CN101950128B - Photosensitive resin for plasma display screen - Google Patents
Photosensitive resin for plasma display screen Download PDFInfo
- Publication number
- CN101950128B CN101950128B CN2010105027873A CN201010502787A CN101950128B CN 101950128 B CN101950128 B CN 101950128B CN 2010105027873 A CN2010105027873 A CN 2010105027873A CN 201010502787 A CN201010502787 A CN 201010502787A CN 101950128 B CN101950128 B CN 101950128B
- Authority
- CN
- China
- Prior art keywords
- weight portions
- weight
- photosensitive resin
- display screen
- plasma display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Gas-Filled Discharge Tubes (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
The invention discloses a photosensitive resin for a plasma display screen. The photosensitive resin for the plasma display screen comprises acrylate copolymer resin and solvent as well as photoplymerization initiator and defoamer. Compared with the existing photosensitive resin, the photosensitive resin for the plasma display screen provided by the invention has the advantages of higher resolution, excellent photosensitivity and image developing performance, and is particularly suitable for preparing a barrier of a PDP screen.
Description
Technical field
The present invention relates to a kind of used for plasma display screen photosensitive resin.
Background technology
Plasma panel (Plasma display panel is called for short PDP) is the electronic installation that utilizes plasma (plasma) discharge formation image.Make it that plasma discharge effect takes place after applying voltage on the electrode that in the PDP discharge space, distributes, and visual through the vacuum ultraviolet (VUV) that in the plasma discharge process, sends thereby come the fluorescence excitation bisque to form.
Along with market is vigorous day by day to the demand of flat-panel monitors such as PDP, LCD and OLED, manufacturers have added big picture exploitation dynamics, thereby require the high-resolution of display device, and the cry of high image resolution is also very high.
Barrier is not only the works that discharge space is provided in PDP; Its more important role is to prevent to occur between the adjacent display unit (cell) simultaneously; The works that crosstalk each other (the cross talk) of optics aspect forms on the plate of back is so it is bringing into play important effect in PDP image display quality.
And existing P DP barrier form in required photoresist be on the attaching power of substrate certain limitation is arranged, and resolution is not high yet.
Summary of the invention
The purpose of this invention is to provide a kind of used for plasma display screen photosensitive resin.
Used for plasma display screen photosensitive resin provided by the invention comprises acrylic copolymeric resin, Photoepolymerizationinitiater initiater, foam-breaking agent and solvent.
Above-mentioned used for plasma display screen photosensitive resin also can only be made up of above-mentioned four components.In this photosensitive resin; The weight-average molecular weight of said acrylic copolymeric resin is 20000-80000; Specifically can be 20000-60000,20000-50000,20000-40000,20000-25000,25000-60000,25000-50000,25000-40000,30000-60000,30000-50000,30000-40000,40000-60000,40000-50000 or 50000-60000, preferred 30000-50000.
Said solvent is selected from least a in ethylene glycol monoemethyl ether acetate, the only methyl ether acetate of propylene glycol, propylene glycol monomethyl ether, the only ether acetic acid esters of propylene glycol, diethylene glycol dimethyl ether, diethylene glycol ethylmethyl ether, cyclohexanone, 3-methoxy propyl acetoacetic ester, 3-ethoxy-propionic acid methyl esters, 3-ethoxyl ethyl propionate, butanone, isopropyl alcohol, ethanol and the methyl alcohol, at least a in preferred only methyl ether acetate of propylene glycol and the ethylene glycol monoemethyl ether acetate.
Said Photoepolymerizationinitiater initiater is the I type light trigger of free radical polymerization in the photochemical reaction; The initiating agent of various the type all is suitable for, as being selected from least a in styrax, benzoin ether, styrax diether, methyl benzoylformate, S-(4-benzoyl) thiobenzoate phenyl ester, 3-hydroxy-3-methyl propiophenone, benzyl phenyl ketone and the m-chloro benzyl phenyl ketone;
Said foam-breaking agent is a silicon oil foam killer, is selected from least a in methyl polysiloxane and the dimethyl diphenyl polysiloxane; This methyl polysiloxane and dimethyl diphenyl polysiloxane can be bought by open commercial sources and obtain, and its viscosity can be 80-120cp or 100cp;
The ratio of quality and the number of copies of said acrylic copolymeric resin, Photoepolymerizationinitiater initiater, foam-breaking agent and solvent is 10-40: 0.5-10: 0.1-2: 50-90; Specifically can be 10-35: 0.5-5: 0.1-2: 60-89,10-30: 0.5-5: 0.1-2: 60-89,10-20: 0.5-4: 0.1-1: 60-88,20-35: 1-5: 0.5-2: 63-89,20-30: 1-4: 0.5-1: 63-88 or 20-30: 1-3: 0.5-1: 65-77; Preferred 10-30: 0.5-5: 0.5-2: 60-90, more preferably 20-30: 2-4: 1-2: 60-80.
In the above-mentioned used for plasma display screen photosensitive resin, the mass fraction of acrylic copolymeric resin must be in above-mentioned 10-40 mass fraction scope, and its mass fraction surpasses 40 easy gels, and photoresist is when depositing, and its stability can decline; Its mass fraction is lower than and occurs the long phenomenon of development time in the development work in 10 o'clock easily.The mass fraction of Photoepolymerizationinitiater initiater must be controlled at the 0.5-10 scope, and its mass fraction is lower than at 0.5 o'clock, and the molecular weight of acrylic copolymeric resin polymkeric substance can roll up; Mass fraction surpasses at 10 o'clock, and the molecular weight of acrylic copolymeric resin polymkeric substance can reduce and then cause sensitivity to descend in a large number, and the figure pattern is not good.The effect of foam-breaking agent is that each component more is prone to mix in the photosensitive resin in order to make, and prevents pin hole (pin hole) phenomenon, reduces because of film is inhomogeneous and causes problems such as being coated with bad generation, according to circumstances can suitably add.The effect of solvent is the dissolubility that improves each component in the photosensitive resin, reduces the preceding viscosity of acryl resin system coating, to improve coating, adds as required.
Wherein, said acrylic copolymeric resin is by behind unsaturated carboxylic acid, comonomer and the organic solvent mixing copolyreaction taking place, and steams with the method for decompression distillation to desolventize the back and get again;
Said unsaturated carboxylic acid is selected from least a in acrylic acid, methacrylate, methylene succinic acid, maleic acid and the fumaric acid;
Said comonomer is selected from ethyl acrylate, propyl acrylate, acrylic acid oxo two-2; 1-ethyl, trimethylolpropane double methacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, ethoxylation trihydroxy methyl propyl group triacrylate, propoxylation trimethylolpropane triacrylate, dipentaerythritol five acrylic ester that contract, the dipentaerythritol acrylate that contracts, ethyl 2-methacrylate, 2-propyl methacrylate, 2-methacrylic acid oxo two-2, in the two 2-methacrylates of 1-ethyl, trimethylolpropane, trimethylolpropane tris 2-methacrylate, pentaerythrite three 2-methacrylates, pentaerythrite four 2-methacrylates, ethoxylation trihydroxy methyl propyl group three 2-methacrylates, propoxylation trimethylolpropane tris 2-methacrylate, the dipentaerythritol five 2-methacrylates that contract, contract dipentaerythritol six 2-methacrylates, methylene succinic acid ethyl ester, methylene succinic acid propyl ester, ethyl maleate, maleic acid propyl ester and fumaric acid ethyl ester and the fumaric acid propyl ester at least two kinds;
Said organic solvent is selected from least a in ethylene glycol monoemethyl ether acetate, the only methyl ether acetate of propylene glycol, propylene glycol monomethyl ether, the only ether acetic acid esters of propylene glycol, diethylene glycol dimethyl ether and the diethylene glycol ethylmethyl ether, at least a in preferred only methyl ether acetate of propylene glycol and the ethylene glycol monoemethyl ether acetate;
The mass ratio of said unsaturated carboxylic acid and comonomer is 1: 10-1: 1, preferred 3: 7-4: 6; The quality sum of unsaturated carboxylic acid and comonomer and the quality of organic solvent are in a ratio of 1: 0.25-1, preferred 1: 0.5-1.
In the said copolymerization step, temperature is 50-200 ℃, and preferred 100-150 ℃, the time is 2-10 hour, preferred 4-5 hour.
The method of the above-mentioned used for plasma display screen photosensitive resin of preparation provided by the invention comprises the steps: said acrylic copolymeric resin, Photoepolymerizationinitiater initiater, foam-breaking agent and solvent, obtains said used for plasma display screen photosensitive resin.
The application of the used for plasma display screen photosensitive resin that the invention described above provides in the preparation plasma panel also belongs to protection scope of the present invention.
Used for plasma display screen photosensitive resin provided by the invention is compared than existing photoresist, has high resolution, and outstanding photonasty and developing performance are highly suitable for preparing the barrier that PDP shields.
Embodiment
Below in conjunction with specific embodiment the present invention is described further, but the present invention is not limited to following examples.Method is conventional method if no special instructions described in the following embodiment, and said compound all can obtain from open commercial sources purchase if no special instructions.Used ethoxylation trihydroxy methyl propyl group triacrylate is available from the grand brightness chemical industry of Yixing City company limited among the embodiment; Production code member is CAS 28961-43-5; The propoxylation trimethylolpropane triacrylate is available from the grand brightness chemical industry of Yixing City company limited; Production code member is CAS 53879-54-2, and used methyl polysiloxane is available from the lucky roc fluosilicic in Shenzhen Materials Co., Ltd, and production code member is 201 methyl-silicone oil 201-100 (viscosity 100cp); Used dimethyl diphenyl polysiloxane is available from Chengdu Gracia chemical technology company limited, and production code member is 1026963 (viscosity 100cp).The weight-average molecular weight that following embodiment step 1) prepares the gained acrylic copolymeric resin all gets according to the gel chromatography of routine.
Embodiment 1
1) preparation acrylic copolymeric resin:
With acrylic acid 10 weight portions; Trimethylolpropane triacrylate 40 weight portions, acrylic acid oxo two-2,1-ethyl 40 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 27.5 weight portions of solvent propylene glycol; Under 50 ℃, carried out polyreaction 2 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 20,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 25 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 89 weight portions of 000 acrylic copolymeric resin 10 weight portions, Photoepolymerizationinitiater initiater styrax 0.5 weight portion, foam-breaking agent methyl polysiloxane 0.5 weight portion and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 2
1) preparation acrylic copolymeric resin:
With acrylic acid 10 weight portions; Trimethylolpropane triacrylate 40 weight portions, acrylic acid oxo two-2,1-ethyl 40 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 55 weight portions of solvent propylene glycol; Under 100 ℃, carried out polyreaction 2 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 20,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 20 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 88 weight portions of 000 acrylic copolymeric resin 10 weight portions, Photoepolymerizationinitiater initiater styrax 1 weight portion, foam-breaking agent methyl polysiloxane 1 weight portion and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 3
1) with acrylic acid 10 weight portion; Trimethylolpropane triacrylate 40 weight portions, acrylic acid oxo two-2,1-ethyl 40 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 110 weight portions of solvent propylene glycol; Under 200 ℃, carried out polyreaction 10 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 20,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 20 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 83 weight portions of 000 acrylic copolymeric resin 10 weight portions, Photoepolymerizationinitiater initiater styrax 5 weight portions, foam-breaking agent methyl polysiloxane 2 weight portions and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 4
1) with acrylic acid 30 weight portion; Trimethylolpropane triacrylate 30 weight portions, acrylic acid oxo two-2,1-ethyl 30 weight portions and 2-ethyl acrylate 10 weight portions are mixing in only ether acetic acid esters 50 weight portions of solvent propylene glycol; Under 100 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 30,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 30 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 89 weight portions of 000 acrylic copolymeric resin 10 weight portions, Photoepolymerizationinitiater initiater benzoin ether 0.5 weight portion, foam-breaking agent methyl polysiloxane 0.5 weight portion and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 5
1) with acrylic acid 30 weight portion; Trimethylolpropane triacrylate 30 weight portions, acrylic acid oxo two-2,1-ethyl 30 weight portions and 2-ethyl acrylate 10 weight portions are mixing in only ether acetic acid esters 50 weight portions of solvent propylene glycol; Under 100 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 30,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 30 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 77 weight portions of 000 acrylic copolymeric resin 20 weight portions, Photoepolymerizationinitiater initiater benzoin ether 2 weight portions, foam-breaking agent methyl polysiloxane 1 weight portion and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 6
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 50 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 4 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 66 weight portions of 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater benzoin ether 2 weight portions, foam-breaking agent methyl polysiloxane 2 weight portions and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 7
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater styrax diether 2 weight portions, foam-breaking agent methyl polysiloxane 2 weight portions and only methyl ether acetate 66 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 8
1) with acrylic acid 50 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 10 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 60,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 60 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 66 weight portions of 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater methyl benzoylformate 2 weight portions, foam-breaking agent methyl polysiloxane 2 weight portions and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 9
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 200 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 80,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 60 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 66 weight portions of 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater methyl benzoylformate 2 weight portions, foam-breaking agent methyl polysiloxane 2 weight portions and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 10
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 10 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 80,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 60 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 66 weight portions of 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater methyl benzoylformate 2 weight portions, foam-breaking agent methyl polysiloxane 2 weight portions and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 11
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 63 weight portions of 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater methyl benzoylformate 5 weight portions, foam-breaking agent methyl polysiloxane 2 weight portions and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 12
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater S-(4-benzoyl) thiobenzoate phenyl ester 2 weight portions, foam-breaking agent methyl polysiloxane 0.1 weight portion and only methyl ether acetate 67.9 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 13
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater S-(4-benzoyl) thiobenzoate phenyl ester 2 weight portions, foam-breaking agent methyl polysiloxane 0.5 weight portion and only methyl ether acetate 67.5 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 14
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater S-(4-benzoyl) thiobenzoate phenyl ester 2 weight portions, foam-breaking agent methyl polysiloxane 1 weight portion and only methyl ether acetate 67 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 15
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater S-(4-benzoyl) thiobenzoate phenyl ester 1 weight portion, foam-breaking agent methyl polysiloxane 1 weight portion and only methyl ether acetate 68 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 16
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater 3-hydroxy-3-methyl propiophenone 4 weight portions, foam-breaking agent methyl polysiloxane 1 weight portion and only methyl ether acetate 65 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 17
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater 3-hydroxy-3-methyl propiophenone 5 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and only methyl ether acetate 64 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 18
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only ether acetic acid esters 100 weight portions of solvent propylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize the only ether acetic acid esters of propylene glycol, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 35 weight portions, Photoepolymerizationinitiater initiater 3-hydroxy-3-methyl propiophenone 3 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 2 weight portions and only methyl ether acetate 60 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 19
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize ethylene glycol monoemethyl ether acetate, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater 3-hydroxy-3-methyl propiophenone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and only methyl ether acetate 67 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 20
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions mixing in solvent propylene glycol monomethyl ether 100 weight portions; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize propylene glycol monomethyl ether, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater 3-hydroxy-3-methyl propiophenone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and only methyl ether acetate 67 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 21
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in solvent diethylene glycol dimethyl ether 50 weight portions and diethylene glycol ethylmethyl ether 50 weight portions; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize diethylene glycol dimethyl ether and diethylene glycol ethylmethyl ether, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater 3-hydroxy-3-methyl propiophenone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and only methyl ether acetate 67 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 22
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize ethylene glycol monoemethyl ether acetate, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater 3-hydroxy-3-methyl propiophenone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and only methyl ether acetate 67 weight portions of solvent propylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 23
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize ethylene glycol monoemethyl ether acetate, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent propylene glycol monomethyl ether 67 weight portions are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 24
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize ethylene glycol monoemethyl ether acetate, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; Only ether acetic acid esters 67 weight portions of 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent propylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 25
1) with acrylic acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize ethylene glycol monoemethyl ether acetate, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent diethylene glycol ethylmethyl ether 67 weight portions are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 26
1) with methacrylate 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize diethylene glycol dimethyl ether and diethylene glycol ethylmethyl ether, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 67 weight portions of 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 27
1) with methylene succinic acid olefin(e) acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize diethylene glycol dimethyl ether and diethylene glycol ethylmethyl ether, obtain weight-average molecular weight and be 50,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 50 that step 1) is prepared the gained weight-average molecular weight; Only methyl ether acetate 67 weight portions of 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 28
1) with maleic acid acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize diethylene glycol dimethyl ether and diethylene glycol ethylmethyl ether, obtain weight-average molecular weight and be 40,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 40 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater m-chloro benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and only methyl ether acetate 67 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 29
1) with fumaric acid acid 40 weight portion; Trimethylolpropane triacrylate 20 weight portions, acrylic acid oxo two-2,1-ethyl 20 weight portions and 2-ethyl acrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize diethylene glycol dimethyl ether and diethylene glycol ethylmethyl ether, obtain weight-average molecular weight and be 40,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 40 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater m-chloro benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and only methyl ether acetate 67 weight portions of solvent ethylene glycol are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 30
1) with acrylic acid 40 weight portion; Ethyl acrylate 20 weight portions; Propyl acrylate 20 weight portions and trimethylolpropane double methacrylate 20 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol, under 150 ℃, carries out polyreaction 5 hours, steams with the method for decompression distillation then to desolventize ethylene glycol monoemethyl ether acetate; Obtain weight-average molecular weight and be 40,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 40 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater m-chloro benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent diethylene glycol ethylmethyl ether 67 weight portions are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 31
1) with acrylic acid 40 weight portion; Pentaerythritol triacrylate 20 weight portions; Tetramethylol methane tetraacrylate 20 weight portions and trihydroxy methyl propyl group oxirane sex change orthoformic acid acrylic ester 20 weight portions mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol carried out polyreaction 5 hours under 150 ℃, steam with the method for decompression distillation then to desolventize ethylene glycol monoemethyl ether acetate; Obtain weight-average molecular weight and be 40,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 40 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater m-chloro benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent diethylene glycol ethylmethyl ether 67 weight portions are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 32
1) with acrylic acid 40 weight portion; Trihydroxy methyl propyl group epoxypropane sex change orthoformic acid acrylic ester 30 weight portions and trihydroxy methyl propyl group oxirane sex change orthoformic acid acrylic ester 30 weight portions mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize ethylene glycol monoemethyl ether acetate, obtain weight-average molecular weight and be 40,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 40 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater m-chloro benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent diethylene glycol ethylmethyl ether 67 weight portions are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
Embodiment 33
1) with acrylic acid 40 weight portion; Pentaerythritol triacrylate 30 weight portions and tetramethylol methane tetraacrylate 30 weight portions are mixing in only methyl ether acetate 100 weight portions of solvent ethylene glycol; Under 150 ℃, carried out polyreaction 5 hours; Steam with the method for decompression distillation then and desolventize ethylene glycol monoemethyl ether acetate, obtain weight-average molecular weight and be 40,000 acrylic copolymeric resin;
2) preparation used for plasma display screen photosensitive resin provided by the invention:
It is 40 that step 1) is prepared the gained weight-average molecular weight; 000 acrylic copolymeric resin 30 weight portions, Photoepolymerizationinitiater initiater m-chloro benzyl phenyl ketone 2 weight portions, foam-breaking agent dimethyl diphenyl polysiloxane 1 weight portion and solvent diethylene glycol ethylmethyl ether 67 weight portions are mixing at normal temperatures, obtains used for plasma display screen photosensitive resin provided by the invention.
After above-mentioned each embodiment prepared gained used for plasma display screen photosensitive resin coating film forming, graphics resolution behind its developing performance, photosensitive property and the post bake is estimated.
The evaluation of development property:
Apply the back at the photosensitive compoistion that will above-mentioned each embodiment with the even glue speed rotation of 3500r/min 1 minute with rotary glue spreader on the substrate obtains and forming the thick film of 2.5um～3um after with 90 ℃ of bakings on the hot plate, the film that above-mentioned all thickness is identical uses 365nm, intensity to be 15mw/cm after using mask plate to cover
2Ultraviolet ray irradiation made public in 20 seconds; To use mass percentage concentration again be 5% tetramethylammonium hydroxide aqueous solution cleaned 1 minute with ultrapure water after developing 5 minutes down at 25 ℃, and pattern edge on substrate flatness and the residue situation after through development observed with 50 power microscopes in the back that disposes.
One, flatness
Zero: it is clean to be expressed as pattern edge, smooth no burr
*: it is unclean to be expressed as pattern edge, out-of-flatness and burr are arranged
Two, residue:
Whether the figure position of observing after aforesaid substrate has developed with 250 power microscopes has residue.
Zero: be expressed as no residue,
△: level of residue is few
*: level of residue is many
The light sensitivity evaluation criterion is following:
Apply the back at the photosensitive resin that will above-mentioned each embodiment with the even glue speed rotation of 3500r/min 1 minute with rotary glue spreader on the substrate obtains and forming the thick film of 2.5um～3um after with 90 ℃ of bakings on the hot plate, the film that above-mentioned all thickness is identical uses 365nm, intensity to be 15mw/cm after using the mask plate of 20 μ m live widths to cover
2Ultraviolet ray irradiation different time make public, to use mass percentage concentration again be 5% tetramethylammonium hydroxide aqueous solution cleaned 1 minute with ultrapure water after developing 5 minutes down at 25 ℃, used 365nm, intensity to be 15mw/cm in figure afterwards
235～40 seconds of ultraviolet ray irradiation after, the temperature baking is 3 minutes in 120 ℃, heating made its sclerosis post bake in 60 minutes in 220 ℃ of hot stoves again, obtained graphic films, with the resolution of ESEM test pattern film.To obtain the evaluation criterion of outstanding graphic films required exposure time of resolution as light sensitivity, the time shutter is short more, and light sensitivity is good more: when time shutter during less than 10 seconds; Outstanding for light sensitivity, the time shutter is when being 10～20 seconds, for light sensitivity better; Time shutter is when being 20～30 seconds; Common for light sensitivity, the time shutter is during greater than 30 seconds, for light sensitivity poor.
The graphics resolution evaluation of graphic films:
Apply the back at the photosensitive resin that will above-mentioned each embodiment with the even glue speed rotation of 3500r/min 1 minute with rotary glue spreader on the substrate obtains and forming the thick film of 2.5um～3um after with 90 ℃ of bakings on the hot plate, the film that above-mentioned all thickness is identical uses 365nm, intensity to be 15mw/cm after using the mask plate of 20 μ m live widths to cover
2Ultraviolet ray irradiation made public in 20 seconds, to use mass percentage concentration again be 1% tetramethylammonium hydroxide aqueous solution cleaned 1 minute with ultrapure water after developing 2 minutes down at 25 ℃, used 365nm, intensity to be 15mw/cm in figure afterwards
235～40 seconds of ultraviolet ray irradiation after, the temperature baking is 3 minutes in 120 ℃, heating made its sclerosis post bake in 60 minutes in 220 ℃ of hot stoves again, obtained graphic films, with the resolution of ESEM test pattern film.Live width is even, and no burr or burr resolution are outstanding less than resolution 0.5 μ m, and the live width edge is burr slightly, and the burr size is common 0.5～1 μ m's, and live width edge burr are more, and size 1～3 μ m for poor.
Above-mentioned testing result is all listed in the table 1.
The mensuration result of the graphics resolution of the developing performance of table 1, photosensitive resin, photosensitive property and graphic films
Can know by table 1, adopt acrylic copolymeric resin, Photoepolymerizationinitiater initiater, foam-breaking agent and the solvent of system of the present invention, control suitable mass ratio, can the very outstanding used for plasma display screen photosensitive resin of obtained performance.
Claims (12)
1. a used for plasma display screen photosensitive resin comprises acrylic copolymeric resin, solvent, Photoepolymerizationinitiater initiater and foam-breaking agent;
The weight-average molecular weight of said acrylic copolymeric resin is 20000-50000;
Said solvent is selected from least a in ethylene glycol monoemethyl ether acetate, the only methyl ether acetate of propylene glycol, propylene glycol monomethyl ether, the only ether acetic acid esters of propylene glycol, diethylene glycol dimethyl ether, diethylene glycol ethylmethyl ether, cyclohexanone, 3-methoxy propyl acetoacetic ester, 3-ethoxy-propionic acid methyl esters, 3-ethoxyl ethyl propionate, butanone, isopropyl alcohol, ethanol and the methyl alcohol;
Said Photoepolymerizationinitiater initiater is selected from least a in styrax, benzoin ether, styrax diether, methyl benzoylformate, S-(4-benzoyl) thiobenzoate phenyl ester, 3-hydroxy-3-methyl propiophenone, benzyl phenyl ketone and the m-chloro benzyl phenyl ketone;
Said foam-breaking agent is selected from least a in methyl polysiloxane and the dimethyl diphenyl polysiloxane;
The ratio of quality and the number of copies of said acrylic copolymeric resin, Photoepolymerizationinitiater initiater, foam-breaking agent and solvent is 10-40: 0.2-10: 0.1-2: 50-90;
Said acrylic copolymeric resin is to be got by copolymerization behind unsaturated carboxylic acid, comonomer and the organic solvent mixing;
Said unsaturated carboxylic acid is selected from least a in acrylic acid, methacrylate, methylene succinic acid, maleic acid and the fumaric acid;
Said comonomer is selected from 2-ethyl acrylate, acrylic acid oxo two-2, in 1-ethyl and the trimethylolpropane triacrylate at least two kinds;
Said organic solvent is selected from least a in ethylene glycol monoemethyl ether acetate, propylene glycol monomethyl ether, the only methyl ether acetate of propylene glycol, the only ether acetic acid esters of propylene glycol, diethylene glycol dimethyl ether and the diethylene glycol ethylmethyl ether.
2. photosensitive resin according to claim 1 is characterized in that: the weight-average molecular weight of said acrylic copolymeric resin is 30000-50000.
3. photosensitive resin according to claim 1 is characterized in that: said solvent is selected from least a in only methyl ether acetate of propylene glycol and the ethylene glycol monoemethyl ether acetate.
4. photosensitive resin according to claim 1 is characterized in that: the ratio of quality and the number of copies of said acrylic copolymeric resin, Photoepolymerizationinitiater initiater, foam-breaking agent and solvent is 10-30: 0.5-5: 0.5-2: 60-90.
5. photosensitive resin according to claim 4 is characterized in that: the ratio of quality and the number of copies of said acrylic copolymeric resin, Photoepolymerizationinitiater initiater, foam-breaking agent and solvent is 20-30: 2-4: 1-2: 60-80.
6. according to the arbitrary described photosensitive resin of claim 1-5, it is characterized in that: said used for plasma display screen photosensitive resin is by acrylic copolymeric resin, Photoepolymerizationinitiater initiater, foam-breaking agent and solvent composition.
7. photosensitive resin according to claim 1 is characterized in that: the mass ratio of said unsaturated carboxylic acid and comonomer is 1: 10-1: 1; The quality sum of said unsaturated carboxylic acid and comonomer and the mass ratio of organic solvent are 1: 0.25-1.
8. photosensitive resin according to claim 7 is characterized in that: the mass ratio of said unsaturated carboxylic acid and comonomer is 3: 7-4: 6; The quality sum of said unsaturated carboxylic acid and comonomer and the mass ratio of organic solvent are 1: 0.5-1.
9. according to claim 7 or 8 described photosensitive resins, it is characterized in that: in the said copolymerization step, temperature is 50-200 ℃, and the time is 2-10 hour.
10. photosensitive resin according to claim 9 is characterized in that: in the said copolymerization step, temperature is 100-150 ℃, and the time is 4-5 hour.
11. method for preparing the arbitrary said used for plasma display screen photosensitive resin of claim 1-10; Comprise the steps: said acrylic copolymeric resin, said Photoepolymerizationinitiater initiater, said foam-breaking agent and said solvent mixing are obtained said used for plasma display screen photosensitive resin.
12. the application of the arbitrary said used for plasma display screen photosensitive resin of claim 1-10 in the preparation plasma panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105027873A CN101950128B (en) | 2010-10-11 | 2010-10-11 | Photosensitive resin for plasma display screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105027873A CN101950128B (en) | 2010-10-11 | 2010-10-11 | Photosensitive resin for plasma display screen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101950128A CN101950128A (en) | 2011-01-19 |
| CN101950128B true CN101950128B (en) | 2012-08-08 |
Family
ID=43453664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010105027873A Expired - Fee Related CN101950128B (en) | 2010-10-11 | 2010-10-11 | Photosensitive resin for plasma display screen |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101950128B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107329369A (en) * | 2017-05-19 | 2017-11-07 | 合肥市惠科精密模具有限公司 | A kind of plasma display screen electrode is with high-strength photosensitive developable resin |
| CN107359099A (en) * | 2017-07-12 | 2017-11-17 | 合肥轻风飏电气科技有限责任公司 | A kind of electronic display |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101125475A (en) * | 2006-08-15 | 2008-02-20 | 大连路明发光科技股份有限公司 | UV curing luminescent film and manufacturing method thereof |
| CN101196686A (en) * | 2006-12-04 | 2008-06-11 | 旭化成电子材料元件株式会社 | Photosensitive resin composition and use of the same |
| CN101201543A (en) * | 2006-12-15 | 2008-06-18 | 北京化工大学 | A kind of light curing inkjet resist for printed circuit board and preparation method thereof |
| CN101206399A (en) * | 2006-12-14 | 2008-06-25 | 第一毛织株式会社 | Photosensitive resin composition for column spacers for liquid crystal display device, column spacers formed using the composition and display device comprising the column spacers |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS646014A (en) * | 1987-06-30 | 1989-01-10 | Somar Corp | Curable composition |
-
2010
- 2010-10-11 CN CN2010105027873A patent/CN101950128B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101125475A (en) * | 2006-08-15 | 2008-02-20 | 大连路明发光科技股份有限公司 | UV curing luminescent film and manufacturing method thereof |
| CN101196686A (en) * | 2006-12-04 | 2008-06-11 | 旭化成电子材料元件株式会社 | Photosensitive resin composition and use of the same |
| CN101206399A (en) * | 2006-12-14 | 2008-06-25 | 第一毛织株式会社 | Photosensitive resin composition for column spacers for liquid crystal display device, column spacers formed using the composition and display device comprising the column spacers |
| CN101201543A (en) * | 2006-12-15 | 2008-06-18 | 北京化工大学 | A kind of light curing inkjet resist for printed circuit board and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101950128A (en) | 2011-01-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102103327B (en) | Black matrix composition with high light-shielding and improved adhesion properties | |
| CN104820342B (en) | Photosensitive resin composition for light-shielding film and cured product thereof | |
| JP4640505B2 (en) | Black photosensitive resin composition, method for forming black matrix, method for producing color filter, and color filter | |
| CN101508846B (en) | Organic-inorganic composite resin composition useful as protective film | |
| JP2011039165A (en) | Alkali-soluble photocurable composition, cured coating film using the composition and transparent member | |
| TWI712857B (en) | Photosensitive resin composition, cured film, laminate, touch panel member, and cured film manufacturing method | |
| KR102326631B1 (en) | Photosensitive resin composition, photospacer, protective film for color filters, and protective film or insulating film of touch panel | |
| TWI298113B (en) | Photoresist resin commposition for printing electric-circuit board | |
| CN100334506C (en) | Photosensitive resin composition using photosensitive resin | |
| TW201809884A (en) | Photosensitive resin composition for forming black column spacer, black column spacer and image display device | |
| CN101950128B (en) | Photosensitive resin for plasma display screen | |
| CN104080788B (en) | New compound, photosensitive composition and the photosensitizer containing described photosensitive composition | |
| CN108693707A (en) | Black-colored photosensitive resin composition and the display device manufactured using it | |
| CN102033429B (en) | Photosensitive resin for plasma display screen electrode | |
| CN109836514B (en) | Polymerizable photoinitiator for photoresist | |
| JP2001064356A (en) | Photosensitive resin and resist ink composition using the same | |
| TWI830897B (en) | Photosensitive resin composition,cuered film thereof,and display device with that film | |
| TWI659266B (en) | Photosensitive resin composition | |
| KR101041310B1 (en) | Photosensitive resin composition | |
| CN102880002B (en) | A kind of black-colored photosensitive resin composition, display panel and liquid crystal display | |
| TWI771355B (en) | Negative photosensitive resin composition | |
| JP2010262135A (en) | Photosensitive resin composition, color filter and color display device using the same | |
| CN107531880A (en) | Alkali soluble resins | |
| CN111978239A (en) | Compound and photosensitive resin composition | |
| KR102401215B1 (en) | Transfer-type photosensitive film, cured film pattern formation method and touch panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120808 Termination date: 20171011 |