CN103132128B - A kind of stainless steel electrochemical polishing solution and using method - Google Patents
A kind of stainless steel electrochemical polishing solution and using method Download PDFInfo
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- CN103132128B CN103132128B CN201310061718.7A CN201310061718A CN103132128B CN 103132128 B CN103132128 B CN 103132128B CN 201310061718 A CN201310061718 A CN 201310061718A CN 103132128 B CN103132128 B CN 103132128B
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- 238000005498 polishing Methods 0.000 title claims abstract description 91
- 229910001220 stainless steel Inorganic materials 0.000 title claims abstract description 23
- 239000010935 stainless steel Substances 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000000243 solution Substances 0.000 claims abstract description 55
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 50
- 239000002253 acid Substances 0.000 claims abstract description 32
- IMQLKJBTEOYOSI-GPIVLXJGSA-N Inositol-hexakisphosphate Chemical compound OP(O)(=O)O[C@H]1[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@@H]1OP(O)(O)=O IMQLKJBTEOYOSI-GPIVLXJGSA-N 0.000 claims abstract description 25
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 25
- 235000011007 phosphoric acid Nutrition 0.000 claims abstract description 25
- 235000002949 phytic acid Nutrition 0.000 claims abstract description 25
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000000654 additive Substances 0.000 claims abstract description 17
- 238000007517 polishing process Methods 0.000 claims abstract description 17
- IMQLKJBTEOYOSI-UHFFFAOYSA-N Phytic acid Natural products OP(O)(=O)OC1C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C1OP(O)(O)=O IMQLKJBTEOYOSI-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000000467 phytic acid Substances 0.000 claims abstract description 16
- 229940068041 phytic acid Drugs 0.000 claims abstract description 16
- 239000007864 aqueous solution Substances 0.000 claims abstract description 13
- 239000002131 composite material Substances 0.000 claims abstract description 13
- 235000011187 glycerol Nutrition 0.000 claims abstract description 12
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229940081974 saccharin Drugs 0.000 claims abstract description 12
- 235000019204 saccharin Nutrition 0.000 claims abstract description 12
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims abstract description 12
- 230000000996 additive effect Effects 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000003756 stirring Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 abstract description 2
- 238000005406 washing Methods 0.000 description 9
- 238000001556 precipitation Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- -1 iron ions Chemical class 0.000 description 5
- 239000003082 abrasive agent Substances 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910001430 chromium ion Inorganic materials 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
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Abstract
本发明属于不锈钢表面加工领域，是一种不锈钢电化学抛光溶液及使用方法。本发明抛光溶液由混合酸和复合添加剂组成，混合酸为磷酸和植酸组成水溶液，各组分的质量组成为，水:植酸:磷酸=1:1:10~1:1:5；复合添加为甘油、糖精和磷酸组成的水溶液，各组分的体积浓度为：甘油200-300g/L、糖精50-60g/L、磷酸50-100g/L；在1000mL混合酸溶液中，添加30-50mL复合添加剂，搅拌均匀得到电化学抛光溶液。本发明电化学抛光溶液使用时，抛光工艺参数为：温度50-80℃，电压8-20V，电流密度0.5-80A/dm2，平均抛光时间0.5-30min/dm2。该抛光溶液具有电流密度范围大、适合不同材质不锈钢、工艺简单、操作方便、抛光效率高等优点，可以实现大型不锈钢设备内外壁的连续电化学抛光处理，抛光溶液用量少，电源设备负荷小。The invention belongs to the field of stainless steel surface processing, and relates to a stainless steel electrochemical polishing solution and a use method. The polishing solution of the present invention is made up of mixed acid and composite additive, and mixed acid is phosphoric acid and phytic acid to form aqueous solution, and the quality of each component is made up of, water: phytic acid: phosphoric acid=1:1:10～1:1:5; Composite Added as an aqueous solution composed of glycerin, saccharin and phosphoric acid, the volume concentration of each component is: glycerin 200-300g/L, saccharin 50-60g/L, phosphoric acid 50-100g/L; in 1000mL mixed acid solution, add 30- 50mL of composite additives, stirred evenly to obtain an electrochemical polishing solution. When the electrochemical polishing solution of the present invention is used, the polishing process parameters are: temperature 50-80°C, voltage 8-20V, current density 0.5-80A/dm 2 , and average polishing time 0.5-30min/dm 2 . The polishing solution has the advantages of large current density range, suitable for stainless steel of different materials, simple process, convenient operation, high polishing efficiency, etc., and can realize continuous electrochemical polishing treatment of the inner and outer walls of large stainless steel equipment, with less polishing solution consumption and less power equipment load.
Description
技术领域technical field
本发明属于不锈钢表面加工领域，特别是涉及一种快速不锈钢电化学抛光溶液及其使用方法。The invention belongs to the field of stainless steel surface processing, in particular to a fast stainless steel electrochemical polishing solution and its application method.
背景技术Background technique
不锈钢抛光分为机械抛光、化学抛光和电化学抛光，电化学抛光是在化学抛光基础上发展起来的，电化学抛光适合于不锈钢制品的精饰处理。与化学抛光溶液相比，电化学抛光溶液的组成简单、不含硝酸、氢氟酸和盐酸等，抛光温度低，不产生氮氧化物和挥发性酸，对环境污染低，缺点是一次性设备投资大和抛光成本高。现有电化学抛光溶液主要由硫酸、磷酸和铬酐组成，存在问题是六价铬污染环境，溶液稳定性差，废液处理和回收困难，废沉渣严重污染环境。为了降低电化学抛光成本，首先采用人工或机械抛方法进行进行预抛光，然后再进行电化学抛光处理。申请号为97106050.9的中国专利公开了一种不锈钢抛光液，此溶液仅适合于小电流密度慢速抛光处理，抛光效率低；申请号为200920231300.5的中国专利公开了一种高精度抛光装置，适合于小工件精饰抛光处理，不适用于大件快速抛光处理；申请号为201220128785.7的中国专利公开了一种电化学、机械复合抛光装置，虽然可以用于大电流密度进行快速抛光处理，但不足之处是所用抛光溶液稳定性差和溶液调整困难。Stainless steel polishing is divided into mechanical polishing, chemical polishing and electrochemical polishing. Electrochemical polishing is developed on the basis of chemical polishing. Electrochemical polishing is suitable for finishing treatment of stainless steel products. Compared with chemical polishing solution, electrochemical polishing solution has simple composition, does not contain nitric acid, hydrofluoric acid and hydrochloric acid, etc., has low polishing temperature, does not produce nitrogen oxides and volatile acids, and has low environmental pollution. The disadvantage is disposable equipment Large investment and high polishing cost. The existing electrochemical polishing solution is mainly composed of sulfuric acid, phosphoric acid and chromic anhydride. The problems are that hexavalent chromium pollutes the environment, the solution stability is poor, waste liquid treatment and recovery are difficult, and waste sediment seriously pollutes the environment. In order to reduce the cost of electrochemical polishing, manual or mechanical polishing is firstly used for pre-polishing, and then electrochemical polishing is performed. The Chinese patent application number 97106050.9 discloses a stainless steel polishing solution, which is only suitable for low current density and slow polishing, and the polishing efficiency is low; the Chinese patent application number 200920231300.5 discloses a high-precision polishing device, which is suitable for Fine polishing of small workpieces is not suitable for rapid polishing of large workpieces; Chinese patent application number 201220128785.7 discloses an electrochemical and mechanical composite polishing device, although it can be used for rapid polishing with high current density, it is not enough The disadvantages are the poor stability of the polishing solution used and the difficulty in adjusting the solution.
发明内容Contents of the invention
本发明的目的在于克服上述现有技术的不足，提供一种工艺简单、抛光效率高、溶液稳定性好的不锈钢电化学抛光溶液及使用方法。The object of the present invention is to overcome the shortcomings of the above-mentioned prior art, and provide a stainless steel electrochemical polishing solution with simple process, high polishing efficiency and good solution stability and its use method.
本发明是通过以下方式实现的：The present invention is achieved in the following ways:
一种不锈钢电化学抛光溶液，由混合酸和复合添加剂组成，其特征是混合酸为磷酸和植酸的水溶液，混合酸中各组分的质量百分比为，水：植酸：磷酸=1:1:10~1:1:5；复合添加剂为甘油、糖精和磷酸组成的水溶液，各组分的体积浓度为：甘油200-300g/L、糖精50-60g/L、磷酸50-150g/L；按在1000mL混合酸溶液中，添加30-50mL复合添加剂的比例，搅拌均匀得到电化学抛光溶液。A stainless steel electrochemical polishing solution, which is composed of a mixed acid and a composite additive, is characterized in that the mixed acid is an aqueous solution of phosphoric acid and phytic acid, and the mass percentage of each component in the mixed acid is, water:phytic acid:phosphoric acid=1:1 :10~1:1:5; the composite additive is an aqueous solution composed of glycerin, saccharin and phosphoric acid, and the volume concentration of each component is: glycerin 200-300g/L, saccharin 50-60g/L, phosphoric acid 50-150g/L; According to the ratio of adding 30-50mL composite additives to 1000mL mixed acid solution, stirring evenly to obtain an electrochemical polishing solution.
上述不锈钢电化学抛光溶液的使用方法，其特征是电化学抛光工艺参数为：温度50-80℃，电压8-20V，电流密度0.5-80A/dm2，平均抛光时间0.5-30min/dm2。抛光电流密度和平均抛光时间取决于基体表面粗糙度和对抛光质量的具体要求。电化学抛光工艺流程：工件→表面处理→除油→水洗→除氧化皮→水洗→抛光→水洗→中和→水洗→干燥→制品。表面处理包括倒角、去除焊渣、补焊孔和预抛光处理等，中和采用0.5-1.5%碳酸钠水溶液。The method for using the stainless steel electrochemical polishing solution is characterized in that the electrochemical polishing process parameters are: temperature 50-80°C, voltage 8-20V, current density 0.5-80A/dm2, and average polishing time 0.5-30min/dm2. The polishing current density and average polishing time depend on the surface roughness of the substrate and the specific requirements for polishing quality. Electrochemical polishing process: workpiece → surface treatment → degreasing → washing → descaling → washing → polishing → washing → neutralization → washing → drying → finished product. Surface treatment includes chamfering, removing welding slag, repairing welding holes and pre-polishing treatment, etc., neutralize with 0.5-1.5% sodium carbonate aqueous solution.
电化学抛光溶液维护：电化学抛光过程中，阳极发生不锈钢溶解而形成铁离子、镍离子和铬离子，并析出少量氧气，阴极发生氢离子还原而析出氢气；随着电化学抛光过程进行，抛光溶液中铁离子、镍离子和铬离子浓度不断提高，氢离子浓度降低导致游离植酸根离子浓度提高，继而形成植酸盐沉淀；随着植酸盐沉淀形成，植酸浓度降低，影响抛光效果，需及时补加植酸以维持电化学抛光继续进行。Electrochemical polishing solution maintenance: During the electrochemical polishing process, the anode dissolves stainless steel to form iron ions, nickel ions and chromium ions, and a small amount of oxygen is precipitated, and hydrogen ions are reduced to precipitate hydrogen gas at the cathode; as the electrochemical polishing process progresses, the polishing The concentration of iron ions, nickel ions and chromium ions in the solution increases continuously, and the concentration of hydrogen ions decreases, which leads to an increase in the concentration of free phytate ions, and then forms phytate precipitation; with the formation of phytate precipitation, the concentration of phytic acid decreases, which affects the polishing effect. Add phytic acid in time to keep the electrochemical polishing going on.
植酸盐沉淀处理：电化学抛光溶液中沉淀过多也会影响抛光质量，应及时过滤植酸盐沉淀，植酸盐沉淀经过洗涤纯化后用于金属表面预处理剂，替代传统钢铁磷化和钝化处理，从而得到有效利用，避免对环境产生二次污染。Phytate precipitation treatment: Too much precipitation in the electrochemical polishing solution will also affect the polishing quality. The phytate precipitation should be filtered in time. After washing and purification, the phytate precipitation can be used as a metal surface pretreatment agent to replace traditional steel phosphating and passivation treatment, so as to be effectively used and avoid secondary pollution to the environment.
在上述电化学抛光工艺中，将电化学抛光溶液加热至所需温度即可进行抛光处理，抛光过程为放热过程，抛光过程中需要冷却；对于大型设备的电化学抛光，可以采用抛光液浸没部分抛光面、被抛光工件阳极与辅助阴极做相对运动实现局部大电流密度连续抛光；辅助阴极采用铅，提高辅助阴极的强度采用不锈钢材料包覆铅，采用与被抛光面结构对称的辅助阴极使电流分布均匀达到均匀抛光，用耐酸滤布包覆辅助阴极可以减小与工件阳极的距离、降低溶液电阻和降低能耗，在抛光液中添加耐酸磨料通过辅助阳极与抛光面压力产生的摩擦进一步提高抛光速度和抛光效果。In the above-mentioned electrochemical polishing process, the electrochemical polishing solution can be heated to the required temperature for polishing. The polishing process is an exothermic process, and cooling is required during the polishing process; for electrochemical polishing of large equipment, the polishing solution can be used to immerse Part of the polished surface, the anode of the workpiece to be polished and the auxiliary cathode do relative movement to achieve continuous polishing with a local high current density; the auxiliary cathode uses lead to improve the strength of the auxiliary cathode. Uniform current distribution achieves uniform polishing. Coating the auxiliary cathode with acid-resistant filter cloth can reduce the distance from the anode of the workpiece, reduce the solution resistance and reduce energy consumption. Adding acid-resistant abrasives to the polishing solution further improves the friction through the pressure of the auxiliary anode and the polishing surface. Improve polishing speed and polishing effect.
与现有电化学抛光溶液相比，该发明抛光溶液的优点在于：1）植酸与不锈钢基体表面形成稳定的吸附络合物，与难溶性磷酸盐膜形成协同效应，有效阻止不锈钢的化学溶解和腐蚀；2）植酸为强酸，导电能力强，可以提高电流密度，实现快速电化学抛光处理；3）抛光过程形成难溶性植酸盐沉淀，容易过滤和调整溶液，抛光溶液稳定性高；4）溶液不含六价铬和植酸盐沉淀可以有效利用，避免抛光溶液对环境的二次污染；5）电流密度范围大，可以适合不同材质不锈钢的表面抛光处理；6）工艺简单、操作方便和抛光效率高；7）对大型不锈钢设备连续抛光，可以减少抛光溶液的用量和降低电源设备负荷。Compared with the existing electrochemical polishing solution, the advantages of the inventive polishing solution are: 1) Phytic acid forms a stable adsorption complex with the surface of the stainless steel substrate, forms a synergistic effect with the insoluble phosphate film, and effectively prevents the chemical dissolution of stainless steel 2) Phytic acid is a strong acid with strong electrical conductivity, which can increase the current density and realize fast electrochemical polishing; 3) Insoluble phytate precipitates are formed during the polishing process, which is easy to filter and adjust the solution, and the polishing solution has high stability; 4) The solution does not contain hexavalent chromium and phytate precipitation can be effectively used to avoid secondary pollution of the polishing solution to the environment; 5) The current density range is large, which can be suitable for surface polishing of stainless steel of different materials; 6) The process is simple and easy to operate Convenience and high polishing efficiency; 7) Continuous polishing of large stainless steel equipment can reduce the amount of polishing solution and reduce the load of power equipment.
具体实施方式detailed description
下面给出本发明的三个最佳实施例：Three preferred embodiments of the present invention are given below:
实施例1Example 1
一种不锈钢电化学抛光溶液及使用方法。电化学抛光溶液由混合酸和复合添加剂组成，混合酸为磷酸和植酸的水溶液，混合酸中各组分的质量百分比为，水：植酸：磷酸（质量）=1:1:10；复合添加剂为甘油、糖精和磷酸组成的水溶液，各组分的体积浓度为：甘油300g/L、糖精60g/L、磷酸50g/L；在1000mL混合酸溶液中，添加50mL复合添加剂，搅拌均匀得到电化学抛光溶液。电化学抛光工艺参数为：温度80℃，电压20V，电流密度80A/dm2，平均抛光时间0.5min/dm2。电化学抛光工艺流程：工件→表面处理→除油→水洗→除氧化皮→水洗→抛光→水洗→中和→水洗→干燥→制品。在上述电化学抛光过程中，配置溶液冷却、加热、过滤和循环系统，及时补加植酸和过滤植酸盐沉淀，以维持电化学抛光继续进行。采用铅辅助阴极并用耐酸滤布包覆，在抛光液中添加耐酸磨料。A stainless steel electrochemical polishing solution and a use method thereof. The electrochemical polishing solution is composed of a mixed acid and a composite additive. The mixed acid is an aqueous solution of phosphoric acid and phytic acid. The mass percentage of each component in the mixed acid is, water: phytic acid: phosphoric acid (mass) = 1:1:10; The additive is an aqueous solution composed of glycerin, saccharin and phosphoric acid, and the volume concentration of each component is: glycerin 300g/L, saccharin 60g/L, phosphoric acid 50g/L; in 1000mL of mixed acid solution, add 50mL of compound additives, stir evenly to obtain electric Chemical polishing solution. The parameters of the electrochemical polishing process are: temperature 80°C, voltage 20V, current density 80A/dm 2 , and average polishing time 0.5min/dm 2 . Electrochemical polishing process: workpiece → surface treatment → degreasing → washing → descaling → washing → polishing → washing → neutralization → washing → drying → finished product. During the above electrochemical polishing process, configure solution cooling, heating, filtering and circulation systems, add phytic acid and filter phytate precipitates in time, so as to maintain the continuous electrochemical polishing. A lead-assisted cathode is used and covered with an acid-resistant filter cloth, and acid-resistant abrasives are added to the polishing solution.
实施例2Example 2
电化学抛光溶液由混合酸和复合添加剂组成，混合酸为磷酸和植酸的水溶液，混合酸中各组分的质量百分比为，水：植酸：磷酸（质量）=1:1:5；复合添加剂为甘油、糖精和磷酸组成的水溶液，各组分的体积浓度为：甘油200g/L、糖精50g/L、磷酸150g/L；在1000mL混合酸溶液中，添加30mL复合添加剂，搅拌均匀得到电化学抛光溶液。电化学抛光工艺参数为：温度70℃，电压8V，电流密度0.5A/dm2，平均抛光时间30min/dm2。采用不锈钢材料，依次包覆铅和耐酸滤布，在抛光液中添加耐酸磨料，阴极加压。抛光工艺流程和溶液维护同实施例1。The electrochemical polishing solution is composed of a mixed acid and a composite additive. The mixed acid is an aqueous solution of phosphoric acid and phytic acid. The mass percentage of each component in the mixed acid is, water: phytic acid: phosphoric acid (mass) = 1:1:5; The additive is an aqueous solution composed of glycerin, saccharin and phosphoric acid, and the volume concentration of each component is: glycerin 200g/L, saccharin 50g/L, phosphoric acid 150g/L; in 1000mL of mixed acid solution, add 30mL of compound additives, stir evenly to obtain electric Chemical polishing solution. Electrochemical polishing process parameters are: temperature 70°C, voltage 8V, current density 0.5A/dm 2 , and average polishing time 30min/dm 2 . Stainless steel is used to cover lead and acid-resistant filter cloth in turn, acid-resistant abrasives are added to the polishing solution, and the cathode is pressurized. The polishing process flow and solution maintenance are the same as in Example 1.
实施例3Example 3
电化学抛光溶液由混合酸和复合添加剂组成，混合酸为磷酸和植酸的水溶液，混合酸中各组分的质量百分比为，水：植酸：磷酸（质量）=1:1:8；复合添加剂为甘油、糖精和磷酸组成的水溶液，各组分的体积浓度为：甘油250g/L、糖精55g/L、磷酸100g/L；在1000mL混合酸溶液中，添加40mL复合添加剂，搅拌均匀得到电化学抛光溶液。电化学抛光工艺参数为：温度60℃，电压12V，电流密度20A/dm2，平均抛光时间5min/dm2。采用不锈钢材料，依次包覆铅和耐酸滤布，在抛光液中添加耐酸磨料，阴极加压。抛光工艺流程和溶液维护同实施例1。The electrochemical polishing solution is composed of a mixed acid and a composite additive. The mixed acid is an aqueous solution of phosphoric acid and phytic acid. The mass percentage of each component in the mixed acid is, water: phytic acid: phosphoric acid (mass) = 1:1:8; The additive is an aqueous solution composed of glycerin, saccharin and phosphoric acid, and the volume concentration of each component is: glycerin 250g/L, saccharin 55g/L, phosphoric acid 100g/L; in 1000mL of mixed acid solution, add 40mL of compound additives, stir evenly to obtain the Chemical polishing solution. The parameters of the electrochemical polishing process are: temperature 60°C, voltage 12V, current density 20A/dm 2 , and average polishing time 5 min/dm 2 . Stainless steel is used to cover lead and acid-resistant filter cloth in turn, acid-resistant abrasives are added to the polishing solution, and the cathode is pressurized. The polishing process flow and solution maintenance are the same as in Example 1.
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| CN1746253A (en) * | 2004-09-09 | 2006-03-15 | 福吉米株式会社 | Polishing composition and polishing method using the same |
| CN1908248A (en) * | 2006-07-26 | 2007-02-07 | 沈阳工业大学 | Precision polishing technique for stainless steel printed circuit board |
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| CN1746253A (en) * | 2004-09-09 | 2006-03-15 | 福吉米株式会社 | Polishing composition and polishing method using the same |
| CN1908248A (en) * | 2006-07-26 | 2007-02-07 | 沈阳工业大学 | Precision polishing technique for stainless steel printed circuit board |
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| 不锈钢电抛光技术;姚颖悟等;《电镀与精饰》;20100531;第32卷(第5期);1.2溶液配方及操作条件、2.1至2.4 * |
| 不锈钢表面抛光技术的研究进展;王玥等;《电镀与环保》;20120331;第32卷(第2期);第2页右栏最后一段 * |
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