CN103093811A - Flash memory current limiting device and flash memory using the device - Google Patents
Flash memory current limiting device and flash memory using the device Download PDFInfo
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Abstract
Description
技术领域 technical field
本发明涉及微电子行业存储器技术领域,尤其涉及一种快闪存储器限流装置及应用该装置的快闪存储器。The invention relates to the technical field of memory in the microelectronics industry, in particular to a flash memory current limiting device and a flash memory using the device.
背景技术 Background technique
一般来说,在快闪存储单元的源极、漏极和控制栅极施加适当的电压,电荷就会被储存或者被移除,因此数据就可以以这种电荷的形式存储在存储单元中或自存储单元擦除。电荷在浮动栅极上的出现或消失,决定当存储单元被选择时,电流是否在源极和漏极区域之间流动。通过判断存储单元中源极和漏极区域之间电流的大小,来区分存储的内容是“0”还是“1”。典型地,快闪存储单元在阵列中的位线连接任一特定行的存储单元的漏极,而字线连接任一特定列的存储单元的栅极。每一个存储单元的源极通常会接地。Generally speaking, by applying appropriate voltages to the source, drain and control gate of the flash memory cell, the charge will be stored or removed, so data can be stored or stored in the memory cell in the form of this charge. Erased from the memory cell. The presence or absence of charge on the floating gate determines whether current flows between the source and drain regions when the memory cell is selected. By judging the magnitude of the current between the source and drain regions in the memory cell, it is possible to distinguish whether the stored content is "0" or "1". Typically, the bit lines of the flash memory cells in the array are connected to the drains of the memory cells in any specific row, and the word lines are connected to the gates of the memory cells in any specific column. The source of each memory cell is usually connected to ground.
快闪存储器不仅仅只具有读取的功能,还有编程和擦除的功能。完成这些操作就需要对存储阵列中被选择的存储单元所在行对应的位线,施加一个相当高的电压。此外,被选择的存储单元所在行连接的字线,也会被施加一个高压电。其漏极和栅极,被施加高电压产生电流用来产生电荷。然而在进行这些操作模式时,与被选择的存储单元位于同一行而未被选择的存储单元的漏极,也会接受到高电压位线的电位,进而造成关闭时的电流或漏电流可能会在这些未被选择的存储单元的源极和漏极之间流动。虽然单个存储单元的漏电流可能极小,但每一个未被选择的存储单元的漏电流总和,可能会接近甚至超过被选择的存储单元中的电流,导致器件损坏。存储系统加限流装置可以使漏电流总和不超过设定值,不至于器件损坏。但是现在很多存储系统都没有加上限流的方案,或者只在制作器件时加入电流限制方案,或者将电流限制方案集成在器件阵列中。Flash memory not only has the function of reading, but also the function of programming and erasing. To complete these operations, it is necessary to apply a relatively high voltage to the bit line corresponding to the row of the selected memory cell in the memory array. In addition, the word line connected to the row where the selected memory cell is located will also be applied with a high voltage. Its drain and gate are applied with high voltage to generate current to generate charge. However, when performing these operation modes, the drains of the unselected memory cells located in the same row as the selected memory cells will also receive the potential of the high voltage bit line, and the current or leakage current at the time of shutdown may be reduced. flows between the source and drain of these unselected memory cells. Although the leakage current of a single memory cell may be extremely small, the sum of the leakage currents of each unselected memory cell may approach or even exceed the current in the selected memory cell, resulting in device damage. Adding a current limiting device to the storage system can make the sum of the leakage current not exceed the set value, so that the device will not be damaged. But now many storage systems do not have a current limiting solution, or only add a current limiting solution when making devices, or integrate the current limiting solution in the device array.
图1为现有技术快闪存储器限流方案的结构示意图。如图1所示,100为存储单元阵列,101为起限流作用的PMOS传输管(MP),其中,PMOS传输管(MP)101的源端连接可调电压VHB,其栅端连接至一个固定的电压V0上,衬底电压接VPP,PMOS传输管(MP)101的漏端连接至存储单元阵列100的阵列源线104。传统限流方案是通过改变位线上的电压VHB,再给一个合适的电压V0来限制电流的大小。但是V0的改变会造成PMOS传输管(MP)的阈值电压的浮动,从而使限流不能精确达到设定值。FIG. 1 is a schematic structural diagram of a current limiting scheme for a flash memory in the prior art. As shown in FIG. 1 , 100 is a memory cell array, and 101 is a PMOS transmission transistor (MP) that acts as a current limiter, wherein, the source terminal of the PMOS transmission transistor (MP) 101 is connected to the adjustable voltage VHB, and its gate terminal is connected to a On a fixed voltage V0 , the substrate voltage is connected to VPP, and the drain end of the PMOS transfer transistor (MP) 101 is connected to the array source line 104 of the
图2为现有技术使用限流装置,来操作快闪存储器阵列中的单个存储单元的结构示意图。如图2所示,快闪存储器装置包含存储单元阵列100。每个存储单元典型地含有源极,漏极和栅极。阵列100更包含多条位线102,例如BL0,BL1,…BLm,以及多条字线103,例如字线WL0,WL1,…WLn。位线BL0-BLm与位线驱动电路105连接,字线WL0-WLn与字线驱动电路106连接,高压系统107为位线驱动电路105,字线驱动电路106和限流装置108提供存储单元操作时所需要的电压。高压系统107产生的电压连接至字线驱动电路和位线驱动电路的电源信号端,通过字线和位线选择高压系统107产生的电压应用在一条或者多条位线BL0-BLm。存储阵列100的源线104连接在一起,限流装置108连接在阵列源线104与地之间。FIG. 2 is a structural diagram of using a current limiting device to operate a single memory cell in a flash memory array in the prior art. As shown in FIG. 2 , the flash memory device includes a
图3为图2中存储单元阵列100的示意图。如图3所示,阵列100含有安排在列与行的多个存储单元115。其中字线WL0,WL1,…WLn一共有n+1行,以及位线BL0,BL1,…BLm一共m+1列。存储单元中115和116各自的漏极耦接在一起,连接至位线BL0。以同样的方法连接其它列的存储单元,形成字线BL1-BLm,其中所有存储单元的源极是连接在一起的。FIG. 3 is a schematic diagram of the
在图3中,单元115为被选择作程序化的存储单元。施加较高偏压至位线BL0和字线WL0,以及施加较低电压至未被选择字线WL1-WLn的和位线BL1-BLm,来操作被选择的单元115。这些偏压可为,例如,10V,5V,0V,0V,分别施加在字线WL0、位线BL0、WL1-WLn、BL1-BLm。如图3所示,由高压系统107传输相应电压到字线驱动电路106和位线驱动电路105,再由字线驱动电路106和位线驱动电路105分别施加于字线WL0-WLn,位线BL0-BLm。在操作模式下,字线WL0提供电压给被选择的单元115的控制栅极,以及和WL0连接但未被选择的存储单元的栅极,以促进电子注入选择的存储单元115。In FIG. 3, cell 115 is the memory cell selected for programming. The selected cell 115 is operated by applying a higher bias voltage to bit line BL0 and word line WL0 and a lower voltage to unselected word lines WL1-WLn and bit lines BL1-BLm. These bias voltages can be, for example, 10V, 5V, 0V, 0V applied to word line WL0, bit line BL0, WL1-WLn, BL1-BLm, respectively. As shown in Figure 3, the high-
例如5V偏压到位线BL0,10V偏压到字线WL0,作为操作单元115所需的电压。既然未被选择的单元的漏极,均与被选择的单元115的漏极连接,那些未被选择的单元116在它们各自的漏极也会被接收到位线BL0的电压。施加于未被选择的存储单元116各自漏极的位电压,增加了未被选择的存储单元116中每一个单元的漏极至源极电压,这个漏极至源极电压的值会增加未被选择的单元116的漏电流。但依据所述具体实施例,限流装置108,便可以限流此漏电流的大小。如图3所示,随着漏极到源极电压的施加,未被选择的存储单元116中的每一单元产生漏电流Ioff,其自漏极流入,并从每一个未被选择的存储单元116的源极流出。这些Ioff电流的总和,以及流经被选择的单元115的漏电流,一起通过阵列源线104。阵列源线104再通过限流装置108,从而限制了漏电流的总和,使其不超过所期望的预设值。For example, 5V is biased to the bit line BL0 , and 10V is biased to the word line WL0 as the voltage required to operate the unit 115 . Since the drains of the unselected cells are connected to the drain of the selected cell 115, those unselected cells 116 also receive the voltage of the bit line BL0 at their respective drains. The bit voltage applied to the respective drains of the unselected memory cells 116 increases the drain-to-source voltage of each of the unselected memory cells 116, and the value of this drain-to-source voltage increases the value of the unselected memory cells 116. Selected cell 116 leakage current. However, according to the specific embodiment, the current
在实现本发明的过程中,申请人意识到现有技术存在如下缺陷:1、现有技术的限流装置集成在阵列当中,占用了大量的面积;2、现有的限流装置受温度等外界条件影响,造成限流不精确。In the process of realizing the present invention, the applicant realized that the prior art has the following defects: 1. The current limiting device of the prior art is integrated in the array, occupying a large area; 2. The existing current limiting device is affected by temperature, etc. Influenced by external conditions, resulting in inaccurate current limiting.
发明内容 Contents of the invention
(一)要解决的技术问题(1) Technical problems to be solved
为解决上述的一个或多个问题,本发明提供了一种快闪存储器限流装置及应用该装置的快闪存储器,以节约存储阵列的面积,使限流能够精确达到设定值。In order to solve one or more of the above problems, the present invention provides a flash memory current limiting device and a flash memory using the device, so as to save the area of the storage array and enable the current limiting to accurately reach the set value.
(二)技术方案(2) Technical solutions
根据本发明的一个方面,提供了一种快闪存储器限流装置。该快闪存储器限流装置位于快闪存储器的存储单元阵列之外,包括:限流单元、传输管和参考电流产生模块,其中,传输管为PMOS管(MP0),其栅端连接至电压控制信号,漏端连接至存储单元阵列中存储单元源端擦除操作所需要的电压PHV,源端连接至存储单元中的源线;PMOS管(MP0)的源端和存储单元的源线共同作为限流单元的一个输入端,参考电流产生模块所产生的参考电流作为限流单元的另一个输入端;如果存储单元源线的电流未超过参考电流产生模块产生的参考电流,则限流单元截止;如果存储单元的源线的电流大于参考电流产生模块产生的参考电流,则电流通过限流单元放电到地。According to one aspect of the present invention, a flash memory current limiting device is provided. The flash memory current limiting device is located outside the memory cell array of the flash memory, and includes: a current limiting unit, a transfer transistor and a reference current generation module, wherein the transfer transistor is a PMOS transistor (MP0), and its gate terminal is connected to a voltage control signal, the drain end is connected to the voltage PHV required for the erase operation of the source end of the memory cell in the memory cell array, and the source end is connected to the source line in the memory cell; the source end of the PMOS transistor (MP0) and the source line of the memory cell work together as One input terminal of the current limiting unit, the reference current generated by the reference current generating module is used as the other input terminal of the current limiting unit; if the current of the source line of the storage unit does not exceed the reference current generated by the reference current generating module, the current limiting unit is cut off ; If the current of the source line of the storage unit is greater than the reference current generated by the reference current generating module, the current is discharged to the ground through the current limiting unit.
根据本发明的另一个方面,还提供了一种快闪存储器。该快闪存储器包括存储单元及上述的限流装置,其中,存储单元含有源极,漏极和控制栅极;每一条字线分别对应存储单元中的一列,并且存储单元的栅极分别对应于该存储单元中的一列;每一条位线分别对应存储单元中的一行,并且存储单元的漏极分别对应于该存储单元中的一行;每个存储单元的源极共用一条源线,该源线与限流单元及传输管相连接。According to another aspect of the present invention, a flash memory is also provided. The flash memory includes a storage unit and the above-mentioned current limiting device, wherein the storage unit contains a source, a drain and a control gate; each word line corresponds to a column in the storage unit, and the gates of the storage unit correspond to A column in the storage unit; each bit line corresponds to a row in the storage unit, and the drain of the storage unit corresponds to a row in the storage unit; the source of each storage unit shares a source line, the source line Connect with the flow limiting unit and transfer tube.
(三)有益效果(3) Beneficial effects
本发明快闪存储器限流装置及应用该装置的快闪存储器具有下列有益效果:The flash memory current limiting device of the present invention and the flash memory using the device have the following beneficial effects:
(1)本发明中,由于限流装置不用集成在阵列当中,因此可以节省出大量的芯片面积;(1) In the present invention, since the current limiting device does not need to be integrated in the array, a large amount of chip area can be saved;
(2)本发明中,由于电流镜电路受工艺条件的影响较小,外部提供的电流与通过电流镜镜像的电流没有太大的差别,使存储单元中的电流与外部提供的电流相可以精确比较,从而可以精确限制漏电流不超过某一个值。(2) In the present invention, since the current mirror circuit is less affected by the process conditions, there is not much difference between the current provided by the outside and the current mirrored by the current mirror, so that the current in the storage unit and the current phase provided by the outside can be accurately Comparison, so that the leakage current can be precisely limited not to exceed a certain value.
附图说明 Description of drawings
图1为现有技术快闪存储器限流方案的结构示意图;FIG. 1 is a schematic structural diagram of a flash memory current limiting scheme in the prior art;
图2为现有技术使用限流装置,来操作快闪存储器阵列中的单个存储单元的结构示意图;FIG. 2 is a schematic structural diagram of using a current limiting device in the prior art to operate a single storage unit in a flash memory array;
图3为图2中存储单元阵列100的示意图;FIG. 3 is a schematic diagram of the
图4本发明实施例快闪存储器限流装置的示意图;FIG. 4 is a schematic diagram of a flash memory current limiting device according to an embodiment of the present invention;
图5本发明实施例快闪存储器限流装置的非限流时操作时序的示意图;FIG. 5 is a schematic diagram of the operating sequence of the flash memory current limiting device in the embodiment of the present invention when the current is not limited;
图6为本发明实施例快闪存储器限流装置的限流时操作时序的示意图。FIG. 6 is a schematic diagram of an operation sequence during current limiting of the flash memory current limiting device according to an embodiment of the present invention.
具体实施方式 Detailed ways
为使本发明的目的、技术方案和优点更加清楚明白,以下结合具体实施例,并参照附图,对本发明进一步详细说明。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
本发明提供了一种快闪存储器限流装置。该快闪存储器限流装置包括:传输管、参考电流产生模块和限流单元。其中,传输管为PMOS管(MP0),其栅端连接一电压控制信号,漏端连接至存储单元阵列中存储单元源端擦除操作所需要的电压PHV,源端连接至存储单元阵列中存储单元中的源线;PMOS管(MP0)的源端和存储单元的源线共同作为限流单元的一个输入端,参考电流产生模块所产生的参考电流作为限流单元的另一个输入端;限流单元的输出端接地,在存储单元的源线的电流大于参考电流产生模块产生的参考电流时,则电流通过限流单元泄放电到地;如果在存储单元的源线的电流未超过参考电流产生模块产生的参考电流时,则限流单元截止。The invention provides a flash memory current limiting device. The flash memory current limiting device includes: a transmission tube, a reference current generating module and a current limiting unit. Wherein, the transfer transistor is a PMOS transistor (MP0), its gate end is connected to a voltage control signal, its drain end is connected to the voltage PHV required for the source end erase operation of the memory cell in the memory cell array, and its source end is connected to the memory cell stored in the memory cell array. The source line in the unit; the source end of the PMOS transistor (MP0) and the source line of the storage unit are jointly used as an input end of the current limiting unit, and the reference current generated by the reference current generation module is used as the other input end of the current limiting unit; The output terminal of the current unit is grounded. When the current of the source line of the storage unit is greater than the reference current generated by the reference current generation module, the current is discharged to the ground through the current limiting unit; if the current of the source line of the storage unit does not exceed the reference current When the reference current generated by the module is generated, the current limiting unit is cut off.
图4本发明实施例快闪存储器限流装置的示意图。如图4所示,限流装置108含有限流晶体管MN0-MN3以及PMOS传输管MP0,其中,晶体管MN2的漏极连接至阵列源线104,晶体管MN0的漏极连接至参考电流产生电路110。晶体管MN0和MN3的控制栅极分别接控制信号I_EN和Vbias。晶体管MN0的漏极和晶体管MN3的源极与晶体管MN1、MN2的栅相连接。晶体管MP0的源极连接至阵列的源线104和晶体管MN2的漏极,栅极接控制信号Vbias1,漏极接电压PHV。限流装置108,用来限制阵列源极电流的总和在一个预设值内。由于源极电流的总和被限制在一个预设值内,因此降低了外部高压系统的设计难度。FIG. 4 is a schematic diagram of a flash memory current limiting device according to an embodiment of the present invention. As shown in FIG. 4 , the current limiting
在非限流时操作过程中,限流装置108的信号控制逻辑如图5所示。在t0时刻,控制信号I_EN连接至线112上,控制信号Vbias连接至线113上,控制信号Vbias1为低电平连接至线114上,在t4时刻,结束控制。其中VSL对应存储阵列源极104的电压示意图,在t1时刻MP0导通,PHV电压传送到存储阵列源极104;在t4时刻MP0截止,电压VSL在存储阵列源极104变成V1。During the non-current-limiting operation, the signal control logic of the current-limiting
在限流时操作过程中,限流装置108的信号控制逻辑如图6所示。在t0时刻,控制信号I_EN的电压为电源电压VCC连接至线112上;控制信号Vbias的电压为电源电压VCC连接至线113上;控制信号Vbias1的电压为高电平PHV使MP0截止,同时连接至线114上。在t6时刻,控制信号I_EN、Vbias变为低电平结束控制。其中ISL对应存储阵列源极107的电流示意图,假设由于某种操作模式使电流ISL在t3时刻增加,当总的漏电流超过Imax时,由于限流装置108,使电流ISL通过MN2管放电到地面,从而使电流ISL在t4时刻下降到电流预设值Imax以下。假设在某种操作模式下总的漏电流ISL没有大于预市值Imax时,这时限流装置108中的MN2不会使电流ISL通过MN2管放电到地面。During the current limiting operation, the signal control logic of the current limiting
以上所述的具体实施例,对本发明的目的、技术方案和有益效果进行了进一步详细说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The specific embodiments described above have further described the purpose, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above descriptions are only specific embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104952478A (en) * | 2014-03-25 | 2015-09-30 | 三星电子株式会社 | Nonvolatile memory device and storage device with nonvolatile memory device |
| CN106169302A (en) * | 2015-05-18 | 2016-11-30 | 三星电子株式会社 | Storage arrangement and the electronic installation including this storage arrangement |
| CN112133347A (en) * | 2020-09-11 | 2020-12-25 | 中国科学院微电子研究所 | Memory unit based on 7T1C structure, its operation method, and memory |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6031766A (en) * | 1997-09-10 | 2000-02-29 | Macronix International Co., Ltd. | Method and circuit for substrate current induced hot e-injection (SCIHE) approach for VT convergence at low Vcc voltage |
| US6128221A (en) * | 1998-09-10 | 2000-10-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Circuit and programming method for the operation of flash memories to prevent programming disturbances |
| CN1897160A (en) * | 2005-07-15 | 2007-01-17 | 旺宏电子股份有限公司 | Semiconductor components including memory cells and current limiters |
-
2011
- 2011-11-03 CN CN2011103437399A patent/CN103093811A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6031766A (en) * | 1997-09-10 | 2000-02-29 | Macronix International Co., Ltd. | Method and circuit for substrate current induced hot e-injection (SCIHE) approach for VT convergence at low Vcc voltage |
| US6128221A (en) * | 1998-09-10 | 2000-10-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Circuit and programming method for the operation of flash memories to prevent programming disturbances |
| CN1897160A (en) * | 2005-07-15 | 2007-01-17 | 旺宏电子股份有限公司 | Semiconductor components including memory cells and current limiters |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104952478A (en) * | 2014-03-25 | 2015-09-30 | 三星电子株式会社 | Nonvolatile memory device and storage device with nonvolatile memory device |
| CN104952478B (en) * | 2014-03-25 | 2019-04-02 | 三星电子株式会社 | Nonvolatile memory and storage device having the same |
| CN106169302A (en) * | 2015-05-18 | 2016-11-30 | 三星电子株式会社 | Storage arrangement and the electronic installation including this storage arrangement |
| CN106169302B (en) * | 2015-05-18 | 2018-12-07 | 三星电子株式会社 | Memory device and electronic device including the memory device |
| CN112133347A (en) * | 2020-09-11 | 2020-12-25 | 中国科学院微电子研究所 | Memory unit based on 7T1C structure, its operation method, and memory |
| CN112133347B (en) * | 2020-09-11 | 2023-08-15 | 中国科学院微电子研究所 | Storage unit based on 7T1C structure, operation method thereof, and memory |
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