CN103293862B - Silicon wafer edge protection device - Google Patents
Silicon wafer edge protection device Download PDFInfo
- Publication number
- CN103293862B CN103293862B CN201210041401.2A CN201210041401A CN103293862B CN 103293862 B CN103293862 B CN 103293862B CN 201210041401 A CN201210041401 A CN 201210041401A CN 103293862 B CN103293862 B CN 103293862B
- Authority
- CN
- China
- Prior art keywords
- eccentric
- protection device
- silicon wafer
- edge protection
- wafer edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
技术领域 technical field
本发明涉及集成电路制造领域,尤其涉及一种硅片边缘保护装置。The invention relates to the field of integrated circuit manufacturing, in particular to a silicon chip edge protection device.
背景技术 Background technique
光刻装置主要用于集成电路IC或其他微型器件的制造。通过光刻装置,可将掩膜图形成像于涂覆有光刻胶的晶片上,例如半导体或LCD板。光刻装置通过投影物镜曝光,将设计的掩模图形转移到光刻胶上,而作为光刻装置的核心元件,硅片边缘保护对实现负胶工艺曝光过程硅片边缘保护装置功能有重要的影响。Lithography equipment is mainly used in the manufacture of integrated circuits IC or other micro-devices. With a photolithographic apparatus, a mask pattern can be imaged on a photoresist-coated wafer, such as a semiconductor or an LCD panel. The lithography device exposes through the projection objective lens, and transfers the designed mask pattern to the photoresist. As the core component of the lithography device, the edge protection of the silicon wafer is important to realize the function of the edge protection device of the silicon wafer during the exposure process of the negative resist process. Influence.
为了获得成像效果,将光刻胶涂敷于硅片上,曝光后能产生腐蚀图形的一种光敏材料,也称光致抗蚀剂(简称抗蚀剂)或光敏胶,也有称光阻或光阻剂。其可分为正光刻胶(正胶)和负光刻胶(负胶)两类,曝光部分被显影剂溶解的光刻胶称为正光刻胶,非曝光部分被显影液溶解的光刻胶称为负光刻胶。硅片边缘保护装置就是为负胶光刻工艺而产生的一种装置。In order to obtain the imaging effect, the photoresist is coated on the silicon wafer, and a photosensitive material that can produce corrosion patterns after exposure is also called photoresist (abbreviated as resist) or photosensitive adhesive, also known as photoresist or photoresist. Photoresist. It can be divided into positive photoresist (positive photoresist) and negative photoresist (negative photoresist). The photoresist whose exposed part is dissolved by developer is called positive photoresist, and the photoresist whose non-exposed part is dissolved by developer is called positive photoresist. The resist is called a negative photoresist. The silicon wafer edge protection device is a device produced for the negative photolithography process.
已知的负胶光刻方法是在光刻生产线上的单独一套产品,而不是集成到光刻装置上。这样做就会增加产品的生产制造时间,同时导致设备的采购成本及制造厂费用的增加。单独的边缘保护机器会使硅片边缘保护装置的精度大大降低,这样会产生很高的废片率,效率比较低下。Known negative-resist lithography methods are a stand-alone product on a lithography production line, rather than integrated into a lithography apparatus. Doing so will increase the manufacturing time of the product, and at the same time lead to an increase in the purchase cost of the equipment and the cost of the manufacturing plant. A separate edge protection machine will greatly reduce the accuracy of the silicon wafer edge protection device, which will result in a high scrap rate and low efficiency.
硅片边缘保护装置系统主要完成负胶曝光工艺,对于硅片边缘保护装置的核心部件就是硅片边缘保护装置。关于此点,本申请人在2009年9月4日在中国申请的申请号为200910195190.6的文件中已有过简要说明,故在此不再赘述。本申请主要是在前述基础上的优化及创新。The silicon wafer edge protection device system mainly completes the negative rubber exposure process, and the core component of the silicon wafer edge protection device is the silicon wafer edge protection device. Regarding this point, the applicant has briefly explained it in the document with the application number 200910195190.6 filed in China on September 4, 2009, so it will not be repeated here. This application is mainly optimization and innovation based on the foregoing.
发明内容 Contents of the invention
本发明的目的在于提供一种硅片边缘保护装置,以改善现有技术的缺失。The object of the present invention is to provide a silicon chip edge protection device to improve the deficiencies of the prior art.
为解决上述技术问题,本发明提供的硅片边缘保护装置包括基座、轴承、气缸、偏心凸轮盘、至少三个凸轮随动器、至少三个保护爪、至少三个线轨、至少三个挡块以及至少三个导向螺杆。轴承具有可相对运动的外环与内环,内环与基座保持相对静止。气缸具有固定端与活动端,固定端固定于基座。偏心凸轮盘与轴承的外环保持相对静止,且偏心凸轮盘可转动地设置于基座上且连接于活动端。偏心凸轮盘具有至少三个均匀分布的偏心槽,且每一个偏心槽包括偏心圆弧,偏心圆弧的圆心与偏心凸轮盘的圆心不一致。三个凸轮随动器可活动地分别与三个偏心槽对应设置。三个保护爪分别与三个凸轮随动器对应连接设置。至少三个线轨分别对应设置于三个保护爪上。至少三个挡块均固定于基座。至少三个导向螺杆分别对应穿设于三个挡块内。当气缸的活动端作伸缩摆动时,带动偏心凸轮盘以轴承的外圆柱面为滑动轴作圆周运动,三个偏心槽分别作同步偏心运动,使得三个凸轮随动器分别带动三个保护爪沿三个导向螺杆作同步径向运动,三个线轨随三个保护爪同步运动。In order to solve the above technical problems, the silicon chip edge protection device provided by the present invention includes a base, a bearing, a cylinder, an eccentric cam disc, at least three cam followers, at least three protective claws, at least three line rails, at least three stop and at least three lead screws. The bearing has an outer ring and an inner ring that can move relatively, and the inner ring and the base remain relatively stationary. The cylinder has a fixed end and a movable end, and the fixed end is fixed on the base. The eccentric cam disc and the outer ring of the bearing remain relatively stationary, and the eccentric cam disc is rotatably arranged on the base and connected to the movable end. The eccentric cam disc has at least three evenly distributed eccentric slots, and each eccentric slot includes an eccentric arc, and the center of the eccentric arc is not consistent with the center of the eccentric cam disc. The three cam followers are movably arranged respectively corresponding to the three eccentric grooves. The three protective pawls are respectively connected and arranged correspondingly to the three cam followers. At least three line rails are correspondingly arranged on the three protection claws respectively. At least three blocks are fixed on the base. At least three lead screws are correspondingly installed in the three stoppers respectively. When the movable end of the cylinder performs telescopic swing, it drives the eccentric cam disc to make a circular motion with the outer cylindrical surface of the bearing as the sliding axis, and the three eccentric grooves perform synchronous eccentric motion respectively, so that the three cam followers drive the three protective claws respectively. Make synchronous radial movement along the three guide screws, and the three line rails move synchronously with the three protective claws.
在本发明的一实施例中,轴承的内环固定于基座,轴承的外环固定于偏心凸轮盘。In one embodiment of the present invention, the inner ring of the bearing is fixed on the base, and the outer ring of the bearing is fixed on the eccentric cam disc.
在本发明的一实施例中,每一个偏心槽还包括两个同心圆弧,分别连接于偏心圆弧的两端,两个同心圆弧的圆心与偏心凸轮盘的圆心重合。In an embodiment of the present invention, each eccentric groove further includes two concentric arcs connected to two ends of the eccentric arc respectively, and the centers of the two concentric arcs coincide with the centers of the eccentric cam disc.
在本发明的一实施例中,每一个保护爪成C型,且其一端设置通孔,另一端为斜面或直面。In an embodiment of the present invention, each protective claw is C-shaped, and a through hole is provided at one end thereof, and an inclined surface or a straight surface is formed at the other end.
在本发明的一实施例中,硅片边缘保护装置还包括吹气机构,设置于基座。In an embodiment of the present invention, the silicon wafer edge protection device further includes an air blowing mechanism disposed on the base.
在本发明的一实施例中,硅片边缘保护装置还包括至少三个弹簧,分别对应套设于三个导向螺杆上,且分别抵持于三个保护爪。In an embodiment of the present invention, the silicon chip edge protection device further includes at least three springs, which are respectively sleeved on the three lead screws, and respectively supported by the three protection claws.
在本发明的一实施例中,硅片边缘保护装置还包括至少三个定心机构,分别对应设置于三个保护爪,并随三个保护爪同步运动。In an embodiment of the present invention, the silicon wafer edge protection device further includes at least three centering mechanisms, which are respectively arranged on the three protection claws and move synchronously with the three protection claws.
在本发明的一实施例中,硅片边缘保护装置还包括传感器,设置于基座。In an embodiment of the present invention, the silicon chip edge protection device further includes a sensor disposed on the base.
在本发明的一实施例中,硅片边缘保护装置还包括防尘盖与钢珠,防尘盖固定于基座且压合于偏心凸轮盘的上方,钢珠设置于防尘盖内。In an embodiment of the present invention, the silicon wafer edge protection device further includes a dust cover and steel balls, the dust cover is fixed on the base and pressed above the eccentric cam disc, and the steel ball is disposed in the dust cover.
在本发明的一实施例中,硅片边缘保护装置还包括压盖,压合于钢珠。In an embodiment of the present invention, the silicon wafer edge protection device further includes a pressing cover, which is pressed and bonded to the steel ball.
综上所述,在本发明的硅片边缘保护装置中,气缸的伸缩摆动会带动偏心凸轮盘做圆周运动,此时矢量由直线摆动转化为轴向运动。同时,偏心凸轮盘的圆周运动会使得其上的三个偏心槽作同步偏心运动,从而使得三个凸轮随动器分别带动三个保护爪作同步径向运动,此时矢量由轴向运动转化为径向运动。因此,本发明可将一种直线位移转化为多个等分径向位移,以实现通过一个动力源来完成多个径向同步力。本发明提供的硅片边缘保护装置结构简单,摩擦力小,精度高,可靠性好,且同步性高。To sum up, in the silicon wafer edge protection device of the present invention, the telescopic swing of the cylinder will drive the eccentric cam disc to make a circular motion, and at this time the vector is converted from a linear swing to an axial motion. At the same time, the circular motion of the eccentric cam disk will make the three eccentric slots on it move synchronously, so that the three cam followers will respectively drive the three protective claws to make synchronous radial movement. At this time, the vector is converted from axial movement to radial movement. Therefore, the present invention can convert a linear displacement into multiple equally divided radial displacements, so as to realize multiple radial synchronous forces through one power source. The silicon chip edge protection device provided by the invention has the advantages of simple structure, small friction, high precision, good reliability and high synchronization.
附图说明 Description of drawings
图1是硅片边缘保护装置的主视示意图;Fig. 1 is a schematic front view of a silicon wafer edge protection device;
图2是硅片边缘保护装置的俯视示意图;Fig. 2 is a schematic top view of a silicon wafer edge protection device;
图3是硅片边缘保护装置的右视示意图;Fig. 3 is a schematic diagram of a right side view of a silicon wafer edge protection device;
图4是硅片边缘保护装置的直线摆动转化为圆周运动的矢量转化示意图;Fig. 4 is a vector conversion schematic diagram of converting the linear swing of the silicon wafer edge protection device into circular motion;
图5是硅片边缘保护装置的一个圆周运动转化为多个同步偏心运动示意图;Fig. 5 is a schematic diagram of converting one circular motion of the silicon wafer edge protection device into multiple synchronous eccentric motions;
图6是硅片边缘保护装置的多个同步偏心运动转化为同步径向运动示意图。Fig. 6 is a schematic diagram of converting multiple synchronous eccentric movements of the silicon wafer edge protection device into synchronous radial movements.
具体实施方式 Detailed ways
以下将结合附图对本发明的构思、具体结构及产生的技术效果作进一步说明,以充分地了解本发明的目的、特征和效果。The idea, specific structure and technical effects of the present invention will be further described below in conjunction with the accompanying drawings, so as to fully understand the purpose, features and effects of the present invention.
图1是硅片边缘保护装置的主视示意图。图2是硅片边缘保护装置的俯视示意图。图3是硅片边缘保护装置的右视示意图。请参考图1~图3。本实施例提供的硅片边缘保护装置30可用于操作保护环24,以在负胶工艺曝光过程中实现硅片边缘保护。在此,硅片边缘保护装置30可包括气缸1、内六角圆柱头螺钉2、调整压块3、吹气机构4、传感器5、短头螺钉6、防尘盖7、基座8、偏心凸轮盘9、钢球10、轴承11、调节底座12、轴承盖板13、小短头螺钉14、凸轮轴随动器15、四方螺母16、定心机构17、保护爪18、弹簧19、挡块20、线轨21、盖板22、导向螺杆23、轴承压板25、压盖螺钉26、调整垫圈27、钢珠28以及压盖29。然而,本发明对此不作任何限制。在其它实施例中,当硅片边缘保护装置30应用于其它不同场合取放不同物件时,其也可仅包括基座8、气缸1、偏心凸轮盘9、凸轮随动器15以及保护爪18。Fig. 1 is a schematic front view of a silicon wafer edge protection device. Fig. 2 is a schematic top view of a silicon wafer edge protection device. Fig. 3 is a schematic diagram of a right side view of a silicon wafer edge protection device. Please refer to Figure 1 to Figure 3. The silicon wafer edge protection device 30 provided in this embodiment can be used to operate the protection ring 24 to realize the silicon wafer edge protection during the exposure process of the negative resist process. Here, the silicon chip edge protection device 30 may include a cylinder 1, a hexagon socket head cap screw 2, an adjusting pressure block 3, an air blowing mechanism 4, a sensor 5, a short head screw 6, a dust cover 7, a base 8, and an eccentric cam Disk 9, steel ball 10, bearing 11, adjusting base 12, bearing cover plate 13, small short head screw 14, camshaft follower 15, square nut 16, centering mechanism 17, protective claw 18, spring 19, stopper 20. Line rail 21, cover plate 22, guide screw 23, bearing pressure plate 25, gland screw 26, adjustment washer 27, steel ball 28 and gland 29. However, the present invention does not impose any limitation thereto. In other embodiments, when the silicon wafer edge protection device 30 is applied to pick and place different objects in other different occasions, it may also only include the base 8, the cylinder 1, the eccentric cam disc 9, the cam follower 15 and the protection claw 18 .
在本实施例中,内六角圆柱头螺钉2、调整压块3以及调节底座12可实现硅片边缘保护装置30在水平面内沿上下方向上的位置调节。具体而言,调整压块3可固定于调节底座12,且调整压块3可具有沿水平面内上下方向延伸的长形贯孔。内六角圆柱头螺钉2可滑动地设置于此长形贯孔内,并固定于基座8,以带动其沿长形贯孔滑动,实现硅片边缘保护装置30在水平面内沿上下方向上的位置调节。然而,本发明对此不作任何限制。In this embodiment, the hexagon socket head cap screw 2 , the adjustment pressing block 3 and the adjustment base 12 can realize the position adjustment of the silicon wafer edge protection device 30 in the horizontal plane along the up and down direction. Specifically, the adjusting pressing block 3 can be fixed on the adjusting base 12 , and the adjusting pressing block 3 can have an elongated through hole extending along the vertical direction in the horizontal plane. The hexagon socket head cap screw 2 is slidably arranged in the elongated through hole, and is fixed on the base 8 to drive it to slide along the elongated through hole, so as to realize the upward and downward movement of the silicon chip edge protection device 30 in the horizontal plane. position adjustment. However, the present invention does not impose any limitation thereto.
在本实施例中,吹气机构4可设置于基座8。在此,吹气机构4可包括管路附件与气管。管路附件设置于基座8,基座8的下方有几个均匀分布的U型槽。气管在接收气体后会将其分配到基座8的U型槽中。在此,保护环24可设置于基座8的正下方。因此,保护环24的上方即会受到吹气机构4的气体力,使得保护环24易于与硅片边缘保护装置30分离。然而,本发明对此不作任何限制。In this embodiment, the blowing mechanism 4 can be disposed on the base 8 . Here, the blowing mechanism 4 may include pipeline accessories and air pipes. The pipeline accessories are arranged on the base 8, and there are several evenly distributed U-shaped grooves under the base 8. The gas pipe will distribute it to the U-shaped groove of the base 8 after receiving the gas. Here, the protection ring 24 can be disposed directly under the base 8 . Therefore, the upper part of the protective ring 24 is subjected to the gas force of the blowing mechanism 4 , so that the protective ring 24 is easily separated from the silicon wafer edge protection device 30 . However, the present invention does not impose any limitation thereto.
在本实施例中,传感器5设置于基座8。当保护爪18完成取放动作时,传感器5可检测保护环24是否到位。在保护环24到位后,硅片边缘保护装置30才可进行下一步动作。然而,本发明对此不作任何限制。In this embodiment, the sensor 5 is disposed on the base 8 . When the protection claw 18 completes the pick-and-place action, the sensor 5 can detect whether the protection ring 24 is in place. After the protection ring 24 is in place, the silicon wafer edge protection device 30 can proceed to the next step. However, the present invention does not impose any limitation thereto.
在本实施例中,气缸1具有固定端与活动端,固定端固定于基座8,活动端可作伸缩摆动。In this embodiment, the air cylinder 1 has a fixed end and a movable end, the fixed end is fixed on the base 8, and the movable end can perform telescopic swing.
在本实施例中,偏心凸轮盘9可为圆环形,圆环中具有至少三个均匀分布的偏心槽。偏心槽可为通槽或非通槽。在此,以具有三个为通槽形式的偏心槽为例进行说明,相邻偏心槽之间间隔120度。然而,本发明对此不作任何限制。在其它实施例中,为确保取放保护环24的可靠性,也可具有更多个的偏心槽。在此,每一个偏心槽还包括两个同心圆弧与一个偏心圆弧,两个同心圆弧分别连接于偏心圆弧的两端。两个同心圆弧的圆心与偏心凸轮盘9的圆心重合,而偏心圆弧的圆心与偏心凸轮盘9的圆心不一致,即与偏心凸轮盘9的圆心有一定的偏置量。然而,本发明对同心圆弧与偏心圆弧的数量不作任何限制。在其它实施例中,每一个偏心槽可仅具有一个偏心圆弧。In this embodiment, the eccentric cam disc 9 can be circular, and there are at least three evenly distributed eccentric grooves in the circular ring. The eccentric groove can be through groove or non-through groove. Here, three eccentric grooves in the form of through grooves are taken as an example for illustration, and the distance between adjacent eccentric grooves is 120 degrees. However, the present invention does not impose any limitation thereto. In other embodiments, in order to ensure the reliability of picking and placing the protection ring 24, there may also be more eccentric grooves. Here, each eccentric groove further includes two concentric arcs and one eccentric arc, and the two concentric arcs are respectively connected to two ends of the eccentric arc. The centers of the two concentric arcs coincide with the centers of the eccentric cam disc 9, but the centers of the eccentric arcs are inconsistent with the center of the eccentric cam disc 9, that is, there is a certain amount of offset from the center of the eccentric cam disc 9. However, the present invention does not impose any limitation on the number of concentric arcs and eccentric arcs. In other embodiments, each eccentric groove may only have one eccentric arc.
在本实施例中,偏心凸轮盘9可连接于气缸1的活动端,并可通过轴承11可转动地设置于基座8上,以起到减震和减小摩擦的作用。具体而言,偏心凸轮盘9的内圈可具有一个圆环型凹台面,用以安装轴承11。轴承盖板13与轴承压板25可设置于轴承11的上方。轴承11具有可相对运动的外环与内环。其中,轴承11的外环可与偏心凸轮盘9保持相对静止。在此,偏心凸轮盘9的上端面可设置多个螺纹孔,固定螺钉可依序穿过轴承压板25与轴承11的外环而固定于偏心凸轮盘9的螺纹孔内,以将轴承11的外环固定于偏心凸轮盘9。然而,本发明对此不作任何限制。在其它实施例中,可通过设置轴套或其它方式来使轴承11的外环与偏心凸轮盘9保持相对静止。另外,在本实施例中,轴承11的内环可与基座8保持相对静止。例如,可将轴承11的内环固定于基座8。然而,本发明对此也不作任何限制。在其它实施例中,也可通过设置轴套或其它方式来使轴承11的内环与基座8保持相对静止。此外,小短头螺钉14可用于将轴承盖板13固定于基座8,且与偏心凸轮盘9维持一定的距离,以使偏心凸轮盘9可相对于基座8在一定范围内浮起,以减小偏心凸轮盘9的摩擦力,确保运转的高效性。然而,本发明对此不作任何限制。另外,在本实施例中,偏心凸轮盘9的下端面内可设置钢球10。In this embodiment, the eccentric cam plate 9 can be connected to the movable end of the cylinder 1, and can be rotatably arranged on the base 8 through the bearing 11, so as to play the role of damping and reducing friction. Specifically, the inner ring of the eccentric cam disc 9 may have a circular concave table surface for mounting the bearing 11 . The bearing cover plate 13 and the bearing pressing plate 25 can be disposed above the bearing 11 . The bearing 11 has an outer ring and an inner ring that can move relatively. Wherein, the outer ring of the bearing 11 can keep relatively stationary with the eccentric cam disc 9 . Here, the upper end surface of the eccentric cam disc 9 can be provided with a plurality of threaded holes, and the fixing screws can be fixed in the threaded holes of the eccentric cam disc 9 through the bearing plate 25 and the outer ring of the bearing 11 in sequence, so that the bearing 11 The outer ring is fixed to the eccentric cam disc 9 . However, the present invention does not impose any limitation thereto. In other embodiments, the outer ring of the bearing 11 and the eccentric cam plate 9 can be kept relatively stationary by setting a shaft sleeve or other means. In addition, in this embodiment, the inner ring of the bearing 11 can keep relatively stationary with the base 8 . For example, the inner ring of the bearing 11 may be fixed to the base 8 . However, the present invention does not impose any limitation thereto. In other embodiments, the inner ring of the bearing 11 and the base 8 can also be kept relatively stationary by setting a shaft sleeve or other means. In addition, small short-head screws 14 can be used to fix the bearing cover plate 13 to the base 8, and maintain a certain distance from the eccentric cam plate 9, so that the eccentric cam plate 9 can float within a certain range relative to the base 8, To reduce the frictional force of the eccentric cam disc 9 to ensure the high efficiency of operation. However, the present invention does not impose any limitation thereto. In addition, in this embodiment, steel balls 10 may be arranged in the lower end surface of the eccentric cam disc 9 .
在本实施例中,凸轮随动器15的数目可为三个,可活动地分别与偏心凸轮盘9的三个偏心槽对应设置。然而,本发明对此不作任何限制,其可根据偏心凸轮盘9的偏心槽数目作对应调整。在此,当气缸1的活动端作伸缩摆动时,带动偏心凸轮盘9以轴承11的外圆柱面为滑动轴作圆周运动时,三个凸轮随动器15会作同步的径向运动。In this embodiment, there may be three cam followers 15 , which are movably arranged corresponding to the three eccentric grooves of the eccentric cam disc 9 . However, the present invention does not impose any limitation on this, and it can be adjusted according to the number of eccentric grooves of the eccentric cam disc 9 . Here, when the movable end of the cylinder 1 performs telescopic swing, the eccentric cam disc 9 is driven to perform circular motion with the outer cylindrical surface of the bearing 11 as the sliding axis, and the three cam followers 15 will perform synchronous radial motion.
在本实施例中,保护爪18的数目也可对应为三个,其分别与三个凸轮随动器15对应连接设置。每一个保护爪18可成C型,且其一端设置通孔,另一端为斜面或直面。然而,本发明对此不作任何限制,其可根据凸轮随动器15的数目作对应调整。在此,当三个凸轮随动器15作同步的径向运动时,会分别带动三个保护爪18作同步径向运动,从而实现保护环24的取放。In this embodiment, the number of protection claws 18 can also be three correspondingly, which are respectively connected and arranged correspondingly to the three cam followers 15 . Each protection claw 18 can be C-shaped, and one end is provided with a through hole, and the other end is inclined or straight. However, the present invention does not impose any limitation on this, and it can be adjusted according to the number of cam followers 15 . Here, when the three cam followers 15 make synchronous radial movements, they respectively drive the three protective claws 18 to make synchronous radial movements, so as to realize the pick-and-place of the protective ring 24 .
在本实施例中,弹簧19、挡块20以及导向螺杆23的数目也可分别对应为三个。然而,本发明对此不作任何限制,其可根据保护爪18的数目作对应调整。在此,三个挡块20均固定于基座8,三个导向螺杆23分别对应穿设于三个挡块20内,三个弹簧19分别对应套设于三个导向螺杆23上,且分别抵持于三个保护爪18。三个保护爪18可分别沿三个导向螺杆23作同步径向运动,弹簧19则会对保护爪18起缓冲和过载保护作用。然而,本发明对此不作任何限制。In this embodiment, the numbers of the springs 19 , the stoppers 20 and the lead screws 23 may also correspond to three respectively. However, the present invention does not impose any limitation on this, and it can be adjusted according to the number of the protection claws 18 . Here, the three stoppers 20 are all fixed on the base 8, the three guide screws 23 are correspondingly installed in the three stoppers 20, the three springs 19 are respectively sleeved on the three guide screws 23, and respectively Hold against three protective claws 18 . The three protection claws 18 can move synchronously and radially along the three lead screws 23 respectively, and the spring 19 can buffer and overload the protection claws 18 . However, the present invention does not impose any limitation thereto.
在本实施例中,线轨21的数目也可对应为三个,其分别对应设置于三个保护爪18上,并随三个保护爪18同步运动,以减小保护爪18的摩擦力。然而,本发明对此不作任何限制,线轨21的数目可根据保护爪18的数目作对应调整。具体而言,在本实施例中,线轨21的上端可通过螺钉固定于盖板22,即线轨21的上端相对于盖板22保持静止,而线轨21的下端则可固定至保护爪18,以和保护爪18保持相对静止。然而,本发明对此不作任何限制。In this embodiment, the number of wire rails 21 can also be three, which are respectively arranged on the three protection claws 18 and move synchronously with the three protection claws 18 to reduce the frictional force of the protection claws 18 . However, the present invention does not impose any limitation on this, and the number of wire rails 21 can be adjusted accordingly according to the number of protection claws 18 . Specifically, in this embodiment, the upper end of the wire rail 21 can be fixed to the cover plate 22 by screws, that is, the upper end of the wire rail 21 remains stationary relative to the cover plate 22, while the lower end of the wire rail 21 can be fixed to the protective claw 18, to keep relatively stationary with protection claw 18. However, the present invention does not impose any limitation thereto.
在本实施例中,定心机构17的数目也可对应为三个,其分别对应设置于三个保护爪18,并随三个保护爪18同步运动。然而,本发明对此不作任何限制,定心机构17可根据保护爪18的数目作对应调整。定心机构17可对保护环24起定心作用。随着三个定心机构17同时向保护环24中心移动使得原本偏心的保护环24可回归至中心位置。在此,定心机构17可为球头螺钉,其可通过四方螺母16固定至保护爪18一端的通孔内。然而,本发明对此不作任何限制。In this embodiment, the number of centering mechanisms 17 can also be three, which are respectively arranged on the three protection claws 18 and move synchronously with the three protection claws 18 . However, the present invention does not impose any limitation on this, and the centering mechanism 17 can be adjusted according to the number of the protection claws 18 . The centering mechanism 17 can center the protective ring 24 . As the three centering mechanisms 17 move toward the center of the protection ring 24 simultaneously, the original eccentric protection ring 24 can return to the center position. Here, the centering mechanism 17 can be a ball head screw, which can be fixed into a through hole at one end of the protection claw 18 through a square nut 16 . However, the present invention does not impose any limitation thereto.
在本实施例中,防尘盖7与调整垫圈27对齐后,压盖螺钉26可穿过防尘盖7与调整垫圈27而固定于基座8,以将防尘盖7固定于基座8并压合于偏心凸轮盘9的上方。在此,钢珠28设置于防尘盖7内,并通过短头螺钉6将压盖29固定于防尘盖7上方,并使压盖29压合钢珠28,以防止偏心凸轮盘9在水平方向倾斜,确保整个边缘保护装置30平稳运行。In this embodiment, after the dust cover 7 and the adjusting washer 27 are aligned, the gland screw 26 can pass through the dust cover 7 and the adjusting washer 27 and be fixed on the base 8 to fix the dust cover 7 to the base 8 And press fit on the top of the eccentric cam disc 9. Here, the steel ball 28 is arranged in the dustproof cover 7, and the gland 29 is fixed on the top of the dustproof cover 7 by the short head screw 6, and the gland 29 is pressed against the steel ball 28 to prevent the eccentric cam disc 9 from moving in the horizontal direction. Tilting ensures that the entire edge protector 30 runs smoothly.
以下将结合图4~图6对本发明较佳实施例提供的硅片边缘保护装置30的工作原理作详细说明。The working principle of the silicon wafer edge protection device 30 provided by the preferred embodiment of the present invention will be described in detail below with reference to FIGS. 4 to 6 .
图4是硅片边缘保护装置的直线摆动转化为圆周运动的矢量转化示意图。图5是硅片边缘保护装置的一个圆周运动转化为多个同步偏心运动示意图。图6是硅片边缘保护装置的多个同步偏心运动转化为同步径向运动示意图。请参考图4~图6。Fig. 4 is a schematic diagram of the vector conversion of the linear swing of the silicon wafer edge protection device into circular motion. Fig. 5 is a schematic diagram of converting one circular motion of the silicon wafer edge protection device into multiple synchronous eccentric motions. Fig. 6 is a schematic diagram of converting multiple synchronous eccentric movements of the silicon wafer edge protection device into synchronous radial movements. Please refer to Figure 4 to Figure 6.
在本实施例中,硅片边缘保护装置30的动作流程为:气缸1伸缩摆动——>偏心凸轮盘9动作——>凸轮随动器15动作——>保护爪18动作——>保护环24被抓起或放下。由此,可通过矢量转换形式完成将一种直线运动转化为多个等分同步径向运动的过程。具体而言,可包含如下三个步骤。In this embodiment, the action flow of the silicon wafer edge protection device 30 is: the telescopic swing of the cylinder 1 --> the action of the eccentric cam disc 9 --> the action of the cam follower 15 --> the action of the protection claw 18 --> the action of the protection ring 24 were picked up or put down. Thus, the process of transforming a linear motion into multiple equal-divided synchronous radial motions can be completed in the form of vector conversion. Specifically, the following three steps may be included.
第一步:直线摆动转化为圆周运动的矢量转化。The first step: the linear swing is converted into the vector conversion of circular motion.
如图4所示,硅片边缘保护装置30由气缸1绕C轴作小角度旋转并伸长或缩短运动。气缸1伸缩后长度由L1改变为L2。气缸1会带着偏心凸轮盘9作圆周运动,运动轨迹为B1到B2。偏心凸轮盘9带动轴承11的内圈作圆周运动。运动轨迹为B1到B2形成气缸1初始位置角Φ1,气缸1终止位置角Φ2,气缸1工作摆角 d为AC长度,r为AB的长度,L1为气缸1的原长,L2为气缸1伸出后的长度。就是直线摆动转化为圆周运动后气缸1在圆心A处的摆角,因气缸1在圆心A处的摆角与偏心凸轮盘9在圆心A处的摆角相同。因此,气缸1会带动偏心凸轮盘9作圆周运动,摆角为 As shown in FIG. 4 , the silicon wafer edge protection device 30 is rotated at a small angle around the C axis by the cylinder 1 and stretched or shortened. The length of cylinder 1 is changed from L1 to L2 after stretching. Cylinder 1 will move circularly with eccentric cam disc 9, and the motion track is B1 to B2. The eccentric cam disc 9 drives the inner ring of the bearing 11 to perform circular motion. The motion trajectory is from B1 to B2 to form the initial position angle Φ1 of cylinder 1, Cylinder 1 end position angle Φ2, Cylinder 1 working swing angle d is the length of AC, r is the length of AB, L1 is the original length of cylinder 1, and L2 is the extended length of cylinder 1. It is the swing angle of the cylinder 1 at the center A after the linear swing is converted into a circular motion, because the swing angle of the cylinder 1 at the center A is the same as the swing angle of the eccentric cam disc 9 at the center A. Therefore, the cylinder 1 will drive the eccentric cam disc 9 to make a circular motion, and the swing angle is
第二步:一个圆周运动转化为多个同步偏心运动。Step 2: One circular motion is transformed into multiple synchronous eccentric motions.
如图5与图6所示,偏心凸轮盘9的三个偏心槽圆心相对于直角坐标原点的坐标分别为o1(a1,b1),o2(a2,b2),o3(a3,b3)。在此,每个偏心槽有三段圆弧组成。当气缸1带着偏心凸轮盘9作圆周运动,摆角为时,三个偏心槽也会绕着圆心做圆周运动。As shown in Figure 5 and Figure 6, the coordinates of the centers of the three eccentric grooves of the eccentric cam disc 9 relative to the origin of the Cartesian coordinates are o1 (a1, b1), o2 (a2, b2), o3 (a3, b3). Here, each eccentric groove consists of three circular arcs. When the cylinder 1 makes a circular motion with the eccentric cam disc 9, the swing angle is , the three eccentric grooves will also make circular motion around the center of the circle.
因为三个偏心槽的D2<->D3圆弧槽是以o1,o2,o3为圆心的,相对于圆心是偏心的。当偏心凸轮盘9转动时,D2<->D3圆弧运动轨迹相对于圆心o就是渐开的曲线,其轨迹方程为 Because the D2<->D3 arc grooves of the three eccentric grooves are centered on o1, o2, and o3, which are eccentric relative to the center of the circle. When the eccentric cam disc 9 rotates, the arc movement trajectory of D2<->D3 is an involute curve relative to the center o, and its trajectory equation is
而D1<->D2圆弧槽是以o为圆心,半径为r1的圆弧槽,当偏心凸轮盘9转动时,D1<->D2圆弧槽是以o为圆心运动的圆弧轨迹曲线,其轨迹方程为ρ=r1,(117°≤θ≤122°)。The D1<->D2 arc groove is an arc groove with o as the center and a radius of r1. When the eccentric cam disc 9 rotates, the D1<->D2 arc groove is an arc trajectory curve with o as the center of the circle. , and its trajectory equation is ρ=r1, (117°≤θ≤122°).
而D3<->D4圆弧槽是以o为圆心,半径为r1的圆弧槽。当偏心凸轮盘9转动时,D3<->D4圆弧槽是以o为圆心运动的圆弧轨迹曲线,其轨迹方程为ρ=r2,(149°≤θ≤154°)。The arc groove of D3<->D4 is an arc groove with o as the center and radius r1. When the eccentric cam disc 9 rotates, the D3<->D4 arc groove is an arc track curve with o as the center of the circle, and its track equation is ρ=r2, (149°≤θ≤154°).
D1<->D4整个圆弧槽运动的轨迹就是以o为圆心的圆弧——>渐开——>圆弧的复合曲线。在此,因偏心凸轮盘9上有三个圆弧槽,当偏心凸轮盘9运动时,就会有三个圆弧槽运动轨迹。D1<->D4 The trajectory of the entire arc groove movement is the arc with o as the center --> involute --> the compound curve of the arc. Here, because there are three circular arc grooves on the eccentric cam disk 9, when the eccentric cam disk 9 moves, there will be three circular arc groove motion tracks.
因此,通过偏心凸轮盘9的三个或多个偏心槽可以使一个圆周运动转化为多个同步偏心运动。Therefore, one circular motion can be transformed into multiple synchronous eccentric motions through three or more eccentric grooves of the eccentric cam disc 9 .
第三步:多个同步偏心运动转化为同步径向运动。Step 3: Multiple synchronous eccentric movements are transformed into synchronous radial movements.
如图5所示,气缸1会带着偏心凸轮盘9作圆周运动,气缸1的运动轨迹为B1到B2,偏心凸轮盘9的偏心槽从D1位置运动到D4位置。并且,偏心凸轮盘9分别带动三个凸轮随动器15作径向运动,三个凸轮随动器15随之分别带动三个保护爪18作径向运动。因气缸1工作摆角转动多少,相应的偏心凸轮盘9就会转动多少,即气缸1工作摆角与偏心凸轮盘9是同步的。即气缸1工作摆角就是偏心凸轮盘9的旋转角度。由此可知偏心槽的任意点轨迹方程,也就是可知每一个偏心槽的轨迹,即可知气缸1工作摆角转动多少时,凸轮随动器15到圆心o的距离为ρ的变化值,同时可知三个凸轮随动器15任意时刻的坐标(x1,y1),(x2,y2),(x3,y3),其中x1=ρcos(θ1),y1=ρsin(θ1),x2=ρcos(θ1+120),y2=ρsin(θ1+120),x3=ρcos(θ1+240),y3=ρsin(θ1+240),过已知三点圆的直角坐标方程为As shown in Figure 5, the cylinder 1 will move in a circle with the eccentric cam disc 9, the movement track of the cylinder 1 is from B1 to B2, and the eccentric groove of the eccentric cam disc 9 moves from the position D1 to the position D4. Moreover, the eccentric cam disc 9 respectively drives the three cam followers 15 for radial movement, and the three cam followers 15 respectively drive the three protection pawls 18 for radial movement. Due to the working swing angle of cylinder 1 How much it rotates, how much the corresponding eccentric cam disc 9 will rotate, that is, the working swing angle of cylinder 1 It is synchronous with the eccentric cam disc 9. That is, the working swing angle of cylinder 1 Exactly the rotation angle of eccentric cam disc 9. From this, we can know the trajectory equation of any point of the eccentric groove, that is, we can know the trajectory of each eccentric groove, that is, we can know the working swing angle of cylinder 1 When how much it rotates, the distance from the cam follower 15 to the center o is the change value of ρ, and the coordinates (x1, y1), (x2, y2), (x3, y3) of the three cam followers 15 at any time can be known at the same time , where x1=ρcos(θ1), y1=ρsin(θ1), x2=ρcos(θ1+120), y2=ρsin(θ1+120), x3=ρcos(θ1+240), y3=ρsin(θ1+240 ), the Cartesian coordinate equation of the known three-point circle is
因此可知三个保护爪18作同步径向运动。Therefore, it can be seen that the three protective pawls 18 make synchronous radial movement.
综上所述,本发明较佳实施例提供的硅片边缘保护装置,气缸的伸缩摆动会带动偏心凸轮盘做圆周运动,此时矢量由直线摆动转化为轴向运动。同时,偏心凸轮盘的圆周运动会使得其上的三个偏心槽作同步偏心运动,从而使得三个凸轮随动器分别带动三个保护爪作同步径向运动,此时矢量由轴向运动转化为径向运动。因此,本发明可将一种直线位移转化为多个等分径向位移,以实现通过一个动力源来完成多个径向同步力。本发明提供的硅片边缘保护装置结构简单,摩擦力小,精度高,可靠性好,且同步性高。To sum up, in the silicon wafer edge protection device provided by the preferred embodiment of the present invention, the telescopic swing of the cylinder will drive the eccentric cam disc to make a circular motion, and the vector is converted from a linear swing to an axial motion. At the same time, the circular motion of the eccentric cam disk will make the three eccentric slots on it move synchronously, so that the three cam followers will respectively drive the three protective claws to make synchronous radial movement. At this time, the vector is converted from axial movement to radial movement. Therefore, the present invention can convert a linear displacement into multiple equally divided radial displacements, so as to realize multiple radial synchronous forces through one power source. The silicon chip edge protection device provided by the invention has the advantages of simple structure, small friction force, high precision, good reliability and high synchronization.
以上详细描述了本发明的较佳具体实施例。应当理解,本领域的普通技术无需创造性劳动就可以根据本发明的构思作出诸多修改和变化。因此,凡本技术领域中技术人员依本发明的构思在现有技术的基础上通过逻辑分析、推理或者有限的实验可以得到的技术方案,皆应在由权利要求书所确定的保护范围内。The preferred specific embodiments of the present invention have been described in detail above. It should be understood that those skilled in the art can make many modifications and changes according to the concept of the present invention without creative efforts. Therefore, all technical solutions that can be obtained by those skilled in the art based on the concept of the present invention through logical analysis, reasoning or limited experiments on the basis of the prior art shall be within the scope of protection defined by the claims.
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210041401.2A CN103293862B (en) | 2012-02-22 | 2012-02-22 | Silicon wafer edge protection device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210041401.2A CN103293862B (en) | 2012-02-22 | 2012-02-22 | Silicon wafer edge protection device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103293862A CN103293862A (en) | 2013-09-11 |
CN103293862B true CN103293862B (en) | 2015-04-15 |
Family
ID=49094985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210041401.2A Active CN103293862B (en) | 2012-02-22 | 2012-02-22 | Silicon wafer edge protection device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103293862B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103693585A (en) * | 2013-12-04 | 2014-04-02 | 镇江新区汇达机电科技有限公司 | Correction mechanism for displacement errors caused by synchronized lifting of sets of screw rods |
CN104749891B (en) * | 2013-12-27 | 2017-03-29 | 上海微电子装备有限公司 | A kind of silicon chip edge protection device of handgrip self-locking |
CN105807575B (en) * | 2014-12-30 | 2017-08-25 | 上海微电子装备有限公司 | A kind of silicon chip edge protection device |
CN106292192B (en) * | 2015-05-24 | 2019-07-23 | 上海微电子装备(集团)股份有限公司 | Silicon chip edge protection device and litho machine |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0396923A1 (en) * | 1989-05-08 | 1990-11-14 | Balzers Aktiengesellschaft | Elevating platform and conveyance method |
WO1999041022A1 (en) * | 1998-02-14 | 1999-08-19 | Strasbaugh | Accurate positioning of a wafer |
CN102012639A (en) * | 2009-09-04 | 2011-04-13 | 上海微电子装备有限公司 | Method and device for protecting silicon wafer edge |
CN102141735A (en) * | 2010-01-28 | 2011-08-03 | 上海微电子装备有限公司 | Silicon chip edge protection device and application method thereof |
-
2012
- 2012-02-22 CN CN201210041401.2A patent/CN103293862B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0396923A1 (en) * | 1989-05-08 | 1990-11-14 | Balzers Aktiengesellschaft | Elevating platform and conveyance method |
WO1999041022A1 (en) * | 1998-02-14 | 1999-08-19 | Strasbaugh | Accurate positioning of a wafer |
CN102012639A (en) * | 2009-09-04 | 2011-04-13 | 上海微电子装备有限公司 | Method and device for protecting silicon wafer edge |
CN102141735A (en) * | 2010-01-28 | 2011-08-03 | 上海微电子装备有限公司 | Silicon chip edge protection device and application method thereof |
Also Published As
Publication number | Publication date |
---|---|
CN103293862A (en) | 2013-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102141735B (en) | Silicon chip edge protection device and application method thereof | |
CN103293862B (en) | Silicon wafer edge protection device | |
CN100468212C (en) | Dual positioning exchange system | |
CN102012639A (en) | Method and device for protecting silicon wafer edge | |
CN101609193A (en) | A movable optical element adjustment and positioning device | |
CN104570622B (en) | Proximity type gap exposure workpiece table of photoetching machine | |
CN101571676A (en) | Photoetching machine wafer stage dual-stage switching system | |
CN117080143B (en) | A semiconductor positioning device | |
CN113917646B (en) | A three-degree-of-freedom fine-tuning device for a moving mirror | |
CN107818942B (en) | edge finder | |
CN102431281B (en) | Locating and clamping mechanism of screen printing machine | |
CN102200698A (en) | Cable stage of silicon wafer stage of photo-etching machine | |
CN104049337B (en) | In ultrahigh vacuum test cavity, optical path accurate regulates and conversion equipment | |
CN106249370B (en) | A kind of integral shaft is to precision micrometer adjustable device | |
CN106547063A (en) | A kind of movable lens adjustment mechanism | |
CN113410172A (en) | Die bonder | |
TWI704637B (en) | Pre-alignment device and method for warped sheet | |
CN101231471A (en) | A double-swapping system for silicon wafer stages of a lithography machine using a transitional receiving device | |
CN206348595U (en) | It is a kind of to be used for sucker positioner of the semiconductor without mask direct write exposure sources | |
CN105508822B (en) | A kind of camera lens clamping device | |
CN201181388Y (en) | Double-swapping device for silicon wafer stage of lithography machine with conveyor belt structure | |
CN105717750B (en) | The apparatus and method set for optical diffraction wheel rotation eyeglass station | |
CN102789144B (en) | Adjustment mechanism of lithography aligning system reference plate, and adjustment method thereof | |
CN221201140U (en) | Crystal expanding structure for wafer | |
CN100486413C (en) | Positioning platform for fully automatic lead-free tin oil imprinter based on flexible machine |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) Co.,Ltd. Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: SHANGHAI MICRO ELECTRONICS EQUIPMENT Co.,Ltd. |
|
CP01 | Change in the name or title of a patent holder | ||
TR01 | Transfer of patent right |
Effective date of registration: 20250710 Address after: 3 / F, building 19, building 8, No. 498, GuoShouJing Road, China (Shanghai) pilot Free Trade Zone, Pudong New Area, Shanghai, 201203 Patentee after: Shanghai Xinshang Microelectronics Technology Co.,Ltd. Country or region after: China Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) Co.,Ltd. Country or region before: China |