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CN101676436B - 表面处理方法 - Google Patents

表面处理方法 Download PDF

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Publication number
CN101676436B
CN101676436B CN200810304562XA CN200810304562A CN101676436B CN 101676436 B CN101676436 B CN 101676436B CN 200810304562X A CN200810304562X A CN 200810304562XA CN 200810304562 A CN200810304562 A CN 200810304562A CN 101676436 B CN101676436 B CN 101676436B
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Prior art keywords
surface treatment
treatment method
indium
coating
vacuum
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Expired - Fee Related
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CN101676436A (zh
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姜传华
张彬
熊刚
戴丰源
陈正雄
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Shenzhen Futaihong Precision Industry Co Ltd
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Shenzhen Futaihong Precision Industry Co Ltd
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Priority to CN200810304562XA priority Critical patent/CN101676436B/zh
Priority to US12/536,300 priority patent/US20100072058A1/en
Publication of CN101676436A publication Critical patent/CN101676436A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • B05D5/067—Metallic effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • B05D5/067—Metallic effect
    • B05D5/068—Metallic effect achieved by multilayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2350/00—Pretreatment of the substrate
    • B05D2350/60—Adding a layer before coating
    • B05D2350/65—Adding a layer before coating metal layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B2038/0052—Other operations not otherwise provided for
    • B32B2038/0092—Metallizing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2309/00—Parameters for the laminating or treatment process; Apparatus details
    • B32B2309/08—Dimensions, e.g. volume
    • B32B2309/10—Dimensions, e.g. volume linear, e.g. length, distance, width
    • B32B2309/105—Thickness
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2310/00—Treatment by energy or chemical effects
    • B32B2310/08—Treatment by energy or chemical effects by wave energy or particle radiation
    • B32B2310/0806—Treatment by energy or chemical effects by wave energy or particle radiation using electromagnetic radiation
    • B32B2310/0831—Treatment by energy or chemical effects by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/16—Drying; Softening; Cleaning
    • B32B38/162—Cleaning

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

本发明提供一种表面处理方法，其包括如下步骤：提供一塑料基体，并对该基体进行真空镀膜前处理；于该基体表面形成一具有电磁波传透功能的金色真空镀膜层；于该真空镀膜层表面喷涂一保护漆膜。该表面处理方法既可使塑料基体表面呈现高贵华丽的黄金色泽金属外观，又具有电磁波传透功能。

Description

表面处理方法
技术领域
本发明是关于一种表面处理方法，尤其是关于一种在塑料表面产生金色镀膜的表面处理方法。
背景技术
真空镀膜技术已广泛应用于各种产品外观装饰用途。真空镀膜为一种相对电镀来说更为环保的表面涂装方法，且可使产品外表产生高质感的金属外观效果，故可提升产品的外观竞争力和附加价值。然而就通讯产品而言，金属真空镀膜一般会屏蔽电磁波，故而会影响产品的通讯性能，所以目前金属真空镀膜还较少应用在通讯产品外观件上。
发明内容
有鉴于此，有必要提供一种可于塑料产品表面获得具有电磁波传透功能的金色镀膜的表面处理方法。
一种表面处理方法，其包括如下步骤：
提供一塑料基体，并对该基体进行真空镀膜前处理；
于该基体表面形成一具有电磁波传透功能的金色真空镀膜层；
于该真空镀膜层表面喷涂一保护漆膜。
上述表面处理方法通过在基体表面形成一具有黄金色泽且具有电磁波传透性能的真空镀膜层，然后于该真空镀膜层上喷涂该保护漆膜，使该基体既具有高贵的黄金色金属外观，又具有较佳的电磁波传透功能。
具体实施方式
本发明表面处理方法包括如下步骤：
首先，提供一塑料基体。
对基体进行相应的真空镀膜前处理。该前处理主要包括对基体进行去污清洗及为了增加基体表面附着力而进行的表面离子化处理，其具体步骤由后续所采用的具体的真空镀膜方法决定。
于该经前处理的基体表面形成一金属或非金属的真空镀膜层。该真空镀膜层具有黄金色泽，且具有电磁波传透功能。该真空镀膜层为一由单一的膜层组成，或者为多重膜层复合而成。
其后，于上述真空镀膜层表面喷涂一保护漆膜。该保护漆膜包括一中漆层及形成于该中漆层表面的面漆层。该中漆层可以为透明的，也可以根据需要可于该中漆层中添加有不同种类和比例的颜料，此时该中漆层便为半透明的。该中漆层可以为紫外光固化漆，也可以为聚氨酯漆及不饱和聚酯漆等一般热固化漆。该中漆层可提高后续面漆层的附着力。该面漆层具有较高的硬度以起到较好的表面保护作用。该面漆层为透明的紫外光固化漆。
可以理解，该保护漆膜也可以省略该中漆层而仅由该面漆层组成。此时，可根据需要直接于该面漆层中添加颜料，使该面漆层具有颜色而呈半透明状。
下面结合具体实施例对本发明作进一步说明。
第一实施例的表面处理方法包括如下步骤：提供一塑料基体；用含乙醇或异丙醇等有机溶剂的清洗液清洗基体表面，以去除基体表面油污，然后对基体进行离子清洗以使基体表面离子化，提高基体表面附着力，该离子清洗步骤可于一真空镀膜设备中进行；然后用真空反应式溅镀方式或反应式电弧放电法，以钛金属为靶材，氮气为反应气体，于基体表面形成一黄金色泽的氮化钛(TiN)镀层；之后于该氮化钛镀层表面喷涂一透明的中漆层，该中漆层为紫外光固化漆；最后于该中漆层表面喷涂一透明的紫外光固化面漆层。
第二实施例的表面处理方法包括如下步骤：提供一塑料基体；用含乙醇或异丙醇等有机溶剂的清洗液清洗基体表面，以去除基体表面油污，然后对基体进行离子清洗以使基体表面离子化，提高基体表面附着力，该离子清洗步骤可于一真空镀膜设备中进行；然后用真空溅镀方式，分别以金属铟及金属铬为靶材，于该基体表面先溅镀一金属铟膜，再于该金属铟膜表面溅镀一金属铬膜，其中该金属铟膜的厚度可以为90~110nm，该金属铬膜的厚度控制在20~40nm内，以保证其不会导电而使电磁波可以传透，该金属铬膜呈金黄色；最后于该金属铬膜表面喷涂一透明的紫外光固化面漆。
第三实施例的表面处理方法包括如下步骤：提供一塑料基体；用含乙醇或异丙醇等有机溶剂的清洗液清洗基体表面，以去除基体表面油污；用紫外光固化漆打一层底漆膜在基体上，厚度为2~30μ；然后用真空蒸镀方式，使用铟及铝两种靶材同时蒸镀，以于基体表面形成一黄金色的铟铝合金镀层，该铟铝合金镀层的厚度为100~800nm，其中铝与铟的重量含量比为1∶3~1∶6；再于该铟铝合金镀层表面喷涂一添加有色粉的半透明中漆层，该中漆层为紫外光固化漆；最后于该中漆层表面喷涂一透明的紫外光固化面漆。
上述表面处理方法通过对真空镀膜方法、靶材的选择及镀膜层厚度的控制，在基体表面形成一具有黄金色泽且具有电磁波传透性能的真空镀膜层，然后于该真空镀膜层上依次喷涂该透明或半透明的保护漆膜，使该基体既具有高贵的黄金色金属外观，又防止电磁波被屏蔽。

Claims (8)

1.一种表面处理方法，其包括如下步骤：
提供一塑料基体，并对该基体进行真空镀膜前处理；
于该基体表面形成一具有电磁波传透功能的、金色的真空镀膜层，该真空镀膜层为铟铝合金膜层；
于该铟铝合金膜层表面喷涂一保护漆膜。
2.如权利要求1所述的表面处理方法，其特征在于：该铟铝合金膜层的厚度为100～800nm，其中铝与铟的重量含量比为1∶3～1∶6。
3.如权利要求1所述的表面处理方法，其特征在于：该真空镀膜层通过真空蒸镀方式形成。
4.如权利要求1所述的表面处理方法，其特征在于：该表面处理方法还包括形成该铟铝合金膜层之前于该基体上涂敷一底漆膜，该底漆膜为紫外光固化漆。
5.如权利要求1所述的表面处理方法，其特征在于：该保护漆膜包括一透明或半透明的中漆层及形成于该中漆层表面的透明面漆层。
6.如权利要求5所述的表面处理方法，其特征在于：该半透明的中漆层中添加有不同种类和比例的颜料。
7.如权利要求1所述的表面处理方法，其特征在于：该保护漆膜由一透明或半透明的面漆层组成。
8.如权利要求5或7所述的表面处理方法，其特征在于：该面漆层由紫外光固化漆组成。
CN200810304562XA 2008-09-19 2008-09-19 表面处理方法 Expired - Fee Related CN101676436B (zh)

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US12/536,300 US20100072058A1 (en) 2008-09-19 2009-08-05 Process for surface treating plastic substrate

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