CN101927600A - Blowoff and jet method - Google Patents
Blowoff and jet method Download PDFInfo
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- CN101927600A CN101927600A CN2010102125107A CN201010212510A CN101927600A CN 101927600 A CN101927600 A CN 101927600A CN 2010102125107 A CN2010102125107 A CN 2010102125107A CN 201010212510 A CN201010212510 A CN 201010212510A CN 101927600 A CN101927600 A CN 101927600A
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- Prior art keywords
- moving part
- substrate moving
- substrate
- light
- main
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- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 338
- 239000007788 liquid Substances 0.000 claims abstract description 23
- 238000005259 measurement Methods 0.000 claims abstract description 5
- 230000007246 mechanism Effects 0.000 claims description 60
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 33
- 230000003068 static effect Effects 0.000 claims description 24
- 238000001035 drying Methods 0.000 claims description 3
- 239000000976 ink Substances 0.000 description 19
- 230000033228 biological regulation Effects 0.000 description 15
- 238000007639 printing Methods 0.000 description 15
- 239000007921 spray Substances 0.000 description 15
- 238000013461 design Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 241001062009 Indigofera Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 238000013316 zoning Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
- B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
- B41J29/38—Drives, motors, controls or automatic cut-off devices for the entire printing mechanism
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
- B41J29/38—Drives, motors, controls or automatic cut-off devices for the entire printing mechanism
- B41J29/393—Devices for controlling or analysing the entire machine ; Controlling or analysing mechanical parameters involving printing of test patterns
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Coating Apparatus (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Filters (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The present invention relates to blowoff and jet method.The invention provides blowoff and jet method, it constitutes, and the inclination along the direction of rotation of substrate moving part on horizontal plane of two guide rail moving substrates is detected and revises.Blowoff of the present invention (10) constitutes, and has first, second main interference device (62a), (62b) and first, second primary mirror device (61a), (61b), can be determined at the inclination of the direction of rotation on the horizontal plane of substrate moving part (20).In the moving of substrate moving part (20), control two amount of movements on the guide rail respectively, make described inclination and to move beginning preceding identical according to this measurement result.Blowoff (10) constitutes, and has first, second secondary interference device (62c), (62d) and secondary mirror device (61c), and can measure substrate moving part (20) in the axial position of x.In the moving of substrate moving part (20), by according to the axial relative position relation of x that moves and make head (32) and substrate moving part (20) of this measurement result control head (32) with to move beginning preceding identical, can make from the ejection liquid of ejiction opening (35) ejection, hit each hit location on the substrate (50).
Description
Technical field
The present invention relates to blowoff and jet method.
Background technology
Be accompanied by the development of informationized society in recent years, sharply increase, wish to improve its productivity for the demand of more large-scale liquid crystal indicator.In color liquid crystal display arrangement, use color filter in order to make the display image colorize.Color filter is to make with pattern arrangement R (red), G (green), B (indigo plant) three color inks of regulation by the regulation zone on substrate.Ink-jetting style is adopted in the ejection of printing ink more.
At present, Duo Shuo blowoff has: the pedestal static with respect to datum level, the substrate moving part that can move along first direction on pedestal, can be along perpendicular to described first direction and be parallel to the maintaining part that the second direction of datum level moves.
In the device of patent documentation 1 record, adopt in the mode that on substrate, scans to make a maintaining part come and go a move mode that moves and spray printing ink.The problem that exists in the move mode is, proportional with the maximization of substrate, the ejection of printing ink needs long-time, in addition, for the interval with regulation is equably hit printing ink, be difficult to carry out the control of head.
With respect to a move mode, a fixed form can address the above problem, and this fixed form is that maintaining part static with respect to pedestal has a plurality of ejiction openings, to the mode by the ejection of the substrate under it printing ink.
But, in a fixed form, be ejected to each hit location on the substrate in order to make printing ink from ejiction opening, need correctly to carry out the operation of contraposition to substrate and head.
Be accompanied by the maximization of substrate, the control of moving of substrate moving part becomes difficult, even make substrate enter the head below before carry out substrate with the head contraposition, during moving to the ejection position from the contraposition position on the above-mentioned first direction, also may be created in the substrate moving part towards last, the inclination (the inclination on the face parallel) of the direction of rotation that is parallel to datum level that causes in the difference of the amount of movement on each guide rail with respect to first direction or second direction with datum level.
That is, be ejected to each hit location from ejiction opening, need following operation, that is, detect, spray while revise in described inclination by the substrate moving part that produced during under the head in order to make printing ink.
Patent documentation 1:(Japan) spy opens flat 11-248925 communique
Patent documentation 2:(Japan) spy opens the 2008-238143 communique
Patent documentation 3:(Japan) spy opens the 2008-145203 communique
Patent documentation 4:(Japan) spy opens the 2006-245174 communique
Summary of the invention
The present invention creates in order to solve above-mentioned prior art problems, its purpose is, a kind of blowoff is provided, it constitutes, to spray liquid in, and can use laser that the inclination of the direction of rotation that is parallel to datum level of following the substrate moving part that moves and produce is detected and revises by the substrate ejection below the head.
In order to address the above problem, the invention provides a kind of blowoff, have: pedestal is static with respect to datum level; Two guide rails dispose at described pedestal upper edge first direction; Maintaining part is fixed in described pedestal, keeps being provided with respectively the head of a plurality of ejiction openings; Substrate moving part, mounting are in described two guide rails, and the energy placement substrate; And travel mechanism on the guide rail, described substrate moving part is moved at described first direction along described two guide rails, under described maintaining part, spray liquid from described ejiction opening to the substrate ejection that is disposed on the described substrate moving part, the drop of described ejection liquid is hit in described substrate, this blowoff has: first, second main electro-optical device that send sends first, second main light of measuring to described first direction respectively; First, second primary mirror device, vertical with described first direction and be arranged at the second direction branch that is parallel to described datum level, mainly measure light time when described first, second of irradiation, reflect and first, second principal reflection light is returned light; The first main interference device is accepted described first main light and the described first principal reflection light measured, and the described first main first main interference result who measures light and the described first principal reflection light is detected; The second main interference device is accepted described second main light and the described second principal reflection light measured, and the described second main second main interference result who measures light and the described second principal reflection light is detected; Determinator according to described first, second main interference result, is obtained the second main distance between the main distance of first between described first main interference device and the described first primary mirror device and described second main interference device and the described second primary mirror device respectively; And control device, send the measurement result of described determinator to, any device is disposed at described substrate moving part in described first, second main interference device and described first, second primary mirror device, other device is static with respect to described pedestal, described first, second main interference device is disposed at described first, second primary mirror device and described first, second main sending between the electro-optical device, travel mechanism has on the described guide rail: first travel mechanism applies first locomotivity to described first guide rail to described substrate moving part; And second travel mechanism applies second locomotivity to described second guide rail to described substrate moving part, and described control device is according to described first, second main distance, the size of described first, second locomotivity of decision.
In the blowoff of the present invention, described control device is controlled described first, second travel mechanism based on the value that is set of the difference of described first, second main distance, and described substrate moving part is moved along described two guide rails.
In the blowoff of the present invention, have: head moving mechanism can make described head move in described second direction; First pair is sent electro-optical device, sends the first secondary light of measuring in described second direction; The secondary mirror device is measured the light time when irradiation described first is secondary, reflects and the first secondary reverberation is returned light; The first secondary interference device is accepted the described first secondary light and the described first secondary reverberation measured, and the described first secondary mensuration light and the described first secondary catoptrical result of interference are detected; And determinator, according to the described first secondary result of interference, obtain the distance between the described secondary mirror device and the described first secondary interference device, the described first secondary interference device is disposed at the side parallel with the moving direction of described substrate moving part with any device in the described secondary mirror device, other device is static with respect to described pedestal, wherein, the moving direction of described substrate moving part is described first direction, described control device is according to the distance between the described secondary mirror device and the described first secondary interference device, obtain the position of described substrate moving part in described second direction, poor in the position of described second direction of the position of described second direction and described head, determine described head moving mechanism to move the amount of movement of described head according to described substrate moving part.
In the blowoff of the present invention, have: head moving mechanism can make described head move in described second direction; First, second pair is sent electro-optical device, sends first, second secondary light of measuring; The secondary mirror device secondary is measured light time when described first, second of irradiation, reflects and first, second secondary reverberation is returned light; First, second secondary interference device is accepted described first, second secondary light and described first, second secondary reverberation measured, and described first, second secondary mensuration light and described first, second secondary catoptrical result of interference are detected; And determinator, according to described first, the second secondary result of interference, obtain described secondary mirror device and described first, distance between the second secondary interference device, described first, any device in the second secondary interference device and the described secondary mirror device is disposed at described substrate moving part, other device is static with respect to described pedestal, described control device is according to the distance between the described secondary mirror device and the described first secondary interference device, in the distance between the described secondary mirror device and the described second secondary interference device any or two, obtain the position of described substrate moving part in described second direction, poor in the position of described second direction of the position of described second direction and described head, determine described head moving mechanism to move the amount of movement of described head according to described substrate moving part.
In the blowoff of the present invention, described control device is based on described substrate moving part position and described value that is set in the difference of the position of described second direction in described second direction, control described head moving mechanism, described substrate moving part is moved along described two guide rails.
The invention provides a kind of jet method, head-clamp on the pedestal of level is being held in therebetween and each other between the starting point and terminal point at opposition side, along two guide rails from described starting point to described terminal point mounting substrate on the substrate moving part that first direction moves, described substrate moving part is moved towards described terminal point, at described substrate by during below the described head, spray liquid from ejiction opening to described substrate ejection, after described substrate moving part arrives described terminal point, make described drying substrates, unload described substrate from described substrate moving part, before described substrate moving part moves, measure the inclination on the face parallel of described substrate moving part with respect to described first direction or described second direction with datum level, in the moving of described substrate moving part, measure the described inclination of described substrate moving part, change each amount of movement on described two guide rails respectively, so that the described error that moves middle generation that is tilted in of described substrate moving part is zero, the limit makes the described inclination of described substrate moving part equate that with mobile preceding described inclination the limit makes the below of described substrate by described head.
In the jet method of the present invention, before described substrate moving part moves, measure the position of the described second direction of described substrate moving part in advance, in the moving of described substrate moving part, the described inclination that makes described substrate moving part with move beginning before described inclination equate after, measure the position of described substrate moving part in described second direction, move described head, so that described substrate moving part the position of described second direction and described head the difference of the position of described second direction with move beginning before identical, the limit makes the relative position relation of the described second direction between described substrate moving part and the described head identical with mobile preceding relative position relation, and the limit makes the below of described substrate by described head.
In the jet method of the present invention, behind the described substrate of mounting on the described substrate moving part, described substrate moving part is moved, described substrate enter described head below before, make the position of an end in face of described head static, so that the mode under the ejiction opening of each hit location on the described substrate by being arranged at described head is carried out contraposition.
In the jet method of the present invention, on in described substrate moving part and described pedestal any, configuration is when irradiation first, second main measures that the light time reflects and with first, the second principal reflection light returns first of light, the second primary mirror device, on another, configuration acceptance described first main mensuration light and the described first principal reflection light and the first main interference device that the described first main first main interference result who measures light and the described first principal reflection light is detected, and accept the described second main second main interference device of measuring light and the described second principal reflection light and the described second main second main interference result who measures light and the described second principal reflection light being detected, according to described first, the second main interference result obtains described first, the second main interference device and described first, between the second primary mirror device first, the second main distance, according to described first, the described inclination of the described substrate moving part of the second main range determination, on in described substrate moving part and described pedestal any, configuration is when irradiation first, second secondary measures that the light time reflects and with first, the second secondary reverberation returns the secondary mirror device of light, on another, configuration is accepted described first and is secondaryly measured light and the described first secondary reverberation and secondaryly measure the first secondary interference device that light and the described first pair catoptrical first secondary result of interference detect to described first, and accept described second and secondary measure light and the described second secondary reverberation and secondaryly measure the second secondary interference device that light and the described second pair catoptrical second secondary result of interference detect described second, according to described first, the second secondary result of interference obtains described first, between the second secondary interference device and the described secondary mirror device first, the second secondary distance is according to described first, any of the second secondary distance or two positions of measuring the described second direction of described substrate moving part.
The inclination of the direction of rotation that is parallel to datum level that the present invention can cause the difference along the amount of movement of substrate moving part on each guide rail of two guide rail moving substrates detects and revises, therefore, can correctly printing ink be sprayed to substrate, improve the yield rate that substrate is made.
Description of drawings
Fig. 1 is the side view of an example of blowoff of the present invention;
Fig. 2 is the plane of an example of blowoff of the present invention;
Fig. 3 (a): being the schematic diagram of the image of image with first, second fixed cameras fixed cameras when being positioned over a plane coordinates, (b) is the schematic diagram of the image of image with the 3rd, the 4th fixed cameras fixed cameras when being positioned over a plane coordinates;
Fig. 4 is an explanation head and the figure of the configuration of ejiction opening;
Fig. 5 is that a plurality of ejiction openings of explanation are lined up and are staggered and the figure of head when forming ejiction opening row and the configuration of ejiction opening;
Fig. 6 is that the A-A line of blowoff blocks profile;
Fig. 7 is that the B-B line of blowoff blocks profile;
The plane of the blowoff during Fig. 8 has been a mounting first, second substrate;
Symbol description
10 ... blowoff
20 ... the substrate moving part
30 ... maintaining part
32 ... head
35 ... ejiction opening
41 ... travel mechanism on the guide rail
48a, 48b ... first, second travel mechanism
49 ... head moving mechanism
50 ... substrate
61a, 61b ... first, second primary mirror device
61c ... the secondary mirror device
62a, 62b ... first, second main interference device
62c, 62d ... first, second secondary interference device
70 ... pedestal
71a, 71b ... first, second guide rail
92 ... control device
93a, 93b ... first, second determinator
The specific embodiment
Below, will in the manufacturing of RGB (red, green, blue) color filter, use the situation of blowoff to describe as an example.
The present invention is not limited to the manufacturing of RGB color filter, for example also comprises the manufacturing of EL (electroluminescent) display element or liquid crystal indicator.
The structure of＜blowoff 〉
Fig. 1 represents the side view of the blowoff 10 that uses among the present invention, and Fig. 2 represents plane.
The 48a of first, second travel mechanism, 48b for example use linear motor.Fig. 6 represents to illustrate that the A-A line of the blowoff 10 of one of structure of travel mechanism 41 on the guide rail example blocks profile.The 48a of first, second travel mechanism, 48b have first, second variable electromagnet 45a, 45b and a plurality of first, second fixed electromagnet 46a, 46b respectively.First, second variable electromagnet 45a, 45b are fixed in the substrate moving part 20 times.A plurality of first, second fixed electromagnet 46a, 46b spread all over the long dimensional directions separately of first, second guide rail 71a, 71b, equally spaced arrange in each guide rail and fixing.
On the face under the substrate moving part 20, be provided with air ejiction opening 47,, making air layer between substrate moving part 20 and first, second guide rail 71a, 71b, and do not contact by from air ejiction opening 47 ejection air.
When the 48a of first, second travel mechanism, 48b accept from signal that control device 92 transmits respectively separately, the long dimensional directions that can make a plurality of first, second magnetic poles of fixed electromagnet 46a, 46b spread all over each guide rail respectively changes, and, apply first, second locomotivity with respect to first, second guide rail 71a, 71b to the substrate moving part 20 of first, second variable electromagnet 45a, 45b has been installed respectively.Because first, second guide rail 71a, 71b are fixed on the pedestal 70, therefore, when substrate moving part 20 is applied in first, second locomotivity, on first, second guide rail 71a, 71b, move.
Below, the moving direction (first direction) of the substrate moving part 20 that will move along first, second guide rail 71a, 71b is called the y direction of principal axis, and the vertical and direction (second direction) parallel with datum level with it is called the x direction of principal axis.
Maintaining part 30 has: installing plate 33; Be installed on a plurality of 32 of installing plate 33.
Fig. 4 is explanation 32 and the schematic diagram of the configuration of ejiction opening 35.
Each 32 has a plurality of ejiction openings 35.A plurality of ejiction openings 35 of one stature 32 are arranged in row in this one side of 32 and form the ejiction opening row, perhaps, are arranged in a plurality of row that are parallel to each other, and form a plurality of ejiction opening row that are parallel to each other.
In the present invention, a plurality of ejiction openings of a stature 32 35 be as long as equidistant configuration on a direction then not necessarily must be arranged on the straight line, for example, also can line up as shown in Figure 5 and are staggered, and form an ejiction opening and are listed as.
At this, each 32 with an above-mentioned direction become parallel with the x direction of principal axis towards and be installed on installing plate 33.
Each 32 forms, and the length of an above-mentioned direction of head adds that than the length of ejiction opening row (ejiction opening of end in the heart the distance of an above-mentioned direction) length of ejiction opening interval D is bigger.Therefore, when being arranged in row parallel with the x axle with a plurality of 32, and the position on the y axle is made as when identical, the axial distance of x between the ejiction opening of the ejiction opening row end of a stature and the ejiction opening in the ejiction opening row end of the head of adjacency is with than the bigger distance of ejiction opening interval D separately.
Among the present invention, even if a plurality of 32 that arrange along the x direction of principal axis between the ejiction opening of the end of different heads, also so that the axial distance of x becomes the mode of ejiction opening interval D, with adjacency the head ejiction opening 35 on the y axle, be disposed at different positions, the end of the head of adjacency is overlapping on the x axle, comprise between the ejiction opening of different heads, each ejiction opening 35 disposes according to the mode of arranging with the ejiction opening interval D on the x axle.
Under this situation, a plurality of the ejiction opening of arranging along the x axle 35 can be configured to two kinds of positions on the y axle, and when the ejiction opening row alternate configurations of the head of adjacency was two kinds of positions, one group a plurality of 32 that dispose like this were staggered, constitute a stature group 38.
Organize 38 installing plate 33 the higher authorities and be configured many groups.
The head group 38 of stated number n constitutes the head group, in a stature group, in a stature group between two ejiction openings 35 of adjacency, respectively disposes the ejiction opening 35 of other group to become the mode of D/n uniformly-spaced at the x direction of principal axis.
Maintaining part 30 has not shown print cartridge, stores the printing ink that a kind of color in R, G, B three looks is arranged in print cartridge.Each 32 is connected with print cartridge.
Each ejiction opening 35 has the ink chamber that portion within it fills printing ink (ejection liquid) respectively, disposes Pressure generator respectively in each ink chamber.Each Pressure generator is accepted to make the pressure that produces regulation in the ink chamber from the signal of control device 92 transmission of outside, and then sprays the printing ink of ormal weights from ejiction opening 35.
Have in a maintaining part 30 under the situation of the head group more than three, each of each 32 head group is connected in the print cartridge of different colours, and thus, a stature maintaining part 30 can spray the printing ink of 3 kinds of colors.
Fig. 7 is that the B-B line of blowoff 10 blocks profile.
The face towards the top of the second mounting table 24b forms the identical height of the face towards the top with the first mounting table 24a.
The face towards the top of first, second mounting table 24a, 24b all has not shown suction inlet, and suction inlet is connected in not shown vavuum pump.With substrate 50 after disposing in the mode relevant on first, second mounting table 24a, the 24b with two mounting tables, when utilizing vavuum pump to carry out exhaust, substrate 50 by vacuum suction in first, second mounting table 24a, 24b is last and be held.
As shown in Figure 8, for blowoff 10 of the present invention, also first, second substrate 50a, 50b can be disposed at respectively on first, second mounting table 24a, the 24b.After having disposed first, second substrate 50a, 50b, when utilizing not shown vavuum pump to carry out exhaust, first, second substrate 50a, 50b respectively by vacuum suction in first, second mounting table 24a, 24b is last and be held.
With reference to Fig. 2, Fig. 8, on substrate 50 and first, second substrate 50a, 50b, separate provision has R, G, the B zone that should hit of all kinds (hit location).Substrate 50 has respectively in the direction parallel with respect to a direction with first, second substrate 50a, 50b and forms cancellate black matrix (black matrix) with vertical direction, and each hit location is disposed at the zone that gone out by the black matrix zoning.
The interval of the hit location of the direction adjacency on each substrate of substrate 50 and first, second substrate 50a, 50b, identical with the ejiction opening interval D/n in x direction of principal axis adjacency among the stature group, the length of the integral multiple of the ejiction opening interval D/n that perhaps forms in x direction of principal axis adjacency.
Any device is configured in substrate moving part 20 among first, second main interference device 62a, 62b and first, second primary mirror device 61a, the 61b, and other device is fixed on the static pedestal of relative datum face 70.
At this, blowoff 10 has a light source 75 and first, second beam splitter 63a, 63b at least.Constitute the first main electro-optical device that send by the light source 75 and the first beam splitter 63a, constitute the second main electro-optical device that send by the light source 75 and the second beam splitter 63b.Send first, second main light 65a, 65b of measuring respectively from first, second main electro-optical device that send.
First, second main interference device 62a, 62b are disposed at minute surface and first, second main the sending between the electro-optical device of first, second primary mirror device 61a, 61b.
First, second main interference result is transmitted to the second determinator 93b, obtain first, second the main distance between first, second main interference device 62a, 62b and first, second primary mirror device 61a, the 61b.
Can set the poor Δ L of first, second main distance at control device 92.
For example, begin before the y direction of principal axis moves at substrate moving part 20, during the poor Δ L of first, second the main distance when the axial arrangement of x of the hit location on control device 92 being set the axial arrangement of x that makes ejiction opening 35 and substrate 50 is parallel, first, second main distance L of transmission in substrate moving part 20 moves
1, L
2Difference than the big (L of the value Δ L that sets
1-L
2＞Δ L), control device 92 control first 48a of travel mechanism also reduce first locomotivity, perhaps control second 48b of travel mechanism and increase second locomotivity, make amount of movement on the second guide rail 71b, make first, second main distance L greater than the amount of movement on the first guide rail 71a
1, L
2Difference identical with the value Δ L of setting.When first, second main distance L
1, L
2Difference than the L hour (L of value Δ that sets
1-L
2＜Δ L), control device 92 control first 48a of travel mechanism also increase first locomotivity, perhaps control second 48b of travel mechanism and reduce second locomotivity, make amount of movement on the second guide rail 71b, make first, second main distance L less than the amount of movement on the first guide rail 71a
1, L
2Difference identical with the value Δ L of setting.
Therefore, with respect to the direction of advance of the substrate moving part 20 in moving towards, can maintain with move beginning preceding towards identical.
In addition, because can detect the correct amount of movement of substrate moving part 20, so can carry out correct mobile control.
In the explanation of following blowoff 10, so that the situation of substrate 50 mountings on substrate moving part 20 described, but first, second substrate 50a, the situation of 50b mounting on substrate moving part 20 is also identical.
Before substrate moving part 20 is about to begin move, as described later, substrate 50 rotations of mounting on substrate moving part 20, be arranged as the contraposition that parallel mode is carried out angle so that the axial arrangement of the x of the hit location on the substrate 50 and the x of ejiction opening 35 are axial, when will with respect to the direction of advance of substrate moving part 20 towards be maintained with the angle contraposition of substrate 50 and ejiction opening 35 time identical towards the time, substrate moving part 20 has carried out with respect to ejiction opening 35 at substrate 50 moving at the y direction of principal axis under the state of contraposition of angle.
Therefore, when substrate moving part 20 being maintained aforesaid direction and moving it, each hit location on the substrate 50 and the axial distance of y between the ejiction opening 35 of this hit location ejection ejection liquid become the value that value before begin to move only deducts the amount of movement of substrate moving part 20, can not spray liquid produce error from ejiction opening 35 ejection timings not making.
At this, blowoff 10 has the 3rd, the 4th beam splitter 63c, 63d.Constitute first pair by light source 75 and the 3rd beam splitter 63c and send electro-optical device, constitute second pair by light source 75 and the 4th beam splitter 63b and send electro-optical device.Send electro-optical device to send first, second secondary light 65c, 65d of measuring respectively from first, second pair.
The first secondary interference device 62c is disposed at the side parallel with the moving direction (y direction of principal axis) of substrate moving part 20 (under the situation of the first secondary interference device 62c with any device among the secondary mirror device 61c, its sensitive surface is disposed at above-mentioned side, under the situation of secondary mirror device 61c, its reflecting surface is disposed at above-mentioned side), other device is fixed on the static pedestal of relative datum face 70.
At this, the first secondary interference device 62c is arranged at position, the side static pedestal of relative datum face 70, that separate with the moving range of substrate moving part 20, the i.e. position of the transverse direction of a maintaining part 30, secondary mirror device 61c is arranged at the side of substrate moving part 20, i.e. the position that can face of the minute surface and the first secondary interference device 62c.
At this, substrate moving part 20 is that starting point begins to move from the position of mounting substrate 50 on substrate moving part 20, by a maintaining part 30 below after, the substrate 50 that arrival will spray printing ink is a terminal point from the position that substrate moving part 20 unloads, and finishes mobile.
The first secondary interference device 62c be disposed in the ejiction opening 35 in the maintaining part 30 than near the ejiction opening 35 of starting point more near the position of starting point, the end of the terminal point side of the minute surface of secondary mirror device 61c extend to than near the hit location of the terminal point of the substrate on the substrate moving part 20 50 more near the position of terminal point.
Therefore, the arriving than near the ejiction opening 35 of starting point more before the position near terminal point of substrate 50 near the hit location of terminal point, the minute surface of the first secondary interference device 62c and secondary mirror device 61c begins to face.
The first secondary result of interference is transmitted to the second determinator 93b, obtain the first secondary distance between the first secondary interference device 62c and the secondary mirror device 61c.
Store the x coordinate of first static on the pedestal 70 secondary interference device 62c with respect to datum level at control device 92.Therefore, control device 92 can be obtained the x coordinate with respect to datum level (the axial position of x) of substrate moving part 20 from the first secondary Determination of distance result.
As described later, a maintaining part 30 have make a plurality of 32 integratedly with respect to datum level at the mobile head moving mechanism 49 of x direction of principal axis.Head moving mechanism 49 is measured by the first determinator 93a with band ± symbol at the axial amount of movement of x, and transmits to control device 92.For example, before 32 began to move, the value of establishing the first determinator 93a was zero, when making 32 when this state moves, just became as can be known in the axial position of x with respect to moving 32 after the moving of position before the beginning.
For example, control device 92 constitutes in the following manner, promptly, before substrate moving part 20 begins to move, when carrying out contraposition by the mode under the ejiction opening 35 with the hit location on the substrate 50, if the value of the first determinator 93a of 32 amount of movement is zero, and when the axial position of x of setting substrate moving part 20 in control device 92, when the value of the first secondary distance that is transmitted in substrate moving part 20 is moved increases and decreases, according to this increase and decrease, control device 92 control head travel mechanisms 49 also make 32 to move, and the axial position of x that makes substrate moving part 20 is poor with 32 the axial position of x, and is identical with the value of setting.
Therefore, the substrate moving part 20 in moving and the axial relative position relation of x between 32 can be maintained with to move beginning preceding identical.
As described later, before substrate moving part 20 is about to begin move, after the contraposition of the angle of carrying out substrate 50 and ejiction opening 35, become one and move for a plurality of 35 at the x direction of principal axis, with each hit location by the regulation ejiction opening 35 under mode carry out the axial contraposition of x, when with substrate moving part 20 when being maintained as described above with contraposition identical towards, and with substrate moving part 20 when the axial relative position relation of x between 32 is maintained with the axial contraposition of x when identical, substrate moving part 20 each hit location on the substrate 50 by the regulation ejiction opening 35 under state under, move at the y direction of principal axis.
Therefore, when substrate moving part 20 is kept above-mentioned towards with the position relation and carry out when mobile, can not make ejection liquid from the moment of ejiction opening 35 ejections, produce error, and can not produce error in the hit location and the actual position of hitting of ejection liquid of the regulation on the substrate 50.
On pedestal 70,, be provided with the second secondary interference device 62d in position than the more close terminal point side of the first secondary interference device 62c.
When substrate moving part 20 carries out when mobile, the minute surface of the first secondary interference device 62c and secondary mirror device 61c face during, the second secondary interference device 62d begins to face with secondary mirror device 61c, substrate moving part 20 moves, the end of the starting point side of the minute surface of secondary mirror device 61c moves to than the first secondary interference device 62c more by the terminal point side, the minute surface by the first secondary interference device 62c and secondary mirror device 61c when finishing the first secondary Determination of distance, facing of minute surface by the second secondary interference device 62d and secondary mirror device 61c begins the second secondary Determination of distance between the second secondary interference device 62d and the secondary mirror device 61c.
Store the x coordinate of second static on the pedestal 70 secondary interference device 62d with respect to datum level at control device 92.Therefore, control device 92 is obtained the x coordinate (x axial position) of substrate moving part 20 with respect to datum level from the second secondary Determination of distance result.
The present invention is not limited to the situation that begins to measure the second secondary distance when facing of the minute surface of the first secondary interference device 62c and secondary mirror device 61c finished, also can be the minute surface of the second secondary interference device 62d and secondary mirror device 61c begin in the face of the time, begin the second secondary Determination of distance, facing of minute surface until the first secondary interference device 62c and secondary mirror device 61c finished, obtain the axial position of x of substrate moving part 20 from the second secondary Determination of distance result, also can obtain the axial position of x of substrate moving part 20 from the both sides' of first, second secondary distance measurement result.
At this, the second secondary interference device 62d be disposed at than near the position of the ejiction opening 35 of terminal point more near the position of terminal point, the end of the starting point side of the minute surface of secondary mirror device 61c extend to than near the hit location of the starting point of the substrate on the substrate moving part 20 50 more by the starting point side.
Therefore, after the minute surface of the first secondary interference device 62c and secondary mirror device 61c begins to face, any of first, second secondary interference device 62c, 62d or two continue to carry out and the facing of secondary mirror device 61c, until arriving than near the position of the ejiction opening 35 more close terminal points of terminal point of substrate 50 near the hit location of starting point, under can the state when carrying out the axial contraposition of x, keep the axial relative position relation of x between substrate moving part 20 and 32.
The present invention also can constitute, the minute surface of secondary mirror device 61c forms longer in the length sum of the axial arrangement of y at the length and the ejiction opening 35 of the axial arrangement of y than the hit location of substrate 50, from arriving than near the ejiction opening 35 of starting point during of substrate 50 more near the position of terminal point near the hit location of terminal point, until arriving than near the ejiction opening 35 of terminal point more till the position near terminal point of substrate 50, can continue to carry out the facing of minute surface of the first secondary interference device 62c and secondary mirror device 61c near the hit location of starting point.
In addition, among the present invention, secondary mirror device 61c forms and grows crosswise, position, side in the moving range pedestal 70 static, that leave substrate moving part 20 with respect to datum level, promptly in the position of the transverse direction of a maintaining part 30, long dimensional directions is provided with along the y direction of principal axis, and first, second secondary interference device 62c, 62d can be arranged at substrate moving part 20.
The minute surface of secondary mirror device 61c is towards the moving range configuration of substrate moving part 20, in the single side face of substrate moving part 20 by with in opposite directions position of the minute surface of secondary mirror device 61c the time, Yi Bian the first secondary interference device 62c or the second secondary interference device 62d on one side with the minute surface of secondary mirror device 61c in the face of passing through.
The end of the starting point side of secondary mirror device 61c extend to than near the ejiction opening 35 of starting point more near the position of starting point side, same, the end of the terminal point side of secondary mirror device 61c extend to than near the ejiction opening 35 of terminal point more near the position of terminal point.
The first secondary interference device 62c be disposed at than substrate 50 near the hit location of terminal point more near the position of terminal point, the second secondary interference device 62d be disposed at than substrate 50 near the hit location of starting point more near the position of starting point.
Therefore, move from the off at substrate moving part 20, arriving than near the ejiction opening 35 of starting point more before the position near starting point of substrate 50 near the hit location of terminal point, the minute surface of the first secondary interference device 62c and secondary mirror device 61c begins to face, until arriving than near the ejiction opening 35 of terminal point more till the position near terminal point of substrate 50 near the part of starting point, continue to carry out the facing of minute surface of the first secondary interference device 62c or the second secondary interference device 62d and secondary mirror device 61c, under can the state when having carried out the axial contraposition of x, keep the axial relative position relation of x between substrate moving part 20 and 32.
That is, can utilize first, second main interference device 62a, 62b correctly to detect substrate moving part 20 at inclination of the direction of rotation on the xy plane (on the xy plane with respect to x direction of principal axis or the axial inclination of y) and the axial amount of movement of y.In addition, can utilize first, second secondary interference device 62c, 62d correctly to detect the axial side-play amount of x of following substrate moving part 20 to move at the y direction of principal axis.
＜printing ink jet method 〉
The ejection operation that sprays printing ink (ejection liquid) on the subtend substrate 50 describes.
Below, with before the ejection on substrate moving part 20 position of mounting substrate 50 be called starting point, ejection back is called terminal point from the position that substrate moving part 20 unloads infrabasal plate 50.Starting point and terminal point make a maintaining part 30 be clipped on the y axle to be positioned at opposition side therebetween each other.
By the contraposition operation in the first contraposition operation described later, each 32 carries out contraposition with respect to the reference position.
At first, make substrate moving part 20 move to starting point and static.With substrate 50 according to the mode mounting relevant with two mounting tables on first, second mounting table 24a, 24b, carry out vacuum suction, substrate 50 absorption is remained on first, second mounting table 24a, the 24b.
Then,, substrate 50 is moved towards terminal point with substrate moving part 20, carry out a maintaining part 30 in face of substrate 50 on each hit location and the ejiction opening 35 of regulation to bit position, temporarily static.
Contraposition operation in the second contraposition operation is such as described later, by mobile camera 21 and first, second fixed cameras 31a, 31b, the ejiction opening 35 of each hit location on the substrate 50 and regulation is carried out contraposition.
After the contraposition, first, second main interference device 62a, 62b face with first, second primary mirror device 61a, 61b respectively, measure first, second the main distance between first, second main interference device 62a, 62b and first, second primary mirror device 61a, the 61b or measure from first, second main apart from the inclination with respect to x direction of principal axis (or y direction of principal axis) on the xy plane of the substrate moving part of obtaining 20.
In addition, for example,,, obtain the axial position of x of substrate moving part 20 by mobile camera 21 being moved and the initial point that is set in datum level being taken making under the static state of substrate moving part 20.
Then, towards terminal point, begin moving of substrate moving part 20.
Control the 48a of first, second travel mechanism, 48b from first, second main Determination of distance result, and so that the inclination on the xy plane of first, second main distance poor or the substrate moving part 20 obtained from the difference of first, second main distance with respect to x direction of principal axis (perhaps y direction of principal axis), the mode that the value preceding with moving beginning equates, change the amount of movement on first, second guide rail 71a, the 71b respectively, and make substrate moving part 20 with respect to direction of advance towards with begin to move before contraposition towards identical.
Therefore, each hit location and will spray the y axial distance of liquid between the ejiction opening 35 of this hit location ejection and be, value before begin to move only deducts the value of the amount of movement of substrate moving part 20, can calculate each hit location by spraying moment of lower position that liquid is ejected into the ejiction opening 35 of this hit location.
From begin by the ejiction opening 35 that sprays at first the ejection before, to by till the ejiction opening that sprays the at last 35 ejection ejection liquid, any or two that continue to carry out first, second secondary interference device 62c, 62d face with the minute surface of secondary mirror device 61c, measure any or two of first, second secondary distance between first, second secondary interference device 62c, 62d and the secondary mirror device 61c.
Any or two from first, second secondary Determination of distance result, obtain the axial position of x of substrate moving part 20, head moving mechanism 49 is controlled, and so that the axial position of the x of substrate moving part 20 and 32 the axial position of x is poor, with the identical mode of value that begins to move preceding contraposition, make 32 to move, make the axial relative position relation of x between substrate moving part 20 and 32, with begin to move before the relation of contraposition is identical.
Therefore, each hit location by will spray liquid be ejected to this hit location ejiction opening 35 under.Since hit location by under the moment calculate, so the ejection liquid in the moment of calculating from 35 ejections of each ejiction opening hits the hit location of regulation.
When substrate moving part 20 was reached home, ejection liquid hit each hit location on the substrate 50, after drying is carried out in the position of unloading, removed vacuum suction, unloaded infrabasal plate 50 from first, second mounting table 24a, 24b.
As shown in Figure 8, also can with first, second substrate 50a, 50b respectively mounting on first, second mounting table 24a, 24b, and will spray liquid and be ejected on first, second substrate 50a, the 50b.Under this situation, in the jet method of above-mentioned ejection liquid, carry out the first substrate 50a and 32 contraposition by the contraposition operation of the second contraposition operation after, carry out the second substrate 50b and 32 contraposition by the contraposition operation of the 3rd contraposition operation described later at once, then, towards terminal point, begin moving of substrate moving part 20.Like this, first, second substrate 50a, 50b keeps moves with 32 alignment and at the y direction of principal axis, hits the hit location of the regulation on first, second substrate 50a, the 50b from the ejection liquid of ejiction opening 35 ejections.
＜the first contraposition operation 〉
Below, the first contraposition operation that the position finding operation by the video camera datum mark of initial point contraposition operation, head array contraposition operation, fixed cameras is constituted describes.
When will the direction vertical and parallel with datum level with respect to the substrate moving part 20 and the moving direction of substrate moving part 20 being called directions X, substrate moving part 20 has can make mobile camera 21 in video camera travel mechanism 44 that directions X moves.Be provided with motor in video camera travel mechanism 44, when accepting, mobile camera 21 moved at directions X from signal that control device 92 transmits.
＜initial point contraposition operation 〉
At first, carry out the contraposition of mobile camera 21 and initial point, to distinguish any the xy coordinate that utilizes on the image that mobile camera 21 takes with respect to datum level.
Determinator 93 externally be provided with the amount of movement on the x coordinate of mobile camera 21 with band ± symbol and the x direction of principal axis Distnace determination device of measuring, with the amount of movement on the y coordinate with band ± symbol and the y direction of principal axis Distnace determination device measured, when point-to-point transmission moves, can distinguish the x composition and the y composition of the vector that links mobile starting point and terminal point at mobile camera 21.Since measure apart from tape symbol, therefore, come and go and move and the measured value during return to origin is zero.
The scope that can take at mobile camera 21 is in the visual field, is defined in moving reference point motionless in the visual field.
In 10, stipulate the xy origin static in this blowoff with respect to datum level.
When mobile camera 21 is mobile from this state, can distinguish on the image of taking by mobile camera 21, with the xy coordinate of moving reference point position overlapped with respect to datum level.
＜head array contraposition operation 〉
Then, move and the moving of the directions X of mobile camera 21, mobile camera 21 is positioned under the ejiction opening 35 by the y of substrate moving part 20 is axial.
The image of observation mobile camera 21 when making moving reference point consistent with the center of the image of this ejiction opening 35, is obtained the xy coordinate of this ejiction opening 35 with respect to datum level from the value of determinator 93.
Utilize all ejiction openings 35 to repeat the mensuration operation of such ejiction opening 35 with respect to the xy coordinate of datum level.
The xy coordinate with respect to datum level of each ejiction opening 35 is predetermined setting value respectively.When having error with respect to the measured value of the xy coordinate of datum level and setting value, each 32 indivedual position correction unit (micrometer screw) that had is controlled by the signal that staff or control device 92 transmit, and revises according to the xy coordinate with respect to datum level of ejiction opening 35 mode consistent with setting value.The xy coordinate with respect to datum level of revised each ejiction opening 35 is stored in control device 92.
The position finding operation of the video camera datum mark of＜fixed cameras 〉
Maintaining part 30 has first, second, third, fourth fixed cameras 31a, 31b, 31c, 31d.First, second, third, fourth fixed cameras 31a, 31b, 31c, 31d are fixed in the axial end of y of a maintaining part 30.First, second, third, fourth fixed cameras 31a, 31b, 31c, 31d have camera lens in the lower end, therefore, can substrate 50 and first, second substrate 50a, the 50b that move below be taken.
First, second fixed cameras 31a, 31b are configured to following manner design, promptly, equate that with distance between first, second substrate reference points 51a, the 51b that the substrate 50 and the first substrate 50a two substrates are had respectively the line segment that links first, second video camera datum mark is parallel with the x direction of principal axis in the distance between first, second video camera datum mark of setting respectively on first, second fixed cameras 31a, the 31b.
Three, the configuration of the 4th fixed cameras 31c, 31d designs as follows, promptly, the distance between the 3rd, the 4th video camera datum mark of setting respectively on the 3rd, the 4th fixed cameras 31c, the 31d and the second substrate 50b had the 3rd, distance between tetrabasal datum mark 51c, the 51d equates that the line segment that links the 3rd, the 4th video camera datum mark is parallel with the x direction of principal axis.
But in fact first, second, third, fourth fixed cameras 31a, 31b, 31c, 31d be because the alignment error when being fixed in maintaining part 30, and be installed in the position of off-design value.
The position of first, second, third, fourth fixed cameras 31a, 31b, 31c, the 31d video camera datum mark on each camera lens has the fixation mark that can utilize mobile camera 21 to take from the outside.Mobile camera 21 is moved, and be located under the first fixed cameras 31a.On the image that utilizes mobile camera 21 to take, when the image of the fixation mark of the first fixed cameras 31a is consistent with moving reference point, according to the value of determinator 93, measure the xy coordinate with respect to datum level of the video camera datum mark of the first fixed cameras 31a.Second, third, the xy coordinate with respect to datum level of the video camera datum mark of the 4th fixed cameras 31b, 31c, 31d measures too, and stores respectively.
Among the present invention, distance between first, second substrate reference points 51a, the 51b of substrate 50 is identical with distance between first, second video camera datum mark, be not limited to the situation of utilizing first, second fixed cameras 31a, 31b to take, as long as the distance between two the different video camera datum marks in the video camera datum mark of four fixed cameras 31a, 31b, 31c, 31d is identical, can utilizes two fixed cameras of correspondence to take and get final product.
＜the second contraposition operation 〉
Below, the following second contraposition operation of carrying out is described, promptly, during the substrate 50 or the first substrate 50a any (in the following description be representative with the first substrate 50a) below by a maintaining part 30, carry out the contraposition operation by the mode under at least one ejiction opening 35 according to each hit location on the substrate.
The image that utilizes first, second fixed cameras 31a, 31b to take carries out image by control device 92 to be handled, and distinguishes the xy coordinate with respect to datum level of the assigned position in the image.
At first, substrate moving part 20 is moved at the y direction of principal axis, and first, second substrate reference points 51a, 51b that the first substrate 50a is had lay respectively under first, second fixed cameras 31a, the 31b.
The schematic diagram of the fixed cameras image when Fig. 3 (a) expression is positioned over a plane coordinates with image 85a, the 85b of first, second fixed cameras.
When the first substrate rotating mechanism 42 is accepted from signal that control device 92 transmits, make the first mounting table 24a, remain on first, second substrate 50a, 50b on the first mounting table 24a, rotate predetermined angular abreast with respect to substrate moving part 20 and datum level.
First, second substrate reference points 51a, 51b after rotation is moved carries out image by control device 92 to be handled, and is stored in control device 92 with respect to the xy coordinate of each datum level.
On the first substrate 50a, preestablish the relative position of first, second substrate reference points 51a, 51b and each hit location, therefore, obtain the xy coordinate with respect to datum level of each hit location according to the xy coordinate of first, second substrate reference points 51a, 51b.
Each ejiction opening 35 carries out contraposition by the first above-mentioned contraposition operation, and is stored in control device 92 with respect to the xy coordinate of datum level.
Maintaining part 30 have the installing plate of making 33 with respect to a maintaining part 30 at the mobile head moving mechanism 49 of x direction of principal axis.At head moving mechanism 49 travel motor is set.
When head moving mechanism 49 is accepted from signal that control device 92 transmits, make installing plate 33, be installed in 32 on the installing plate 33 and move predetermined distance at the x direction of principal axis with respect to a maintaining part 30.
Finish the second contraposition operation according to above order.Under this state, the first substrate 50a by a maintaining part 30 below during, each hit location on the first substrate 50a by at least one ejiction opening 35 under.
＜the three contraposition operation 〉
Below, following the 3rd contraposition operation of carrying out is described, that is, and with the second substrate 50b by a maintaining part 30 below during, each hit location on the second substrate 50b is carried out the contraposition operation by the mode under at least one ejiction opening 35.
The image that utilizes the 3rd, the 4th fixed cameras 31c, 31d to take carries out image by control device 92 to be handled, and distinguishes the coordinate of the desired position in the image.
At first, substrate moving part 20 is moved at the y direction of principal axis, and make that the second substrate 50b had the 3rd, tetrabasal datum mark 51c, 51d lay respectively under the 3rd, the 4th fixed cameras 31c, the 31d.
The schematic diagram of the fixed cameras image when Fig. 3 (b) expression is placed on a plane coordinates with image 85c, the 85d of the 3rd, the 4th fixed cameras.
When the second substrate contraposition mechanism 80 accepted from signal that control device 92 transmits, the second substrate 50b that make the second mounting table 24b, remains on the second mounting table 24b rotated predetermined angular abreast with respect to substrate moving part 20 and datum level.
After rotation is moved the 3rd, tetrabasal datum mark 51c, 51d carry out image by control device 92 to be handled, and is stored in control device 92 with respect to the xy coordinate of each datum level.
On the second substrate 50b, preestablish the 3rd, tetrabasal datum mark 51c, 51d and aligning of each hit location put, therefore, according to the 3rd, the xy coordinate of tetrabasal datum mark 51c, 51d obtains the xy coordinate with respect to datum level of each hit location.
Each ejiction opening 35 carries out contraposition by first, second above-mentioned contraposition operation, and is stored in control device 92 with respect to the xy coordinate of datum level.
When the second substrate contraposition mechanism 80 accepts from signal that control device 92 transmits, make the second substrate 50b that remains on the second mounting table 24b move predetermined distance at the x direction of principal axis with respect to the first mounting table 24a.
Finish the 3rd contraposition operation according to above order.Under this state, the second substrate 50b by a maintaining part 30 below during, each hit location on the second substrate 50b by at least one ejiction opening 35 under.
Claims (11)
1. blowoff has:
Pedestal is static with respect to datum level;
Two guide rails dispose at described pedestal upper edge first direction;
Maintaining part is fixed in described pedestal, keeps being provided with respectively the head of a plurality of ejiction openings;
Substrate moving part, mounting are in described two guide rails, and the energy placement substrate; And
Travel mechanism on the guide rail can make described substrate moving part move at described first direction along described two guide rails, under described maintaining part,
To the substrate ejection ejection liquid that is disposed on the described substrate moving part, the drop of described ejection liquid is hit in described substrate from described ejiction opening,
It is characterized in that,
This blowoff has:
First, second main electro-optical device that send sends first, second main light of measuring to described first direction respectively;
First, second primary mirror device, vertical with described first direction and be arranged at the second direction branch that is parallel to described datum level, mainly measure light time when described first, second of irradiation, reflect and first, second principal reflection light is returned light;
The first main interference device is accepted described first main light and the described first principal reflection light measured, and the described first main first main interference result who measures light and the described first principal reflection light is detected;
The second main interference device is accepted described second main light and the described second principal reflection light measured, and the described second main second main interference result who measures light and the described second principal reflection light is detected;
Determinator according to described first, second main interference result, is obtained the second main distance between the main distance of first between described first main interference device and the described first primary mirror device and described second main interference device and the described second primary mirror device respectively; And
Control device sends the measurement result of described determinator to,
Any device is disposed at described substrate moving part in described first, second main interference device and described first, second primary mirror device, and other device is static with respect to described pedestal,
Described first, second main interference device is disposed at described first, second primary mirror device and described first, second main sending between the electro-optical device,
Travel mechanism has on the described guide rail: first travel mechanism applies first locomotivity to described first guide rail to described substrate moving part; And second travel mechanism applies second locomotivity to described second guide rail to described substrate moving part,
Described control device determines the size of described first, second locomotivity according to described first, second main distance.
2. blowoff according to claim 1 is characterized in that,
Described control device is controlled described first, second travel mechanism based on the value that is set of the difference of described first, second main distance, and described substrate moving part is moved along described two guide rails.
3. blowoff according to claim 1 and 2 is characterized in that,
Have:
Head moving mechanism can make described head move in described second direction;
First pair is sent electro-optical device, sends the first secondary light of measuring in described second direction;
The secondary mirror device is measured the light time when irradiation described first is secondary, reflects and the first secondary reverberation is returned light;
The first secondary interference device is accepted the described first secondary light and the described first secondary reverberation measured, and the described first secondary mensuration light and the described first secondary catoptrical result of interference are detected; And
Determinator according to the described first secondary result of interference, is obtained the distance between the described secondary mirror device and the described first secondary interference device,
The described first secondary interference device is disposed at the side parallel with the moving direction of described substrate moving part with any device in the described secondary mirror device, other device is static with respect to described pedestal, wherein, the moving direction of described substrate moving part is described first direction
Described control device is according to the distance between the described secondary mirror device and the described first secondary interference device, obtain the position of described substrate moving part in described second direction, poor in the position of described second direction of the position of described second direction and described head, determine described head moving mechanism to move the amount of movement of described head according to described substrate moving part.
4. blowoff according to claim 1 and 2 is characterized in that having:
Head moving mechanism can make described head move in described second direction;
First, second pair is sent electro-optical device, sends first, second secondary light of measuring;
The secondary mirror device secondary is measured light time when described first, second of irradiation, reflects and first, second secondary reverberation is returned light;
First, second secondary interference device is accepted described first, second secondary light and described first, second secondary reverberation measured, and described first, second secondary mensuration light and described first, second secondary catoptrical result of interference are detected; And
Determinator according to described first, second secondary result of interference, is obtained the distance between described secondary mirror device and described first, second secondary interference device,
Any device in described first, second secondary interference device and the described secondary mirror device is disposed at described substrate moving part, and other device is static with respect to described pedestal,
Described control device is according to any or two in the distance between the distance between the described secondary mirror device and the described first secondary interference device, described secondary mirror device and the described second secondary interference device, obtain the position of described substrate moving part in described second direction, poor in the position of described second direction of the position of described second direction and described head, determine described head moving mechanism to move the amount of movement of described head according to described substrate moving part.
5. blowoff according to claim 3 is characterized in that,
Described control device is controlled described head moving mechanism based on described substrate moving part position and described value that is set in the difference of the position of described second direction in described second direction, and described substrate moving part is moved along described two guide rails.
6. blowoff according to claim 4 is characterized in that,
Described control device is controlled described head moving mechanism based on described substrate moving part position and described value that is set in the difference of the position of described second direction in described second direction, and described substrate moving part is moved along described two guide rails.
7. jet method is being held in the head-clamp on the pedestal of level therebetween and each other between the starting point and terminal point at opposition side, along two guide rails from described starting point to described terminal point mounting substrate on the substrate moving part that first direction moves,
Described substrate moving part is moved towards described terminal point,
At described substrate by during below the described head, from ejiction opening to described substrate ejection ejection liquid,
After described substrate moving part arrives described terminal point, make described drying substrates, unload described substrate from described substrate moving part,
It is characterized in that,
Before described substrate moving part moves, measure the inclination on the face parallel of described substrate moving part with respect to described first direction or described second direction with datum level,
In the moving of described substrate moving part,
Measure the described inclination of described substrate moving part, change each amount of movement on described two guide rails respectively, so that the described error that moves middle generation that is tilted in of described substrate moving part is zero,
The limit makes the described inclination of described substrate moving part equate with mobile preceding described inclination,
The limit makes the below of described substrate by described head.
8. jet method according to claim 7 is characterized in that,
Before described substrate moving part moves, measure the position of the described second direction of described substrate moving part in advance,
In the moving of described substrate moving part,
The described inclination that makes described substrate moving part with move beginning before described inclination equate after, measure the position of described substrate moving part in described second direction, move described head, so that described substrate moving part the position of described second direction and described head the difference of the position of described second direction with move beginning before identical
The limit makes the relative position relation of the described second direction between described substrate moving part and the described head identical with mobile preceding relative position relation, and the limit makes the below of described substrate by described head.
9. jet method according to claim 7 is characterized in that,
Behind the described substrate of mounting on the described substrate moving part, described substrate moving part is moved, described substrate enter described head below before, make the position of an end in face of described head static, so that the mode under the ejiction opening of each hit location on the described substrate by being arranged at described head is carried out contraposition.
10. jet method according to claim 8 is characterized in that,
Behind the described substrate of mounting on the described substrate moving part, described substrate moving part is moved, described substrate enter described head below before, make the position of an end in face of described head static, so that the mode under the ejiction opening of each hit location on the described substrate by being arranged at described head is carried out contraposition.
11. according to each described jet method in the claim 7～10, it is characterized in that,
On in described substrate moving part and described pedestal any, configuration is when irradiation first, second main measures that the light time reflects and with first, the second principal reflection light returns first of light, the second primary mirror device, on another, configuration acceptance described first main mensuration light and the described first principal reflection light and the first main interference device that the described first main first main interference result who measures light and the described first principal reflection light is detected, and accept the described second main second main interference device of measuring light and the described second principal reflection light and the described second main second main interference result who measures light and the described second principal reflection light being detected
Obtain first, second main distance between described first, second main interference device and described first, second primary mirror device according to described first, second main interference result,
According to the described inclination of the described substrate moving part of described first, second main range determination,
On in described substrate moving part and described pedestal any, configuration is when irradiation first, second secondary measures that the light time reflects and with first, the second secondary reverberation returns the secondary mirror device of light, on another, configuration is accepted described first and is secondaryly measured light and the described first secondary reverberation and secondaryly measure the first secondary interference device that light and the described first pair catoptrical first secondary result of interference detect to described first, and accept described second and secondary measure light and the described second secondary reverberation and secondaryly measure the second secondary interference device that light and the described second pair catoptrical second secondary result of interference detect described second
Obtain first, second secondary distance between described first, second secondary interference device and the described secondary mirror device according to described first, second secondary result of interference,
Measure the positions of the described second direction of described substrate moving parts according to any or two of described first, second secondary distance.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009-147714 | 2009-06-22 | ||
| JP2009147714A JP5439049B2 (en) | 2009-06-22 | 2009-06-22 | Discharge device and discharge method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101927600A true CN101927600A (en) | 2010-12-29 |
| CN101927600B CN101927600B (en) | 2013-11-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010102125107A Expired - Fee Related CN101927600B (en) | 2009-06-22 | 2010-06-22 | Discharge apparatus and discharge method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5439049B2 (en) |
| KR (1) | KR101207245B1 (en) |
| CN (1) | CN101927600B (en) |
| TW (1) | TWI433729B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108162593A (en) * | 2013-02-15 | 2018-06-15 | 精工爱普生株式会社 | Recording device |
| CN108569042A (en) * | 2017-03-07 | 2018-09-25 | 东京毅力科创株式会社 | Work treatment installation, Work piece processing method and computer storage media |
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| JPH0949707A (en) * | 1995-08-04 | 1997-02-18 | Canon Inc | Moving stage apparatus, apparatus and method for manufacture of color filter using the apparatus and color filter |
| JPH11248925A (en) * | 1998-03-03 | 1999-09-17 | Seiko Epson Corp | Filter manufacturing device and filter manufacturing method |
| CN1839045A (en) * | 2004-03-17 | 2006-09-27 | 松下电器产业株式会社 | Droplet configuration device and droplet configuration method |
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|---|---|---|---|---|
| JP2004337729A (en) * | 2003-05-14 | 2004-12-02 | Seiko Epson Corp | Main scanning feed method and main scanning feed device, droplet discharge device, method of manufacturing electro-optical device, electro-optical device, electronic apparatus |
| JP4595298B2 (en) | 2003-08-20 | 2010-12-08 | セイコーエプソン株式会社 | Optical sensor for printing operation state determination, printing apparatus, and printing operation state determination method |
| JP2006245174A (en) * | 2005-03-02 | 2006-09-14 | Dainippon Printing Co Ltd | Positioning stage, pattern forming equipment, inspection device, position correction method, substrate supporting part |
| JP4598036B2 (en) * | 2007-08-20 | 2010-12-15 | シャープ株式会社 | Defect repair device, defect repair method, program, and computer-readable recording medium |
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2009
- 2009-06-22 JP JP2009147714A patent/JP5439049B2/en not_active Expired - Fee Related
-
2010
- 2010-06-03 TW TW099117941A patent/TWI433729B/en not_active IP Right Cessation
- 2010-06-21 KR KR1020100058499A patent/KR101207245B1/en not_active Expired - Fee Related
- 2010-06-22 CN CN2010102125107A patent/CN101927600B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0949707A (en) * | 1995-08-04 | 1997-02-18 | Canon Inc | Moving stage apparatus, apparatus and method for manufacture of color filter using the apparatus and color filter |
| JPH11248925A (en) * | 1998-03-03 | 1999-09-17 | Seiko Epson Corp | Filter manufacturing device and filter manufacturing method |
| CN1839045A (en) * | 2004-03-17 | 2006-09-27 | 松下电器产业株式会社 | Droplet configuration device and droplet configuration method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108162593A (en) * | 2013-02-15 | 2018-06-15 | 精工爱普生株式会社 | Recording device |
| CN108162593B (en) * | 2013-02-15 | 2020-06-09 | 精工爱普生株式会社 | Recording apparatus |
| CN108569042A (en) * | 2017-03-07 | 2018-09-25 | 东京毅力科创株式会社 | Work treatment installation, Work piece processing method and computer storage media |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011000570A (en) | 2011-01-06 |
| TWI433729B (en) | 2014-04-11 |
| TW201103632A (en) | 2011-02-01 |
| CN101927600B (en) | 2013-11-27 |
| KR20100137384A (en) | 2010-12-30 |
| JP5439049B2 (en) | 2014-03-12 |
| KR101207245B1 (en) | 2012-12-03 |
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