CN102446948B - Light emitting element - Google Patents
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- CN102446948B CN102446948B CN201010506242.XA CN201010506242A CN102446948B CN 102446948 B CN102446948 B CN 102446948B CN 201010506242 A CN201010506242 A CN 201010506242A CN 102446948 B CN102446948 B CN 102446948B
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Abstract
Description
技术领域 technical field
本发明涉及一种发光元件及其制造方法,更具体而言,是涉及一种利用外部电极提升出光效率的发光元件。The present invention relates to a light-emitting element and a manufacturing method thereof, and more specifically, to a light-emitting element that utilizes an external electrode to improve light extraction efficiency.
背景技术 Background technique
近年来,由于外延与工艺技术的进步,使发光二极管(light emittingdiode,简称LED)成为极具潜力的固态照明光源之一。基于物理机制的限制,LED仅能以直流电驱动,因此,任何以LED作为光源的照明设计中,都需要与整流及降压等电子元件搭配,以将电力公司直接提供的交流电转换为LED可使用的直流电源。然而增加整流及降压等电子元件,除造成照明成本的增加外,整流及降压等电子元件的低交流直流转换效率、偏大的体积等均会影响LED使用于日常照明应用时的可靠度与使用寿命。In recent years, due to the advancement of epitaxy and process technology, light emitting diodes (light emitting diodes, referred to as LEDs) have become one of the most promising solid-state lighting sources. Due to the limitation of physical mechanism, LED can only be driven by DC. Therefore, in any lighting design using LED as light source, it needs to be matched with electronic components such as rectification and step-down to convert the AC directly provided by the power company into LED. DC power supply. However, the addition of electronic components such as rectification and step-down will not only increase the cost of lighting, but also the low AC-DC conversion efficiency and large size of electronic components such as rectification and step-down will affect the reliability of LEDs in daily lighting applications. and service life.
交流发光二极管(ACLED)元件不需外加整流与降压等电子元件便可直接操作于交流电源,未来极有潜力成为定点固态照明的主要产品。而ACLED适用的操作瓦数、芯片尺寸、效率与良率提升等因素对于该元件未来的实用性与普及性则有着举足轻重的影响。AC light-emitting diode (ACLED) components can be directly operated on AC power without additional electronic components such as rectification and step-down, and have great potential to become the main product of fixed-point solid-state lighting in the future. Factors such as the applicable operating wattage, chip size, efficiency and yield improvement of ACLEDs will have a decisive impact on the future practicability and popularity of the device.
ACLED目前主要有两种结构:其一为在电路上做反向串并联的设计,另一为在电路上做惠氏电桥(桥式电路)的设计。反向串并联的设计于操作时仅有50%的LED管芯被点亮,而惠氏电桥(桥式电路)的设计则于同一时间内能点亮桥式结构中一半的管芯以及桥式电路所电连接的管芯。相较之下,惠氏电桥(桥式电路)的设计可增加发光面积,有利于ACLED效率提升。ACLED currently has two main structures: one is the reverse series-parallel design on the circuit, and the other is the design of a Whitworth bridge (bridge circuit) on the circuit. In the reverse series-parallel design, only 50% of the LED dies are lit during operation, while the design of the Wyeth bridge (bridge circuit) can light up half of the dies and the bridge in the bridge structure at the same time. The die to which the circuit is electrically connected. In contrast, the design of the Wyeth bridge (bridge circuit) can increase the light-emitting area, which is conducive to the improvement of ACLED efficiency.
然而在ACLED结构中,不论反向串并联的设计或是惠氏电桥(桥式电路)的设计皆需要LED管芯间的电性连接层。如图1所示,为已知的AC LED电极配置方式示意图,其中电极32为ACLED中的电性连接层,而1a~1k,1m,1n,1p,1q,1r等则为ACLED管芯未被电极覆盖的发光区域。由图1所示可以发现,ACLED中各管芯间的电性连接层遮蔽了管芯相当比例的发光区域,而此电性连接结构同时也造成区域性遮光致使发光效率大幅降低。However, in the ACLED structure, no matter the reverse series-parallel design or the Wyeth bridge (bridge circuit) design, an electrical connection layer between LED dies is required. As shown in Figure 1, it is a schematic diagram of the known AC LED electrode configuration method, in which the electrode 32 is the electrical connection layer in the ACLED, and 1a~1k, 1m, 1n, 1p, 1q, 1r, etc. are the ACLED tube cores. The light-emitting area covered by electrodes. As shown in FIG. 1 , it can be found that the electrical connection layer between the dies in the ACLED shields a considerable proportion of the light-emitting area of the dies, and this electrical connection structure also causes regional light-shielding and greatly reduces the luminous efficiency.
发明内容 Contents of the invention
本发明提出具有低遮光效应的发光二极管及其制造方法。The invention proposes a light-emitting diode with low shading effect and a manufacturing method thereof.
本发明提出一种发光元件,其包含发光二极管芯片、基板以及接合层,其中发光二极管芯片包含多个发光二极管单元、多个电极以及至少一电性连接层,发光二极管单元间经电性连接层彼此电性连接,并通过接合层与基板接合;基板内具有多个通道,其上具有多个外部电极以供应发光元件发光所需电力。The present invention proposes a light-emitting element, which includes a light-emitting diode chip, a substrate, and a bonding layer. They are electrically connected to each other, and bonded to the substrate through the bonding layer; there are multiple channels in the substrate, and multiple external electrodes on it to supply the power required for the light-emitting element to emit light.
本发明还提出一种发光元件,包括发光二极管芯片、次载体(sub-mount)以及至少一导电材(solder)。次载体可具有至少一电路,导电材位于次载体上,通过导电材将发光二极管芯片粘结及/或固定于次载体上,并使发光二极管芯片与次载体形成电性连接。其中,次载体可以是导线架(lead frame)或大尺寸镶嵌基底(mounting substrate),以方便发光二极管结构的电路规划并提高其散热效果。The present invention also provides a light-emitting device, including a light-emitting diode chip, a sub-mount, and at least one conductive material (solder). The sub-carrier may have at least one circuit, the conductive material is located on the sub-carrier, the LED chip is bonded and/or fixed on the sub-carrier through the conductive material, and the LED chip is electrically connected to the sub-carrier. Wherein, the secondary carrier may be a lead frame or a large-sized mounting substrate, so as to facilitate the circuit planning of the light-emitting diode structure and improve its heat dissipation effect.
本发明另提出一种发光元件,透过电性连接结构的排列,电性连接发光二极管芯片内的各发光二极管单元,以使各发光二极管单元间彼此串联,并联或串并联接;各发光二极管单元间亦可电性连接为惠氏电桥(桥式电路)。此外,亦可于各发光二极管单元间填入荧光粉及/或散射粒子(scatteringparticle),以增加发光二极管元件的发光效率,并/或进行光线波长转换以实现混光。The present invention also proposes a light-emitting element, which is electrically connected to each LED unit in the LED chip through the arrangement of the electrical connection structure, so that each LED unit is connected in series, in parallel or in series-parallel; each LED Units can also be electrically connected as a Wyeth bridge (bridge circuit). In addition, fluorescent powder and/or scattering particles can also be filled between each LED unit to increase the luminous efficiency of the LED element, and/or perform light wavelength conversion to realize light mixing.
本发明另提出形成发光元件的方法。首先,在生长基板上形成n型半导体层、有源层以及p型半导体层;除去部分n型半导体层、有源层以及p型半导体层以形成多个发光二极管单元;除去每一发光二极管单元内部分的有源层以及p型半导体层,以暴露n型半导体层的部分上表面;于n型半导体层暴露的表面形成n型电极,在p型半导体层的表面形成p型电极;于发光二极管单元间形成绝缘结构;于发光二极管单元间形成电性连接结构;涂布绝缘材料于发光二极管芯片具有电性连接结构的一侧;于发光二极管芯片相对于绝缘结构的另一侧形成反射层;于反射层相对于发光二极管芯片的另一侧形成接合层(bonding layer);利用接合层与永久基板接合;于生长基板内与发光二极管芯片电极的对应处形成多个通道;透过多个通道电性连接发光二极管芯片的电极至生长基板的对侧;于生长基板的对侧上对应多个通道的部分,分别形成对应发光二极管芯片电极的多个外部电极。The invention also proposes a method for forming a light emitting element. First, an n-type semiconductor layer, an active layer, and a p-type semiconductor layer are formed on a growth substrate; a part of the n-type semiconductor layer, an active layer, and a p-type semiconductor layer are removed to form a plurality of light emitting diode units; each light emitting diode unit is removed The active layer and the p-type semiconductor layer of the inner part are to expose part of the upper surface of the n-type semiconductor layer; an n-type electrode is formed on the exposed surface of the n-type semiconductor layer, and a p-type electrode is formed on the surface of the p-type semiconductor layer; An insulating structure is formed between the diode units; an electrical connection structure is formed between the light-emitting diode units; an insulating material is coated on one side of the light-emitting diode chip with the electrical connection structure; a reflective layer is formed on the other side of the light-emitting diode chip opposite to the insulating structure ; form a bonding layer on the other side of the reflective layer relative to the light-emitting diode chip; use the bonding layer to bond with the permanent substrate; form a plurality of channels in the growth substrate corresponding to the electrodes of the light-emitting diode chip; The channels electrically connect the electrodes of the LED chip to the opposite side of the growth substrate; on the opposite side of the growth substrate corresponding to the plurality of channels, a plurality of external electrodes corresponding to the electrodes of the LED chip are respectively formed.
附图说明 Description of drawings
图1为已知的AC LED电极配置方式示意图。Figure 1 is a schematic diagram of a known AC LED electrode configuration.
图2为本发明所披露的发光元件100的示意图。FIG. 2 is a schematic diagram of a light emitting device 100 disclosed in the present invention.
图3A-3G为本发明所披露形成发光元件100的方法示意图。3A-3G are schematic diagrams of the method for forming the light-emitting device 100 disclosed in the present invention.
图4为另一发光元件200的结构示意图。FIG. 4 is a schematic structural diagram of another light emitting element 200 .
图5为另一发光元件300的结构示意图。FIG. 5 is a schematic structural diagram of another light emitting element 300 .
图6为另一发光元件300另一实施的结构示意图。FIG. 6 is a schematic structural diagram of another implementation of another light emitting element 300 .
图7A所示为另一发光元件400的俯视图。FIG. 7A is a top view of another light emitting element 400 .
图7B所示为另一发光元件400的A-A’-A”剖面图。FIG. 7B is an A-A'-A" cross-sectional view of another light-emitting element 400.
附图标记说明Explanation of reference signs
100:发光元件100: light emitting element
110:发光二极管芯片110: LED chip
120:绝缘层120: insulating layer
130:反射层130: reflective layer
140:接合层140: bonding layer
150:永久基板150: permanent substrate
111:生长基板111: Growth substrate
112:发光二极管单元112: LED unit
112a:n型半导体层112a: n-type semiconductor layer
112b:有源层112b: active layer
112c:p型半导体层112c: p-type semiconductor layer
113a、113b:电极113a, 113b: electrodes
114:绝缘结构114: Insulation structure
115:电性连接结构115: Electrical connection structure
116:通道116: channel
117:外部电极117: External electrode
200:发光元件200: light emitting element
250:永久基板250: permanent substrate
300:发光元件300: light emitting element
310:次载体310: secondary carrier
320:导电材320: Conductive material
330:导热结构330: Thermal conduction structure
400:发光元件400: light emitting element
411、412:发光二极管单元群411, 412: LED unit group
420:电性接点420: electrical contacts
B、C、D:节点B, C, D: nodes
B’、C’、D’:节点B', C', D': nodes
具体实施方式 Detailed ways
请见图2所示,为本发明所披露的发光元件100的示意图,发光元件100包括发光二极管芯片110、绝缘层120、反射层130、接合层140以及永久基板150。Please refer to FIG. 2 , which is a schematic diagram of a light emitting device 100 disclosed in the present invention. The light emitting device 100 includes a light emitting diode chip 110 , an insulating layer 120 , a reflective layer 130 , a bonding layer 140 and a permanent substrate 150 .
发光二极管芯片110一侧的表面具有绝缘层120,以隔绝发光二极管芯片110与反射层130、接合层(bonding layer)140以及永久基板150间的电性传导。绝缘层120相对于发光二极管芯片110的另一侧具有反射层130,反射层130用以将发光二极管芯片110所产生的光线反射至同一侧,以增加发光元件100的出光效率(light extraction efficiency),反射层130相对于发光二极管芯片110的另一侧具有接合层140,接合层140接合永久基板150以及发光二极管芯片110。本实施例中,永久基板150可例如为硅基板。The surface of one side of the LED chip 110 has an insulating layer 120 to isolate the electrical conduction between the LED chip 110 and the reflective layer 130 , the bonding layer 140 and the permanent substrate 150 . The insulating layer 120 has a reflective layer 130 on the other side of the LED chip 110. The reflective layer 130 is used to reflect the light generated by the LED chip 110 to the same side, so as to increase the light extraction efficiency of the light emitting element 100. The reflective layer 130 has a bonding layer 140 on the other side of the LED chip 110 , and the bonding layer 140 bonds the permanent substrate 150 and the LED chip 110 . In this embodiment, the permanent substrate 150 may be, for example, a silicon substrate.
发光二极管芯片110包括生长基板111、多个发光二极管单元112、多个电极113a以及113b、绝缘结构114、电性连接结构115、通道116以及外部电极117。发光二极管单元112例如可通过有机金属化学气相沉积法(Metal-Organic Chemical Vapor Deposition)外延成长于生长基板111上。于本实施例中,发光二极管单元112至少包括n型半导体层112a、有源层(activelayer)112b以及p型半导体层112c,依序成长于生长基板111上,其中有源层112b可包括多重量子阱结构(multiple quantum well),n型半导体层112a与生长基板间尚可利用离子掺杂或其他生长方式形成缓冲层(buffer layer),p型半导体层112c相对于有源层112b的另一侧上可进一步形成电流分散层,以使电流更加平均地扩散至有源层112b。电极113a为n型电极,位于n型半导体层112a上,电极113b为p型电极,位于p型半导体层112c上,电极113a与电极113b优选地需要与n型半导体层112a以及p型半导体层112c分别形成欧姆接触(ohmic contact)。发光二极管单元112间具有绝缘结构114,在本实施例中,绝缘结构114的宽度需足以隔绝绝缘结构114两侧的发光二极管单元112间非通过电性连接结构115传导的电性,形成有效绝缘。透过绝缘结构114,得以提供发光二极管单元112所需的静电与短路保护,使得发光二极管单元112的侧面,尤其是有源层(active layer)112b不被异常电性传导状况所影响或破坏。本实施例中,绝缘结构114可由实施旋涂式玻璃法(Spin-on glass)达成局部性的(Locally)平坦化。The LED chip 110 includes a growth substrate 111 , a plurality of LED units 112 , a plurality of electrodes 113 a and 113 b , an insulating structure 114 , an electrical connection structure 115 , channels 116 and external electrodes 117 . The LED unit 112 can be epitaxially grown on the growth substrate 111 by Metal-Organic Chemical Vapor Deposition, for example. In this embodiment, the LED unit 112 at least includes an n-type semiconductor layer 112a, an active layer 112b, and a p-type semiconductor layer 112c, which are sequentially grown on the growth substrate 111, wherein the active layer 112b may include multiple quantum In a multiple quantum well structure, a buffer layer (buffer layer) can be formed between the n-type semiconductor layer 112a and the growth substrate by ion doping or other growth methods, and the other side of the p-type semiconductor layer 112c relative to the active layer 112b A current spreading layer may be further formed on the active layer 112b to spread the current more evenly to the active layer 112b. The electrode 113a is an n-type electrode located on the n-type semiconductor layer 112a, and the electrode 113b is a p-type electrode located on the p-type semiconductor layer 112c. Respectively form ohmic contact (ohmic contact). There is an insulating structure 114 between the light-emitting diode units 112. In this embodiment, the width of the insulating structure 114 needs to be sufficient to isolate the electrical properties between the light-emitting diode units 112 on both sides of the insulating structure 114 that are not conducted through the electrical connection structure 115 to form effective insulation. . Through the insulating structure 114, the static electricity and short-circuit protection required by the LED unit 112 can be provided, so that the sides of the LED unit 112, especially the active layer 112b, are not affected or damaged by abnormal electrical conduction conditions. In this embodiment, the insulating structure 114 can be locally planarized by implementing a spin-on glass method.
绝缘结构114的一侧具有电性连接结构115,以电性连接发光二极管单元112中的发光二极管单元的n型电极113a与另一发光二极管单元的p型电极113b,重复此连接方式,由此以串联或并联方式连接发光二极管芯片110内的各发光二极管单元112,以构成各发光二极管单元112间彼此串联、并联、串并联接或反向串并联接的发光二极管芯片110。此外,各发光二极管单元112间可以电性串联(electrically connecting in series)成为具有多个发光二极管单元的的单芯片(Multiple-dies Chip,MC);配合工作电压,以单一单芯片结构或是组合多个单芯片结构可应用于直流电源或是经过整流之后的交流电源上。亦可于单一单芯片里电性连接多个发光二极管单元112为包含惠氏电桥(桥式电路)的电性布局,以应用于交流电源上。透过电性连接结构115,各发光二极管单元112间彼此电性连接,在实施例中,上述的电性连结状况使得发光二极管芯片110通过两电极(即为电性连接后的发光二极管单元112中发光二极管单元112的n型电极以及另一发光二极管单元112的p型电极)即可供应各发光二极管单元112所需的操作电力。One side of the insulating structure 114 has an electrical connection structure 115 to electrically connect the n-type electrode 113a of one of the LED units 112 with the p-type electrode 113b of another LED unit, and repeat this connection, thereby The LED units 112 in the LED chip 110 are connected in series or in parallel to form the LED chip 110 in which the LED units 112 are connected in series, parallel, series-parallel or reverse series-parallel. In addition, the light-emitting diode units 112 can be electrically connected in series (electrically connecting in series) to form a single chip (Multiple-dies Chip, MC) with multiple light-emitting diode units; Multiple monolithic structures can be applied to DC power or rectified AC power. It is also possible to electrically connect a plurality of LED units 112 in a single chip to form an electrical layout including a Wyeth bridge (bridge circuit), so as to be applied to an AC power supply. Through the electrical connection structure 115, the light emitting diode units 112 are electrically connected to each other. In the embodiment, the above-mentioned electrical connection makes the light emitting diode chip 110 pass through the two electrodes (that is, the light emitting diode unit 112 after being electrically connected) The n-type electrode of the middle LED unit 112 and the p-type electrode of the other LED unit 112 ) can supply the operating power required by each LED unit 112 .
本实施例中,生长基板111为蓝宝石(Sapphire)基板,经研磨后的优选厚度约为10μm。生长基板111具有贯通及/或穿透生长基板111的多个通道116,其中贯通是指直线式的通过,而穿透是指非均匀或非直线式的通过,但仍贯通生长基板111。通道116是于生长基板111内与多个外部电极117的对应处形成,通道116内具有导电性材料,以电性连接外部电极117以及发光二极管单元112,外部电极117位于生长基板111上,与发光二极管芯片110的电极电性连接,使发光二极管芯片110得通过外部电极117以及通道116内的导电材料获得电源供应。值得注意的是,发光二极管单元112间的电性连接可通过电性连接结构115直接形成,各发光二极管单元112无须再单独形成电极,仅需在对应外部电极117的位置上形成电极以提供电性连接即可,因此可以减少制作程序并增加发光二极管芯片的可靠性。In this embodiment, the growth substrate 111 is a sapphire substrate, and the preferred thickness after grinding is about 10 μm. The growth substrate 111 has a plurality of passages 116 passing through and/or penetrating the growth substrate 111 , wherein through refers to passing in a straight line, and through refers to passing in a non-uniform or non-linear manner, but still passes through the growth substrate 111 . The channel 116 is formed in the growth substrate 111 corresponding to the plurality of external electrodes 117. There is a conductive material in the channel 116 to electrically connect the external electrodes 117 and the light emitting diode unit 112. The external electrode 117 is located on the growth substrate 111, and The electrodes of the LED chip 110 are electrically connected, so that the LED chip 110 can obtain power supply through the external electrode 117 and the conductive material in the channel 116 . It is worth noting that the electrical connection between the LED units 112 can be directly formed through the electrical connection structure 115, and each LED unit 112 does not need to form an electrode separately, but only needs to form an electrode at a position corresponding to the external electrode 117 to provide electricity. Only a single connection is required, so the manufacturing process can be reduced and the reliability of the light-emitting diode chip can be increased.
请见图3A-3G所示,为本发明所披露形成发光元件100的方法示意图。首先,在图3A中,在生长基板111上依序形成n型半导体层112a、有源层112b以及p型半导体层112c;接着,除去部分n型半导体层112a、有源层112b以及p型半导体层112c,形成彼此间具有绝缘结构114隔绝的多个以形成多个外延结构,本实施例中,绝缘结构114深达n型半导体层112a底部的生长基板;其后,在图3B中,除去每一外延结构内部分的有源层112b以及p型半导体层112c,使部分n型半导体层112a的上表面暴露于外;于图3C中,在n型半导体层112a暴露的表面形成n型电极113a,在p型半导体层112c的表面形成p型电极113b,以形成发光二极管单元112;于图3D中,在发光二极管单元112间形成绝缘结构114,绝缘结构114可仅沿着发光二极管单元112的侧面形成,或是进一步覆盖p型半导体层112c的表面;接着形成电性连接结构115,以使每一发光二极管单元112彼此电性连接,电性连接结构115的连接方式为电性连接发光二极管单元112的n型电极113a以及另一发光二极管单元112的p型电极113b。或于各发光二极管单元112上不形成电极,直接以电性连接结构115电性连接各发光二极管单元112,以串联或并联方式电性连接发光二极管芯片110内的各发光二极管单元112,以构成各发光二极管单元112间彼此串联、并联或串并联接的发光二极管芯片110,各发光二极管单元112间亦可以串联成为具有多个发光二极管单元的单芯片(Multiple-dies Chip,MC),配合工作电压,以单一单芯片结构或是组合多个单芯片结构以应用于直流电源或是经过整流之后的交流电源上。亦可于单芯片结构里电连接各发光二极管单元112为包含惠氏电桥(桥式电路)的状态,以应用于交流电源上。电性连接结构115部分或全部形成于绝缘结构114上,以通过绝缘结构114隔绝非通过电连接结构115传导的电性,形成有效绝缘,以避免发光二极管单元112受到损害。经过上述步骤完成发光二极管芯片110的结构后,在图3E中,在发光二极管芯片110具有电性连接结构115的侧涂布绝缘层120;于绝缘层120相对于发光二极管芯片110的另一侧形成反射层130,或形成多层具有不同折射率而可以折射由发光二极管芯片110射出光线的结构,例如布拉格反射层(BraggReflection Layer);其后,在反射层130相对于绝缘层120的另一侧形成接合层(bonding layer)140,例如晶片接合层(wafer bonding layer)或金属接合层(metal bonding layer);于图3F中,利用接合层140与永久基板150接合,本实施例中,是以晶片接合方式接合永久基板150以及接合层140,但亦不以此为限,其中永久基板150为硅基板;完成接合后,将生长基板111利用研磨等方法薄化,优选地可薄化至10μm;之后于图3G中,利用蚀刻等方式,在生长基板111内与发光二极管芯片110的多个电极的对应处,形成贯通/穿透生长基板111的多个通道116;利用于通道116内填入导电性材料的方式,电性连接发光二极管芯片110的多个电极至生长基板111的对侧;最后,在生长基板111的对侧上,对应通道116的部分,分别形成对应发光二极管芯片110电极的多个外部电极117。Please refer to FIGS. 3A-3G , which are schematic diagrams of the method for forming the light emitting device 100 disclosed in the present invention. First, in FIG. 3A, the n-type semiconductor layer 112a, the active layer 112b, and the p-type semiconductor layer 112c are sequentially formed on the growth substrate 111; then, part of the n-type semiconductor layer 112a, the active layer 112b, and the p-type semiconductor layer 112c, forming a plurality of isolation structures 114 isolated from each other to form a plurality of epitaxial structures, in this embodiment, the insulation structure 114 reaches as deep as the growth substrate at the bottom of the n-type semiconductor layer 112a; thereafter, in FIG. 3B, remove The active layer 112b and the p-type semiconductor layer 112c in each epitaxial structure expose part of the upper surface of the n-type semiconductor layer 112a to the outside; in FIG. 3C, an n-type electrode is formed on the exposed surface of the n-type semiconductor layer 112a 113a, forming a p-type electrode 113b on the surface of the p-type semiconductor layer 112c to form a light emitting diode unit 112; in FIG. or further cover the surface of the p-type semiconductor layer 112c; then form an electrical connection structure 115 so that each LED unit 112 is electrically connected to each other, and the connection method of the electrical connection structure 115 is to electrically connect and emit light The n-type electrode 113 a of the diode unit 112 and the p-type electrode 113 b of another LED unit 112 . Alternatively, electrodes are not formed on each LED unit 112, and each LED unit 112 is directly electrically connected with an electrical connection structure 115, and each LED unit 112 in the LED chip 110 is electrically connected in series or in parallel to form a The light emitting diode chips 110 connected in series, in parallel or in series and parallel between the light emitting diode units 112 can also be connected in series to form a single chip (Multiple-dies Chip, MC) with a plurality of light emitting diode units. Voltage, using a single single-chip structure or combining multiple single-chip structures to apply to a DC power supply or a rectified AC power supply. It is also possible to electrically connect each LED unit 112 in a single-chip structure to include a Wyeth bridge (bridge circuit) for application to an AC power supply. The electrical connection structure 115 is partly or completely formed on the insulating structure 114 to isolate the electricity that is not conducted through the electrical connection structure 115 through the insulating structure 114 to form an effective insulation to prevent the LED unit 112 from being damaged. After completing the structure of the light emitting diode chip 110 through the above steps, in FIG. Form the reflective layer 130, or form a multi-layer structure with different refractive indices that can refract the light emitted by the LED chip 110, such as a Bragg reflective layer (BraggReflection Layer); A bonding layer (bonding layer) 140 is formed on the side, such as a wafer bonding layer (wafer bonding layer) or a metal bonding layer (metal bonding layer); in FIG. 3F, the bonding layer 140 is used to bond with the permanent substrate 150. In this embodiment, it is The permanent substrate 150 and the bonding layer 140 are bonded by wafer bonding, but not limited thereto. The permanent substrate 150 is a silicon substrate; 10 μm; then in FIG. 3G , by means of etching, etc., a plurality of channels 116 penetrating/penetrating the growth substrate 111 are formed in the growth substrate 111 corresponding to a plurality of electrodes of the light-emitting diode chip 110; used in the channels 116 The way of filling the conductive material is to electrically connect multiple electrodes of the light emitting diode chip 110 to the opposite side of the growth substrate 111; finally, on the opposite side of the growth substrate 111, corresponding to the part of the channel 116, respectively form the corresponding light emitting diode chips A plurality of external electrodes 117 of 110 electrodes.
请见图4,为本发明所披露的另一发光元件200的结构示意图,本实施例中,标号与图2相同的元件,除了本实施例中所叙述的特征与组成外,具有与图2中元件相同的特性与使用方式,其中永久基板250为氮化铝基板,通道116贯通永久基板250,在永久基板250相对于发光二极管芯片110的相对表面上形成外部电极117。Please refer to FIG. 4, which is a schematic structural diagram of another light-emitting element 200 disclosed in the present invention. In this embodiment, the elements with the same labels as those in FIG. The characteristics and usage are the same as those of the above-mentioned components, wherein the permanent substrate 250 is an aluminum nitride substrate, the channel 116 penetrates the permanent substrate 250 , and the external electrodes 117 are formed on the surface of the permanent substrate 250 opposite to the LED chip 110 .
请见图5所示,为本发明所披露的另一发光元件300的结构示意图,本实施例中,标号与图2相同的元件,除了本实施例中所叙述的特征与组成外,亦具有与图2中元件相同的特性与使用方式。发光元件300包括发光二极管芯片110、次载体(sub-mount)310以及至少一导电材320。次载体310可具有至少一电路,导电材320位于次载体310上,或是同时分别存在于发光二极管芯片110以及次载体310上,通过导电材320将发光二极管芯片110粘结及/或固定于次载体310上并使发光二极管芯片110与次载体310形成电性连接,其中,电性连接可通过将导电材320与外部电极117连接而形成,发光二极管芯片110与次载体310可以通过焊接工艺(soldering process)或粘着工艺(adhesive process)彼此固定并完成电性连接。于焊接工艺时,导电材320可为金属凸块(metal bump),其材料可为合金(alloy)、金属(metal)或焊料(solder),当金属凸块为合金凸块,或是于焊接后成为合金的状况下,分布于发光二极管芯片110以及次载体310上的金属凸块可为合金或分别为单一金属,通过共融合金焊接(eutectic soldering)工艺形成合金,亦可通过各向同性导电胶(isotropically conductive adhesive;ICA)形成该金属凸块。于粘着工艺时,则以膏状形式或薄膜形式的各向异性性导电胶(anisotropically conductiveadhesive;ACA),即各向异性导电膜(anisotropically conductive film;ACF)等。将芯片与次载体310相连接。在结合压力和热的共同作用下,完成电性连结,并使粘着剂永久地固化(cure)及热稳定。次载体310可以是导线架(leadframe)、大尺寸镶嵌基底(mounting substrate)或电路板(例如PCB电路板)等,以实现发光元件300的电路规划并提高其散热效果。本实施例中,可选择性地将发光二极管芯片110上的生长基板111移除,并于发光二极管芯片110以及次载体310间填入或形成导热结构330,以增加发光元件300的散热效率。再者,可于移除生长基板后的发光二极管芯片110表面上实施粗化(roughing)步骤,使发光二极管芯片110具有粗化表面或者粗化结构,由此增加发光元件300的光摘出效率。亦可于绝缘结构114内加入荧光粉(Phosphor)以及散射粒子(scattering particle),其中荧光粉可转换发光二极管单元112所发出的光线为不同光色以进行光色混光,换言之,可将发光二极管单元112所发出的光线转换为波长较长的另一光线。例如将蓝光转为红光以及黄光,以形成白光输出,或是其他光色的转换,亦为可能的变换方式。而散射粒子则使进入绝缘结构114中的被发出光线向外散射,以增加发光二极管芯片110的出光效率,散射粒子的材料可为二氧化钛(TiO2)以及二氧化硅(SiO2)及其组合,但亦不以此为限。上述绝缘结构114中的荧光粉(Phosphor)以及散射粒子(scattering particle),可一并或单独加入绝缘结构114中,其组成以及浓度可依据产品不同加以调整,而使绝缘结构114中包含荧光粉(Phosphor)以及散射粒子(scattering particle)的其中之一及其组合。Please refer to FIG. 5, which is a structural schematic diagram of another light-emitting element 300 disclosed in the present invention. In this embodiment, the elements with the same labels as those in FIG. The same characteristics and usage as the components in Figure 2. The light emitting device 300 includes a light emitting diode chip 110 , a sub-mount 310 and at least one conductive material 320 . The sub-carrier 310 can have at least one circuit, the conductive material 320 is located on the sub-carrier 310, or exists on the LED chip 110 and the sub-carrier 310 respectively, and the LED chip 110 is bonded and/or fixed on the sub-carrier 310 through the conductive material 320 on the sub-carrier 310 and electrically connect the light-emitting diode chip 110 to the sub-carrier 310, wherein the electrical connection can be formed by connecting the conductive material 320 to the external electrode 117, and the light-emitting diode chip 110 and the sub-carrier 310 can be soldered (soldering process) or adhesive process (adhesive process) to fix each other and complete the electrical connection. During the soldering process, the conductive material 320 can be a metal bump, and its material can be alloy, metal or solder. In the case of an alloy, the metal bumps distributed on the LED chip 110 and the sub-carrier 310 can be an alloy or a single metal respectively. The alloy can be formed by eutectic soldering process, or can be formed by isotropic An isotropically conductive adhesive (ICA) forms the metal bump. In the adhesion process, anisotropically conductive adhesive (ACA) in the form of paste or film, that is, anisotropically conductive film (ACF) and the like. The chip is connected to the sub-carrier 310 . Under the combination of pressure and heat, the electrical connection is completed, and the adhesive is permanently cured (cure) and thermally stable. The sub-carrier 310 can be a leadframe, a large-size mounting substrate or a circuit board (such as a PCB circuit board), so as to realize the circuit planning of the light-emitting element 300 and improve its heat dissipation effect. In this embodiment, the growth substrate 111 on the LED chip 110 can be selectively removed, and a heat conduction structure 330 is filled or formed between the LED chip 110 and the sub-carrier 310 to increase the heat dissipation efficiency of the light emitting element 300 . Furthermore, a roughing step can be performed on the surface of the LED chip 110 after the growth substrate is removed, so that the LED chip 110 has a roughened surface or a roughened structure, thereby increasing the light extraction efficiency of the light emitting device 300 . Phosphor and scattering particles can also be added to the insulating structure 114, wherein the phosphor can convert the light emitted by the LED unit 112 into different light colors to perform light color mixing. The light emitted by the diode unit 112 is converted into another light with a longer wavelength. For example, converting blue light into red light and yellow light to form white light output, or conversion of other light colors are also possible conversion methods. The scattering particles cause the emitted light entering the insulating structure 114 to scatter outward, so as to increase the light extraction efficiency of the LED chip 110. The materials of the scattering particles can be titanium dioxide (TiO 2 ), silicon dioxide (SiO 2 ) and combinations thereof. , but not limited to this. Phosphor and scattering particles in the above-mentioned insulating structure 114 can be added together or separately in the insulating structure 114, and its composition and concentration can be adjusted according to different products, so that the insulating structure 114 contains phosphor One of (Phosphor) and scattering particle (scattering particle) and its combination.
此外,请见图6所示,发光元件300亦可不除去生长基板111,而于生长基板111实施粗化(roughing)步骤,使生长基板111具有粗化表面或者粗化结构,由此增加发光元件300的光摘出效率。同图5所述,绝缘结构114内亦加入荧光粉(Phosphor)以及散射粒子(scattering particle),其中荧光粉可转换发光二极管单元中发出的光线为不同光色以进行光色混光,例如将蓝光转为红光或是黄光以形成白光输出,或是其他光色的转换,亦为可能的变换方式。而散射粒子则使进入绝缘结构114中的被发出光线向外散射,以增加发光二极管芯片110的出光效率,散射粒子的材料可为二氧化钛(TiO2)以及二氧化硅(SiO2)及其组合,但亦不以此为限。上述绝缘结构114中的荧光粉(Phosphor)以及散射粒子(scattering particle),可一并或单独加入绝缘结构114中,其组成以及浓度可依据产品不同加以调整,而使绝缘结构114中包含荧光粉(Phosphor)以及散射粒子(scattering particle)的其中之一及其组合。In addition, as shown in FIG. 6, the light-emitting element 300 may not remove the growth substrate 111, but implement a roughing step on the growth substrate 111, so that the growth substrate 111 has a roughened surface or a roughened structure, thereby increasing the number of light-emitting elements. Light extraction efficiency of 300. As described in FIG. 5, phosphors and scattering particles are also added into the insulating structure 114, wherein the phosphors can convert the light emitted by the LED unit into different light colors for light color mixing. Converting blue light to red light or yellow light to form white light output, or conversion of other light colors are also possible conversion methods. The scattering particles cause the emitted light entering the insulating structure 114 to scatter outward, so as to increase the light extraction efficiency of the LED chip 110. The materials of the scattering particles can be titanium dioxide (TiO 2 ), silicon dioxide (SiO 2 ) and combinations thereof. , but not limited to this. Phosphor and scattering particles in the above-mentioned insulating structure 114 can be added together or separately in the insulating structure 114, and its composition and concentration can be adjusted according to different products, so that the insulating structure 114 contains phosphor One of (Phosphor) and scattering particle (scattering particle) and its combination.
请见图7A以及图7B所示,为本发明所披露的发元件400的另一实施例,其中图7A为发光二极管结构400的俯视图,图7B则为发光二极管结构400的A-A’-A”剖面图。本实施例利用次载体310与发光二极管芯片110间的电性连接,使得发光元件400具有弹性的电性配置可能。本实施例中,次载体310与发光二极管芯片110间具有至少三个电性接点420,其中电性接点420的材料可与导电材320相同或相通,发光二极管芯片110内可包含至少两组发光二极管单元群411以及412,其中发光二极管单元群411以及412至少包含多个彼此串联的发光二极管单元112,举例来说,发光二极管单元群411以及412可承受近似于均方根(root mean square)值在120伏特(voltage)以及240伏特的顺向电压,或是峰值(peak value)或均方根值近似33伏特或72伏特的顺向电压。发光二极管单元群411以及412可各自具有至少两电性接点420,或者,发光二极管单元群411以及412可共用电性接点420。在发光二极管单元群411以及412可各自具有至少两电性接点420的情形下,发光二极管单元群411的电性接点420与发光二极管单元群412的另一电性接点420彼此电连接,以形成共同节点C(common node),使得于共同节点C上施加的电信号或者电源可以被一并传输应用于发光二极管单元群411以及412上,或具有其他共同节点结构产生的电性特征。另外,发光二极管单元群411上除了共同节点C的另一电性接点420为节点B,而发光二极管单元群412上除了共同节点C的另一电性接点420为节点D。于本实施例中,次载体310利用导电材320分别与节点B、C、D电连接,以于次载体310上形成对应于节点B、C、D的节点B’、C’、D’(图未示),而对节点B’、C’、D’施加的电信号或者电源可被传输应用于对应的节点B、C、D。于此架构下,当节点B’以及D’被连接上电源,而节点C’未与外部电源电性连接时,发光二极管单元群411以及412间为串联电性连接状况,而在C’被电性连接于电源的一极,而节点B’与D’被电性连接于电源的另一极的情形下,发光二极管单元群411以及412间为并联电性连接状况。此种架构于单一芯片以及封装结构下,即可实现发光二极管单元群411以及412间多种电性连接的可能,举例来说,当发光元件400被应用于均方根值在120伏特的电力系统时,则可对发光元件400实行并联的电性连接、封装以及引线,使发光元件400可被应用于均方根值在120伏特的电力系统。而当发光元件400被应用于均方根值在240伏特的电力系统时,则可对发光元件400实行串联的电性连接,封装以及引线,使发光元件400可被应用于均方根值在240伏特的电力系统。以此,本实施例仅使用同一种发光元件400,则可被应用于多种电力系统架构下,且利用次载体作为与电力系统进行电性连接的点,使得发光元件400在应用上的可靠性提高,生产成本降低,让终端产品的价格有优化的空间,进而提升发光二极管应用领域的可能。值得一提的是,前述的发光二极管单元群411以及412为同一发光二极管芯片110的一部分,但亦可以两发光二极管芯片110替代发光二极管单元群411以及412,而于相同的发明精神下实施本实施例。Please refer to FIG. 7A and FIG. 7B, which are another embodiment of the light-emitting element 400 disclosed in the present invention, wherein FIG. 7A is a top view of the light-emitting diode structure 400, and FIG. 7B is A-A'- of the light-emitting diode structure 400. A" sectional view. This embodiment utilizes the electrical connection between the sub-carrier 310 and the LED chip 110, so that the light-emitting element 400 has the possibility of flexible electrical configuration. In this embodiment, there is an electrical connection between the sub-carrier 310 and the LED chip 110. At least three electrical contacts 420, wherein the material of the electrical contacts 420 can be the same as or connected to the conductive material 320, and the LED chip 110 can include at least two groups of LED unit groups 411 and 412, wherein the LED unit groups 411 and 412 It includes at least a plurality of LED units 112 connected in series. For example, the LED unit groups 411 and 412 can withstand forward voltages with a root mean square value of approximately 120 volts and 240 volts, Or a forward voltage with a peak value or an RMS value of approximately 33 volts or 72 volts. The light emitting diode unit groups 411 and 412 may each have at least two electrical contacts 420, or the light emitting diode unit groups 411 and 412 may Shared electrical contact 420. In the case that the LED unit groups 411 and 412 can each have at least two electrical contacts 420, the electrical contact 420 of the LED unit group 411 and the other electrical contact of the LED unit group 412 420 are electrically connected to each other to form a common node C (common node), so that the electrical signal or power applied on the common node C can be transmitted and applied to the LED unit groups 411 and 412, or have other common node structures to generate In addition, the other electrical contact 420 except the common node C on the LED unit group 411 is the node B, and the other electrical contact 420 except the common node C on the LED unit group 412 is the node D. In this embodiment, the sub-carrier 310 is electrically connected to the nodes B, C, and D respectively by using the conductive material 320, so as to form nodes B', C', and D' corresponding to the nodes B, C, and D on the sub-carrier 310 ( Not shown in the figure), and the electrical signal or power applied to the nodes B', C', D' can be transmitted and applied to the corresponding nodes B, C, D. Under this architecture, when the nodes B' and D' are connected When the power supply is on, and the node C' is not electrically connected to the external power supply, the light-emitting diode unit groups 411 and 412 are electrically connected in series, and C' is electrically connected to one pole of the power supply, while the node B' and When D' is electrically connected to the other pole of the power supply, the light-emitting diode unit group 411 and 412 are electrically connected in parallel. This kind of structure can realize the light-emitting diode unit group 411 under a single chip and package structure. and the possibility of multiple electrical connections between 412, for example, when the light emitting element 40 0 is applied to a power system with a root mean square value of 120 volts, then the light-emitting element 400 can be electrically connected, packaged, and leaded in parallel, so that the light-emitting element 400 can be applied to a power system with a root mean square value of 120 volts system. When the light-emitting element 400 is applied to a power system with a root mean square value of 240 volts, the light-emitting element 400 can be electrically connected in series, packaged and leaded, so that the light-emitting element 400 can be applied to a power system with a root mean square value of 240 volts. 240 volt electrical system. Therefore, this embodiment only uses the same light-emitting element 400, which can be applied to various power system architectures, and uses the secondary carrier as a point of electrical connection with the power system, making the light-emitting element 400 reliable in application. The performance is improved, the production cost is reduced, and there is room for optimization of the price of the end product, thereby increasing the possibility of the application field of the light-emitting diode. It is worth mentioning that the aforementioned LED unit groups 411 and 412 are part of the same LED chip 110, but it is also possible to replace the LED unit groups 411 and 412 with two LED chips 110 to implement the present invention under the same spirit of the invention. Example.
本发明所披露的发光元件,可包含由基板侧出光的倒装式(flip chip)封装结构,因倒装封装结构由基板侧出光的特性,使其出光效率不因发光区域被遮蔽而减少,因此于发光二极管单元间的导电材料无须选择透明材料,亦无需针对缩小遮光面积的问题,或导电材料的形状或工艺进行特别设计,因此可以增加出光效率、降低成本,并使导电材料的选择不受限制。The light-emitting element disclosed in the present invention may include a flip-chip packaging structure that emits light from the substrate side. Due to the characteristics of the flip-chip packaging structure that emits light from the substrate side, the light-emitting efficiency will not be reduced due to the shadowing of the light-emitting area. Therefore, there is no need to choose transparent materials for the conductive material between the LED units, and there is no need to design specially for the problem of reducing the shading area, or the shape or process of the conductive material, so that the light extraction efficiency can be increased, the cost can be reduced, and the selection of the conductive material can be avoided. Restricted.
此外,本发明所披露的发光二极管结构,除可以已知封装方式进行封装之外,亦可于外延工艺下进行操作,与一般将发光二极管结构另外与尺寸差异甚大的封装体进行封装分属不同方法,亦即本发明所披露的发光二极管结构可于同一晶片等级下进行操作,因此所述各元件间可具有相似的尺寸等级(例如于同一数量级,或10的1次方内),如此一来,不仅简化工艺,无须再额外对发光二极管结构进行封装,亦可将本发明所披露的发光二极管结构单独或数个与封装载体再进行封装,则本发明所披露的发光二极管结构使得引线等封装步骤更为简单,因此使发光二极管的封装得以降低成本并且增加封装体的信赖性。In addition, the light emitting diode structure disclosed in the present invention can not only be packaged in known packaging methods, but also can be operated under the epitaxial process, which is different from the general packaging of the light emitting diode structure and the package body with a large difference in size. method, that is, the light-emitting diode structure disclosed in the present invention can be operated at the same wafer level, so the various components can have similar size levels (for example, in the same order of magnitude, or within 1 power of 10), such a In the future, not only will the process be simplified, there is no need to additionally package the light-emitting diode structure, and the light-emitting diode structure disclosed in the present invention can be packaged individually or severally with the packaging carrier, then the light-emitting diode structure disclosed in the present invention makes the lead wires, etc. The packaging steps are simpler, so that the packaging cost of the light emitting diode can be reduced and the reliability of the packaging body can be increased.
上述的诸实施例,其中所述的n型半导体层、p型半导体层以及有源层的材料包含III-V族化合物,例如氮化镓系列或磷化镓系列的材料。所述的生长基板例如为包括至少一种材料选自于蓝宝石、碳化硅、氮化镓、以及氮化铝所组成的群组。所述的n型半导体层、p型半导体层以及有源层可为单层或多层结构,例如为超晶格结构。另外,本发明的所述的发光二极管芯片并不限于以接合方式直接接合或通过介质接合至导热或导电基板,其他形成方式,例如以成长方式成长于所述的生长基板上亦属本发明的范围。In the above-mentioned embodiments, the materials of the n-type semiconductor layer, p-type semiconductor layer and active layer include group III-V compounds, such as gallium nitride series or gallium phosphide series materials. The growth substrate includes, for example, at least one material selected from the group consisting of sapphire, silicon carbide, gallium nitride, and aluminum nitride. The n-type semiconductor layer, p-type semiconductor layer, and active layer can be single-layer or multi-layer structures, such as superlattice structures. In addition, the light-emitting diode chip of the present invention is not limited to being directly bonded or bonded to a heat-conducting or conductive substrate through a bonding method. Other forming methods, such as growing on the above-mentioned growth substrate by a growth method, also belong to the present invention. scope.
所述的电流分散层包含透明金属氧化物,例如为氧化铟锡(ITO)、金属或金属合金。所述的生长基板例如为包括至少一种透明材料或绝缘材料选自于蓝宝石、碳化硅、氮化镓、以及氮化铝所组成的群组。所述的支持基板例如为包括透明材料选自于磷化镓、蓝宝石、碳化硅、氮化镓、以及氮化铝所组成的群组;或例如为包括导热材料选自于金刚石、类金刚石碳(DLC)、氧化锌、金、银、铝等金属材料所组成的群组。所述的非单晶相接合层包含至少一种材料选自于金属氧化物、非金属氧化物、高分子聚合物、金属、或金属合金所组成的群组。The current spreading layer includes transparent metal oxide, such as indium tin oxide (ITO), metal or metal alloy. The growth substrate includes, for example, at least one transparent or insulating material selected from the group consisting of sapphire, silicon carbide, gallium nitride, and aluminum nitride. The support substrate, for example, includes a transparent material selected from the group consisting of gallium phosphide, sapphire, silicon carbide, gallium nitride, and aluminum nitride; or, for example, includes a thermally conductive material selected from diamond, diamond-like carbon (DLC), zinc oxide, gold, silver, aluminum and other metal materials. The non-single crystal phase bonding layer comprises at least one material selected from the group consisting of metal oxides, non-metal oxides, polymers, metals, or metal alloys.
本发明所列举的各实施例仅用以说明本发明,并非用以限制本发明的范围。任何人对本发明所作的任何显而易知的修饰或变更皆不脱离本发明的精神与范围。The various embodiments listed in the present invention are only used to illustrate the present invention, and are not intended to limit the scope of the present invention. Any obvious modifications or changes made by anyone to the present invention will not depart from the spirit and scope of the present invention.
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