CN101701803B - Bi-orthogonal diffraction optical grating measuring system and cardinal plane-sharing scanning workbench constructed by same - Google Patents
Bi-orthogonal diffraction optical grating measuring system and cardinal plane-sharing scanning workbench constructed by same Download PDFInfo
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- CN101701803B CN101701803B CN2009102728402A CN200910272840A CN101701803B CN 101701803 B CN101701803 B CN 101701803B CN 2009102728402 A CN2009102728402 A CN 2009102728402A CN 200910272840 A CN200910272840 A CN 200910272840A CN 101701803 B CN101701803 B CN 101701803B
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- 230000003287 optical effect Effects 0.000 title claims abstract description 23
- 238000006073 displacement reaction Methods 0.000 claims abstract description 24
- 230000033001 locomotion Effects 0.000 claims abstract description 23
- 230000001360 synchronised effect Effects 0.000 claims abstract description 13
- 238000005259 measurement Methods 0.000 claims description 16
- 239000004579 marble Substances 0.000 claims description 5
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 5
- 238000012876 topography Methods 0.000 abstract description 4
- 230000002457 bidirectional effect Effects 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 230000005622 photoelectricity Effects 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 1
- 230000002195 synergetic effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 7
- 230000004807 localization Effects 0.000 description 6
- 238000010276 construction Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- 102100029469 WD repeat and HMG-box DNA-binding protein 1 Human genes 0.000 description 1
- 101710097421 WD repeat and HMG-box DNA-binding protein 1 Proteins 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000004441 surface measurement Methods 0.000 description 1
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Abstract
The invention discloses a bi-orthogonal diffraction optical grating measuring system which comprises two orthogonal diffraction optical gratings, the light emitted by a laser source radiates onto the working face of a grating vertically, and transmits to working face of the other orthogonal diffraction optical grating to be received by a photoelectricity receiver, the photoelectricity receiver captures the light intensity change of any point and analyzes, thus realizing synchronous displacement measuring, and ensuring higher two-dimension positioning precision. The invention provides a scanning platform adopting the above measuring system, the bidirectional guide rails are located on the same plane to form a stable and reliable measuring reference plane to improve positioning precision. The invention is mainly applied to three-dimension topography measuring, as well as in the fields needing synergic movement of precision workbench such as precision processing, semiconductor etching, miniature assembly and the like.
Description
Technical field
The present invention relates to the precision measurement field, be specifically related to the cobasis face scanning workbench of a kind of bi-orthogonal diffraction optical grating metering system and application thereof, mainly apply to 3 d surface topography and measure, also can be applicable to the field that Precision Machining, semiconductor lithography, miniature assembling etc. need the precision stage cooperative motion.
Background technology
Reliable and stable and the high two-dimensional scan worktable of bearing accuracy of plane of movement is the important component part of 3 d surface topography surveying instrument.The one dimensions that the many employing two cover guide rails of two-dimensional scan worktable, leading screw and motor are formed in the existing surface measurement instrument drive the location structure stack combinations and form, the two-dimensional localization metering of worktable also is to adopt two cover metering systems, realizes metering respectively as precise grating, laser interferometer etc.Such structure and metering arrangement exist the problem that some need solve.At first, these two-dimensional scan worktable by x, y line slideway separate and that have suitable vertical range each other, form the datum plane of three-dimensional measurement.This form is owing to be difficult to realize the unification of two-way oriention benchmark on the technology, precision characteristic separately, stiffness characteristics, load situation are all different, thereby are difficult to realize high datum plane precision.Because work top is big from the vertical range of track drive shaft and spigot surface, Abbe error is inevitable simultaneously.Though now some scientific payoffss also occur based on the two-dimentional work bench of cobasis face, be based on magnetic levitation technology or air-float guide rail mostly, often complex structure involves great expense.On the other hand, existing worktable x, y direction metering system are independently installed, the metering system of a direction can only be finished the displacement metering of this direction, the worktable integral body of introducing owing to guiding error in this direction motion then can not get metering in the change in location of other direction, must form positioning error, thereby make the two dimension metering be difficult to the positioning accuracy request that reaches high.
Summary of the invention
The object of the present invention is to provide the two-dimentional synchronous measurement of a kind of bi-orthogonal diffraction optical grating system, detect the displacement of both direction simultaneously, improved the two-dimensional localization precision.
Another object of the present invention is to provide a kind of cobasis face scanning workbench that adopts above-mentioned metering system to constitute, detect the displacement of both direction simultaneously, and unified horizontal and vertical spigot surface, thereby realize high datum plane precision from physical construction.
Bi-orthogonal diffraction optical grating two dimension synchronous measurement system, comprise quiet grating seat 4 and the moving grating seat 5 that is positioned at its below, on quiet grating seat 4 and moving grating seat 5, be separately installed with first, the second cross diffraction grating 11a, 11b, cross diffraction grating is the grating that is etched with two-way quadrature grid line, the workplace of the first cross diffraction grating 11a be positioned at the second cross diffraction grating 11b workplace directly over, the corresponding grid line of two gratings is parallel; Quiet grating seat 4 is provided with lasing light emitter, the workplace of the light vertical incidence first cross diffraction grating 11a that lasing light emitter sends, and be transmitted on the workplace of the second cross diffraction grating 11b, finally received by a photelectric receiver.
The cobasis face scanning workbench that adopts above-mentioned metering system to constitute comprises bi-orthogonal diffraction optical grating two dimension synchronous measurement system and common basal plane two-dimension displacement mechanism; The common basal plane two-dimension displacement mechanism comprises cobasis face platform 210, be equipped with on the cobasis face platform 210 a pair of x to the x of parallel placement to guide rail and a pair of y to the y of parallel placement to guide rail; The moving grating seat 5 of bi-orthogonal diffraction optical grating two dimension synchronous measurement system is installed in x on the slide block of guide rail, and moving grating seat 5 connects x to ball-screw 107, its at x to the drive lower edge of drive motor x to motion; Cobasis face platform 210 connects y to ball-screw 207, other have a fixing support rack 2 by connect y to the slide block of guide rail together basal plane platform 210 connect, cobasis face platform 210 at y to the drive lower edge of drive motor y to motion; On the moving grating seat 5 object tables 3 is installed.
Beneficial effect of the present invention exists:
Bi-orthogonal diffraction optical grating metering system disclosed by the invention can be realized x-y to synchronous shift, guarantees higher two-dimensional localization precision.The principal character of this system is the change in displacement of energy synchronous detection to x, y both direction, metering system than the independent detection of both direction is more intelligent, convenient, and when worktable when the x direction is moved, if the displacement error of y direction is arranged, the bi-orthogonal diffraction optical grating metering system also can detect the change in location on the y direction when the x direction is carried out FEEDBACK CONTROL, thereby the error of drive controlling compensation on worktable y direction by the y direction realizes high two-dimensional localization precision.With grating line density is that 1200/mm is an example, and this system's metering initial resolution can reach 1 μ m, and software segmentation back resolution is better than 0.01 μ m.
The scanning workbench of using above-mentioned bi-orthogonal diffraction optical grating metering system can conveniently use on the 3 d surface topography surveying instrument, cost is low, physical construction is simple, stroke range is big, reliable and stable measuring basis face is unified, is easy to form to x, y spigot surface, controls by the feedback closed loop of bi-orthogonal diffraction optical grating synchro measure two-dimension displacement signal to reach higher two-dimensional localization precision.The common spigot surface rail mounting structure of scanning workbench, version is simple, x spigot surface and y spigot surface are in the same plane owing to structurally realize that two-way guide rails is in same plane, be easy to realize less vertical range between measuring point and table slide driving, location and metering system, at utmost reduced the Abbe error of measuring point location, its object tables motion reference field error is much smaller than the object tables that is formed by stacking by the double-deck spigot surface reference field of doing exercises.Effectively the stroke range of measuring is big, can reach 25mm * 25mm, can be better than 0.01 μ m after the segmentation of metering resolution, and positioning resolution, bearing accuracy, repetitive positioning accuracy can reach 0.1 μ m, 1 μ m, 0.5 μ m respectively.
Description of drawings
Fig. 1 is the one-piece construction synoptic diagram of worktable of the present invention.
Fig. 2 is the vertical view of worktable of the present invention.
Fig. 3 is the A--A cut-open view of Fig. 2.
Fig. 4 is a cobasis face rail mounting structure synoptic diagram.
Fig. 5 is a bi-orthogonal diffraction optical grating displacement measurement principle schematic.
Fig. 6 is a bi-orthogonal diffraction optical grating metering system space structure synoptic diagram.
Fig. 7 is the key components and parts structural representation, and Fig. 7 (a) is a cobasis face platform structure synoptic diagram, and Fig. 7 (b) is the rigid mount structural representation, and Fig. 7 (c) is a shaft flexible hinge arrangement synoptic diagram, and Fig. 7 (d) is moving grating holder structure synoptic diagram.
Embodiment
Bi-orthogonal diffraction optical grating two dimension synchronous measurement system comprises quiet grating seat 4 and moving grating seat 5, on quiet grating seat 4 and moving grating seat 5, be separately installed with first, the second cross diffraction grating 11a, 11b, the workplace of the first cross diffraction grating 11a be positioned at the second cross diffraction grating 11b workplace directly over, the corresponding grid line of two gratings is parallel; Quiet grating seat 4 is provided with lasing light emitter, the workplace of the light vertical incidence first cross diffraction grating 11a that lasing light emitter sends, and be transmitted on the workplace of the second cross diffraction grating 11b, finally received by a photelectric receiver.Cross diffraction grating is the grating that is etched with two-way quadrature grid line.When a branch of collimation laser impinges perpendicularly on corresponding grid line and workplace pairwise orthogonal diffraction grating 11a all parallel to each other and 11b, diffraction takes place respectively in collimation laser in two vertical planes of quadrature grid line, referring to accompanying drawing 5, with the plane of parallel paper direction wherein is example, incident laser is diffracted into by the vertical paper grid line of the first cross diffraction grating 11a+and 1,0 and-1 order diffraction light.This three beams diffraction light enters the second cross diffraction grating 11b, is diffracted into (+1 ,+1) respectively, (+1,0), (+1 ,-1), (0 ,+1), (0,0), (0 ,-1) and (1 ,+1), (1,0), (1 ,-1) order diffraction light.In the corresponding overlay region of these diffraction lights, as (+1,0) and the overlay region of (0 ,+1) and the overlay region of (0 ,-1) and (1,0), generation is interfered in dislocation, produces interference fringe.Vertical grid line direction (being vertical direction in the paper) has a grid distance relative displacement when two gratings edge, and at the interference region any point, interference strength just has the sinusoidal variations of one-period.Thus, grasp arbitrfary point light intensity variation and analysis, just can obtain the grating relative displacement, thereby displacement measurement is achieved by photelectric receiver.Because the diffraction grating grid distance below micron, conveniently obtains very high displacement measurement resolution and precision, simultaneously because the consistance of length direction is easy to obtain big measurement range.In like manner, other direction grid line generation diffraction interference is realized the synchro measure of another corresponding vertical direction displacement.
Fig. 1 is the cobasis face scanning workbench structural representation that adopts the two-dimentional synchronous measurement of above-mentioned bi-orthogonal diffraction optical grating system to constitute; Fig. 2 is the vertical view of worktable, and Fig. 3 is the A-A cut-open view of Fig. 2.Scanning workbench is made of bi-orthogonal diffraction optical grating metering system and common basal plane two-dimension displacement mechanism.
The common basal plane two-dimension displacement mechanism mainly comprises x axle motion module, y axle motion module and cobasis face platform 210.X axle motion module is driven by x shaft step motor 101, x shaft step motor 101 by motor fixing frame 102 together basal plane platform 210 be fixed together, x shaft step motor 101 is connected with ball-screw 107 by shaft coupling 103, leading screw hold-down support 104 is used for ball-screw 107 is fixed on cobasis face platform 210, feed screw nut 105 is connected with moving grating seat 5 by shaft flexible hinge 106 and web joint 108, thereby realizes the driving location of x axle motion module on the x direction.Y axle motion module is driven by y shaft step motor 201, y shaft step motor 201 is fixed together by motor fixing frame 202 and marble pedestal 1, y shaft step motor 201 is connected with ball-screw 207 by shaft coupling 203, leading screw hold-down support 204 is used for ball-screw 207 is fixed on marble pedestal 1, feed screw nut 205 by shaft flexible hinge 206 and web joint 208 together basal plane platform 210 be connected, thereby realize the driving location of y axle motion module on the y direction.
Referring to Fig. 3,4, x, four guide rails of y both direction are installed on the cobasis face platform 210, make that the spigot surface of both direction is in the same plane, and Fig. 4 is a cobasis face rail mounting structure synoptic diagram.X axle left side line slideway 109a is the basic rack of x direction, the side reference field of its guide rail is by behind the positioning step side reference field of last cobasis face platform 210, on the prefastened reference plane that fixes on cobasis face platform 210 of screw, screwing force should not be too big, can make the guide rail bottom surface together the reference plane of basal plane platform 210 just engage and get final product, compress guide rail with guide rail clip 110 then, the side reference field that makes guide rail is the positioning step reference side fluid-tight engagement of basal plane platform 210 together, begin from the centre at last to tighten the mounting screw of guide rail to two ends, can obtain stabilized accuracy like this by chi sequence.After basic rack fixed, the right line slideway 109b of x axle was that benchmark comes adjustment to install with x axle left side line slideway 109a.Two guide rails of same y direction are that benchmark comes adjustment to install to guarantee the verticality of y traversing guide and x traversing guide with x axle left side line slideway 109a also.The slide block of two width of cloth guide rails of y direction and the fixing support rack of rigidity 2 are by screw retention together, fixing support rack 2 is fixing with marble pedestal 1 again, be fixed on the marble pedestal 1 thereby be equivalent to slide block, driven cobasis face platform 210 by guide rail and on the y direction, move.The non-reference side of fixing support rack 2 processes threaded hole, holds out against line slideway 209b behind the y axle by screw, thereby makes the y reference side of line slideway 209a and the reference side fluid-tight engagement of fixing support rack 2 forward, guarantees the depth of parallelism of two guide rails of y direction.Two guide rail slide blocks of x direction and moving grating seat 5 drive moving grating seat 5 moving on the x direction by slide block by screw retention together.The non-reference side of moving grating seat 5 processes threaded hole, holds out against the right line slideway 109b of x axle by screw, thereby makes the reference side of x axle left side line slideway 109a and the reference side of moving grating seat 5 combine closely, and guarantees the depth of parallelism of two guide rails of x direction.Object tables 3 is fixed on the moving grating seat 5, the motion of y traversing guide body drives cobasis face platform 210 and moves on the y direction, thereby drive x axle motion module moving on the y direction, the guide rail of x direction drives the moving motion of grating seat 5 on the x direction again, finally makes object tables 3 realize the two-dimensional scan campaign of cobasis face.X, y both direction all adopt the directly mode of location of stepper motor and precision ball screw, ball-screw by the leading screw hold-down support adopt an end fix an end freely supporting way be fixed on the workpiece, feed screw nut is connected by the shaft flexible hinge with movement parts, rigidity height on its guide direction, flexibility at other both direction is big, thereby reached high guiding accuracy, effectively avoided the agitation error of other both direction.The flatness error of two spigot surfaces is basic only to be determined by the elastic deformation of guide rail ball, thereby its object tables motion reference field error is much smaller than the object tables that is formed by stacking by the double-deck spigot surface reference field of doing exercises.
Referring to Fig. 6,7, two cross diffraction grating 11a, 11b of bi-orthogonal diffraction optical grating metering system are installed in respectively on quiet grating seat 4 and the moving grating seat 5.Quiet grating seat 4 adds two shim liner 6a, 6b and is fixedly mounted on the rigid mount 2 by beneath, adjusts quiet grating seat 4 and moving grating seat 5 keeping parallelisms.The specific implementation of lasing light emitter is: LASER Light Source 9 is fixed on 8 li in laser sleeve, and laser sleeve 8 one ends are processed inclined-plane at 45, and catoptron 12 is attached on the inclined-plane, and laser jacket casing 8 is fixedly mounted on the quiet grating seat 4 by laser supporting seat 7.Receiver is installed the bottom that flat board 10 is fixed on fixing support rack 2, and photelectric receiver then is installed in receiver and installs on dull and stereotyped 10.When collimation laser vertical incidence two-dimensional quadrature diffraction grating, will two respectively perpendicular to the direction generation diffraction of quadrature grid line, so adopt two two-dimensional quadrature diffraction grating that are parallel to each other, can realize that the two-dimension displacement in the parallel grating plane is measured.Quiet grating seat 4 is parallel to object tables 3 planes of scanning motion is fixed on the fixing support rack 2, the cross diffraction grating grid line on the quiet grating seat 4 is parallel to x and y direction of scanning respectively; Moving grating seat 5 is placed on the slide block of x axle line slideway, the cross diffraction grating grid line on the moving grating seat 5 respectively with quiet grating seat 4 on corresponding grid line parallel.Move when object tables 3 has the scanning of any direction in the plane of scanning motion, obtain during the diffraction interference information of same of two orthogonal directionss, bidirectional displacement and the position of reflection object tables 3 in the plane of scanning motion.Because it is same as orthogonal grating that the two-dimension displacement metering relies on, and has unified mete-wand.
The basic functional principle of this worktable is: computing machine sends the angular displacement output of displacement commands by controller control step motor, realizes the location of object tables on x, y two-dimensional directional by leading screw, guide rail kinematic train.Metering system detects the physical location of object tables in real time, and by carrying out feedback ratio in the input computing machine, computing machine constantly relatively sends adjusts instruction, realizes its two-dimensional localization precision of closed-loop control with detection signal.
Claims (1)
1. adopt the cobasis face scanning workbench of cross diffraction grating two dimension synchronous measurement system, comprise bi-orthogonal diffraction optical grating two dimension synchronous measurement system and common basal plane two-dimension displacement mechanism; The common basal plane two-dimension displacement mechanism comprises cobasis face platform (210), be equipped with on the cobasis face platform (210) a pair of x to the x of parallel placement to guide rail and a pair of y to the y of parallel placement to guide rail; The moving grating seat (5) of bi-orthogonal diffraction optical grating two dimension synchronous measurement system is installed in x on the slide block of guide rail, and moving grating seat (5) connects x to ball-screw (107), its at x to the drive lower edge of drive motor x to motion; Cobasis face platform (210) connects y to ball-screw (207), other have a fixing support rack (2) by connect y to the slide block of guide rail together basal plane platform (210) connect, cobasis face platform (210) at y to the drive lower edge of drive motor y to motion; Quiet grating seat (4) adds two shim liners and is fixedly mounted on the fixing support rack by beneath, and fixing support rack and marble pedestal are fixed; On the moving grating seat (5) object tables (3) is installed;
The two-dimentional synchronous measurement of described bi-orthogonal diffraction optical grating system, comprise quiet grating seat (4) and be positioned at its below moving grating seat (5), on quiet grating seat (4) and moving grating seat (5), be separately installed with first, second cross diffraction grating (the 11a, 11b), cross diffraction grating is the grating that is etched with two-way quadrature grid line, the workplace of first cross diffraction grating (11a) be positioned at second cross diffraction grating (11b) workplace directly over, the corresponding grid line of two gratings is parallel; Quiet grating seat (4) is provided with lasing light emitter, the workplace of light vertical incidence first cross diffraction grating (11a) that lasing light emitter sends, and be transmitted on the workplace of second cross diffraction grating (11b), finally received by a photelectric receiver.
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| CN2009102728402A CN101701803B (en) | 2009-11-21 | 2009-11-21 | Bi-orthogonal diffraction optical grating measuring system and cardinal plane-sharing scanning workbench constructed by same |
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| CN101701803B true CN101701803B (en) | 2011-07-20 |
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| CN103712603B (en) * | 2013-09-24 | 2016-03-23 | 哈尔滨工业大学 | Based on 3D vision pose measuring apparatus and the measuring method thereof of plane grating |
| CN103465043A (en) * | 2013-09-27 | 2013-12-25 | 苏州凯欧机械科技有限公司 | Novel precise positioning working platform driven by electromagnet in auxiliary way |
| CN104197856B (en) * | 2014-08-25 | 2017-12-01 | 华侨大学 | A kind of surface profile measurement workbench in place |
| CN105547184B (en) * | 2015-12-23 | 2018-12-07 | 华中科技大学 | A kind of flatness error measuring device and its two-dimensional scanning workbench |
| CN112254665B (en) * | 2020-09-09 | 2022-04-01 | 杭州电子科技大学 | High-precision digital circular division sensor, system and detection method |
| CN112066961B (en) * | 2020-09-15 | 2021-04-13 | 山东鑫诚精密机械有限公司 | Abbe error control system for precision measurement |
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