述的第一衬底(1)由三层结构组成:位于上面的第一金属层,位于中间的第一电绝缘层(1b)和位于下面的第二金属层;所述的第一金属层通过刻蚀工艺形成两部分:第一金属层栅极侧(1a2)和第一金属层发射极侧(1a1),所述的第一金属层发射极侧(1a1)与第一金属层栅极侧(1a2)之间不导通;所述的第二金属层通过刻蚀工艺形成两部分:第二金属层栅极侧(1c2)和第二金属层发射极侧(1c1);第一金属层栅极侧(1a2)与第二金属层栅极侧(1c2)的位置上下对应,第一金属层发射极侧(1a1)与第二金属层发射极侧(1c1)上下对应;位于中间的第一电绝缘层有一个金属化通孔(7c),第一金属层栅极侧(1a2)与第二金属层栅极侧(1c2)通过所述的金属化通孔(7c)连接;第一金属层发射极侧(1a1)与第二金属层发射极侧(1c1)之间电气绝缘;The first substrate (1) is composed of a three-layer structure: the first metal layer on the top, the first electrical insulation layer (1b) in the middle and the second metal layer on the bottom; the first metal layer Layer is formed into two parts by etching process: the first metal layer gate side (1a2) and the first metal layer emitter side (1a1), the first metal layer emitter side (1a1) and the first metal layer gate There is no conduction between the pole sides (1a2); the second metal layer is formed into two parts by an etching process: the second metal layer gate side (1c2) and the second metal layer emitter side (1c1); the first The metal layer gate side (1a2) corresponds to the position of the second metal layer gate side (1c2) up and down, and the first metal layer emitter side (1a1) corresponds to the second metal layer emitter side (1c1) up and down; located in the middle The first electrical insulating layer has a metallized through hole (7c), and the first metal layer gate side (1a2) is connected to the second metal layer gate side (1c2) through the metallized through hole (7c); electrical insulation between the emitter side (1a1) of the first metal layer and the emitter side (1c1) of the second metal layer; 全控型功率半导体芯片(10a)的栅极(10a2)与第二金属层栅极侧(1c2)相对应,全控型功率半导体芯片(10a)的发射极(10a1)、不控型功率半导体芯片的正极(10b1)与第二金属层的集电极侧(1c1)相对应;The grid (10a2) of the fully-controlled power semiconductor chip (10a) corresponds to the gate side (1c2) of the second metal layer, the emitter (10a1) of the fully-controlled power semiconductor chip (10a), and the uncontrolled power semiconductor The positive electrode (10b1) of the chip corresponds to the collector side (1c1) of the second metal layer; 第二衬底(5)由三层组成:位于上面的第三金属层,位于中间的第二电绝缘层(5b)和位于下面的第四金属层(5c);第三金属层通过刻蚀工艺形成不连接的两部分:第三金属层集电极侧(5a1)和第三金属层发射极侧(5a2),第三金属层集电极侧(5a1)和第三金属层发射极侧(5a2)不导通。The second substrate (5) is composed of three layers: the third metal layer on the top, the second electrical insulating layer (5b) in the middle and the fourth metal layer (5c) below; the third metal layer is etched The process forms two parts that are not connected: the third metal layer collector side (5a1) and the third metal layer emitter side (5a2), the third metal layer collector side (5a1) and the third metal layer emitter side (5a2 ) is not conductive. 2.根据权利要求1所述的功率半导体模块,其特征在于,所述的第一金属层、第二金属层和第三金属层均具有电路结构。2. The power semiconductor module according to claim 1, wherein the first metal layer, the second metal layer and the third metal layer all have a circuit structure. 3.根据权利要求1所述的功率半导体模块,其特征在于,所述的全控型功率半导体芯片(10a)的发射极(10a1)、不控型功率半导体芯片的负极(10b2)焊接于第三金属层发射极侧(5a1)上;全控型功率半导体芯片(10a)的发射极(10a1)、栅极(10a2)和不控型功率半导体芯片的正极(10b1)分别和第一金属垫片(8a)、第二金属垫片(9a),以及第三金属垫片(9b)焊接;第一金属垫片(8a)与第二金属层栅极侧(1c2)焊接,并通过金属化通孔(7c)与第一金属层栅极侧(1a2)相连;第二金属垫片(9a)和第三金属垫片(9b)与第二金属层发射极侧(1c1)焊接;第二金属层发射极侧(1c1)通过第四金属垫片(11)与第三金属层发射极侧(5a2)相连。3. The power semiconductor module according to claim 1, characterized in that, the emitter (10a1) of the fully-controlled power semiconductor chip (10a) and the negative electrode (10b2) of the uncontrolled power semiconductor chip are welded to the first On the emitter side (5a1) of the three metal layers; the emitter (10a1), grid (10a2) of the fully controlled power semiconductor chip (10a) and the positive pole (10b1) of the uncontrolled power semiconductor chip are respectively connected to the first metal pad sheet (8a), the second metal pad (9a), and the third metal pad (9b); the first metal pad (8a) is welded to the second metal layer gate side (1c2), and through the metallization The through hole (7c) is connected to the gate side (1a2) of the first metal layer; the second metal pad (9a) and the third metal pad (9b) are welded to the emitter side (1c1) of the second metal layer; the second The emitter side (1c1) of the metal layer is connected to the emitter side (5a2) of the third metal layer through a fourth metal pad (11). 4.根据权利要求1所述的功率半导体模块,其特征在于,所述的不控型功率半导体芯片(10b)位于远离全控型功率半导体芯片(10a)的栅极(10a2)的一侧;全控型功率半导体芯片(10a)、不控型功率半导体芯片(10b)与第二衬底的左侧边缘对齐,所述的全控型功率半导体芯片(10a)的栅极(10a2)位于全控型功率半导体芯片边角处。4. The power semiconductor module according to claim 1, characterized in that, the uncontrolled power semiconductor chip (10b) is located on a side away from the gate (10a2) of the fully controlled power semiconductor chip (10a); The fully-controlled power semiconductor chip (10a) and the uncontrolled power semiconductor chip (10b) are aligned with the left edge of the second substrate, and the grid (10a2) of the fully-controlled power semiconductor chip (10a) is located at the full Controlled power semiconductor chip corner. 5.根据权利要求1所述的功率半导体模块,其特征在于,所述功率半导体模块通入绝缘冷却液体冷却,外接的制冷压缩设备通过与该功率半导体模块入口(21a)以及出口(21b)相连进行浸润式散热。5. The power semiconductor module according to claim 1, characterized in that, the power semiconductor module is cooled by an insulating cooling liquid, and the external refrigeration compression equipment is connected to the inlet (21a) and outlet (21b) of the power semiconductor module Perform immersion cooling.
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