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CN101328576B - A vacuum coating device and an atmospheric rotary table used for the device - Google Patents

A vacuum coating device and an atmospheric rotary table used for the device Download PDF

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CN101328576B
CN101328576B CN200710075141XA CN200710075141A CN101328576B CN 101328576 B CN101328576 B CN 101328576B CN 200710075141X A CN200710075141X A CN 200710075141XA CN 200710075141 A CN200710075141 A CN 200710075141A CN 101328576 B CN101328576 B CN 101328576B
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moving mechanism
turntable
vacuum coating
atmospheric
workpiece
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CN101328576A (en
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赵斌
张惊雷
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SHENZHEN CSG DISPLAY DEVICES CO Ltd
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CSG Holding Co Ltd
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Abstract

The invention discloses vacuum coating equipment, which comprises a vacuum coating chamber used to carry out vacuum coating of a workpiece, an atmosphere return cabin and an atmosphere turntable, wherein an inlet of the atmosphere return cabin is close to an outlet of the vacuum coating chamber, while an outlet of the atmosphere return cabin is close to an inlet of the vacuum coating chamber; the atmosphere turntable is close to the outlet of the vacuum coating chamber and the inlet of the atmosphere return cabin; moreover, the atmosphere turntable comprises a rotary mechanism, a third movable mechanism used to carry a workpiece support from the vacuum coating chamber to the atmosphere turntable and a fourth movable mechanism used to carry the workpiece support from the atmosphere turntable to the inside of the atmosphere return cabin; and the third movable mechanism and the fourth movable mechanism rotates along with the rotary mechanism so as to exchange positions. The vacuum coating equipment adopts the atmosphere turntable to reclaim coated workpiece, and has small land occupation, quick reclaiming tempo and low requirements on transmission accuracy and sealing so as to be beneficial to equipment maintenance.

Description

一种真空镀膜设备及用于该设备的大气回转台 A vacuum coating device and an atmospheric rotary table used for the device

技术领域technical field

本发明涉及一种真空镀膜设备及用于该设备的大气回转台。The invention relates to a vacuum coating device and an atmospheric rotary table used for the device.

背景技术Background technique

由于在对玻璃等一些产品进行镀膜时需要保证工作环境的净化,因此,现有的镀膜生产线例如ITO连续真空镀膜生产线的布置方式通常是采用从净化操作间装片,经过真空镀膜设备完成镀膜,再返回净化操作间卸片。因净化操作间的高成本,通常将装片和卸片都设计在一个净化操作间,这要求工件在镀膜后折回装片的操作间,相应的真空镀膜设备也都是折回式的。现有的折回式真空镀膜设备主要包括两种方式:(1)真空双面镀膜+出口平移+大气回架;(2)真空单面镀膜+真空旋转回架。Since it is necessary to ensure the purification of the working environment when coating some products such as glass, the layout of the existing coating production line such as the ITO continuous vacuum coating production line is usually to load the film from the purification operation room and complete the coating through the vacuum coating equipment. Then return to the purification operation room to unload the film. Due to the high cost of the purification operation room, the loading and unloading of the wafers are usually designed in the same purification operation room, which requires the workpiece to be folded back to the loading operation room after coating, and the corresponding vacuum coating equipment is also folded back. The existing fold-back vacuum coating equipment mainly includes two methods: (1) vacuum double-sided coating + outlet translation + atmospheric return frame; (2) vacuum single-sided coating + vacuum rotary return frame.

对于第一种方式,其真空镀膜设备包括真空双面镀膜室、平移回收台和大气回仓;待镀工件如玻璃基片从净化操作间装入真空双面镀膜室,工件架装载待镀工件在真空镀膜室中移动,真空双面镀膜室对待镀工件进行镀膜,当镀膜结束,待镀工件架移动到平移回收台并与平移回收台上的工件架相接,已镀膜的工件从真空镀膜室转移到平移回收台,平移回收台中装载了已镀膜的工件的工件架从与真空镀膜室相接的位置平移到与大气回仓相接的位置,大气回仓不需要设计为真空环境,但需要是高净化环境,已镀膜的工件从平移回收台转移到大气回仓并从大气回仓折回到同一净化操作间卸片。For the first method, its vacuum coating equipment includes a vacuum double-sided coating chamber, a translational recovery table and an atmospheric return warehouse; the workpiece to be coated, such as a glass substrate, is loaded into the vacuum double-sided coating chamber from the purification operation room, and the workpiece rack is loaded with the workpiece to be coated Moving in the vacuum coating chamber, the vacuum double-sided coating chamber coats the workpiece to be coated. When the coating is completed, the workpiece rack to be coated moves to the translation recovery table and connects with the workpiece rack on the translation recovery table. The coated workpiece is taken from the vacuum coating chamber. Transfer to the translation recovery table, where the workpiece rack loaded with coated workpieces is translated from the position connected to the vacuum coating chamber to the position connected to the atmospheric return chamber. The atmospheric return chamber does not need to be designed as a vacuum environment, but it needs It is a high-purification environment, and the coated workpiece is transferred from the translation recovery table to the atmospheric return bin, and then turned back from the atmospheric return bin to the same purification operation room for unloading.

对于第二种方式,其真空镀膜设备包括第一真空镀膜室、第二真空镀膜室和真空回转台,待镀工件从净化操作间进入第一真空镀膜室开始镀膜并在其中移动,完成镀膜工序的一部分,到达真空回转台后,真空回转台将工件从第一真空镀膜室转移到与第一真空镀膜室大致平行但运行方向相反的第二真空镀膜室,继续镀膜,工件在第二真空镀膜室中镀膜后返回到净化操作间。For the second method, its vacuum coating equipment includes a first vacuum coating chamber, a second vacuum coating chamber and a vacuum rotary table. The workpiece to be coated enters the first vacuum coating chamber from the purification operation room to start coating and move in it to complete the coating process. After arriving at the vacuum rotary table, the vacuum rotary table transfers the workpiece from the first vacuum coating chamber to the second vacuum coating chamber which is roughly parallel to the first vacuum coating chamber but opposite to the running direction, and continues to coat. The workpiece is in the second vacuum coating chamber. After coating in the chamber, return to the purification operation room.

以上两种方式各有其缺陷,第一种方式由于采用平移回收台,其不但占地面积大,而且生产节拍较低,通常都大于100s/pitch。第二种方式采用真空回转台,真空回转台需要真空环境,且和第一真空镀膜室、第二真空镀膜室都需要真空密封,所以其对传动精度及真空密封要求很高,增加了制造和维护难度。The above two methods have their own defects. The first method not only occupies a large area due to the use of a translation recovery table, but also has a low production cycle, usually greater than 100s/pitch. The second method uses a vacuum rotary table, which requires a vacuum environment, and requires vacuum sealing with the first vacuum coating chamber and the second vacuum coating chamber, so it has high requirements for transmission accuracy and vacuum sealing, which increases manufacturing and difficult to maintain.

发明内容Contents of the invention

为了解决上述技术问题,本发明提出了一种真空镀膜设备及用于该设备的大气回转台,不仅提高了生产节拍,而且降低了传动精度和密封要求,更利于维护。In order to solve the above technical problems, the present invention proposes a vacuum coating equipment and an atmospheric rotary table used for the equipment, which not only improves the production cycle, but also reduces the transmission accuracy and sealing requirements, and is more convenient for maintenance.

为了实现上述目的,本发明采用了如下技术方案:In order to achieve the above object, the present invention adopts the following technical solutions:

一种真空镀膜设备,包括用于对工件进行真空镀膜的真空镀膜室、位于真空镀膜室内用于将用于承载工件的工件架运输且穿过真空镀膜室的第一移动机构、大气回仓和位于大气回仓内用于将用于承载工件的工件架运输且穿过大气回仓的第二移动机构,所述第一移动机构和第二移动机构的运行方向相反,且大气回仓的入口与真空镀膜室的出口靠近,大气回仓的出口与真空镀膜室的入口靠近,还包括大气回转台,所述大气回转台靠近真空镀膜室的出口和大气回仓的入口,所述大气回转台包括旋转机构、用于将工件架从真空镀膜室运输到大气回转台上的第三移动机构和用于将工件架从大气回转台上运输到大气回仓内的第四移动机构,所述第三移动机构和第四移动机构跟随旋转机构旋转以交换位置;所述第三移动机构在静止状态下位于第一移动机构的运行方向上,所述第四移动机构在静止状态下位于第二移动机构的运行反方向上,即所述第三移动机构在静止状态下位于将第一移动机构沿其运行延伸的轨道上,所述第四移动机构在静止状态下位于将第二移动机构沿其运行的反方向延伸的轨道上。A vacuum coating device, comprising a vacuum coating chamber for vacuum coating a workpiece, a first moving mechanism located in the vacuum coating chamber for transporting a workpiece rack for carrying workpieces through the vacuum coating chamber, an atmospheric return bin and The second moving mechanism located in the atmospheric return bin is used to transport the workpiece rack for carrying workpieces through the atmospheric return bin. The first moving mechanism and the second moving mechanism operate in opposite directions, and the entrance of the atmospheric return bin It is close to the exit of the vacuum coating chamber, and the outlet of the atmospheric return chamber is close to the entrance of the vacuum coating chamber. It also includes an atmospheric rotary table, which is close to the exit of the vacuum coating chamber and the entrance of the atmospheric return chamber. The atmospheric rotary table It includes a rotating mechanism, a third moving mechanism for transporting the workpiece frame from the vacuum coating chamber to the atmospheric rotary table, and a fourth mobile mechanism for transporting the workpiece frame from the atmospheric rotary table to the atmospheric return bin. The third moving mechanism and the fourth moving mechanism rotate with the rotating mechanism to exchange positions; the third moving mechanism is located in the running direction of the first moving mechanism in a static state, and the fourth moving mechanism is located in a second moving direction in a static state. The operation of the mechanism is in the opposite direction, that is, the third moving mechanism is located on a track extending along which the first moving mechanism runs in a static state, and the fourth moving mechanism is located in a static state along which the second moving mechanism runs on the track extending in the opposite direction.

本发明的优选实施中,所述旋转机构包括旋转转台,所述第三移动机构和第四移动机构分别固定在旋转转台的两相对的侧边上,所述大气回转台还包括位于旋转转台上方或上边缘、与第三移动机构和第四移动机构分别对应的两个固定机构。In a preferred implementation of the present invention, the rotating mechanism includes a rotating turntable, the third moving mechanism and the fourth moving mechanism are respectively fixed on two opposite sides of the rotating turntable, and the atmospheric turntable also includes Or the upper edge, and two fixing mechanisms respectively corresponding to the third moving mechanism and the fourth moving mechanism.

所述旋转机构还包括转动马达和转盘轴承,所述转盘轴承与转动马达的输出端耦合,所述旋转转台与转盘轴承紧固在一起。The rotation mechanism also includes a rotation motor and a turntable bearing, the turntable bearing is coupled with the output end of the rotation motor, and the rotary turntable and the turntable bearing are fastened together.

所述第三移动机构和第四移动机构分别包括驱动马达、由驱动马达驱动旋转的至少两个摩擦驱动轮,所述摩擦驱动轮固定在旋转转台的外侧面;所述固定机构为用于容纳工件架上边缘的倒“U”型轨道。The third moving mechanism and the fourth moving mechanism respectively include a driving motor and at least two friction driving wheels driven and rotated by the driving motor, and the friction driving wheels are fixed on the outer surface of the rotating turntable; the fixing mechanism is used for accommodating Inverted "U" track on the upper edge of the workpiece holder.

优选的,所述倒“U”型轨道为磁轨道,所述工件架上边缘设有与磁轨道磁性相反的磁条。Preferably, the inverted "U" track is a magnetic track, and a magnetic strip opposite to the magnetic track is provided on the upper edge of the workpiece holder.

所述磁轨道的两端为喇叭口,所述大气回转台还包括位于旋转转台上的、用于固定磁轨道的磁轨道支架。Both ends of the magnetic track are bell mouths, and the atmospheric turntable also includes a magnetic track support on the rotary turntable for fixing the magnetic track.

进一步的,所述大气回转台还包括与摩擦驱动轮位于相同外侧面的位置传感器,所述每一侧面的位置传感器至少有两个。Further, the atmospheric turntable further includes position sensors located on the same outer surface as the friction drive wheel, and there are at least two position sensors on each side.

所述旋转机构的旋转中心分别到所述真空镀膜室的出口和大气回仓的入口的最短距离大于旋转机构的边缘相对于旋转中心的最大径向距离。The shortest distance from the rotation center of the rotation mechanism to the outlet of the vacuum coating chamber and the inlet of the atmospheric return chamber is greater than the maximum radial distance between the edge of the rotation mechanism and the rotation center.

所述真空镀膜设备还包括与所述大气回转台结构相同的工件装卸台,所述工件装卸台靠近真空镀膜室的入口和大气回仓的出口。The vacuum coating equipment also includes a workpiece loading and unloading table with the same structure as the atmospheric rotary table, and the workpiece loading and unloading table is close to the entrance of the vacuum coating chamber and the exit of the atmospheric return chamber.

本发明还提出了一种用于真空镀膜设备的大气回转台,包括旋转机构、第三移动机构和第四移动机构,所述第三移动机构在静止状态下位于将第一移动机构沿其运行方向延伸的轨道上,用于将工件架从真空镀膜室运输到大气回转台上,所述第四移动机构在静止状态下位于将第二移动机构沿其运行的反方向延伸的轨道上,用于将工件架从大气回转台上运输到大气回仓内,所述第三移动机构和第四移动机构跟随旋转机构旋转以交换位置;所述旋转机构包括旋转转台,所述第三移动机构和第四移动机构分别位于所述旋转转台的相对的两侧。The present invention also proposes an atmospheric turntable for vacuum coating equipment, including a rotating mechanism, a third moving mechanism and a fourth moving mechanism, the third moving mechanism is located at a position where the first moving mechanism runs along it in a static state On the track extending in the direction of the second moving mechanism, it is used to transport the workpiece frame from the vacuum coating chamber to the atmospheric turntable, and the fourth moving mechanism is located on the track extending in the opposite direction to the running of the second moving mechanism in a static state. When the workpiece frame is transported from the atmospheric turntable to the atmospheric return bin, the third moving mechanism and the fourth moving mechanism rotate with the rotating mechanism to exchange positions; the rotating mechanism includes a rotating turntable, the third moving mechanism and The fourth moving mechanism is respectively located on two opposite sides of the rotary turntable.

所述旋转机构包括转动马达、转盘轴承和旋转转台,所述转盘轴承与转动马达的输出端耦合,所述旋转转台与转盘轴承紧固在一起;所述第三移动机构和第四移动机构分别固定在旋转转台的两相对的侧边上,所述大气回转台还包括位于旋转转台上方、与第三移动机构和第四移动机构分别对应的两个固定机构。The rotary mechanism includes a rotary motor, a turntable bearing and a rotary turntable, the turntable bearing is coupled to the output end of the rotary motor, and the rotary turntable and the turntable bearing are fastened together; the third moving mechanism and the fourth moving mechanism are respectively It is fixed on two opposite sides of the rotary turntable, and the atmospheric turntable also includes two fixing mechanisms located above the rotary turntable and respectively corresponding to the third moving mechanism and the fourth moving mechanism.

所述第三移动机构和第四移动机构分别包括驱动马达、由驱动马达驱动旋转的至少两个摩擦驱动轮,所述摩擦驱动轮固定在旋转转台的外侧面;所述固定机构为用于容纳工件架上边缘的倒“U”型磁轨道。The third moving mechanism and the fourth moving mechanism respectively include a driving motor and at least two friction driving wheels driven and rotated by the driving motor, and the friction driving wheels are fixed on the outer surface of the rotating turntable; the fixing mechanism is used for accommodating Inverted "U" shaped magnetic track on the upper edge of the workpiece holder.

所述大气回转台还包括与摩擦驱动轮位于相同外侧面的位置传感器,所述每一侧面的位置传感器至少有两个。The atmospheric turntable also includes position sensors located on the same outer surface as the friction drive wheel, and there are at least two position sensors on each side.

与现有技术相比,本发明的有益效果是:Compared with prior art, the beneficial effect of the present invention is:

本发明采用大气回转台回收已镀膜的工件,使用回转方式的回收台占地面积小,回收节拍快,可以在大气环境工作,而不需要在真空环境,对传动精度与密封要求不高,有利于设备的维护。The invention adopts the atmospheric rotary table to recycle the coated workpiece. The rotary recovery table has a small footprint and a fast recovery cycle. It can work in an atmospheric environment instead of a vacuum environment. It does not require high transmission accuracy and sealing. Conducive to equipment maintenance.

工件装卸台采用与大气回转台相同的结构,使操作员不用变换位置就可以完成工件的装卸,简化了操作,提高了工作效率。The workpiece loading and unloading table adopts the same structure as the atmospheric rotary table, so that the operator can complete the loading and unloading of the workpiece without changing the position, which simplifies the operation and improves the work efficiency.

附图说明Description of drawings

图1是本发明具体实施方式的真空镀膜设备的结构示意图;Fig. 1 is the structural representation of the vacuum coating equipment of the specific embodiment of the present invention;

图2是本发明具体实施方式的大气回转台的立体结构图;Fig. 2 is a three-dimensional structure diagram of an atmospheric turntable according to a specific embodiment of the present invention;

图3是本发明具体实施方式的大气回转台的分解结构图;Fig. 3 is an exploded structure diagram of an atmospheric turntable according to a specific embodiment of the present invention;

图4-A是本发明具体实施方式的大气回转台的正视图;Fig. 4-A is the front view of the atmospheric turntable of the specific embodiment of the present invention;

图4-B是本发明具体实施方式的大气回转台的侧视图;Fig. 4-B is a side view of an atmospheric turntable according to a specific embodiment of the present invention;

图4-C是本发明具体实施方式的大气回转台的俯视图;Fig. 4-C is a top view of an atmospheric turntable according to a specific embodiment of the present invention;

图5是本发明具体实施方式的真空镀膜设备的立体结构图。Fig. 5 is a three-dimensional structure diagram of a vacuum coating device according to a specific embodiment of the present invention.

具体实施方式Detailed ways

下面结合附图对本发明的方案和效果做进一步详细的说明。The solutions and effects of the present invention will be further described in detail below in conjunction with the accompanying drawings.

实施例一:Embodiment one:

请参看图1和图5,本发明的真空镀膜设备包括工件装卸台1、真空镀膜室2、大气回转台3和大气回仓4,工件装卸台1安置在净化操作间内,靠近真空镀膜室2的入口和大气回仓3的出口;大气回仓4的入口与真空镀膜室2的出口靠近,出口与真空镀膜室2的入口靠近,大气回仓4和真空镀膜室2可平行并排设置,大气回转台3靠近真空镀膜室2的出口和大气回仓4的入口。在工件装卸台1处,待镀工件如玻璃基片被安装在工件架上,工件架带着工件从工件装卸台1移入真空镀膜室2,工件架装载待镀工件在真空镀膜室2中移动,真空镀膜室2对待镀工件进行镀膜,当镀膜结束,工件架移动到大气回转台3,已镀膜的工件从真空镀膜室2转移到大气回转台3,大气回转台3将装载了已镀膜工件的工件架从与真空镀膜室2出口位置旋转到大气回仓4入口位置,然后装载了已镀膜工件的工件架被从大气回转台3转移到大气回仓4并从大气回仓4回到净化操作间的工件装卸台1卸片。大气回仓4中不断充入净化气体使其相对于外界环境为高压状态,从而可将灰尘排出,保证大气回仓4内的净化状态。Please refer to Fig. 1 and Fig. 5, the vacuum coating equipment of the present invention comprises workpiece loading and unloading platform 1, vacuum coating chamber 2, atmospheric rotary table 3 and atmospheric return warehouse 4, and workpiece loading and unloading platform 1 is placed in the purification operation room, near the vacuum coating chamber 2 and the outlet of the atmospheric return chamber 3; the entrance of the atmospheric return chamber 4 is close to the outlet of the vacuum coating chamber 2, and the outlet is close to the entrance of the vacuum coating chamber 2. The atmospheric return chamber 4 and the vacuum coating chamber 2 can be arranged side by side in parallel, The atmospheric turntable 3 is close to the exit of the vacuum coating chamber 2 and the entrance of the atmospheric return chamber 4 . At the workpiece loading and unloading platform 1, the workpiece to be plated, such as a glass substrate, is installed on the workpiece frame, and the workpiece frame moves into the vacuum coating chamber 2 from the workpiece loading and unloading platform 1 with the workpiece, and the workpiece frame is loaded with the workpiece to be plated. The vacuum coating chamber 2 coats the workpiece to be coated. When the coating is finished, the workpiece rack moves to the atmospheric rotary table 3, and the coated workpiece is transferred from the vacuum coating chamber 2 to the atmospheric rotary table 3. The atmospheric rotary table 3 will be loaded with the coated workpiece. The workpiece rack rotates from the exit position of the vacuum coating chamber 2 to the inlet position of the atmospheric return bin 4, and then the workpiece rack loaded with coated workpieces is transferred from the atmospheric rotary table 3 to the atmospheric return bin 4 and returns to the purification operation from the atmospheric return bin 4 Between the workpiece loading and unloading table 1 unloading. The air return bin 4 is constantly filled with purified gas to make it in a high pressure state relative to the external environment, so that dust can be discharged to ensure the purification state in the air return bin 4 .

装载工件的工件架在真空镀膜室2和大气回仓4中的移动是借助于位于真空镀膜室2内的第一移动机构(附图未示出)和位于大气回仓4内的第二移动机构(附图未示出),第一移动机构和第二移动机构的运行方向相反,均采用现有技术的移动机构,例如可用马达驱动传送带从而使工件架随着传送带移动。或者用马达驱动沿真空镀膜室2和大气回仓4的轴向分布的转动轮,工件架直立在转动轮上,转动轮在马达驱动下转动,靠转动摩擦力带动工件架移动。The movement of the workpiece frame of loading the workpiece in the vacuum coating chamber 2 and the atmosphere return bin 4 is by means of the first moving mechanism (not shown in the accompanying drawings) in the vacuum coating chamber 2 and the second movement in the atmosphere return bin 4 Mechanism (not shown in the drawings), the running direction of the first moving mechanism and the second moving mechanism are opposite, all adopt the moving mechanism of the prior art, for example, the conveyor belt can be driven by a motor so that the workpiece holder moves with the conveyor belt. Or drive the rotating wheels along the axial distribution of the vacuum coating chamber 2 and the atmosphere back to the warehouse 4 with a motor, the workpiece frame is upright on the rotating wheel, and the rotating wheel rotates under the motor drive, and the workpiece frame is moved by the frictional force of rotation.

请参看图2、3、4-A、4-B和4-C,本发明的大气回转台3包括转台底座31、固定机构32,固定机构支架33、位置传感器34、传感器安装座35、旋转机构、第三移动机构和第四移动机构。旋转机构包括旋转转台361、转盘轴承362、轴承固定板363和转动马达364;轴承固定板363安置在转台底座31上,转盘轴承362固定安装在轴承固定板363上并与转动马达364的输出端耦合,旋转转台361安置在转盘轴承362上并与转盘轴承362紧固在一起;通过转动马达364输出旋转驱动力,转盘轴承362转动并带动旋转转台361在转台底座31上进行旋转。第三移动机构和第四移动机构分别位于旋转转台361的相对的两侧,第三移动机构在静止状态下位于真空镀膜室2中的第一移动机构沿其运行方向延伸的轨道上,第四移动机构在静止状态下位于大气回仓4中的第二移动机构沿其运行反方向延伸的轨道上。第三移动机构用于从真空镀膜室2中接收工件架并将工件架运输到第三移动机构上,第四移动机构用于位于其上的工件架运输并送入到大气回仓4中。当第三移动机构和第四移动机构随旋转转台361旋转180度后,第三移动机构和第四移动机构交换位置,原第三移动机构变为新的第四移动机构,将其上的工件架运输并送入到大气回仓4中,原第四移动机构变为新的第三移动机构,从真空镀膜室2中接收工件架。Please refer to Fig. 2, 3, 4-A, 4-B and 4-C, the atmosphere turntable 3 of the present invention comprises turntable base 31, fixing mechanism 32, fixing mechanism support 33, position sensor 34, sensor mount 35, rotating mechanism, the third mobile mechanism and the fourth mobile mechanism. The rotating mechanism comprises a rotating turntable 361, a turntable bearing 362, a bearing fixing plate 363 and a rotating motor 364; Coupling, the rotating turntable 361 is placed on the turntable bearing 362 and fastened together with the turntable bearing 362; the rotating drive force is output by the rotating motor 364, and the turntable bearing 362 rotates and drives the rotating turntable 361 to rotate on the turntable base 31. The 3rd moving mechanism and the 4th moving mechanism are respectively positioned at the opposite two sides of rotating turntable 361, and the 3rd moving mechanism is positioned at the track that the first moving mechanism in the vacuum coating chamber 2 extends along its running direction under static state, and the 4th moving mechanism The second moving mechanism in the air return bin 4 is located on a track extending in the opposite direction of its operation in a stationary state. The third moving mechanism is used to receive the workpiece frame from the vacuum coating chamber 2 and transport the workpiece frame to the third moving mechanism. After the third moving mechanism and the fourth moving mechanism rotate 180 degrees with the rotary turntable 361, the third moving mechanism and the fourth moving mechanism exchange positions, and the original third moving mechanism becomes a new fourth moving mechanism, and the workpiece on it The frame is transported and sent into the atmospheric return warehouse 4, and the original fourth moving mechanism becomes a new third moving mechanism to receive the workpiece frame from the vacuum coating chamber 2.

因大气回转台3需要旋转,所以大气回转台3不能紧靠真空镀膜室2和/或大气回仓4,大气回转台3的旋转中心分别到真空镀膜室2的出口和大气回仓4的入口的最短距离应大于旋转机构的边缘相对于旋转中心的最大径向距离,以保证大气回转台3旋转时不会接触或碰撞真空镀膜室2和大气回仓4。Because the atmospheric rotary table 3 needs to rotate, the atmospheric rotary table 3 cannot be close to the vacuum coating chamber 2 and/or the atmospheric return chamber 4, and the rotation center of the atmospheric rotary table 3 is respectively connected to the exit of the vacuum coating chamber 2 and the entrance of the atmospheric return chamber 4 The shortest distance should be greater than the maximum radial distance of the edge of the rotating mechanism relative to the center of rotation, so as to ensure that the atmospheric turntable 3 will not touch or collide with the vacuum coating chamber 2 and the atmospheric return chamber 4 when rotating.

第三移动机构和第四移动机构分别包括驱动马达371、驱动皮带372和摩擦驱动轮373,摩擦驱动轮373固定在旋转转台361的外侧面,呈“一”字形,摩擦驱动轮373的数目不限,可以是2、3、4个等等,通过驱动马达371的驱动,驱动皮带372可带动摩擦驱动轮373旋转。The 3rd moving mechanism and the 4th moving mechanism comprise driving motor 371, driving belt 372 and friction driving wheel 373 respectively, and friction driving wheel 373 is fixed on the outer surface of rotating turntable 361, is " one " font, and the number of friction driving wheel 373 is different The limit can be 2, 3, 4 and so on. Driven by the drive motor 371, the drive belt 372 can drive the friction drive wheel 373 to rotate.

固定机构支架33安装在旋转转台361上,其上安装有两个固定机构32,分别与第三移动机构和第四移动机构相对应;固定机构32用于容纳工件架上边缘,以使工件架直立在摩擦驱动轮373上而不会向两边歪倒。本实施例中,固定机构32为倒“U”型磁轨道,开口321为喇叭型,以防止工件架稍偏离轨道时,也能将工件架导入此轨道中,并将工件架矫正回轨道上。下面说明本发明的工作原理。The fixed mechanism support 33 is installed on the rotary turntable 361, and two fixed mechanisms 32 are installed on it, corresponding to the third mobile mechanism and the fourth mobile mechanism respectively; The fixed mechanism 32 is used to accommodate the upper edge of the workpiece holder, so that the workpiece holder Stand upright on the friction drive wheel 373 and can not tip over to both sides. In this embodiment, the fixing mechanism 32 is an inverted "U"-shaped magnetic track, and the opening 321 is a trumpet shape, so as to prevent the workpiece rack from being slightly off the track, the workpiece rack can also be guided into the track, and the workpiece rack can be corrected back on the track . The working principle of the present invention is explained below.

工件完成镀膜后,装载已镀膜工件的工件架从真空镀膜室2中被第一移动机构移出,然后转移到大气回转台3的第三移动机构,此时,工件架下边缘由第三移动机构中的第一个摩擦驱动轮373支撑,上边缘则进入到作为固定机构32的磁轨道中,工件架上方安装有与磁轨道磁性相反的磁条,通过磁性相斥,使得工件架能直立在摩擦驱动轮373上而不与磁轨道的任意一边相接触;这样可以使工件架在移动机构上移动时上边缘几乎没有摩擦,有利于工件架的移动。After the workpiece is coated, the workpiece rack loaded with the coated workpiece is moved out of the vacuum coating chamber 2 by the first moving mechanism, and then transferred to the third moving mechanism of the atmospheric rotary table 3. At this time, the lower edge of the workpiece rack is moved by the third moving mechanism The first friction driving wheel 373 in the support, the upper edge then enters into the magnetic track as the fixing mechanism 32, and the magnetic strip opposite to the magnetic track is installed above the workpiece holder, and the workpiece holder can stand upright on the The friction drive wheel 373 is not in contact with any one side of the magnetic track; this can make the upper edge almost no friction when the workpiece holder moves on the moving mechanism, which is conducive to the movement of the workpiece holder.

当工件架完全进入大气回转台3后,转动马达364驱动旋转转台361旋转,第三移动机构和第四移动机构跟随旋转机构旋转以交换位置使得已镀膜的工件从真空镀膜室2出口转移到大气回仓4的入口,然后以同样方法将已镀膜工件移入大气回仓4并返回到净化操作间中进行卸片;在第三移动机构和第四移动机构交换位置后,第三移动机构将已镀膜的工件移入大气回仓4的同时,第四移动机构可以继续从真空镀膜室2接收已镀膜的工件。After the workpiece rack has completely entered the atmospheric turntable 3, the rotating motor 364 drives the rotary turntable 361 to rotate, and the third moving mechanism and the fourth moving mechanism follow the rotating mechanism to rotate to exchange positions so that the coated workpiece is transferred from the outlet of the vacuum coating chamber 2 to the atmosphere Return to the entrance of the bin 4, and then move the coated workpiece into the atmosphere back bin 4 in the same way and return to the purification operation room for unloading; after the third moving mechanism and the fourth moving mechanism exchange positions, the third moving mechanism will have While the coated workpieces are moved into the atmospheric return bin 4, the fourth moving mechanism can continue to receive the coated workpieces from the vacuum coating chamber 2.

当然,本实施例中的固定机构32的形状并不限于倒“U”型,也可以是倒“V”型或倒“L”型等,开口也可以是其他形状,也不限定采用磁性轨道,也可采用一般轨道。Of course, the shape of the fixing mechanism 32 in this embodiment is not limited to the inverted "U" shape, it can also be an inverted "V" shape or an inverted "L" shape, etc. The opening can also be in other shapes, and the use of magnetic tracks is not limited. , general orbits can also be used.

实施例二:Embodiment two:

在实施例一的基础上,进一步增加了位置传感器34,位置传感器34与摩擦驱动轮373位于相同外侧面,通过传感器安装座35安装在旋转转台361上,其数目不限,可以是2、3、4个等等。位置传感器34用于检测工件架的移动位置,并将检测结果传送给PLC(可编程逻辑控制器,附图中未示出)由其根据检测结果控制马达旋转和停止。On the basis of Embodiment 1, a position sensor 34 is further added. The position sensor 34 and the friction drive wheel 373 are located on the same outer surface, and are installed on the rotary turntable 361 through the sensor mounting base 35. The number is not limited, and can be 2 or 3. , 4 and so on. The position sensor 34 is used to detect the moving position of the workpiece holder, and transmits the detection result to a PLC (programmable logic controller, not shown in the drawings), which controls the motor to rotate and stop according to the detection result.

第三移动机构和第四移动机构的摩擦驱动轮以四个为宜,每边可以设置两个位置传感器34。如果每边的四个摩擦驱动轮按照其运转的方向依次是第一摩擦驱动轮、第二摩擦驱动轮、第三摩擦驱动轮和第四摩擦驱动轮,对于第三移动机构来说,则第一个位置传感器设置在第一摩擦驱动轮的右侧,而第二个位置传感器设置在第四摩擦驱动轮的左侧,对于第四移动机构,则第一个位置传感器设置在第一摩擦驱动轮的左侧,而第二个位置传感器设置在第四摩擦驱动轮的右侧。当第三移动机构侧的第一个位置传感器感应到工件架移动过来时,则将工件架的位置信号传递给PLC,PLC控制驱动马达371输出相应的动力驱动摩擦驱动轮373转动,工件架依靠其与摩擦驱动轮之间的摩擦力向前移动。当第二个位置传感器感应到工件架的位置时,将信号传给PLC,PLC控制驱动马达371停止,摩擦驱动轮373停止转动,工件架也停止移动。同时此时PLC判断第四移动机构的第二个位置传感器是否感应到工件架移走,即判断前次旋转时从真空镀膜室2出口转移到大气回仓4入口的装载了已镀工件的工件架是否已经进入到大气回仓4,如果是则控制转动马达364转动,旋转转台361转动,第三移动机构和第四移动机构交换位置。It is advisable to have four friction drive wheels for the third moving mechanism and the fourth moving mechanism, and two position sensors 34 can be arranged on each side. If the four friction driving wheels on each side are the first friction driving wheel, the second friction driving wheel, the third friction driving wheel and the fourth friction driving wheel according to the direction of its operation, for the third moving mechanism, then the One position sensor is set on the right side of the first friction drive wheel, and the second position sensor is set on the left side of the fourth friction drive wheel. For the fourth movement mechanism, the first position sensor is set on the first friction drive wheel. The left side of the wheel, while the second position sensor is placed on the right side of the fourth friction drive wheel. When the first position sensor on the third moving mechanism side senses that the workpiece holder moves over, the position signal of the workpiece holder is transmitted to the PLC, and the PLC controls the drive motor 371 to output corresponding power to drive the friction drive wheel 373 to rotate, and the workpiece holder relies on The friction between it and the friction drive wheel moves it forward. When the second position sensor sensed the position of the workpiece rack, the signal was passed to the PLC, and the PLC controlled the driving motor 371 to stop, the friction drive wheel 373 stopped rotating, and the workpiece rack also stopped moving. At the same time, the PLC judges whether the second position sensor of the fourth moving mechanism senses that the workpiece rack is removed, that is, it judges the workpiece loaded with the coated workpiece that was transferred from the outlet of the vacuum coating chamber 2 to the inlet of the atmospheric return chamber 4 during the previous rotation. Whether the frame has entered the atmosphere back to the warehouse 4, if so, the control rotation motor 364 rotates, the rotary turntable 361 rotates, and the third mobile mechanism and the fourth mobile mechanism exchange positions.

实施例三:Embodiment three:

本实施例是基础实施例一或二基础上的进一步改进,即工件装卸台1采用与大气回转台3相同的结构,当装载有已镀膜工件的工件架移动到大气回仓4的出口时,进行移动进入到工件装卸台1上,工件装卸台1进行180度旋转,已镀膜工件的工件架转移到真空镀膜室2的入口处,操作员将已镀膜工件卸下,然后装上待镀膜的工件,待镀膜的工件被送入真空镀膜室2。本实施例使操作员不用变换位置就可以完成工件的装卸,简化了操作,提高了工作效率。This embodiment is a further improvement on the basis of the first or second basic embodiment, that is, the workpiece loading and unloading platform 1 adopts the same structure as the atmospheric rotary table 3. When the workpiece rack loaded with coated workpieces moves to the outlet of the atmospheric return bin 4, Move to the workpiece loading and unloading table 1, the workpiece loading and unloading table 1 rotates 180 degrees, the workpiece rack of the coated workpiece is transferred to the entrance of the vacuum coating chamber 2, the operator unloads the coated workpiece, and then installs the workpiece to be coated. The workpiece, the workpiece to be coated is sent into the vacuum coating chamber 2. In this embodiment, the operator can complete the loading and unloading of the workpiece without changing the position, which simplifies the operation and improves the working efficiency.

综上所述,本发明在真空镀膜设备中采用了大气回转台,不仅占地面积小,回收节拍快,回收节拍可达到60秒。同时大气回转方式因大气回转台和真空镀膜室、大气回仓之间不需要真空密封,所以对传动精度和密封要求较真空回转方式低,采用转盘轴承来完成回转,设备简单,成本低,有利于操作维护。并且装工件和卸工件可在同一个净化操作间,减少了净化操作间的成本,同时装卸工件可在同一个工位,提高了工作效率。In summary, the present invention adopts the atmospheric rotary table in the vacuum coating equipment, which not only occupies a small area, but also has a fast recycling cycle, which can reach 60 seconds. At the same time, the atmospheric rotary method does not require a vacuum seal between the atmospheric rotary table, the vacuum coating chamber, and the atmospheric return chamber, so the requirements for transmission accuracy and sealing are lower than that of the vacuum rotary method. The rotary table bearing is used to complete the rotation, and the equipment is simple and low in cost. Conducive to operation and maintenance. Moreover, the loading and unloading of workpieces can be performed in the same purification operation room, which reduces the cost of the purification operation room. At the same time, the loading and unloading of workpieces can be at the same station, which improves work efficiency.

以上内容是结合具体的优选实施方式对本发明所作的进一步详细说明,不能认定本发明的具体实施只局限于这些说明。对于本发明所属技术领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干简单推演或替换,都应当视为属于本发明的保护范围。The above content is a further detailed description of the present invention in conjunction with specific preferred embodiments, and it cannot be assumed that the specific implementation of the present invention is limited to these descriptions. For those of ordinary skill in the technical field of the present invention, without departing from the concept of the present invention, some simple deduction or replacement can be made, which should be regarded as belonging to the protection scope of the present invention.

Claims (13)

1.一种真空镀膜设备,包括用于对工件进行真空镀膜的真空镀膜室、位于真空镀膜室内用于将用于承载工件的工件架运输且穿过真空镀膜室的第一移动机构、大气回仓和位于大气回仓内用于将用于承载工件的工件架运输且穿过大气回仓的第二移动机构,所述第一移动机构和第二移动机构的运行方向相反,且大气回仓的入口与真空镀膜室的出口靠近,大气回仓的出口与真空镀膜室的入口靠近,其特征在于:还包括大气回转台,所述大气回转台靠近真空镀膜室的出口和大气回仓的入口,所述大气回转台包括旋转机构、用于将工件架从真空镀膜室运输到大气回转台上的第三移动机构和用于将工件架从大气回转台上运输到大气回仓内的第四移动机构,所述第三移动机构和第四移动机构跟随旋转机构旋转以交换位置;所述第三移动机构在静止状态下位于将第一移动机构沿其运行延伸的轨道上,所述第四移动机构在静止状态下位于将第二移动机构沿其运行的反方向延伸的轨道上。1. A vacuum coating equipment, comprising a vacuum coating chamber for carrying out vacuum coating to a workpiece, being positioned in the vacuum coating chamber for transporting the workpiece rack for carrying the workpiece and passing through the first moving mechanism of the vacuum coating chamber, an atmospheric return The warehouse and the second moving mechanism located in the atmospheric return warehouse are used to transport the workpiece rack for carrying workpieces and pass through the atmospheric return warehouse. The running directions of the first moving mechanism and the second moving mechanism are opposite, and the atmospheric return warehouse The entrance of the vacuum coating chamber is close to the exit of the vacuum coating chamber, and the outlet of the atmospheric return chamber is close to the entrance of the vacuum coating chamber. , the atmospheric turntable includes a rotating mechanism, a third moving mechanism for transporting the workpiece frame from the vacuum coating chamber to the atmospheric rotary table, and a fourth moving mechanism for transporting the workpiece frame from the atmospheric rotary table to the atmospheric return bin. The moving mechanism, the third moving mechanism and the fourth moving mechanism rotate with the rotating mechanism to exchange positions; the third moving mechanism is located on a track extending along the running of the first moving mechanism in a static state, and the fourth moving mechanism In the stationary state, the moving mechanism is located on a track extending in the opposite direction to the running direction of the second moving mechanism. 2.如权利要求1所述的真空镀膜设备,其特征在于:所述旋转机构包括旋转转台,所述第三移动机构和第四移动机构分别固定在旋转转台的两相对的侧边上,所述大气回转台还包括位于旋转转台上方或上边缘、且与第三移动机构和第四移动机构分别对应的两个固定机构。2. The vacuum coating device according to claim 1, wherein the rotating mechanism comprises a rotating turntable, and the third moving mechanism and the fourth moving mechanism are respectively fixed on two opposite sides of the rotating turntable, so The atmospheric turntable further includes two fixing mechanisms located above or on the upper edge of the turntable and corresponding to the third moving mechanism and the fourth moving mechanism respectively. 3.如权利要求2所述的真空镀膜设备,其特征在于:所述旋转机构还包括转动马达和转盘轴承,所述转盘轴承与转动马达的输出端耦合,所述旋转转台与转盘轴承紧固在一起。3. The vacuum coating equipment according to claim 2, characterized in that: the rotating mechanism further comprises a rotating motor and a turntable bearing, the turntable bearing is coupled with the output end of the turning motor, and the rotating turntable is fastened to the turntable bearing together. 4.如权利要求3所述的真空镀膜设备,其特征在于:所述第三移动机构和第四移动机构分别包括驱动马达、由驱动马达驱动旋转的至少两个摩擦驱动轮,所述摩擦驱动轮固定在旋转转台的外侧面;所述固定机构为用于容纳工件架上边缘的倒“U”型轨道。4. The vacuum coating device according to claim 3, characterized in that: the third moving mechanism and the fourth moving mechanism respectively comprise a driving motor, at least two friction driving wheels driven to rotate by the driving motor, and the friction driving The wheels are fixed on the outer surface of the rotary turntable; the fixing mechanism is an inverted "U" track for accommodating the upper edge of the workpiece holder. 5.如权利要求4所述的真空镀膜设备,其特征在于:所述倒“U”型轨道为磁轨道,所述工件架上边缘设有与磁轨道磁性相反的磁条。5. The vacuum coating equipment according to claim 4, characterized in that: the inverted "U" track is a magnetic track, and the upper edge of the workpiece holder is provided with a magnetic strip magnetically opposite to the magnetic track. 6.如权利要求5所述的真空镀膜设备,其特征在于:所述磁轨道的两端为喇叭口,所述大气回转台还包括位于旋转转台上的、用于固定磁轨道的磁轨道支架。6. The vacuum coating equipment according to claim 5, characterized in that: the two ends of the magnetic track are bell mouths, and the atmospheric turntable also includes a magnetic track support on the rotary turntable for fixing the magnetic track . 7.如权利要求4至6中任一项所述的真空镀膜设备,其特征在于:所述大气回转台还包括与摩擦驱动轮位于相同外侧面的位置传感器,所述每一侧面的位置传感器至少有两个。7. The vacuum coating equipment according to any one of claims 4 to 6, characterized in that: the atmospheric turntable also includes a position sensor located on the same outer surface as the friction drive wheel, and the position sensor on each side There are at least two. 8.如权利要求1至6任一项所述的真空镀膜设备,其特征在于:所述旋转机构的旋转中心分别到所述真空镀膜室的出口和大气回仓的入口的最短距离大于旋转机构的边缘相对于旋转中心的最大径向距离。8. The vacuum coating equipment according to any one of claims 1 to 6, characterized in that: the shortest distance from the center of rotation of the rotating mechanism to the outlet of the vacuum coating chamber and the inlet of the atmospheric return chamber is greater than that of the rotating mechanism The maximum radial distance of the edge of , relative to the center of rotation. 9.如权利要求1至6任一项所述的真空镀膜设备,其特征在于:还包括与所述大气回转台结构相同的工件装卸台,所述工件装卸台靠近真空镀膜室的入口和大气回仓的出口。9. The vacuum coating equipment according to any one of claims 1 to 6, characterized in that: it also includes a workpiece loading and unloading table with the same structure as the atmospheric rotary table, and the workpiece loading and unloading table is close to the entrance of the vacuum coating chamber and the atmosphere Back to the exit of the warehouse. 10.一种用于真空镀膜设备的大气回转台,其特征在于:包括旋转机构、第三移动机构和第四移动机构,所述第三移动机构在静止状态下位于将第一移动机构沿其运行方向延伸的轨道上,用于将工件架从真空镀膜室运输到大气回转台上,所述第四移动机构在静止状态下位于将第二移动机构沿其运行的反方向延伸的轨道上,用于将工件架从大气回转台上运输到大气回仓内,所述第三移动机构和第四移动机构跟随旋转机构旋转以交换位置;所述旋转机构包括旋转转台,所述第三移动机构和第四移动机构分别位于所述旋转转台的相对的两侧。10. An atmospheric turntable for vacuum coating equipment, characterized in that it includes a rotating mechanism, a third moving mechanism and a fourth moving mechanism, the third moving mechanism is positioned at a position where the first moving mechanism is positioned along its On the track extending in the running direction, it is used to transport the workpiece frame from the vacuum coating chamber to the atmospheric turntable, and the fourth moving mechanism is located on the track extending in the opposite direction to the running direction of the second moving mechanism in a static state, Used to transport the workpiece rack from the atmospheric turntable to the atmospheric return bin, the third moving mechanism and the fourth moving mechanism rotate with the rotating mechanism to exchange positions; the rotating mechanism includes a rotating turntable, and the third moving mechanism and the fourth moving mechanism are respectively located on opposite sides of the rotary turntable. 11.如权利要求10所述的大气回转台,其特征在于:所述旋转机构包括转动马达、转盘轴承和旋转转台,所述转盘轴承与转动马达的输出端耦合,所述旋转转台与转盘轴承紧固在一起;所述第三移动机构和第四移动机构分别固定在旋转转台的两相对的侧边上,所述大气回转台还包括位于旋转转台上方、与第三移动机构和第四移动机构分别对应的两个固定机构。11. The atmospheric turntable as claimed in claim 10, characterized in that: the rotating mechanism comprises a rotating motor, a turntable bearing and a rotating turntable, the turntable bearing is coupled with the output end of the turning motor, and the rotating turntable and the turntable bearing fastened together; the third moving mechanism and the fourth moving mechanism are respectively fixed on the two opposite sides of the rotary turntable, and the atmospheric turntable also includes the third moving mechanism and the fourth moving Two fixed mechanisms corresponding to the mechanism respectively. 12.如权利要求11所述的大气回转台,其特征在于:所述第三移动机构和第四移动机构分别包括驱动马达、由驱动马达驱动旋转的至少两个摩擦驱动轮,所述摩擦驱动轮固定在旋转转台的外侧面;所述固定机构为用于容纳工件架上边缘的倒“U”型磁轨道。12. The atmospheric turntable as claimed in claim 11, characterized in that: the third moving mechanism and the fourth moving mechanism respectively comprise a driving motor, at least two friction driving wheels driven and rotated by the driving motor, and the friction driving The wheels are fixed on the outer surface of the rotary turntable; the fixing mechanism is an inverted "U"-shaped magnetic track for accommodating the upper edge of the workpiece holder. 13.如权利要求12所述的大气回转台,其特征在于:还包括与摩擦驱动轮位于相同外侧面的位置传感器,所述每一侧面的位置传感器至少有两个。13. The atmospheric turntable according to claim 12, further comprising position sensors located on the same outer surface as the friction drive wheel, and there are at least two position sensors on each side.
CN200710075141XA 2007-06-20 2007-06-20 A vacuum coating device and an atmospheric rotary table used for the device Expired - Fee Related CN101328576B (en)

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CN111139446A (en) * 2018-11-05 2020-05-12 肇庆市前沿真空设备有限公司 Vacuum coating production line
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CN1215093A (en) * 1997-09-29 1999-04-28 莱博德系统股份有限公司 Film coating device for roughly flat sheet shaped substrate
CN1918321A (en) * 2004-02-10 2007-02-21 株式会社爱发科 Thin film forming apparatus

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Publication number Priority date Publication date Assignee Title
CN1215093A (en) * 1997-09-29 1999-04-28 莱博德系统股份有限公司 Film coating device for roughly flat sheet shaped substrate
CN1918321A (en) * 2004-02-10 2007-02-21 株式会社爱发科 Thin film forming apparatus

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