CN101306817B - 重掺硅中磷、砷、锑、硼的去除装置 - Google Patents
重掺硅中磷、砷、锑、硼的去除装置 Download PDFInfo
- Publication number
- CN101306817B CN101306817B CN2008100598058A CN200810059805A CN101306817B CN 101306817 B CN101306817 B CN 101306817B CN 2008100598058 A CN2008100598058 A CN 2008100598058A CN 200810059805 A CN200810059805 A CN 200810059805A CN 101306817 B CN101306817 B CN 101306817B
- Authority
- CN
- China
- Prior art keywords
- silicon
- heavily doped
- blowing
- crucible
- arsenic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 229910052785 arsenic Inorganic materials 0.000 title claims abstract description 19
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 239000011574 phosphorus Substances 0.000 title claims abstract description 19
- 229910052698 phosphorus Inorganic materials 0.000 title claims abstract description 19
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 229910052796 boron Inorganic materials 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title abstract description 19
- -1 stibium Chemical compound 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 58
- 239000010703 silicon Substances 0.000 claims abstract description 58
- 238000007664 blowing Methods 0.000 claims abstract description 46
- 239000013078 crystal Substances 0.000 claims abstract description 32
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 48
- 229910052787 antimony Inorganic materials 0.000 claims description 16
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 16
- 239000010453 quartz Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 239000010439 graphite Substances 0.000 claims description 7
- 241000209456 Plumbago Species 0.000 claims description 6
- 239000011148 porous material Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 abstract description 31
- 239000004065 semiconductor Substances 0.000 abstract description 15
- 230000005587 bubbling Effects 0.000 abstract description 13
- 239000002994 raw material Substances 0.000 abstract description 12
- 239000012535 impurity Substances 0.000 abstract description 10
- 238000001704 evaporation Methods 0.000 abstract description 6
- 230000008020 evaporation Effects 0.000 abstract description 6
- 239000012634 fragment Substances 0.000 abstract description 4
- 238000005070 sampling Methods 0.000 abstract description 4
- 239000002699 waste material Substances 0.000 abstract description 4
- 238000001514 detection method Methods 0.000 abstract description 2
- 125000004122 cyclic group Chemical group 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 239000002019 doping agent Substances 0.000 description 12
- 235000012054 meals Nutrition 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- FGRBYDKOBBBPOI-UHFFFAOYSA-N 10,10-dioxo-2-[4-(N-phenylanilino)phenyl]thioxanthen-9-one Chemical compound O=C1c2ccccc2S(=O)(=O)c2ccc(cc12)-c1ccc(cc1)N(c1ccccc1)c1ccccc1 FGRBYDKOBBBPOI-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008100598058A CN101306817B (zh) | 2008-02-04 | 2008-02-04 | 重掺硅中磷、砷、锑、硼的去除装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008100598058A CN101306817B (zh) | 2008-02-04 | 2008-02-04 | 重掺硅中磷、砷、锑、硼的去除装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101306817A CN101306817A (zh) | 2008-11-19 |
CN101306817B true CN101306817B (zh) | 2010-06-02 |
Family
ID=40123528
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008100598058A Expired - Fee Related CN101306817B (zh) | 2008-02-04 | 2008-02-04 | 重掺硅中磷、砷、锑、硼的去除装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN101306817B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112009001990B4 (de) * | 2008-08-15 | 2018-01-25 | Ulvac, Inc. | Verfahren zum Reinigen von Silizium |
CN102162124B (zh) * | 2011-04-06 | 2012-08-22 | 天津市环欧半导体材料技术有限公司 | 一种提高重掺砷单晶轴向电阻率均匀性的方法 |
CN103014839B (zh) * | 2013-01-09 | 2016-07-27 | 英利集团有限公司 | 一种p型掺杂剂及其制备方法 |
CN106082232B (zh) * | 2016-06-08 | 2018-02-06 | 大工(青岛)新能源材料技术研究院有限公司 | 中频熔炼回收打磨硅粉的方法 |
CN106757313A (zh) * | 2016-12-29 | 2017-05-31 | 上海合晶硅材料有限公司 | 超重掺砷晶棒拉制方法 |
CN109457294A (zh) * | 2018-12-27 | 2019-03-12 | 衢州晶哲电子材料有限公司 | 一种直拉重掺锑硅单晶锑源提纯装置及提纯掺杂方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5476065A (en) * | 1993-01-28 | 1995-12-19 | Mitsubishi Materials Silicon Corp. | System for pulling-up monocrystal and method of exhausting silicon oxide |
CN1900387A (zh) * | 2005-07-19 | 2007-01-24 | 上海九晶电子材料有限公司 | 一种太阳能级硅单晶用料配方及制备 |
CN101016155A (zh) * | 2006-12-30 | 2007-08-15 | 浙江昱辉阳光能源有限公司 | 直拉法生长硅单晶产生的锅底料的除杂方法 |
JP4193706B2 (ja) * | 2004-01-23 | 2008-12-10 | トヨタ自動車株式会社 | 路面摩擦係数検出装置 |
-
2008
- 2008-02-04 CN CN2008100598058A patent/CN101306817B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5476065A (en) * | 1993-01-28 | 1995-12-19 | Mitsubishi Materials Silicon Corp. | System for pulling-up monocrystal and method of exhausting silicon oxide |
JP4193706B2 (ja) * | 2004-01-23 | 2008-12-10 | トヨタ自動車株式会社 | 路面摩擦係数検出装置 |
CN1900387A (zh) * | 2005-07-19 | 2007-01-24 | 上海九晶电子材料有限公司 | 一种太阳能级硅单晶用料配方及制备 |
CN101016155A (zh) * | 2006-12-30 | 2007-08-15 | 浙江昱辉阳光能源有限公司 | 直拉法生长硅单晶产生的锅底料的除杂方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101306817A (zh) | 2008-11-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101724899B (zh) | 少子寿命大于等于1000微秒的n型太阳能硅单晶生长工艺 | |
CN101306817B (zh) | 重掺硅中磷、砷、锑、硼的去除装置 | |
CN103249875B (zh) | 镓、铟、或铝掺杂单晶硅 | |
KR101939594B1 (ko) | 초기 장입물만을 도핑하여 균등하게 도핑된 실리콘 잉곳의 성장 | |
CN102260900B (zh) | 提高单晶硅纵向电阻率一致性的装置及其处理工艺 | |
CN101591808A (zh) | 掺锗的定向凝固铸造单晶硅及其制备方法 | |
CN105821474B (zh) | 一种晶体硅的制备方法及晶体硅 | |
CN104124292A (zh) | 硼镓共掺单晶硅片及其制备方法和太阳能电池 | |
TWI776373B (zh) | 一種用於計算晶體生長過程中固液界面形狀的方法 | |
CN104328494A (zh) | 一种太阳能级直拉单晶硅的生产方法 | |
CN106222742A (zh) | 一种晶体硅及其制备方法 | |
CN112144117B (zh) | 氢、磷、氮掺杂单晶硅及其制备方法、太阳能电池 | |
CN104451872A (zh) | 一种太阳能级直拉单晶硅的生产方法 | |
CN102605418A (zh) | 太阳能电池基板、太阳能电池的制造方法及其使用的坩埚 | |
CN101787566B (zh) | 直拉硅单晶的镓元素掺杂方法及所用掺杂装置 | |
EP2048696A2 (en) | Process for manufacturing silicon wafers for solar cell | |
CN1609286A (zh) | 太阳能级硅单晶生产工艺方法 | |
CN202144523U (zh) | 一种提高单晶硅纵向电阻率一致性的装置 | |
CN102732943A (zh) | 单晶硅铸锭的生产方法 | |
CN102839415A (zh) | 一种太阳能电池用掺镓单晶硅的制备方法 | |
CN1556257A (zh) | 用于六英寸及八英寸重掺磷直拉硅单晶制造的上部热场 | |
CN201990762U (zh) | 直拉单晶炉加热装置 | |
CN102758253A (zh) | 直拉多或单晶硅制备工艺 | |
CN102534749A (zh) | 用直拉区熔法制备6英寸n型太阳能硅单晶的方法 | |
CN217973493U (zh) | 一种用于mcz法拉制重掺锑单晶的加掺装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: ZHEJIANG DONGYUAN ELECTRONIC CO., LTD. Free format text: FORMER OWNER: LIU PEIDONG Effective date: 20100917 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 310012 ROOM 201, UNIT 3, BUILDING 1, MEILINQUAN, SHANSHUIRENJIA, XIHU DISTRICT, HANGZHOU CITY, ZHEJIANG PROVINCE TO: 314200 ROOM 2024, BUILDING 3, NORTH OF FANRONG ROAD, EAST OF PINGHU AVENUE, PINGHU ECONOMIC DEVELOPMENT ZONE, JIAXING CITY, ZHEJIANG PROVINCE |
|
TR01 | Transfer of patent right |
Effective date of registration: 20100917 Address after: 2024, room 3, building 314200, north of prosperity Road, Pinghu Road, Pinghu Economic Development Zone, Jiaxing, Zhejiang Patentee after: Zhejiang Dongyuan Electronics Co., Ltd. Address before: 201, room 3, unit 1, 310012, Merrill Lynch, Xihu District landscape, Zhejiang, Hangzhou Patentee before: Liu Peidong |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100602 Termination date: 20130204 |