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CN101408405B - Optical aspheric measuring system and its platform - Google Patents

Optical aspheric measuring system and its platform Download PDF

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CN101408405B
CN101408405B CN2007101520713A CN200710152071A CN101408405B CN 101408405 B CN101408405 B CN 101408405B CN 2007101520713 A CN2007101520713 A CN 2007101520713A CN 200710152071 A CN200710152071 A CN 200710152071A CN 101408405 B CN101408405 B CN 101408405B
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陈俊贤
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Industrial Technology Research Institute ITRI
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Abstract

本发明的光学式非球面测量系统包含测量支架、干涉光路系统和光学式非球面测量平台。所述光学式非球面测量平台包含有偏摆旋转机构和半径调整机构。偏摆旋转机构用于提供测量时的偏摆运动,以使所述干涉光路系统得以扫描待测物的整个曲面。半径调整机构用于调整待测物的球心位置,用以与所述偏摆旋转机构的中心位置相重合。

Figure 200710152071

The optical aspheric surface measurement system of the present invention comprises a measurement bracket, an interference optical path system and an optical aspheric surface measurement platform. The optical aspheric surface measurement platform comprises a yaw rotation mechanism and a radius adjustment mechanism. The yaw rotation mechanism is used to provide a yaw motion during measurement so that the interference optical path system can scan the entire curved surface of the object to be measured. The radius adjustment mechanism is used to adjust the spherical center position of the object to be measured so as to coincide with the center position of the yaw rotation mechanism.

Figure 200710152071

Description

光学式非球面测量系统及其平台 Optical aspheric measuring system and its platform

技术领域technical field

本发明涉及一种测量系统,且明确地说,涉及一种光学式非球面测量系统。The present invention relates to a measurement system, and in particular to an optical aspheric surface measurement system.

背景技术Background technique

在非球面镜片或模仁的测量中,常规技术是以接触的方式来测量表面的形貌与粗糙度,其中最为人所诟病者便是探针接触测量时所产生的刮痕。模仁的刮痕必须重新再用加工机来修整;而镜片如果有刮痕,便无法使用而必须报废,所以在做法上多是以抽验的方式,再辅以QC的手法来推估合格率,无法做到产品的全检。这对于镜片或模仁厂商来说都是时间的损耗与潜在风险的增加。In the measurement of aspherical lenses or mold cores, the conventional technology is to measure the surface shape and roughness by contact, and the most criticized one is the scratches produced by the probe contact measurement. Scratches on the mold core must be repaired again with a processing machine; and if the lens is scratched, it cannot be used and must be scrapped. Therefore, most of the methods are random inspections, supplemented by QC methods to estimate the pass rate , It is impossible to do a full inspection of the product. This is a waste of time and an increase in potential risks for lens or mold core manufacturers.

对于接触式测量产生的问题,可以用光干涉技术来加以克服。光干涉技术由于其快速、精细度高以及为非破坏性检测等优点,普遍地被应用在平面测量上。但是,在测量像球面或非球面这样表面倾斜度高的形貌,则会因为收光角度的限制而无法测量。这是应用光干涉技术于球面或非球面上所需要克服的重要问题之一。The problems caused by contact measurement can be overcome by optical interferometry. Optical interferometry is widely used in plane measurement due to its advantages of fast, high precision and non-destructive detection. However, when measuring topography with high surface slopes such as spherical or aspherical surfaces, it cannot be measured due to the limitation of the light collection angle. This is one of the important problems to be overcome when applying light interference technology to spherical or aspherical surfaces.

关于光干涉技术应用在球面或非球面上的测量,美国专利2006/0290942揭露用可做偏摆和左右移动的测量探头来达到测量目的,其中待测物放置在一个只能做自体轴对称转动的旋转平台上。这样的设计对于测量凹陷的待测物是相当容易的,但是要测量凸出的待测物,由于摆动行程的加大且摆动轴心部位在测量头本体上,整个就会变成复杂且难以设计执行,且相对地成本上会高出许多。Regarding the measurement of optical interference technology applied to spherical or aspheric surfaces, US Patent 2006/0290942 discloses that a measuring probe that can be used for deflection and left and right movement can be used to achieve the purpose of measurement. on the rotating platform. Such a design is quite easy to measure a concave DUT, but to measure a protruding DUT, due to the increase of the swing stroke and the center of the swing axis on the body of the measuring head, the whole will become complicated and difficult. Design implementation, and relatively cost will be much higher.

市售的测角器(goniometer)通常被用来作为偏摆机构之用,但其偏摆角度与方向有固定限制,且现在市面上多样的非球面镜片随着镜头越做越短,曲面斜率越来越大,让这样的以测角器为主的偏摆机构无法满足测量需要。The commercially available goniometer is usually used as a deflection mechanism, but its deflection angle and direction have fixed restrictions, and the various aspheric lenses on the market now become shorter and shorter as the lens becomes shorter. It is getting bigger and bigger, so that such a goniometer-based yaw mechanism cannot meet the measurement needs.

发明内容Contents of the invention

本发明的光学式非球面测量平台的实施例包含偏摆旋转机构和半径调整机构。所述偏摆旋转机构提供测量时的偏摆运动,并能让固定测量探头测量到偏摆直径两端之间的曲面范围。所述半径调整机构用于调整待测物的球心位置与所述偏摆旋转机构的中心位置间相重合,且所述半径调整机构固定在所述偏摆旋转机构之上。An embodiment of the optical aspheric measuring platform of the present invention includes a yaw rotation mechanism and a radius adjustment mechanism. The yaw rotation mechanism provides yaw movement during measurement, and enables the fixed measuring probe to measure the range of the curved surface between the two ends of the yaw diameter. The radius adjustment mechanism is used to adjust the coincidence between the position of the center of the object to be measured and the center position of the yaw rotation mechanism, and the radius adjustment mechanism is fixed on the yaw rotation mechanism.

本发明的光学式非球面测量系统的实施例包含测量支架、干涉光路系统和光学式非球面测量平台。所述干涉光路系统包含测量探头,用以测量所述偏摆旋转机构的偏摆直径两端之间的曲面范围。所述测量支架用以固定所述光学式非球面测量平台和所述干涉光路系统,并用于调整所述测量探头与待测物的相对距离。The embodiment of the optical aspheric surface measurement system of the present invention includes a measurement bracket, an interference optical path system and an optical aspheric surface measurement platform. The interference optical path system includes a measuring probe for measuring the range of the curved surface between two ends of the yaw diameter of the yaw rotation mechanism. The measurement bracket is used to fix the optical aspheric surface measurement platform and the interference optical system, and to adjust the relative distance between the measurement probe and the object to be measured.

附图说明Description of drawings

图1显示本发明的光学式非球面测量平台的具体实施例;Fig. 1 shows the specific embodiment of the optical aspheric measuring platform of the present invention;

图2显示本发明的光学式非球面测量系统的具体实施例;以及Fig. 2 shows the specific embodiment of optical type aspheric measuring system of the present invention; And

图3显示本发明的光学式非球面测量系统的干涉光路系统的具体实施例。FIG. 3 shows a specific embodiment of the interference optical path system of the optical aspheric surface measuring system of the present invention.

具体实施方式Detailed ways

图1显示本发明的光学式非球面测量平台的具体实施例。球面或非球面待测物101放置在元件镜头座102上,且用固定测量探头测量其表面形貌。所述元件镜头座102则固定在所述半径调整机构103上。由于如果用光干涉的技术测量待测物的曲面,在固定探头的条件下,必须让待测物能够做偏摆运动,如此才可以克服因为曲面造成收光角度的限制而无法测量的问题。这里所谓的偏摆是指对待测物所做的旋转动作,其最大范围可达正负90度。可是,不同的待测物会有不同的曲率半径,或者其外型有可能会是凸出或凹陷等,这些情形都会让待测物的圆心不在偏摆轴心上。如果待测物呈偏心状态,随着待测物的转动,测量表面会偏离原来测量位置而产生失焦的情况。半径调整机构103就是用来上下调整待测物的圆心到偏摆的轴心之上,使得测量不同曲面的待测物时仍能让偏摆的曲面保持在一定范围之内,以避免失焦的情形发生。图1中的半径调整机构是Z轴方向可调整的平移台,如果测量凸出的非球面,则所述平移台需要往上位移调整;若是测量凹入的非球面,则要往下位移调整。同时为了减少测量不同曲率半径的待测物所要花费在校正圆心位置的时间,可以在半径调整机构103上加装刻度尺104。FIG. 1 shows a specific embodiment of the optical aspheric surface measurement platform of the present invention. A spherical or aspheric object to be tested 101 is placed on the element lens holder 102, and its surface topography is measured with a fixed measuring probe. The element lens holder 102 is fixed on the radius adjustment mechanism 103 . If the curved surface of the object to be measured is measured by light interference technology, under the condition of fixing the probe, the object to be measured must be able to do yaw movement, so as to overcome the problem of being unable to measure due to the limitation of the receiving angle caused by the curved surface. The so-called deflection here refers to the rotation action of the object under test, and its maximum range can reach plus or minus 90 degrees. However, different objects to be tested have different radii of curvature, or their shapes may be protruding or concave, etc., all of which will make the center of the object to be tested not on the yaw axis. If the object under test is in an eccentric state, as the object under test rotates, the measurement surface will deviate from the original measurement position, resulting in out-of-focus situations. The radius adjustment mechanism 103 is used to adjust the center of the object to be tested up and down above the axis of the yaw, so that when measuring objects with different curved surfaces, the yaw curved surface can still be kept within a certain range to avoid out of focus situation occurs. The radius adjustment mechanism in Figure 1 is a translation platform that can be adjusted in the Z-axis direction. If a convex aspheric surface is measured, the translation platform needs to be adjusted upward; if a concave aspheric surface is measured, it must be adjusted downward. . At the same time, in order to reduce the time spent on correcting the position of the center of the circle when measuring objects to be tested with different curvature radii, a scale 104 can be added to the radius adjustment mechanism 103 .

所述半径调整机构103固定在偏摆旋转机构105上,所述偏摆旋转机构105使所述半径调整机构103偏摆,进而带动待测物的偏摆运动。偏摆旋转机构105是马达所带动的可旋转机构或者是精密旋转平台(Rotation stage),其可使待测物件产生测量所需的偏摆运动,这使得球面或非球面的任一部分都可以测量得到。由于是马达带动旋转的缘故,所以可让固定测量探头扫过正负90度之内的曲面范围。所述马达可使用侧立旋转马达,可做360度旋转,如此便没有旋转角度的限制;而在不用拆装待测物和重新做校正的情形下,可测量到整个圆的外形。测量前除了前述Z轴方向的偏差需要做校正外,待测物对测量探头的光轴位置上的偏差也需要加以校正。偏摆旋转机构105可以用连结结构(例如L型转接板106)将其固定于位置校正机构107上。如此便可以用较精密的装置(如X精密平移台或者XY精密平移台等)来将待测物圆心对准于测量探头的光轴上。The radius adjustment mechanism 103 is fixed on the yaw rotation mechanism 105, and the yaw rotation mechanism 105 makes the radius adjustment mechanism 103 yaw, thereby driving the yaw movement of the object to be tested. The yaw rotation mechanism 105 is a rotatable mechanism driven by a motor or a precision rotation stage (Rotation stage), which can cause the object to be measured to produce the yaw motion required for measurement, which makes it possible to measure any part of a spherical or aspheric surface get. Because the rotation is driven by the motor, the fixed measuring probe can be swept across the range of the curved surface within plus or minus 90 degrees. The motor can use a side-standing rotary motor, which can rotate 360 degrees, so there is no limit to the rotation angle; and the entire circle shape can be measured without disassembling and re-calibrating the object to be tested. In addition to the above-mentioned deviation in the Z-axis direction that needs to be corrected before measurement, the deviation of the object to be measured on the optical axis position of the measuring probe also needs to be corrected. The yaw rotation mechanism 105 can be fixed on the position correction mechanism 107 by a connecting structure (such as an L-shaped adapter plate 106 ). In this way, a relatively precise device (such as an X precision translation stage or an XY precision translation stage, etc.) can be used to align the circle center of the object to be measured on the optical axis of the measuring probe.

图2显示本发明的光学式非球面测量系统的具体实施例。光学式非球面测量系统包含干涉光路系统201、光学式非球面测量平台202和测量支架204,其中所述干涉光路系统201包含测量探头203。所述光路系统201架设在所述测量支架204上,其内建的直线滑轨可以在Z轴方向对待测物进行对焦的动作。FIG. 2 shows a specific embodiment of the optical aspheric surface measurement system of the present invention. The optical aspheric measurement system includes an interference optical system 201 , an optical aspheric measurement platform 202 and a measurement bracket 204 , wherein the interference optical system 201 includes a measurement probe 203 . The optical path system 201 is erected on the measurement bracket 204, and its built-in linear slide rail can focus on the object to be measured in the direction of the Z axis.

图3显示本发明的光学式非球面测量系统的干涉光路系统的具体实施例。所述干涉光路系统201的架构是以Linnik光路为基础所发展而成的。所述干涉光路系统201包含分光镜301、CCD 302、氦氖激光303、全波长减光镜(Neutral Density Filter)304、50X物镜305、针孔(Pin Hole)306、第一聚光镜307、光圈(Stop)308、第二聚光镜309、二个10X物镜310以及参考曲面311。所述干涉光路系统201在CCD上产生干涉条纹,借此测量所述待测物的表面形貌。操作所述测量系统的步骤如下:将待测物放置在光学式非球面测量平台202上的元件镜头座102上,并将所述待测物固定住;以干涉光路系统201的光轴为准,调整位置校正机构107,使得待测物的中心位置被光轴所覆照;调整半径调整机构103,使所述待测物的球心位置与所述偏摆旋转机构105的中心位置相重合;利用所述测量支架204中的调整机构,调整所述干涉光路系统201的焦点于所述待测物上,并产生干涉条纹,进而取得所述待测物中心区域的形貌数据;调整所述偏摆旋转机构105以顺逆时针方向旋转,让干涉光路系统201取得所述待测物边缘区域的形貌数据;以及通过计算机软件的图像迭合运算,取得所述待测物表面的所有数据。FIG. 3 shows a specific embodiment of the interference optical path system of the optical aspheric surface measuring system of the present invention. The architecture of the interference optical system 201 is developed based on the Linnik optical path. Described interference optical path system 201 comprises spectroscope 301, CCD 302, helium-neon laser 303, full-wavelength light reducing mirror (Neutral Density Filter) 304, 50X objective lens 305, pinhole (Pin Hole) 306, the first condenser lens 307, aperture ( Stop) 308, a second condenser lens 309, two 10X objective lenses 310 and a reference curved surface 311. The interference optical system 201 generates interference fringes on the CCD, thereby measuring the surface topography of the object to be tested. The steps of operating the measurement system are as follows: place the object to be measured on the element lens holder 102 on the optical aspheric measuring platform 202, and fix the object to be measured; the optical axis of the interference optical path system 201 shall prevail , adjust the position correction mechanism 107 so that the center position of the object to be measured is covered by the optical axis; adjust the radius adjustment mechanism 103 so that the center position of the object to be measured coincides with the center position of the yaw rotation mechanism 105 ; Using the adjustment mechanism in the measurement bracket 204, adjust the focus of the interference optical system 201 on the object to be measured, and generate interference fringes, and then obtain the topography data of the center area of the object to be measured; adjust the The yaw rotation mechanism 105 rotates clockwise, allowing the interference optical system 201 to obtain the topography data of the edge region of the object to be measured; data.

本发明的技术内容和技术特点已揭示如上,然而所属领域的技术人员仍可能基于本发明的教示和揭示而作种种不背离本发明精神的替换和修饰。因此,本发明的保护范围应不限于实施例所揭示者,而应包括各种不背离本发明的替换和修饰,并为所附权利要求书所涵盖。The technical content and technical features of the present invention have been disclosed above, but those skilled in the art may still make various replacements and modifications based on the teaching and disclosure of the present invention without departing from the spirit of the present invention. Therefore, the protection scope of the present invention should not be limited to those disclosed in the embodiments, but should include various replacements and modifications that do not depart from the present invention, and are covered by the appended claims.

Claims (15)

1. optical type aspherical measuring table is characterized in that comprising:
The beat rotating mechanism is used to provide the motion of the beat when measuring, so that fixation measuring probe energy measurement is to the curved surface scope between the beat diameter two ends;
The radius adjusting mechanism is fixed on the described beat rotating mechanism, is used to adjust the sphere center position of determinand and the center of described beat rotating mechanism coincides; And
Be fixed in the element lens mount on the described radius adjusting mechanism.
2. optical type aspherical measuring table according to claim 1, it is characterized in that further comprising the position correction mechanism and the connecting structure of one dimension or two dimension, the wherein said connecting structure described position correction mechanism that is used for locking makes determinand can do horizontal adjustment.
3. optical type aspherical measuring table according to claim 2 is characterized in that wherein said connecting structure comprises L type card extender.
4. optical type aspherical measuring table according to claim 2 is characterized in that wherein said position correction mechanism comprises the accurate translation stage of XY.
5. optical type aspherical measuring table according to claim 1 is characterized in that wherein said radius adjusting mechanism comprises the accurate translation stage of single shaft.
6. optical type aspherical measuring table according to claim 1 is characterized in that the side of wherein said radius adjusting mechanism further comprises rule, in order to reduce the eccentric correction time.
7. optical type aspherical measuring table according to claim 1 is characterized in that wherein said beat rotating mechanism comprises the motor of rotatable 360 degree, and described motor comprises edge-on rotation motor.
8. optical type aspherical measuring system is characterized in that comprising:
The optical type aspherical measuring table has the beat rotating mechanism, and wherein said optical type aspherical measuring table can be adjusted the sphere center position of determinand and the center of described beat rotating mechanism coincides;
The optical interference circuit system comprises measuring sonde, in order to the curved surface scope between the beat diameter two ends of measuring described beat rotating mechanism;
Measurement bracket in order to fixing described optical type aspherical measuring table and described optical interference circuit system, and is used to adjust the relative distance of described measuring sonde and determinand;
The radius adjusting mechanism is fixed on the described beat rotating mechanism, is used to adjust the center of the sphere center position of determinand to described beat rotating mechanism; And
Be fixed in the element lens mount on the described radius adjusting mechanism.
9. optical type aspherical measuring system according to claim 8, it is characterized in that wherein said optical type aspherical measuring table further comprises the position correction mechanism and the connecting structure of one dimension or two dimension, the wherein said connecting structure described position correction mechanism that is used for locking makes the sphere center position of described determinand be adjustable on the optical axis of described optical interference circuit system.
10. optical type aspherical measuring system according to claim 9 is characterized in that wherein said connecting structure comprises L type card extender.
11. optical type aspherical measuring system according to claim 9 is characterized in that wherein said position correction mechanism comprises the accurate translation stage of XY.
12. optical type aspherical measuring system according to claim 8 is characterized in that wherein said radius adjusting mechanism comprises the accurate translation stage of single shaft.
13. optical type aspherical measuring system according to claim 8 is characterized in that the side of wherein said radius adjusting mechanism further comprises rule, in order to reduce the eccentric correction time.
14. optical type aspherical measuring system according to claim 8 is characterized in that the used motor of wherein said beat rotating mechanism comprises edge-on rotation motor, and rotatable 360 degree of described motor.
15. optical type aspherical measuring system according to claim 8 is characterized in that the framework of wherein said optical interference circuit system comprises the interference of light framework that is developed based on the Linnik light path.
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CN1529120A (en) * 2003-10-08 2004-09-15 ����ʦ����ѧ Small online radial shear interferometer and its method for measuring aspheric surface
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