CN102044447B - Packaging process and packaging structure - Google Patents
Packaging process and packaging structure Download PDFInfo
- Publication number
- CN102044447B CN102044447B CN200910174057.2A CN200910174057A CN102044447B CN 102044447 B CN102044447 B CN 102044447B CN 200910174057 A CN200910174057 A CN 200910174057A CN 102044447 B CN102044447 B CN 102044447B
- Authority
- CN
- China
- Prior art keywords
- encapsulant
- semiconductor element
- semiconductor elements
- chip
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004806 packaging method and process Methods 0.000 title claims abstract description 44
- 238000012858 packaging process Methods 0.000 title claims abstract description 22
- 239000004065 semiconductor Substances 0.000 claims abstract description 199
- 239000008393 encapsulating agent Substances 0.000 claims abstract description 116
- 239000012790 adhesive layer Substances 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 17
- 238000000227 grinding Methods 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 239000000084 colloidal system Substances 0.000 abstract description 5
- 235000012431 wafers Nutrition 0.000 description 12
- 239000004020 conductor Substances 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 239000010410 layer Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 230000008054 signal transmission Effects 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 2
- 238000013467 fragmentation Methods 0.000 description 2
- 238000006062 fragmentation reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 238000004100 electronic packaging Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/96—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
- H01L2224/11001—Involving a temporary auxiliary member not forming part of the manufacturing apparatus, e.g. removable or sacrificial coating, film or substrate
- H01L2224/11002—Involving a temporary auxiliary member not forming part of the manufacturing apparatus, e.g. removable or sacrificial coating, film or substrate for supporting the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/12105—Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/1302—Disposition
- H01L2224/13025—Disposition the bump connector being disposed on a via connection of the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/14—Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
- H01L2224/141—Disposition
- H01L2224/1418—Disposition being disposed on at least two different sides of the body, e.g. dual array
- H01L2224/14181—On opposite sides of the body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16135—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/16145—Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/81001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector involving a temporary auxiliary member not forming part of the bonding apparatus
- H01L2224/81005—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector involving a temporary auxiliary member not forming part of the bonding apparatus being a temporary or sacrificial substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3135—Double encapsulation or coating and encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
- H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
- H01L2924/18161—Exposing the passive side of the semiconductor or solid-state body of a flip chip
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
技术领域 technical field
本发明涉及一种封装工艺及封装结构,且特别是涉及一种将大芯片配置于小芯片上的封装工艺及封装结构。The invention relates to a packaging process and a packaging structure, and in particular to a packaging process and a packaging structure in which a large chip is arranged on a small chip.
背景技术 Background technique
在现今的资讯社会中,使用者均追求高速度、高品质、多功能性的电子产品。就产品外观而言,电子产品的设计是朝向轻、薄、短、小的趋势迈进。因此,电子封装技术发展出诸如堆叠式芯片封装等多芯片封装技术。In today's information society, users are pursuing high-speed, high-quality, and multi-functional electronic products. As far as product appearance is concerned, the design of electronic products is moving towards the trend of light, thin, short and small. Therefore, electronic packaging technology has developed multi-chip packaging technologies such as stacked chip packaging.
堆叠式芯片封装利用垂直堆叠的方式将多个芯片封装于同一封装结构中,如此可提升封装密度以使封装体小型化,且可利用立体堆叠的方式缩短芯片之间的信号传输的路径长度,以提升芯片之间信号传输的速度,并可将不同功能的芯片组合于同一封装体中。Stacked chip packaging uses vertical stacking to package multiple chips in the same package structure, which can increase the packaging density to make the package smaller, and can shorten the path length of signal transmission between chips by using three-dimensional stacking. In order to increase the speed of signal transmission between chips, chips with different functions can be combined in the same package.
已知的堆叠式芯片封装的制作方法是先将多个倒装芯片接合至晶片上,然后沿这些芯片之间的间隙切割晶片,以形成多个芯片堆叠结构,之后再将芯片堆叠结构配置于线路板上并在线路板上形成封装胶体,以保护芯片堆叠结构。The known manufacturing method of stacked chip packaging is to firstly bond a plurality of flip chips onto a wafer, then cut the wafer along the gaps between the chips to form a plurality of chip stack structures, and then dispose the chip stack structures on and form encapsulant on the circuit board to protect the chip stack structure.
由于已知的堆叠式芯片封装的制作方法是通过切割晶片的方式来形成多个芯片堆叠结构,因此,在芯片堆叠结构中,由切割晶片所形成的芯片的尺寸势必大于接合至晶片上的倒装芯片的尺寸。因此,已知的堆叠式芯片封装的制作方法只能形成将小尺寸芯片配置于大尺寸芯片上的封装结构。Since the known manufacturing method of the stacked chip package is to form a plurality of chip stack structures by dicing the wafer, therefore, in the chip stack structure, the size of the chip formed by dicing the wafer must be larger than the size of the chip bonded to the wafer. The size of the loaded chip. Therefore, the known manufacturing method of stacked chip package can only form a package structure in which a small-sized chip is arranged on a large-sized chip.
此外,已知技术为减少堆叠式芯片封装的整体厚度,会在将倒装芯片接合至晶片上之前,先研磨晶片,以减少晶片的厚度。然而,目前倒装接合技术仍有工艺能力上的极限值,因此,当所使用的晶片厚度小于其工艺能力的极限值时,在进行倒装接合的过程中,容易发生破片的情形,以致于工艺良率降低。此外,厚度小的晶片在切割工艺中容易破裂,以致于工艺良率降低。In addition, in order to reduce the overall thickness of the stacked chip package in the known technology, the wafer is ground before the flip chip is bonded to the wafer, so as to reduce the thickness of the wafer. However, the current flip-chip bonding technology still has a limit value on the process capability. Therefore, when the thickness of the wafer used is less than the limit value of the process capability, fragments are prone to occur during the flip-chip bonding process, so that the process Yield decreases. In addition, wafers with a small thickness are easily broken during the dicing process, so that the process yield is reduced.
发明内容Contents of the invention
本发明提供一种封装工艺,可制作由各种尺寸的芯片相互堆叠而成的封装结构,且工艺良率高。The invention provides a packaging process, which can manufacture a packaging structure formed by stacking chips of various sizes, and has a high process yield.
本发明提供一种封装结构,其将大尺寸芯片配置于小尺寸芯片上。The invention provides a packaging structure, which arranges a large-size chip on a small-size chip.
为具体描述本发明的内容,在此提出一种封装工艺如下所述。首先,提供承载板,承载板上配置有粘着层。接着,将多个第一半导体元件配置于粘着层上,且第一半导体元件彼此分离并分别透过粘着层固定于承载板上。然后,在承载板上形成第一封装胶体,第一封装胶体覆盖第一半导体元件的侧壁并填满第一半导体元件之间的间隙,以使第一半导体元件与第一封装胶体形成芯片阵列板。之后,将多个第二半导体元件分别倒装接合至第一半导体元件上。接着,在芯片阵列板上形成第二封装胶体,第二封装胶体至少覆盖第二半导体元件的侧壁并填满第二半导体元件之间的间隙。然后,分离芯片阵列板与粘着层。之后,沿着第二半导体元件之间的间隙切割第二封装胶体与第一封装胶体,以形成多个芯片封装单元。In order to specifically describe the content of the present invention, a packaging process is proposed here as follows. Firstly, a bearing plate is provided, on which an adhesive layer is disposed. Next, a plurality of first semiconductor elements are arranged on the adhesive layer, and the first semiconductor elements are separated from each other and respectively fixed on the carrier board through the adhesive layer. Then, a first encapsulant is formed on the carrier board, the first encapsulant covers the sidewall of the first semiconductor element and fills the gap between the first semiconductor elements, so that the first semiconductor element and the first encapsulant form a chip array plate. After that, a plurality of second semiconductor elements are respectively flip-chip bonded to the first semiconductor element. Next, a second encapsulant is formed on the chip array board, the second encapsulant at least covers the sidewalls of the second semiconductor elements and fills the gaps between the second semiconductor elements. Then, the chip array plate and the adhesive layer were separated. After that, the second encapsulant and the first encapsulant are cut along the gap between the second semiconductor elements to form a plurality of chip packaging units.
在本发明的实施例中,上述的第一半导体元件具有多个直通硅晶穿孔结构,且封装工艺还包括在形成芯片阵列板之后,研磨芯片阵列板,以薄化芯片阵列板并露出第一半导体元件的直通硅晶穿孔结构的端面。In an embodiment of the present invention, the above-mentioned first semiconductor element has a plurality of TSV structures, and the packaging process further includes grinding the chip array plate after forming the chip array plate, so as to thin the chip array plate and expose the first The end face of the TSV structure of the semiconductor element.
在本发明的实施例中,上述的研磨芯片阵列板的方法包括研磨芯片阵列板直到芯片阵列板的厚度实质上小于或等于4密尔。In an embodiment of the present invention, the above method of grinding the chip array plate includes grinding the chip array plate until the thickness of the chip array plate is substantially less than or equal to 4 mils.
在本发明的实施例中,上述的封装工艺还包括在形成芯片阵列板之后,在第一半导体元件上分别形成多个彼此分离的第一底胶,其中各第一底胶覆盖对应的第一半导体元件以及第一封装胶体的围绕对应的第一半导体元件的部分,且在将第二半导体元件分别倒装接合至第一半导体元件上时,各第二半导体元件的多个导电凸块通过对应的第一底胶而与对应的第一半导体元件接合。In an embodiment of the present invention, the above packaging process further includes forming a plurality of first primers separated from each other on the first semiconductor element after forming the chip array board, wherein each first primer covers the corresponding first The semiconductor element and the part of the first encapsulant surrounding the corresponding first semiconductor element, and when the second semiconductor element is respectively flip-chip bonded to the first semiconductor element, the plurality of conductive bumps of each second semiconductor element pass through the corresponding The first primer is used to bond with the corresponding first semiconductor element.
在本发明的实施例中,上述的封装工艺还包括将芯片封装单元配置于线路基板上,以使第一半导体元件电性与结构性连接线路基板。In an embodiment of the present invention, the above packaging process further includes disposing the chip packaging unit on the circuit substrate, so that the first semiconductor element is electrically and structurally connected to the circuit substrate.
在本发明的实施例中,上述的封装工艺还包括在线路基板上形成第二底胶,以使第二底胶位于芯片封装单元的第一半导体元件与线路基板之间并包覆第一半导体元件的多个导电凸块。In an embodiment of the present invention, the above packaging process further includes forming a second primer on the circuit substrate, so that the second primer is located between the first semiconductor element of the chip packaging unit and the circuit substrate and covers the first semiconductor. Multiple conductive bumps for a component.
在本发明的实施例中,上述的封装工艺还包括在线路基板上形成第三封装胶体,第三封装胶体至少覆盖芯片封装单元的侧壁。In an embodiment of the present invention, the above packaging process further includes forming a third encapsulant on the circuit substrate, and the third encapsulant at least covers the sidewall of the chip packaging unit.
为具体描述本发明的内容,在此提出一种封装结构包括第一半导体元件、第一封装胶体、第二半导体元件以及第二封装胶体。第一封装胶体包覆第一半导体元件的侧壁。第二半导体元件配置于第一半导体元件与部分第一封装胶体上,且第二半导体元件的尺寸大于第一半导体元件的尺寸。第二封装胶体至少覆盖第二半导体元件的侧壁以及第一封装胶体,其中第一封装胶体与第二封装胶体为各自成型。In order to specifically describe the content of the present invention, a package structure including a first semiconductor element, a first encapsulant, a second semiconductor element and a second encapsulant is proposed here. The first encapsulant encapsulates the sidewall of the first semiconductor element. The second semiconductor element is disposed on the first semiconductor element and part of the first encapsulant, and the size of the second semiconductor element is larger than that of the first semiconductor element. The second encapsulant at least covers the sidewall of the second semiconductor element and the first encapsulant, wherein the first encapsulant and the second encapsulant are molded separately.
在本发明的实施例中,上述的第一封装胶体的侧壁切齐于第二封装胶体的侧壁。In an embodiment of the present invention, the sidewall of the above-mentioned first encapsulant is aligned with the sidewall of the second encapsulant.
在本发明的实施例中,上述的第一封装胶体的朝向第二半导体元件的第一顶面切齐于第一半导体元件的朝向第二半导体元件的第二顶面。In an embodiment of the present invention, the first top surface of the above-mentioned first encapsulant facing the second semiconductor element is aligned with the second top surface of the first semiconductor element facing the second semiconductor element.
在本发明的实施例中,上述的第一封装胶体的厚度实质上等于第一半导体元件的厚度。In an embodiment of the present invention, the thickness of the above-mentioned first encapsulant is substantially equal to the thickness of the first semiconductor element.
在本发明的实施例中,上述的第二半导体元件具有位于第二半导体元件与第一半导体元件之间的多个导电凸块,且封装结构还包括底胶,其配置于第二半导体元件与第一半导体元件之间以及第二半导体元件与第一封装胶体之间,以包覆第二半导体元件的导电凸块。In an embodiment of the present invention, the above-mentioned second semiconductor element has a plurality of conductive bumps located between the second semiconductor element and the first semiconductor element, and the packaging structure further includes a primer, which is disposed between the second semiconductor element and the first semiconductor element. Between the first semiconductor element and between the second semiconductor element and the first encapsulant to cover the conductive bump of the second semiconductor element.
在本发明的实施例中,上述的第一半导体元件的厚度实质上小于或等于4密尔。In an embodiment of the present invention, the thickness of the above-mentioned first semiconductor element is substantially less than or equal to 4 mils.
在本发明的实施例中,上述的第二封装胶体还覆盖第二半导体元件的远离第一半导体元件的顶面。In an embodiment of the present invention, the above-mentioned second encapsulant also covers the top surface of the second semiconductor element away from the first semiconductor element.
在本发明的实施例中,上述的第二封装胶体暴露出第二半导体元件的远离第一半导体元件的顶面。In an embodiment of the present invention, the above-mentioned second encapsulant exposes the top surface of the second semiconductor element away from the first semiconductor element.
在本发明的实施例中,上述的第一半导体元件的远离第二半导体元件的底面上配置有多个导电凸块。In an embodiment of the present invention, a plurality of conductive bumps are disposed on the bottom surface of the above-mentioned first semiconductor element away from the second semiconductor element.
在本发明的实施例中,上述的封装结构还包括线路基板,第一半导体元件配置于线路基板上,且导电凸块位于第一半导体元件与线路基板之间。In an embodiment of the present invention, the above package structure further includes a circuit substrate, the first semiconductor element is disposed on the circuit substrate, and the conductive bump is located between the first semiconductor element and the circuit substrate.
在本发明的实施例中,上述的封装结构还包括底胶,其配置于第一半导体元件与线路基板之间,以包覆导电凸块。In an embodiment of the present invention, the above packaging structure further includes a primer disposed between the first semiconductor element and the circuit substrate to cover the conductive bumps.
在本发明的实施例中,上述的封装结构还包括第三封装胶体,其配置于线路基板上,并至少覆盖第一封装胶体的侧壁与第二封装胶体的侧壁。In an embodiment of the present invention, the above-mentioned encapsulation structure further includes a third encapsulant disposed on the circuit substrate and covering at least the sidewalls of the first encapsulant and the second encapsulant.
基于上述,本发明可制得由各种尺寸的芯片相互堆叠而成的封装结构。此外,由于第二封装胶体可强化厚度相当小的芯片阵列板,故可稳固地连结全部的第二半导体元件以及全部的第一半导体元件,并可在以切割的方式形成芯片封装单元的过程中,避免芯片阵列板碎裂,从而提升工艺良率。Based on the above, the present invention can produce a packaging structure in which chips of various sizes are stacked on each other. In addition, since the second encapsulant can strengthen the chip array plate with a relatively small thickness, it can firmly connect all the second semiconductor elements and all the first semiconductor elements, and can be used in the process of forming chip packaging units by dicing. , to avoid chip array plate fragmentation, thereby improving process yield.
为让本发明的上述特征和优点能更明显易懂,下文特举实施例,并配合附图作详细说明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail with reference to the accompanying drawings.
附图说明 Description of drawings
图1A~图1I绘示本发明实施例的封装工艺的剖面图。1A-1I are cross-sectional views of the packaging process of the embodiment of the present invention.
图2A~图2D绘示本发明另一实施例的封装工艺的剖面图。2A-2D are cross-sectional views illustrating a packaging process according to another embodiment of the present invention.
附图标记说明Explanation of reference signs
100、200:封装结构100, 200: package structure
110:承载板110: Loading board
120:粘着层120: Adhesive layer
130:第一半导体元件130: The first semiconductor element
132:导电凸块132: Conductive bump
134、142、164、172、W、W1:侧壁134, 142, 164, 172, W, W1: side wall
136、144、166:顶面136, 144, 166: top surface
138:开孔138: opening
140:第一封装胶体140: The first packaging colloid
150、190:底胶150, 190: primer
160:第二半导体元件160: Second semiconductor element
162:导电凸块162: Conductive bump
168、182:底面168, 182: bottom surface
170、210:第二封装胶体170, 210: the second encapsulant
180:线路基板180: circuit substrate
220、M:第三封装胶体220, M: the third packaging colloid
A:芯片阵列板A: Chip array board
C1、C2:芯片封装单元C1, C2: chip packaging unit
D:导电材料D: conductive material
G1、G2:间隙G1, G2: Gap
I:绝缘层I: insulating layer
S:焊球S: solder ball
T、T1、T2:厚度T, T1, T2: Thickness
V:直通硅晶穿孔结构V: TSV structure
具体实施方式 Detailed ways
图1A~图1I绘示本发明实施例的封装工艺的剖面图。1A-1I are cross-sectional views of the packaging process of the embodiment of the present invention.
首先,请参照图1A,提供承载板110,承载板110的形状与大小可相似于晶片。承载板110上配置有粘着层120。接着,将多个第一半导体元件130配置于粘着层120上,且这些第一半导体元件130彼此分离并分别透过粘着层120固定于承载板110上。在本实施例中,第一芯片130的多个导电凸块132可埋于粘着层120中。First, please refer to FIG. 1A , a
详细而言,在本实施例中,在将第一半导体元件130配置于粘着层120上之前,可先在第一半导体元件130中形成多个高深宽比的开孔138,并在开孔138的内壁上形成绝缘层I,然后,在各开孔138中填入导电材料D,且绝缘层I分隔于导电材料D与开孔138的内壁之间,之后,才在各导电材料D上形成导电凸块132。In detail, in this embodiment, before disposing the
然后,请参照图1B,例如以印刷(printing)或是压模(molding)的方式在承载板110上形成第一封装胶体140,其中第一封装胶体140覆盖第一半导体元件130的侧壁134并填满第一半导体元件130之间的间隙G1,以使第一半导体元件130与第一封装胶体140形成芯片阵列板A。具体而言,在本实施例中,芯片阵列板A是指由第一封装胶体140以及全部的第一半导体元件130所构成的板状结构。Then, please refer to FIG. 1B , for example, a
之后,请参照图1C,在本实施例中,可研磨芯片阵列板A,以薄化芯片阵列板A并暴露出导电材料D。在本实施例中,可研磨芯片阵列板A直到芯片阵列板A的厚度T实质上小于或等于4密尔。在本实施例中,导电材料D、绝缘层I与开孔138可构成直通硅晶穿孔(Through-Silicon Via,TSV)结构V。Afterwards, please refer to FIG. 1C , in this embodiment, the chip array plate A may be ground to thin the chip array plate A and expose the conductive material D. Referring to FIG. In this embodiment, the chip array plate A may be ground until the thickness T of the chip array plate A is substantially less than or equal to 4 mils. In this embodiment, the conductive material D, the insulating layer I and the
由前述可知,第一半导体元件130是采用直通硅晶穿孔(Through-SiliconVia,TSV)技术来与导电凸块132以及之后将堆叠于第一半导体元件130上的其他芯片(未绘示)电性连接。直通硅晶穿孔技术例如是在芯片或晶片内部制作导电通道,以形成垂直的直通硅晶穿孔结构V,其可使第一半导体元件130在三维方向的堆叠密度最大化且外形尺寸最小化。因此,第一半导体元件130与之后将堆叠于第一半导体元件130上的其他芯片之间的信号可透过直通硅晶穿孔结构V来上下传递,以减少芯片之间的信号传输路径长度并减少信号延迟及功率消耗。It can be seen from the foregoing that the
接着,请参照图1D,在本实施例中,可在芯片阵列板A上以例如点胶或网板印刷的方式形成多个彼此分离的底胶150,其中各底胶150覆盖对应的第一半导体元件130以及第一封装胶体140的围绕对应的第一半导体元件130的部分。详细而言,每一个底胶150不但完全覆盖对应的第一半导体元件130,还覆盖第一封装胶体140的围绕对应的第一半导体元件130的部分。换言之,底胶150在承载板110上的投影面积大于第一半导体元件130在承载板110上的投影面积。底胶150的材料包括非导电性接合胶(non-contactpaste,NCP1)或非导电性接合膜(non-contact film,NCF1)。Next, please refer to FIG. 1D. In this embodiment, a plurality of
然后,请参照图1E,将多个第二半导体元件160分别倒装接合至第一半导体元件130上,以使各第二半导体元件160的多个导电凸块162通过对应的底胶150而与对应的第一半导体元件130的直通硅晶穿孔结构V接合。在本实施例中,第二半导体元件160在承载板110上的投影面积大于第一半导体元件130在承载板110上的投影面积。换言之,第二半导体元件160的尺寸大于第一半导体元件130的尺寸。Then, referring to FIG. 1E , a plurality of
之后,请参照图1F,例如以印刷或是压模的方式在芯片阵列板A上形成第二封装胶体170,第二封装胶体170可选择性地覆盖第二半导体元件160的侧壁164以及第二半导体元件160的远离对应的第一半导体元件130的顶面166并填满第二半导体元件160之间的间隙G2,以保护第二半导体元件160。值得注意的是,由于第二封装胶体170填满第二半导体元件160之间的间隙G2,因此,第二封装胶体170可强化厚度相当小的芯片阵列板A,以稳固地连结全部的第二半导体元件160以及全部的第一半导体元件130。此外,在其他实施例中,可通过使部分的第二封装胶体170填入第二半导体元件160与芯片阵列板A之间的方式,来取代形成底胶150的步骤。Afterwards, please refer to FIG. 1F , for example, a
然后,请参照图1G,分离芯片阵列板A与粘着层120。之后,请同时参照图1G与图1H,沿着第二半导体元件160之间的间隙G2切割第二封装胶体170与第一封装胶体140,以形成多个芯片封装单元C1。Then, referring to FIG. 1G , the chip array plate A and the
由前述可知,本实施例先将多个第一半导体元件130用第一封装胶体140连接而成芯片阵列板A,之后再将多个第二半导体元件160分别配置于芯片阵列板A的第一半导体元件130上并用第二封装胶体170连接,然后切割第一封装胶体140与第二封装胶体170而形成多个芯片封装单元C1。换言之,本实施例利用第一封装胶体140与第二封装胶体170来固定并连接第一半导体元件130与第二半导体元件160,之后再通过切割第一封装胶体140与第二封装胶体170来形成多个芯片封装单元C1。As can be seen from the foregoing, in this embodiment, a plurality of
如此一来,本实施例不会受限于第一半导体元件130与第二半导体元件160的尺寸关系,亦即本实施例可制作第一半导体元件130的尺寸大于或等于或小于第二半导体元件160的尺寸的芯片封装单元C1。换言之,本实施例可制得由各种尺寸的芯片相互堆叠而成的封装结构。此外,由于第二封装胶体170可强化厚度相当小的芯片阵列板A,故可在以切割的方式形成芯片封装单元C1的过程中,避免芯片阵列板A碎裂,从而提升工艺良率。In this way, this embodiment is not limited to the size relationship between the
接着,请同时参照图1H与图1I,在本实施例中,可在线路基板180(例如印刷电路板)上形成底胶190,并可将芯片封装单元C1配置于线路基板180上,以使第一半导体元件130可透过导电凸块132电性与结构性连接线路基板180,并使底胶190位于芯片封装单元C1的第一半导体元件130与线路基板180之间以包覆第一半导体元件130的导电凸块132。Next, please refer to FIG. 1H and FIG. 1I at the same time. In this embodiment, a
请参照图1I,在本实施例中,例如以印刷或是压模的方式在线路基板180上形成第三封装胶体M,第三封装胶体M可覆盖芯片封装单元C1的侧壁W以及第二半导体元件160的顶面166。详细而言,部分的第三封装胶体M位于第二封装胶体170的覆盖顶面166的部分上,换言之,第三封装胶体M间接覆盖第二半导体元件160的顶面166。在其他未绘示的实施例中,第三封装胶体M可覆盖芯片封装单元C1的侧壁W并暴露出第二封装胶体170的覆盖顶面166的部分。Please refer to FIG. 1I. In this embodiment, for example, a third encapsulant M is formed on the
另外,在其他实施例中,可通过使部分的第三封装胶体M填入第一半导体元件130与线路基板180之间的方式,来取代形成底胶190的步骤。此外,为使芯片封装单元C1可透过线路基板180电性连接至其他的电子元件,可在线路基板180的远离芯片封装单元C1的底面182上形成多个焊球S,且焊球S与线路基板180电性连接。此时,已初步完成本实施例的封装结构100。In addition, in other embodiments, the step of forming the
以下将详细介绍图1I的封装结构100。The
请参照图1I,本实施例的封装结构100包括第一半导体元件130、第一封装胶体140、第二半导体元件160以及第二封装胶体170。在本实施例中,第一半导体元件130的厚度T2实质上小于或等于4密尔,举例来说,第一半导体元件130的厚度T2实质上为2密尔。Referring to FIG. 1I , the
第一封装胶体140包覆第一半导体元件130的侧壁134。在本实施例中,第一封装胶体140的朝向第二半导体元件160的顶面144可切齐于第一半导体元件130的朝向第二半导体元件160的顶面136,且第一封装胶体140的厚度T1实质上可等于第一半导体元件130的厚度T2。The
第二半导体元件160配置于第一半导体元件130与部分第一封装胶体140上,且第二半导体元件160的尺寸大于第一半导体元件130的尺寸。换言之,第二半导体元件160的朝向第一半导体元件130的底面168的面积大于第一半导体元件130的顶面136的面积。The
值得注意的是,本实施例的封装结构100是将尺寸较大的芯片配置于尺寸较小的芯片上,因此,封装结构100可适于用在将存储器芯片等大尺寸芯片配置于运算芯片等小尺寸芯片上的封装结构中。此外,由于本实施例的第一半导体元件130的厚度T2较小(例如小于或等于4密尔),故可降低封装结构100的整体厚度。It is worth noting that the
第二封装胶体170覆盖第二半导体元件160的侧壁164、第二半导体元件160的远离第一半导体元件130的顶面166以及第一封装胶体140,其中第一封装胶体140与第二封装胶体170可为各自成型,且第一封装胶体140的侧壁142可切齐于第二封装胶体170的侧壁172。The
在本实施例中,第二半导体元件160的底面168上配置有多个导电凸块162,以电性连接至第一半导体元件130。为保护导电凸块162,可在第二半导体元件160与第一半导体元件130之间以及第二半导体元件160与第一封装胶体140之间配置底胶150,以使底胶150包覆导电凸块162。此外,在其他实施例中,亦可无底胶150,亦即可使部分第二封装胶体170填充于第二半导体元件160与第一半导体元件130之间以及第二半导体元件160与第一封装胶体140之间而毋须配置底胶150。In this embodiment, a plurality of
在本实施例中,第一半导体元件130可配置于线路基板180上,以使第一半导体元件130的多个导电凸决132电性连接至线路基板180。为保护导电凸决132,可在第一半导体元件130与线路基板180之间配置底胶190,以使底胶190包覆导电凸块132。In this embodiment, the
此外,在本实施例中,可在线路基板180上配置第三封装胶体M,第三封装胶体M覆盖第一封装胶体140的侧壁142、第二封装胶体170的侧壁172与第二半导体元件160的远离第一半导体元件130的顶面166。详细而言,部分的第三封装胶体M位于第二封装胶体170的覆盖第二半导体元件160的顶面166的部分上,换言之,第三封装胶体M是间接覆盖顶面166。在其他实施例中,第三封装胶体M可以覆盖第一封装胶体140的侧壁142以及第二封装胶体170的侧壁172,并暴露出第二封装胶体170的覆盖第二半导体元件160的顶面166的部分。此外,在其他实施例中,亦可无底胶190,亦即可使部分第三封装胶体M填充于第一半导体元件130与线路基板180之间而毋须配置底胶190。In addition, in this embodiment, a third encapsulant M can be disposed on the
另外,线路基板180的远离第一半导体元件130的底面182上可配置有多个焊球S,焊球S与线路基板180电性连接,且线路基板180可透过焊球S电性连接至其他的电子元件(例如线路板)。In addition, a plurality of solder balls S may be disposed on the bottom surface 182 of the
图2A~图2D绘示本发明另一实施例的封装工艺的剖面图。2A-2D are cross-sectional views illustrating a packaging process according to another embodiment of the present invention.
在本实施例中,可先进行图1A~图1E的工艺,之后,请参照图2A,在芯片阵列板A上形成第二封装胶体210,第二封装胶体210可选择性地覆盖第二半导体元件160的侧壁164并暴露出第二半导体元件160的远离对应的第一半导体元件130的顶面166,且填满第二半导体元件160之间的间隙G2,以保护第二半导体元件160。In this embodiment, the processes shown in FIG. 1A to FIG. 1E can be performed first, and then, referring to FIG. 2A , a
然后,请参照图2B,分离芯片阵列板A与粘着层120。之后,请同时参照图2B与图2C,沿着第二半导体元件160之间的间隙G2切割第二封装胶体170与第一封装胶体140,以形成多个芯片封装单元C2。接着,在本实施例中,可在线路基板180上形成底胶190。Then, referring to FIG. 2B , the chip array plate A and the
接着,请同时参照图2C与图2D,在本实施例中,可将芯片封装单元C2配置于线路基板180上,以使第一半导体元件130透过导电凸块132电性与结构性连接线路基板180,并使底胶190位于芯片封装单元C2的第一半导体元件130与线路基板180之间以包覆第一半导体元件130的导电凸块132。Next, please refer to FIG. 2C and FIG. 2D at the same time. In this embodiment, the chip package unit C2 can be disposed on the
请参照图2D,在本实施例中,可在线路基板180上形成第三封装胶体220,第三封装胶体220可覆盖芯片封装单元C2的侧壁W1并暴露出第二半导体元件160的顶面166。此时,已初步完成本实施例的封装结构200。此外,在其他未绘示的实施例中,第三封装胶体220可覆盖芯片封装单元C2的侧壁W1以及第二半导体元件160的顶面166。2D, in this embodiment, a
以下将详细介绍图2D的封装结构200的结构部分。The structural parts of the
请参照图2D,本实施例的封装结构200与图1I的封装结构100相似,两者的差异之处在于封装结构200的第二封装胶体210与第三封装胶体220共同暴露出第二半导体元件160的的顶面166。因此,封装结构200可透过第二半导体元件160的顶面166将第一半导体元件130与第二半导体元件160在运作时所产生的热传导至外界环境,进而提升封装结构200的散热效率。Please refer to FIG. 2D , the
综上所述,本发明先利用第一封装胶体与第二封装胶体来固定并连接第一半导体元件与第二半导体元件,之后再通过切割第一封装胶体与第二封装胶体来形成多个芯片封装单元。因此,本发明可制得由各种尺寸的芯片相互堆叠而成的封装结构。此外,由于第二封装胶体可强化厚度相当小的芯片阵列板,故可稳固地连结全部的第二半导体元件以及全部的第一半导体元件,并可在以切割的方式形成芯片封装单元的过程中,避免芯片阵列板碎裂,从而提升工艺良率。In summary, the present invention uses the first encapsulant and the second encapsulant to fix and connect the first semiconductor element and the second semiconductor element, and then forms a plurality of chips by cutting the first encapsulant and the second encapsulant packaging unit. Therefore, the present invention can produce a packaging structure in which chips of various sizes are stacked on each other. In addition, since the second encapsulant can strengthen the chip array plate with a relatively small thickness, it can firmly connect all the second semiconductor elements and all the first semiconductor elements, and can be used in the process of forming chip packaging units by dicing. , to avoid chip array plate fragmentation, thereby improving process yield.
虽然本发明已以实施例披露如上,然其并非用以限定本发明,任何所属技术领域中普通技术人员,在不脱离本发明的精神和范围内,当可作些许的更动与润饰,故本发明的保护范围当视所附的权利要求所界定为准。Although the present invention has been disclosed above with embodiments, it is not intended to limit the present invention. Any person skilled in the art may make some modifications and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention should be defined by the appended claims.
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200910174057.2A CN102044447B (en) | 2009-10-20 | 2009-10-20 | Packaging process and packaging structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200910174057.2A CN102044447B (en) | 2009-10-20 | 2009-10-20 | Packaging process and packaging structure |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102044447A CN102044447A (en) | 2011-05-04 |
CN102044447B true CN102044447B (en) | 2013-01-02 |
Family
ID=43910468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200910174057.2A Active CN102044447B (en) | 2009-10-20 | 2009-10-20 | Packaging process and packaging structure |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN102044447B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI509712B (en) * | 2012-01-20 | 2015-11-21 | Dawning Leading Technology Inc | Chip size package structure and chip size package method thereof |
CN106910519B (en) * | 2015-12-31 | 2022-12-16 | 中山市江波龙电子有限公司 | Solid state disk storage module and solid state disk |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1431708A (en) * | 2002-01-10 | 2003-07-23 | 裕沛科技股份有限公司 | Wafer type diffusion type packaging structure and manufacturing method thereof |
US6607938B2 (en) * | 2001-07-19 | 2003-08-19 | Samsung Electronics Co., Ltd. | Wafer level stack chip package and method for manufacturing same |
CN1461050A (en) * | 2002-05-24 | 2003-12-10 | 富士通株式会社 | Semiconductor device and its mfg. method |
CN101213663A (en) * | 2005-06-30 | 2008-07-02 | 费查尔德半导体有限公司 | Semiconductor die package and method of making the same |
CN101211874A (en) * | 2006-12-28 | 2008-07-02 | 育霈科技股份有限公司 | Ultra-thin chip-scale packaging structure and method thereof |
-
2009
- 2009-10-20 CN CN200910174057.2A patent/CN102044447B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6607938B2 (en) * | 2001-07-19 | 2003-08-19 | Samsung Electronics Co., Ltd. | Wafer level stack chip package and method for manufacturing same |
CN1431708A (en) * | 2002-01-10 | 2003-07-23 | 裕沛科技股份有限公司 | Wafer type diffusion type packaging structure and manufacturing method thereof |
CN1461050A (en) * | 2002-05-24 | 2003-12-10 | 富士通株式会社 | Semiconductor device and its mfg. method |
CN101213663A (en) * | 2005-06-30 | 2008-07-02 | 费查尔德半导体有限公司 | Semiconductor die package and method of making the same |
CN101211874A (en) * | 2006-12-28 | 2008-07-02 | 育霈科技股份有限公司 | Ultra-thin chip-scale packaging structure and method thereof |
Also Published As
Publication number | Publication date |
---|---|
CN102044447A (en) | 2011-05-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10916533B2 (en) | Semiconductor package | |
US9786632B2 (en) | Semiconductor package structure and method for forming the same | |
US9502335B2 (en) | Package structure and method for fabricating the same | |
US8258007B2 (en) | Package process | |
US20220157775A1 (en) | Package process and package structure | |
US20100327465A1 (en) | Package process and package structure | |
US12002721B2 (en) | Method of fabricating semiconductor structure | |
US8446000B2 (en) | Package structure and package process | |
US10515887B2 (en) | Fan-out package structure having stacked carrier substrates and method for forming the same | |
JP2005045251A (en) | Stacked semiconductor chip BGA package and manufacturing method thereof | |
TW201436161A (en) | Semiconductor package and method of manufacture | |
US8338235B2 (en) | Package process of stacked type semiconductor device package structure | |
CN111128914A (en) | Low-warpage multi-chip packaging structure and manufacturing method thereof | |
CN213936169U (en) | Secondary plastic package packaging structure | |
US9640503B2 (en) | Package substrate, semiconductor package and method of manufacturing the same | |
US9673140B2 (en) | Package structure having a laminated release layer and method for fabricating the same | |
CN102044447B (en) | Packaging process and packaging structure | |
CN102956547B (en) | Semiconductor packaging structure and manufacturing method thereof | |
CN101958253A (en) | Packaging process and packaging structure | |
US8012800B2 (en) | Method of fabricating a stacked type chip package structure and a stacked type package structure | |
CN112838067B (en) | Chip packaging structure and manufacturing method thereof | |
KR101514525B1 (en) | Semiconductor package and method of maunfacturing the same | |
CN101976652B (en) | Semiconductor packaging structure and its manufacturing process | |
CN219677250U (en) | Integrated chip packaging structure and electronic product | |
TWI771242B (en) | Dual die semiconductor package and manufacturing method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |