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CN103093811A - Flash memory current limiting device and flash memory using the device - Google Patents

Flash memory current limiting device and flash memory using the device Download PDF

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CN103093811A
CN103093811A CN2011103437399A CN201110343739A CN103093811A CN 103093811 A CN103093811 A CN 103093811A CN 2011103437399 A CN2011103437399 A CN 2011103437399A CN 201110343739 A CN201110343739 A CN 201110343739A CN 103093811 A CN103093811 A CN 103093811A
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current
current limiting
nmos transistor
source
storage unit
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冀永辉
冯二媛
刘明
于兆安
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Institute of Microelectronics of CAS
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Abstract

The invention discloses a flash memory current limiting device. The flash memory current limiting device is arranged outside a memory cell array of a flash memory and comprises: the device comprises a transmission tube, a reference current generation module and a current limiting unit, wherein the transmission tube is a PMOS tube, the grid end of the transmission tube is connected to a voltage control signal, the drain end of the transmission tube is connected to a voltage PHV required by the erasing operation of the source end of a storage unit in a storage unit array, and the source end of the transmission tube is connected to a source line in the storage unit; the source end of the PMOS tube and the source line of the storage unit are jointly used as one input end of the current limiting unit, and the reference current generated by the reference current generating module is used as the other input end of the current limiting unit. The flash memory current limiting device can save a large amount of chip area because the current limiting device is not integrated in the array.

Description

快闪存储器限流装置及应用该装置的快闪存储器Flash memory current limiting device and flash memory using the device

技术领域 technical field

本发明涉及微电子行业存储器技术领域,尤其涉及一种快闪存储器限流装置及应用该装置的快闪存储器。The invention relates to the technical field of memory in the microelectronics industry, in particular to a flash memory current limiting device and a flash memory using the device.

背景技术 Background technique

一般来说,在快闪存储单元的源极、漏极和控制栅极施加适当的电压,电荷就会被储存或者被移除,因此数据就可以以这种电荷的形式存储在存储单元中或自存储单元擦除。电荷在浮动栅极上的出现或消失,决定当存储单元被选择时,电流是否在源极和漏极区域之间流动。通过判断存储单元中源极和漏极区域之间电流的大小,来区分存储的内容是“0”还是“1”。典型地,快闪存储单元在阵列中的位线连接任一特定行的存储单元的漏极,而字线连接任一特定列的存储单元的栅极。每一个存储单元的源极通常会接地。Generally speaking, by applying appropriate voltages to the source, drain and control gate of the flash memory cell, the charge will be stored or removed, so data can be stored or stored in the memory cell in the form of this charge. Erased from the memory cell. The presence or absence of charge on the floating gate determines whether current flows between the source and drain regions when the memory cell is selected. By judging the magnitude of the current between the source and drain regions in the memory cell, it is possible to distinguish whether the stored content is "0" or "1". Typically, the bit lines of the flash memory cells in the array are connected to the drains of the memory cells in any specific row, and the word lines are connected to the gates of the memory cells in any specific column. The source of each memory cell is usually connected to ground.

快闪存储器不仅仅只具有读取的功能,还有编程和擦除的功能。完成这些操作就需要对存储阵列中被选择的存储单元所在行对应的位线,施加一个相当高的电压。此外,被选择的存储单元所在行连接的字线,也会被施加一个高压电。其漏极和栅极,被施加高电压产生电流用来产生电荷。然而在进行这些操作模式时,与被选择的存储单元位于同一行而未被选择的存储单元的漏极,也会接受到高电压位线的电位,进而造成关闭时的电流或漏电流可能会在这些未被选择的存储单元的源极和漏极之间流动。虽然单个存储单元的漏电流可能极小,但每一个未被选择的存储单元的漏电流总和,可能会接近甚至超过被选择的存储单元中的电流,导致器件损坏。存储系统加限流装置可以使漏电流总和不超过设定值,不至于器件损坏。但是现在很多存储系统都没有加上限流的方案,或者只在制作器件时加入电流限制方案,或者将电流限制方案集成在器件阵列中。Flash memory not only has the function of reading, but also the function of programming and erasing. To complete these operations, it is necessary to apply a relatively high voltage to the bit line corresponding to the row of the selected memory cell in the memory array. In addition, the word line connected to the row where the selected memory cell is located will also be applied with a high voltage. Its drain and gate are applied with high voltage to generate current to generate charge. However, when performing these operation modes, the drains of the unselected memory cells located in the same row as the selected memory cells will also receive the potential of the high voltage bit line, and the current or leakage current at the time of shutdown may be reduced. flows between the source and drain of these unselected memory cells. Although the leakage current of a single memory cell may be extremely small, the sum of the leakage currents of each unselected memory cell may approach or even exceed the current in the selected memory cell, resulting in device damage. Adding a current limiting device to the storage system can make the sum of the leakage current not exceed the set value, so that the device will not be damaged. But now many storage systems do not have a current limiting solution, or only add a current limiting solution when making devices, or integrate the current limiting solution in the device array.

图1为现有技术快闪存储器限流方案的结构示意图。如图1所示,100为存储单元阵列,101为起限流作用的PMOS传输管(MP),其中,PMOS传输管(MP)101的源端连接可调电压VHB,其栅端连接至一个固定的电压V0上,衬底电压接VPP,PMOS传输管(MP)101的漏端连接至存储单元阵列100的阵列源线104。传统限流方案是通过改变位线上的电压VHB,再给一个合适的电压V0来限制电流的大小。但是V0的改变会造成PMOS传输管(MP)的阈值电压的浮动,从而使限流不能精确达到设定值。FIG. 1 is a schematic structural diagram of a current limiting scheme for a flash memory in the prior art. As shown in FIG. 1 , 100 is a memory cell array, and 101 is a PMOS transmission transistor (MP) that acts as a current limiter, wherein, the source terminal of the PMOS transmission transistor (MP) 101 is connected to the adjustable voltage VHB, and its gate terminal is connected to a On a fixed voltage V0 , the substrate voltage is connected to VPP, and the drain end of the PMOS transfer transistor (MP) 101 is connected to the array source line 104 of the memory cell array 100 . The traditional current limiting scheme is to limit the magnitude of the current by changing the voltage VHB on the bit line, and then giving an appropriate voltage V0. However, the change of V0 will cause the threshold voltage of the PMOS transmission transistor (MP) to fluctuate, so that the current limit cannot accurately reach the set value.

图2为现有技术使用限流装置,来操作快闪存储器阵列中的单个存储单元的结构示意图。如图2所示,快闪存储器装置包含存储单元阵列100。每个存储单元典型地含有源极,漏极和栅极。阵列100更包含多条位线102,例如BL0,BL1,…BLm,以及多条字线103,例如字线WL0,WL1,…WLn。位线BL0-BLm与位线驱动电路105连接,字线WL0-WLn与字线驱动电路106连接,高压系统107为位线驱动电路105,字线驱动电路106和限流装置108提供存储单元操作时所需要的电压。高压系统107产生的电压连接至字线驱动电路和位线驱动电路的电源信号端,通过字线和位线选择高压系统107产生的电压应用在一条或者多条位线BL0-BLm。存储阵列100的源线104连接在一起,限流装置108连接在阵列源线104与地之间。FIG. 2 is a structural diagram of using a current limiting device to operate a single memory cell in a flash memory array in the prior art. As shown in FIG. 2 , the flash memory device includes a memory cell array 100 . Each memory cell typically contains a source, drain and gate. The array 100 further includes a plurality of bit lines 102 , such as BL0 , BL1 , . . . BLm, and a plurality of word lines 103 , such as word lines WL0 , WL1 , . . . WLn. Bit lines BL0-BLm are connected to bit line driver circuit 105, word lines WL0-WLn are connected to word line driver circuit 106, high voltage system 107 provides memory cell operation for bit line driver circuit 105, word line driver circuit 106 and current limiting device 108 the required voltage. The voltage generated by the high voltage system 107 is connected to the power signal terminals of the word line driving circuit and the bit line driving circuit, and the voltage generated by the high voltage system 107 is applied to one or more bit lines BL0-BLm through word line and bit line selection. The source lines 104 of the memory array 100 are connected together, and the current limiting device 108 is connected between the array source lines 104 and ground.

图3为图2中存储单元阵列100的示意图。如图3所示,阵列100含有安排在列与行的多个存储单元115。其中字线WL0,WL1,…WLn一共有n+1行,以及位线BL0,BL1,…BLm一共m+1列。存储单元中115和116各自的漏极耦接在一起,连接至位线BL0。以同样的方法连接其它列的存储单元,形成字线BL1-BLm,其中所有存储单元的源极是连接在一起的。FIG. 3 is a schematic diagram of the memory cell array 100 in FIG. 2 . As shown in FIG. 3, array 100 includes a plurality of memory cells 115 arranged in columns and rows. The word lines WL0 , WL1 , . . . WLn have a total of n+1 rows, and the bit lines BL0 , BL1 , . . . BLm have a total of m+1 columns. The respective drains of memory cells 115 and 116 are coupled together and connected to bit line BL0. The memory cells of other columns are connected in the same way to form word lines BL1-BLm, wherein the sources of all memory cells are connected together.

在图3中,单元115为被选择作程序化的存储单元。施加较高偏压至位线BL0和字线WL0,以及施加较低电压至未被选择字线WL1-WLn的和位线BL1-BLm,来操作被选择的单元115。这些偏压可为,例如,10V,5V,0V,0V,分别施加在字线WL0、位线BL0、WL1-WLn、BL1-BLm。如图3所示,由高压系统107传输相应电压到字线驱动电路106和位线驱动电路105,再由字线驱动电路106和位线驱动电路105分别施加于字线WL0-WLn,位线BL0-BLm。在操作模式下,字线WL0提供电压给被选择的单元115的控制栅极,以及和WL0连接但未被选择的存储单元的栅极,以促进电子注入选择的存储单元115。In FIG. 3, cell 115 is the memory cell selected for programming. The selected cell 115 is operated by applying a higher bias voltage to bit line BL0 and word line WL0 and a lower voltage to unselected word lines WL1-WLn and bit lines BL1-BLm. These bias voltages can be, for example, 10V, 5V, 0V, 0V applied to word line WL0, bit line BL0, WL1-WLn, BL1-BLm, respectively. As shown in Figure 3, the high-voltage system 107 transmits the corresponding voltage to the word line driver circuit 106 and the bit line driver circuit 105, and then the word line driver circuit 106 and the bit line driver circuit 105 are respectively applied to the word lines WL0-WLn, the bit line BL0-BLm. In the operational mode, word line WL0 provides a voltage to the control gate of the selected cell 115 and the gate of the unselected memory cell connected to WL0 to facilitate electron injection into the selected memory cell 115 .

例如5V偏压到位线BL0,10V偏压到字线WL0,作为操作单元115所需的电压。既然未被选择的单元的漏极,均与被选择的单元115的漏极连接,那些未被选择的单元116在它们各自的漏极也会被接收到位线BL0的电压。施加于未被选择的存储单元116各自漏极的位电压,增加了未被选择的存储单元116中每一个单元的漏极至源极电压,这个漏极至源极电压的值会增加未被选择的单元116的漏电流。但依据所述具体实施例,限流装置108,便可以限流此漏电流的大小。如图3所示,随着漏极到源极电压的施加,未被选择的存储单元116中的每一单元产生漏电流Ioff,其自漏极流入,并从每一个未被选择的存储单元116的源极流出。这些Ioff电流的总和,以及流经被选择的单元115的漏电流,一起通过阵列源线104。阵列源线104再通过限流装置108,从而限制了漏电流的总和,使其不超过所期望的预设值。For example, 5V is biased to the bit line BL0 , and 10V is biased to the word line WL0 as the voltage required to operate the unit 115 . Since the drains of the unselected cells are connected to the drain of the selected cell 115, those unselected cells 116 also receive the voltage of the bit line BL0 at their respective drains. The bit voltage applied to the respective drains of the unselected memory cells 116 increases the drain-to-source voltage of each of the unselected memory cells 116, and the value of this drain-to-source voltage increases the value of the unselected memory cells 116. Selected cell 116 leakage current. However, according to the specific embodiment, the current limiting device 108 can limit the magnitude of the leakage current. As shown in FIG. 3, with the application of the drain-to-source voltage, each unit in the unselected memory cells 116 generates a leakage current Ioff, which flows in from the drain, and from each unselected memory cell 116 source outflow. The sum of these Ioff currents, together with the leakage current flowing through the selected cell 115, passes through the array source line 104 together. The array source line 104 then passes through the current limiting device 108, thereby limiting the sum of the leakage current so that it does not exceed a desired preset value.

在实现本发明的过程中,申请人意识到现有技术存在如下缺陷:1、现有技术的限流装置集成在阵列当中,占用了大量的面积;2、现有的限流装置受温度等外界条件影响,造成限流不精确。In the process of realizing the present invention, the applicant realized that the prior art has the following defects: 1. The current limiting device of the prior art is integrated in the array, occupying a large area; 2. The existing current limiting device is affected by temperature, etc. Influenced by external conditions, resulting in inaccurate current limiting.

发明内容 Contents of the invention

(一)要解决的技术问题(1) Technical problems to be solved

为解决上述的一个或多个问题,本发明提供了一种快闪存储器限流装置及应用该装置的快闪存储器,以节约存储阵列的面积,使限流能够精确达到设定值。In order to solve one or more of the above problems, the present invention provides a flash memory current limiting device and a flash memory using the device, so as to save the area of the storage array and enable the current limiting to accurately reach the set value.

(二)技术方案(2) Technical solutions

根据本发明的一个方面,提供了一种快闪存储器限流装置。该快闪存储器限流装置位于快闪存储器的存储单元阵列之外,包括:限流单元、传输管和参考电流产生模块,其中,传输管为PMOS管(MP0),其栅端连接至电压控制信号,漏端连接至存储单元阵列中存储单元源端擦除操作所需要的电压PHV,源端连接至存储单元中的源线;PMOS管(MP0)的源端和存储单元的源线共同作为限流单元的一个输入端,参考电流产生模块所产生的参考电流作为限流单元的另一个输入端;如果存储单元源线的电流未超过参考电流产生模块产生的参考电流,则限流单元截止;如果存储单元的源线的电流大于参考电流产生模块产生的参考电流,则电流通过限流单元放电到地。According to one aspect of the present invention, a flash memory current limiting device is provided. The flash memory current limiting device is located outside the memory cell array of the flash memory, and includes: a current limiting unit, a transfer transistor and a reference current generation module, wherein the transfer transistor is a PMOS transistor (MP0), and its gate terminal is connected to a voltage control signal, the drain end is connected to the voltage PHV required for the erase operation of the source end of the memory cell in the memory cell array, and the source end is connected to the source line in the memory cell; the source end of the PMOS transistor (MP0) and the source line of the memory cell work together as One input terminal of the current limiting unit, the reference current generated by the reference current generating module is used as the other input terminal of the current limiting unit; if the current of the source line of the storage unit does not exceed the reference current generated by the reference current generating module, the current limiting unit is cut off ; If the current of the source line of the storage unit is greater than the reference current generated by the reference current generating module, the current is discharged to the ground through the current limiting unit.

根据本发明的另一个方面,还提供了一种快闪存储器。该快闪存储器包括存储单元及上述的限流装置,其中,存储单元含有源极,漏极和控制栅极;每一条字线分别对应存储单元中的一列,并且存储单元的栅极分别对应于该存储单元中的一列;每一条位线分别对应存储单元中的一行,并且存储单元的漏极分别对应于该存储单元中的一行;每个存储单元的源极共用一条源线,该源线与限流单元及传输管相连接。According to another aspect of the present invention, a flash memory is also provided. The flash memory includes a storage unit and the above-mentioned current limiting device, wherein the storage unit contains a source, a drain and a control gate; each word line corresponds to a column in the storage unit, and the gates of the storage unit correspond to A column in the storage unit; each bit line corresponds to a row in the storage unit, and the drain of the storage unit corresponds to a row in the storage unit; the source of each storage unit shares a source line, the source line Connect with the flow limiting unit and transfer tube.

(三)有益效果(3) Beneficial effects

本发明快闪存储器限流装置及应用该装置的快闪存储器具有下列有益效果:The flash memory current limiting device of the present invention and the flash memory using the device have the following beneficial effects:

(1)本发明中,由于限流装置不用集成在阵列当中,因此可以节省出大量的芯片面积;(1) In the present invention, since the current limiting device does not need to be integrated in the array, a large amount of chip area can be saved;

(2)本发明中,由于电流镜电路受工艺条件的影响较小,外部提供的电流与通过电流镜镜像的电流没有太大的差别,使存储单元中的电流与外部提供的电流相可以精确比较,从而可以精确限制漏电流不超过某一个值。(2) In the present invention, since the current mirror circuit is less affected by the process conditions, there is not much difference between the current provided by the outside and the current mirrored by the current mirror, so that the current in the storage unit and the current phase provided by the outside can be accurately Comparison, so that the leakage current can be precisely limited not to exceed a certain value.

附图说明 Description of drawings

图1为现有技术快闪存储器限流方案的结构示意图;FIG. 1 is a schematic structural diagram of a flash memory current limiting scheme in the prior art;

图2为现有技术使用限流装置,来操作快闪存储器阵列中的单个存储单元的结构示意图;FIG. 2 is a schematic structural diagram of using a current limiting device in the prior art to operate a single storage unit in a flash memory array;

图3为图2中存储单元阵列100的示意图;FIG. 3 is a schematic diagram of the memory cell array 100 in FIG. 2;

图4本发明实施例快闪存储器限流装置的示意图;FIG. 4 is a schematic diagram of a flash memory current limiting device according to an embodiment of the present invention;

图5本发明实施例快闪存储器限流装置的非限流时操作时序的示意图;FIG. 5 is a schematic diagram of the operating sequence of the flash memory current limiting device in the embodiment of the present invention when the current is not limited;

图6为本发明实施例快闪存储器限流装置的限流时操作时序的示意图。FIG. 6 is a schematic diagram of an operation sequence during current limiting of the flash memory current limiting device according to an embodiment of the present invention.

具体实施方式 Detailed ways

为使本发明的目的、技术方案和优点更加清楚明白,以下结合具体实施例,并参照附图,对本发明进一步详细说明。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

本发明提供了一种快闪存储器限流装置。该快闪存储器限流装置包括:传输管、参考电流产生模块和限流单元。其中,传输管为PMOS管(MP0),其栅端连接一电压控制信号,漏端连接至存储单元阵列中存储单元源端擦除操作所需要的电压PHV,源端连接至存储单元阵列中存储单元中的源线;PMOS管(MP0)的源端和存储单元的源线共同作为限流单元的一个输入端,参考电流产生模块所产生的参考电流作为限流单元的另一个输入端;限流单元的输出端接地,在存储单元的源线的电流大于参考电流产生模块产生的参考电流时,则电流通过限流单元泄放电到地;如果在存储单元的源线的电流未超过参考电流产生模块产生的参考电流时,则限流单元截止。The invention provides a flash memory current limiting device. The flash memory current limiting device includes: a transmission tube, a reference current generating module and a current limiting unit. Wherein, the transfer transistor is a PMOS transistor (MP0), its gate end is connected to a voltage control signal, its drain end is connected to the voltage PHV required for the source end erase operation of the memory cell in the memory cell array, and its source end is connected to the memory cell stored in the memory cell array. The source line in the unit; the source end of the PMOS transistor (MP0) and the source line of the storage unit are jointly used as an input end of the current limiting unit, and the reference current generated by the reference current generation module is used as the other input end of the current limiting unit; The output terminal of the current unit is grounded. When the current of the source line of the storage unit is greater than the reference current generated by the reference current generation module, the current is discharged to the ground through the current limiting unit; if the current of the source line of the storage unit does not exceed the reference current When the reference current generated by the module is generated, the current limiting unit is cut off.

图4本发明实施例快闪存储器限流装置的示意图。如图4所示,限流装置108含有限流晶体管MN0-MN3以及PMOS传输管MP0,其中,晶体管MN2的漏极连接至阵列源线104,晶体管MN0的漏极连接至参考电流产生电路110。晶体管MN0和MN3的控制栅极分别接控制信号I_EN和Vbias。晶体管MN0的漏极和晶体管MN3的源极与晶体管MN1、MN2的栅相连接。晶体管MP0的源极连接至阵列的源线104和晶体管MN2的漏极,栅极接控制信号Vbias1,漏极接电压PHV。限流装置108,用来限制阵列源极电流的总和在一个预设值内。由于源极电流的总和被限制在一个预设值内,因此降低了外部高压系统的设计难度。FIG. 4 is a schematic diagram of a flash memory current limiting device according to an embodiment of the present invention. As shown in FIG. 4 , the current limiting device 108 includes current limiting transistors MN0 - MN3 and a PMOS transmission transistor MP0 , wherein the drain of the transistor MN2 is connected to the array source line 104 , and the drain of the transistor MN0 is connected to the reference current generating circuit 110 . The control gates of transistors MN0 and MN3 are respectively connected to control signals I_EN and Vbias. The drain of transistor MN0 and the source of transistor MN3 are connected to the gates of transistors MN1, MN2. The source of the transistor MP0 is connected to the source line 104 of the array and the drain of the transistor MN2 , the gate is connected to the control signal Vbias1 , and the drain is connected to the voltage PHV. The current limiting device 108 is used to limit the sum of array source currents within a preset value. Since the sum of the source currents is limited to a preset value, the design difficulty of the external high voltage system is reduced.

在非限流时操作过程中,限流装置108的信号控制逻辑如图5所示。在t0时刻,控制信号I_EN连接至线112上,控制信号Vbias连接至线113上,控制信号Vbias1为低电平连接至线114上,在t4时刻,结束控制。其中VSL对应存储阵列源极104的电压示意图,在t1时刻MP0导通,PHV电压传送到存储阵列源极104;在t4时刻MP0截止,电压VSL在存储阵列源极104变成V1。During the non-current-limiting operation, the signal control logic of the current-limiting device 108 is shown in FIG. 5 . At time t0, the control signal I_EN is connected to the line 112, the control signal Vbias is connected to the line 113, the control signal Vbias1 is connected to the line 114 at a low level, and at time t4, the control ends. VSL corresponds to the schematic diagram of the voltage of the storage array source 104, MP0 is turned on at t1, and the PHV voltage is transmitted to the storage array source 104; at t4, MP0 is turned off, and the voltage VSL becomes V1 at the storage array source 104.

在限流时操作过程中,限流装置108的信号控制逻辑如图6所示。在t0时刻,控制信号I_EN的电压为电源电压VCC连接至线112上;控制信号Vbias的电压为电源电压VCC连接至线113上;控制信号Vbias1的电压为高电平PHV使MP0截止,同时连接至线114上。在t6时刻,控制信号I_EN、Vbias变为低电平结束控制。其中ISL对应存储阵列源极107的电流示意图,假设由于某种操作模式使电流ISL在t3时刻增加,当总的漏电流超过Imax时,由于限流装置108,使电流ISL通过MN2管放电到地面,从而使电流ISL在t4时刻下降到电流预设值Imax以下。假设在某种操作模式下总的漏电流ISL没有大于预市值Imax时,这时限流装置108中的MN2不会使电流ISL通过MN2管放电到地面。During the current limiting operation, the signal control logic of the current limiting device 108 is shown in FIG. 6 . At time t0, the voltage of the control signal I_EN is the power supply voltage VCC and connected to the line 112; the voltage of the control signal Vbias is the power supply voltage VCC and connected to the line 113; the voltage of the control signal Vbias1 is high level PHV to cut off MP0, and at the same time connect to line 114. At time t6, the control signals I_EN and Vbias become low level to end the control. Wherein ISL corresponds to the current schematic diagram of the source 107 of the storage array, assuming that due to a certain operation mode, the current ISL increases at time t3, when the total leakage current exceeds Imax, due to the current limiting device 108, the current ISL is discharged to the ground through the MN2 tube , so that the current ISL drops below the current preset value Imax at time t4. Assuming that the total leakage current ISL is not greater than the pre-market value Imax in a certain operation mode, the MN2 in the current limiting device 108 will not discharge the current ISL to the ground through the MN2 tube.

以上所述的具体实施例,对本发明的目的、技术方案和有益效果进行了进一步详细说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The specific embodiments described above have further described the purpose, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above descriptions are only specific embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.

Claims (7)

1.一种快闪存储器限流装置,其特征在于,该快闪存储器限流装置位于快闪存储器的存储单元阵列之外,包括:传输管、参考电流产生模块和限流单元,其中,1. A flash memory current limiting device, characterized in that, the flash memory current limiting device is located outside the storage cell array of the flash memory, including: transmission tube, reference current generation module and current limiting unit, wherein, 所述传输管为PMOS管(MP0),其栅端连接至电压控制信号,漏端连接至存储单元阵列中存储单元源端擦除操作所需要的电压PHV,源端连接至所述存储单元中的源线;The transfer transistor is a PMOS transistor (MP0), its gate end is connected to the voltage control signal, its drain end is connected to the voltage PHV required for the source end erase operation of the memory cell in the memory cell array, and its source end is connected to the memory cell the source line; 所述PMOS管(MP0)的源端和所述存储单元的源线共同作为所述限流单元的一个输入端,参考电流产生模块所产生的参考电流作为所述限流单元的另一个输入端;The source terminal of the PMOS transistor (MP0) and the source line of the storage unit are jointly used as an input terminal of the current limiting unit, and the reference current generated by the reference current generating module is used as the other input terminal of the current limiting unit ; 所述限流单元的输出端接地,如果所述存储单元源线的电流未超过所述参考电流产生模块产生的参考电流,则限流单元截止;如果所述存储单元的源线的电流大于所述参考电流产生模块产生的参考电流,则电流通过所述限流单元放电到地。The output terminal of the current limiting unit is grounded, and if the current of the source line of the storage unit does not exceed the reference current generated by the reference current generating module, the current limiting unit is cut off; if the current of the source line of the storage unit is greater than the If the reference current generated by the reference current generation module is used, the current is discharged to the ground through the current limiting unit. 2.根据权利要求1所述的快闪存储器限流装置,其特征在于,所述参考电流产生模块通过电流镜镜像外部电流而产生参考电流。2 . The flash memory current limiting device according to claim 1 , wherein the reference current generating module mirrors an external current through a current mirror to generate a reference current. 3 . 3.根据权利要求1所述的快闪存储器限流装置,其特征在于,所述限流单元包括第一NMOS管(MN0)、第二NMOS管(MN1)、第三NMOS管(MN2)和第四NMOS管(MN3),其中:3. The flash memory current limiting device according to claim 1, wherein the current limiting unit comprises a first NMOS transistor (MN0), a second NMOS transistor (MN1), a third NMOS transistor (MN2) and The fourth NMOS tube (MN3), wherein: 第一NMOS管(MN0)的漏极连接至参考电流产生模块所产生的参考电流,控制栅极接第一控制信号I_EN,源极接到第二NMOS管(MN1)的漏极;The drain of the first NMOS transistor (MN0) is connected to the reference current generated by the reference current generating module, the control gate is connected to the first control signal I_EN, and the source is connected to the drain of the second NMOS transistor (MN1); 第二NMOS管(MN1)和第三NMOS管(MN2)组成一个电流镜电路,第二NMOS管(MN1)的栅极与第三NMOS管(MN2)的栅极互连,并与第一NMOS管(MN0)的源极连接;The second NMOS transistor (MN1) and the third NMOS transistor (MN2) form a current mirror circuit, the gate of the second NMOS transistor (MN1) is interconnected with the gate of the third NMOS transistor (MN2), and is connected to the first NMOS transistor (MN2). The source connection of the tube (MN0); 第三NMOS管(MN2)的漏极连接至存储单元中的源端和PMOS传输管(MP0)的源极,第三NMOS管(MN2)的栅极与第二NMOS管(MN1)的栅极互连,源极接地;The drain of the third NMOS transistor (MN2) is connected to the source of the memory cell and the source of the PMOS transmission transistor (MP0), and the gate of the third NMOS transistor (MN2) is connected to the gate of the second NMOS transistor (MN1). Interconnect, source to ground; 第四NMOS管(MN3)的漏端连接至第三NMOS管(MN2)和第二NMOS管(MN1)的栅极;其源极接地,其控制栅极接第二控制信号Vbias;The drain end of the fourth NMOS transistor (MN3) is connected to the gates of the third NMOS transistor (MN2) and the second NMOS transistor (MN1); its source is grounded, and its control gate is connected to the second control signal Vbias; 所述PMOS管(MP0)的控制栅极接第三控制信号Vbias1,源极连接高电压PHV,漏极接到存储单元阵列的源线;The control gate of the PMOS transistor (MP0) is connected to the third control signal Vbias1, the source is connected to the high voltage PHV, and the drain is connected to the source line of the memory cell array; 如果所述存储单元源线的电流未超过所述参考电流产生模块产生的参考电流,第三NMOS管(MN2)截止;如果所述存储单元的源线的电流大于所述参考电流产生模块产生的参考电流,电流通过第三NMOS管(MN2)放电到地。If the current of the source line of the storage unit does not exceed the reference current generated by the reference current generation module, the third NMOS transistor (MN2) is turned off; if the current of the source line of the storage unit is greater than the reference current generated by the reference current generation module Referring to the current, the current is discharged to the ground through the third NMOS transistor (MN2). 4.根据权利要求3所述的快闪存储器限流装置,其特征在于,在对所述存储单元的源线进行限流操作时,4. The flash memory current limiting device according to claim 3, characterized in that, when the source line of the storage unit is subjected to a current limiting operation, 所述第一控制信号I_EN连接至电源电压;所述第二控制信号Vbias连接至地电平;所述第三控制信号Vbias1连接至高电压PHV,使PMOS传输管(MP0)截止。The first control signal I_EN is connected to the power supply voltage; the second control signal Vbias is connected to the ground level; the third control signal Vbias1 is connected to the high voltage PHV to turn off the PMOS transmission transistor (MP0). 5.根据权利要求3所述的快闪存储器限流装置,其特征在于,在未对所述存储单元的源线进行限流操作时,5. The flash memory current limiting device according to claim 3, wherein when the source line of the storage unit is not subjected to a current limiting operation, 所述第一控制信号I_EN连接至地电压;所述第二控制信号Vbias连接至电源电压;所述第三控制信号Vbias1连接至地电平,使PMOS传输管(MP0)导通。The first control signal I_EN is connected to the ground voltage; the second control signal Vbias is connected to the power supply voltage; the third control signal Vbias1 is connected to the ground level to turn on the PMOS transmission transistor (MP0). 6.根据权利要求3所述的快闪存储器限流装置,其特征在于,6. The flash memory current limiting device according to claim 3, wherein: 当进行擦除操作时,第四NMOS管(MN3)导通,第三NMOS管(MN2)截止,通过第一NMOS管(MN0)传输PHV电压给存储单元的源端;When performing an erase operation, the fourth NMOS transistor (MN3) is turned on, the third NMOS transistor (MN2) is turned off, and the PHV voltage is transmitted to the source terminal of the memory cell through the first NMOS transistor (MN0); 当进行编程、读取操作时,第四NMOS管(MN3)截止,第三NMOS管(MN2)导通,总漏电流超过预设值时,电流经过第三NMOS管(MN2)流向地。When performing programming and reading operations, the fourth NMOS transistor (MN3) is turned off, and the third NMOS transistor (MN2) is turned on. When the total leakage current exceeds a preset value, the current flows to the ground through the third NMOS transistor (MN2). 7.一种快闪存储器,其特征在于,包括存储单元及权利要求1至6中任一项所述的限流装置,7. A flash memory, characterized in that it comprises a storage unit and the current limiting device according to any one of claims 1 to 6, 存储单元含有源极,漏极和控制栅极;A memory cell has a source, a drain, and a control gate; 每一条字线分别对应存储单元中的一列,并且存储单元的栅极分别对应于该存储单元中的一列;Each word line corresponds to a column in the storage unit, and the gate of the storage unit corresponds to a column in the storage unit; 每一条位线分别对应存储单元中的一行,并且存储单元的漏极分别对应于该存储单元中的一行;Each bit line corresponds to a row in the storage unit, and the drain of the storage unit corresponds to a row in the storage unit; 每个存储单元的源极共用一条源线,该源线与所述限流单元及传输管相连接。The source of each storage unit shares a source line, which is connected to the current limiting unit and the transmission tube.
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