CN102560338B - A kind of cermet coating and preparation method thereof - Google Patents

Abstract

A cermet coating: composed of a metal phase matrix and dispersed nanocrystalline nitride phase particles; the metal phase (b) is an alloy phase or pure metal containing solid solution strengthening alloy components; the nitride phase (c) It is dispersed in the metal phase (b), and the volume fraction of the nitride (c) is 5-60%. A method of preparing a cermet coating, specifically using a vacuum physical vapor deposition type method; the preparation process includes three steps: (1) the part must be placed in the vacuum chamber (e), (2) the vacuum chamber (e) is passed through Into the reaction gas (f), (3) to make the material on the surface of the target (g) form a gas phase (h). The coating of the invention has higher fracture toughness, oxidation resistance and corrosion resistance, higher adhesion of oxide film, better hardness and wear resistance. The coating preparation process is simple, no subsequent treatment such as vacuum annealing is required after preparation, and the production efficiency is high.

Description

A kind of cermet coating and preparation method thereof

technical field

The invention relates to high temperature protection technology, and in particular provides a cermet coating and a preparation method thereof.

Background technique

MCrAlY coating is an ideal cladding coating. Because of its good high temperature oxidation resistance and thermal corrosion resistance, as well as good toughness and thermal fatigue resistance, it is widely used in turbine blades of aero-engines, gas turbines, etc. The advantage of MCrAlY coating lies in the diversity of its composition selection, that is, the appropriate coating composition can be selected according to different working environments and different substrate materials, and is not limited by the chemical composition and microstructure of the substrate. But the hardness and wear resistance of MCrAlY coating need to be improved. At present, the main preparation methods of MCrAlY coatings are physical vapor deposition and plasma spraying.

Compared with MCrAlY coating, nitride coating has high hardness and has excellent wear resistance. However, the thermal stability of the nitride coating is not high, and the thermal cracking resistance is poor, so the application research in the field of high temperature protection is less. In recent years, CrN, CrAlN coatings have attracted widespread attention due to their high hardness and wear resistance, good high temperature oxidation resistance and corrosion resistance. However, the toughness of the nitride coating is poor. After oxidation, the oxide on the surface of the coating is easily peeled off by thermal cycles and mechanical action at high temperature, which accelerates the failure of the coating. Therefore, the bonding strength and toughness of the nitride coating to the substrate It also needs to be improved. Recently, Lin et al. used pulsed unbalanced magnetron sputtering to prepare CrAlN coatings with different Al contents, which showed better high temperature performance and reduced the oxidation rate of AISI304 stainless steel at 800 ^o C. At the same time, it was found that with the increase of Al content, the oxidation resistance of CrAlN coating gradually improved, and the addition of Al effectively suppressed the decrease of nitrogen content in the coating under high temperature environment, so that the coating was annealed at 800 ^o C for 1h The treatment still maintains a hardness value of 25Gpa. However, this coating decomposes at high temperatures with oxide formation and provides only short-term protection [see J. Lin, et al. A study of the oxidation behavior of CrN and CrAlN thin films in air using DSC and TGA analyzes [J]. Surface & Coatings Technology, 202 (2008): 3272-3283.].

At present, the nitride protective coatings of superalloys cannot effectively protect superalloys from corrosion due to their poor toughness, low bonding strength with the substrate, lack of compact structure, or low thermal stability. Far from meeting the requirements of industrial applications. Therefore, the development of new high-temperature protective coatings with high oxidation resistance, high corrosion resistance, high thermal stability, high wear resistance and high toughness is still an urgent problem to be solved in the field of superalloy protection.

Contents of the invention

The object of the present invention is to provide a cermet coating and a preparation method thereof. The cermet coating is composed of a metal phase matrix and dispersed nanocrystalline nitride phase particles. The microhardness, wear resistance, and high temperature oxidation resistance of the cermet coating are more than double that of the MCrAlY coating (M=Ni, Co, or NiCo), and are suitable for metal workpieces. The preparation method is a vacuum physical vapor deposition method using an alloy as a target material and nitrogen as a reaction gas, including but not limited to multi-arc ion plating and magnetron sputtering. Coatings that meet different requirements such as hardness, wear resistance, oxidation resistance, and hot corrosion resistance can be obtained by adjusting control parameters such as alloy target composition, vacuum chamber temperature, gas pressure, and substrate bias. The coating preparation process is simple, no subsequent treatment such as vacuum annealing is required after preparation, and the production efficiency is high.

A cermet coating of the present invention is characterized in that: the cermet coating is composed of a metal phase matrix and dispersedly distributed nanocrystalline nitride phase particles;

The metal phase (b) is an alloy phase containing solid solution strengthening alloy components or a pure metal, including but not limited to Ni when it is a pure metal;

The nitride phase (c) is dispersed in the metal phase (b), and the volume fraction of the nitride (c) is 5-60%.

The cermet coating is characterized in that: the nitride phase (c) contains at least one metal element; the grain size of the nitride phase (c) is ≤80nm.

The present invention also claims a method for preparing a cermet coating, characterized in that:

The prepared finished product is composed of a metal phase matrix and dispersed nanocrystalline nitride phase particles; the metal phase (b) is an alloy phase or a pure metal containing solid solution strengthening alloy components, and when it is a pure metal, it includes but not Limited to Ni; the nitride phase (c) is dispersed in the metal phase (b), and the volume fraction of the nitride (c) is 5-60%;

Specific use of vacuum physical vapor deposition methods, including but not limited to multi-arc ion plating, magnetron sputtering, etc.;

The preparation process consists of three steps: (1) the part must be placed in the vacuum chamber (e), (2) the reaction gas (f) is introduced into the vacuum chamber (e), (3) the substance on the surface of the target (g) A gas phase (h) is formed.

The preparation method of the cermet coating is characterized in that:

During the preparation process, the reaction gas (f) must contain nitrogen, and other gases such as argon can also be passed at the same time, and the amount of reaction gas introduced should make the pressure of the vacuum chamber ≥ 0.2Pa;

The material of the target is an alloy, and the quantity is ≥1; the alloy components of the target contain alloy components that are not easy to form or do not form nitrides, including but not limited to Ni, etc.;

During the preparation process, it is required to be able to adjust the volume fraction of the nitride phase (c) of the cermet coating (a) by changing the chemical composition of the target; during the preparation process, it is required to be able to adjust the temperature of the vacuum chamber, the gas pressure introduced, and the bias voltage of the substrate and other control parameters to adjust the volume fraction of the nitride phase (c) in the cermet coating (a).

In the preparation method of the cermet coating, further preferred requirements are:

The preparation steps are as follows: (1) Preparation of alloy target: adopt vacuum melting method to prepare multi-component alloy as cathode target; (2) Workpiece pretreatment: before coating, the sample is subjected to conventional grinding and mirror polishing treatment, and finally Ultrasonic cleaning with acetone and alcohol respectively, drying for later use; (3) coating preparation: the preparation method of the cermet coating adopts multi-arc ion plating;

The coating preparation process is specifically as follows:

First place the sample on the sample rack of the vacuum coating chamber, and then pass in Ar with a purity of 99.99% and N ₂ with a purity of 99.99% after vacuuming. The generator electrode adopts the method of arc discharge to generate a strong luminous cathode arc spot on the surface of the solid cathode target, so that the target metal is directly evaporated and ionized; at the same time, a certain negative bias is applied to the substrate to accelerate the ion beam; N ₂ It mixes with the ions of the cathode material emitted from the cathode arc spot to form a plasma, which is accelerated by a negative bias and deposited on the substrate to form a cermet coating. The specific parameters are:

Ion cleaning: vacuum: P﹤6×10 ^-3 Pa, arc current: 65-72A, substrate negative bias: 600V, cleaning time: 3min;

Coating deposition: vacuum degree: P﹤6×10 ^-3 Pa, arc current: 65-72A, arc voltage: 18-22V, substrate negative bias voltage: 100-500V, substrate temperature: 200-300 ^o C, The flow of Ar is 8-20sccm, the flow of N ₂ is 100-400sccm, the distance between the target and the substrate: 200mm, the deposition time: 1-5h.

The specific requirements for parameter control are as follows:

(1) Before coating deposition, high-purity Ar with a purity of 99.99% and N ₂ with a purity of 99.99% are introduced to perform ion cleaning and implantation on the substrate, and at the same time nitride the surface of the cathode target to effectively reduce large particles at the initial stage of deposition production;

(2) During the coating deposition process, strictly control the arc current between 65-72A, and the Ar flow rate between 8-20sccm, if the value is too high or too low, it will lead to a sharp increase of coating droplets or arc extinction, etc. Phenomenon. According to different workpiece materials, strictly control the temperature of the substrate: 200-300 ^o C, if the temperature is too low, the bonding force between the coating and the substrate will decrease, and if the temperature is too high, the substrate will soften; During the layer deposition process, the speed of rotation at 18 rpm/min is maintained to ensure uniform coating deposition;

(3) During the coating deposition process, adjust the N ₂ flow rate: the control range is 100-400sccm, the substrate bias voltage: the control range is 100-500V, the deposition time: 1-5h; to obtain the thickness, hardness, wear resistance, resistance Oxidation and hot corrosion resistance require different coatings;

(4) After the deposition is completed, the temperature of the vacuum chamber is slowly cooled, and the workpiece is taken out after it is completely cooled to prevent the workpiece from being oxidized by heat.

The cermet coating of the present invention has the following characteristics:

1. The cermet coating of the present invention is composed of metal phase and nitride, and the volume fraction of nitride is 5-60%. The cermet coating uses a metal phase as a matrix and a nanoscale nitride as a strengthening phase to form a composite structure in which the nitride is dispersed in the matrix phase. The metal phase can be pure metal or an alloy phase containing solid-solution strengthening alloy components, and the grain size of the dispersed nitride is less than 80nm.

2. The metal-ceramic coating of the present invention uses the metal phase as the matrix, so that the coating has high fracture toughness, oxidation resistance and corrosion resistance, and at the same time, due to the solid-dissolved rare earth elements in the metal phase, such as Y, it can effectively The adhesion of the oxide film is improved, thereby effectively improving the thermal crack resistance of the coating; the nitride dispersed in the matrix phase is a strengthening phase, so that the cermet coating has higher hardness and wear resistance. The microhardness, wear resistance and high-temperature oxidation resistance of the cermet coating in the present invention are more than double that of the MCrAlY coating (M=Ni, Co, or NiCo).

The preparation method of the cermet coating of the present invention determines the type of vacuum physical vapor deposition method, including but not limited to multi-arc ion plating, magnetron sputtering, etc. as the preparation technology of the cermet, and the method is characterized in that: (1) A single alloy target or multiple alloy targets are used, (2) when an alloy target is used, the alloy target contains alloy components that are not easy to form or do not form nitrides, including but not limited to Ni, etc., (3) can be passed Adjust the vacuum physical vapor deposition parameters and the chemical composition of the alloy target to obtain coatings that meet different requirements such as thickness, hardness, wear resistance, oxidation resistance and hot corrosion resistance.

The preparation method of a cermet coating of the present invention can obtain thickness, hardness, wear resistance, oxidation resistance and resistance Coatings with different requirements such as hot corrosion. The metal-ceramic coating is suitable for metal workpieces and is not limited by factors such as material structure and composition. The coating preparation process is simple, no subsequent treatment such as vacuum annealing is required after preparation, and the production efficiency is high.

In the present invention, vacuum physical vapor deposition methods, including but not limited to multi-arc ion plating, magnetron sputtering, etc., are adopted in the microhardness, wear resistance, and high temperature oxidation resistance of MCrAlY coatings compared to MCrAlY coatings. layer (M=Ni, Co, or NiCo) more than doubled. The preparation method of a cermet coating of the present invention can obtain thickness, hardness, wear resistance, oxidation resistance and thermal corrosion resistance, etc. Coatings with different requirements. The coating preparation process is simple, no subsequent treatment such as vacuum annealing is required after preparation, and the production efficiency is high.

Description of drawings

Below in conjunction with accompanying drawing and embodiment the present invention is described in further detail:

Fig. 1 adopts multi-arc ion plating technology to prepare the TEM field image photo of this cermet coating on the martensitic heat-resistant steel 1Cr16Ni2MoN substrate;

Fig. 2 is the photomicrograph that adopts multi-arc ion plating technology to prepare this cermet coating on nickel base superalloy K417 substrate;

Figure 3 is a photomicrograph of a cermet coating prepared on a nickel-based superalloy K417 substrate by multi-arc ion plating technology and oxidized at a constant temperature of 1000 ^o C for 100 h;

Figure 4 is a photomicrograph of the cermet coating prepared on the nickel K417 substrate by multi-arc ion plating technology in the environment of 900 ^o C, NaCl/Na ₂ SO ₄ (25:75wt.%) hot corrosion for 80h;

Figure 5 is a TEM field image photo of a cermet coating prepared on a glass substrate by using multi-arc ion plating technology.

Detailed ways

Example 1

The martensitic heat-resistant steel 1Cr16Ni2MoN is used as the substrate, and the multi-arc ion plating technology is used as the preparation method of the ceramic coating. The preparation process is as follows:

(1) Preparation of alloy target (taking NiCrAlSiY alloy target as an example): Ni-Cr-Al-Si-Y multi-component alloy prepared by vacuum melting method is used as cathode target material, and its alloy composition is: 8～13wt .% Al, 20-26 wt.% Cr, 0.5-1.0 wt.% Si, about 0.5 wt.% Y, the balance being Ni, and the total content of Al and Cr is 31-37 wt.%;

(2) Pre-treatment of parts: Before coating, the parts are subjected to conventional grinding and mirror polishing, and finally ultrasonically cleaned with acetone and alcohol respectively, and dried for later use;

(3) Coating preparation: the sample is placed on the sample holder of the vacuum coating chamber, and high-purity Ar (purity 99.99%) and N ₂ (purity 99.99%) are introduced after vacuuming. In this method, an intensely luminescent cathode arc spot is generated on the surface of the NiCrAlSiY solid cathode target, so that the target metal is directly evaporated and ionized. At the same time, a certain negative bias voltage is applied to the substrate to accelerate the ion beam. _N2 mixes with the ions of the cathode material emitted from the cathode arc spot to form a plasma, which is accelerated by a bias voltage and deposited on the substrate to form a cermet coating. The specific parameters are:

Ion cleaning: vacuum: P﹤6×10 ^-3 Pa, arc current: 65-72A, substrate negative bias: 600V, cleaning time: 3min.

Coating deposition: vacuum degree: P﹤6×10 ^-3 Pa, arc current: 65-72A, substrate negative bias voltage: 100V, substrate temperature: 210 ^o C, Ar flow rate is 8 sccm, N2 flow rate is 225 sccm, target Material and substrate distance: 200mm, deposition time: 3h.

The TEM field phase of the coating is shown in Figure 1. Nitride with a grain size smaller than 30nm is diffusely distributed on the matrix phase Ni of the coating, and the volume fraction of nitride is about 35%. The deposition rate is 183.3nm/min, and the coating is γ-Ni, CrN and AlN phases. The nitrogen content of the coating is 19.43 at%, and the Al and Cr contents are: 14.40 at.% and 18.60 at.%, respectively. The hardness of the coating is 889.6 HV _25gf , and the wear amount of the coating is 11.0×10 ^-3 mm ³ /m when the load is 10N.

Example 2

The nickel-based superalloy K417 is used as the substrate, and the multi-arc ion plating technology is used as the preparation method of the ceramic coating. The preparation process is as follows:

(1) The preparation of the alloy target is the same as in Example 1;

(2) Part pretreatment is the same as embodiment 1;

(3) Coating preparation: The substrate negative bias voltage was 300V during coating deposition, and other process parameters were the same as in Example 1.

The deposition rate of the coating is 148.9nm/min, and the coating is γ-Ni, CrN and AlN phases, and its microstructure is shown in Figure 2. The nitrogen content of the coating is 15.40 at.%, and the Al and Cr contents are 14.88 at.% and 16.87 at.%, respectively. The hardness of the coating is 970.2 HV _25gf , and the wear amount of the coating is 6.96×10 ^-3 mm ³ /m when the load is 10N. After the sample was oxidized at a constant temperature of 1000 ^o C for 100 hours, a thin continuous and dense aluminum oxide film was formed on the surface of the coating, and the oxidation weight gain per unit area of the sample was 0.34mg/cm ² .

Example 3

The ceramic coating is prepared by using the nickel-based superalloy K438 as the substrate and adopting multi-arc ion plating technology, and the preparation process is the same as that in Example 2.

The deposition rate of the coating is 145.4 nm/min, and the coating is γ-Ni, CrN and AlN phases. The nitrogen content of the coating is 16.35 at.%, and the Al and Cr contents are 14.18 at.% and 16.14 at.%, respectively. The hardness of the coating is 980.6 HV _25gf , and the wear amount of the coating is 6.04×10 ^-3 mm ³ /m when the load is 10N. After the sample was oxidized at a constant temperature of 1000 ^o C for 100 hours, a thin continuous and dense aluminum oxide film was formed on the surface of the coating, and the oxidation weight gain per unit area of the sample was 0.37mg/cm ² .

Example 4

The nickel-based superalloy K417 is used as the substrate, and the multi-arc ion plating technology is used as the preparation method of the ceramic coating. The preparation process is as follows:

(1) The preparation of the alloy target is the same as in Example 1;

(2) Part pretreatment is the same as embodiment 1;

(3) Coating preparation: The substrate negative bias voltage was 400V during coating deposition, and other process parameters were the same as in Example 1.

The deposition rate of the coating is 112.8 nm/min, and the coating is γ-Ni, CrN and AlN phases. The nitrogen content of the coating is 14.01 at.%, and the Al and Cr contents are 14.91 at.% and 17.87 at.%, respectively. The hardness of the coating is 824.7 HV _25gf , and the wear amount of the coating is 8.46×10 ^-3 mm ³ /m when the load is 10N. The microstructure of the sample was oxidized at 1000 ^o C for 100 hours, as shown in Figure 3. A thin continuous and dense aluminum oxide film was formed on the coating surface. mg/cm ² .

Example 5

The nickel-based superalloy K417 is used as the substrate, and the multi-arc ion plating technology is used as the preparation method of the ceramic coating. The preparation process is as follows:

(1) The preparation of the alloy target is the same as in Example 1;

(2) Part pretreatment is the same as embodiment 1;

(3) Coating preparation: _N flow during coating deposition was 300 sccm, and other process parameters were the same as in Example 1.

The deposition rate of the coating is 236.7 nm/min, and the coating is γ-Ni, CrN and AlN phases. The nitrogen content of the coating is 20.08 at.%, and the Al and Cr contents are 10.97 at.% and 18.64 at.%, respectively. The hardness of the coating is 787.4 HV _25gf , and the wear amount of the coating is 8.78×10 ^-3 mm ³ /m when the load is 10N. After the sample was oxidized at a constant temperature of 1000 ^o C for 100 hours, a thin continuous and dense aluminum oxide film was formed on the surface of the coating, and the oxidation weight gain per unit area of the sample was 0.45mg/cm ² .

Example 6

The nickel-based superalloy K417 is used as the substrate, and the multi-arc ion plating technology is used as the preparation method of the ceramic coating. The preparation process is as follows:

(1) The preparation of the alloy target is the same as in Example 1;

(2) Part pretreatment is the same as embodiment 1;

(3) Coating preparation: the deposition time is 5h, and other process parameters are the same as in Example 1.

The coating thickness was 28 μm. After pre-oxidation at 1000 ^o C for 1 hour, the coating was coated with 25%NaCl+75%Na ₂ SO ₄ (wt.%) salt, the amount of salt applied was 1.5-2.5 mg/cm ² , after 80 hours of hot corrosion test at 900 ^o C The thickness of the oxide film is 3.3 μm, and the microstructure photo is shown in Figure 4. A single aluminum oxide film is formed on the surface of the coating. Weight gain per unit area of sample at 80h: 0.27mg/cm ² . After 100 hours of testing, the thickness of the oxide film was 4.5 μm. Due to the large consumption of Al in the coating, it was not enough to form a continuous protective aluminum oxide film. Cr diffused outwards to form chromium oxide, and the outer layer of the formed oxide film was chromium oxide. The layer is a double-layer structure of alumina. 100h sample weight gain per unit area: 1.7mg/cm ² .

Example 7

The martensitic heat-resistant steel 1Cr16Ni2MoN is used as the substrate, and the multi-arc ion plating technology is used as the preparation method of the ceramic coating, and the preparation process is the same as that in Example 2.

The crack resistance of the CrN coating was compared with that of the prepared cermet coating. The sample was subjected to a thermal shock test at 800 ^o C. After holding for 10 minutes, it was taken out and quenched. After 14 thermal shocks, it was found that the surface edge of the sample coated with CrN coating was The peeling phenomenon appeared at the corner, but the sample coated with cermet coating did not appear peeling phenomenon. The sample was subjected to a thermal shock test at 1000 ^o C, and after 10 minutes of heat preservation, it was taken out and quenched. The sample is weighed every two tests, and it is found by optical microscope observation that serious peeling occurs on the surface of the CrN coating after one thermal shock, while the cermet coating prepared by the present invention is coated after ten thermal shocks. There is no peeling phenomenon on the surface. After 2 and 10 thermal shocks, the mass changes per unit area of the CrN-coated samples were 0.0144 mg/cm ² and -0.3515 mg/cm ² , respectively. After 2 and 10 thermal shocks, the mass changes per unit area of the samples coated with the cermet coating were 0.0091 mg/cm ² and 0.0401 mg/cm ² respectively.

Example 8

The nickel-based superalloy K438 is used as the substrate, and the magnetron sputtering technology is used as the preparation method of the ceramic coating. The preparation process is as follows:

(1) The preparation of the alloy target is the same as in Example 1;

(2) Part pretreatment is the same as embodiment 1;

(3) Coating preparation: Nitrogen (purity: 99.99%) is used as the reaction gas, and argon (purity: 99.99%) is used as the sputtering gas. Put the parts into the magnetron sputtering reaction chamber, the vacuum degree in the chamber reaches 6×10 ^-3 Pa, the chamber is heated to 200 ^o C, and the substrate is etched for 30 minutes before deposition. The process parameters are: the sputtering pressure is 0.20Pa, the substrate bias is 300V, the target-substrate distance is 150mm, the N ₂ flow rate is 450 sccm, the sputtering power is 2kw, and the deposition time is 4h.

The deposition rate of the coating is 62.5 nm/min, and the coating exists in the form of columnar crystals, which are γ-Ni, CrN and AlN phases. The nitrogen content of the coating is 14.40 at.%, and the Al and Cr contents are 16.88 at.% and 16.95 at.%, respectively. The hardness of the coating is 981.2 HV _25gf , and the wear amount of the coating is 6.67×10 ^-3 mm ³ /m when the load is 10N. After the sample was oxidized at a constant temperature of 1000 ^o C for 100 hours, a thin continuous and dense aluminum oxide film was formed on the surface of the coating, and the oxidation weight gain per unit area of the sample was 0.41mg/cm ² .

Example 9

The nickel-based superalloy K417 is used as the substrate, and the magnetron sputtering technology is used as the preparation method of the ceramic coating, and the preparation process is the same as that in Example 8.

The deposition rate of the coating is 59.5 nm/min, and the coating exists in the form of columnar crystals, which are γ-Ni, CrN and AlN phases. The nitrogen content of the coating is 14.82 at.%, and the Al and Cr contents are 15.97 at.% and 17.05 at.%, respectively. The hardness of the coating is 984.2 HV _25gf , and the wear amount of the coating is 6.83×10 ^-3 mm ³ /m when the load is 10N. After the sample was oxidized at a constant temperature of 1000 ^o C for 100 hours, a thin continuous and dense aluminum oxide film was formed on the surface of the coating, and the oxidation weight gain per unit area of the sample was 0.43mg/cm ² .

Claims (2)

1. a metal-ceramic coating preparation method is characterized in that:

This metal-ceramic coating is by metallographic phase parent and the disperse nanocrystalline Nitride Phase granulometric composition that distributes;

Described metallographic phase (b) is alloy phase or pure metal containing the solid solution strengthened alloy constituent element;

Nitride Phase (c) disperse is distributed in metallographic phase (b), and wherein the volume fraction of Nitride Phase (c) is 5～60%;

Nitride Phase (c) is containing at least one metallic element; Nitride Phase (c) grain-size≤80nm;

The concrete physical vacuum vapour deposition type method that uses;

Preparation process comprises three steps: (1) part must be placed in vacuum chamber (e), and (2) pass into reactant gases (f) in vacuum chamber (e), and (3) make the material on target (g) surface form gas phase (h);

In preparation process, reactant gases (f) must also can lead to argon gas containing nitrogen simultaneously, and the amount of reactant gases passed into should make the air pressure >=0.2Pa of vacuum chamber;

The material of target is alloy, quantity >=1; The alloy constituent element of target is containing the alloy constituent element that is difficult for forming or not forming nitride;

In preparation process, requirement can pass through to change the chemical composition of target to regulate Nitride Phase (c) volume fraction of metal-ceramic coating (a); In preparation process, requirement can be regulated vacuum chamber temperature, the gaseous tension passed into, substrate bias control parameter to regulate Nitride Phase (c) volume fraction in metal-ceramic coating (a).

2. according to the described metal-ceramic coating preparation method of claim 1, it is characterized in that:

Preparation process is as follows: the preparation of (1) alloy target material: adopt the method for vacuum melting to prepare multicomponent alloy as cathode targets; (2) workpiece pre-treatment: before plated film, sample is carried out to conventional polishing, mirror polish processing, finally use respectively acetone and alcohol ultrasonic cleaning, dry up standby; (3) coating preparation: the preparation method of described metal-ceramic coating adopts multi-arc ion coating;

The coating preparation process is specially:

At first sample is placed on the specimen holder of vacuum film coating chamber, passes into the Ar of purity 99.99% and the N of purity 99.99% after vacuumizing ₂, the amount of reactant gases passed into should make the air pressure>=0.2Pa of vacuum chamber; Then utilize and inspire electrode, adopt the method for arc-over, produce the cathodic arc spot of strong luminescence at the solid state cathode target material surface, make the target metal directly evaporate and ionize; Substrate is applied to certain negative bias simultaneously, ionic fluid is accelerated; N ₂form plasma body with the Ar ion mixing of the cathode substance of emitting from cathodic arc spot, after negative bias is accelerated, be deposited on substrate and form metal-ceramic coating, design parameter is:

Ion Cleaning: vacuum tightness: P ﹤ 6 * 10 ^-3pa, flame current: 65-72A, Substrate negative bias voltage: 600V, scavenging period: 3min;

Coating deposition: vacuum tightness: P ﹤ 6 * 10 ^-3pa, flame current: 65-72A, arc voltage: 18-22V, Substrate negative bias voltage: 100-500V, substrate temperature: 200-300 ℃, the Ar flow is 8-20sccm, N ₂flow is 100-400sccm, target and matrix distance: 200mm, depositing time: 1-5h;

The specific requirement that relevant parameters is controlled is as follows:

(1) before the coating deposition, pass into purity 99.99% high-purity Ar and purity 99.99%N ₂, substrate is carried out to Ion Cleaning and injection effect, make the nitrogenize of cathode targets top layer simultaneously, effectively reduce the oarse-grained generation of deposition initial stage;

(2) in being coated with layer deposition process, strictly arc current is controlled between 65-72A, the Ar flow is between 8-20sccm, and the too high or too low coating molten drop that all can cause of its numerical value increases severely or the blow-out phenomenon;

According to the different workpieces material, strictly control the temperature of substrate: 200-300 ℃; The speed rotation of specimen holder maintenance 18rpm/min in the process of Ion Cleaning, coating deposition of workpiece is housed, to guarantee the coating deposition evenly;

(3), in being coated with layer deposition process, adjust N ₂flow: modification scope 100-400sccm, substrate bias: modification scope 100-500V, depositing time: 1-5h; To obtain thickness, hardness, wear resistance, coating that oxidation-resistance is different with the corrosion and heat resistant requirement;

(4) after deposition finishes, make the vacuum chamber slow cooling, take out after workpiece is fully cooling, to prevent workpiece, be subject to thermooxidizing.

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