CN101726945A - Wide visual angle LCD array substrate and manufacturing method thereof - Google Patents
Wide visual angle LCD array substrate and manufacturing method thereof Download PDFInfo
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Abstract
本发明涉及一种宽视角液晶显示器阵列基板及其制造方法。阵列基板包括形成在基板上的栅线和数据线,栅线和数据线限定的像素区域内形成有薄膜晶体管和像素电极,像素区域内还形成有至少一个延伸电极,使至少一个延伸电极与像素电极之间形成用于产生横向电场的狭缝。制造方法包括:在基板上形成包括栅线、栅电极、数据线、源电极、漏电极、TFT沟道区域和钝化层的图形;沉积一层透明导电薄膜,通过构图工艺在像素区域内形成包括像素电极和至少一个延伸电极的图形,使所述至少一个延伸电极与像素电极之间形成用于产生横向电场的狭缝。本发明扩展了周围多个方向上的视角,实现了各个角度上的视角均一,同时简化了阵列基板的结构和制造工艺。
The invention relates to a wide viewing angle liquid crystal display array substrate and a manufacturing method thereof. The array substrate includes gate lines and data lines formed on the substrate, thin film transistors and pixel electrodes are formed in the pixel area defined by the gate line and the data line, and at least one extended electrode is also formed in the pixel area, so that the at least one extended electrode and the pixel A slit for generating a transverse electric field is formed between the electrodes. The manufacturing method includes: forming patterns including gate lines, gate electrodes, data lines, source electrodes, drain electrodes, TFT channel regions and passivation layers on the substrate; depositing a layer of transparent conductive film, and forming in the pixel region by patterning A pattern comprising a pixel electrode and at least one extended electrode, so that a slit for generating a lateral electric field is formed between the at least one extended electrode and the pixel electrode. The invention expands the viewing angles in multiple directions around, realizes uniform viewing angles at various angles, and simultaneously simplifies the structure and manufacturing process of the array substrate.
Description
技术领域technical field
本发明涉及一种液晶显示器及其制造方法,特别是一种宽视角液晶显示器阵列基板及其制造方法。The invention relates to a liquid crystal display and a manufacturing method thereof, in particular to a wide viewing angle liquid crystal display array substrate and a manufacturing method thereof.
背景技术Background technique
液晶显示器的市场迅速成长,应用领域不断扩展,特别是大尺寸液晶电视的应用,要求液晶显示器具有宽阔的视角范围。液晶显示器包括对盒的阵列基板和彩膜基板,其间设置液晶。在电压作用下液晶偏转,通过控制电压大小可以控制液晶的偏转程度,从而实现调制透过率(显示灰度)的目的。The market of liquid crystal display is growing rapidly, and the application fields are continuously expanding, especially the application of large-size liquid crystal TV, which requires the liquid crystal display to have a wide range of viewing angles. The liquid crystal display includes an array substrate and a color filter substrate in a cell, and a liquid crystal is arranged between them. The liquid crystal is deflected under the action of voltage, and the degree of deflection of the liquid crystal can be controlled by controlling the magnitude of the voltage, so as to achieve the purpose of modulating the transmittance (display gray scale).
由于液晶的光学各向异性,液晶显示器存在屏幕视角过窄的缺陷,为此现有技术提出了多种显示模式以克服视角过窄缺陷,多种显示模式包括90°扭曲向列型液晶加补偿膜(Twisted Nematic+film,简称TN+film)模式、多畴垂直排列(Multi-domain Vertical Alignment,简称MVA)模式、像素电极图形化垂直排列(Patterned Vertical Alignment,简称PVA)模式、平面驱动模式(In-Plane Switching,简称IPS)模式以及利用边缘场的平面驱动(Fringe Field Switching,简称FFS)模式等。Due to the optical anisotropy of liquid crystals, liquid crystal displays have the defect that the viewing angle of the screen is too narrow. For this reason, the prior art proposes a variety of display modes to overcome the defect of too narrow viewing angle. The various display modes include 90° twisted nematic liquid crystal plus compensation Film (Twisted Nematic+film, referred to as TN+film) mode, multi-domain vertical alignment (Multi-domain Vertical Alignment, referred to as MVA) mode, pixel electrode patterned vertical alignment (Patterned Vertical Alignment, referred to as PVA) mode, planar drive mode ( In-Plane Switching (IPS for short) mode and Fringe Field Switching (FFS for short) mode using fringe fields, etc.
虽然上述显示模式先后被提出并逐渐实现产业化,但实际使用表明,上述显示模式仍存在相应缺陷。TN+film模式对视角的改善十分有限,视角改善限制在水平140°、垂直100°的范围内,一般只应用于笔记本电脑和台式机监视器,不适于大尺寸液晶电视的应用;MVA模式需要在彩膜基板(彩色滤光片)一侧制造复杂的凸起结构,增加了制造成本;PVA模式需要将像素电极制作成复杂的狭缝结构,影响了光利用效率;而IPS模式和FFS模式要求工艺控制精度高,制造工艺难度大,且影响对比度。Although the above-mentioned display modes have been proposed successively and gradually realized industrialization, actual use shows that the above-mentioned display modes still have corresponding defects. The TN+film mode has very limited improvement on the viewing angle. The viewing angle improvement is limited to the range of 140° horizontally and 100° vertically. It is generally only applied to notebook computers and desktop monitors, and is not suitable for large-size LCD TV applications; MVA mode requires A complex raised structure is manufactured on the side of the color filter substrate (color filter), which increases the manufacturing cost; the PVA mode requires the pixel electrode to be made into a complex slit structure, which affects the light utilization efficiency; while the IPS mode and the FFS mode High process control precision is required, the manufacturing process is difficult, and the contrast is affected.
发明内容Contents of the invention
本发明的目的是提供一种宽视角液晶显示器阵列基板及其制造方法,具有宽视角特性和视角均一特性,同时简化阵列基板结构和制造方法。The object of the present invention is to provide a wide viewing angle liquid crystal display array substrate and its manufacturing method, which has wide viewing angle characteristics and uniform viewing angle characteristics, and simultaneously simplifies the array substrate structure and manufacturing method.
为了实现上述目的,本发明提供了一种宽视角液晶显示器阵列基板,包括形成在基板上的栅线和数据线,所述栅线和数据线限定的像素区域内形成有薄膜晶体管和像素电极,所述像素区域内还形成有至少一个延伸电极,使所述至少一个延伸电极与像素电极之间形成用于产生横向电场的狭缝。In order to achieve the above object, the present invention provides a wide viewing angle liquid crystal display array substrate, including gate lines and data lines formed on the substrate, thin film transistors and pixel electrodes are formed in the pixel area defined by the gate lines and data lines, At least one extension electrode is also formed in the pixel area, so that a slit for generating a lateral electric field is formed between the at least one extension electrode and the pixel electrode.
所述像素电极的一侧形成有凹槽,所述延伸电极设置在所述凹槽内,所述延伸电极与相邻像素区域内的像素电极连接。A groove is formed on one side of the pixel electrode, the extension electrode is disposed in the groove, and the extension electrode is connected to a pixel electrode in an adjacent pixel area.
所述相邻像素区域内的像素电极为相同像素行内相邻像素区域内的像素电极或相同像素列内相邻像素区域内的像素电极。The pixel electrodes in adjacent pixel regions are pixel electrodes in adjacent pixel regions in the same pixel row or pixel electrodes in adjacent pixel regions in the same pixel column.
进一步地,所述延伸电极的形状为矩形、多边形、椭圆形或长条形,所述凹槽的形状与所述延伸电极的形状相对应。所述延伸电极的长度为像素区域宽度的1/10~2/3。所述狭缝的宽度为1μm~6μm。Further, the shape of the extension electrode is rectangle, polygon, ellipse or strip, and the shape of the groove corresponds to the shape of the extension electrode. The length of the extension electrode is 1/10˜2/3 of the width of the pixel area. The width of the slit is 1 μm˜6 μm.
在上述技术方案基础上,所述像素区域内还形成有与所述像素电极一起构成存储电容的公共电极线,所述延伸电极位于所述公共电极线的上方。On the basis of the above technical solution, a common electrode line forming a storage capacitor together with the pixel electrode is formed in the pixel region, and the extension electrode is located above the common electrode line.
为了实现上述目的,本发明还提供了一种宽视角液晶显示器阵列基板制造方法,包括:In order to achieve the above object, the present invention also provides a method for manufacturing a wide viewing angle liquid crystal display array substrate, comprising:
步骤1、在基板上形成包括栅线、栅电极、数据线、源电极、漏电极、TFT沟道区域和钝化层的图形;
步骤2、在完成步骤1的基板上沉积一层透明导电薄膜,通过构图工艺在像素区域内形成包括像素电极和至少一个延伸电极的图形,使所述至少一个延伸电极与像素电极之间形成用于产生横向电场的狭缝。
所述步骤2具体包括:在完成步骤1的基板上沉积一层透明导电薄膜,采用普通掩模板通过构图工艺在像素区域内形成包括像素电极和至少一个延伸电极的图形,所述像素电极的一侧形成有凹槽,所述至少一个延伸电极设置在所述凹槽内,使所述至少一个延伸电极与像素电极之间形成用于产生横向电场的狭缝,所述延伸电极与相邻像素区域内的像素电极连接。The
在上述技术方案基础上,所述延伸电极的形状为矩形、多边形、椭圆形或长条形,所述凹槽的形状与所述延伸电极的形状相对应。所述延伸电极的长度为像素区域宽度的1/10~2/3。所述狭缝的宽度为1μm~6μm。所述步骤1中还形成有公共电极线,所述延伸电极位于所述公共电极线的上方。On the basis of the above technical solution, the shape of the extension electrode is rectangle, polygon, ellipse or strip, and the shape of the groove corresponds to the shape of the extension electrode. The length of the extension electrode is 1/10˜2/3 of the width of the pixel area. The width of the slit is 1 μm˜6 μm. In the
本发明提供了一种宽视角液晶显示器阵列基板及其制造方法,通过在像素区域内设置像素电极和延伸电极,且像素电极和延伸电极之间形成用于产生横向电场的狭缝,实现了一种新型的多畴垂直排列的显示模式。该显示模式采用负性液晶,在不工作时,液晶在电极表面取向材料的作用下均匀地垂直于上下基板排列,而工作时,像素电极与延伸电极之间狭缝附近区域的液晶将受该横向电场的诱导倒向多个方向,使液晶形成多畴结构,一方面扩展了周围多个方向上的视角,另一方面实现了各个角度上的视角均一。进一步地,在保证宽视角和视角均一特性的前提下,由于本发明技术方案既不需要凸起结构,也不需要摩擦工艺,因此本发明简化了阵列基板的结构和制造工艺,且其制造工艺与传统TN型TFT-LCD兼容。实际使用中,如果在偏振片的内侧增加负性双折射补偿膜,还可以进一步扩展视角。本发明宽视角液晶显示器阵列基板适用于帧反转、行反转、列反转、点反转等各种驱动模式的液晶显示器,具有广泛的应用前景。The present invention provides an array substrate of a liquid crystal display with a wide viewing angle and a manufacturing method thereof. A pixel electrode and an extension electrode are arranged in a pixel area, and a slit for generating a lateral electric field is formed between the pixel electrode and the extension electrode, thereby realizing a A novel multi-domain vertically aligned display mode. This display mode adopts negative liquid crystal. When it is not working, the liquid crystal is evenly arranged vertically to the upper and lower substrates under the action of the alignment material on the electrode surface. When it is working, the liquid crystal in the area near the slit between the pixel electrode and the extension electrode will be affected by the liquid crystal. The transverse electric field induces inversion in multiple directions, making the liquid crystal form a multi-domain structure. On the one hand, it expands the viewing angles in multiple directions around it, and on the other hand, it realizes uniform viewing angles at all angles. Furthermore, under the premise of ensuring wide viewing angle and uniform viewing angle, since the technical solution of the present invention does not require a raised structure or a rubbing process, the present invention simplifies the structure and manufacturing process of the array substrate, and its manufacturing process Compatible with traditional TN type TFT-LCD. In actual use, if a negative birefringence compensation film is added inside the polarizer, the viewing angle can be further expanded. The wide viewing angle liquid crystal display array substrate of the present invention is suitable for liquid crystal displays of various driving modes such as frame inversion, row inversion, column inversion, dot inversion, etc., and has wide application prospects.
附图说明Description of drawings
图1为本发明宽视角液晶显示器阵列基板的结构示意图;FIG. 1 is a schematic structural view of an array substrate of a wide viewing angle liquid crystal display of the present invention;
图2为图1中A1-A1向的剖视图;Fig. 2 is the sectional view of A1-A1 in Fig. 1;
图3为图1中B1-B1向的剖视图;Fig. 3 is the sectional view of B1-B1 direction in Fig. 1;
图4为本发明宽视角液晶显示器阵列基板第一次构图工艺后的平面图;4 is a plan view of the array substrate of the wide viewing angle liquid crystal display of the present invention after the first patterning process;
图5为图4中A2-A2向的剖面图;Fig. 5 is the sectional view of A2-A2 direction in Fig. 4;
图6为图4中B2-B2向的剖面图;Fig. 6 is the sectional view of B2-B2 in Fig. 4;
图7为本发明宽视角液晶显示器阵列基板第二次构图工艺后的平面图;7 is a plan view of the array substrate of the wide viewing angle liquid crystal display of the present invention after the second patterning process;
图8为图7中A3-A3向的剖面图;Fig. 8 is the sectional view of A3-A3 direction in Fig. 7;
图9为图7中B3-B3向的剖面图;Fig. 9 is the sectional view of B3-B3 direction in Fig. 7;
图10为本发明宽视角液晶显示器阵列基板第三次构图工艺后的平面图;10 is a plan view of the array substrate of the wide viewing angle liquid crystal display of the present invention after the third patterning process;
图11为图10中A4-A4向的剖面图;Fig. 11 is the sectional view of A4-A4 direction in Fig. 10;
图12为图10中B4-B4向的剖面图;Fig. 12 is the sectional view of B4-B4 direction in Fig. 10;
图13为本发明宽视角液晶显示器阵列基板第四次构图工艺后的平面图;Fig. 13 is a plan view after the fourth patterning process of the wide viewing angle liquid crystal display array substrate of the present invention;
图14为图13中A5-A5向的剖面图;Fig. 14 is the sectional view of A5-A5 direction in Fig. 13;
图15为图13中B5-B5向的剖面图;Fig. 15 is a sectional view of B5-B5 direction in Fig. 13;
图16为本发明宽视角液晶显示器阵列基板采用半色调或灰色调掩模板构图工艺后的结构示意图;FIG. 16 is a schematic structural view of the array substrate of the wide viewing angle liquid crystal display of the present invention after patterning with a half-tone or gray-tone mask;
图17为本发明宽视角液晶显示器阵列基板的工作示意图;Fig. 17 is a working schematic diagram of the array substrate of the wide viewing angle liquid crystal display of the present invention;
图18为本发明宽视角液晶显示器阵列基板制造方法的流程图;FIG. 18 is a flowchart of a method for manufacturing an array substrate of a wide viewing angle liquid crystal display according to the present invention;
图19为本发明宽视角液晶显示器阵列基板制造方法第一实施例的流程图;19 is a flow chart of the first embodiment of the method for manufacturing the array substrate of the wide viewing angle liquid crystal display of the present invention;
图20为本发明宽视角液晶显示器阵列基板制造方法第二实施例的流程图。FIG. 20 is a flow chart of the second embodiment of the method for manufacturing the array substrate of the wide viewing angle liquid crystal display of the present invention.
附图标记说明:Explanation of reference signs:
1-基板; 2-栅线; 3-栅电极;1-substrate; 2-grid line; 3-gate electrode;
4-公共电极线; 5-栅绝缘层; 6-半导体层;4-common electrode line; 5-gate insulating layer; 6-semiconductor layer;
7-掺杂半导体层;8-源电极; 9-漏电极;7-doped semiconductor layer; 8-source electrode; 9-drain electrode;
10-数据线; 11-钝化层; 12-钝化层过孔;10-data line; 11-passivation layer; 12-passivation layer via;
13-第二过孔; 14-像素电极;15-延伸电极;13-second via hole; 14-pixel electrode; 15-extended electrode;
20-阵列基板; 30-彩膜基板;31-彩膜层;20-array substrate; 30-color filter substrate; 31-color filter layer;
32-公共电极; 40-液晶。32-common electrode; 40-liquid crystal.
具体实施方式Detailed ways
下面通过附图和实施例,对本发明的技术方案做进一步的详细描述。The technical solutions of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments.
图1为本发明宽视角液晶显示器阵列基板的结构示意图,图2为图1中A1-A1向的剖视图,图3为图1中B1-B1向的剖视图。如图1~图3所示,本发明宽视角液晶显示器阵列基板的主体结构包括形成在基板上的栅线2、数据线10和薄膜晶体管(Thin Film Transistor,简称TFT);数个栅线2和数个数据线10限定了数个像素区域,薄膜晶体管形成在每个像素区域内,并位于栅线2与数据线10的交叉处;每个像素区域内还形成有一个像素电极14和至少一个延伸电极15,至少一个延伸电极15与相邻像素区域内的像素电极连接,且在延伸电极15与像素电极14之间形成用于产生横向电场的狭缝。具体地,对于一个像素区域来说,像素电极14形成在该像素区域内,像素电极14中部的一侧(如左侧)形成有向像素电极14的中心延伸的条形状的凹槽,条形状的延伸电极15设置在该条形状的凹槽内,在延伸电极15与像素电极14之间形成产生横向电场狭缝,而延伸电极15与相邻(如左侧)的像素电极连接成一体结构。对于一个像素电极14和延伸电极15来说,像素电极14形成在一个像素区域内,与像素电极14一体结构的延伸电极15形成在相邻(如右侧)的像素区域内,像素电极14中部的一侧(如左侧)形成有向像素电极14的中心延伸的条形状的凹槽,像素电极14中部的另一侧(如右侧)设置延伸电极15,形成在相邻(如右侧)像素区域内的延伸电极15同时设置在相邻(如右侧)像素电极形成的条形状的凹槽内,并与该相邻像素电极之间形成用于产生横向电场的狭缝。工作时,由于像素电极14与延伸电极15之间存在电压差,因此像素电极14和延伸电极15之间的狭缝处将产生横向电场,狭缝附近区域的液晶受该横向电场的诱导倒向多个方向,使液晶形成多畴结构。FIG. 1 is a schematic structural view of an array substrate of a wide viewing angle liquid crystal display according to the present invention, FIG. 2 is a cross-sectional view along A1-A1 in FIG. 1 , and FIG. 3 is a cross-sectional view along B1-B1 in FIG. 1 . As shown in Figures 1 to 3, the main structure of the array substrate of the wide viewing angle liquid crystal display of the present invention includes
本发明上述技术方案中,像素区域内还可以形成有公共电极线(也称存储电容线)4,公共电极线4位于二条栅线2之间,用于与像素电极14一起构成存储电容。当公共电极线4位于像素区域的中部时,本发明像素电极14上形成的凹槽和延伸电极15可以设置在公共电极线4的上方,一方面充分利用现有阵列基板的结构形式,另一方面不会影响开口率。在实际使用中,一个像素区域内的延伸电极15可以是一个,也可以是多个;延伸电极15的形状可以根据形成多畴结构的需要设置成矩形、多边形或椭圆形等长条形形状,像素电极14上凹槽的形状与延伸电极15的形状相对应;延伸电极的宽度可以根据像素区域的实际尺寸进行调整,优选地小于或等于公共电极线4的宽度;延伸电极15的长度可以根据形成多畴结构的要求进行调整,可以设置为像素区域宽度的1/10~2/3,优选地,延伸电极15的长度为像素区域宽度的1/2左右;像素电极14与延伸电极15之间狭缝的宽度为1μm~6μm,优选地,狭缝的宽度为2μm。In the above technical solution of the present invention, a common electrode line (also called a storage capacitor line) 4 may also be formed in the pixel area, and the
本发明上述技术方案中,薄膜晶体管的结构与TN型TFT-LCD基本相同,包括栅电极3、栅绝缘层5、有源层(包括半导体层6和掺杂半导体层7)、源电极8、漏电极9、TFT沟道区域和钝化层11。其中,栅电极3形成在基板1上并与栅线2连接;栅绝缘层5形成在栅线2和栅电极3上并覆盖整个基板1;有源层形成在栅绝缘层5上并位于栅电极3的上方;源电极8的一端位于有源层上,另一端与数据线10连接,漏电极9的一端位于有源层上,另一端通过钝化层过孔12与像素电极14连接,源电极8与漏电极9之间形成TFT沟道区域;钝化层11形成在TFT沟道区域上并覆盖整个基板1,其上开设有使像素电极14与漏电极9连接的钝化层过孔12。In the technical scheme of the present invention, the structure of the thin film transistor is basically the same as that of the TN-type TFT-LCD, including a
图4~图15为本发明宽视角液晶显示器阵列基板制备过程的示意图,下面以五次构图工艺为例通过宽视角液晶显示器阵列基板的制备过程进一步说明本发明的技术方案,在以下说明中,本发明所称的构图工艺包括光刻胶涂覆、掩模、曝光、刻蚀、剥离等工艺,其中光刻胶以正性光刻胶为例。4 to 15 are schematic diagrams of the preparation process of the array substrate of the wide viewing angle liquid crystal display of the present invention. The following takes the five-time patterning process as an example to further illustrate the technical solution of the present invention through the preparation process of the array substrate of the wide viewing angle liquid crystal display. In the following description, The patterning process referred to in the present invention includes processes such as photoresist coating, masking, exposure, etching, stripping, etc., wherein the photoresist is an example of a positive photoresist.
图4为本发明宽视角液晶显示器阵列基板第一次构图工艺后的平面图,图5为图4中A2-A2向的剖面图,图6为图4中B2-B2向的剖面图。采用磁控溅射或热蒸发的方法,在基板1(如玻璃基板或石英基板)上沉积一层栅金属薄膜。采用普通掩模板通过第一次构图工艺对栅金属薄膜进行构图,在基板1上形成包括栅线2的图形,并在每个像素区域内形成与栅线2连接的栅电极3,如图4~图6所示。本实施例中,第一次构图工艺中还可以同时形成公共电极线4,公共电极线4位于相邻的二条栅线2中部且与栅线2平行。4 is a plan view of the array substrate of a wide viewing angle liquid crystal display of the present invention after the first patterning process, FIG. 5 is a cross-sectional view along the A2-A2 direction in FIG. 4 , and FIG. 6 is a cross-sectional view along the B2-B2 direction in FIG. 4 . A gate metal thin film is deposited on a substrate 1 (such as a glass substrate or a quartz substrate) by magnetron sputtering or thermal evaporation. The gate metal thin film is patterned by the first patterning process using a common mask, and a pattern including the
图7为本发明宽视角液晶显示器阵列基板第二次构图工艺后的平面图,图8为图7中A 3-A 3向的剖面图,图9为图7中B3-B3向的剖面图。在完成上述结构图形的基板上,采用等离子体增强化学气相沉积(简称PECVD)方法,依次沉积栅绝缘层5、半导体层6和掺杂半导体层(欧姆接触层)7。采用普通掩模板通过第二次构图工艺对半导体层6和掺杂半导体层7进行构图,在每个像素区域的栅电极3上方形成包括有源层的图形,如图7~图9所示。7 is a plan view after the second patterning process of the wide viewing angle liquid crystal display array substrate of the present invention, FIG. 8 is a sectional view of A3-A3 in FIG. 7, and FIG. 9 is a sectional view of B3-B3 in FIG. 7. On the substrate with the above structural patterns, a
图10为本发明宽视角液晶显示器阵列基板第三次构图工艺后的平面图,图11为图10中A4-A4向的剖面图,图12为图10中B4-B4向的剖面图。在完成上述结构图形的基板上,采用磁控溅射或热蒸发的方法,沉积一层源漏金属薄膜。采用普通掩模板通过第三次构图工艺对源漏金属薄膜进行构图,形成包括数据线10的图形,并在每个像素区域内形成源电极8、漏电极9、和TFT沟道区域的图形,其中源电极8的一端位于有源层上,另一端与数据线10连接,漏电极9的一端位于有源层上,源电极8和漏电极9之间的掺杂半导体层7被完全刻蚀掉,并刻蚀掉部分半导体层6,暴露出半导体层6,形成TFT沟道区域图形,如图10~图12所示。10 is a plan view of the array substrate of a wide viewing angle liquid crystal display of the present invention after the third patterning process, FIG. 11 is a sectional view along the A4-A4 direction in FIG. 10 , and FIG. 12 is a sectional view along the B4-B4 direction in FIG. 10 . On the substrate with the above-mentioned structural patterns, a layer of source-drain metal thin film is deposited by magnetron sputtering or thermal evaporation. Patterning the source-drain metal thin film through the third patterning process by using a common mask to form a pattern including the
图13为本发明宽视角液晶显示器阵列基板第四次构图工艺后的平面图,图14为图13中A5-A5向的剖面图,图15为图13中B5-B5向的剖面图。在完成上述结构图形的基板上,采用PECVD方法沉积一层钝化层11。采用普通掩模板通过第四次构图工艺对钝化层进行构图,在钝化层覆盖TFT沟道区域的基础上,形成包括钝化层过孔12的图形,其中每个像素区域内形成的钝化层过孔12位于漏电极9位置,钝化层过孔12内的钝化层11被完全刻蚀掉,暴露出漏电极9的上表面,如图13~图15所示。13 is a plan view of the array substrate of a wide viewing angle liquid crystal display according to the present invention after the fourth patterning process, FIG. 14 is a sectional view along the A5-A5 direction in FIG. 13 , and FIG. 15 is a sectional view along the B5-B5 direction in FIG. 13 . A
最后,在完成上述结构图形的基板上,采用磁控溅射或热蒸发的方法,沉积一层透明导电薄膜。采用普通掩模板通过第五次构图工艺对透明导电薄膜进行构图,在每个像素区域内形成包括像素电极14和延伸电极15的图形,延伸电极15与相邻像素区域内的像素电极连接,且延伸电极15与像素电极14之间形成用于产生横向电场的狭缝。具体地说,对于一个像素区域来说,像素电极14形成在该像素区域内,并通过该像素区域内的钝化层过孔12与漏电极9连接,像素电极14中部的一侧(如左侧)形成有向像素电极14的中心延伸的条形状的凹槽,条形状的延伸电极15设置在该条形状的凹槽内,在延伸电极15与像素电极14之间形成狭缝,而该延伸电极15与相邻(如左侧)的像素电极连接成一体结构,如图1~图3所示。对于一个像素电极14和延伸电极15来说,像素电极14形成在一个像素区域内,与像素电极14一体结构的延伸电极15则形成在相邻(如右侧)的像素区域内,像素电极14通过钝化层过孔12与漏电极9连接,像素电极14中部的一侧(如左侧)形成有向像素电极14的中心延伸的条形状的凹槽,像素电极14中部的另一侧(如右侧)设置延伸电极15,形成在相邻(如右侧)像素区域内的延伸电极15同时设置在相邻(如右侧)像素电极形成的条形状的凹槽内,并与该相邻像素电极之间形成用于产生横向电场的狭缝。在实际使用中,延伸电极15可以是一个,也可以是多个,延伸电极15的形状可以设置成矩形、多边形或椭圆形等长条形形状。Finally, a layer of transparent conductive film is deposited on the substrate with the above-mentioned structural patterns by magnetron sputtering or thermal evaporation. Patterning the transparent conductive film by using a common mask plate through the fifth patterning process, forming a pattern including a
以上所说明的五次构图工艺仅仅是制备本发明宽视角液晶显示器阵列基板的一种实现方法,实际使用中还可以通过增加或减少构图工艺次数、选择不同的材料或材料组合来实现本发明。例如,本发明还可以通过多步刻蚀的四次构图工艺制备完成,将前述第二次构图工艺和第三次构图工艺合并成一个采用半色调或灰色调掩模板的构图工艺,下面予以简单说明。The five-time patterning process described above is only one implementation method for preparing the array substrate of the wide viewing angle liquid crystal display of the present invention. In actual use, the present invention can also be realized by increasing or decreasing the number of patterning processes and selecting different materials or combinations of materials. For example, the present invention can also be prepared by four patterning processes of multi-step etching, and the aforementioned second patterning process and the third patterning process are combined into one patterning process using a halftone or gray tone mask, which is briefly described below illustrate.
图16为本发明宽视角液晶显示器阵列基板采用半色调或灰色调掩模板构图工艺后的结构示意图,为图10中A4-A4向的剖面图。其具体工艺过程为:在完成前述结构图形的基板上,采用PECVD方法依次沉积栅绝缘层5、半导体层6和掺杂半导体层7,然后采用磁控溅射或热蒸发的方法沉积源漏金属薄膜。之后涂覆一层光刻胶,采用半色调或灰色调掩模板曝光,使光刻胶形成完全曝光区域(光刻胶完全去除区域)、部分曝光区域(光刻胶部分去除区域)和未曝光区域(光刻胶完全保留区域),其中未曝光区域对应于数据线、源电极和漏电极图形所在区域,部分曝光区域对应于TFT沟道区域图形所在区域,完全曝光区域对应于上述图形以外的区域。显影处理后,未曝光区域光刻胶的厚度没有变化,部分曝光区域光刻胶的厚度变薄,完全曝光区域的光刻胶被完全去除。首先对完全曝光区域进行第一次刻蚀,分别刻蚀掉完全曝光区域的源漏金属薄膜、搀杂半导体层和半导体层,形成数据线、有源层、漏电极和源电极图形。进行灰化处理,完全去除部分曝光区域的光刻胶,对部分曝光区域进行第二次刻蚀,分别刻蚀掉部分曝光区域的源漏金属薄膜和搀杂半导体层,部分刻蚀掉半导体层,使该区域露出半导体层,形成TFT沟道区域图形。本构图工艺后,栅绝缘层覆盖整个基板,有源层图形以外区域的半导体层和掺杂半导体层被完全刻蚀掉,但数据线、源电极和漏电极图形下保留有半导体层和掺杂半导体层,如图16所示。该过程已经广泛应用于液晶显示器制造领域,这里不再赘述。FIG. 16 is a schematic structural view of the array substrate of the wide viewing angle liquid crystal display of the present invention after patterning with a half-tone or gray-tone mask, which is a cross-sectional view along the direction A4-A4 in FIG. 10 . The specific process is as follows: on the substrate with the aforementioned structural patterns, the
图17为本发明宽视角液晶显示器阵列基板的工作示意图。如图17所示,阵列基板20与彩膜基板30对盒形成垂直排列的宽视角液晶显示器,液晶40则设置在阵列基板20与彩膜基板30之间。阵列基板20采用前述本发明宽视角液晶显示器阵列基板的结构,至少包括形成在基板上的像素电极14和延伸电极15,像素电极14和延伸电极15之间形成狭缝。彩膜基板30可以采用传统的结构形式,至少包括形成在基板上的彩膜层31和公共电极32。液晶40采用介电常数为负的材料。当不加电压时,液晶在电极表面取向材料的作用下,其长轴方向按照垂直方式排列,当加电压时,由于像素电极14和延伸电极15之间存在电压差,因此在像素电极14和延伸电极15之间的狭缝处产生横向电场,狭缝附近区域的液晶受该横向电场的诱导倒向多个方向,使液晶形成多畴结构,而其它区域的电场仍然是阵列基板20的像素电极14与彩膜基板30的公共电极32之间的电场。由于像素电极14与延伸电极15之间的狭缝贯穿在像素区域的中部,具有水平或接近水平段、垂直或接近垂直段,因此所形成的横向电场具有放射状的特点,即横向电场具有多个方向,因此在狭缝附近区域的液晶将受该横向电场的诱导倒向多个方向,形成多畴结构,这样就可以在周围多个方向上看到显示图像,一方面扩展了周围多个方向上的视角,另一方面实现了各个角度上的视角均一。FIG. 17 is a working diagram of the array substrate of the wide viewing angle liquid crystal display of the present invention. As shown in FIG. 17 , the
图1~图3所示的本发明宽视角液晶显示器阵列基板只是一种实现结构,像素电极和延伸电极均形成在一像素行内,实际使用中还可以具有多种结构变形,例如,像素电极和延伸电极可以形成在一像素列内,这里不再赘述。实际使用中,当像素电极和延伸电极均形成在一像素行内时,复数个像素区域的第一列或最后一列为虚拟(dummy)像素区域,不显示实际内容,只配合相邻列产生横向电场。The wide viewing angle liquid crystal display array substrate of the present invention shown in Figures 1 to 3 is only a realization structure, the pixel electrode and the extension electrode are all formed in a pixel row, and various structural deformations can also be used in actual use, for example, the pixel electrode and the The extended electrodes can be formed in a pixel column, which will not be repeated here. In actual use, when both the pixel electrode and the extension electrode are formed in a pixel row, the first column or the last column of multiple pixel areas is a dummy pixel area, which does not display actual content, and only cooperates with adjacent columns to generate a lateral electric field .
图18为本发明宽视角液晶显示器阵列基板制造方法的流程图,具体包括:Fig. 18 is a flow chart of the method for manufacturing the array substrate of the wide viewing angle liquid crystal display of the present invention, which specifically includes:
步骤1、在基板上形成包括栅线、栅电极、数据线、源电极、漏电极、TFT沟道区域和钝化层的图形;
步骤2、在完成步骤1的基板上沉积一层透明导电薄膜,通过构图工艺在像素区域内形成包括像素电极和至少一个延伸电极的图形,使所述至少一个延伸电极与像素电极之间形成产生横向电场的狭缝。
下面通过具体实施例进一步说明本发明宽视角液晶显示器阵列基板制造方法的技术方案。The technical solution of the method for manufacturing the array substrate of the wide viewing angle liquid crystal display of the present invention will be further described below through specific examples.
图19为本发明宽视角液晶显示器阵列基板制造方法第一实施例的流程图,具体包括:Fig. 19 is a flow chart of the first embodiment of the method for manufacturing the array substrate of the wide viewing angle liquid crystal display of the present invention, which specifically includes:
步骤11、在基板上沉积一层栅金属薄膜,采用普通掩模板通过构图工艺形成包括栅线、栅电极和公共电极线的图形;
步骤12、在完成步骤11的基板上依次沉积栅绝缘层、半导体层和掺杂半导体层,采用普通掩模板通过构图工艺形成包括有源层的图形;
步骤13、在完成步骤12的基板上沉积源漏金属薄膜,采用普通掩模板通过构图工艺形成包括数据线、源电极、漏电极和TFT沟道区域的图形;
步骤14、在完成步骤13的基板上沉积一层钝化层,采用普通掩模板通过构图工艺形成钝化层过孔,所述钝化层过孔位于漏电极位置;
步骤15、在完成步骤14的基板上沉积一层透明导电薄膜,采用普通掩模板通过构图工艺在像素区域内形成包括像素电极和至少一个延伸电极的图形,所述像素电极通过钝化层过孔与漏电极连接,所述像素电极的一侧形成有凹槽,所述至少一个延伸电极设置在所述凹槽内,使所述至少一个延伸电极与像素电极之间形成用于产生横向电场的狭缝,所述至少一个延伸电极与相邻像素区域内的像素电极连接。
本发明上述技术方案中,步骤11~步骤15的具体工艺过程已在图4~图15所示的制备过程中详细说明,这里不再赘述。In the above technical solution of the present invention, the specific process of
图20为本发明宽视角液晶显示器阵列基板制造方法第二实施例的流程图,具体包括:Fig. 20 is a flow chart of the second embodiment of the method for manufacturing the array substrate of the wide viewing angle liquid crystal display of the present invention, which specifically includes:
步骤21、在基板上沉积一层栅金属薄膜,采用普通掩模板通过构图工艺形成包括栅线、栅电极和公共电极线的图形;
步骤22、在完成步骤21的基板上依次沉积栅绝缘层、半导体层、掺杂半导体层和源漏金属薄膜,采用半色调或灰色调掩模板通过构图工艺形成包括有源层、数据线、源电极、漏电极和TFT沟道区域的图形;
步骤23、在完成步骤22的基板上沉积一层钝化层,采用普通掩模板通过构图工艺形成钝化层过孔,所述钝化层过孔位于漏电极位置;
步骤24、在完成步骤23的基板上沉积一层透明导电薄膜,采用普通掩模板通过构图工艺在像素区域内形成包括像素电极和至少一个延伸电极的图形,所述像素电极通过钝化层过孔与漏电极连接,所述像素电极的一侧形成有凹槽,所述至少一个延伸电极设置在所述凹槽内,使所述至少一个延伸电极与像素电极之间形成用于产生横向电场的狭缝,所述延伸电极与相邻像素区域内的像素电极连接。
本实施例与第一实施例的主要流程基本相同,区别在于将第一实施例中的步骤12和步骤13并成一个采用半色调或灰色调掩模板的构图工艺,其它过程与前述第一实施例相同。采用半色调或灰色调掩模板的工艺过程已在图16所示的制备过程中详细说明,这里不再赘述。The main process of this embodiment is basically the same as that of the first embodiment, the difference is that
本发明提供了一种宽视角液晶显示器阵列基板及其制造方法,通过在像素区域内设置像素电极和延伸电极,且像素电极和延伸电极之间形成用于产生横向电场的狭缝,实现了一种新型的多畴垂直排列的显示模式。该显示模式采用负性液晶,在不工作时,液晶在电极表面取向材料的作用下均匀地垂直于上下基板排列,而工作时,像素电极与延伸电极之间狭缝附近区域的液晶将受该横向电场的诱导倒向多个方向,使液晶形成多畴结构,一方面扩展了周围多个方向上的视角,另一方面实现了各个角度上的视角均一。进一步地,在保证宽视角和视角均一特性的前提下,由于本发明技术方案既不需要凸起结构,也不需要摩擦工艺,因此本发明简化了阵列基板的结构和制造工艺,且其制造工艺与传统TN型TFT-LCD兼容。实际使用中,如果在偏振片的内侧增加负性双折射补偿膜,还可以进一步扩展视角。本发明宽视角液晶显示器阵列基板适用于帧反转、行反转、列反转、点反转等各种驱动模式的液晶显示器,具有广泛的应用前景。The present invention provides an array substrate of a liquid crystal display with a wide viewing angle and a manufacturing method thereof. A pixel electrode and an extension electrode are arranged in a pixel area, and a slit for generating a lateral electric field is formed between the pixel electrode and the extension electrode, thereby realizing a A novel multi-domain vertically aligned display mode. This display mode adopts negative liquid crystal. When it is not working, the liquid crystal is evenly arranged vertically to the upper and lower substrates under the action of the alignment material on the electrode surface. When it is working, the liquid crystal in the area near the slit between the pixel electrode and the extension electrode will be affected by the liquid crystal. The transverse electric field induces inversion in multiple directions, making the liquid crystal form a multi-domain structure. On the one hand, it expands the viewing angles in multiple directions around it, and on the other hand, it realizes uniform viewing angles at all angles. Furthermore, under the premise of ensuring wide viewing angle and uniform viewing angle, since the technical solution of the present invention does not require a raised structure or a rubbing process, the present invention simplifies the structure and manufacturing process of the array substrate, and its manufacturing process Compatible with traditional TN type TFT-LCD. In actual use, if a negative birefringence compensation film is added inside the polarizer, the viewing angle can be further expanded. The wide viewing angle liquid crystal display array substrate of the present invention is suitable for liquid crystal displays of various driving modes such as frame inversion, row inversion, column inversion, dot inversion, etc., and has wide application prospects.
最后应说明的是:以上实施例仅用以说明本发明的技术方案而非限制,尽管参照较佳实施例对本发明进行了详细说明,本领域的普通技术人员应当理解,可以对本发明的技术方案进行修改或者等同替换,而不脱离本发明技术方案的精神和范围。Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present invention without limitation, although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present invention can be Modifications or equivalent replacements can be made without departing from the spirit and scope of the technical solutions of the present invention.
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WO2013026395A1 (en) * | 2011-08-23 | 2013-02-28 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof |
CN103513475A (en) * | 2012-06-26 | 2014-01-15 | 株式会社日本显示器 | Liquid crystal display device |
CN110928094A (en) * | 2019-12-31 | 2020-03-27 | 成都中电熊猫显示科技有限公司 | Array substrate and liquid crystal panel |
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WO2013026395A1 (en) * | 2011-08-23 | 2013-02-28 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof |
US9070772B2 (en) | 2011-08-23 | 2015-06-30 | Boe Technology Group Co., Ltd. | Array substrate and manufacturing method thereof |
CN103513475A (en) * | 2012-06-26 | 2014-01-15 | 株式会社日本显示器 | Liquid crystal display device |
CN103513475B (en) * | 2012-06-26 | 2016-05-25 | 株式会社日本显示器 | The liquid crystal indicator of wall electrode IPS mode |
CN110928094A (en) * | 2019-12-31 | 2020-03-27 | 成都中电熊猫显示科技有限公司 | Array substrate and liquid crystal panel |
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