CN101859789A - AC light emitting device with increased light extraction efficiency and method of manufacturing the same - Google Patents
AC light emitting device with increased light extraction efficiency and method of manufacturing the same Download PDFInfo
- Publication number
- CN101859789A CN101859789A CN200910131539A CN200910131539A CN101859789A CN 101859789 A CN101859789 A CN 101859789A CN 200910131539 A CN200910131539 A CN 200910131539A CN 200910131539 A CN200910131539 A CN 200910131539A CN 101859789 A CN101859789 A CN 101859789A
- Authority
- CN
- China
- Prior art keywords
- light emitting
- light
- emitting diode
- type semiconductor
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 238000000605 extraction Methods 0.000 title claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 87
- 238000000926 separation method Methods 0.000 claims abstract description 24
- 239000004020 conductor Substances 0.000 claims abstract description 18
- 239000004065 semiconductor Substances 0.000 claims description 148
- 238000006243 chemical reaction Methods 0.000 claims description 19
- 238000005530 etching Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 239000004038 photonic crystal Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 21
- 238000011161 development Methods 0.000 description 7
- 238000009825 accumulation Methods 0.000 description 6
- 238000000149 argon plasma sintering Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/82—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/23—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
- H01L2224/24—Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
- H01L2224/241—Disposition
- H01L2224/24135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/24137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
Description
技术领域technical field
本发明涉及一种发光装置,特别是涉及一种具有增加光取出效率的交流发光装置;本发明还涉及所述交流发光装置的制造方法。The invention relates to a light emitting device, in particular to an AC light emitting device with increased light extraction efficiency; the invention also relates to a manufacturing method of the AC light emitting device.
背景技术Background technique
随着光电产业的快速发展,作为光源的一的发光二极管(LED Light Emitting Diode)由于具有省电的特点,已大量广泛地应用于各种照明或需光源的领域,且发光二极管于光电领域中占有举足轻重的地位。正因如此,世界各国厂商莫不投入大量资源于相关技术的开发,而于2005的韩国汉城半导体与美国III-N Technology的产品发表会更说明了交流式发光二极管(AC LED)产品的发展趋势,成为全球性发光二极管厂商的开发趋势。With the rapid development of the optoelectronic industry, LED Light Emitting Diode (LED Light Emitting Diode), which is one of the light sources, has been widely used in various lighting or light source fields due to its power-saving characteristics, and the LED Light Emitting Diode is used in the optoelectronic field. occupies an important position. Because of this, manufacturers from all over the world have invested a lot of resources in the development of related technologies, and the 2005 Seoul Semiconductor and American III-N Technology's product launch conference further explained the development trend of AC LED products. Become the development trend of global light-emitting diode manufacturers.
从交流式发光二极管的技术发展至今,主要的技术发展在于改善交流式发光二极管的电性问题。例如:交流式发光二极管无法于交流电正负半周讯号输入时皆可发光(全时发光)的问题,因而发展出一种桥式交流式发光二极管结构,其主要利用惠斯登电桥(Wheatstone Bridge)的整流设计概念,以使发光二极管于交流电正负半周讯号输入时的每一瞬间仅有总数1/2的交流式电发光二极管发光的现象得以改善,而能全时发光。From the technical development of AC LEDs to the present, the main technical development is to improve the electrical problems of AC LEDs. For example: AC light-emitting diodes cannot emit light (full-time light) when the AC positive and negative half-cycle signals are input, so a bridge-type AC light-emitting diode structure has been developed, which mainly uses Wheatstone Bridge (Wheatstone Bridge) ) rectification design concept to improve the phenomenon that only 1/2 of the total number of AC light-emitting diodes emit light at each moment when the AC positive and negative half-cycle signals are input, and can emit light all the time.
然而,现今交流式发光二极管结构中针对光学特性仍有其发展性,例如:全反射问题的改善。由于交流式发光二极管的发光层产生光线后,大部分光线是在交流式发光二极管结构中传递,而交流式发光二极管结构中的光线需经折射的方式才能传递至交流式发光二极管结构外;但光线折射的角度有限,当光线的入射角度超过能折射的角度范围时,光线会发生全反射,因而造成部分光线仍然在交流式发光二极管结构中,却无法传递出交流式发光二极管结构外;如此交流式发光二极管无法发挥原有的发光效能。However, there is still room for development in terms of optical characteristics in the current AC LED structure, such as the improvement of the total reflection problem. After the light-emitting layer of the AC LED generates light, most of the light is transmitted in the AC LED structure, and the light in the AC LED structure needs to be refracted to be transmitted outside the AC LED structure; but The angle of light refraction is limited. When the incident angle of light exceeds the refraction angle range, the light will be totally reflected, so that part of the light is still in the AC LED structure, but cannot be transmitted out of the AC LED structure; so AC light emitting diodes cannot exert their original luminous efficacy.
此外,交流式发光二极管的发光层照射至基板的光线中,部分光线为直线前进,因而导致部分光线仅能被基板吸收或基板与发光层之间来回反射,光线却无法往交流式发光二极管的侧面传播。如此基板所吸收的光能将转为热能发散,所以造成交流式发光二极管的发光效能降低并造成过热。In addition, when the light-emitting layer of the AC LED irradiates the substrate, part of the light travels in a straight line. As a result, part of the light can only be absorbed by the substrate or reflected back and forth between the substrate and the light-emitting layer, but the light cannot reach the back and forth of the AC LED. Side spread. In this way, the light energy absorbed by the substrate will be transformed into heat energy and dissipated, so that the luminous efficiency of the AC LED is reduced and overheating is caused.
综合上述,交流式发光二极管的主要设计为光源的使用,如何提高其发光效率为一主要课题,而交流式发光二极管使用于人类的家庭较为广泛,故解决上述的问题实为一最大的课题。To sum up the above, the main design of AC LEDs is the use of light sources, how to improve the luminous efficiency is a major issue, and AC LEDs are widely used in human families, so solving the above problems is actually the biggest issue.
发明内容Contents of the invention
本发明要解决的技术问题是提供一种具有增加光取出效率的交流发光装置,能够有效增加光取出效率;为此,本发明还要提供一种所述交流发光装置的制造方法。The technical problem to be solved by the present invention is to provide an AC light-emitting device with increased light extraction efficiency, which can effectively increase the light extraction efficiency; therefore, the present invention also provides a manufacturing method of the AC light-emitting device.
为解决上述技术问题,本发明的具有增加光取出效率的交流发光装置所采用的技术方案之一是,包括:In order to solve the above technical problems, one of the technical solutions adopted by the AC light-emitting device with increased light extraction efficiency of the present invention includes:
一基板,其具有复数凹槽;A substrate having a plurality of grooves;
一第一发光二极管,设置于所述复数凹槽上;a first light emitting diode, arranged on the plurality of grooves;
一第二发光二极管,设置于所述复数凹槽上;以及a second light emitting diode disposed on the plurality of grooves; and
一导体,其耦接所述第一发光二极管与所述第二发光二极管,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间,所述第一发光二极管与所述第二发光二极管可依一交流电发光。A conductor, which is coupled to the first light emitting diode and the second light emitting diode, there is a separation space between the first light emitting diode and the second light emitting diode, the first light emitting diode and the second light emitting diode The two light emitting diodes can emit light according to an alternating current.
上述交流发光装置的制造方法是:The manufacture method of above-mentioned AC light emitting device is:
提供一基板并蚀刻复数凹槽于所述基板上;providing a substrate and etching a plurality of grooves on the substrate;
分别形成一第一发光二极管与一第二发光二极管于所述复数凹槽上,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间;以及forming a first light emitting diode and a second light emitting diode on the plurality of grooves respectively, with a separation space between the first light emitting diode and the second light emitting diode; and
设置一导体于所述分隔空间上并连接所述第一发光二极管与所述第二发光二极管。A conductor is arranged on the separation space and connected to the first light-emitting diode and the second light-emitting diode.
本发明的具有增加光取出效率的交流发光装置所采用的技术方案之二是,包括:The second technical solution adopted by the AC light-emitting device with increased light extraction efficiency of the present invention is to include:
一承接基板,具有复数凹槽、一第一导电层、一第二导电层与一第三导电层;A receiving substrate having a plurality of grooves, a first conductive layer, a second conductive layer and a third conductive layer;
一第一发光二极管,设置于所述复数凹槽上,所述第一发光二极管包含一第一电极与一第二电极,所述第二电极通过一第一凸块连接所述第一导电层,所述第一电极通过一第二凸块连接所述第二导电层;以及A first light-emitting diode, disposed on the plurality of grooves, the first light-emitting diode includes a first electrode and a second electrode, and the second electrode is connected to the first conductive layer through a first bump , the first electrode is connected to the second conductive layer through a second bump; and
一第二发光二极管,设置于所述复数凹槽上,所述第二发光二极管包含一第三电极与一第四电极,所述第三电极通过一第三凸块连接所述第三导电层,所述第四电极通过一第二凸块连接所述第二导电层,所述第一发光二极管与所述第二发光二极管之间具有一分隔空间,所述第一发光二极管与所述第二发光二极管通过所述第一导电层、所述第二导电层与所述第三导电层依一交流电发光。A second light emitting diode is arranged on the plurality of grooves, the second light emitting diode includes a third electrode and a fourth electrode, and the third electrode is connected to the third conductive layer through a third bump , the fourth electrode is connected to the second conductive layer through a second bump, there is a separation space between the first light emitting diode and the second light emitting diode, and the first light emitting diode and the first light emitting diode The two light emitting diodes emit light according to an alternating current through the first conductive layer, the second conductive layer and the third conductive layer.
上述交流发光装置的制造方法是:The manufacture method of above-mentioned AC light emitting device is:
提供一承接基板并蚀刻复数凹槽于所述承接基板上,且所述承接基板上具有一第一导电层、一第二导电层与一第三导电层;providing a receiving substrate and etching a plurality of grooves on the receiving substrate, and the receiving substrate has a first conductive layer, a second conductive layer and a third conductive layer;
提供一共享基板,对应所述复数凹槽分别形成一第一发光二极管与一第二发光二极管于所述共享基板上,所述第一发光二极管与所述第二发光二极管之间具一分隔空间;以及A shared substrate is provided, a first light emitting diode and a second light emitting diode are respectively formed on the shared substrate corresponding to the plurality of grooves, and there is a separation space between the first light emitting diode and the second light emitting diode ;as well as
翻转所述共享基板,以一第一凸块使所述第一发光二极管连接所述第一导电层,以一第二凸块使所述第一发光二极管与所述第二发光二极管连接所述第二导电层,以一第三凸块使所述第二发光二极管连接所述第三导电层;以及Flipping the shared substrate, using a first bump to connect the first light emitting diode to the first conductive layer, using a second bump to connect the first light emitting diode and the second light emitting diode to the a second conductive layer, using a third bump to connect the second light emitting diode to the third conductive layer; and
自所述第一发光二极管与所述第二发光二极管分离所述共享基板。The shared substrate is separated from the first LED and the second LED.
由于采用本发明的交流发光装置及其制造方法,可以籍由基板所具有的复数凹槽将光线反射至侧面,以解决发光层照射至基板的光线无法完全往发光二极管的侧面传播,降低其发光效率的问题,提高第一发光二极管与第二发光二极管的光取出效率,因而提高交流发光装置的发光效能。Due to the adoption of the AC light-emitting device and its manufacturing method of the present invention, light can be reflected to the side by virtue of the plurality of grooves in the substrate, so as to solve the problem that the light emitted by the light-emitting layer to the substrate cannot completely propagate to the side of the light-emitting diode, reducing its luminescence. To solve the problem of efficiency, the light extraction efficiency of the first light-emitting diode and the second light-emitting diode is improved, thereby improving the luminous efficiency of the AC light-emitting device.
另外,采用本发明的交流发光装置及其制造方法,还可以籍由散射结构,使交流发光装置增加光取出效率的基础上增加电极的接触面积。In addition, by using the AC light emitting device and its manufacturing method of the present invention, the scattering structure can also be used to increase the contact area of the electrodes on the basis of increasing the light extraction efficiency of the AC light emitting device.
附图说明Description of drawings
下面结合附图与具体实施方式对本发明作进一步详细的说明Below in conjunction with accompanying drawing and specific embodiment, the present invention will be described in further detail
图1是本发明的实施例一结构示意图;Fig. 1 is a schematic structural view of Embodiment 1 of the present invention;
图2是本发明的实施例二结构示意图;Fig. 2 is a schematic structural diagram of Embodiment 2 of the present invention;
图3是本发明的实施例三结构示意图;Fig. 3 is a schematic structural view of Embodiment 3 of the present invention;
图4A是本发明的实施例四结构示意图;Fig. 4A is a schematic structural diagram of Embodiment 4 of the present invention;
图4B是本发明的实施例五结构示意图;Fig. 4B is a schematic structural diagram of Embodiment 5 of the present invention;
图5A至5D是本发明的交流发光装置的实施例电路图。5A to 5D are circuit diagrams of embodiments of the AC light emitting device of the present invention.
图6A至6D是本发明中半导体磊晶层一实施例的结构示意图;6A to 6D are schematic structural views of an embodiment of a semiconductor epitaxial layer in the present invention;
图7A至7D是本发明中半导体磊晶层另一实施例的结构示意图;7A to 7D are schematic structural views of another embodiment of the semiconductor epitaxial layer in the present invention;
图8A至8C是图1所示实施例的制造流程示意图;8A to 8C are schematic diagrams of the manufacturing process of the embodiment shown in FIG. 1;
图9A至9D是图2所示实施例的制造流程示意图;9A to 9D are schematic diagrams of the manufacturing process of the embodiment shown in FIG. 2;
图10是本发明的实施例五结构示意图;Fig. 10 is a schematic structural diagram of Embodiment 5 of the present invention;
图11是本发明的实施例六结构示意图;Fig. 11 is a schematic structural diagram of Embodiment 6 of the present invention;
图12是本发明的实施例七结构示意图;Fig. 12 is a schematic structural diagram of Embodiment 7 of the present invention;
图13是本发明的实施例八结构示意图;Fig. 13 is a schematic structural diagram of Embodiment 8 of the present invention;
图14是本发明的实施例九结构示意图;Fig. 14 is a schematic structural diagram of Embodiment 9 of the present invention;
图15是本发明的实施例十结构示意图;Fig. 15 is a schematic structural diagram of
图16A、16B是本发明的实施例十一结构示意图;16A and 16B are structural schematic diagrams of Embodiment 11 of the present invention;
图17A至17D是本发明的交流发光装置的另一实施例电路图;17A to 17D are circuit diagrams of another embodiment of the AC light emitting device of the present invention;
图18A至18D是本发明中半导体磊晶层的再一实施例结构示意图;18A to 18D are structural schematic diagrams of yet another embodiment of the semiconductor epitaxial layer in the present invention;
图19A至19D是本发明中半导体磊晶层另一较佳实施例结构示意图;19A to 19D are structural schematic diagrams of another preferred embodiment of the semiconductor epitaxial layer in the present invention;
图20A至20E是图10所示实施例的制造流程示意图;20A to 20E are schematic diagrams of the manufacturing process of the embodiment shown in FIG. 10;
图21A至21E是图11所示实施例的制造流程示意图。21A to 21E are schematic diagrams of the manufacturing process of the embodiment shown in FIG. 11 .
图中符号说明:Explanation of symbols in the figure:
10为交流发光装置; 12为基板; 122为凹槽;10 is an AC light emitting device; 12 is a substrate; 122 is a groove;
124为分隔空间; 130为第一导电层; 132为第二导电层;124 is the separation space; 130 is the first conductive layer; 132 is the second conductive layer;
134为第三导电层; 14为第一发光二极管; 142为外延堆栈层;134 is the third conductive layer; 14 is the first light-emitting diode; 142 is the epitaxial stack layer;
144为N型半导体层; 146为发光层; 148为P型半导体层;144 is an N-type semiconductor layer; 146 is a light-emitting layer; 148 is a P-type semiconductor layer;
150为第一电极; 152为第二电极; 154为散射结构;150 is the first electrode; 152 is the second electrode; 154 is the scattering structure;
16为第二发光二极管; 162为外延堆栈层; 164为N型半导体层;16 is the second light emitting diode; 162 is the epitaxial stack layer; 164 is the N-type semiconductor layer;
166为发光层; 168为P型半导体层; 170为第一电极;166 is the light emitting layer; 168 is the P-type semiconductor layer; 170 is the first electrode;
172为第二电极; 174为散射结构; 18为导体;172 is a second electrode; 174 is a scattering structure; 18 is a conductor;
20为绝缘层; 22为能量转换层; 222为散射结构;20 is an insulating layer; 22 is an energy conversion layer; 222 is a scattering structure;
30为桥式整流电路; 40为半导体磊晶层; 42为外延堆栈层;30 is a bridge rectifier circuit; 40 is a semiconductor epitaxy layer; 42 is an epitaxial stack layer;
422为第二电极; 44为N型半导体层; 442为第一电极;422 is the second electrode; 44 is the N-type semiconductor layer; 442 is the first electrode;
46为发光层; 48为P型半导体层; 482为第二电极;46 is a light-emitting layer; 48 is a P-type semiconductor layer; 482 is a second electrode;
50为覆晶式交流发光装置; 510为第一凸块;50 is a flip-chip AC light emitting device; 510 is the first bump;
512为第二凸块; 514为第三凸块; 52为承接基板;512 is the second bump; 514 is the third bump; 52 is the receiving substrate;
522为凹槽; 54为第一发光二极管; 524为介电层;522 is a groove; 54 is a first light emitting diode; 524 is a dielectric layer;
540为散射结构; 542为外延堆栈层; 544为N型半导体层;540 is a scattering structure; 542 is an epitaxial stack layer; 544 is an N-type semiconductor layer;
546为发光层; 548为P型半导体层; 550为第一电极;546 is a light-emitting layer; 548 is a P-type semiconductor layer; 550 is a first electrode;
552为第二电极; 554为透明基板; 556为散射结构;552 is the second electrode; 554 is the transparent substrate; 556 is the scattering structure;
56为第二发光二极管; 560为散射结构;56 is the second light emitting diode; 560 is the scattering structure;
562为外延堆栈层; 564为N型半导体层; 566为发光层;562 is an epitaxial stack layer; 564 is an N-type semiconductor layer; 566 is a light emitting layer;
568为P型半导体层; 570为第一电极; 572为第二电极;568 is a P-type semiconductor layer; 570 is a first electrode; 572 is a second electrode;
574为透明基板; 576为散射结构; 58为分隔空间;574 is a transparent substrate; 576 is a scattering structure; 58 is a separation space;
60为散射结构; 62为能量转换层; 64为能量转换层;60 is a scattering structure; 62 is an energy conversion layer; 64 is an energy conversion layer;
642为散射结构; 96为共享基板。642 is a scattering structure; 96 is a shared substrate.
具体实施方式Detailed ways
实施例一。如图1所示,本发明的交流发光装置10,包含有一基板12、一第一发光二极管14与一第二发光二极管16。所述基板12具有复数凹槽122,所述复数凹槽122可包含复数光子晶体结构,所述复数凹槽122具有相同间隔距离或不同间隔距离,使发光二极管内的光传播路径产生变化,以提高发光效率。所述第一发光二极管14与所述第二发光二极管16设置于复数凹槽122上,且所述第一发光二极管14与所述第二发光二极管16之间通过一导体18电性相接。所述第一发光二极管14与所述第二发光二极管16为相隔设,所以第一发光二极管14与第二发光二极管16之间具有一分隔空间124,因此导体18为一导线。其中,所述第一发光二极管14的第一电极150经导体18连接所述第二发光二极管16的第二电极172,使所述第一发光二极管14与所述第二发光二极管16可依所述交流电发光。Embodiment one. As shown in FIG. 1 , the AC
再者,所述第一发光二极管14与所述第二发光二极管16包含一磊晶堆积层142、162、一N型半导体层144、164与一发光层146、166以及一P型半导体148、168。磊晶堆积层142、162设置于所述复数凹槽122上,所述第一发光二极管14与所述第二发光二极管16从下而上依序为磊晶堆积层142、162、N型半导体层144、164、发光层146、166与P型半导体148、168,且N型半导体层144、164之上设置一第一电极150、170,P型半导体层148、168之上设置一第二电极152、172。其中,部分磊晶堆积层142、162会位于所述复数凹槽122内,且所述磊晶堆积层142、162的掺杂浓度比所述N型半导体层144、164的掺杂浓度低。Furthermore, the
本发明藉由基板12的复数凹槽122避免发光层146、166照射至基板12的光线直接被基板12所吸收,并可让光线经基板12反射后往所述第一发光二极管14与所述第二发光二极管16的侧面传播,以提高所述第一发光二极管14与所述第二发光二极管16的光取出效率。In the present invention, the plurality of
实施例二。如图2所示,该实施例与图1所示的实施例不同之处在于,本实施例进一步包含一绝缘层20,设于所述基板12之上,且设置于所述第一发光二极管14与所述第二发光二极管16之间的分隔空间124内,以进一步绝缘所述第一发光二极管14与所述第二发光二极管16之间的电性,而避免所述第一发光二极管14与所述第二发光二极管16之间发生短路或漏电情况。因此导体18设置于绝缘层20上,此时导体18为一导电层。Embodiment two. As shown in FIG. 2 , the difference between this embodiment and the embodiment shown in FIG. 1 is that this embodiment further includes an insulating
实施例三。如图3所示,该实施例与图2所示的实施例不同之处在于,本实施例于所述第一发光二极管14与所述第二发光二极管16之上设置一散射结构154、174,且散射结构154、174位于P型半导体层148、168之上,以提高光散射效果及电极的接触面积,进而提高发光效能。实施例四。如图4A所示,本发明的此一实施例与图2的实施例不同之处在于第一发光二极管14与第二发光二极管16的P型半导体层148、168上设置一能量转换层22,且能量转换层22覆盖第一发光二极管14与第二发光二极管16。藉由能量转换层22提高交流发光装置10的照度。此外,如图4B所示,能量转换层22上更可设置散射结构222,以提高覆晶式交流发光装置10的光散射效果,进而提高发光效能。Embodiment three. As shown in FIG. 3 , the difference between this embodiment and the embodiment shown in FIG. 2 is that a scattering structure 154 , 174 is arranged on the
参见图5A至图5D,其为本发明的交流发光装置10的实施例的电路图。如图5A所示,本发明的此一实施例是交流发光装置10包含一桥式整流电路30,其耦接所述第一发光二极管14与所述第二发光二极管16。所述桥式整流电路30包含复数半导体磊晶层40(如图6A至图6C所示或如图7A至图7C所示)。如图5B所示,所述交流发光装置10至少包含一个以上的并联电路,所述并联电路亦即并联图5A所示的桥式整流电路30以及其所耦接的所述第一发光二极管14与所述第二发光二极管16。如图5C所示,所述交流发光装置10至少包含一个以上的串联电路,所述串联电路亦即串联图5A所示的桥式整流电路30以及其所耦接的所述第一发光二极管14与所述第二发光二极管16。如图5D所示,所述交流发光装置10至少包含一个以上的串并联电路,所述串并联电路亦即串并联图5A所示的桥式整流电路30以及其所耦接的所述第一发光二极管14与所述第二发光二极管16。Referring to FIG. 5A to FIG. 5D , they are circuit diagrams of an embodiment of the AC
图6A至图6C,为本发明的半导体磊晶层的一实施例的结构示意图。如图6A所示,若所述复数半导体磊晶层40为复数第三发光二极管,则分别由下而上包含一磊晶堆积层42、一N型半导体层44与一发光层46以及一P型半导体48;其中N型半导体层44上设置一第一电极442,P型半导体层48上设置一第二电极482。如图6B所示,若所述复数半导体磊晶层40为复数二极管,则分别由下而上包含一磊晶堆积层42、一N型半导体层44与一P型半导体48;其中N型半导体层44上设置一第一电极442,P型半导体层48上设置一第二电极482。如图6C所示,若所述复数半导体磊晶层40为复数二极管,则分别由下而上包含一磊晶堆积层42以及一N型半导体层44;其中磊晶堆积层42上设置一第二电极422,N型半导体层44上设置一第一电极442。此外,本发明更可设置一能量转换层62于P型半导体层48上,如图6D所示。6A to 6C are schematic structural views of an embodiment of the semiconductor epitaxial layer of the present invention. As shown in FIG. 6A, if the plurality of semiconductor epitaxial layers 40 are a plurality of third light-emitting diodes, they respectively include an epitaxial stacked
图7A至图7C,为本发明的半导体磊晶层的另一实施例的结构示意图。如图7A所示,本发明的此一实施例与图6A的实施例不同之处在于,所述复数第三发光二极管之上设置一散射结构60,且散射结构60位于P型半导体层48或N型半导体层44之上,以提高光散射效果及电极的接触面积,进而提高发光效能。如图7B所示,本发明的此一实施例与图6B的实施例不同之处在于,所述复数二极管之上设置一散射结构60,且散射结构60位于P型半导体层48或N型半导体层44之上。如图7C所示,本发明的此一实施例与图6C的实施例不同之处在于,所述复数二极管之上设置一散射结构60,且散射结构60位于N型半导体层44或磊晶堆积层42之上。此外,本发明更可设置一能量转换层62于P型半导体层48上,如图7D所示。7A to 7C are schematic structural views of another embodiment of the semiconductor epitaxial layer of the present invention. As shown in FIG. 7A, the difference between this embodiment of the present invention and the embodiment of FIG. 6A is that a
参见图8A至图8C,其为本发明的一较佳实施例的制造流程图;如图所示,并同时参见图1。本发明的交流发光装置的制造方法步骤包含提供一基板12,并蚀刻复数凹槽122;分别形成一第一发光二极管14与一第二发光二极管16于所述复数凹槽122上;设置一导体18于第一发光二极管14与第二发光二极管16之间,并让导体18耦接第一发光二极管14与第二发光二极管16。Referring to FIG. 8A to FIG. 8C , it is a manufacturing flowchart of a preferred embodiment of the present invention; as shown in the figures, and also refer to FIG. 1 . The steps of the manufacturing method of the AC light emitting device of the present invention include providing a
参见图9A至图9D,其为本发明的另一较佳实施例的制造流程图;如图所示,并同时参见图2。本发明的此一实施例与图7A至图7C的实施例不同之处在于,设置一导体18于第一发光二极管14与第二发光二极管16之间,并让所述导体18耦接第一发光二极管14与第二发光二极管16的步骤前,进一步包含一步骤,其为形成一绝缘层20于第一发光二极管14与第二发光二极管16之间,且绝缘层20位于第一发光二极管14与第二发光二极管16之间的分隔空间124内。Refer to FIG. 9A to FIG. 9D , which are the manufacturing flow diagrams of another preferred embodiment of the present invention; as shown in the figures, and refer to FIG. 2 at the same time. This embodiment of the present invention differs from the embodiment shown in FIGS. 7A to 7C in that a
实施例五。如图10所示,具有增加光取出效率的覆晶式交流发光装置50,包含有一承接基板52、一第一发光二极管54与一第二发光二极管56。所述承接基板52具有复数凹槽522以及一第一导电层130、一第二导电层132与一第三导电层134。所述复数凹槽522更可包含复数光子晶体结构,所述复数凹槽522并进一步具有相同间隔距离或不同间隔距离,使发光二极管内的光传播路径产生变化,以提高发光效率;且第一导电层130、第二导电层132与第三导电层134为分隔设置。所述第一发光二极管54与所述第二发光二极管56设置于复数凹槽522上;所述第一发光二极管54与所述第二发光二极管56包含一第一电极550、第三电极570与一第二电极552、第四电极572。所述第一发光二极管54的第二电极552通过一第一凸块510连接所述第一导电层130。所述第一发光二极管54的第一电极550与所述第二发光二极管56的第四电极572,通过一第二凸块512连接所述第二导电层132,并通过所述第二凸块512电性连接所述第一发光二极管54与所述第二发光二极管56。所述第三电极570通过一第三凸块514连接所述第三导电层134。由于所述第一发光二极管54与所述第二发光二极管56为相隔设置,所以第一发光二极管54与所述第二发光二极管56之间具有一分隔空间58,以分隔所述第一发光二极管54与所述第二发光二极管56之间的电性,避免所述第一发光二极管54与所述第二发光二极管56之间发生短路或漏电情况。其中,所述第一发光二极管54与所述第二发光二极管56经第一导电层130、一第二导电层132与一第三导电层134电性相接并耦接一交流电源(图中未示),使所述第一发光二极管54与所述第二发光二极管56可依所述交流电发光。Embodiment five. As shown in FIG. 10 , the flip-chip AC
再者,所述第一发光二极管54与所述第二发光二极管56包含一磊晶堆积层542、562、一N型半导体层544、564与一发光层546、566以及一P型半导体548、568。所述第一发光二极管54与所述第二发光二极管56从上而下依序为磊晶堆积层542、562、N型半导体层544、564、发光层546、566与P型半导体548、568;且第一电极550、570连接N型半导体层544、564,第二电极552、572连接P型半导体548、568;且所述磊晶堆积层542、562的掺杂浓度比所述N型半导体层544、564的掺杂浓度低。Furthermore, the
本发明藉由承接基板52的复数凹槽522避免发光层546、566照射至承接基板52的光线直接被承接基板52所吸收,并可让光线经承接基板52反射后往所述第一发光二极管54与所述第二发光二极管56的侧面传播,以提高所述第一发光二极管54与所述第二发光二极管56的光取出效率。In the present invention, the plurality of
实施例六。如图11所示,本发明的此一实施例与图10的实施例不同之处在于,进一步包含一绝缘层20,其设置于所述第一发光二极管54与所述第二发光二极管56之间的分隔空间58内,以进一步绝缘所述第一发光二极管54与所述第二发光二极管56之间的电性,而避免所述第一发光二极管54与所述第二发光二极管56之间发生短路或漏电情况。Embodiment six. As shown in FIG. 11 , this embodiment of the present invention differs from the embodiment of FIG. 10 in that it further includes an insulating
实施例七。如图12所示,本发明的此一实施例与图11的实施例不同之处在于,进一步包含一散射结构540、560,其位于所述第一发光二极管54的P型半导体548与第二发光二极管56的P型半导体568上,以提高所述第一发光二极管54与所述第二发光二极管56的光取出效率。Embodiment seven. As shown in FIG. 12, the difference between this embodiment of the present invention and the embodiment of FIG. 11 is that it further includes a
实施例八。如图13所示,本发明的此一实施例与12的实施例不同之处在于,所述第一发光二极管54与所述第二发光二极管56之上设置一透明基板554、574,且透明基板554、574位于磊晶堆积层542、562之上。其中透明基板554、574设置一散射结构556、576,以提高覆晶式交流发光装置50的光散射效果,进而提高发光效能。Embodiment eight. As shown in Figure 13, the difference between this embodiment of the present invention and the embodiment of 12 is that a
实施例九。如图14所示,本发明的此一实施例与图13的实施例不同之处在于,承接基板52之上设置一介电层524,以进一步绝缘所述第一发光二极管54与所述第二发光二极管56之间的电性,而避免所述第一发光二极管54与所述第二发光二极管56之间发生短路或漏电情况。Embodiment nine. As shown in FIG. 14 , the difference between this embodiment of the present invention and the embodiment of FIG. 13 is that a
实施例十。如图15所示,本发明的此一实施例与图14的实施例不同之处在于承接基板52之上设置一反射层526,并位于所述承接基板52与第一发光二极管54及所述第二发光二极管56之间;以避免发光层546、566照射至承接基板52的光线直接被承接基板52所吸收,并可让光线经承接基板52反射后往所述第一发光二极管54与所述第二发光二极管56的正面及侧面传播,以提高所述第一发光二极管54与所述第二发光二极管56的光取出效率。Embodiment ten. As shown in FIG. 15, the difference between this embodiment of the present invention and the embodiment of FIG. 14 is that a
实施例十一。如图16A所示,本发明的此一实施例与图15的实施例不同之处在于,第一发光二极管54与第二发光二极管56的透明基板554、574上设置一能量转换层64,且能量转换层64覆盖第一发光二极管54与第二发光二极管56,藉由能量转换层64提高覆晶式交流发光装置50的照度。此外,如图16B所示,能量转换层64上可设置散射结构642,以提高覆晶式交流发光装置50的光散射效果,进而提高发光效能。此外,如图17A所示,覆晶式交流发光装置50更包含一桥式整流电路30,其耦接所述第一发光二极管54与所述第二发光二极管56,所述桥式整流电路30包含复数半导体磊晶层40。如图17B所示,所述覆晶式交流发光装置50至少包含一个以上的并联电路,所述并联电路亦即并联图17A所示的桥式整流电路30以及其所耦接的所述第一发光二极管54与所述第二发光二极管56。如图17C所示,所述覆晶式交流发光装置50至少包含一个以上的串联电路,所述串联电路亦即串联图17A所示的桥式整流电路30以及其所耦接的所述第一发光二极管54与所述第二发光二极管56。如图17D所示,所述覆晶式交流发光装置50至少包含一个以上的串并联电路,所述串并联电路亦即串并联图17A所示的桥式整流电路30以及其所耦接的所述第一发光二极管54与所述第二发光二极管56。Embodiment eleven. As shown in FIG. 16A , the difference between this embodiment of the present invention and the embodiment of FIG. 15 lies in that an
参见图18A,当所述复数半导体磊晶层40为复数第三发光二极管时,每一所述半导体磊晶层40设置于承接基板52的复数凹槽522上,且每一所述半导体磊晶层40分别由下而上包含一磊晶堆积层42、一N型半导体层44与一发光层46以及一P型半导体48。其中N型半导体层44上设置一第一电极442,P型半导体层48上设置一第二电极482。如图18B所示,当所述复数半导体磊晶层40为复数二极管时,每一所述半导体磊晶层40设置于承接基板52的复数凹槽522上,且每一所述半导体磊晶层40分别由下而上包含一磊晶堆积层42、一N型半导体层44与一P型半导体48。其中N型半导体层44上设置一第一电极442,P型半导体层48上设置一第二电极482。如图18C所示,当所述复数半导体磊晶层40为复数二极管时,每一所述半导体磊晶层40设置于承接基板52的复数凹槽522上,且每一所述半导体磊晶层40分别由下而上包含一磊晶堆积层42以及一N型半导体层44。其中磊晶堆积层42上设置一第二电极422,N型半导体层44上设置一第一电极442。此外,本发明更可设置一能量转换层62于所述半导体磊晶层40上,如图18D所示。Referring to FIG. 18A, when the plurality of semiconductor epitaxial layers 40 are a plurality of third light emitting diodes, each of the semiconductor epitaxial layers 40 is disposed on the plurality of
如图19A所示,本发明的此一实施例与图18A的实施例不同之处在于,设置一散射结构60于P型半导体层48或N型半导体层44之上,以提高光散射效果及电极的接触面积,进而提高发光效能。如图19B所示,本发明的此一实施例与图18B的实施例不同之处在于,设置一散射结构60于P型半导体层48或N型半导体层44之上。如图19C所示,本发明的此一实施例与图18C的实施例不同之处在于,设置一散射结构60于N型半导体层44或磊晶堆积层42之上。此外,本发明更可设置一能量转换层62于所述半导体磊晶层40上,如图19D所示。As shown in FIG. 19A, the difference between this embodiment of the present invention and the embodiment of FIG. 18A is that a
参见图20A至20E,其为本发明的再一较佳实施例的制造流程图,并请同时参见图10。本发明的覆晶式交流发光装置的制造方法,包含提供一承接基板52,并蚀刻复数凹槽522;形成一第一导电层130、一第二导电层132与一第三导电层134于承接基板52上;提供一共享基板96,并对应所述复数凹槽522磊晶形成一第一发光二极管54与一第二发光二极管56于所述共享基板96之上;翻转所述共享基板96以一第一凸块510使所述第一发光二极管54与所述第一导电层130电性相接,以一第二凸块512使所述第一发光二极管54与所述第二发光二极管56相接第二导电层132,以一第三凸块514使所述第二发光二极管56与所述第三导电层134相接;以及自所述共享基板96分离所述第一发光二极管54与所述第二发光二极管56。Refer to FIGS. 20A to 20E , which are the manufacturing flow diagrams of yet another preferred embodiment of the present invention, and please refer to FIG. 10 at the same time. The manufacturing method of the flip-chip AC light-emitting device of the present invention includes providing a receiving
再参见图21A至21E,其也为本发明的另一较佳实施例的制造流程图;并请同时参阅图11。本实施例与图20A至图20E的实施例不同之处在于,对应所述复数凹槽522磊晶形成一第一发光二极管54与一第二发光二极管56于所述共享基板96之上的同一步骤中,进一步包含形成一绝缘层20于第一发光二极管54与第二发光二极管56之间,且绝缘层20位于第一发光二极管54与第二发光二极管56之间的分隔空间58内。Referring again to FIGS. 21A to 21E , which are also manufacturing flow charts of another preferred embodiment of the present invention; please also refer to FIG. 11 . The difference between this embodiment and the embodiment shown in FIG. 20A to FIG. 20E is that a first
以上通过实施例,对本发明进行了详细的说明,但这些并非构成对本发明的限制。在不脱离本发明原理的情况下,本领域的技术人员还可做出许多变形和改进,这些也应视为本发明的保护范围。The present invention has been described in detail through the above examples, but these are not intended to limit the present invention. Without departing from the principle of the present invention, those skilled in the art can also make many modifications and improvements, which should also be regarded as the protection scope of the present invention.
Claims (60)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200910131539.XA CN101859789B (en) | 2009-04-07 | 2009-04-07 | Alternating current light-emitting device with effect of increasing light extraction efficiency and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200910131539.XA CN101859789B (en) | 2009-04-07 | 2009-04-07 | Alternating current light-emitting device with effect of increasing light extraction efficiency and manufacturing method thereof |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310531580.2A Division CN103560195A (en) | 2009-04-07 | 2009-04-07 | Alternating-current light-emitting device capable of increasing light extraction efficiency and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101859789A true CN101859789A (en) | 2010-10-13 |
CN101859789B CN101859789B (en) | 2015-01-07 |
Family
ID=42945558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200910131539.XA Active CN101859789B (en) | 2009-04-07 | 2009-04-07 | Alternating current light-emitting device with effect of increasing light extraction efficiency and manufacturing method thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN101859789B (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102468293A (en) * | 2010-11-09 | 2012-05-23 | 柏友照明科技股份有限公司 | Polycrystal packaging structure directly electrically connected with alternating current power supply |
CN102544048A (en) * | 2010-12-27 | 2012-07-04 | 同方光电科技有限公司 | High-power GaN-base light-emitting diode and manufacturing method thereof |
CN102593299A (en) * | 2011-01-17 | 2012-07-18 | 隆达电子股份有限公司 | Solid-state light-emitting element with mesh channel and manufacturing method thereof |
CN102842573A (en) * | 2012-09-05 | 2012-12-26 | 宁波市鄞州皓升半导体照明有限公司 | Alternating current light emitting diode structure |
CN102867837A (en) * | 2012-09-13 | 2013-01-09 | 中国科学院半导体研究所 | Manufacture method of array type high-voltage LED device |
CN106935577A (en) * | 2011-03-22 | 2017-07-07 | 晶元光电股份有限公司 | Light emitting diode device |
CN106935698A (en) * | 2013-04-18 | 2017-07-07 | 亿光电子工业股份有限公司 | Light emitting diode device |
CN111864019A (en) * | 2020-07-10 | 2020-10-30 | 武汉大学 | A flip-chip light-emitting diode with embedded scattering layer and method of making the same |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6753552B1 (en) * | 2003-08-02 | 2004-06-22 | Formosa Epitaxy Incorporation | Growth-selective structure of light-emitting diode |
JP2005072089A (en) * | 2003-08-20 | 2005-03-17 | ▲さん▼圓光電股▲ふん▼有限公司 | Light emitting diode device and its manufacturing method |
CN1767223A (en) * | 2004-10-28 | 2006-05-03 | 国联光电科技股份有限公司 | Semiconductor light-emitting component and its manufacturing method |
US20060273333A1 (en) * | 2005-06-03 | 2006-12-07 | Liang-Wen Wu | Light emitting diode and method of fabricating thereof |
US20070246711A1 (en) * | 2006-04-24 | 2007-10-25 | Cheng-Kuo Huang | Multi-directional light scattering LED and manufacturing method thereof |
CN101203966A (en) * | 2005-06-22 | 2008-06-18 | 首尔Opto仪器股份有限公司 | Light emitting device and manufacturing method thereof |
-
2009
- 2009-04-07 CN CN200910131539.XA patent/CN101859789B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6753552B1 (en) * | 2003-08-02 | 2004-06-22 | Formosa Epitaxy Incorporation | Growth-selective structure of light-emitting diode |
JP2005072089A (en) * | 2003-08-20 | 2005-03-17 | ▲さん▼圓光電股▲ふん▼有限公司 | Light emitting diode device and its manufacturing method |
CN1767223A (en) * | 2004-10-28 | 2006-05-03 | 国联光电科技股份有限公司 | Semiconductor light-emitting component and its manufacturing method |
US20060273333A1 (en) * | 2005-06-03 | 2006-12-07 | Liang-Wen Wu | Light emitting diode and method of fabricating thereof |
CN101203966A (en) * | 2005-06-22 | 2008-06-18 | 首尔Opto仪器股份有限公司 | Light emitting device and manufacturing method thereof |
US20070246711A1 (en) * | 2006-04-24 | 2007-10-25 | Cheng-Kuo Huang | Multi-directional light scattering LED and manufacturing method thereof |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102468293A (en) * | 2010-11-09 | 2012-05-23 | 柏友照明科技股份有限公司 | Polycrystal packaging structure directly electrically connected with alternating current power supply |
CN102544048A (en) * | 2010-12-27 | 2012-07-04 | 同方光电科技有限公司 | High-power GaN-base light-emitting diode and manufacturing method thereof |
CN102593299A (en) * | 2011-01-17 | 2012-07-18 | 隆达电子股份有限公司 | Solid-state light-emitting element with mesh channel and manufacturing method thereof |
CN102593299B (en) * | 2011-01-17 | 2016-12-14 | 隆达电子股份有限公司 | Solid-state light-emitting element with mesh channel and manufacturing method thereof |
CN106935577A (en) * | 2011-03-22 | 2017-07-07 | 晶元光电股份有限公司 | Light emitting diode device |
CN102842573A (en) * | 2012-09-05 | 2012-12-26 | 宁波市鄞州皓升半导体照明有限公司 | Alternating current light emitting diode structure |
CN102867837A (en) * | 2012-09-13 | 2013-01-09 | 中国科学院半导体研究所 | Manufacture method of array type high-voltage LED device |
CN106935698A (en) * | 2013-04-18 | 2017-07-07 | 亿光电子工业股份有限公司 | Light emitting diode device |
CN106935698B (en) * | 2013-04-18 | 2019-05-24 | 亿光电子工业股份有限公司 | Light emitting diode device |
CN111864019A (en) * | 2020-07-10 | 2020-10-30 | 武汉大学 | A flip-chip light-emitting diode with embedded scattering layer and method of making the same |
CN111864019B (en) * | 2020-07-10 | 2021-11-30 | 武汉大学 | Flip light-emitting diode with embedded scattering layer and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
CN101859789B (en) | 2015-01-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9620682B2 (en) | Light emitting device | |
CN101859789A (en) | AC light emitting device with increased light extraction efficiency and method of manufacturing the same | |
US9153622B2 (en) | Series of light emitting regions with an intermediate pad | |
US8304798B2 (en) | Light-emitting diode module and manufacturing method thereof | |
CN102969426B (en) | Luminescent device | |
JP6720220B2 (en) | Optical lens, illumination module, and light unit including the same | |
JP2014131041A (en) | Light emitting element | |
TWI422006B (en) | An alternating current discharge device and a manufacturing method thereof | |
CN103178181B (en) | Electrode Coplanar Light Emitting Diode Element, Encapsulation Structure and Light Reflection Structure | |
CN103022310B (en) | The light-extraction layer of LED luminescence chip and LED matrix | |
CN103178185B (en) | Light emitting device | |
CN104659176B (en) | Semiconductor light emitting element | |
CN104465919B (en) | Light-emitting diode and manufacturing method thereof | |
CN200986927Y (en) | Light-emitting diodes with micro-optical structures | |
CN105226153A (en) | A kind of light-emitting diode with high expansion effect | |
CN103594594B (en) | There is the inverted light-emitting diode (LED) of roughening transparency electrode | |
CN205355072U (en) | Emitting diode filament chip and emitting diode filament | |
CN102832310B (en) | Light emitting diode structure | |
TWI876862B (en) | Micro light-emitting diode device | |
TWI876834B (en) | Micro light-emitting diode device | |
TWI872935B (en) | Micro light-emitting diode device | |
CN101859757B (en) | Stack light-emitting diode chip structure and manufacturing method thereof | |
CN102832311B (en) | Light emitting diode structure | |
TWI419359B (en) | Structure and fabrication method of AC type flip - chip light emitting diode | |
CN108666400A (en) | Semiconductor light emitting module and semiconductor light emitting diode chip thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: JIANGSU CANYANG OPTOELECTRONICS CO., LTD. Free format text: FORMER OWNER: CANYANG INVESTMENT CO., LTD. Effective date: 20131024 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: HONG KONG, CHINA TO: 225101 YANGZHOU, JIANGSU PROVINCE |
|
TA01 | Transfer of patent application right |
Effective date of registration: 20131024 Address after: 225101, No. 9, Zhuanghe branch, Yangzhou Economic Development Zone, Jiangsu Applicant after: JIANGSU CANYANG OPTOELECTRONICS CO., LTD. Address before: Room 2701, Jin Zhonghui center, 28 Queen's Road East, Wan Chai, Hongkong, China Applicant before: Canyang Investment Co., Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |