[go: up one dir, main page]

CN101859789A - AC light emitting device with increased light extraction efficiency and method of manufacturing the same - Google Patents

AC light emitting device with increased light extraction efficiency and method of manufacturing the same Download PDF

Info

Publication number
CN101859789A
CN101859789A CN200910131539A CN200910131539A CN101859789A CN 101859789 A CN101859789 A CN 101859789A CN 200910131539 A CN200910131539 A CN 200910131539A CN 200910131539 A CN200910131539 A CN 200910131539A CN 101859789 A CN101859789 A CN 101859789A
Authority
CN
China
Prior art keywords
light emitting
light
emitting diode
type semiconductor
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN200910131539A
Other languages
Chinese (zh)
Other versions
CN101859789B (en
Inventor
潘锡明
黄国钦
冯辉庆
朱胤丞
丁逸圣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JIANGSU CANYANG OPTOELECTRONICS Co Ltd
Original Assignee
Canyang Investment Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canyang Investment Co ltd filed Critical Canyang Investment Co ltd
Priority to CN200910131539.XA priority Critical patent/CN101859789B/en
Publication of CN101859789A publication Critical patent/CN101859789A/en
Application granted granted Critical
Publication of CN101859789B publication Critical patent/CN101859789B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/82Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L2224/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
    • H01L2224/241Disposition
    • H01L2224/24135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/24137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12041LED

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)

Abstract

The invention discloses an alternating current light-emitting device with the function of increasing light extraction efficiency.A first light-emitting diode and a second light-emitting diode are arranged on a substrate, the substrate is provided with a plurality of grooves, a separation space is arranged between the first light-emitting diode and the second light-emitting diode to insulate the light-emitting diodes, and the first light-emitting diode and the second light-emitting diode are connected through a conductor so that the alternating current light-emitting device can completely use alternating current to emit light. The invention also discloses a manufacturing method of the alternating current light-emitting device. The invention can reflect the light to the side surface by the plurality of grooves of the substrate, so as to solve the problem that the light irradiated to the substrate by the luminous layer can not be completely transmitted to the side surface of the light-emitting diode, thereby reducing the luminous efficiency of the light-emitting diode, improving the light extraction efficiency of the first light-emitting diode and the second light-emitting diode and improving the luminous efficiency of the alternating current light-emitting device.

Description

具有增加光取出效率的交流发光装置及其制造方法 AC light-emitting device with increased light extraction efficiency and manufacturing method thereof

技术领域technical field

本发明涉及一种发光装置,特别是涉及一种具有增加光取出效率的交流发光装置;本发明还涉及所述交流发光装置的制造方法。The invention relates to a light emitting device, in particular to an AC light emitting device with increased light extraction efficiency; the invention also relates to a manufacturing method of the AC light emitting device.

背景技术Background technique

随着光电产业的快速发展,作为光源的一的发光二极管(LED Light Emitting Diode)由于具有省电的特点,已大量广泛地应用于各种照明或需光源的领域,且发光二极管于光电领域中占有举足轻重的地位。正因如此,世界各国厂商莫不投入大量资源于相关技术的开发,而于2005的韩国汉城半导体与美国III-N Technology的产品发表会更说明了交流式发光二极管(AC LED)产品的发展趋势,成为全球性发光二极管厂商的开发趋势。With the rapid development of the optoelectronic industry, LED Light Emitting Diode (LED Light Emitting Diode), which is one of the light sources, has been widely used in various lighting or light source fields due to its power-saving characteristics, and the LED Light Emitting Diode is used in the optoelectronic field. occupies an important position. Because of this, manufacturers from all over the world have invested a lot of resources in the development of related technologies, and the 2005 Seoul Semiconductor and American III-N Technology's product launch conference further explained the development trend of AC LED products. Become the development trend of global light-emitting diode manufacturers.

从交流式发光二极管的技术发展至今,主要的技术发展在于改善交流式发光二极管的电性问题。例如:交流式发光二极管无法于交流电正负半周讯号输入时皆可发光(全时发光)的问题,因而发展出一种桥式交流式发光二极管结构,其主要利用惠斯登电桥(Wheatstone Bridge)的整流设计概念,以使发光二极管于交流电正负半周讯号输入时的每一瞬间仅有总数1/2的交流式电发光二极管发光的现象得以改善,而能全时发光。From the technical development of AC LEDs to the present, the main technical development is to improve the electrical problems of AC LEDs. For example: AC light-emitting diodes cannot emit light (full-time light) when the AC positive and negative half-cycle signals are input, so a bridge-type AC light-emitting diode structure has been developed, which mainly uses Wheatstone Bridge (Wheatstone Bridge) ) rectification design concept to improve the phenomenon that only 1/2 of the total number of AC light-emitting diodes emit light at each moment when the AC positive and negative half-cycle signals are input, and can emit light all the time.

然而,现今交流式发光二极管结构中针对光学特性仍有其发展性,例如:全反射问题的改善。由于交流式发光二极管的发光层产生光线后,大部分光线是在交流式发光二极管结构中传递,而交流式发光二极管结构中的光线需经折射的方式才能传递至交流式发光二极管结构外;但光线折射的角度有限,当光线的入射角度超过能折射的角度范围时,光线会发生全反射,因而造成部分光线仍然在交流式发光二极管结构中,却无法传递出交流式发光二极管结构外;如此交流式发光二极管无法发挥原有的发光效能。However, there is still room for development in terms of optical characteristics in the current AC LED structure, such as the improvement of the total reflection problem. After the light-emitting layer of the AC LED generates light, most of the light is transmitted in the AC LED structure, and the light in the AC LED structure needs to be refracted to be transmitted outside the AC LED structure; but The angle of light refraction is limited. When the incident angle of light exceeds the refraction angle range, the light will be totally reflected, so that part of the light is still in the AC LED structure, but cannot be transmitted out of the AC LED structure; so AC light emitting diodes cannot exert their original luminous efficacy.

此外,交流式发光二极管的发光层照射至基板的光线中,部分光线为直线前进,因而导致部分光线仅能被基板吸收或基板与发光层之间来回反射,光线却无法往交流式发光二极管的侧面传播。如此基板所吸收的光能将转为热能发散,所以造成交流式发光二极管的发光效能降低并造成过热。In addition, when the light-emitting layer of the AC LED irradiates the substrate, part of the light travels in a straight line. As a result, part of the light can only be absorbed by the substrate or reflected back and forth between the substrate and the light-emitting layer, but the light cannot reach the back and forth of the AC LED. Side spread. In this way, the light energy absorbed by the substrate will be transformed into heat energy and dissipated, so that the luminous efficiency of the AC LED is reduced and overheating is caused.

综合上述,交流式发光二极管的主要设计为光源的使用,如何提高其发光效率为一主要课题,而交流式发光二极管使用于人类的家庭较为广泛,故解决上述的问题实为一最大的课题。To sum up the above, the main design of AC LEDs is the use of light sources, how to improve the luminous efficiency is a major issue, and AC LEDs are widely used in human families, so solving the above problems is actually the biggest issue.

发明内容Contents of the invention

本发明要解决的技术问题是提供一种具有增加光取出效率的交流发光装置,能够有效增加光取出效率;为此,本发明还要提供一种所述交流发光装置的制造方法。The technical problem to be solved by the present invention is to provide an AC light-emitting device with increased light extraction efficiency, which can effectively increase the light extraction efficiency; therefore, the present invention also provides a manufacturing method of the AC light-emitting device.

为解决上述技术问题,本发明的具有增加光取出效率的交流发光装置所采用的技术方案之一是,包括:In order to solve the above technical problems, one of the technical solutions adopted by the AC light-emitting device with increased light extraction efficiency of the present invention includes:

一基板,其具有复数凹槽;A substrate having a plurality of grooves;

一第一发光二极管,设置于所述复数凹槽上;a first light emitting diode, arranged on the plurality of grooves;

一第二发光二极管,设置于所述复数凹槽上;以及a second light emitting diode disposed on the plurality of grooves; and

一导体,其耦接所述第一发光二极管与所述第二发光二极管,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间,所述第一发光二极管与所述第二发光二极管可依一交流电发光。A conductor, which is coupled to the first light emitting diode and the second light emitting diode, there is a separation space between the first light emitting diode and the second light emitting diode, the first light emitting diode and the second light emitting diode The two light emitting diodes can emit light according to an alternating current.

上述交流发光装置的制造方法是:The manufacture method of above-mentioned AC light emitting device is:

提供一基板并蚀刻复数凹槽于所述基板上;providing a substrate and etching a plurality of grooves on the substrate;

分别形成一第一发光二极管与一第二发光二极管于所述复数凹槽上,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间;以及forming a first light emitting diode and a second light emitting diode on the plurality of grooves respectively, with a separation space between the first light emitting diode and the second light emitting diode; and

设置一导体于所述分隔空间上并连接所述第一发光二极管与所述第二发光二极管。A conductor is arranged on the separation space and connected to the first light-emitting diode and the second light-emitting diode.

本发明的具有增加光取出效率的交流发光装置所采用的技术方案之二是,包括:The second technical solution adopted by the AC light-emitting device with increased light extraction efficiency of the present invention is to include:

一承接基板,具有复数凹槽、一第一导电层、一第二导电层与一第三导电层;A receiving substrate having a plurality of grooves, a first conductive layer, a second conductive layer and a third conductive layer;

一第一发光二极管,设置于所述复数凹槽上,所述第一发光二极管包含一第一电极与一第二电极,所述第二电极通过一第一凸块连接所述第一导电层,所述第一电极通过一第二凸块连接所述第二导电层;以及A first light-emitting diode, disposed on the plurality of grooves, the first light-emitting diode includes a first electrode and a second electrode, and the second electrode is connected to the first conductive layer through a first bump , the first electrode is connected to the second conductive layer through a second bump; and

一第二发光二极管,设置于所述复数凹槽上,所述第二发光二极管包含一第三电极与一第四电极,所述第三电极通过一第三凸块连接所述第三导电层,所述第四电极通过一第二凸块连接所述第二导电层,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间,所述第一发光二极管与所述第二发光二极管通过所述第一导电层、所述第二导电层与所述第三导电层依一交流电发光。A second light emitting diode is arranged on the plurality of grooves, the second light emitting diode includes a third electrode and a fourth electrode, and the third electrode is connected to the third conductive layer through a third bump , the fourth electrode is connected to the second conductive layer through a second bump, there is a separation space between the first light emitting diode and the second light emitting diode, and the first light emitting diode and the first light emitting diode The two light emitting diodes emit light according to an alternating current through the first conductive layer, the second conductive layer and the third conductive layer.

上述交流发光装置的制造方法是:The manufacture method of above-mentioned AC light emitting device is:

提供一承接基板并蚀刻复数凹槽于所述承接基板上,且所述承接基板上具有一第一导电层、一第二导电层与一第三导电层;providing a receiving substrate and etching a plurality of grooves on the receiving substrate, and the receiving substrate has a first conductive layer, a second conductive layer and a third conductive layer;

提供一共享基板,对应所述复数凹槽分别形成一第一发光二极管与一第二发光二极管于所述共享基板上,所述第一发光二极管与所述第二发光二极管之间具一分隔空间;以及A shared substrate is provided, a first light emitting diode and a second light emitting diode are respectively formed on the shared substrate corresponding to the plurality of grooves, and there is a separation space between the first light emitting diode and the second light emitting diode ;as well as

翻转所述共享基板,以一第一凸块使所述第一发光二极管连接所述第一导电层,以一第二凸块使所述第一发光二极管与所述第二发光二极管连接所述第二导电层,以一第三凸块使所述第二发光二极管连接所述第三导电层;以及Flipping the shared substrate, using a first bump to connect the first light emitting diode to the first conductive layer, using a second bump to connect the first light emitting diode and the second light emitting diode to the a second conductive layer, using a third bump to connect the second light emitting diode to the third conductive layer; and

自所述第一发光二极管与所述第二发光二极管分离所述共享基板。The shared substrate is separated from the first LED and the second LED.

由于采用本发明的交流发光装置及其制造方法,可以籍由基板所具有的复数凹槽将光线反射至侧面,以解决发光层照射至基板的光线无法完全往发光二极管的侧面传播,降低其发光效率的问题,提高第一发光二极管与第二发光二极管的光取出效率,因而提高交流发光装置的发光效能。Due to the adoption of the AC light-emitting device and its manufacturing method of the present invention, light can be reflected to the side by virtue of the plurality of grooves in the substrate, so as to solve the problem that the light emitted by the light-emitting layer to the substrate cannot completely propagate to the side of the light-emitting diode, reducing its luminescence. To solve the problem of efficiency, the light extraction efficiency of the first light-emitting diode and the second light-emitting diode is improved, thereby improving the luminous efficiency of the AC light-emitting device.

另外,采用本发明的交流发光装置及其制造方法,还可以籍由散射结构,使交流发光装置增加光取出效率的基础上增加电极的接触面积。In addition, by using the AC light emitting device and its manufacturing method of the present invention, the scattering structure can also be used to increase the contact area of the electrodes on the basis of increasing the light extraction efficiency of the AC light emitting device.

附图说明Description of drawings

下面结合附图与具体实施方式对本发明作进一步详细的说明Below in conjunction with accompanying drawing and specific embodiment, the present invention will be described in further detail

图1是本发明的实施例一结构示意图;Fig. 1 is a schematic structural view of Embodiment 1 of the present invention;

图2是本发明的实施例二结构示意图;Fig. 2 is a schematic structural diagram of Embodiment 2 of the present invention;

图3是本发明的实施例三结构示意图;Fig. 3 is a schematic structural view of Embodiment 3 of the present invention;

图4A是本发明的实施例四结构示意图;Fig. 4A is a schematic structural diagram of Embodiment 4 of the present invention;

图4B是本发明的实施例五结构示意图;Fig. 4B is a schematic structural diagram of Embodiment 5 of the present invention;

图5A至5D是本发明的交流发光装置的实施例电路图。5A to 5D are circuit diagrams of embodiments of the AC light emitting device of the present invention.

图6A至6D是本发明中半导体磊晶层一实施例的结构示意图;6A to 6D are schematic structural views of an embodiment of a semiconductor epitaxial layer in the present invention;

图7A至7D是本发明中半导体磊晶层另一实施例的结构示意图;7A to 7D are schematic structural views of another embodiment of the semiconductor epitaxial layer in the present invention;

图8A至8C是图1所示实施例的制造流程示意图;8A to 8C are schematic diagrams of the manufacturing process of the embodiment shown in FIG. 1;

图9A至9D是图2所示实施例的制造流程示意图;9A to 9D are schematic diagrams of the manufacturing process of the embodiment shown in FIG. 2;

图10是本发明的实施例五结构示意图;Fig. 10 is a schematic structural diagram of Embodiment 5 of the present invention;

图11是本发明的实施例六结构示意图;Fig. 11 is a schematic structural diagram of Embodiment 6 of the present invention;

图12是本发明的实施例七结构示意图;Fig. 12 is a schematic structural diagram of Embodiment 7 of the present invention;

图13是本发明的实施例八结构示意图;Fig. 13 is a schematic structural diagram of Embodiment 8 of the present invention;

图14是本发明的实施例九结构示意图;Fig. 14 is a schematic structural diagram of Embodiment 9 of the present invention;

图15是本发明的实施例十结构示意图;Fig. 15 is a schematic structural diagram of Embodiment 10 of the present invention;

图16A、16B是本发明的实施例十一结构示意图;16A and 16B are structural schematic diagrams of Embodiment 11 of the present invention;

图17A至17D是本发明的交流发光装置的另一实施例电路图;17A to 17D are circuit diagrams of another embodiment of the AC light emitting device of the present invention;

图18A至18D是本发明中半导体磊晶层的再一实施例结构示意图;18A to 18D are structural schematic diagrams of yet another embodiment of the semiconductor epitaxial layer in the present invention;

图19A至19D是本发明中半导体磊晶层另一较佳实施例结构示意图;19A to 19D are structural schematic diagrams of another preferred embodiment of the semiconductor epitaxial layer in the present invention;

图20A至20E是图10所示实施例的制造流程示意图;20A to 20E are schematic diagrams of the manufacturing process of the embodiment shown in FIG. 10;

图21A至21E是图11所示实施例的制造流程示意图。21A to 21E are schematic diagrams of the manufacturing process of the embodiment shown in FIG. 11 .

图中符号说明:Explanation of symbols in the figure:

10为交流发光装置;      12为基板;              122为凹槽;10 is an AC light emitting device; 12 is a substrate; 122 is a groove;

124为分隔空间;         130为第一导电层;       132为第二导电层;124 is the separation space; 130 is the first conductive layer; 132 is the second conductive layer;

134为第三导电层;       14为第一发光二极管;    142为外延堆栈层;134 is the third conductive layer; 14 is the first light-emitting diode; 142 is the epitaxial stack layer;

144为N型半导体层;      146为发光层;           148为P型半导体层;144 is an N-type semiconductor layer; 146 is a light-emitting layer; 148 is a P-type semiconductor layer;

150为第一电极;         152为第二电极;         154为散射结构;150 is the first electrode; 152 is the second electrode; 154 is the scattering structure;

16为第二发光二极管;    162为外延堆栈层;       164为N型半导体层;16 is the second light emitting diode; 162 is the epitaxial stack layer; 164 is the N-type semiconductor layer;

166为发光层;           168为P型半导体层;      170为第一电极;166 is the light emitting layer; 168 is the P-type semiconductor layer; 170 is the first electrode;

172为第二电极;         174为散射结构;         18为导体;172 is a second electrode; 174 is a scattering structure; 18 is a conductor;

20为绝缘层;            22为能量转换层;        222为散射结构;20 is an insulating layer; 22 is an energy conversion layer; 222 is a scattering structure;

30为桥式整流电路;      40为半导体磊晶层;      42为外延堆栈层;30 is a bridge rectifier circuit; 40 is a semiconductor epitaxy layer; 42 is an epitaxial stack layer;

422为第二电极;         44为N型半导体层;       442为第一电极;422 is the second electrode; 44 is the N-type semiconductor layer; 442 is the first electrode;

46为发光层;            48为P型半导体层;       482为第二电极;46 is a light-emitting layer; 48 is a P-type semiconductor layer; 482 is a second electrode;

50为覆晶式交流发光装置;                        510为第一凸块;50 is a flip-chip AC light emitting device; 510 is the first bump;

512为第二凸块;         514为第三凸块;         52为承接基板;512 is the second bump; 514 is the third bump; 52 is the receiving substrate;

522为凹槽;             54为第一发光二极管;    524为介电层;522 is a groove; 54 is a first light emitting diode; 524 is a dielectric layer;

540为散射结构;         542为外延堆栈层;       544为N型半导体层;540 is a scattering structure; 542 is an epitaxial stack layer; 544 is an N-type semiconductor layer;

546为发光层;           548为P型半导体层;      550为第一电极;546 is a light-emitting layer; 548 is a P-type semiconductor layer; 550 is a first electrode;

552为第二电极;         554为透明基板;         556为散射结构;552 is the second electrode; 554 is the transparent substrate; 556 is the scattering structure;

56为第二发光二极管;                            560为散射结构;56 is the second light emitting diode; 560 is the scattering structure;

562为外延堆栈层;       564为N型半导体层;      566为发光层;562 is an epitaxial stack layer; 564 is an N-type semiconductor layer; 566 is a light emitting layer;

568为P型半导体层;      570为第一电极;         572为第二电极;568 is a P-type semiconductor layer; 570 is a first electrode; 572 is a second electrode;

574为透明基板;         576为散射结构;         58为分隔空间;574 is a transparent substrate; 576 is a scattering structure; 58 is a separation space;

60为散射结构;          62为能量转换层;        64为能量转换层;60 is a scattering structure; 62 is an energy conversion layer; 64 is an energy conversion layer;

642为散射结构;         96为共享基板。642 is a scattering structure; 96 is a shared substrate.

具体实施方式Detailed ways

实施例一。如图1所示,本发明的交流发光装置10,包含有一基板12、一第一发光二极管14与一第二发光二极管16。所述基板12具有复数凹槽122,所述复数凹槽122可包含复数光子晶体结构,所述复数凹槽122具有相同间隔距离或不同间隔距离,使发光二极管内的光传播路径产生变化,以提高发光效率。所述第一发光二极管14与所述第二发光二极管16设置于复数凹槽122上,且所述第一发光二极管14与所述第二发光二极管16之间通过一导体18电性相接。所述第一发光二极管14与所述第二发光二极管16为相隔设,所以第一发光二极管14与第二发光二极管16之间具有一分隔空间124,因此导体18为一导线。其中,所述第一发光二极管14的第一电极150经导体18连接所述第二发光二极管16的第二电极172,使所述第一发光二极管14与所述第二发光二极管16可依所述交流电发光。Embodiment one. As shown in FIG. 1 , the AC light emitting device 10 of the present invention includes a substrate 12 , a first LED 14 and a second LED 16 . The substrate 12 has a plurality of grooves 122, and the plurality of grooves 122 may contain a plurality of photonic crystal structures, and the plurality of grooves 122 have the same spacing distance or different spacing distances, so that the light propagation path in the light emitting diode is changed, so that Improve luminous efficiency. The first LED 14 and the second LED 16 are disposed on the plurality of grooves 122 , and the first LED 14 and the second LED 16 are electrically connected through a conductor 18 . The first LED 14 and the second LED 16 are spaced apart, so there is a separation space 124 between the first LED 14 and the second LED 16 , so the conductor 18 is a wire. Wherein, the first electrode 150 of the first light emitting diode 14 is connected to the second electrode 172 of the second light emitting diode 16 through the conductor 18, so that the first light emitting diode 14 and the second light emitting diode 16 can The alternating current luminescence.

再者,所述第一发光二极管14与所述第二发光二极管16包含一磊晶堆积层142、162、一N型半导体层144、164与一发光层146、166以及一P型半导体148、168。磊晶堆积层142、162设置于所述复数凹槽122上,所述第一发光二极管14与所述第二发光二极管16从下而上依序为磊晶堆积层142、162、N型半导体层144、164、发光层146、166与P型半导体148、168,且N型半导体层144、164之上设置一第一电极150、170,P型半导体层148、168之上设置一第二电极152、172。其中,部分磊晶堆积层142、162会位于所述复数凹槽122内,且所述磊晶堆积层142、162的掺杂浓度比所述N型半导体层144、164的掺杂浓度低。Furthermore, the first LED 14 and the second LED 16 include an epitaxial stacked layer 142, 162, an N-type semiconductor layer 144, 164, a light-emitting layer 146, 166, and a P-type semiconductor 148, 168. Epitaxial accumulation layers 142, 162 are disposed on the plurality of grooves 122, and the first light emitting diode 14 and the second light emitting diode 16 are epitaxial accumulation layers 142, 162, N-type semiconductor layer 144,164, light-emitting layer 146,166 and P-type semiconductor 148,168, and a first electrode 150,170 is set on the N-type semiconductor layer 144,164, and a second electrode 150,170 is set on the P-type semiconductor layer 148,168. Electrodes 152,172. Wherein, part of the epitaxial accumulation layers 142 , 162 are located in the plurality of grooves 122 , and the doping concentration of the epitaxial accumulation layers 142 , 162 is lower than that of the N-type semiconductor layers 144 , 164 .

本发明藉由基板12的复数凹槽122避免发光层146、166照射至基板12的光线直接被基板12所吸收,并可让光线经基板12反射后往所述第一发光二极管14与所述第二发光二极管16的侧面传播,以提高所述第一发光二极管14与所述第二发光二极管16的光取出效率。In the present invention, the plurality of grooves 122 of the substrate 12 prevents the light irradiated by the light-emitting layers 146 and 166 on the substrate 12 from being directly absorbed by the substrate 12, and allows the light to be reflected by the substrate 12 and then go to the first light-emitting diode 14 and the first light-emitting diode 14. The side surface of the second light emitting diode 16 spreads to improve the light extraction efficiency of the first light emitting diode 14 and the second light emitting diode 16 .

实施例二。如图2所示,该实施例与图1所示的实施例不同之处在于,本实施例进一步包含一绝缘层20,设于所述基板12之上,且设置于所述第一发光二极管14与所述第二发光二极管16之间的分隔空间124内,以进一步绝缘所述第一发光二极管14与所述第二发光二极管16之间的电性,而避免所述第一发光二极管14与所述第二发光二极管16之间发生短路或漏电情况。因此导体18设置于绝缘层20上,此时导体18为一导电层。Embodiment two. As shown in FIG. 2 , the difference between this embodiment and the embodiment shown in FIG. 1 is that this embodiment further includes an insulating layer 20 disposed on the substrate 12 and disposed on the first light emitting diode. 14 and the second light-emitting diode 16 in the separation space 124 to further insulate the electrical properties between the first light-emitting diode 14 and the second light-emitting diode 16 and avoid the first light-emitting diode 14 A short circuit or leakage occurs between the second light emitting diode 16 and the second light emitting diode 16 . Therefore, the conductor 18 is disposed on the insulating layer 20, and the conductor 18 is a conductive layer at this time.

实施例三。如图3所示,该实施例与图2所示的实施例不同之处在于,本实施例于所述第一发光二极管14与所述第二发光二极管16之上设置一散射结构154、174,且散射结构154、174位于P型半导体层148、168之上,以提高光散射效果及电极的接触面积,进而提高发光效能。实施例四。如图4A所示,本发明的此一实施例与图2的实施例不同之处在于第一发光二极管14与第二发光二极管16的P型半导体层148、168上设置一能量转换层22,且能量转换层22覆盖第一发光二极管14与第二发光二极管16。藉由能量转换层22提高交流发光装置10的照度。此外,如图4B所示,能量转换层22上更可设置散射结构222,以提高覆晶式交流发光装置10的光散射效果,进而提高发光效能。Embodiment three. As shown in FIG. 3 , the difference between this embodiment and the embodiment shown in FIG. 2 is that a scattering structure 154 , 174 is arranged on the first LED 14 and the second LED 16 in this embodiment. , and the scattering structures 154, 174 are located on the P-type semiconductor layers 148, 168, so as to improve the light scattering effect and the contact area of the electrodes, thereby improving the luminous efficiency. Embodiment four. As shown in FIG. 4A, the difference between this embodiment of the present invention and the embodiment of FIG. 2 is that an energy conversion layer 22 is disposed on the P-type semiconductor layers 148 and 168 of the first light emitting diode 14 and the second light emitting diode 16, And the energy conversion layer 22 covers the first LED 14 and the second LED 16 . The illuminance of the AC light emitting device 10 is improved by the energy conversion layer 22 . In addition, as shown in FIG. 4B , a scattering structure 222 can be provided on the energy conversion layer 22 to improve the light scattering effect of the flip-chip AC light emitting device 10 , thereby improving the luminous efficiency.

参见图5A至图5D,其为本发明的交流发光装置10的实施例的电路图。如图5A所示,本发明的此一实施例是交流发光装置10包含一桥式整流电路30,其耦接所述第一发光二极管14与所述第二发光二极管16。所述桥式整流电路30包含复数半导体磊晶层40(如图6A至图6C所示或如图7A至图7C所示)。如图5B所示,所述交流发光装置10至少包含一个以上的并联电路,所述并联电路亦即并联图5A所示的桥式整流电路30以及其所耦接的所述第一发光二极管14与所述第二发光二极管16。如图5C所示,所述交流发光装置10至少包含一个以上的串联电路,所述串联电路亦即串联图5A所示的桥式整流电路30以及其所耦接的所述第一发光二极管14与所述第二发光二极管16。如图5D所示,所述交流发光装置10至少包含一个以上的串并联电路,所述串并联电路亦即串并联图5A所示的桥式整流电路30以及其所耦接的所述第一发光二极管14与所述第二发光二极管16。Referring to FIG. 5A to FIG. 5D , they are circuit diagrams of an embodiment of the AC light emitting device 10 of the present invention. As shown in FIG. 5A , in this embodiment of the present invention, the AC light emitting device 10 includes a bridge rectifier circuit 30 coupled to the first LED 14 and the second LED 16 . The bridge rectifier circuit 30 includes a plurality of semiconductor epitaxial layers 40 (as shown in FIGS. 6A to 6C or as shown in FIGS. 7A to 7C ). As shown in FIG. 5B , the AC light emitting device 10 includes at least one parallel circuit, that is, the bridge rectifier circuit 30 shown in FIG. 5A and the first light emitting diode 14 coupled thereto are connected in parallel. with the second LED 16 . As shown in FIG. 5C, the AC light emitting device 10 includes at least one series circuit, and the series circuit is the bridge rectifier circuit 30 shown in FIG. 5A and the first light emitting diode 14 coupled thereto. with the second LED 16 . As shown in FIG. 5D , the AC light emitting device 10 includes at least one series-parallel circuit, and the series-parallel circuit is the series-parallel connection of the bridge rectifier circuit 30 shown in FIG. 5A and the first connected to it. The light emitting diode 14 and the second light emitting diode 16 .

图6A至图6C,为本发明的半导体磊晶层的一实施例的结构示意图。如图6A所示,若所述复数半导体磊晶层40为复数第三发光二极管,则分别由下而上包含一磊晶堆积层42、一N型半导体层44与一发光层46以及一P型半导体48;其中N型半导体层44上设置一第一电极442,P型半导体层48上设置一第二电极482。如图6B所示,若所述复数半导体磊晶层40为复数二极管,则分别由下而上包含一磊晶堆积层42、一N型半导体层44与一P型半导体48;其中N型半导体层44上设置一第一电极442,P型半导体层48上设置一第二电极482。如图6C所示,若所述复数半导体磊晶层40为复数二极管,则分别由下而上包含一磊晶堆积层42以及一N型半导体层44;其中磊晶堆积层42上设置一第二电极422,N型半导体层44上设置一第一电极442。此外,本发明更可设置一能量转换层62于P型半导体层48上,如图6D所示。6A to 6C are schematic structural views of an embodiment of the semiconductor epitaxial layer of the present invention. As shown in FIG. 6A, if the plurality of semiconductor epitaxial layers 40 are a plurality of third light-emitting diodes, they respectively include an epitaxial stacked layer 42, an N-type semiconductor layer 44, a light-emitting layer 46, and a P type semiconductor 48; wherein a first electrode 442 is disposed on the N-type semiconductor layer 44, and a second electrode 482 is disposed on the P-type semiconductor layer 48. As shown in FIG. 6B, if the plurality of semiconductor epitaxial layers 40 are a plurality of diodes, they respectively include an epitaxial stacked layer 42, an N-type semiconductor layer 44, and a P-type semiconductor 48 from bottom to top; wherein the N-type semiconductor A first electrode 442 is disposed on the layer 44 , and a second electrode 482 is disposed on the P-type semiconductor layer 48 . As shown in FIG. 6C, if the plurality of semiconductor epitaxial layers 40 is a plurality of diodes, they respectively include an epitaxial accumulation layer 42 and an N-type semiconductor layer 44 from bottom to top; wherein a first epitaxial accumulation layer 42 is provided. In the second electrode 422 , a first electrode 442 is disposed on the N-type semiconductor layer 44 . In addition, the present invention can further arrange an energy conversion layer 62 on the P-type semiconductor layer 48, as shown in FIG. 6D.

图7A至图7C,为本发明的半导体磊晶层的另一实施例的结构示意图。如图7A所示,本发明的此一实施例与图6A的实施例不同之处在于,所述复数第三发光二极管之上设置一散射结构60,且散射结构60位于P型半导体层48或N型半导体层44之上,以提高光散射效果及电极的接触面积,进而提高发光效能。如图7B所示,本发明的此一实施例与图6B的实施例不同之处在于,所述复数二极管之上设置一散射结构60,且散射结构60位于P型半导体层48或N型半导体层44之上。如图7C所示,本发明的此一实施例与图6C的实施例不同之处在于,所述复数二极管之上设置一散射结构60,且散射结构60位于N型半导体层44或磊晶堆积层42之上。此外,本发明更可设置一能量转换层62于P型半导体层48上,如图7D所示。7A to 7C are schematic structural views of another embodiment of the semiconductor epitaxial layer of the present invention. As shown in FIG. 7A, the difference between this embodiment of the present invention and the embodiment of FIG. 6A is that a scattering structure 60 is arranged on the plurality of third light emitting diodes, and the scattering structure 60 is located on the P-type semiconductor layer 48 or on the N-type semiconductor layer 44 to improve the light scattering effect and the contact area of the electrodes, thereby improving the luminous efficiency. As shown in FIG. 7B, the difference between this embodiment of the present invention and the embodiment of FIG. 6B is that a scattering structure 60 is arranged on the plurality of diodes, and the scattering structure 60 is located in the P-type semiconductor layer 48 or the N-type semiconductor layer. layer 44 above. As shown in FIG. 7C, the difference between this embodiment of the present invention and the embodiment of FIG. 6C is that a scattering structure 60 is arranged on the plurality of diodes, and the scattering structure 60 is located on the N-type semiconductor layer 44 or the epitaxial stack layer 42 above. In addition, the present invention can further arrange an energy conversion layer 62 on the P-type semiconductor layer 48, as shown in FIG. 7D.

参见图8A至图8C,其为本发明的一较佳实施例的制造流程图;如图所示,并同时参见图1。本发明的交流发光装置的制造方法步骤包含提供一基板12,并蚀刻复数凹槽122;分别形成一第一发光二极管14与一第二发光二极管16于所述复数凹槽122上;设置一导体18于第一发光二极管14与第二发光二极管16之间,并让导体18耦接第一发光二极管14与第二发光二极管16。Referring to FIG. 8A to FIG. 8C , it is a manufacturing flowchart of a preferred embodiment of the present invention; as shown in the figures, and also refer to FIG. 1 . The steps of the manufacturing method of the AC light emitting device of the present invention include providing a substrate 12, and etching a plurality of grooves 122; respectively forming a first light emitting diode 14 and a second light emitting diode 16 on the plurality of grooves 122; setting a conductor 18 is between the first LED 14 and the second LED 16 , and the conductor 18 is coupled to the first LED 14 and the second LED 16 .

参见图9A至图9D,其为本发明的另一较佳实施例的制造流程图;如图所示,并同时参见图2。本发明的此一实施例与图7A至图7C的实施例不同之处在于,设置一导体18于第一发光二极管14与第二发光二极管16之间,并让所述导体18耦接第一发光二极管14与第二发光二极管16的步骤前,进一步包含一步骤,其为形成一绝缘层20于第一发光二极管14与第二发光二极管16之间,且绝缘层20位于第一发光二极管14与第二发光二极管16之间的分隔空间124内。Refer to FIG. 9A to FIG. 9D , which are the manufacturing flow diagrams of another preferred embodiment of the present invention; as shown in the figures, and refer to FIG. 2 at the same time. This embodiment of the present invention differs from the embodiment shown in FIGS. 7A to 7C in that a conductor 18 is arranged between the first light emitting diode 14 and the second light emitting diode 16, and the conductor 18 is coupled to the first light emitting diode 16. Before the steps of the light emitting diode 14 and the second light emitting diode 16, a step is further included, which is to form an insulating layer 20 between the first light emitting diode 14 and the second light emitting diode 16, and the insulating layer 20 is located on the first light emitting diode 14 In the separation space 124 between the second LED 16 and the second LED 16 .

实施例五。如图10所示,具有增加光取出效率的覆晶式交流发光装置50,包含有一承接基板52、一第一发光二极管54与一第二发光二极管56。所述承接基板52具有复数凹槽522以及一第一导电层130、一第二导电层132与一第三导电层134。所述复数凹槽522更可包含复数光子晶体结构,所述复数凹槽522并进一步具有相同间隔距离或不同间隔距离,使发光二极管内的光传播路径产生变化,以提高发光效率;且第一导电层130、第二导电层132与第三导电层134为分隔设置。所述第一发光二极管54与所述第二发光二极管56设置于复数凹槽522上;所述第一发光二极管54与所述第二发光二极管56包含一第一电极550、第三电极570与一第二电极552、第四电极572。所述第一发光二极管54的第二电极552通过一第一凸块510连接所述第一导电层130。所述第一发光二极管54的第一电极550与所述第二发光二极管56的第四电极572,通过一第二凸块512连接所述第二导电层132,并通过所述第二凸块512电性连接所述第一发光二极管54与所述第二发光二极管56。所述第三电极570通过一第三凸块514连接所述第三导电层134。由于所述第一发光二极管54与所述第二发光二极管56为相隔设置,所以第一发光二极管54与所述第二发光二极管56之间具有一分隔空间58,以分隔所述第一发光二极管54与所述第二发光二极管56之间的电性,避免所述第一发光二极管54与所述第二发光二极管56之间发生短路或漏电情况。其中,所述第一发光二极管54与所述第二发光二极管56经第一导电层130、一第二导电层132与一第三导电层134电性相接并耦接一交流电源(图中未示),使所述第一发光二极管54与所述第二发光二极管56可依所述交流电发光。Embodiment five. As shown in FIG. 10 , the flip-chip AC light emitting device 50 with increased light extraction efficiency includes a receiving substrate 52 , a first LED 54 and a second LED 56 . The receiving substrate 52 has a plurality of grooves 522 and a first conductive layer 130 , a second conductive layer 132 and a third conductive layer 134 . The plurality of grooves 522 may further include a plurality of photonic crystal structures, and the plurality of grooves 522 further have the same spacing distance or different spacing distances, so that the light propagation path in the light emitting diode is changed to improve the luminous efficiency; and the first The conductive layer 130 , the second conductive layer 132 and the third conductive layer 134 are arranged separately. The first light emitting diode 54 and the second light emitting diode 56 are disposed on the plurality of grooves 522; the first light emitting diode 54 and the second light emitting diode 56 include a first electrode 550, a third electrode 570 and A second electrode 552 and a fourth electrode 572 . The second electrode 552 of the first LED 54 is connected to the first conductive layer 130 through a first bump 510 . The first electrode 550 of the first light-emitting diode 54 and the fourth electrode 572 of the second light-emitting diode 56 are connected to the second conductive layer 132 through a second bump 512 , and are connected to the second conductive layer 132 through the second bump. 512 electrically connects the first LED 54 and the second LED 56 . The third electrode 570 is connected to the third conductive layer 134 through a third bump 514 . Since the first light emitting diode 54 and the second light emitting diode 56 are spaced apart, there is a separation space 58 between the first light emitting diode 54 and the second light emitting diode 56 to separate the first light emitting diode. 54 and the second LED 56 to avoid short circuit or leakage between the first LED 54 and the second LED 56 . Wherein, the first light emitting diode 54 and the second light emitting diode 56 are electrically connected through the first conductive layer 130, a second conductive layer 132 and a third conductive layer 134 and are coupled to an AC power source (in the figure not shown), so that the first light emitting diode 54 and the second light emitting diode 56 can emit light according to the alternating current.

再者,所述第一发光二极管54与所述第二发光二极管56包含一磊晶堆积层542、562、一N型半导体层544、564与一发光层546、566以及一P型半导体548、568。所述第一发光二极管54与所述第二发光二极管56从上而下依序为磊晶堆积层542、562、N型半导体层544、564、发光层546、566与P型半导体548、568;且第一电极550、570连接N型半导体层544、564,第二电极552、572连接P型半导体548、568;且所述磊晶堆积层542、562的掺杂浓度比所述N型半导体层544、564的掺杂浓度低。Furthermore, the first LED 54 and the second LED 56 include an epitaxial stacked layer 542, 562, an N-type semiconductor layer 544, 564, a light-emitting layer 546, 566, and a P-type semiconductor 548, 568. The first light-emitting diode 54 and the second light-emitting diode 56 are sequentially from top to bottom epitaxial stacked layers 542, 562, N-type semiconductor layers 544, 564, light-emitting layers 546, 566, and P-type semiconductor layers 548, 568. and the first electrodes 550, 570 are connected to the N-type semiconductor layers 544, 564, and the second electrodes 552, 572 are connected to the P-type semiconductors 548, 568; and the doping concentration of the epitaxial stacked layers 542, 562 is higher than that of the N-type The doping concentration of the semiconductor layers 544, 564 is low.

本发明藉由承接基板52的复数凹槽522避免发光层546、566照射至承接基板52的光线直接被承接基板52所吸收,并可让光线经承接基板52反射后往所述第一发光二极管54与所述第二发光二极管56的侧面传播,以提高所述第一发光二极管54与所述第二发光二极管56的光取出效率。In the present invention, the plurality of grooves 522 of the receiving substrate 52 prevents the light irradiated by the light-emitting layers 546 and 566 on the receiving substrate 52 from being directly absorbed by the receiving substrate 52, and allows the light to be reflected by the receiving substrate 52 and then go to the first light-emitting diode. 54 and the side of the second light emitting diode 56 to improve the light extraction efficiency of the first light emitting diode 54 and the second light emitting diode 56 .

实施例六。如图11所示,本发明的此一实施例与图10的实施例不同之处在于,进一步包含一绝缘层20,其设置于所述第一发光二极管54与所述第二发光二极管56之间的分隔空间58内,以进一步绝缘所述第一发光二极管54与所述第二发光二极管56之间的电性,而避免所述第一发光二极管54与所述第二发光二极管56之间发生短路或漏电情况。Embodiment six. As shown in FIG. 11 , this embodiment of the present invention differs from the embodiment of FIG. 10 in that it further includes an insulating layer 20 disposed between the first light emitting diode 54 and the second light emitting diode 56 In the separation space 58 between them, to further insulate the electrical property between the first light emitting diode 54 and the second light emitting diode 56, and avoid the gap between the first light emitting diode 54 and the second light emitting diode 56 A short circuit or leakage condition has occurred.

实施例七。如图12所示,本发明的此一实施例与图11的实施例不同之处在于,进一步包含一散射结构540、560,其位于所述第一发光二极管54的P型半导体548与第二发光二极管56的P型半导体568上,以提高所述第一发光二极管54与所述第二发光二极管56的光取出效率。Embodiment seven. As shown in FIG. 12, the difference between this embodiment of the present invention and the embodiment of FIG. 11 is that it further includes a scattering structure 540, 560, which is located between the P-type semiconductor 548 of the first light emitting diode 54 and the second on the P-type semiconductor 568 of the light emitting diode 56 to improve the light extraction efficiency of the first light emitting diode 54 and the second light emitting diode 56 .

实施例八。如图13所示,本发明的此一实施例与12的实施例不同之处在于,所述第一发光二极管54与所述第二发光二极管56之上设置一透明基板554、574,且透明基板554、574位于磊晶堆积层542、562之上。其中透明基板554、574设置一散射结构556、576,以提高覆晶式交流发光装置50的光散射效果,进而提高发光效能。Embodiment eight. As shown in Figure 13, the difference between this embodiment of the present invention and the embodiment of 12 is that a transparent substrate 554, 574 is arranged on the first light emitting diode 54 and the second light emitting diode 56, and transparent Substrates 554 , 574 are on top of epitaxial buildup layers 542 , 562 . The transparent substrates 554, 574 are provided with a scattering structure 556, 576 to improve the light scattering effect of the flip-chip AC light emitting device 50, thereby improving the luminous efficiency.

实施例九。如图14所示,本发明的此一实施例与图13的实施例不同之处在于,承接基板52之上设置一介电层524,以进一步绝缘所述第一发光二极管54与所述第二发光二极管56之间的电性,而避免所述第一发光二极管54与所述第二发光二极管56之间发生短路或漏电情况。Embodiment nine. As shown in FIG. 14 , the difference between this embodiment of the present invention and the embodiment of FIG. 13 is that a dielectric layer 524 is provided on the receiving substrate 52 to further insulate the first light emitting diode 54 from the first LED. The electrical properties between the two light emitting diodes 56, so as to avoid short circuit or leakage between the first light emitting diode 54 and the second light emitting diode 56.

实施例十。如图15所示,本发明的此一实施例与图14的实施例不同之处在于承接基板52之上设置一反射层526,并位于所述承接基板52与第一发光二极管54及所述第二发光二极管56之间;以避免发光层546、566照射至承接基板52的光线直接被承接基板52所吸收,并可让光线经承接基板52反射后往所述第一发光二极管54与所述第二发光二极管56的正面及侧面传播,以提高所述第一发光二极管54与所述第二发光二极管56的光取出效率。Embodiment ten. As shown in FIG. 15, the difference between this embodiment of the present invention and the embodiment of FIG. 14 is that a reflective layer 526 is arranged on the receiving substrate 52, and is located between the receiving substrate 52 and the first LED 54 and the between the second light-emitting diodes 56; to prevent light from the light-emitting layers 546, 566 irradiating onto the receiving substrate 52 from being directly absorbed by the receiving substrate 52, and allow the light to be reflected by the receiving substrate 52 to the first light-emitting diode 54 and the receiving substrate 52. The front and side surfaces of the second light emitting diode 56 are transmitted to improve the light extraction efficiency of the first light emitting diode 54 and the second light emitting diode 56 .

实施例十一。如图16A所示,本发明的此一实施例与图15的实施例不同之处在于,第一发光二极管54与第二发光二极管56的透明基板554、574上设置一能量转换层64,且能量转换层64覆盖第一发光二极管54与第二发光二极管56,藉由能量转换层64提高覆晶式交流发光装置50的照度。此外,如图16B所示,能量转换层64上可设置散射结构642,以提高覆晶式交流发光装置50的光散射效果,进而提高发光效能。此外,如图17A所示,覆晶式交流发光装置50更包含一桥式整流电路30,其耦接所述第一发光二极管54与所述第二发光二极管56,所述桥式整流电路30包含复数半导体磊晶层40。如图17B所示,所述覆晶式交流发光装置50至少包含一个以上的并联电路,所述并联电路亦即并联图17A所示的桥式整流电路30以及其所耦接的所述第一发光二极管54与所述第二发光二极管56。如图17C所示,所述覆晶式交流发光装置50至少包含一个以上的串联电路,所述串联电路亦即串联图17A所示的桥式整流电路30以及其所耦接的所述第一发光二极管54与所述第二发光二极管56。如图17D所示,所述覆晶式交流发光装置50至少包含一个以上的串并联电路,所述串并联电路亦即串并联图17A所示的桥式整流电路30以及其所耦接的所述第一发光二极管54与所述第二发光二极管56。Embodiment eleven. As shown in FIG. 16A , the difference between this embodiment of the present invention and the embodiment of FIG. 15 lies in that an energy conversion layer 64 is disposed on the transparent substrates 554 and 574 of the first LED 54 and the second LED 56 , and The energy conversion layer 64 covers the first LED 54 and the second LED 56 , and the illuminance of the flip chip AC light emitting device 50 is improved by the energy conversion layer 64 . In addition, as shown in FIG. 16B , a scattering structure 642 can be provided on the energy conversion layer 64 to improve the light scattering effect of the flip-chip AC light emitting device 50 , thereby improving the luminous efficiency. In addition, as shown in FIG. 17A , the flip-chip AC light emitting device 50 further includes a bridge rectifier circuit 30 coupled to the first LED 54 and the second LED 56 , and the bridge rectifier circuit 30 It includes a plurality of semiconductor epitaxial layers 40 . As shown in FIG. 17B, the flip-chip AC light emitting device 50 includes at least one parallel circuit, and the parallel circuit is to parallel connect the bridge rectifier circuit 30 shown in FIG. 17A and the first connected to it. LED 54 and the second LED 56 . As shown in FIG. 17C , the flip-chip AC light emitting device 50 includes at least one series circuit, and the series circuit is the bridge rectifier circuit 30 shown in FIG. 17A and the first connected circuit. LED 54 and the second LED 56 . As shown in FIG. 17D, the flip-chip AC light emitting device 50 includes at least one series-parallel circuit, and the series-parallel circuit is a series-parallel connection of the bridge rectifier circuit 30 shown in FIG. 17A and all the connected circuits. The first LED 54 and the second LED 56.

参见图18A,当所述复数半导体磊晶层40为复数第三发光二极管时,每一所述半导体磊晶层40设置于承接基板52的复数凹槽522上,且每一所述半导体磊晶层40分别由下而上包含一磊晶堆积层42、一N型半导体层44与一发光层46以及一P型半导体48。其中N型半导体层44上设置一第一电极442,P型半导体层48上设置一第二电极482。如图18B所示,当所述复数半导体磊晶层40为复数二极管时,每一所述半导体磊晶层40设置于承接基板52的复数凹槽522上,且每一所述半导体磊晶层40分别由下而上包含一磊晶堆积层42、一N型半导体层44与一P型半导体48。其中N型半导体层44上设置一第一电极442,P型半导体层48上设置一第二电极482。如图18C所示,当所述复数半导体磊晶层40为复数二极管时,每一所述半导体磊晶层40设置于承接基板52的复数凹槽522上,且每一所述半导体磊晶层40分别由下而上包含一磊晶堆积层42以及一N型半导体层44。其中磊晶堆积层42上设置一第二电极422,N型半导体层44上设置一第一电极442。此外,本发明更可设置一能量转换层62于所述半导体磊晶层40上,如图18D所示。Referring to FIG. 18A, when the plurality of semiconductor epitaxial layers 40 are a plurality of third light emitting diodes, each of the semiconductor epitaxial layers 40 is disposed on the plurality of grooves 522 of the receiving substrate 52, and each of the semiconductor epitaxial layers 40 The layer 40 includes an epitaxial stacked layer 42 , an N-type semiconductor layer 44 , a light-emitting layer 46 and a P-type semiconductor 48 from bottom to top. A first electrode 442 is disposed on the N-type semiconductor layer 44 , and a second electrode 482 is disposed on the P-type semiconductor layer 48 . As shown in FIG. 18B, when the plurality of semiconductor epitaxial layers 40 are plural diodes, each of the semiconductor epitaxial layers 40 is disposed on the plurality of grooves 522 of the receiving substrate 52, and each of the semiconductor epitaxial layers 40 respectively includes an epitaxial stacked layer 42 , an N-type semiconductor layer 44 and a P-type semiconductor layer 48 from bottom to top. A first electrode 442 is disposed on the N-type semiconductor layer 44 , and a second electrode 482 is disposed on the P-type semiconductor layer 48 . As shown in FIG. 18C, when the plurality of semiconductor epitaxial layers 40 are plural diodes, each of the semiconductor epitaxial layers 40 is disposed on the plurality of grooves 522 of the receiving substrate 52, and each of the semiconductor epitaxial layers 40 respectively includes an epitaxial deposition layer 42 and an N-type semiconductor layer 44 from bottom to top. Wherein, a second electrode 422 is disposed on the epitaxial stacked layer 42 , and a first electrode 442 is disposed on the N-type semiconductor layer 44 . In addition, the present invention can further arrange an energy conversion layer 62 on the semiconductor epitaxial layer 40 , as shown in FIG. 18D .

如图19A所示,本发明的此一实施例与图18A的实施例不同之处在于,设置一散射结构60于P型半导体层48或N型半导体层44之上,以提高光散射效果及电极的接触面积,进而提高发光效能。如图19B所示,本发明的此一实施例与图18B的实施例不同之处在于,设置一散射结构60于P型半导体层48或N型半导体层44之上。如图19C所示,本发明的此一实施例与图18C的实施例不同之处在于,设置一散射结构60于N型半导体层44或磊晶堆积层42之上。此外,本发明更可设置一能量转换层62于所述半导体磊晶层40上,如图19D所示。As shown in FIG. 19A, the difference between this embodiment of the present invention and the embodiment of FIG. 18A is that a scattering structure 60 is arranged on the P-type semiconductor layer 48 or the N-type semiconductor layer 44 to improve the light scattering effect and The contact area of the electrodes is improved, thereby improving the luminous efficiency. As shown in FIG. 19B , the difference between this embodiment of the present invention and the embodiment of FIG. 18B is that a scattering structure 60 is disposed on the P-type semiconductor layer 48 or the N-type semiconductor layer 44 . As shown in FIG. 19C , the difference between this embodiment of the present invention and the embodiment of FIG. 18C is that a scattering structure 60 is disposed on the N-type semiconductor layer 44 or the epitaxial stacked layer 42 . In addition, the present invention can further arrange an energy conversion layer 62 on the semiconductor epitaxial layer 40 , as shown in FIG. 19D .

参见图20A至20E,其为本发明的再一较佳实施例的制造流程图,并请同时参见图10。本发明的覆晶式交流发光装置的制造方法,包含提供一承接基板52,并蚀刻复数凹槽522;形成一第一导电层130、一第二导电层132与一第三导电层134于承接基板52上;提供一共享基板96,并对应所述复数凹槽522磊晶形成一第一发光二极管54与一第二发光二极管56于所述共享基板96之上;翻转所述共享基板96以一第一凸块510使所述第一发光二极管54与所述第一导电层130电性相接,以一第二凸块512使所述第一发光二极管54与所述第二发光二极管56相接第二导电层132,以一第三凸块514使所述第二发光二极管56与所述第三导电层134相接;以及自所述共享基板96分离所述第一发光二极管54与所述第二发光二极管56。Refer to FIGS. 20A to 20E , which are the manufacturing flow diagrams of yet another preferred embodiment of the present invention, and please refer to FIG. 10 at the same time. The manufacturing method of the flip-chip AC light-emitting device of the present invention includes providing a receiving substrate 52, and etching a plurality of grooves 522; forming a first conductive layer 130, a second conductive layer 132 and a third conductive layer 134 on the receiving substrate On the substrate 52; a shared substrate 96 is provided, and a first light emitting diode 54 and a second light emitting diode 56 are epitaxially formed on the shared substrate 96 corresponding to the plurality of grooves 522; the shared substrate 96 is turned over to A first bump 510 electrically connects the first LED 54 to the first conductive layer 130, and a second bump 512 connects the first LED 54 to the second LED 56. Connecting to the second conductive layer 132, using a third bump 514 to connect the second LED 56 to the third conductive layer 134; and separating the first LED 54 and the third conductive layer 134 from the shared substrate 96 The second light emitting diode 56 .

再参见图21A至21E,其也为本发明的另一较佳实施例的制造流程图;并请同时参阅图11。本实施例与图20A至图20E的实施例不同之处在于,对应所述复数凹槽522磊晶形成一第一发光二极管54与一第二发光二极管56于所述共享基板96之上的同一步骤中,进一步包含形成一绝缘层20于第一发光二极管54与第二发光二极管56之间,且绝缘层20位于第一发光二极管54与第二发光二极管56之间的分隔空间58内。Referring again to FIGS. 21A to 21E , which are also manufacturing flow charts of another preferred embodiment of the present invention; please also refer to FIG. 11 . The difference between this embodiment and the embodiment shown in FIG. 20A to FIG. 20E is that a first light emitting diode 54 and a second light emitting diode 56 are epitaxially formed on the same substrate 96 corresponding to the plurality of grooves 522. In the step, it further includes forming an insulating layer 20 between the first LED 54 and the second LED 56 , and the insulating layer 20 is located in the separation space 58 between the first LED 54 and the second LED 56 .

以上通过实施例,对本发明进行了详细的说明,但这些并非构成对本发明的限制。在不脱离本发明原理的情况下,本领域的技术人员还可做出许多变形和改进,这些也应视为本发明的保护范围。The present invention has been described in detail through the above examples, but these are not intended to limit the present invention. Without departing from the principle of the present invention, those skilled in the art can also make many modifications and improvements, which should also be regarded as the protection scope of the present invention.

Claims (60)

1.一种具有增加光取出效率的交流发光装置,其特征在于,包括:1. An AC lighting device with increased light extraction efficiency, characterized in that it comprises: 一基板,其具有复数凹槽;A substrate having a plurality of grooves; 一第一发光二极管,设置于所述复数凹槽上;a first light emitting diode, arranged on the plurality of grooves; 一第二发光二极管,设置于所述复数凹槽上;以及a second light emitting diode disposed on the plurality of grooves; and 一导体,其耦接所述第一发光二极管与所述第二发光二极管,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间,所述第一发光二极管与所述第二发光二极管可依一交流电发光。A conductor, which is coupled to the first light emitting diode and the second light emitting diode, there is a separation space between the first light emitting diode and the second light emitting diode, the first light emitting diode and the second light emitting diode The two light emitting diodes can emit light according to an alternating current. 2.如权利要求1所述的交流发光装置,其特征在于:还包括,2. The AC lighting device according to claim 1, further comprising: 一绝缘层,设置于所述第一发光二极管与所述第二发光二极管之间,并位于所述分隔空间。An insulating layer is arranged between the first light-emitting diode and the second light-emitting diode, and is located in the separation space. 3.如权利要求1所述的交流发光装置,其特征在于:所述第一发光二极管包含:3. The AC light emitting device according to claim 1, wherein the first light emitting diode comprises: 一外延堆栈层,设置于所述复数凹槽上;an epitaxial stack layer disposed on the plurality of grooves; 一N型半导体层,设置于所述外延堆栈层上;an N-type semiconductor layer disposed on the epitaxial stack layer; 一发光层,设置于所述N型半导体层上;a light-emitting layer disposed on the N-type semiconductor layer; 一P型半导体层,设置于所述发光层上;A P-type semiconductor layer disposed on the light-emitting layer; 一第一电极,设置于所述N型半导体层上,所述第一电极耦接所述导体;以及a first electrode, disposed on the N-type semiconductor layer, the first electrode coupled to the conductor; and 一第二电极,设置于所述P型半导体层上。A second electrode is arranged on the P-type semiconductor layer. 4.如权利要求3所述的交流发光装置,其特征在于:所述第一发光二极管包含一散射结构,设置于所述P型半导体层上。4. The AC light emitting device according to claim 3, wherein the first light emitting diode comprises a scattering structure disposed on the P-type semiconductor layer. 5.如权利要求1所述的交流发光装置,其特征在于:所述第二发光二极管包含:5. The AC light emitting device according to claim 1, wherein the second light emitting diode comprises: 一外延堆栈层,设置于所述复数凹槽上;an epitaxial stack layer disposed on the plurality of grooves; 一N型半导体层,设置于所述外延堆栈层上;an N-type semiconductor layer disposed on the epitaxial stack layer; 一发光层,设置于所述N型半导体层上;a light-emitting layer disposed on the N-type semiconductor layer; 一P型半导体层,设置于所述发光层上;A P-type semiconductor layer disposed on the light-emitting layer; 一第一电极,设置于所述N型半导体层上;以及a first electrode disposed on the N-type semiconductor layer; and 一第二电极,设置于所述P型半导体层上,所述第二电极耦接所述导体。A second electrode is disposed on the P-type semiconductor layer, and the second electrode is coupled to the conductor. 6.如权利要求5所述的交流发光装置,其特征在于:所述第二发光二极管包含一散射结构,设置于所述P型半导体层上。6. The AC light emitting device according to claim 5, wherein the second light emitting diode comprises a scattering structure disposed on the P-type semiconductor layer. 7.如权利要求1所述的交流发光装置,其特征在于:还包括,7. The AC lighting device according to claim 1, further comprising: 一桥式整流电路,其耦接所述第一发光二极管与所述第二发光二极管。A bridge rectifier circuit coupled to the first LED and the second LED. 8.如权利要求7所述的交流发光装置,其特征在于:所述桥式整流电路包含复数半导体磊晶层。8. The AC light emitting device according to claim 7, wherein the bridge rectifier circuit comprises a plurality of semiconductor epitaxial layers. 9.如权利要求8所述的交流发光装置,其特征在于:所述复数半导体磊晶层为复数第三发光二极管,其分别包含:9. The AC light-emitting device according to claim 8, characterized in that: the plurality of semiconductor epitaxial layers are a plurality of third light-emitting diodes, which respectively include: 一外延堆栈层,设置于所述复数凹槽上;an epitaxial stack layer disposed on the plurality of grooves; 一N型半导体层,设置于所述外延堆栈层上;an N-type semiconductor layer disposed on the epitaxial stack layer; 一发光层,设置于所述N型半导体层上;a light-emitting layer disposed on the N-type semiconductor layer; 一P型半导体层,设置于所述发光层上;A P-type semiconductor layer disposed on the light-emitting layer; 一第一电极,设置于所述N型半导体层上;以及a first electrode disposed on the N-type semiconductor layer; and 一第二电极,设置于所述P型半导体层上。A second electrode is arranged on the P-type semiconductor layer. 10.如权利要求9所述的交流发光装置,其特征在于:所述第三发光二极管包含一散射结构,设置于所述P型半导体层上。10 . The AC light emitting device according to claim 9 , wherein the third light emitting diode comprises a scattering structure disposed on the P-type semiconductor layer. 11 . 11.如权利要求8所述的交流发光装置,其特征在于:所述复数半导体磊晶层为复数二极管,其分别包含:11. The AC light emitting device according to claim 8, characterized in that: the plurality of semiconductor epitaxial layers are a plurality of diodes, which respectively include: 一外延堆栈层,设置于所述复数凹槽上;an epitaxial stack layer disposed on the plurality of grooves; 一N型半导体层,设置于所述外延堆栈层上;an N-type semiconductor layer disposed on the epitaxial stack layer; 一P型半导体层,设置于所述N型半导体层上;A P-type semiconductor layer disposed on the N-type semiconductor layer; 一第一电极,设置于所述N型半导体层上;以及a first electrode disposed on the N-type semiconductor layer; and 一第二电极,设置于所述P型半导体层上。A second electrode is arranged on the P-type semiconductor layer. 12.如权利要求11所述的交流发光装置,其特征在于:所述复数二极管包含一散射结构,设置于所述P型半导体层上。12. The AC light emitting device according to claim 11, wherein the plurality of diodes comprise a scattering structure disposed on the P-type semiconductor layer. 13.如权利要求8所述的交流发光装置,其特征在于:所述复数半导体磊晶层为复数二极管,其分别包含:13. The AC light emitting device according to claim 8, characterized in that: the plurality of semiconductor epitaxial layers are a plurality of diodes, which respectively include: 一外延堆栈层,设置于所述复数凹槽上;an epitaxial stack layer disposed on the plurality of grooves; 一N型半导体层,设置于所述外延堆栈层上;an N-type semiconductor layer disposed on the epitaxial stack layer; 一第一电极,设置于所述外延堆栈层上;以及a first electrode disposed on the epitaxial stack; and 一第二电极,设置于所述N型半导体层上。A second electrode is arranged on the N-type semiconductor layer. 14.如权利要求13所述的交流发光装置,其特征在于:所述复数二极管包含一散射结构,设置于所述N型半导体层上。14. The AC light emitting device according to claim 13, wherein the plurality of diodes comprise a scattering structure disposed on the N-type semiconductor layer. 15.如权利要求3、5、9、11或13所述的交流发光装置,其特征在于:所述外延堆栈层的掺杂浓度较N型半导体层的掺杂浓度低。15. The AC light-emitting device according to claim 3, 5, 9, 11 or 13, wherein the doping concentration of the epitaxial stack layer is lower than that of the N-type semiconductor layer. 16.如权利要求3、5、9或11所述的交流发光装置,其特征在于:还包含一能量转换层,设置于所述P型半导体层上。16. The AC light emitting device according to claim 3, 5, 9 or 11, further comprising an energy conversion layer disposed on the P-type semiconductor layer. 17.如权利要求16所述的交流发光装置,其特征在于:还包含一散射结构,设置于所述能量转换层上。17. The AC light emitting device according to claim 16, further comprising a scattering structure disposed on the energy conversion layer. 18.如权利要求1所述的交流发光装置,其特征在于:所述复数凹槽包含复数光子晶体结构。18. The AC light emitting device according to claim 1, wherein the plurality of grooves comprise a plurality of photonic crystal structures. 19.如权利要求1所述的交流发光装置,其特征在于:所述复数凹槽具相同间隔距离。19. The AC light emitting device as claimed in claim 1, wherein the plurality of grooves have the same distance apart. 20.如权利要求1所述的交流发光装置,其特征在于:所述复数凹槽具不同间隔距离。20. The AC light emitting device as claimed in claim 1, wherein the plurality of grooves have different spacing distances. 21.如权利要求1所述的交流发光装置,其特征在于:所述交流发光装置至少包含一个以上的并联电路。21. The AC light emitting device according to claim 1, characterized in that: the AC light emitting device comprises at least one parallel circuit. 22.如权利要求1所述的交流发光装置,其特征在于:所述交流发光装置至少包含一个以上的串联电路。22. The AC light emitting device according to claim 1, wherein the AC light emitting device comprises at least one series circuit. 23.如权利要求1所述的交流发光装置,其特征在于:所述交流发光装置至少包含一个以上的串并联电路。23. The AC light emitting device according to claim 1, wherein the AC light emitting device comprises at least one series-parallel circuit. 24.一种交流发光装置的制造方法,其特征在于:包含如下步骤:24. A method for manufacturing an AC light emitting device, comprising the following steps: 提供一基板并蚀刻复数凹槽于所述基板上;providing a substrate and etching a plurality of grooves on the substrate; 分别形成一第一发光二极管与一第二发光二极管于所述复数凹槽上,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间;以及forming a first light emitting diode and a second light emitting diode on the plurality of grooves respectively, with a separation space between the first light emitting diode and the second light emitting diode; and 设置一导体于所述分隔空间上并连接所述第一发光二极管与所述第二发光二极管。A conductor is arranged on the separation space and connected to the first light-emitting diode and the second light-emitting diode. 25.如权利要求24所述的制造方法,其特征在于:设置一导体于所述分隔空间上并连接所述第一发光二极管与所述第二发光二极管的步骤前,包含,形成一绝缘层于所述第一发光二极管与所述第二发光二极管之间,且所述绝缘层位于所述分隔空间中。25. The manufacturing method according to claim 24, wherein before the step of disposing a conductor on the separation space and connecting the first light-emitting diode and the second light-emitting diode, comprising forming an insulating layer Between the first light emitting diode and the second light emitting diode, and the insulating layer is located in the separation space. 26.一种具有增加光取出效率的交流发光装置,其特征在于:包含,26. An AC light-emitting device with increased light extraction efficiency, characterized in that: comprising, 一承接基板,具有复数凹槽、一第一导电层、一第二导电层与一第三导电层;A receiving substrate having a plurality of grooves, a first conductive layer, a second conductive layer and a third conductive layer; 一第一发光二极管,设置于所述复数凹槽上,所述第一发光二极管包含一第一电极与一第二电极,所述第二电极通过一第一凸块连接所述第一导电层,所述第一电极通过一第二凸块连接所述第二导电层;以及A first light-emitting diode, disposed on the plurality of grooves, the first light-emitting diode includes a first electrode and a second electrode, and the second electrode is connected to the first conductive layer through a first bump , the first electrode is connected to the second conductive layer through a second bump; and 一第二发光二极管,设置于所述复数凹槽上,所述第二发光二极管包含一第三电极与一第四电极,所述第三电极通过一第三凸块连接所述第三导电层,所述第四电极通过一第二凸块连接所述第二导电层,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间,所述第一发光二极管与所述第二发光二极管通过所述第一导电层、所述第二导电层与所述第三导电层依一交流电发光。A second light emitting diode is arranged on the plurality of grooves, the second light emitting diode includes a third electrode and a fourth electrode, and the third electrode is connected to the third conductive layer through a third bump , the fourth electrode is connected to the second conductive layer through a second bump, there is a separation space between the first light emitting diode and the second light emitting diode, and the first light emitting diode and the first light emitting diode The two light emitting diodes emit light according to an alternating current through the first conductive layer, the second conductive layer and the third conductive layer. 27.如权利要求26所述的交流发光装置,其特征在于:还包含,一绝缘层,设置于所述第一发光二极管与所述第二发光二极管之间,并位于所述分隔空间。27. The AC light emitting device according to claim 26, further comprising: an insulating layer disposed between the first LED and the second LED and located in the separation space. 28.如权利要求26所述的交流发光装置,其特征在于:所述第一发光二极管包含:28. The AC light emitting device according to claim 26, wherein the first light emitting diode comprises: 一P型半导体层,设置于所述承接基板上,并连接所述第二电极;a P-type semiconductor layer disposed on the receiving substrate and connected to the second electrode; 一发光层,设置于所述N型半导体层上;a light-emitting layer disposed on the N-type semiconductor layer; 一N型半导体层,设置于所述发光层上,并连接所述第一电极;以及an N-type semiconductor layer disposed on the light-emitting layer and connected to the first electrode; and 一外延堆栈层,设置于所述N型半导体层上。An epitaxial stack layer is arranged on the N-type semiconductor layer. 29.如权利要求28所述的交流发光装置,其特征在于:所述第一发光二极管包含一散射结构,设置于所述P型半导体层上。29. The AC light emitting device according to claim 28, wherein the first light emitting diode comprises a scattering structure disposed on the P-type semiconductor layer. 30.如权利要求28所述的交流发光装置,其特征在于:所述第一发光二极管包含一透明基板,设置于所述外延堆栈层上。30. The AC light emitting device according to claim 28, wherein the first light emitting diode comprises a transparent substrate disposed on the epitaxial stack layer. 31.如权利要求30所述的交流发光装置,其特征在于:所述第一发光二极管包含一散射结构,设置于所述透明基板上。31. The AC light emitting device according to claim 30, wherein the first light emitting diode comprises a scattering structure disposed on the transparent substrate. 32.如权利要求26所述的交流发光装置,其特征在于:所述第二发光二极管包含,32. The AC light emitting device according to claim 26, wherein the second light emitting diode comprises, 一P型半导体层,设置于所述承接基板上,并连接所述第四电极;a P-type semiconductor layer disposed on the receiving substrate and connected to the fourth electrode; 一发光层,设置于所述N型半导体层上;a light-emitting layer disposed on the N-type semiconductor layer; 一N型半导体层,设置于所述发光层上,并连接所述第三电极;以及an N-type semiconductor layer disposed on the light-emitting layer and connected to the third electrode; and 一外延堆栈层,设置于所述N型半导体层上。An epitaxial stack layer is arranged on the N-type semiconductor layer. 33.如权利要求32所述的交流发光装置,其特征在于:所述第二发光二极管包含一散射结构,设置于所述P型半导体层上。33. The AC light emitting device according to claim 32, wherein the second light emitting diode comprises a scattering structure disposed on the P-type semiconductor layer. 34.如权利要求32所述的交流发光装置,其特征在于:所述第二发光二极管包含一透明基板,设置于所述外延堆栈层上。34. The AC light emitting device according to claim 32, wherein the second light emitting diode comprises a transparent substrate disposed on the epitaxial stack layer. 35.如权利要求34所述的交流发光装置,其特征在于:所述第二发光二极管包含一散射结构,设置于所述透明基板上。35. The AC light emitting device according to claim 34, wherein the second light emitting diode comprises a scattering structure disposed on the transparent substrate. 36.如权利要求30或34所述的交流发光装置,其特征在于:还包含一能量转换层设置于所述透明基板上。36. The AC light emitting device according to claim 30 or 34, further comprising an energy conversion layer disposed on the transparent substrate. 37.如权利要求26所述的交流发光装置,其特征在于:还包含一桥式整流电路,其耦接所述第一发光二极管与所述第二发光二极管。37. The AC lighting device as claimed in claim 26, further comprising a bridge rectifier circuit coupled to the first LED and the second LED. 38.如权利要求37所述的交流发光装置,其特征在于:所述桥式整流电路包含复数半导体磊晶层。38. The AC light emitting device according to claim 37, wherein the bridge rectifier circuit comprises a plurality of semiconductor epitaxial layers. 39.如权利要求38所述的交流发光装置,其特征在于:所述复数半导体磊晶层为复数第三发光二极管,其分别包含:39. The AC light-emitting device according to claim 38, characterized in that: the plurality of semiconductor epitaxial layers are a plurality of third light-emitting diodes, which respectively include: 一外延堆栈层,设置于所述复数凹槽上;an epitaxial stack layer disposed on the plurality of grooves; 一N型半导体层,设置于所述外延堆栈层上;an N-type semiconductor layer disposed on the epitaxial stack layer; 一发光层,设置于所述N型半导体层上;a light-emitting layer disposed on the N-type semiconductor layer; 一P型半导体层,设置于所述发光层上;A P-type semiconductor layer disposed on the light-emitting layer; 一第一电极,设置于所述N型半导体层上;以及a first electrode disposed on the N-type semiconductor layer; and 一第二电极,设置于所述P型半导体层上。A second electrode is arranged on the P-type semiconductor layer. 40.如权利要求39所述的交流发光装置,其特征在于:所述第三发光二极管包含一散射结构,设置于所述P型半导体层上。40. The AC light emitting device according to claim 39, wherein the third light emitting diode comprises a scattering structure disposed on the P-type semiconductor layer. 41.如权利要求38所述的交流发光装置,其特征在于:所述复数半导体磊晶层为复数二极管,其分别包含:41. The AC light emitting device according to claim 38, characterized in that: the plurality of semiconductor epitaxial layers are a plurality of diodes, which respectively include: 一外延堆栈层,设置于所述复数凹槽上;an epitaxial stack layer disposed on the plurality of grooves; 一N型半导体层,设置于所述外延堆栈层上;an N-type semiconductor layer disposed on the epitaxial stack layer; 一P型半导体层,设置于所述N型半导体层上;A P-type semiconductor layer disposed on the N-type semiconductor layer; 一第一电极,设置于所述N型半导体层上;以及a first electrode disposed on the N-type semiconductor layer; and 一第二电极,设置于所述P型半导体层上。A second electrode is arranged on the P-type semiconductor layer. 42.如权利要求41所述的交流发光装置,其特征在于:所述复数二极管包含一散射结构,设置于所述P型半导体层上。42. The AC light emitting device according to claim 41, wherein the plurality of diodes comprise a scattering structure disposed on the P-type semiconductor layer. 43.如权利要求38所述的交流发光装置,其特征在于:所述复数半导体磊晶层为复数二极管,其分别包含:43. The AC light emitting device according to claim 38, characterized in that: the plurality of semiconductor epitaxial layers are a plurality of diodes, which respectively include: 一外延堆栈层,设置于所述复数凹槽上;an epitaxial stack layer disposed on the plurality of grooves; 一N型半导体层,设置于所述外延堆栈层上;an N-type semiconductor layer disposed on the epitaxial stack layer; 一第一电极,设置于所述外延堆栈层上;以及a first electrode disposed on the epitaxial stack; and 一第二电极,设置于所述N型半导体层上。A second electrode is arranged on the N-type semiconductor layer. 44.如权利要求43所述的交流发光装置,其特征在于:所述复数二极管包含一散射结构,设置于所述N型半导体层上。44. The AC light emitting device according to claim 43, wherein the plurality of diodes comprise a scattering structure disposed on the N-type semiconductor layer. 45.如权利要求28、32、39、41或43所述的交流发光装置,其特征在于:所述外延堆栈层的掺杂浓度较所述N型半导体层的掺杂浓度低。45. The AC light-emitting device according to claim 28, 32, 39, 41 or 43, wherein the doping concentration of the epitaxial stack layer is lower than that of the N-type semiconductor layer. 46.如权利要求39或41所述的交流发光装置,其特征在于:还包含一能量转换层,设置于所述P型半导体层上。46. The AC light emitting device according to claim 39 or 41, further comprising an energy conversion layer disposed on the P-type semiconductor layer. 47.如权利要求26所述的交流发光装置,其特征在于:所述复数凹槽可包含复数光子晶体结构。47. The AC light emitting device as claimed in claim 26, wherein the plurality of grooves comprise a plurality of photonic crystal structures. 48.如权利要求26所述的交流发光装置,其特征在于:所述复数凹槽具有相同间隔距离。48. The AC light emitting device as claimed in claim 26, wherein the plurality of grooves have the same distance apart. 49.如权利要求26所述的交流发光装置,其特征在于:所述复数凹槽具有不同间隔距离。49. The AC light emitting device as claimed in claim 26, wherein the plurality of grooves have different spacing distances. 50.如权利要求26所述的交流发光装置,其特征在于:所述交流发光装置至少包含一个以上的并联电路。50. The AC light emitting device according to claim 26, wherein the AC light emitting device comprises at least one parallel circuit. 51.如权利要求26所述的交流发光装置,其特征在于:所述交流发光装置至少包含一个以上串联电路。51. The AC lighting device according to claim 26, wherein the AC lighting device comprises at least one series circuit. 52.如权利要求26所述的交流发光装置,其特征在于:所述交流发光装置至少包含一个以上串并联电路。52. The AC light emitting device according to claim 26, wherein the AC light emitting device comprises at least one series-parallel circuit. 53.如权利要求26所述的交流发光装置,其特征在于:还包含一介电层,设置于所述复数凹槽上。53. The AC light emitting device according to claim 26, further comprising a dielectric layer disposed on the plurality of grooves. 54.如权利要求53所述的交流发光装置,其特征在于:所述介电层至少包含一种以上材料与厚度的复数组合。54. The AC light emitting device according to claim 53, wherein the dielectric layer at least comprises a plurality of combinations of more than one material and thickness. 55.如权利要求26所述的交流发光装置,其特征在于:还包含一反射层,设于所述承接基板与所述第一发光二极管及所述第二发光二极管之间。55. The AC light emitting device according to claim 26, further comprising a reflective layer disposed between the receiving substrate and the first light emitting diode and the second light emitting diode. 56.如权利要求53所述的交流发光装置,其特征在于:还包含一反射层,设于所述承接基板与介电层之间。56. The AC light emitting device according to claim 53, further comprising a reflective layer disposed between the receiving substrate and the dielectric layer. 57.一种交流发光装置的制造方法,其特征在于:包含如下步骤,57. A method for manufacturing an AC light emitting device, characterized in that it comprises the following steps, 提供一承接基板并蚀刻复数凹槽于所述承接基板上,且所述承接基板上具有一第一导电层、一第二导电层与一第三导电层;providing a receiving substrate and etching a plurality of grooves on the receiving substrate, and the receiving substrate has a first conductive layer, a second conductive layer and a third conductive layer; 提供一共享基板,对应所述复数凹槽分别形成一第一发光二极管与一第二发光二极管于所述共享基板上,所述第一发光二极管与所述第二发光二极管之间具一分隔空间;以及A shared substrate is provided, a first light emitting diode and a second light emitting diode are respectively formed on the shared substrate corresponding to the plurality of grooves, and there is a separation space between the first light emitting diode and the second light emitting diode ;as well as 翻转所述共享基板,以一第一凸块使所述第一发光二极管连接所述第一导电层,以一第二凸块使所述第一发光二极管与所述第二发光二极管连接所述第二导电层,以一第三凸块使所述第二发光二极管连接所述第三导电层;以及Flipping the shared substrate, using a first bump to connect the first light emitting diode to the first conductive layer, using a second bump to connect the first light emitting diode and the second light emitting diode to the a second conductive layer, using a third bump to connect the second light emitting diode to the third conductive layer; and 自所述第一发光二极管与所述第二发光二极管分离所述共享基板。The shared substrate is separated from the first LED and the second LED. 58.如权利要求57所述的制造方法,其特征在于:对应所述复数凹槽分别形成一第一发光二极管与一第二发光二极管于所述共享基板上的步骤中,包含如下步骤:58. The manufacturing method according to claim 57, wherein the step of forming a first light-emitting diode and a second light-emitting diode on the shared substrate corresponding to the plurality of grooves includes the following steps: 形成一绝缘层于所述第一发光二极管与所述第二发光二极管之间,且所述绝缘层位于所述分隔空间中。An insulating layer is formed between the first LED and the second LED, and the insulating layer is located in the separation space. 59.如权利要求57所述的制造方法,其特征在于:对应所述复数凹槽分别形成一第一发光二极管与一第二发光二极管于所述共享基板上的步骤中,包含如下步骤:形成一介电层于所述承接基板上。59. The manufacturing method according to claim 57, wherein the step of forming a first light-emitting diode and a second light-emitting diode on the shared substrate corresponding to the plurality of grooves includes the following steps: forming A dielectric layer is on the receiving substrate. 60.如权利要求57所述的制造方法,其特征在于:对应所述复数凹槽分别形成一第一发光二极管与一第二发光二极管于所述共享基板上的的步骤中,包含如下步骤:形成一反射层设于所述承接基板与所述介电层之间。60. The manufacturing method according to claim 57, wherein the step of forming a first light-emitting diode and a second light-emitting diode on the shared substrate corresponding to the plurality of grooves includes the following steps: A reflective layer is formed between the receiving substrate and the dielectric layer.
CN200910131539.XA 2009-04-07 2009-04-07 Alternating current light-emitting device with effect of increasing light extraction efficiency and manufacturing method thereof Active CN101859789B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200910131539.XA CN101859789B (en) 2009-04-07 2009-04-07 Alternating current light-emitting device with effect of increasing light extraction efficiency and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200910131539.XA CN101859789B (en) 2009-04-07 2009-04-07 Alternating current light-emitting device with effect of increasing light extraction efficiency and manufacturing method thereof

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201310531580.2A Division CN103560195A (en) 2009-04-07 2009-04-07 Alternating-current light-emitting device capable of increasing light extraction efficiency and manufacturing method thereof

Publications (2)

Publication Number Publication Date
CN101859789A true CN101859789A (en) 2010-10-13
CN101859789B CN101859789B (en) 2015-01-07

Family

ID=42945558

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200910131539.XA Active CN101859789B (en) 2009-04-07 2009-04-07 Alternating current light-emitting device with effect of increasing light extraction efficiency and manufacturing method thereof

Country Status (1)

Country Link
CN (1) CN101859789B (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102468293A (en) * 2010-11-09 2012-05-23 柏友照明科技股份有限公司 Polycrystal packaging structure directly electrically connected with alternating current power supply
CN102544048A (en) * 2010-12-27 2012-07-04 同方光电科技有限公司 High-power GaN-base light-emitting diode and manufacturing method thereof
CN102593299A (en) * 2011-01-17 2012-07-18 隆达电子股份有限公司 Solid-state light-emitting element with mesh channel and manufacturing method thereof
CN102842573A (en) * 2012-09-05 2012-12-26 宁波市鄞州皓升半导体照明有限公司 Alternating current light emitting diode structure
CN102867837A (en) * 2012-09-13 2013-01-09 中国科学院半导体研究所 Manufacture method of array type high-voltage LED device
CN106935577A (en) * 2011-03-22 2017-07-07 晶元光电股份有限公司 Light emitting diode device
CN106935698A (en) * 2013-04-18 2017-07-07 亿光电子工业股份有限公司 Light emitting diode device
CN111864019A (en) * 2020-07-10 2020-10-30 武汉大学 A flip-chip light-emitting diode with embedded scattering layer and method of making the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6753552B1 (en) * 2003-08-02 2004-06-22 Formosa Epitaxy Incorporation Growth-selective structure of light-emitting diode
JP2005072089A (en) * 2003-08-20 2005-03-17 ▲さん▼圓光電股▲ふん▼有限公司 Light emitting diode device and its manufacturing method
CN1767223A (en) * 2004-10-28 2006-05-03 国联光电科技股份有限公司 Semiconductor light-emitting component and its manufacturing method
US20060273333A1 (en) * 2005-06-03 2006-12-07 Liang-Wen Wu Light emitting diode and method of fabricating thereof
US20070246711A1 (en) * 2006-04-24 2007-10-25 Cheng-Kuo Huang Multi-directional light scattering LED and manufacturing method thereof
CN101203966A (en) * 2005-06-22 2008-06-18 首尔Opto仪器股份有限公司 Light emitting device and manufacturing method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6753552B1 (en) * 2003-08-02 2004-06-22 Formosa Epitaxy Incorporation Growth-selective structure of light-emitting diode
JP2005072089A (en) * 2003-08-20 2005-03-17 ▲さん▼圓光電股▲ふん▼有限公司 Light emitting diode device and its manufacturing method
CN1767223A (en) * 2004-10-28 2006-05-03 国联光电科技股份有限公司 Semiconductor light-emitting component and its manufacturing method
US20060273333A1 (en) * 2005-06-03 2006-12-07 Liang-Wen Wu Light emitting diode and method of fabricating thereof
CN101203966A (en) * 2005-06-22 2008-06-18 首尔Opto仪器股份有限公司 Light emitting device and manufacturing method thereof
US20070246711A1 (en) * 2006-04-24 2007-10-25 Cheng-Kuo Huang Multi-directional light scattering LED and manufacturing method thereof

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102468293A (en) * 2010-11-09 2012-05-23 柏友照明科技股份有限公司 Polycrystal packaging structure directly electrically connected with alternating current power supply
CN102544048A (en) * 2010-12-27 2012-07-04 同方光电科技有限公司 High-power GaN-base light-emitting diode and manufacturing method thereof
CN102593299A (en) * 2011-01-17 2012-07-18 隆达电子股份有限公司 Solid-state light-emitting element with mesh channel and manufacturing method thereof
CN102593299B (en) * 2011-01-17 2016-12-14 隆达电子股份有限公司 Solid-state light-emitting element with mesh channel and manufacturing method thereof
CN106935577A (en) * 2011-03-22 2017-07-07 晶元光电股份有限公司 Light emitting diode device
CN102842573A (en) * 2012-09-05 2012-12-26 宁波市鄞州皓升半导体照明有限公司 Alternating current light emitting diode structure
CN102867837A (en) * 2012-09-13 2013-01-09 中国科学院半导体研究所 Manufacture method of array type high-voltage LED device
CN106935698A (en) * 2013-04-18 2017-07-07 亿光电子工业股份有限公司 Light emitting diode device
CN106935698B (en) * 2013-04-18 2019-05-24 亿光电子工业股份有限公司 Light emitting diode device
CN111864019A (en) * 2020-07-10 2020-10-30 武汉大学 A flip-chip light-emitting diode with embedded scattering layer and method of making the same
CN111864019B (en) * 2020-07-10 2021-11-30 武汉大学 Flip light-emitting diode with embedded scattering layer and preparation method thereof

Also Published As

Publication number Publication date
CN101859789B (en) 2015-01-07

Similar Documents

Publication Publication Date Title
US9620682B2 (en) Light emitting device
CN101859789A (en) AC light emitting device with increased light extraction efficiency and method of manufacturing the same
US9153622B2 (en) Series of light emitting regions with an intermediate pad
US8304798B2 (en) Light-emitting diode module and manufacturing method thereof
CN102969426B (en) Luminescent device
JP6720220B2 (en) Optical lens, illumination module, and light unit including the same
JP2014131041A (en) Light emitting element
TWI422006B (en) An alternating current discharge device and a manufacturing method thereof
CN103178181B (en) Electrode Coplanar Light Emitting Diode Element, Encapsulation Structure and Light Reflection Structure
CN103022310B (en) The light-extraction layer of LED luminescence chip and LED matrix
CN103178185B (en) Light emitting device
CN104659176B (en) Semiconductor light emitting element
CN104465919B (en) Light-emitting diode and manufacturing method thereof
CN200986927Y (en) Light-emitting diodes with micro-optical structures
CN105226153A (en) A kind of light-emitting diode with high expansion effect
CN103594594B (en) There is the inverted light-emitting diode (LED) of roughening transparency electrode
CN205355072U (en) Emitting diode filament chip and emitting diode filament
CN102832310B (en) Light emitting diode structure
TWI876862B (en) Micro light-emitting diode device
TWI876834B (en) Micro light-emitting diode device
TWI872935B (en) Micro light-emitting diode device
CN101859757B (en) Stack light-emitting diode chip structure and manufacturing method thereof
CN102832311B (en) Light emitting diode structure
TWI419359B (en) Structure and fabrication method of AC type flip - chip light emitting diode
CN108666400A (en) Semiconductor light emitting module and semiconductor light emitting diode chip thereof

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: JIANGSU CANYANG OPTOELECTRONICS CO., LTD.

Free format text: FORMER OWNER: CANYANG INVESTMENT CO., LTD.

Effective date: 20131024

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: HONG KONG, CHINA TO: 225101 YANGZHOU, JIANGSU PROVINCE

TA01 Transfer of patent application right

Effective date of registration: 20131024

Address after: 225101, No. 9, Zhuanghe branch, Yangzhou Economic Development Zone, Jiangsu

Applicant after: JIANGSU CANYANG OPTOELECTRONICS CO., LTD.

Address before: Room 2701, Jin Zhonghui center, 28 Queen's Road East, Wan Chai, Hongkong, China

Applicant before: Canyang Investment Co., Ltd.

C14 Grant of patent or utility model
GR01 Patent grant