CN101229916B - Method for synthesizing silicon nitride powder by burning polytetrafluoroethylene as additive - Google Patents
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Abstract
本发明属于非氧化物超细氮化硅粉体的制备技术领域,特别涉及在无氮化硅稀释剂时利用聚四氟乙烯作添加剂燃烧合成氮化硅粉体的方法。以硅粉、铵盐或含氮化合物和聚四氟乙烯为原料,按不同的组分配比配制成反应混合料,经短时间研磨混合后,将混合物料装于密闭的耐高温容器中,松装密度为0.8~2.0g/cm3;反应装置抽真空后充入氮气、氨气等,使燃烧合成反应装置的气体压力控制在5MPa之内,产物经过细磨处理后可以得到均质的氮化硅粉体,其α相含量为60~80%。本发明实现了硅粉在无氮化硅稀释剂条件下燃烧合成氮化硅,突破了传统燃烧合成氮化硅工艺必须添加大量氮化硅稀释剂的限制。本发明的方法提高了产品净产率,降低了成本。The invention belongs to the technical field of preparation of non-oxide superfine silicon nitride powder, and in particular relates to a method for burning and synthesizing silicon nitride powder by using polytetrafluoroethylene as an additive when there is no silicon nitride diluent. Using silicon powder, ammonium salt or nitrogen-containing compound and polytetrafluoroethylene as raw materials, the reaction mixture is prepared according to different component ratios. After a short period of grinding and mixing, the mixture is placed in a closed high-temperature-resistant container, loose The packing density is 0.8~2.0g/cm 3 ; the reaction device is vacuumed and filled with nitrogen, ammonia, etc., so that the gas pressure of the combustion synthesis reaction device is controlled within 5MPa, and the product can be obtained after fine grinding. The SiC powder has an α-phase content of 60-80%. The invention realizes the combustion synthesis of silicon nitride by silicon powder under the condition of no silicon nitride diluent, and breaks through the limitation that a large amount of silicon nitride diluent must be added in the traditional combustion synthesis silicon nitride process. The method of the invention improves the net yield of products and reduces costs.
Description
技术领域technical field
本发明属于非氧化物超细氮化硅粉体的制备技术领域,涉及燃烧合成(也称自蔓延高温合成)氮化硅粉体的方法,特别涉及在无氮化硅稀释剂时利用聚四氟乙烯(PTFE)作添加剂燃烧合成氮化硅(Si3N4)粉体的方法。The invention belongs to the technical field of preparation of non-oxide ultrafine silicon nitride powder, and relates to a method for combustion synthesis (also known as self-propagating high-temperature synthesis) of silicon nitride powder, in particular to the use of polytetrafluoroethylene when there is no silicon nitride diluent. A method for synthesizing silicon nitride (Si 3 N 4 ) powder by burning vinyl fluoride (PTFE) as an additive.
背景技术Background technique
氮化硅陶瓷作为一种重要的高温结构陶瓷材料,具有低密度、低比重、高硬度、耐腐蚀、耐磨损、耐高温、高弹性模量、抗氧化、抗热震性和电绝缘性能好等优点,其在轴承、轧辊、切削工具、发动机部件等方面已经得到了广泛的应用,并具有很大的发展潜力。氮化硅粉末作为生产氮化硅陶瓷制品的原始材料,其商业需求量呈逐年增加的趋势。As an important high-temperature structural ceramic material, silicon nitride ceramics have low density, low specific gravity, high hardness, corrosion resistance, wear resistance, high temperature resistance, high elastic modulus, oxidation resistance, thermal shock resistance and electrical insulation properties Good and other advantages, it has been widely used in bearings, rolls, cutting tools, engine parts, etc., and has great development potential. Silicon nitride powder is used as the raw material for the production of silicon nitride ceramic products, and its commercial demand is increasing year by year.
国际上已研究开发的氮化硅粉体的制备方法有很多,具有代表性的有硅粉直接氮化法、碳热还原法、硅亚胺分解法、等离子法和燃烧合成法。国际上一些大型生产厂家如德国的Stark、日本的Denka等普遍采用直接氮化法来制备氮化硅粉体。其工艺过程是:将硅粉置于氮气(或氮气/氢气)流动气氛中,经过不同时间段的长时间保温,完全氮化后经研磨等处理即可获得氮化硅粉体。该方法生产周期较长(高达72小时),需要二次氮化,因此能耗大,还必须严格控制好各种工艺参数。碳热还原法工艺也存在生产周期长、过程复杂、成本高等缺点,另外产物中碳、氧等杂质含量较高。日本UBE公司生产的商品化程度较好的氮化硅粉体采用的是硅亚胺分解法。该法除了存在工艺复杂、生产成本高、生产过程中的腐蚀问题等的缺点外,产物中的氯含量还较高。近年来,国内一些单位开发了等离子法来制备纳米氮化硅。其工艺过程为:往等离子体发生器中通入等离子体工作气体(如N2-Ar-H2等),然后利用等离子体电弧加热工作气体,最后注入含氮原料(如NH3、N2等)和含硅原料(如SiCl4)进行化学气相反应来制备氮化硅纳米粉体。等离子法制备的氮化硅大多是无定型的氮化硅粉体,并且含有氯化铵杂质,产物需要经过500℃以上脱除氯化铵杂质以及高温下处理才能获得高α相氮化硅粉体。等离子法也存在设备复杂、成本高、能耗大等缺点,另外在产品价格和产量规模上也不具备形成大规模产业的可能性。There are many preparation methods of silicon nitride powder that have been researched and developed in the world, the representative ones are silicon powder direct nitriding method, carbothermal reduction method, silicon imine decomposition method, plasma method and combustion synthesis method. Some large-scale manufacturers in the world, such as Stark in Germany and Denka in Japan, generally use the direct nitriding method to prepare silicon nitride powder. The process is: place the silicon powder in a nitrogen (or nitrogen/hydrogen) flowing atmosphere, hold it for a long time for different periods of time, complete nitriding, and then perform grinding and other treatments to obtain silicon nitride powder. This method has a long production cycle (up to 72 hours), requires secondary nitriding, and therefore consumes a lot of energy, and various process parameters must be strictly controlled. The carbothermal reduction process also has disadvantages such as long production cycle, complicated process, and high cost. In addition, the content of impurities such as carbon and oxygen in the product is relatively high. The commercialized silicon nitride powder produced by Japan UBE Company adopts the silicon imine decomposition method. In addition to the disadvantages of complex process, high production cost, and corrosion problems in the production process, this method also has relatively high chlorine content in the product. In recent years, some domestic units have developed a plasma method to prepare nano-silicon nitride. The process is as follows: inject plasma working gas (such as N 2 -Ar-H 2 , etc.) into the plasma generator, then use plasma arc to heat the working gas, and finally inject nitrogen-containing raw materials (such as NH 3 etc.) and silicon-containing raw materials (such as SiCl 4 ) by chemical vapor phase reaction to prepare silicon nitride nanopowder. Most of the silicon nitride prepared by plasma method is amorphous silicon nitride powder and contains ammonium chloride impurities. The product needs to be removed from ammonium chloride impurities at a temperature above 500°C and treated at high temperature to obtain high α-phase silicon nitride powder. body. The plasma method also has disadvantages such as complex equipment, high cost, and high energy consumption. In addition, it does not have the possibility of forming a large-scale industry in terms of product price and output scale.
燃烧合成技术(Combustion synthesis,缩写CS)也称自蔓延高温合成(Self-propagating high temperature synthesis,简称SHS),是一种有效的合成氮化物、碳化物等新型特种陶瓷粉末材料的新技术。其基本过程特点是:高放热的化学反应体系在利用外部能量诱发后发生局部化学放热反应(此过程称为点燃),形成燃烧反应前沿(即燃烧波),此后反应在自身放出的热量的维持下,反应不断地自发向前进行(称为自蔓延),在燃烧波蔓延的过程中,反应物转变为合成材料。对于燃烧合成氮化硅技术来说,其特点表现在反应迅速、能耗低、自净化、粉体的烧结活性高、设备、工艺简单、投资小、设备通用性强等方面。Combustion synthesis (CS for short), also known as self-propagating high temperature synthesis (SHS for short), is an effective new technology for synthesizing new special ceramic powder materials such as nitrides and carbides. Its basic process features are: a highly exothermic chemical reaction system undergoes a local chemical exothermic reaction after being induced by external energy (this process is called ignition), forming a combustion reaction front (that is, a combustion wave), and then reacts in the heat released by itself Under the maintenance of the combustion wave, the reaction continues to proceed spontaneously (called self-propagation). During the propagation of the combustion wave, the reactants are transformed into synthetic materials. For the combustion synthesis of silicon nitride technology, its characteristics are in the aspects of rapid reaction, low energy consumption, self-purification, high sintering activity of powder, simple equipment and process, small investment, and strong versatility of equipment.
自20世纪80年代始,国内外材料研究者对采用燃烧合成技术制备氮化硅粉体表现出了高度的关注,已经有大量的专利和研究论文报道。这些报道各有侧重点。Since the 1980s, material researchers at home and abroad have shown high attention to the preparation of silicon nitride powder by combustion synthesis technology, and there have been a large number of patents and research papers. These reports have different focuses.
自俄罗斯科学家Merzhanov等将其发明的SHS技术用于制备氮化硅粉体后,其申请了名为“具有高α相含量氮化硅的制备方法”(美国专利号US5032370)的专利,该燃烧合成反应需要的气体压力过高(最高达30MPa),反应原料中添加的铵盐量过大(最高达所加硅粉含量的60wt%);另外,在该工艺的原料中不仅Si粉需要经过氢氟酸等特殊方法进行预处理,而且还使用了不同含量的无定形Si或硅亚胺,这就使得原料的成本增加。美国Holt J.Birch等发明的“燃烧合成细晶α相氮化硅”(美国专利号US4944930),采用大量的NaN3(约占反应物的50wt%)等为氮源。由于NaN3属于高毒易爆品,不仅会引进杂质,同时也不适合安全生产。Since the Russian scientist Merzhanov et al. used the SHS technology invented by him to prepare silicon nitride powder, he applied for a patent named "Preparation Method of Silicon Nitride with High α Phase Content" (US Patent No. US5032370). The gas pressure required for the synthesis reaction is too high (up to 30MPa), and the amount of ammonium salt added in the reaction raw material is too large (up to 60wt% of the added silicon powder content); in addition, in the raw materials of this process, not only Si powder needs to pass through Special methods such as hydrofluoric acid are used for pretreatment, and different contents of amorphous Si or silicon imine are used, which increases the cost of raw materials. The "combustion synthesis of fine-grained α-phase silicon nitride" (US Patent No. US4944930) invented by Holt J. Birch in the United States uses a large amount of NaN 3 (accounting for about 50wt% of the reactants) as a nitrogen source. Since NaN 3 is highly toxic and explosive, it will not only introduce impurities, but also is not suitable for safe production.
中国陈克新等发明的“一种低压燃烧合成高α相氮化硅粉体的方法”(中国专利号为02100183.9),利用悬浮氮化硅粉的技术制备氮化硅,该法可以起到降低氮气压力的作用,但在所使用的原料中加入了一定量的硅亚胺或无定形硅,同时加入了高达58wt%的氮化硅作为稀释剂。其目的是为了合成的是高α相含量的氮化硅。中国孙加林等发明的“低压燃烧合成氮化硅或氮化硅铁的方法及设备”(中国专利申请号为02158760.4),通过对燃烧合成设备作了改进后,起到了降低氮气压力的作用,但也加入了高达95wt%的氮化硅作为稀释剂,同时原料需要进行预热,预热要求达到的温度高达1200℃,同样会导致能耗和生产成本过高。该法合成的是高β相含量的氮化硅。中国王声宏等发明的“一种氮化硅燃烧合成过程中增压调控的生产方法”(中国专利号为03149961.9)和“一种造粒燃烧合成氮化硅的生产方法”(中国专利号为200410037807.9),分别在原料的预处理及后续的过程控制上做了改进,其目的分别在于合成均质的高β相含量的氮化硅,但也都加入了高达60wt%的氮化硅作为稀释剂,而且所采用的方法使得整个工艺操作过程变得复杂,还会引进杂质。上海硅酸盐所的两篇专利“自蔓延高温合成制备β-氮化硅晶须的方法”(中国专利号为01126400.4)和“以氮化硅镁作为生长助剂燃烧合成制备β-氮化硅棒晶”(中国专利号为200410017913.0),介绍的是通过燃烧合成方法来制备β-氮化硅,同样也都加入了达50wt%的氮化硅作为稀释剂,前者采用氧化物作生长助剂,后者采用氮化硅镁作助剂,两者都不可避免的在产物中引入氧或者金属杂质。同时,该法产物的后续处理使得工艺变得复杂。"A Method for Synthesizing High α-phase Silicon Nitride Powder by Low-Pressure Combustion" (Chinese Patent No. 02100183.9) invented by Chen Kexin in China, uses the technology of suspending silicon nitride powder to prepare silicon nitride, which can reduce nitrogen gas The effect of pressure, but a certain amount of silicon imide or amorphous silicon is added to the raw materials used, and at the same time, up to 58wt% of silicon nitride is added as a diluent. The purpose is to synthesize silicon nitride with a high α-phase content. The "Method and Equipment for Synthesizing Silicon Nitride or Ferrosilicon Nitride by Low-Pressure Combustion" (Chinese Patent Application No. 02158760.4) invented by China Sun Jialin et al. improved the combustion synthesis equipment and played a role in reducing the nitrogen pressure, but Up to 95wt% of silicon nitride is also added as a diluent, and the raw material needs to be preheated, and the temperature required for preheating is as high as 1200°C, which will also lead to high energy consumption and production costs. This method synthesizes silicon nitride with high β-phase content. Invented by Wang Shenghong of China, "A production method for pressurized control during silicon nitride combustion synthesis" (Chinese patent number 03149961.9) and "A production method for granulation combustion synthesis of silicon nitride" (Chinese patent number 200410037807.9 ), respectively improved the pretreatment of raw materials and subsequent process control, the purpose of which is to synthesize homogeneous silicon nitride with high β phase content, but also added up to 60wt% silicon nitride as a diluent , and the method used makes the whole process operation complicated and also introduces impurities. Two patents issued by Shanghai Institute of Ceramics "Self-propagating high-temperature synthesis method for preparing β-silicon nitride whiskers" (China Patent No. 01126400.4) and "Preparation of β-nitride whiskers by combustion synthesis using silicon magnesium nitride as a growth aid" "Silicon Rod Crystal" (Chinese Patent No. 200410017913.0) introduces the preparation of β-silicon nitride by combustion synthesis method, and also adds up to 50wt% silicon nitride as a diluent. The former uses oxide as a growth aid. agent, the latter uses magnesium silicon nitride as an auxiliary agent, both of which inevitably introduce oxygen or metal impurities into the product. At the same time, the subsequent treatment of the product of this method makes the process complicated.
以上专利大多数在工艺上做了改进,目的是制备高β相或高α相含量的氮化硅,但不论是实验研究还是产业化,通常都涉及到在原料组成中添加不同比例的氮化硅(最高达95wt%)作为稀释剂来降低反应温度,从而避免反应过程中Si的熔融团聚,从而保证Si粉在氮气中的燃烧合成得以进行。这种做法的主要问题是使得产品的净产率低,导致成本高。显然,这些工艺对于制备α相含量为60~80%的氮化硅粉体来说更会增加成本,不适宜于工业化生产。因此,开发较低氮气压力下的不用氮化硅作稀释剂进行燃烧合成氮化硅的新工艺显得极为必要。Most of the above patents have been improved in the process, the purpose is to prepare silicon nitride with high β phase or high α phase content, but whether it is experimental research or industrialization, it usually involves adding different proportions of silicon nitride to the raw material composition. Silicon (up to 95wt%) is used as a diluent to reduce the reaction temperature, thereby avoiding the melting and agglomeration of Si during the reaction process, thereby ensuring that the combustion synthesis of Si powder in nitrogen can be carried out. The main problem with this approach is that it makes the net yield of the product low, resulting in high cost. Obviously, these processes will increase the cost for the preparation of silicon nitride powder with an α-phase content of 60-80%, and are not suitable for industrial production. Therefore, it is extremely necessary to develop a new process for synthesizing silicon nitride by combustion without using silicon nitride as a diluent under lower nitrogen pressure.
发明内容Contents of the invention
本发明的目的在于提供一种以聚四氟乙烯(PTFE)为新型添加剂燃烧合成氮化硅粉体的新方法。The object of the present invention is to provide a new method for burning and synthesizing silicon nitride powder with polytetrafluoroethylene (PTFE) as a novel additive.
本发明的方法是以硅粉、铵盐或含氮化合物和PTFE为原料,按不同的组分配比配制成反应混合料,经短时间研磨混合后,将混合物料装于密闭的耐高温容器中,松装密度为0.8~2.0g/cm3;然后将装有反应混合料的密闭的耐高温容器放入带有冷却水夹套的高压反应装置中,反应装置抽真空后充入氮气、氨气或氮气与NH3、Ar或H2的混合气体,使燃烧合成反应装置的气体压力控制在5MPa之内,再通过局部加热方式,引发燃烧合成反应,合成后的氮化硅产物随炉冷却。产物经过细磨处理后可以得到均质的氮化硅粉体,其α相含量为60~80%。The method of the present invention uses silicon powder, ammonium salt or nitrogen-containing compound and PTFE as raw materials, and prepares a reaction mixture according to different component ratios. After grinding and mixing for a short time, the mixture is packed in a closed high-temperature-resistant container. , the bulk density is 0.8-2.0g/cm 3 ; then put the airtight high-temperature-resistant container containing the reaction mixture into the high-pressure reaction device with a cooling water jacket, and the reaction device is vacuumed and filled with nitrogen, ammonia Gas or nitrogen mixed with NH 3 , Ar or H 2 to control the gas pressure of the combustion synthesis reaction device within 5MPa, and then through local heating to initiate the combustion synthesis reaction, and the synthesized silicon nitride product is cooled with the furnace . After the product is finely ground, homogeneous silicon nitride powder can be obtained, and the alpha phase content is 60-80%.
本发明的以聚四氟乙烯为添加剂燃烧合成氮化硅粉体的方法包括以下步骤:The method for burning and synthesizing silicon nitride powder with polytetrafluoroethylene as an additive of the present invention comprises the following steps:
(1).反应剂的配制(1). Preparation of reactants
按硅粉:铵盐、含氮化合物或它们的混合物:聚四氟乙烯的重量份比例为95~60∶4.5~30∶0.5~10称取原料并充分混合,配制反应剂;优选硅粉∶铵盐、含氮化合物或它们的混合物∶聚四氟乙烯的重量份比例为95~63∶4.5~27∶0.5~10。According to silicon powder: ammonium salt, nitrogen-containing compound or their mixture: the weight ratio of polytetrafluoroethylene is 95 ~ 60: 4.5 ~ 30: 0.5 ~ 10 Weigh raw materials and fully mix, prepare reactant; Preferred silicon powder: The weight ratio of ammonium salt, nitrogen-containing compound or their mixture:polytetrafluoroethylene is 95-63:4.5-27:0.5-10.
(2).反应剂的预处理(2). Pretreatment of reactants
将步骤(1)的混合后的物料置于研磨设备上经短时间的研磨混合处理,或者置于超声装置中进行混合处理;The mixed material in step (1) is placed on a grinding device for a short period of grinding and mixing treatment, or placed in an ultrasonic device for mixing treatment;
(3).燃烧合成反应(3). Combustion synthesis reaction
将经过步骤(2)预处理后的混合物料装于密闭的耐高温容器中,松装密度为0.8~2.0g/cm3;然后将容器放入带有冷却水夹套的高压反应装置中,抽真空后充入氮气、氨气或氮气与NH3、Ar或H2的混合气体(其中,氮气与Ar或H2的混合气体中Ar或H2所占的比例为0~30vol%),使燃烧合成反应装置的气体压力控制在5MPa之内,优选气体压力控制在1.0~5MPa之间;再通过局部加热方式(电点火),引发燃烧合成反应,合成后的氮化硅产物随炉冷却。产物经过粉碎细磨分级等后处理后可以得到均质的氮化硅粉体,其α相含量为60~80%。Put the pretreated mixture in step (2) in a closed high-temperature-resistant container with a bulk density of 0.8 to 2.0 g/cm 3 ; then put the container into a high-pressure reaction device with a cooling water jacket, After vacuuming, fill it with nitrogen, ammonia or the mixed gas of nitrogen and NH 3 , Ar or H 2 (the proportion of Ar or H 2 in the mixed gas of nitrogen and Ar or H 2 is 0-30vol%), The gas pressure of the combustion synthesis reaction device is controlled within 5MPa, preferably the gas pressure is controlled between 1.0-5MPa; and then the combustion synthesis reaction is triggered by local heating (electric ignition), and the synthesized silicon nitride product is cooled with the furnace . The homogeneous silicon nitride powder can be obtained after post-processing such as pulverization, fine grinding and grading of the product, and the alpha phase content thereof is 60-80%.
所述的物料研磨混合处理后,粉体经过筛分处理,然后装入多孔石墨坩埚中,松装密度为0.8~2.0g/cm3,再将布粉后的多孔石墨坩埚放入密闭的耐高温容器中进行燃烧合成反应。After the materials are ground and mixed, the powder is sieved, and then put into a porous graphite crucible with a bulk density of 0.8-2.0g/cm 3 , and then put the powdered porous graphite crucible into a closed resistant The combustion synthesis reaction is carried out in a high-temperature container.
所述的原料硅粉纯度>99%,粒径范围为0.1~10μm。The purity of the raw silicon powder is greater than 99%, and the particle size ranges from 0.1 to 10 μm.
当选自铵盐与含氮化合物的混合物时,它们之间为等重量份比例。When selected from a mixture of ammonium salts and nitrogen-containing compounds, they are in an equal weight ratio.
所述的铵盐是纯度为化学纯的NH4F、NH4Cl、(NH4)2CO3或它们的混合物等;当选自两种或两种以上的混合物时,它们之间为等重量份比例。The said ammonium salt is chemically pure NH 4 F, NH 4 Cl, (NH 4 ) 2 CO 3 or mixtures thereof; when selected from two or more mixtures, they are equal in weight portion ratio.
所述的含氮化合物是纯度为化学纯的CO(NH2)2。The nitrogen-containing compound is chemically pure CO(NH 2 ) 2 .
所述的聚四氟乙烯添加剂的纯度为化学纯。The purity of the polytetrafluoroethylene additive is chemically pure.
本发明突破了利用燃烧合成方法制备氮化硅粉体时,尤其是工业规模生产条件下必须添加大量氮化硅稀释剂的限制。合成的氮化硅粉体杂质含量低,颗粒均匀细小。而且生产成本低、生产效率高、易于操作、设备投资少,适宜于大规模生产。The invention breaks through the limitation that a large amount of silicon nitride diluent must be added when the silicon nitride powder is prepared by the combustion synthesis method, especially under industrial scale production conditions. The synthesized silicon nitride powder has low impurity content and uniform and fine particles. Moreover, the production cost is low, the production efficiency is high, the operation is easy, the equipment investment is small, and it is suitable for large-scale production.
本发明与已有技术相比的优点:Advantage of the present invention compared with prior art:
1)本发明提供了一种新型的聚四氟乙烯(PTFE)添加剂,实现了Si粉在没1) The present invention provides a novel polytetrafluoroethylene (PTFE) additive, which realizes Si powder without
有氮化硅稀释剂加入条件下燃烧合成Si3N4,突破了传统燃烧合成氮化硅工艺尤其是工业规模生产条件下必须添加大量氮化硅稀释剂的限制,提高了产品净产率,降低了成本,有助于燃烧合成氮化硅工艺低成本优势的充分发挥。Combustion synthesis of Si 3 N 4 with the addition of silicon nitride diluent breaks through the traditional combustion synthesis of silicon nitride process, especially the limitation of adding a large amount of silicon nitride diluent under industrial scale production conditions, and improves the net product yield. The cost is reduced, and it is helpful to give full play to the low-cost advantage of the combustion synthesis silicon nitride process.
2)本发明工艺过程简单,可操作性强,避免了繁琐复杂的工艺处理过程。原料只需要经过短时间的混合预处理,减少了研磨时间过长带来的能耗和污染;粉料坯勿需经过特殊处理,减少了操作的难度。2) The technological process of the present invention is simple, and operability is strong, has avoided tedious and complicated technological process. The raw materials only need to be mixed and pretreated for a short time, which reduces the energy consumption and pollution caused by the long grinding time; the powder blank does not need special treatment, which reduces the difficulty of operation.
附图说明Description of drawings
图1.本发明实施例1中制备的氮化硅粉体的X射线衍射图。Fig. 1. X-ray diffraction diagram of the silicon nitride powder prepared in Example 1 of the present invention.
图2.本发明实施例1中制备的氮化硅粉体的扫描电镜显微分析图。Fig. 2. SEM microscopic analysis diagram of the silicon nitride powder prepared in Example 1 of the present invention.
具体实施方式Detailed ways
实施例1Example 1
按硅粉(纯度>99%,粒径范围为0.1~10μm)∶氯化铵∶PTFE为90∶9∶1的重量份称取原料,将配制好的原料置于振动研磨机上混合研磨1小时,研磨后粉体经过筛分处理,然后装入多孔石墨坩埚中,松装密度为0.8~2.0g/cm3。将布粉后的多孔石墨坩埚放入40L的燃烧合成反应装置内,在粉坯的一端安放螺旋状钨丝和钛粉做点火源。抽真空后,往燃烧合成反应装置内充入氮气,直到压力达到1.5MPa。对钨丝通电加热引燃钛粉,诱发粉末体系发生燃烧合成反应。随炉冷却燃烧合成得到的产物。得到的产物经过粉碎细磨等后处理工艺即得到α相含量为77.7%,平均粒径为2.6μm的均质氮化硅粉体。Weigh the raw materials according to the weight ratio of silicon powder (purity > 99%, particle size range 0.1-10 μm): ammonium chloride: PTFE 90:9:1, put the prepared raw materials on a vibrating grinder, mix and grind for 1 hour , After grinding, the powder is sieved, and then loaded into a porous graphite crucible, with a bulk density of 0.8-2.0g/cm 3 . Put the powdered porous graphite crucible into a 40L combustion synthesis reaction device, and place a spiral tungsten wire and titanium powder at one end of the powder blank as an ignition source. After vacuuming, fill the combustion synthesis reaction device with nitrogen until the pressure reaches 1.5 MPa. The tungsten wire is energized and heated to ignite the titanium powder, inducing the combustion synthesis reaction of the powder system. Combustion synthesized products with furnace cooling. The obtained product is subjected to post-treatment processes such as pulverization and fine grinding to obtain a homogeneous silicon nitride powder with an α phase content of 77.7% and an average particle size of 2.6 μm.
本实施例中燃烧合成产物的X射线衍射图及扫描电镜显微分析图见附图1、图2。通过物相分析可以得知产物为氮化硅,无残余Si的衍射峰出现,这说明了Si粉实现了完全氮化。采用X射线衍射分析法定量计算得产物中α相氮化硅的含量为77.7%。从产物的扫描电镜显微分析图2中可以看出,得到的产物颗粒尺寸均匀,大小一致,具备均质氮化硅粉体的特点。The X-ray diffraction pattern and scanning electron microscope microanalysis diagram of the combustion synthesis product in this embodiment are shown in accompanying drawings 1 and 2. Through phase analysis, it can be known that the product is silicon nitride, and no diffraction peak of residual Si appears, which shows that Si powder has been completely nitrided. Quantitatively calculated by X-ray diffraction analysis method, the content of α-phase silicon nitride in the product is 77.7%. It can be seen from the scanning electron microscope microscopic analysis of the product in Figure 2 that the particle size of the obtained product is uniform, consistent in size, and has the characteristics of a homogeneous silicon nitride powder.
实施例2Example 2
按硅粉(纯度>99%,粒径范围为0.1~10μm)∶铵盐∶PTFE为73∶22∶5的重量份比例称取原料,其中铵盐为氯化铵和氟化氨的混合物,其重量份比例为1∶1。将配制好的原料置于振动研磨机上混合研磨1小时,研磨后粉体经过筛分处理,然后装入多孔石墨坩埚中,松装密度为0.8~2.0g/cm3。将布粉后的多孔石墨坩埚放入40L的燃烧合成反应装置内,在粉坯的一端安放螺旋状钨丝和钛粉做点火源。经抽真空后,往燃烧合成反应装置内充入氮气和氩气的混合气体,其中氩气所占的比例为20vol%,直到压力达到3MPa。对钨丝通电加热引燃钛粉,(采用局部加热方式)诱发粉末体系发生燃烧合成反应。随炉冷却燃烧合成得到的产物。得到的产物经过处理后即得到α相含量为78.4%,平均粒径为8.5μm的氮化硅粉体。Take the raw material according to the weight ratio of silicon powder (purity > 99%, particle size range is 0.1 ~ 10 μ m): ammonium salt: PTFE is 73: 22: 5, wherein the ammonium salt is the mixture of ammonium chloride and ammonium fluoride, The ratio of parts by weight is 1:1. The prepared raw materials are placed on a vibrating grinder for mixing and grinding for 1 hour. After grinding, the powder is sieved and then loaded into a porous graphite crucible with a bulk density of 0.8-2.0 g/cm 3 . Put the powdered porous graphite crucible into a 40L combustion synthesis reaction device, and place a spiral tungsten wire and titanium powder at one end of the powder blank as an ignition source. After vacuuming, a mixture of nitrogen and argon is charged into the combustion synthesis reaction device, wherein the proportion of argon is 20 vol%, until the pressure reaches 3 MPa. The tungsten wire is energized and heated to ignite the titanium powder, and (by local heating) induces the combustion synthesis reaction of the powder system. Combustion synthesized products with furnace cooling. The obtained product was treated to obtain silicon nitride powder with an α-phase content of 78.4% and an average particle size of 8.5 μm.
实施例3Example 3
按硅粉(纯度>99%,粒径范围为0.1~10μm)∶(铵盐+含氮化合物)∶PTFE为81∶10∶9的重量份比例称取原料,其中铵盐为氯化铵和碳酸氨,含氮化合物为尿素,其重量份比例为1∶1∶1。将配制好的原料置于振动研磨机上混合研磨1小时,研磨后粉体经过筛分处理,然后装入多孔石墨坩埚中,松装密度为0.8~2.0g/cm3。将布粉后的多孔石墨坩埚放入40L的燃烧合成反应装置内,在粉坯的一端安放螺旋状钨丝和钛粉做点火源。经抽真空后,往燃烧合成反应装置内充入氮气和氢气的混合气体,其中氢气所占的比例为25vol%,,直到压力达到4.5MPa。对钨丝通电加热引燃钛粉,诱发粉末体系发生燃烧合成反应。随炉冷却燃烧合成得到的产物。得到的产物经过处理后即得到α相含量为63.8%,平均粒径为6.5μm的氮化硅粉体。According to silicon powder (purity > 99%, particle diameter range is 0.1~10 μ m): (ammonium salt+nitrogen-containing compound): PTFE is the weight ratio of 81: 10: 9 and takes raw material, wherein ammonium salt is ammonium chloride and Ammonium carbonate, the nitrogen-containing compound is urea, and its weight ratio is 1:1:1. The prepared raw materials are placed on a vibrating grinder for mixing and grinding for 1 hour. After grinding, the powder is sieved and then loaded into a porous graphite crucible with a bulk density of 0.8-2.0 g/cm 3 . Put the powdered porous graphite crucible into a 40L combustion synthesis reaction device, and place a spiral tungsten wire and titanium powder at one end of the powder blank as an ignition source. After vacuuming, a mixture of nitrogen and hydrogen is charged into the combustion synthesis reaction device, wherein the proportion of hydrogen is 25 vol%, until the pressure reaches 4.5 MPa. The tungsten wire is energized and heated to ignite the titanium powder, inducing the combustion synthesis reaction of the powder system. Combustion synthesized products with furnace cooling. The obtained product was treated to obtain a silicon nitride powder with an α-phase content of 63.8% and an average particle size of 6.5 μm.
实施例4Example 4
按硅粉(纯度>99%,粒径范围为0.1~10μm)∶(铵盐+含氮化合物)∶PTFE为83∶15∶2的重量份比例称取原料,其中铵盐为氟化铵和碳酸氨,含氮化合物为尿素,其重量份比例为1∶1∶1。将配制好的原料置于振动研磨机上混合研磨0.5小时,研磨后粉体置于超声装置中处理20分钟,然后筛分并装入多孔石墨坩埚中,松装密度为0.8~2.0g/cm3。将布粉后的多孔石墨坩埚放入40L的燃烧合成反应装置内,在粉坯的一端安放螺旋状钨丝和钛粉做点火源。经抽真空后,往燃烧合成反应装置内充入氮气和氢气的混合气体,其中氢气所占的比例为10vol%,,直到压力达到3.5MPa。对钨丝通电加热引燃钛粉,诱发粉末体系发生燃烧合成反应。随炉冷却燃烧合成得到的产物。得到的产物经过处理后即得到α相含量为67.8%,平均粒径为4.5μm的氮化硅粉体。Weigh raw materials according to the weight ratio of silicon powder (purity > 99%, particle size range is 0.1 ~ 10 μm): (ammonium salt + nitrogen-containing compound): PTFE is 83: 15: 2, wherein the ammonium salt is ammonium fluoride and Ammonium carbonate, the nitrogen-containing compound is urea, and its weight ratio is 1:1:1. Mix and grind the prepared raw materials on a vibrating grinder for 0.5 hours. After grinding, place the powder in an ultrasonic device for 20 minutes, then sieve and put it into a porous graphite crucible. The bulk density is 0.8-2.0g/cm 3 . Put the powdered porous graphite crucible into a 40L combustion synthesis reaction device, and place a spiral tungsten wire and titanium powder at one end of the powder blank as an ignition source. After vacuuming, a mixture of nitrogen and hydrogen is charged into the combustion synthesis reaction device, wherein the proportion of hydrogen is 10vol%, until the pressure reaches 3.5MPa. The tungsten wire is energized and heated to ignite the titanium powder, inducing the combustion synthesis reaction of the powder system. Combustion synthesized products with furnace cooling. The obtained product was treated to obtain silicon nitride powder with an α-phase content of 67.8% and an average particle diameter of 4.5 μm.
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