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CN101276766A - Flip Chip Packaging Method - Google Patents

Flip Chip Packaging Method Download PDF

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Publication number
CN101276766A
CN101276766A CNA2008100996055A CN200810099605A CN101276766A CN 101276766 A CN101276766 A CN 101276766A CN A2008100996055 A CNA2008100996055 A CN A2008100996055A CN 200810099605 A CN200810099605 A CN 200810099605A CN 101276766 A CN101276766 A CN 101276766A
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chip
substrate
groove
encapsulation method
crystal coated
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CN101276766B (en
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钟智明
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Advanced Semiconductor Engineering Inc
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Advanced Semiconductor Engineering Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/921Connecting a surface with connectors of different types
    • H01L2224/9212Sequential connecting processes
    • H01L2224/92122Sequential connecting processes the first connecting process involving a bump connector
    • H01L2224/92125Sequential connecting processes the first connecting process involving a bump connector the second connecting process involving a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

The invention discloses a flip chip packaging method, which comprises the steps of providing a substrate, wherein the substrate is provided with a cutting channel; forming an insulating layer on the substrate, wherein the insulating layer is provided with a groove which is positioned on the cutting path; arranging a chip on the substrate, wherein the arrangement position of the chip is positioned at one side of the groove and is adjacent to the groove, and the chip is electrically connected with the substrate in a flip chip bonding mode; and forming a bottom glue between the chip and the substrate from one side of the chip adjacent to the cutting channel.

Description

覆晶封装方法 Flip Chip Packaging Method

【技术领域】【Technical field】

本发明是有关于一种覆晶封装方法,且特别是有关于一种提高基板使用率的覆晶封装方法。The present invention relates to a method of flip-chip packaging, and in particular to a method of flip-chip packaging that improves substrate utilization.

【背景技术】【Background technique】

在科技日新月异的世代,利用集成电路组件所组成的电子产品,已成为现代人日常生活中不可或缺的工具。随着电子产品迈向轻薄短小的设计的潮流,半导体封装技术也相对地开发出许多高密度的半导体封装的形式,例如覆晶封装件。In the era of ever-changing technology, electronic products composed of integrated circuit components have become an indispensable tool in the daily life of modern people. With the trend of electronic products moving toward thinner and smaller designs, semiconductor packaging technology has relatively developed many high-density semiconductor packaging forms, such as flip-chip packages.

覆晶封装制程中需要形成底胶于芯片与基板之间。然而当芯片很薄或面积较大时,很容易发生溢胶问题。而溢出的胶会污染邻近芯片的焊垫,导致邻近芯片的焊垫在随后的打线操作时,金线不易固定于被污染的焊垫上。而且,近来客户要求芯片尺寸日益缩小,使得芯片与邻近芯片的焊垫之间的距离跟着配合缩短,因此导致溢出的底胶更容易污染到邻近芯片的焊垫。During the flip-chip packaging process, a primer needs to be formed between the chip and the substrate. However, when the chip is very thin or has a large area, it is easy to cause glue overflow. The overflowing glue will contaminate the bonding pads of adjacent chips, so that the gold wires are not easy to be fixed on the contaminated bonding pads during the subsequent wire bonding operation. Moreover, recently, customers have requested that the size of the chip be reduced day by day, so that the distance between the chip and the bonding pad of the adjacent chip is shortened accordingly, so that the overflowed primer is more likely to contaminate the bonding pad of the adjacent chip.

【发明内容】【Content of invention】

有鉴于此,本发明就是在提供一种覆晶封装方法,于开始形成底胶的处与邻近芯片的焊垫之间形成一沟槽,当底胶的溢胶发生时,溢胶会先填充沟槽内的空间而不会流至邻近芯片的焊垫,因此降低了污染邻近芯片的焊垫的机会,并且提高邻近芯片于打线操作的成功率,以提高产品合格率并降低成本。并且,由于沟槽的形成,也使得芯片间的距离可以拉近而不会有焊垫遭受底胶的溢胶污染的问题,因此相同基板面积可以容纳较多的芯片,使得基板使用率提升。In view of this, the present invention is to provide a flip-chip packaging method. A groove is formed between the place where the primer is formed and the bonding pad of the adjacent chip. When the overflow of the primer occurs, the overflow will be filled first. The space in the groove does not flow to the bonding pads of adjacent chips, thereby reducing the chance of polluting the bonding pads of adjacent chips, and improving the success rate of bonding operations of adjacent chips, so as to improve product yield and reduce costs. Moreover, due to the formation of the grooves, the distance between the chips can be shortened without the problem of solder pads being polluted by overflowing glue from the primer. Therefore, the same substrate area can accommodate more chips, which improves the utilization rate of the substrate.

根据本发明的一方面,提出一种覆晶封装方法,包括提供一基板,基板具有一切割道;形成一绝缘层于基板上,绝缘层具有一沟槽,沟槽位于切割道上;将一芯片设置于基板上,芯片的设置位置位于沟槽的一侧且邻近于沟槽,芯片以覆晶接合的方式电性连接于基板;以及,从邻近切割道的芯片的一侧开始形成一底胶于芯片与基板之间。According to one aspect of the present invention, a flip-chip packaging method is proposed, including providing a substrate, the substrate has a dicing line; forming an insulating layer on the substrate, the insulating layer has a groove, and the groove is located on the dicing line; placing a chip Installed on the substrate, the chip is located on one side of the trench and adjacent to the trench, and the chip is electrically connected to the substrate in the form of flip-chip bonding; and, a primer is formed from the side of the chip adjacent to the dicing line between the chip and the substrate.

为让本发明的上述内容能更明显易懂,下文特举一较佳实施例,并配合所附图式,作详细说明如下:In order to make the above content of the present invention more obvious and understandable, a preferred embodiment is specifically cited below, together with the accompanying drawings, and described in detail as follows:

【附图说明】【Description of drawings】

图1绘示依照本发明较佳实施例的覆晶封装方法的流程图。FIG. 1 shows a flowchart of a flip-chip packaging method according to a preferred embodiment of the present invention.

图2A绘示本实施例的基板的俯视图。FIG. 2A is a top view of the substrate of this embodiment.

图2B绘示图2A中基板的前视图。FIG. 2B is a front view of the substrate in FIG. 2A.

图3A绘示本实施例的形成有绝缘层与焊垫的基板的俯视图。FIG. 3A is a top view of the substrate formed with the insulating layer and the pads of the present embodiment.

图3B绘示图3A中基板沿着1A-1A’的剖视图。FIG. 3B is a cross-sectional view of the substrate in FIG. 3A along 1A-1A'.

图4A绘示本实施例的设置有芯片的基板的俯视图。FIG. 4A is a top view of a substrate provided with chips in this embodiment.

图4B绘示图4A中基板沿着1B-1B’的剖视图。FIG. 4B is a cross-sectional view of the substrate in FIG. 4A along 1B-1B'.

图5绘示本实施例的形成底胶时的基板的俯视图。FIG. 5 is a top view of the substrate when the primer is formed in this embodiment.

图6A绘示不形成沟槽时,溢胶分布的示意图。FIG. 6A is a schematic diagram showing the distribution of glue overflow when no groove is formed.

图6B绘示本实施例的形成有凹槽的覆晶封装方法的溢胶分布示意图。FIG. 6B is a schematic diagram of the overflow distribution of the flip-chip packaging method with grooves formed in this embodiment.

图7A绘示本实施例的形成有多条金线的基板的俯视图。FIG. 7A is a top view of a substrate formed with a plurality of gold wires in this embodiment.

图7B绘示图7A中基板沿者1C-1C’的剖视图。FIG. 7B is a cross-sectional view of the substrate along line 1C-1C' in FIG. 7A.

图8绘示本实施例的覆晶封装件的示意图。FIG. 8 is a schematic diagram of the flip-chip package of this embodiment.

图9绘示本实施例的沟槽的另一结构的示意图。FIG. 9 is a schematic diagram of another structure of the groove of this embodiment.

【具体实施方式】【Detailed ways】

本发明提出一种覆晶封装方法,包括提供一基板,基板具有一切割道;形成一绝缘层于基板上,绝缘层具有一沟槽,沟槽位于切割道上;将一芯片设置于基板上,芯片的设置位置位于沟槽的一侧且邻近于沟槽,芯片以覆晶接合的方式电性连接于基板;以及,从邻近切割道的芯片的一侧开始形成一底胶于芯片与基板之间。当底胶的溢胶发生时,溢胶会先填充沟槽内空间而不会流至邻近芯片的焊垫,因此降低了污染邻近芯片的焊垫的机会。以下举出一较佳实施例做详细说明,然此实施例仅为本发明的发明精神下的几种实施方式之一,其说明的文字与图标并不会对本发明的欲保护范围进行限缩。The present invention proposes a flip-chip packaging method, which includes providing a substrate with a dicing line; forming an insulating layer on the substrate, the insulating layer has a groove, and the groove is located on the dicing line; disposing a chip on the substrate, The chip is placed on one side of the trench and adjacent to the trench, and the chip is electrically connected to the substrate by flip-chip bonding; and, a primer is formed between the chip and the substrate from the side of the chip adjacent to the dicing line between. When the overflow of the primer occurs, the overflow will first fill the space in the trench and will not flow to the bonding pads of the adjacent chips, thus reducing the chance of contaminating the bonding pads of the adjacent chips. A preferred embodiment is given below as a detailed description, but this embodiment is only one of several implementations under the inventive spirit of the present invention, and the words and icons in its description will not limit the intended protection scope of the present invention .

请参照图1,其绘示依照本发明较佳实施例的覆晶封装方法的流程图。覆晶封装方法包括以下步骤。首先,请同时参照图2A及图2B,图2A绘示本实施例的基板的俯视图,图2B绘示图2A中基板的前视图。于步骤102中,提供一基板202,基板202具有一切割道204。Please refer to FIG. 1 , which shows a flowchart of a flip-chip packaging method according to a preferred embodiment of the present invention. The flip-chip packaging method includes the following steps. First, please refer to FIG. 2A and FIG. 2B at the same time. FIG. 2A shows a top view of the substrate of this embodiment, and FIG. 2B shows a front view of the substrate in FIG. 2A . In step 102 , a substrate 202 having a dicing line 204 is provided.

接着,请同时参照图3A及图3B,图3A绘示本实施例的形成有绝缘层与焊垫的基板的俯视图,图3B绘示图3A中基板沿着1A-1A’的剖视图。于步骤104中,形成一绝缘层206于基板202上,绝缘层206具有一沟槽208,沟槽208位于切割道204上。其中,绝缘层206包括绿漆、隔离层、ABF介电层(Ajinomoto Build-up film)或其它介电材质。沟槽208的宽度可以小于或等于切割道204的宽度,沟槽208的长度可小于或等于切割道204的长度,本实施例以沟槽208的宽度与长度分别小于切割道204的宽度与长度为例作说明。另外,于本步骤中,覆晶封装方法更包括形成多个焊垫214于基板202上,沟槽208例如以一曝光显影技术形成,沟槽208可以在形成绝缘层206中对应至焊垫214的开口213的制程中一并完成。因此,沟槽的形成是相当简单的,而且不会额外增加制程成本。Next, please refer to FIG. 3A and FIG. 3B at the same time. FIG. 3A shows a top view of the substrate formed with insulating layers and pads in this embodiment, and FIG. 3B shows a cross-sectional view of the substrate in FIG. 3A along 1A-1A'. In step 104 , an insulating layer 206 is formed on the substrate 202 , the insulating layer 206 has a groove 208 located on the scribe line 204 . Wherein, the insulating layer 206 includes green paint, isolation layer, ABF dielectric layer (Ajinomoto Build-up film) or other dielectric materials. The width of the groove 208 can be less than or equal to the width of the cutting line 204, and the length of the groove 208 can be less than or equal to the length of the cutting line 204. In this embodiment, the width and length of the groove 208 are respectively smaller than the width and length of the cutting line 204 As an example for illustration. In addition, in this step, the flip-chip packaging method further includes forming a plurality of soldering pads 214 on the substrate 202. The grooves 208 are formed, for example, by an exposure and development technique. The grooves 208 can correspond to the soldering pads 214 in forming the insulating layer 206. The process of opening 213 is completed together. Therefore, the formation of the trench is quite simple without additional process cost.

另外,沟槽208所形成的凹陷空间吸收了基板202在后续制程中因加热动作所产生的热膨胀量,使得基板202整体的翘曲量(Warpage)降低,因此提升了覆晶封装件的制程合格率。In addition, the recessed space formed by the groove 208 absorbs the thermal expansion of the substrate 202 due to the heating action in the subsequent process, so that the overall warpage of the substrate 202 is reduced, thus improving the process qualification of the flip-chip package. Rate.

然后,请同时参照图4A及图4B,图4A绘示本实施例的设置有芯片的基板的俯视图,图4B绘示图4A中基板沿着1B-1B’的剖视图。于步骤106中,将一芯片210设置于基板202上,芯片210的设置位置位于沟槽208的一侧且邻近于沟槽208,芯片210以覆晶接合的方式电性连接于基板202。此外,芯片210更具有多个锡球211,芯片210通过锡球211与基板202电性连接。此外,于本步骤中,亦可形成另一芯片212于基板202上,芯片210与芯片212分别位于切割道204的两侧。芯片212可以直接设置于基板202上或是堆栈在覆晶式芯片上,本实施例以堆栈在覆晶式芯片215的形式为例作说明。基板202上具有的焊垫214用以与芯片212电性连接,电性连接的方式可采用打线技术完成,为了使金线的长度适中,焊垫214形成于切割道204与芯片212之间。Then, please refer to FIG. 4A and FIG. 4B at the same time. FIG. 4A shows a top view of the substrate provided with chips in this embodiment, and FIG. 4B shows a cross-sectional view of the substrate in FIG. 4A along 1B-1B'. In step 106 , a chip 210 is disposed on the substrate 202 . The chip 210 is disposed on one side of the trench 208 and adjacent to the trench 208 . The chip 210 is electrically connected to the substrate 202 by flip-chip bonding. In addition, the chip 210 further has a plurality of solder balls 211 , and the chip 210 is electrically connected to the substrate 202 through the solder balls 211 . In addition, in this step, another chip 212 can also be formed on the substrate 202 , and the chip 210 and the chip 212 are respectively located on two sides of the dicing line 204 . The chip 212 can be directly disposed on the substrate 202 or stacked on the flip-chip chip. In this embodiment, the form of stacking on the flip-chip chip 215 is taken as an example for illustration. The welding pad 214 on the substrate 202 is used to electrically connect with the chip 212. The electrical connection can be completed by wire bonding. In order to make the length of the gold wire moderate, the welding pad 214 is formed between the dicing line 204 and the chip 212. .

然后,请同时参照图5其绘示本实施例的形成底胶时的基板的俯视图。于步骤108中,从邻近切割道204的芯片210的一侧219开始形成底胶216于芯片210与基板202之间,当底胶216开始被放置于邻近于芯片210的一侧219时,通过虹吸原理,底胶216会慢慢被吸入芯片210与基板202之间。其中,形成底胶216的方式可采用喷射(Jetting)方式或点胶方式(Dispensing or No-Flow)。Then, please also refer to FIG. 5 , which shows a top view of the substrate when the primer is formed in this embodiment. In step 108, the primer 216 is formed between the chip 210 and the substrate 202 from the side 219 of the chip 210 adjacent to the dicing line 204. When the primer 216 is initially placed on the side 219 adjacent to the chip 210, by According to the siphon principle, the primer 216 will be slowly sucked between the chip 210 and the substrate 202 . Wherein, the method of forming the primer 216 can be Jetting or Dispensing or No-Flow.

在不形成沟槽的情况下,于形成底胶的过程当中,假如有溢胶产生,则溢胶将可能污染到焊垫。请参照图6A,其绘示不形成沟槽时,溢胶分布的示意图。当绝缘层206不具沟槽时,底胶的一溢胶221因为没有沟槽可以被容纳,所以只能顺势流至邻近芯片,例如是芯片212,的焊垫214上,而使焊垫214受到污染。因此导致在后续的打线操作中,金线无法稳固地黏着于焊垫214上。在这种情况下,则必需加大芯片210与焊垫214之间距来降低焊垫214受到污染的机率。如此,将会浪费基板202的可使用的空间。In the case of not forming a groove, if there is glue overflow during the process of forming the primer, the overflow glue may contaminate the pad. Please refer to FIG. 6A , which is a schematic diagram of the overflow glue distribution when no groove is formed. When the insulating layer 206 does not have a groove, an overflow glue 221 of the primer can only flow to the bonding pad 214 of the adjacent chip, such as the chip 212, because there is no groove to accommodate the bonding pad 214, and the bonding pad 214 is affected. pollute. Therefore, the gold wire cannot be firmly adhered to the bonding pad 214 during the subsequent wire bonding operation. In this case, it is necessary to increase the distance between the chip 210 and the bonding pad 214 to reduce the probability of the bonding pad 214 being contaminated. In this way, the available space of the substrate 202 will be wasted.

于形成底胶的过程当中,如果有溢胶产生的话,本实施例将可有效地使溢胶避免污染到邻近芯片的焊垫。请参照图6B,其绘示本实施例的形成有凹槽的覆晶封装方法的溢胶分布示意图。底胶216的一溢胶218会先流进沟槽208的空间内,而避免了溢胶218流至焊垫214而污染焊垫214,如此,晶粒210与焊垫214之间距不需加大,因此而节省基板202的可使用的空间。In the process of forming the primer, if there is glue overflow, this embodiment can effectively prevent the overflow glue from polluting the bonding pads of adjacent chips. Please refer to FIG. 6B , which is a schematic diagram of the overflow distribution of the flip-chip packaging method with grooves formed in this embodiment. An overflow glue 218 of the primer 216 will flow into the space of the groove 208 first, and avoid the overflow glue 218 from flowing to the welding pad 214 and polluting the welding pad 214, so that the distance between the crystal grain 210 and the welding pad 214 does not need to be increased. Therefore, the available space of the substrate 202 is saved.

此外,为了电性连接芯片212与焊垫214,于步骤108后,覆晶封装方法更可包括形成多条金线217的步骤。请参照图7A及图7B,图7A绘示本实施例的形成有多条金线的基板的俯视图,图7B绘示图7A中基板沿者1C-1C’的剖视图。通过打线操作,形成多条金线217连接芯片212与焊垫214,以使芯片212经由金线217与焊垫214电性连接。In addition, in order to electrically connect the chip 212 and the bonding pad 214 , after the step 108 , the flip-chip packaging method may further include a step of forming a plurality of gold wires 217 . Please refer to FIG. 7A and FIG. 7B. FIG. 7A shows a top view of a substrate formed with a plurality of gold wires in this embodiment, and FIG. 7B shows a cross-sectional view of the substrate along line 1C-1C' in FIG. 7A. Through the wire bonding operation, a plurality of gold wires 217 are formed to connect the chip 212 and the bonding pad 214 , so that the chip 212 is electrically connected to the bonding pad 214 through the gold wire 217 .

此外,于步骤108后,覆晶封装方法更可包括沿着切割道204切割基板202,以形成覆晶封装件220的步骤。请参照图8,其绘示本实施例的覆晶封装件的示意图。使用一切割刀222切割基板202后,形成覆晶封装件220及224,其中,为了保护金线217免于受潮及外物侵蚀,在切割前以封胶226覆盖芯片212及金线217。In addition, after step 108 , the flip-chip packaging method may further include a step of cutting the substrate 202 along the dicing line 204 to form the flip-chip package 220 . Please refer to FIG. 8 , which shows a schematic diagram of the flip-chip package of this embodiment. After dicing the substrate 202 with a dicing knife 222 , flip-chip packages 220 and 224 are formed. In order to protect the gold wires 217 from moisture and foreign objects, the chip 212 and the gold wires 217 are covered with an encapsulant 226 before dicing.

此外,在切割过程中,由于绝缘层206的质地较软,在切割完后很容易在边缘形成毛边。然而,由于沟槽的形成,使得具有沟槽的切割道所具有的绝缘层成份相较于不具有沟槽的切割道所具有的绝缘层成份还少,当绝缘层的成份较少时,切割后的覆晶封装件所残留的毛边也自然地变得较少。如此,有助于覆晶封装件成品品质的提升。In addition, during the cutting process, since the texture of the insulating layer 206 is relatively soft, it is easy to form burrs on the edges after cutting. However, due to the formation of the groove, the insulating layer composition of the scribe line with the groove is less than that of the scribe line without the groove. When the composition of the insulating layer is less, the dicing The remaining burrs of the final flip-chip package also naturally become less. In this way, it is helpful to improve the quality of the finished product of the flip-chip package.

在打线操作中,为了使金线能够稳固定于焊垫214上,焊垫须保持洁净,不能够有杂质在焊垫上,否则金线无法稳固在焊垫上。若焊垫污染过于严重,例如是底胶216的溢胶流至焊垫214上(如图6A所示),甚至会发生无法打线的不良问题。所以本实施例的沟槽208的形成,使得当底胶216的溢胶218发生时,溢胶218会先填充沟槽208内的空间而不会流至焊垫214上,因此降低了污染焊垫214的机会,使后续的打线操作中的金线217,可以稳定地固定于焊垫214上。此外,由于沟槽的形成,使得溢胶的区域范围也可以被控制的较小,芯片间的距离得以拉近,以使基板容纳更多的芯片而提高基板的使用率。During the wire bonding operation, in order to make the gold wires firmly fixed on the welding pads 214 , the welding pads must be kept clean without impurities on the welding pads, otherwise the gold wires cannot be firmly fixed on the welding pads. If the pads are too polluted, for example, the glue overflow of the primer 216 flows onto the pads 214 (as shown in FIG. 6A ), and even the problem of inability to bond wires may occur. Therefore, the groove 208 of this embodiment is formed so that when the overflow glue 218 of the primer 216 occurs, the overflow glue 218 will first fill the space in the groove 208 and will not flow to the solder pad 214, thus reducing the pollution of solder pads. The opportunity of the pad 214 enables the gold wire 217 in the subsequent wire bonding operation to be stably fixed on the pad 214 . In addition, due to the formation of the grooves, the area of glue overflow can also be controlled to be smaller, and the distance between chips can be shortened, so that the substrate can accommodate more chips and improve the utilization rate of the substrate.

请参照图9,其绘示本实施例的沟槽的另一结构的示意图。绝缘层302具有多个沟槽304,沟槽304位于切割道306上。本发明的覆晶封装方法所形成的沟槽并不局限图1的沟槽形式,沟槽的分布可随着覆晶封装件于基板上的分布方式而配合变更。因此,多种沟槽的配置方式增加了制程的规划弹性。Please refer to FIG. 9 , which shows a schematic diagram of another structure of the groove of this embodiment. The insulating layer 302 has a plurality of trenches 304 located on the dicing lines 306 . The trenches formed by the flip-chip packaging method of the present invention are not limited to the trench form shown in FIG. 1 , and the distribution of the trenches can be changed according to the distribution of the flip-chip package components on the substrate. Therefore, the arrangement of various grooves increases the planning flexibility of the manufacturing process.

此外,沟槽的尺寸可以配合底胶量调整,例如,底胶量因配合产品尺寸而需要较多时,沟槽的尺寸则可以配合形成容积较大的沟槽以容纳更多的溢胶量。如此,使得溢胶的区域范围仍可以被控制的较小。In addition, the size of the groove can be adjusted according to the amount of primer. For example, when the amount of primer is required to match the size of the product, the size of the groove can be matched to form a groove with a larger volume to accommodate more excess glue. In this way, the area of glue overflow can still be controlled to be small.

本发明上述实施例所揭露的覆晶封装方法,具有多项优点,以下仅列举部分优点说明如下:The flip-chip packaging method disclosed in the above-mentioned embodiments of the present invention has many advantages, and only some of the advantages are listed below:

1)沟槽的形成,使得邻近芯片的焊垫受到底胶污染的机率降低,提高了后续打线操作的成功率及确保打线品质。1) The formation of the groove reduces the probability of the bonding pad adjacent to the chip being polluted by the primer, improves the success rate of the subsequent wire bonding operation and ensures the quality of the wire bonding.

2)沟槽的形成,使得溢胶的区域范围可以缩小,因此芯片间的距离得以缩短,使得相同的基板面积可以容纳更多尺寸较小的晶粒。因此提高了基板的使用率。2) The formation of grooves can reduce the area of glue overflow, so the distance between chips can be shortened, so that the same substrate area can accommodate more crystal grains with smaller sizes. Therefore, the usage rate of the substrate is improved.

3)沟槽的形成,使得质地较软的绝缘层数量减少,在基板切割成覆晶封装件后,覆晶封装件的切割边缘所残留的毛边也减少了,因此提升了覆晶封装件的成品品质。3) The formation of grooves reduces the number of soft insulating layers. After the substrate is cut into flip-chip packages, the remaining burrs on the cutting edges of flip-chip packages are also reduced, thus improving the performance of flip-chip packages. Finished quality.

4)沟槽的形成,使得基板翘曲量降低,因此提升了覆晶封装件的制程合格率。4) The formation of the groove reduces the warpage of the substrate, thus improving the yield of the flip-chip package.

综上所述,虽然本发明已以一较佳实施例揭露如上,然其并非用以限定本发明。本发明所属技术领域中具有通常知识者,在不脱离本发明的精神和范围内,当可作各种的更动与润饰。因此,本发明的保护范围当视后附的申请专利范围所界定者为准。In summary, although the present invention has been disclosed as above with a preferred embodiment, it is not intended to limit the present invention. Those skilled in the art of the present invention can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the scope of the appended patent application.

Claims (11)

1. crystal coated encapsulation method comprises:
(a) provide a substrate, have a Cutting Road;
(b) form an insulating barrier on this substrate, this insulating barrier has a groove, and this groove is positioned on this Cutting Road;
(c) chip is arranged on this substrate, the position that is provided with of this chip is positioned at a side of this groove and is adjacent to this groove, and this chip is electrically connected at this substrate in the mode of chip bonding; And
(d) side from this chip of contiguous this Cutting Road begins to form a primer between this chip and this substrate.
2. crystal coated encapsulation method according to claim 1 is characterized in that, the width of this groove is less than or equal to the width of this Cutting Road.
3. crystal coated encapsulation method according to claim 1 is characterized in that, the length of this groove is less than or equal to the length of this Cutting Road.
4. crystal coated encapsulation method according to claim 1 is characterized in that this insulating barrier has a plurality of grooves, and described groove is positioned on this Cutting Road.
5. crystal coated encapsulation method according to claim 1 is characterized in that, in this step (c), this chip has a plurality of tin balls, and this chip electrically connects by described tin ball and this substrate.
6. crystal coated encapsulation method according to claim 1 is characterized in that, in this step (a), this groove forms with an exposure imaging technology.
7. crystal coated encapsulation method according to claim 1 is characterized in that, in this step (d), (Jetting) forms this primer with spray regime.
8. crystal coated encapsulation method according to claim 1 is characterized in that, in this step (d), (Dispensing or No-Flow) forms this primer in a glue mode.
9. crystal coated encapsulation method according to claim 1 is characterized in that, in this step (d) afterwards, this method more comprises:
Cut this substrate along this Cutting Road, to form a flip chip.
10. crystal coated encapsulation method according to claim 1 is characterized in that, more comprises:
Form another chip on this substrate, this chip and this another chip lay respectively at the both sides of this Cutting Road.
11. crystal coated encapsulation method according to claim 10 is characterized in that, has more a plurality of weld pads on this substrate, described pad-shaped is formed between this Cutting Road and this another chip, and this method more comprises:
Form many gold threads, so that this another chip electrically connects via described gold thread and described weld pad respectively.
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Cited By (5)

* Cited by examiner, † Cited by third party
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CN105225974A (en) * 2015-11-05 2016-01-06 南通富士通微电子股份有限公司 Method for packing
CN105225973A (en) * 2015-11-05 2016-01-06 南通富士通微电子股份有限公司 Method for packing
CN105390429A (en) * 2015-11-05 2016-03-09 南通富士通微电子股份有限公司 Packaging method
CN107708303A (en) * 2016-08-08 2018-02-16 三星电子株式会社 Printed circuit board (PCB) and the semiconductor package part including printed circuit board (PCB)
CN111816644A (en) * 2019-04-10 2020-10-23 力成科技股份有限公司 Antenna integrated package structure and manufacturing method thereof

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Publication number Priority date Publication date Assignee Title
CN105225974A (en) * 2015-11-05 2016-01-06 南通富士通微电子股份有限公司 Method for packing
CN105225973A (en) * 2015-11-05 2016-01-06 南通富士通微电子股份有限公司 Method for packing
CN105390429A (en) * 2015-11-05 2016-03-09 南通富士通微电子股份有限公司 Packaging method
CN107708303A (en) * 2016-08-08 2018-02-16 三星电子株式会社 Printed circuit board (PCB) and the semiconductor package part including printed circuit board (PCB)
CN107708303B (en) * 2016-08-08 2021-05-07 三星电子株式会社 Printed circuit board and semiconductor package including the same
CN111816644A (en) * 2019-04-10 2020-10-23 力成科技股份有限公司 Antenna integrated package structure and manufacturing method thereof
CN111816644B (en) * 2019-04-10 2023-08-29 力成科技股份有限公司 Antenna-integrated package structure and manufacturing method thereof

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