CN101419410B - Direct image exposure device - Google Patents
Direct image exposure device Download PDFInfo
- Publication number
- CN101419410B CN101419410B CN2008101684332A CN200810168433A CN101419410B CN 101419410 B CN101419410 B CN 101419410B CN 2008101684332 A CN2008101684332 A CN 2008101684332A CN 200810168433 A CN200810168433 A CN 200810168433A CN 101419410 B CN101419410 B CN 101419410B
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- CN
- China
- Prior art keywords
- exposure
- luminophor
- photohead
- image exposure
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
- Facsimile Heads (AREA)
Abstract
The invention claims a direct image exposure device, characterized in that an exposure head assembly (1) has several exposure heads (10, 11, 12, 13) arranged parallel in a space W at a sub-scan direction Y; an exposure table (5) may move along the sub-scan direction Y under the exposure head assembly 1, may remove a printed circuit board (90) on the exposure table (5) under the exposure heads (10, 11, 12, 13), and may continuously expose the printed circuit board (90) by the exposure heads (10, 11, 12, 13); the exposure heads (10, 11, 12, 13) are provided with an array of LED (20) linearly arranged with the same space P; the LED (20) is arranged with space d at a main scan direction X among the exposure heads (10, 11, 12, 13), by which a same position of the sub-scan direction Y is repeatedly exposed, thereby implementing exposure of high position precision.
Description
Technical field
The present invention relates to image directly is exposed to the through image exposure device on object.
Background technology
The through image exposure device utilize ultraviolet laser light source and polygon mirror (list of references 1 and 2) or utilize the ultraviolet light that sends from LASER Light Source or high-pressure mercury vapour pipe and the combination (list of references 3 and 4) of digital micro-mirror device (DMD, digital micro mirror device) by image exposure on the exposure object such as printed circuit board (PCB).
The exposure object Linear ground scan laser (main sweep) that the former is moving to sub scanning direction by LASER Light Source being carried out to open/close polygon mirror.By semicondcutor laser unit is carried out to direct switch, or by acousto-optic modulator (AOM), solid state laser is carried out to analog switch, carry out switching manipulation.
The latter does not carry out the switch of light source and controls, but controls the arrival situation of light with respect to exposure object as the inclination that DMD is controlled in main sweep, and on sub scanning direction the moving exposure object.
List of references 1 Japanese Unexamined Patent Application Publication 2004-523101;
List of references 2 TOHKEMY 2000-338432;
List of references 3 Japan special permission 324248;
List of references 4 TOHKEMY 2000-93624.
Use the method for polygon mirror have along with exposure station away from the main sweep center on exposure object the shortcoming of the degradation of exposing.And, because polygon mirror causes the exposure wider width, it is larger that device becomes, the maintenance of installing is become to very difficult, this can cause the dirt problems in operation.
Use the exposure area of the method for DMD to be limited in the approximately scope from tens nm to 100nm of each DMD according to resolution, and for the extended exposure width, the exposing unit of a plurality of DMD of having need to be set, or need to and carry out towards main scanning direction moving exposure unit repeatedly subscan.Also the optical devices that comprise a plurality of lens need to be set between DMD and exposure object.
And above-mentioned two methods device used is very complicated and expensive.
The objective of the invention is to solve the problems referred to above of prior art.
Summary of the invention
Through image exposure device of the present invention comprises: the exposure desk that exposure object is installed; A plurality of photoheads that be arranged in parallel in one direction; A plurality of luminophors that exposure light is provided of line spread on other directions perpendicular to a described direction; Mobile described photohead and/or described exposure desk any part of described exposure object is positioned to the mobile device of the ad-hoc location that described luminophor can be exposed in one direction; The privileged site of the described exposure object of wherein by the exposure light sent from described luminophor, described mobile device being determined is exposed.For example, described exposure object is to want the plate of P.e.c..
About another aspect of the present invention, through image exposure device of the present invention comprises: the exposure desk that exposure object is installed; A plurality of photoheads that be arranged in parallel in one direction; A plurality of luminophors that exposure light is provided of line spread on other directions perpendicular to a described direction; Mobile described photohead and/or described exposure desk any part of described exposure object is positioned to the mobile device of the ad-hoc location that described luminophor can be exposed in one direction; Wherein, between described photohead, the position of described luminophor is offset specific distance d on described other directions.
The preferred implementation of described through image exposure device also comprises switch and the switch control device regularly of controlling described luminophor, wherein said mobile device on a described direction relative to and move continuously described photohead and/or described exposure desk, by in gauge tap and switch timing, irradiating the exposure light sent from described luminophor, by the described exposure object of specific pattern exposure on the described exposure desk with respect to described photohead continuous moving.
Through image exposure device of the present invention comprises the luminophor such as LED of line spread, and draws described pattern by each luminophor of switch on main scanning direction X.On the described exposure desk moved, for example exposure object of printed circuit board (PCB) is installed on the sub scanning direction Y vertical with main scanning direction X, the mobile scanning of carrying out on sub scanning direction Y of described exposure desk, can directly expose arbitrary graphic pattern on described exposure object.
Through image exposure device of the present invention does not have Mechanical Moving on main scanning direction X, and the photohead assembly only has optical devices or the photohead assembly for assembling image not need this optical devices.And described photohead assembly can arrive several millimeters near described exposure object, and can make equipment miniaturization, thereby is easy to safeguard.Described photohead assembly can be lengthened corresponding to the width of exposure object, and the width of the exposure object of several parts can be adapted to have.
Be subject to the impact of LED electrode, the shape of distortion may appear in the output pattern of LED, yet exposure has been eliminated the impact of output pattern and made the high-quality exposure become possibility repeatedly.And, can avoid the impact of the positional precision of described photohead assembly.
Described photohead assembly generally has 600DPI, 1200DPI and 2400DPI, and can carry out the exposure of the live width suitable with spacing P and gap length (L/S).Yet P can not obtain sufficient positional precision with this spacing.
Setting of the present invention has with a plurality of photohead assemblies of the luminophors such as the spaced LED of gap d (N).Suppose the 1/N that gap d is LED spacing P, and this device is when making exposure object mobile on sub scanning direction Y, to the isolated LED of gap P/N, carrying out switch control, exposure object is carried out to N exposure, then exposure object a bit on, all with gap P/N, move on main scanning direction X and sub scanning direction Y and repeat N
2Inferior exposure.Operation of the present invention can be with the live width suitable with spacing P and gap length and positional precision is brought up to the 1/N of spacing P.
The accompanying drawing explanation
Fig. 1 shows an embodiment of the invention perspective diagram.
Fig. 2 shows the further explanatory drawings of the photohead assembly 1 of an embodiment of the invention.
Fig. 3 shows the key diagram of the operation of an embodiment of the invention.
Fig. 4 shows the schematic block diagram of an embodiment of the invention.
Fig. 5 shows the key diagram of the irradiation pattern of LED.
Fig. 6 shows the key diagram of exposure data.
Fig. 7 shows the 3D figure that irradiates simulation.
Fig. 8 shows the key diagram of L shaped pattern data.
Fig. 9 shows the contour map of L shaped irradiation simulation.
Figure 10 shows the key diagram of the data of correction.
Figure 11 shows the contour map of the irradiation simulation of correction.
Embodiment
Referring now to accompanying drawing, the present invention is described.Fig. 1 and 2 shows the embodiment of through image exposure of the present invention.
Through image exposure device A has pedestal 6, along main scanning direction X, photohead assembly 1 is set thereon, and the printed circuit board (PCB) on exposure desk 5 90 is set to move to sub scanning direction Y.
The luminophor of for example LED by switch photohead assembly 1 carries out the main sweep of through image exposure, by moving exposure platform 5, carries out subscan.
Along main scanning direction X, each photohead 10,11,12,13 is set, along sub scanning direction Y with the interval W the equated photohead 10,11,12,13 that be arranged in parallel.
Exposure desk 5 can move towards sub scanning direction Y below photohead assembly 1, can below photohead 10,11,12,13, transfer the printed circuit board (PCB) 90 on exposure desk 5, and by photohead 10,11,12,13 continuous exposure printed circuit board (PCB)s 90.
Substitute exposure desk 5, photohead assembly 1 can be movably, and, as long as exposure desk 5 and photohead assembly 1 relatively move on sub scanning direction Y, exposure desk 5 and photohead assembly 1 can be all movably.
Photohead 10,11,12,13 has the array of LED20, as on main scanning direction X with the luminophor of constant spacing P line spread, and each LED20 sends the light with specific wavelength that exposure needs.General ultraviolet light is used for exposure, but can use the other light sources that sends other wavelength as required.And, can use the other light sources except LED20.
LED20 is arranged between photohead 10,11,12,13 with interval d on main scanning direction X.Interval d means with following formula: d=P/N (quantity that N is photohead) carries out about N by interval d on main scanning direction X and sub scanning direction Y
2Exposure is carried out in inferior irradiation.
As mentioned above, exposure desk 5 relatively moves towards sub scanning direction Y under photohead 10,11,12,13, and the exposure light by photohead 10,11,12,13 is exposed to the printed circuit board (PCB) 90 of installing on it.The LED20 of photohead 10,11,12,13 with spacing d arrangement, repeatedly exposes by the same position on 10,11,12,13 couples of sub scanning direction Y of photohead on main scanning direction X, thereby can realize the exposure of high position precision.
Fig. 3 shows the state of exposure.Fig. 3 (a) shows by the exposure status on the printed circuit board (PCB) 90 of photohead 10 exposures, (b) shows the exposure status that the same position on the 11 couples of sub scanning direction Y of photohead by having the LED20 separated with spacing d is exposed.Equally, by photohead 12 and 13, exposed continuously, and (c) and state (d) are provided.Mobile interval d on sub scanning direction Y and repeatedly carry out this exposure, obtain complete exposure.Can correspondingly to LED20, carry out switch with pattern and draw any pattern.
Can be according to the quantity of definite photoheads 10,11,12,13 such as power of time shutter, LED20.Present embodiment comprises four photoheads 10,11,12,13, but 10 photoheads are arranged usually.
As mentioned above because repeatedly exposed at same position, the power stage of LED20 can be by the part to tens of the luminous required energy density of being exposed/mono-once.
Present embodiment has photohead position regulator 15, for adjusting the position of photohead assembly 1, photohead position regulator 15 moves up and down photohead assembly 1 and according to the Focussing LED20 of photohead assembly 1 and the distance (being generally several millimeters) between printed circuit board (PCB) 90.Can on main scanning direction X and sub scanning direction Y, adjust photohead assembly 1.
Exposure desk 5 has position regulator 15, and for adjusting the position of exposure desk 5, and exposure desk 5 can be adjusted position on main scanning direction X and on the sense of rotation on x-y plane.Can save the adjusting gear on sense of rotation by the rotation exposure data.
Fig. 4 shows the block diagram of present embodiment.
Control through image exposure device A by controller 30, and controller 30 is also controlled each LED20 of photohead assembly 1 by LED driver 21, to open and close each LED20 according to specific pattern to be drawn, by this pattern exposure on printed circuit board (PCB) 90.
Store pattern to be drawn in pattern memory 40, controller 30 reads specific pattern according to instruction.
Controller 30 has the switch luminous timing correcting device 31 regularly that can revise LED20, and the luminous intensity correcting device 32 that can revise luminous intensity.
The output detector 22 that comprises camera head etc. detects actual luminous position and the luminous intensity of LED20, and detected value is sent to controller 30.Controller 30 detects the position deviation of LED20 according to the actual luminous position detected, luminous timing correcting device 31 is according to the luminous timing of described position deviation correction LED20, with the position deviation on compensation sub scanning direction Y.
Utilize luminous timing correcting device 31, can correct the position deviation of LED20 on the Y of direction of scanning, and can compensate machine error.
The luminous intensity of each LED20 of luminous intensity values correction that luminous intensity correcting device 32 detects according to output detector 22, exported uniformly from LED20.By luminous intensity correcting device 32, luminance deviation that can compensation LED 20.
Control photohead position regulator 15, upright position and the position main scanning direction X and sub scanning direction Y on of photohead position regulator 15 for adjusting photohead assembly 1 by controller 30.
Controller 30 is controlled mobile device 50 and controls the movement of exposure desk 5 on sub scanning direction Y.Control exposure desk 5 in order to just in time before the through image exposure starts, complete and accelerate and move with constant speed in exposure process.Likely cause in practice the translational speed error, controller 30 detects amount of movement Correction and Control timing.
Position regulator 51 for adjusting position on main scanning direction X and sense of rotation.
Fig. 5 shows the irradiation figure of the LED20 used in simulation, has wherein used 10 LED array of photohead assembly 1, and irradiation position be spaced apart 1/10 of spacing P.
Fig. 6 shows irradiation pattern, and its data are drawn the perpendicular line of 81 * 10 pixels for the center at 100 * 50 pixel regions.The black pixel of irradiating of indicating, the pixel that white expression will not irradiated.The spacing of pixel is 1/10 of spacing P.
Cumlative energy when Fig. 7 shows irradiation figure by Fig. 5 and irradiates the pattern of Fig. 6.Half that suppose Fig. 7 height is the energy that exposure needs, and obviously can draw the corresponding pattern with Fig. 6 by exposure repeatedly.
Present embodiment also comprises lines device for thinning 33, at this, will explain this device.Through image exposure method of the present invention is by repeatedly exposing and carry out energy accumulation as mentioned above, and the problem that may exist is by the lines chap that exposure is drawn repeatedly, particularly in L shaped part and small arc-shaped position.
Fig. 8 shows the pattern that comprises L shaped part, and Fig. 9 shows the result of simulation.The pattern data at the L shaped part of lines device for thinning 33 refinement before exposure and small arc-shaped place, avoid thick lines.
Figure 10 shows the data that lines device for thinning 33 is revised, and Figure 11 shows the result of simulation.
The problem that can solve in L shaped part and the lines chap of small arc-shaped place by lines device for thinning 33 as mentioned above.
Claims (6)
1. a through image exposure device, this through image exposure device comprises:
The exposure desk of exposure object is installed;
A plurality of photoheads that be arranged in parallel in one direction;
On other direction perpendicular to a described direction with a plurality of luminophors that exposure light is provided of specific distance P line spread;
Mobile described photohead and/or described exposure desk any part of described exposure object is positioned to the mobile device of the ad-hoc location that described luminophor can be exposed on a described direction;
Control the control device of the switch of described luminophor; Wherein
Between described photohead, the position of described luminophor is offset specific distance d on described other direction, the 1/N that wherein said specific distance d is described spacing P, and the N number that is described a plurality of photoheads,
By the exposure light sent from luminophor, described exposure object is exposed,
Wherein, this through image exposure device is when making described exposure object mobile on a described direction, to the isolated described luminophor of gap P/N, carrying out switch control, described exposure object is carried out to N exposure, then described exposure object a bit on, all with gap P/N, move on described other direction and a described direction and repeat N
2Inferior exposure.
2. through image exposure device as claimed in claim 1, wherein,
The same position on a described direction carries out many times exposures to described exposure object for the exposure light sent by the described luminophor from a photohead and other exposure light of sending from the described luminophor of other photohead.
3. as claim 1 or 2 described through image exposure devices, this through image exposure device also comprises:
Control the switch control device regularly of described luminophor.
4. as claim 1 or 2 described through image exposure devices, this through image exposure device also comprises:
Control switch and the switch control device regularly of described luminophor; Wherein
Described mobile device on a described direction relative to and move continuously described photohead and/or described exposure desk, and
In the switch of controlling described luminophor and switch timing, irradiate the exposure light sent from described luminophor, thereby by the described exposure object of specific pattern exposure on the described exposure desk with respect to described photohead continuous moving.
5. as claim 1 or 2 described through image exposure devices, this through image exposure device also comprises:
Control the control device of the output of described luminophor.
6. as claim 1 or 2 described through image exposure devices, this through image exposure device also comprises:
Revise in advance the correcting device of the pattern on described exposure object to be exposed.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007278784 | 2007-10-26 | ||
| JP2007-278784 | 2007-10-26 | ||
| JP2007278784A JP2009109550A (en) | 2007-10-26 | 2007-10-26 | Direct writing exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101419410A CN101419410A (en) | 2009-04-29 |
| CN101419410B true CN101419410B (en) | 2013-12-04 |
Family
ID=40490470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008101684332A Expired - Fee Related CN101419410B (en) | 2007-10-26 | 2008-10-07 | Direct image exposure device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2009109550A (en) |
| KR (1) | KR20090042711A (en) |
| CN (1) | CN101419410B (en) |
| DE (1) | DE102008050547A1 (en) |
| TW (1) | TW200919122A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5165731B2 (en) * | 2010-06-30 | 2013-03-21 | 東京エレクトロン株式会社 | Local exposure apparatus and local exposure method |
| JP5470236B2 (en) * | 2010-12-22 | 2014-04-16 | 東京エレクトロン株式会社 | Local exposure method and local exposure apparatus |
| JP5451798B2 (en) * | 2011-03-15 | 2014-03-26 | 東京エレクトロン株式会社 | Local exposure method and local exposure apparatus |
| DE102012016178B3 (en) * | 2012-08-16 | 2013-08-29 | Forschungszentrum Jülich GmbH | Method for optical transmission of a structure into a recording medium |
| JP5298236B2 (en) * | 2012-12-19 | 2013-09-25 | 東京エレクトロン株式会社 | Local exposure apparatus and local exposure method |
| CN103331988B (en) * | 2013-06-19 | 2015-02-18 | 汪海洋 | Plate-making method of flexible printing plate and main exposure device |
| EP2871525A3 (en) * | 2013-11-08 | 2015-09-23 | Limata GmbH | Lithography exposure device for lithographic exposure with single or multi-level laser project units with one or more wavelengths |
| US10488762B1 (en) * | 2018-06-29 | 2019-11-26 | Applied Materials, Inc. | Method to reduce data stream for spatial light modulator |
| CN112130422B (en) * | 2020-09-02 | 2022-11-18 | 合肥芯碁微电子装备股份有限公司 | Direct-writing exposure machine |
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| CN1501171A (en) * | 2002-11-15 | 2004-06-02 | ��ʿ��Ƭ��ʽ���� | Exposure device |
| CN1550876A (en) * | 2003-05-06 | 2004-12-01 | ��ʿ��Ƭ��ʽ���� | Projection exposing device |
| CN1766736A (en) * | 2004-04-30 | 2006-05-03 | 富士胶片株式会社 | Photolithography method and apparatus |
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| JPH0580524A (en) * | 1991-09-25 | 1993-04-02 | Nikon Corp | Photoresist pattern direct plotting device |
| JP3052587B2 (en) * | 1992-07-28 | 2000-06-12 | 日本電気株式会社 | Exposure equipment |
| JPH11147326A (en) * | 1997-11-17 | 1999-06-02 | Dainippon Screen Mfg Co Ltd | Image-recording apparatus |
| JP2000093624A (en) | 1998-09-18 | 2000-04-04 | Sanyo Electric Co Ltd | Pachinko game system |
| JP2000338432A (en) * | 1999-05-31 | 2000-12-08 | Dainippon Screen Mfg Co Ltd | Laser exposure device and its method |
| JP2000355121A (en) * | 1999-06-15 | 2000-12-26 | Asahi Optical Co Ltd | Light amount control method by VF value in multi-beam drawing recording apparatus |
| JP4543487B2 (en) * | 2000-03-16 | 2010-09-15 | 富士ゼロックス株式会社 | Lighting method of optical printer head |
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| JP2007033764A (en) * | 2005-07-26 | 2007-02-08 | Fujifilm Holdings Corp | Pattern manufacturing system, exposure apparatus, and exposure method |
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| JP2007171610A (en) * | 2005-12-22 | 2007-07-05 | Fujifilm Corp | Pattern formation method |
| JP2007298603A (en) * | 2006-04-28 | 2007-11-15 | Shinko Electric Ind Co Ltd | Drawing device and drawing method |
| JP4934459B2 (en) * | 2007-02-23 | 2012-05-16 | 株式会社 日立ディスプレイズ | Design apparatus, direct drawing exposure apparatus and direct drawing exposure system using them |
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2007
- 2007-10-26 JP JP2007278784A patent/JP2009109550A/en active Pending
-
2008
- 2008-08-28 TW TW97132899A patent/TW200919122A/en unknown
- 2008-09-18 KR KR1020080091528A patent/KR20090042711A/en not_active Withdrawn
- 2008-10-06 DE DE200810050547 patent/DE102008050547A1/en not_active Withdrawn
- 2008-10-07 CN CN2008101684332A patent/CN101419410B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1501171A (en) * | 2002-11-15 | 2004-06-02 | ��ʿ��Ƭ��ʽ���� | Exposure device |
| CN1550876A (en) * | 2003-05-06 | 2004-12-01 | ��ʿ��Ƭ��ʽ���� | Projection exposing device |
| CN1766736A (en) * | 2004-04-30 | 2006-05-03 | 富士胶片株式会社 | Photolithography method and apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090042711A (en) | 2009-04-30 |
| CN101419410A (en) | 2009-04-29 |
| JP2009109550A (en) | 2009-05-21 |
| TW200919122A (en) | 2009-05-01 |
| DE102008050547A1 (en) | 2009-04-30 |
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