CN102286724A - 光伏吸收层溅射镀膜的铜镓合金旋转靶材及制备方法 - Google Patents
光伏吸收层溅射镀膜的铜镓合金旋转靶材及制备方法 Download PDFInfo
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102430718A (zh) * | 2011-12-26 | 2012-05-02 | 昆山全亚冠环保科技有限公司 | 用于制备铝及铝基合金旋转靶材的模具及制作方法 |
CN102703862A (zh) * | 2012-06-20 | 2012-10-03 | 江苏美特林科特殊合金有限公司 | 一种铜镓/铜铟镓管状阴极靶材的成型方法 |
CN109136635A (zh) * | 2018-11-13 | 2019-01-04 | 江苏迪丞光电材料有限公司 | 铜镓合金溅射靶材的制备方法及靶材 |
WO2019024421A1 (zh) | 2017-08-04 | 2019-02-07 | 米亚索乐装备集成(福建)有限公司 | 一种制备靶材的方法和靶材 |
CN109371263A (zh) * | 2018-11-14 | 2019-02-22 | 中国科学院理化技术研究所 | 一种铜镓合金、银镓合金的制备方法 |
CN113913759A (zh) * | 2021-09-06 | 2022-01-11 | 宜春赣锋锂业有限公司 | 一种旋转锂靶材组件的制备方法 |
CN114015921A (zh) * | 2021-11-04 | 2022-02-08 | 温州市铜仁新材料研究院 | 高阻电阻磁控溅射靶材及其制备方法 |
Citations (3)
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JP2000073163A (ja) * | 1998-08-28 | 2000-03-07 | Vacuum Metallurgical Co Ltd | Cu−Ga合金スパッタリングターゲット及びその製造方法 |
CN1415779A (zh) * | 2002-10-28 | 2003-05-07 | 天津大学 | 溅射法生产高稳定性金属膜电阻器用的高阻靶材制造方法 |
CN1719626A (zh) * | 2005-06-03 | 2006-01-11 | 清华大学 | 用于铜铟镓硒薄膜太阳能电池的铜镓合金靶及其制备方法 |
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Patent Citations (3)
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JP2000073163A (ja) * | 1998-08-28 | 2000-03-07 | Vacuum Metallurgical Co Ltd | Cu−Ga合金スパッタリングターゲット及びその製造方法 |
CN1415779A (zh) * | 2002-10-28 | 2003-05-07 | 天津大学 | 溅射法生产高稳定性金属膜电阻器用的高阻靶材制造方法 |
CN1719626A (zh) * | 2005-06-03 | 2006-01-11 | 清华大学 | 用于铜铟镓硒薄膜太阳能电池的铜镓合金靶及其制备方法 |
Non-Patent Citations (1)
Title |
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王大勇: "靶材制备研究现状及研发趋势", 《浙江冶金》 * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102430718A (zh) * | 2011-12-26 | 2012-05-02 | 昆山全亚冠环保科技有限公司 | 用于制备铝及铝基合金旋转靶材的模具及制作方法 |
CN102703862A (zh) * | 2012-06-20 | 2012-10-03 | 江苏美特林科特殊合金有限公司 | 一种铜镓/铜铟镓管状阴极靶材的成型方法 |
WO2019024421A1 (zh) | 2017-08-04 | 2019-02-07 | 米亚索乐装备集成(福建)有限公司 | 一种制备靶材的方法和靶材 |
CN109136635A (zh) * | 2018-11-13 | 2019-01-04 | 江苏迪丞光电材料有限公司 | 铜镓合金溅射靶材的制备方法及靶材 |
CN109371263A (zh) * | 2018-11-14 | 2019-02-22 | 中国科学院理化技术研究所 | 一种铜镓合金、银镓合金的制备方法 |
CN113913759A (zh) * | 2021-09-06 | 2022-01-11 | 宜春赣锋锂业有限公司 | 一种旋转锂靶材组件的制备方法 |
CN114015921A (zh) * | 2021-11-04 | 2022-02-08 | 温州市铜仁新材料研究院 | 高阻电阻磁控溅射靶材及其制备方法 |
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Denomination of invention: Copper and gallium alloy rotating target for photovoltaic absorption layer sputtering film coating and preparation method Effective date of registration: 20200616 Granted publication date: 20130828 Pledgee: Jiangsu Suzhou Rural Commercial Bank Co., Ltd. Lili sub branch Pledgor: JIMAIKE MATERIAL TECHNOLOGY (SUZHOU) Co.,Ltd. Registration number: Y2020320010048 |
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Date of cancellation: 20210608 Granted publication date: 20130828 Pledgee: Jiangsu Suzhou Rural Commercial Bank Co., Ltd. Lili sub branch Pledgor: JIMAIKE MATERIAL TECHNOLOGY (SUZHOU) Co.,Ltd. Registration number: Y2020320010048 |
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Denomination of invention: Copper gallium alloy rotating target with photovoltaic absorbing layer sputtered coating and its preparation method Effective date of registration: 20210611 Granted publication date: 20130828 Pledgee: Jiangsu Suzhou Rural Commercial Bank Co., Ltd. Lili sub branch Pledgor: JIMAIKE MATERIAL TECHNOLOGY (SUZHOU) Co.,Ltd. Registration number: Y2021320010207 |