CN100589031C - A kind of light curing inkjet resist for printed circuit board and preparation method thereof - Google Patents
A kind of light curing inkjet resist for printed circuit board and preparation method thereof Download PDFInfo
- Publication number
- CN100589031C CN100589031C CN200610165254A CN200610165254A CN100589031C CN 100589031 C CN100589031 C CN 100589031C CN 200610165254 A CN200610165254 A CN 200610165254A CN 200610165254 A CN200610165254 A CN 200610165254A CN 100589031 C CN100589031 C CN 100589031C
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- China
- Prior art keywords
- acrylate
- acid
- blue
- component
- diacrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000002360 preparation method Methods 0.000 title claims abstract description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 37
- 238000000016 photochemical curing Methods 0.000 claims abstract description 15
- 239000011347 resin Substances 0.000 claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 14
- 239000002253 acid Substances 0.000 claims description 29
- -1 functional group propenoic acid ester Chemical class 0.000 claims description 28
- 239000000178 monomer Substances 0.000 claims description 26
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 15
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 239000003795 chemical substances by application Substances 0.000 claims description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 10
- 239000002270 dispersing agent Substances 0.000 claims description 9
- 229960000834 vinyl ether Drugs 0.000 claims description 9
- 238000009736 wetting Methods 0.000 claims description 9
- 239000000975 dye Substances 0.000 claims description 8
- 239000003112 inhibitor Substances 0.000 claims description 8
- 238000006116 polymerization reaction Methods 0.000 claims description 8
- 239000013530 defoamer Substances 0.000 claims description 7
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 6
- 229960001506 brilliant green Drugs 0.000 claims description 6
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 claims description 5
- YFXXJQJIGQHZSG-UHFFFAOYSA-N 4-(prop-1-enoxymethyl)-1,3-dioxolan-2-one Chemical compound CC=COCC1COC(=O)O1 YFXXJQJIGQHZSG-UHFFFAOYSA-N 0.000 claims description 5
- 125000004386 diacrylate group Chemical group 0.000 claims description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 5
- 239000004925 Acrylic resin Substances 0.000 claims description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 claims description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 4
- 239000012965 benzophenone Substances 0.000 claims description 4
- 239000001045 blue dye Substances 0.000 claims description 4
- 239000012952 cationic photoinitiator Substances 0.000 claims description 4
- JZEXORLUKMQOFA-UHFFFAOYSA-N 2-(1-ethoxyethyl)-2-(hydroxymethyl)propane-1,3-diol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCOC(C)C(CO)(CO)CO JZEXORLUKMQOFA-UHFFFAOYSA-N 0.000 claims description 3
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 claims description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 claims description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N acetone Substances CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 claims description 2
- IQQVCMQJDJSRFU-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO IQQVCMQJDJSRFU-UHFFFAOYSA-N 0.000 claims description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 claims description 2
- NHZWSJJRDZVBSA-UHFFFAOYSA-N 3-ethyloctan-3-yl prop-2-enoate Chemical compound CCCCCC(CC)(CC)OC(=O)C=C NHZWSJJRDZVBSA-UHFFFAOYSA-N 0.000 claims description 2
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 claims description 2
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 claims description 2
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical group CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 claims description 2
- LVGFPWDANALGOY-UHFFFAOYSA-N 8-methylnonyl prop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C=C LVGFPWDANALGOY-UHFFFAOYSA-N 0.000 claims description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 2
- 244000028419 Styrax benzoin Species 0.000 claims description 2
- 235000000126 Styrax benzoin Nutrition 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 claims description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 claims description 2
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 claims description 2
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 claims description 2
- 229960002130 benzoin Drugs 0.000 claims description 2
- 230000001588 bifunctional effect Effects 0.000 claims description 2
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 claims description 2
- FWLDHHJLVGRRHD-UHFFFAOYSA-N decyl prop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C=C FWLDHHJLVGRRHD-UHFFFAOYSA-N 0.000 claims description 2
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 claims description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 2
- 235000019382 gum benzoic Nutrition 0.000 claims description 2
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 claims description 2
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 claims description 2
- QVCCZAZTGUCIHD-UHFFFAOYSA-M sodium;2-[(4-amino-3-bromo-9,10-dioxoanthracen-1-yl)amino]-5-methylbenzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC(C)=CC=C1NC1=CC(Br)=C(N)C2=C1C(=O)C1=CC=CC=C1C2=O QVCCZAZTGUCIHD-UHFFFAOYSA-M 0.000 claims description 2
- RWVGQQGBQSJDQV-UHFFFAOYSA-M sodium;3-[[4-[(e)-[4-(4-ethoxyanilino)phenyl]-[4-[ethyl-[(3-sulfonatophenyl)methyl]azaniumylidene]-2-methylcyclohexa-2,5-dien-1-ylidene]methyl]-n-ethyl-3-methylanilino]methyl]benzenesulfonate Chemical compound [Na+].C1=CC(OCC)=CC=C1NC1=CC=C(C(=C2C(=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C)C=2C(=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C)C=C1 RWVGQQGBQSJDQV-UHFFFAOYSA-M 0.000 claims description 2
- QTTDXDAWQMDLOF-UHFFFAOYSA-J tetrasodium 3-[[4-[[4-[(6-amino-1-hydroxy-3-sulfonatonaphthalen-2-yl)diazenyl]-6-sulfonatonaphthalen-1-yl]diazenyl]naphthalen-1-yl]diazenyl]naphthalene-1,5-disulfonate Chemical compound [Na+].[Na+].[Na+].[Na+].Nc1ccc2c(O)c(N=Nc3ccc(N=Nc4ccc(N=Nc5cc(c6cccc(c6c5)S([O-])(=O)=O)S([O-])(=O)=O)c5ccccc45)c4ccc(cc34)S([O-])(=O)=O)c(cc2c1)S([O-])(=O)=O QTTDXDAWQMDLOF-UHFFFAOYSA-J 0.000 claims description 2
- MPCYPRXRVWZKGF-UHFFFAOYSA-J tetrasodium 5-amino-3-[[4-[4-[(8-amino-1-hydroxy-3,6-disulfonatonaphthalen-2-yl)diazenyl]phenyl]phenyl]diazenyl]-4-hydroxynaphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].[Na+].[Na+].C1=C(S([O-])(=O)=O)C=C2C=C(S([O-])(=O)=O)C(N=NC3=CC=C(C=C3)C3=CC=C(C=C3)N=NC3=C(C=C4C=C(C=C(C4=C3O)N)S([O-])(=O)=O)S([O-])(=O)=O)=C(O)C2=C1N MPCYPRXRVWZKGF-UHFFFAOYSA-J 0.000 claims description 2
- HHKPGQSPFVLKMV-UHFFFAOYSA-N vat olive green b Chemical compound N1C(C2=C(C(C3=CC=CC=C3C2=O)=O)C=C2)=C2C2=CC=C3C(=O)C4=CC=CC=C4C4=CC=C1C2=C43 HHKPGQSPFVLKMV-UHFFFAOYSA-N 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims 16
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims 12
- 229920001427 mPEG Polymers 0.000 claims 4
- BXGYYDRIMBPOMN-UHFFFAOYSA-N 2-(hydroxymethoxy)ethoxymethanol Chemical compound OCOCCOCO BXGYYDRIMBPOMN-UHFFFAOYSA-N 0.000 claims 3
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 claims 3
- RUAIJHHRCIHFEV-UHFFFAOYSA-N methyl 4-amino-5-chlorothiophene-2-carboxylate Chemical compound COC(=O)C1=CC(N)=C(Cl)S1 RUAIJHHRCIHFEV-UHFFFAOYSA-N 0.000 claims 3
- MEAWBIDPFZUIJL-UHFFFAOYSA-N (diphenyl-$l^{3}-sulfanyl)benzene Chemical compound C1=CC=CC=C1[S](C=1C=CC=CC=1)C1=CC=CC=C1 MEAWBIDPFZUIJL-UHFFFAOYSA-N 0.000 claims 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims 2
- 238000004040 coloring Methods 0.000 claims 2
- 229960003511 macrogol Drugs 0.000 claims 2
- XUIXZBXRQFZHIT-UHFFFAOYSA-N 1-[1-(1-hydroxypropan-2-yloxy)propan-2-yloxy]-3-methoxypropan-2-ol Chemical compound COCC(O)COC(C)COC(C)CO XUIXZBXRQFZHIT-UHFFFAOYSA-N 0.000 claims 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 claims 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 claims 1
- GZBSIABKXVPBFY-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GZBSIABKXVPBFY-UHFFFAOYSA-N 0.000 claims 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 claims 1
- CERINUCHRJFNTJ-UHFFFAOYSA-N 2-(1-ethoxy-1-methoxyethyl)-2-(hydroxymethyl)propane-1,3-diol prop-2-enoic acid Chemical compound C(C=C)(=O)O.C(C=C)(=O)O.COC(C(CO)(CO)CO)(C)OCC CERINUCHRJFNTJ-UHFFFAOYSA-N 0.000 claims 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 claims 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 claims 1
- HDMIWIXLPFMCFC-UHFFFAOYSA-N 2-chloro-2h-thiopyrano[3,2-b]chromen-10-one Chemical compound O1C2=CC=CC=C2C(=O)C2=C1C=CC(Cl)S2 HDMIWIXLPFMCFC-UHFFFAOYSA-N 0.000 claims 1
- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 claims 1
- NOVNFHQBYJQDJA-UHFFFAOYSA-N C1(=CC=CC=C1)CC(C)=O.OCCOCCO Chemical compound C1(=CC=CC=C1)CC(C)=O.OCCOCCO NOVNFHQBYJQDJA-UHFFFAOYSA-N 0.000 claims 1
- YYVFJVISIWGONW-UHFFFAOYSA-N COC(O)(C(C)(CO)C)OCCC Chemical compound COC(O)(C(C)(CO)C)OCCC YYVFJVISIWGONW-UHFFFAOYSA-N 0.000 claims 1
- NNJVILVZKWQKPM-UHFFFAOYSA-N Lidocaine Chemical compound CCN(CC)CC(=O)NC1=C(C)C=CC=C1C NNJVILVZKWQKPM-UHFFFAOYSA-N 0.000 claims 1
- 229920002565 Polyethylene Glycol 400 Polymers 0.000 claims 1
- SDXWNNKIAOBKMP-UHFFFAOYSA-N SC1=C(C(=O)C2=CC=CC=C2)C=CC=C1.C1(=CC=CC=C1)C Chemical compound SC1=C(C(=O)C2=CC=CC=C2)C=CC=C1.C1(=CC=CC=C1)C SDXWNNKIAOBKMP-UHFFFAOYSA-N 0.000 claims 1
- 239000005864 Sulphur Substances 0.000 claims 1
- RVWADWOERKNWRY-UHFFFAOYSA-N [2-(dimethylamino)phenyl]-phenylmethanone Chemical compound CN(C)C1=CC=CC=C1C(=O)C1=CC=CC=C1 RVWADWOERKNWRY-UHFFFAOYSA-N 0.000 claims 1
- SSOONFBDIYMPEU-UHFFFAOYSA-N [3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propyl] prop-2-enoate Chemical compound OCC(CO)(CO)COCC(CO)(CO)COC(=O)C=C SSOONFBDIYMPEU-UHFFFAOYSA-N 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 235000010290 biphenyl Nutrition 0.000 claims 1
- 239000004305 biphenyl Substances 0.000 claims 1
- 125000006267 biphenyl group Chemical group 0.000 claims 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 claims 1
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- 125000000031 ethylamino group Chemical group [H]C([H])([H])C([H])([H])N([H])[*] 0.000 claims 1
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- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 claims 1
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- VLCAYQIMSMPEBW-UHFFFAOYSA-N methyl 3-hydroxy-2-methylidenebutanoate Chemical compound COC(=O)C(=C)C(C)O VLCAYQIMSMPEBW-UHFFFAOYSA-N 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims 1
- WKGDNXBDNLZSKC-UHFFFAOYSA-N oxido(phenyl)phosphanium Chemical compound O=[PH2]c1ccccc1 WKGDNXBDNLZSKC-UHFFFAOYSA-N 0.000 claims 1
- 235000012736 patent blue V Nutrition 0.000 claims 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 claims 1
- 238000010792 warming Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 abstract description 12
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract description 10
- 238000001723 curing Methods 0.000 abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 239000010949 copper Substances 0.000 abstract description 3
- 125000002091 cationic group Chemical group 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 abstract description 2
- 230000007797 corrosion Effects 0.000 abstract description 2
- 150000003254 radicals Chemical class 0.000 abstract description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 238000000034 method Methods 0.000 description 12
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- 238000004519 manufacturing process Methods 0.000 description 6
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
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Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
Abstract
本发明涉及一种印刷电路板用光固化喷墨抗蚀剂及其制备方法。采用含羧基的丙烯酸酯类低聚物、丙烯酸酯类低粘度树脂以及采用自由基、阳离子混合固化方式,使抗蚀剂具有良好的脱膜性、固化时间短、分辨率高,可以利用喷墨的技术,将喷墨抗蚀剂喷在覆铜板的特定区域,光固化后形成抗蚀刻图形。制得的固化膜硬度高、柔韧性好,并且具有良好的抗蚀性。The invention relates to a photocurable inkjet resist for printed circuit boards and a preparation method thereof. The use of carboxyl-containing acrylate oligomers, acrylate low-viscosity resins, and free radical and cationic mixed curing methods makes the resist have good film release properties, short curing time, and high resolution. The technology of inkjet resist is sprayed on the specific area of the copper clad laminate, and the anti-etching pattern is formed after photocuring. The prepared cured film has high hardness, good flexibility and good corrosion resistance.
Description
技术领域: Technical field:
本发明涉及一种用于印刷电路板的光固化喷墨抗蚀剂及其制备方法。The invention relates to a photocurable inkjet resist for printed circuit boards and a preparation method thereof.
背景技术: Background technique:
光致抗蚀剂也称光刻胶,主要应用于电子工业中集成电路和半导体分立器件的细微加工过程中。人类最先应用在电子工业上的光刻胶是1954年由Eastman-Kodak公司合成的聚乙烯醇肉桂酸酯及其衍生物类光刻胶体系。1958年同一公司又开发出环化橡胶——双叠氮系光刻胶,使集成电路制作的产业化成为现实。Photoresist, also known as photoresist, is mainly used in the microfabrication process of integrated circuits and semiconductor discrete devices in the electronics industry. The first photoresist used by humans in the electronics industry was the polyvinyl alcohol cinnamate and its derivatives photoresist system synthesized by Eastman-Kodak Company in 1954. In 1958, the same company developed cyclized rubber—biazide photoresist, which made the industrialization of integrated circuit production a reality.
传统的印刷线路板(PCB)的制造工艺包括基片处理、涂胶、前烘、曝光、中烘、显影、后烘、去胶。在制作过程中往往需要多次甚至几十次的光刻,每次光刻均需要完成上述的工作循环,过程非常复杂。与此同时,即使是使用抽真空的方法而使掩膜与预涂覆了感光抗蚀材料的PCB板紧密贴附,仍然会在层与层之间存在缝隙,导致在曝光时产生衍射,使图象失真。因此运用传统方法制作的PCB板的分辨率、对位以及产品的成品率都难以达到要求。The traditional manufacturing process of printed circuit board (PCB) includes substrate processing, gluing, pre-baking, exposure, middle-baking, developing, post-baking, and degumming. In the production process, multiple or even dozens of photolithography operations are often required, and the above-mentioned work cycle needs to be completed each time the photolithography is performed, and the process is very complicated. At the same time, even if the mask is closely attached to the PCB board pre-coated with photoresist material by vacuuming, there will still be gaps between layers, resulting in diffraction during exposure, making The image is distorted. Therefore, the resolution, alignment and product yield of PCB boards produced by traditional methods are difficult to meet the requirements.
喷墨技术制造PCB板是使用专用的喷墨打印机,直接将光致抗蚀剂准确地喷打在覆铜板上所需的地方而获得电路图形,不需要显影以及掩膜的制作这些复杂的工艺过程。与传统工艺相比,此方法大大简化了PCB板的制作工艺,节约成本,并且由于不需要掩膜,从而有效地提高了PCB板的分辨率。Inkjet technology to manufacture PCB boards is to use a special inkjet printer to directly spray photoresist on the desired place on the copper clad board to obtain circuit patterns, without the need for complex processes such as development and mask making process. Compared with the traditional process, this method greatly simplifies the manufacturing process of the PCB board, saves cost, and effectively improves the resolution of the PCB board because no mask is required.
US 005270368A公开了一种光固化抗蚀刻喷墨油墨,该油墨包含两种或多种丙烯酸树脂、光引发剂、有机载体(溶剂)。所选用的树脂粘度较大,通过加入溶剂来降低粘度以满足喷墨的要求。但是,挥发性溶剂的加入无法满足目前绿色环保的要求,并且对PCB板的分辨率也会产生不良影响。US 20060154033 A1报道了一种制备电子装置的方法和油墨。所制得的抗蚀刻油墨不含溶剂,通过选择合适的单体来满足喷墨的要求。但是,这种抗蚀刻油墨光固化速度慢,不利于提高PCB板的分辨率。US 005270368A discloses a photocurable anti-etching inkjet ink, which contains two or more acrylic resins, a photoinitiator, and an organic vehicle (solvent). The selected resin has a high viscosity, and the viscosity is reduced by adding a solvent to meet the requirements of inkjet. However, the addition of volatile solvents cannot meet the current environmental protection requirements, and will also have a negative impact on the resolution of the PCB board. US 20060154033 A1 reports a method and ink for preparing electronic devices. The prepared anti-etching ink does not contain solvent, and the requirement of inkjet can be satisfied by selecting suitable monomers. However, the light curing speed of this anti-etching ink is slow, which is not conducive to improving the resolution of the PCB board.
发明内容 Contents of the invention
本发明的目的在于提供一种印刷电路板(PCB)用新型光固化喷墨抗蚀剂及其制备方法。采用含羧基的丙烯酸酯类低聚物、丙烯酸酯类低粘度树脂以及采用自由基、阳离子混合固化方式,使抗蚀剂具有良好的脱膜性、固化时间短、分辨率高,可以利用喷墨的技术,将喷墨抗蚀剂喷在覆铜板的特定区域,光固化后形成抗蚀刻图形。制得的固化膜硬度高、柔韧性好,并且具有良好的抗蚀性。The object of the present invention is to provide a novel photocurable inkjet resist for printed circuit board (PCB) and a preparation method thereof. The use of carboxyl-containing acrylate oligomers, acrylate low-viscosity resins, and free radical and cationic mixed curing methods makes the resist have good film release properties, short curing time, and high resolution. The technology of inkjet resist is sprayed on the specific area of the copper clad laminate, and the anti-etching pattern is formed after photocuring. The prepared cured film has high hardness, good flexibility and good corrosion resistance.
本发明的一种印刷电路板(PCB)用新型光固化喷墨抗蚀剂,其组成及质量百分含量为:A kind of printed circuit board (PCB) of the present invention uses novel photocurable ink-jet resist, and its composition and mass percentage are:
A丙烯酸酯类低聚物10%~60%,优选范围是20%~50%,其中含羧基的丙烯酸酯类低聚物占A组份的10~90%,优选范围是40~80%,丙烯酸酯类低粘度树脂占A组份的10~90%,优选范围是20~60%;A acrylate oligomer 10% to 60%, the preferred range is 20% to 50%, wherein the carboxyl-containing acrylate oligomer accounts for 10 to 90% of component A, the preferred range is 40 to 80%, Acrylic low-viscosity resin accounts for 10-90% of component A, preferably 20-60%;
B丙烯酸酯类活性单体20~70%,优选范围是30~60%;B acrylate active monomer 20-70%, preferably 30-60%;
C乙烯基醚类活性单体5~50%,优选范围是10~30%;C vinyl ether active monomer 5-50%, the preferred range is 10-30%;
D光引发剂1~8%,优选范围是3~5%;D photoinitiator 1~8%, preferred scope is 3~5%;
E染料0.5~5%,优选范围是1~2%;E dye 0.5-5%, the preferred range is 1-2%;
F消泡剂0.1~1.0%;F defoamer 0.1 ~ 1.0%;
G流平剂0.1~1.0%;G leveling agent 0.1~1.0%;
H润湿分散剂0.1~1.0%;H wetting and dispersing agent 0.1~1.0%;
I阻聚剂0.1~1.0%。I polymerization inhibitor 0.1~1.0%.
所述的含羧基的丙烯酸酯类低聚物为粘度范围100~6000mPa·s(25℃),优选范围是100~3000mPa·s(25℃),酸值范围20~200mgKOH/g的含羧基的聚酯丙烯酸酯、含羧基的丙烯酸酯、含羧基的甲基丙烯酸酯、芳香酸丙烯酸半酯、芳香酸甲基丙烯酸半酯中的一种或它们的混合物,其中酸值表征了丙烯酸酯类低聚物的羧基含量。The carboxyl group-containing acrylate oligomer is a carboxyl group-containing oligomer with a viscosity range of 100-6000mPa·s (25°C), a preferred range of 100-3000mPa·s (25°C), and an acid value range of 20-200mgKOH/g. One of polyester acrylate, carboxyl-containing acrylate, carboxyl-containing methacrylate, aromatic acid half-acrylic acid, aromatic acid half-methacrylic acid or their mixture, wherein the acid value represents the low The carboxyl content of the polymer.
所述的丙烯酸酯类低粘度树脂为粘度范围100~500mPa·s(25℃)的丙烯酸酯树脂。此低粘度树脂粘度低、官能度大,可以在降低粘度的同时有效的提高体系的光固化速度,进而提高抗蚀剂的分辨率。The acrylate low-viscosity resin is an acrylate resin with a viscosity range of 100-500 mPa·s (25° C.). This low-viscosity resin has low viscosity and high functionality, which can effectively increase the photocuring speed of the system while reducing the viscosity, thereby improving the resolution of the resist.
所述的丙烯酸酯类活性单体为单官能团、双官能团、多官能团三种官能团活性丙烯酸酯类单体以1~3∶3~5∶1~3的质量比混合的混合物。The acrylate reactive monomer is a mixture of three functional reactive acrylate monomers of monofunctional group, bifunctional group and multifunctional group in a mass ratio of 1-3:3-5:1-3.
单官能团丙烯酸酯类单体为下列物质中的任何一种或它们的组合:丙烯酸丁酯、丙烯酸异辛酯、丙烯酸异癸酯、丙烯酸月桂酯、丙烯酸羟乙酯、丙烯酸羟丙酯、甲基丙烯酸羟乙酯、甲基丙烯酸羟丙酯、甲基丙烯酸缩水甘油酯、丙烯酸异冰片酯、甲基丙烯酸四氢呋喃甲酯、丙烯酸苯氧基乙酯、苯乙烯、醋酸乙烯酯、N-乙烯基吡咯烷酮、丁基丙烯酸酯、二乙基己基丙烯酸酯、正己基丙烯酸酯、环己基丙烯酸酯、正癸基丙烯酸酯、双环戊烯氧乙基丙烯酸酯、苯氧基乙基丙烯酸酯、4-羟丁基乙烯基醚、甘油碳酸酯丙稀基醚、十二烷基乙烯基醚、甲氧基聚乙二醇(350)单甲基丙烯酸酯、甲氧基聚乙二醇(350)单丙烯酸酯、甲氧基聚乙二醇(550)单甲基丙烯酸酯、甲氧基聚乙二醇(550)单丙烯酸酯、甲氧基三丙二醇单丙烯酸酯、甲氧基丙氧基新戊二醇单丙烯酸酯。Monofunctional acrylate monomers are any one or combination of the following substances: butyl acrylate, isooctyl acrylate, isodecyl acrylate, lauryl acrylate, hydroxyethyl acrylate, hydroxypropyl acrylate, methyl Hydroxyethyl Acrylate, Hydroxypropyl Methacrylate, Glycidyl Methacrylate, Isobornyl Acrylate, Tetrahydrofuryl Methyl Methacrylate, Phenoxyethyl Acrylate, Styrene, Vinyl Acetate, N-Vinylpyrrolidone , butyl acrylate, diethylhexyl acrylate, n-hexyl acrylate, cyclohexyl acrylate, n-decyl acrylate, dicyclopentenyloxyethyl acrylate, phenoxyethyl acrylate, 4-hydroxybutyl Polyethylene glycol (350) monomethacrylate, Glycerin carbonate propenyl ether, Dodecyl vinyl ether, Methoxypolyethylene glycol (350) monoacrylate , Methoxypolyethylene glycol (550) monomethacrylate, methoxypolyethylene glycol (550) monoacrylate, methoxytripropylene glycol monoacrylate, methoxypropoxy neopentyl glycol monoacrylate.
双官能团丙烯酸酯类单体为下列物质中的任何一种或它们的组合:新戊二醇二丙烯酸酯、乙氧基新戊二醇二丙烯酸酯、丙氧基新戊二醇二丙烯酸酯、二丙二醇类二丙烯酸酯、三丙二醇类二丙烯酸酯、乙二醇二丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、二乙二醇类二丙烯酸酯、三乙二醇类二丙烯酸酯、聚乙二醇(200)二丙烯酸酯、聚乙二醇(400)二丙烯酸酯、聚乙二醇(600)二丙烯酸酯、双酚A二丙烯酸酯、邻苯二甲酸乙二醇二丙烯酸酯、三甘醇二乙烯基醚、1,4-环己基二甲醇二乙烯基醚、甲氧基乙氧基三羟甲基丙烷二丙烯酸酯。The difunctional acrylate monomer is any one or combination of the following substances: neopentyl glycol diacrylate, ethoxy neopentyl glycol diacrylate, propoxy neopentyl glycol diacrylate, Dipropylene glycol diacrylate, tripropylene glycol diacrylate, ethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, diethylene glycol diacrylate ester, triethylene glycol diacrylate, polyethylene glycol (200) diacrylate, polyethylene glycol (400) diacrylate, polyethylene glycol (600) diacrylate, bisphenol A diacrylate , Ethylene glycol phthalate diacrylate, triethylene glycol divinyl ether, 1,4-cyclohexyldimethanol divinyl ether, methoxyethoxytrimethylolpropane diacrylate.
多官能团丙烯酸酯类单体为下列物质中的任何一种或它们的组合:三羟甲基丙烷三丙烯酸酯、乙氧基三羟甲基丙烷三丙烯酸酯、9乙氧基三羟甲基丙烷三丙烯酸酯、丙氧基三羟甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二缩三羟甲基丙烷四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯。Multifunctional acrylate monomers are any one of the following substances or their combination: trimethylolpropane triacrylate, ethoxytrimethylolpropane triacrylate, 9ethoxytrimethylolpropane Triacrylate, propoxytrimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate.
所述的乙烯基醚类活性单体为下列物质中的任何一种或它们的组合:三甘醇二乙烯基醚、1,4-环己基二甲醇二乙烯基醚、4-羟丁基乙烯基醚、甘油碳酸酯丙烯基醚、十二烷基乙烯基醚。The vinyl ether active monomer is any one of the following substances or a combination thereof: triethylene glycol divinyl ether, 1,4-cyclohexyldimethanol divinyl ether, 4-hydroxybutylethylene Base ether, glycerin carbonate propenyl ether, dodecyl vinyl ether.
所述的光引发剂为自由基型光引发剂、阳离子型光引发剂的任何一种或以3~5∶1~3的质量比混合的混合物。The photoinitiator is any one of a free radical photoinitiator, a cationic photoinitiator or a mixture with a mass ratio of 3-5:1-3.
自由基型光引发剂为下列物质中的任何一种或它们的组合:苯偶姻、苯偶酰、α,α’-二甲基苯偶酰缩酮、α,α-二乙氧基苯乙酮、2-羟基-2-甲基-1-苯基丙酮、1-羟基环己基苯甲酮、2-羟基-2-甲基-1-对羟乙基醚基苯基丙酮、2-甲基1-(4-甲巯基苯基)-2-吗啉1-丙酮、2-苄基-2-二甲氨基-1-(4-吗啉苯基)1-丁酮、2,4,6-三甲基苯甲酰基乙氧基苯基氧化磷、2,4,6-三甲基苯甲酰基二苯基氧化膦、双(2,4,6-三甲基苯甲酰基)苯基氧化膦、4-对甲苯巯基二苯甲酮、二苯甲酮、2,4,6-三甲基二苯甲酮、4-甲基二苯甲酮、4,4’-双(二甲氨基)二苯甲酮、4,4’-双(二乙氨基)二苯甲酮、4,4’-双(甲基、乙基氨基)二苯甲酮、异丙基硫杂蒽酮、2-氯硫杂蒽酮、1-氯-4-丙氧基硫杂蒽酮、2,4-二乙基硫杂蒽酮、2-乙基蒽醌。The free radical photoinitiator is any one of the following substances or a combination of them: benzoin, benzil, α,α'-dimethylbenzil ketal, α,α-diethoxybenzene Ethanone, 2-hydroxy-2-methyl-1-phenylacetone, 1-hydroxycyclohexylbenzophenone, 2-hydroxy-2-methyl-1-p-hydroxyethyl ether phenylacetone, 2- Methyl 1-(4-methylmercaptophenyl)-2-morpholine 1-propanone, 2-benzyl-2-dimethylamino-1-(4-morpholinephenyl) 1-butanone, 2,4 , 6-trimethylbenzoylethoxyphenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl) Phenylphosphine oxide, 4-p-tolylmercaptobenzophenone, benzophenone, 2,4,6-trimethylbenzophenone, 4-methylbenzophenone, 4,4'-bis( Dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-bis(methyl,ethylamino)benzophenone, isopropylthioxanthene Ketone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, 2,4-diethylthioxanthone, 2-ethylanthraquinone.
阳离子型光引发剂为下列物质中的任何一种或它们的组合:双十二烷基苯碘鎓盐、长链烷氧基二苯基碘鎓盐、双(4,4’-硫醚三苯基硫鎓)六氟锑酸盐、苯硫基苯基二苯基硫鎓六氟锑酸盐、双(4,4’-硫醚三苯基硫鎓)六氟磷酸盐、苯硫基苯基二苯基硫鎓六氟磷酸盐、η6-异丙苯茂铁六氟磷酸盐。The cationic photoinitiator is any one of the following substances or a combination of them: didodecylphenyliodonium salt, long-chain alkoxydiphenyliodonium salt, bis(4,4'-sulfide three Phenylsulfonium) hexafluoroantimonate, phenylthiophenyldiphenylsulfonium hexafluoroantimonate, bis(4,4'-thioether triphenylsulfonium) hexafluorophosphate, phenylthio Phenyldiphenylsulfonium hexafluorophosphate, η 6 -cumyl ferrocene hexafluorophosphate.
所述的染料为蓝色或绿色染料。The dye is blue or green dye.
蓝色染料为下列物质中的任何一种或它们的组合:酸性翠蓝2G、弱酸性蓝AS、酸性蓝2G、酸性蓝78、酸性湖蓝V、酸性艳蓝R、酸性蓝G、弱酸性深蓝5R、弱酸性深蓝GR、酸性络合蓝GGN、直接蓝2B、直接耐晒蓝FRL、分散蓝BGL、分散深蓝H-3G、分散蓝FFR、分散翠蓝HBF、分散蓝2BLN、分散艳蓝G,上述均为蓝色染料商品牌号。The blue dye is any one of the following substances or a combination of them: Acid Turquoise Blue 2G, Acid Blue AS, Acid Blue 2G, Acid Blue 78, Acid Lake Blue V, Acid Brilliant Blue R, Acid Blue G, Weak Acid Dark Blue 5R, Weak Acid Dark Blue GR, Acid Complex Blue GGN, Direct Blue 2B, Direct Fast Blue FRL, Disperse Blue BGL, Disperse Dark Blue H-3G, Disperse Blue FFR, Disperse Emerald Blue HBF, Disperse Blue 2BLN, Disperse Brilliant Blue G, the above are the brand names of blue dyes.
绿色染料为下列物质中的任何一种或它们的组合:还原艳绿3B、还原艳绿2G、还原橄榄绿B、硫化艳绿GB、碱性绿,上述均为绿色染料商品牌号。The green dye is any one of the following substances or a combination thereof: vat brilliant green 3B, vat brilliant green 2G, vat olive green B, sulfur brilliant green GB, basic green, all of which are commercial brands of green dyes.
本发明所用的消泡剂、流平剂、润湿分散剂、阻聚剂都是现有技术中光固化常用的,如:消泡剂可以是下列物质中的任何一种或它们的组合:德谦2700、3100、5300、迪高Foamex 810、Foamex N、Airex 920、Airex 986、毕克BYK 055、BYK 088、BYK 020、BYK 067A、埃夫卡Efka 2720、Efka2721,上述均为消泡剂商品牌号。The defoamer used in the present invention, leveling agent, wetting and dispersing agent, polymerization inhibitor all are commonly used in photocuring in the prior art, as: defoamer can be any one or their combination in the following materials: Deqian 2700, 3100, 5300, Tego Foamex 810, Foamex N, Airex 920, Airex 986, BYK 055, BYK 088, BYK 020, BYK 067A, Efka 2720, Efka2721, all of which are defoamers trade name.
流平剂可以是下列物质中的任何一种或它们的组合:德谦431、432、488、495、810、迪高Glide 100、Glide 432、Glide 435、Glide 440、Flow 300、Flow 425、Flow ZFS 460、毕克BYK 333、BYK 371、BYK 373、BYK 361、TROY Troysol S366、科宁Perenol S71uv、Perenol S83uv、埃夫卡Efka 3883,上述均为流平剂商品牌号。The leveling agent can be any one of the following substances or their combination: Deqian 431, 432, 488, 495, 810, Tego Glide 100, Glide 432, Glide 435, Glide 440, Flow 300, Flow 425, Flow ZFS 460, BYK 333, BYK 371, BYK 373, BYK 361, TROY Troysol S366, Corning Perenol S71uv, Perenol S83uv, Efka 3883, all of the above are brand names of leveling agents.
润湿分散剂可以是下列物质中的任何一种或它们的组合:德谦DP 983、912、毕克BYKP-105、Disperbyk-111、Disperbyk-180、Disperbyk-168、迪高Dispers 680UV、Dispers 681UV、Dispers 710、Dispers 652、科宁TexaphorP61、埃夫卡Efka 4800,上述均为润湿分散剂商品牌号。The wetting and dispersing agent can be any one of the following substances or their combination: Deqian DP 983, 912, BYKP-105, Disperbyk-111, Disperbyk-180, Disperbyk-168, Tego Dispers 680UV, Dispers 681UV , Dispers 710, Dispers 652, Corning TexaphorP61, Efka 4800, the above are all wetting and dispersing agent brand names.
阻聚剂可以是下列物质中的任何一种或它们的组合:对羟基苯甲醚、对苯二酚、2,6-二叔丁基对甲苯酚、FIRSTCURE ST-1(商品牌号)、FIRSTCURE ST-2(商品牌号)。The polymerization inhibitor can be any one of the following substances or their combination: p-hydroxyanisole, hydroquinone, 2,6-di-tert-butyl p-cresol, FIRSTCURE ST-1 (trade name), FIRSTCURE ST-2 (trade name).
本发明还提供了一种用于印刷电路板的光固化喷墨抗蚀剂的制备方法,依次包括下列步骤:首先将含羧基的丙烯酸酯类低聚物、丙烯酸酯类低粘度树脂、丙烯酸酯类活性单体、乙烯基醚类活性单体搅拌混合均匀,再在黄光(滤去波长小于420nm的光)条件下加入光引发剂,升温至使光引发剂充分溶解,然后降至室温,按比例加入染料,搅拌至混合均匀,加入流平剂、润湿分散剂、阻聚剂、消泡剂再均匀混合,经过滤制得。The present invention also provides a method for preparing a light-curable inkjet resist for printed circuit boards, comprising the following steps in sequence: first, carboxyl-containing acrylate oligomers, acrylate low-viscosity resins, acrylate Stir and mix the reactive monomers and vinyl ether reactive monomers evenly, then add the photoinitiator under the condition of yellow light (filter the light with a wavelength less than 420nm), raise the temperature to fully dissolve the photoinitiator, and then cool down to room temperature. Add dye in proportion, stir until mixed evenly, add leveling agent, wetting and dispersing agent, polymerization inhibitor, defoamer, mix evenly, and make it through filtration.
如上所述,在蚀刻后,光致抗蚀剂需在碱性条件下易于脱去,酸值范围应在35~40mgKOH/g之间。由于采用喷墨方法制作PCB板无需显影这一工艺,则不需要用碱性不同的两种碱性溶液对PCB板进行操作,因此对酸值的要求不再苛刻,本发明的光致喷墨抗蚀剂的酸值大于10mgKOH/g。As mentioned above, after etching, the photoresist should be easily removed under alkaline conditions, and the acid value range should be between 35-40 mgKOH/g. Since the PCB board is made by the inkjet method without the development process, it is not necessary to use two different alkaline solutions to operate the PCB board, so the acid value is no longer harsh. The photo-induced inkjet of the present invention The acid value of the resist is greater than 10 mgKOH/g.
本发明制备的用于PCB板的新型光固化喷墨抗蚀剂具有如下性能:粘度≤30mPa·s(40℃),可保证油墨能够连续喷出。酸值≥10mgKOH/g、光固化时间6s~10s、硬度2H~3H、附着力0级、柔韧性1~2mm、耐蚀刻性好、碱溶性好。本发明制得的PCB板制作工艺简单、绿色环保,满足于目前对PCB板的需求。The novel photocurable inkjet resist for PCB prepared by the invention has the following properties: the viscosity is less than or equal to 30mPa·s (40°C), which can ensure the continuous ejection of ink. Acid value ≥ 10mgKOH/g, photocuring time 6s~10s, hardness 2H~3H, adhesion level 0, flexibility 1~2mm, good etching resistance, good alkali solubility. The manufacturing process of the PCB board prepared by the invention is simple, green and environment-friendly, and satisfies the current demand for the PCB board.
具体实施方式 Detailed ways
实施例1~10Examples 1-10
制备用于印刷电路板(PCB)的新型光固化喷墨抗蚀剂各组分的质量百分含量见表1。首先将含羧基的丙烯酸酯类低聚物、丙烯酸酯类低粘度树脂、丙烯酸酯类活性单体、乙烯基醚类活性单体混合均匀,再在黄光条件下加入光引发剂,升温至50℃使光引发剂充分溶解,再降至室温按比例加入染料,使用搅拌、砂磨、分散多用机搅拌2小时后至混合均匀,加入流平剂、润湿分散剂、阻聚剂、消泡剂再均匀混合,经过滤制得。See Table 1 for the mass percentage of each component of the new photocurable inkjet resist prepared for printed circuit board (PCB). First, mix carboxyl-containing acrylate oligomers, acrylate low-viscosity resins, acrylate active monomers, and vinyl ether active monomers evenly, then add a photoinitiator under yellow light conditions, and heat up to 50 ℃ to fully dissolve the photoinitiator, then lower it to room temperature and add the dye in proportion, use a stirring, sand milling, and dispersing multipurpose machine to stir for 2 hours until the mixture is uniform, add leveling agent, wetting and dispersing agent, polymerization inhibitor, defoaming agent The agent is mixed evenly and obtained by filtration.
用喷墨印刷机喷涂于基材表面,然后进行光固化,得到实验样板。Use an inkjet printer to spray on the surface of the substrate, and then perform photocuring to obtain an experimental sample.
表1用于PCB板的新型光固化喷墨抗蚀剂各组份及用量(质量百分浓度)Table 1 The components and dosage (mass percentage concentration) of the new photocurable inkjet resist for PCB board
续表1Continued Table 1
本发明实施例1-10制备的用于PCB板的新型光固化喷墨抗蚀剂的评价结果列于表2。评价方法如下:The evaluation results of the novel photocurable inkjet resists for PCBs prepared in Examples 1-10 of the present invention are listed in Table 2. The evaluation method is as follows:
粘度:采用NDJ-79型旋转粘度剂测定抗蚀刻油墨在40℃时的粘度。Viscosity: NDJ-79 type rotational viscometer was used to measure the viscosity of the anti-etching ink at 40°C.
酸值:准确称取0.1~0.5g抗蚀刻油墨溶解在50毫升丙酮和无水乙醇的等体积混合液中,以酚酞为指示剂,用0.1mol/L KOH水溶液,滴定至浅红色出现为终点。酸值(KOH mg/g)=(V×M×56.1)/W。式中:V是样品消耗的氢氧化钾水溶液体积(ml);56.1是氢氧化钾的摩尔质量;W是样品质量;M是氢氧化钾的体积摩尔浓度。Acid value: Accurately weigh 0.1-0.5g of anti-etching ink and dissolve it in 50ml of acetone and absolute ethanol in an equal volume mixture, use phenolphthalein as indicator, and titrate with 0.1mol/L KOH aqueous solution until light red appears as the end point . Acid value (KOH mg/g)=(V×M×56.1)/W. In the formula: V is the aqueous potassium hydroxide volume (ml) consumed by the sample; 56.1 is the molar mass of potassium hydroxide; W is the sample mass; M is the volume molar concentration of potassium hydroxide.
光固化时间:将抗蚀刻油墨喷涂在干燥清洁的覆铜板上,然后将涂有油墨的基板在高压汞灯下曝光,光固化能量为1000mJ/cm2,测定其曝光时间。Photocuring time: Spray the anti-etching ink on a dry and clean copper-clad board, then expose the ink-coated substrate under a high-pressure mercury lamp with a photocuring energy of 1000mJ/cm 2 , and measure the exposure time.
铅笔硬度:参照GB6739-86,使用QHQ型涂膜铅笔划痕硬度仪测定实验样板在25℃时的铅笔硬度。Pencil hardness: With reference to GB6739-86, use the QHQ type coating pencil scratch hardness tester to measure the pencil hardness of the experimental sample at 25°C.
附着力:参照GB9256-88,通过划格实验的方法判定实验样板的附着力好坏。Adhesion: With reference to GB9256-88, the adhesion of the experimental model is judged by the cross-cut test method.
柔韧性:参照GB/T1731-93,使用QTX-1型漆膜弹性实验器测定实验样板的柔韧性。Flexibility: With reference to GB/T1731-93, use QTX-1 paint film elasticity tester to measure the flexibility of the test sample.
抗蚀刻性:将实验样板浸于45℃、40波美度的FeCl3蚀刻液10分钟,观察其膜的状态。涂膜完全无变化,边缘陡直为优,涂膜脱落为差。Etching resistance: Immerse the experimental sample in FeCl 3 etching solution at 45°C and 40 Baume for 10 minutes, and observe the state of the film. There is no change in the coating film at all, the edge is steep as excellent, and the coating film falls off as poor.
碱溶性:将实验样板浸于60℃、5%的NaOH溶液5分钟,观察脱膜性好坏。涂膜脱落为优,部分脱落为差。Alkali solubility: immerse the test sample in 5% NaOH solution at 60°C for 5 minutes, and observe the release property. The peeling of the coating film is excellent, and the partial peeling is poor.
表2实施例1~10评价结果Table 2 Embodiment 1~10 evaluation results
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CN105273167B (en) * | 2014-06-19 | 2018-01-23 | 北京化工大学 | Purposes of the iron arene complexes as the sensitizer for triggering photocuring under salt compounded of iodine visible ray |
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