CN100462932C - Low power SRAM backup repair architecture - Google Patents
Low power SRAM backup repair architecture Download PDFInfo
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Abstract
Description
技术领域 technical field
本发明是关于一种静态随机存取存储器(Static Random Access Memory,SRAM),尤指一种SRAM储存单元功率结构。The present invention relates to a static random access memory (Static Random Access Memory, SRAM), especially to a power structure of an SRAM storage unit.
背景技术 Background technique
SRAM的主要设计都是朝向将存储器阵列储存单元(cell)所消耗的功率最小化而努力。目前已有许多种解决方案被提出,包括藉由降低故障存储器储存单元所消耗的功率,进而降低整个芯片所消耗的功率。The main design of SRAM is aimed at minimizing the power consumed by memory array storage cells (cells). Many solutions have been proposed, including reducing the power consumed by the faulty memory storage unit, thereby reducing the power consumed by the entire chip.
美国专利案号5,703,816提供一种方法,该方法是在封装之前,藉由存储器储存单元的备用行(redundant columns)取代故障行(failed columns),以降低在SRAM中故障储存单元的待命电流(standby current)。该专利案提供一种装置,该装置可以关闭供应电流给位线对(bit line pair)的预充电(precharge)电路晶体管对,以及可以关闭存储器储存单元阵列故障行的储存单元电源线电路。U.S. Patent No. 5,703,816 provides a method to reduce the standby current (standby) of faulty storage cells in SRAM by replacing failed columns with redundant columns of memory storage cells before packaging. current). The patent provides a device for shutting down a precharge circuit transistor pair that supplies current to a bit line pair and a memory cell power line circuit for a faulty row of a memory cell array.
美国专利案号6,175,938揭露了一种降低由制程瑕疵所引起的待命电流的结构。在备用储存单元取代故障储存单元后,每一位线VDD路径上的多晶硅(polysilicon)保险丝会断路,以减少故障储存单元的待命电流。US Patent No. 6,175,938 discloses a structure for reducing standby current caused by process defects. After the spare memory cell replaces the failed memory cell, the polysilicon fuses on the V DD path of each bit line are disconnected to reduce the standby current of the failed memory cell.
美国专利案号6,097,647揭露了一种方法,该方法是利用电性隔绝的方式,将没有办法修复的存储器储存单元与电源线及接地线切断。该方法也可使功能正常的存储器储存单元子阵列继续工作,而消除故障存储器储存单元所多的额外待命电流。US Patent No. 6,097,647 discloses a method, which uses electrical isolation to cut off the irreparable memory storage unit from the power line and the ground line. The method also allows the functioning sub-array of memory storage cells to continue to operate while eliminating the excess standby current of a failed memory storage cell.
这些低功率的的存储器阵列储存单元是由静态互补金属氧化物半导体(Complementary Metal-Oxide Semiconductor,CMOS)触发器(flip-flop)电路所构成,使用一对相互耦合的反相器当作储存元件。CMOS触发器在静态功率消耗实际上是非常地小,主要的消耗由接点漏电流引起。在这包含存储器阵列储存单元的电路中,功率的消耗是非常关键的。对于低功率的规格来说,一些故障储存单元就足以产生够大的电流而超出该芯片的的功率规格。These low-power memory array storage cells are composed of static complementary metal-oxide semiconductor (Complementary Metal-Oxide Semiconductor, CMOS) flip-flop (flip-flop) circuits, using a pair of mutually coupled inverters as storage elements . The static power consumption of CMOS flip-flops is actually very small, and the main consumption is caused by contact leakage current. In the circuit including the storage cells of the memory array, power consumption is very critical. For low power specifications, a few fault memory cells are sufficient to generate enough current to exceed the chip's power specification.
因此需要一种机制,该机制可以将故障的储存单元选择性地禁止,藉此降低漏电流以及整个芯片的功率。Therefore, there is a need for a mechanism that can selectively disable faulty memory cells, thereby reducing leakage current and overall chip power.
发明内容 Contents of the invention
本发明的主要目的是提供一种有效将低功率SRAM阵列中故障储存单元所造成电流降到最低的机制。本发明的次要目的是提供一种装置,该装置可用来侦测在SRAM存储器中哪一个储存单元或是哪一区的储存单元有漏电路径的存在。为了达到上述目的,本发明提供一种具有一备份修复结构的SRAM存储器储存单元。在该结构中,SRAM存储器储存单元连接到一高参考电压以及一低参考电压,且具有一切断装置,可切断低参考电压与SRAM存储器储存单元间的连接。根据本发明的一种有备份修复结构的SRAM存储器储存单元,包括有:The main purpose of the present invention is to provide a mechanism to effectively minimize the current caused by a faulty memory cell in a low power SRAM array. A secondary object of the present invention is to provide a device that can be used to detect which storage unit or which region of storage units has a leakage path in the SRAM memory. In order to achieve the above object, the present invention provides a SRAM memory storage unit with a backup repair structure. In this structure, the SRAM memory storage unit is connected to a high reference voltage and a low reference voltage, and has a cutting device, which can cut off the connection between the low reference voltage and the SRAM memory storage unit. According to a kind of SRAM memory storage unit that backup repair structure is arranged according to the present invention, comprise:
一连接到一高参考电压及一低参考电压的SRAM存储器储存单元;其特特在于还包括A SRAM memory storage unit connected to a high reference voltage and a low reference voltage; characterized in that it also includes
一切断装置,可切断该低参考电压与该SRAM存储器储存单元间的连接,其中该装置包括有:A cut-off device can cut off the connection between the low reference voltage and the SRAM memory storage unit, wherein the device includes:
一包括一NMOS晶体管的低参考电压启动VSSEN电路,该电路还包括:A low reference voltage start VSSEN circuit including an NMOS transistor, the circuit also includes:
一启动/禁止控制逻辑10,其输出信号EN连接到装置14的漏极端点;an enable/disable
一解码器12,其输出信号TMEN连接到装置18的漏极端点;a
一反向器16,其输出信号TESTMOD连接到装置14及装置18的栅极端点,装置14及装置18的源极端点连接到信号VSSEN。An
本发明亦提供一种降低由SRAM阵列中故障储存单元所产生的漏电流的方法,该方法包括有以下步骤:The present invention also provides a method for reducing leakage current generated by faulty storage cells in an SRAM array, the method comprising the following steps:
a:将一SRAM阵列中的多个SRAM存储器储存单元连接到一高参考电压及一低参考电压;a: connecting a plurality of SRAM memory storage units in an SRAM array to a high reference voltage and a low reference voltage;
b:测试该SRAM阵列是否有故障储存单元;b: test whether the SRAM array has a fault storage unit;
c:当检测到SRAM阵列中有缺陷储存单元时,由正常的备份储存单元取代该故障储存单元;以及c: when a defective storage unit in the SRAM array is detected, the faulty storage unit is replaced by a normal backup storage unit; and
d:藉由低参考电压信号的变化切断低参考电压与该故障储存单元的连接,藉以降低来自该故障储存单元的漏电流,使芯片整体功率结构不变。d: cut off the connection between the low reference voltage and the faulty storage unit by changing the low reference voltage signal, thereby reducing the leakage current from the faulty storage unit, and keeping the overall power structure of the chip unchanged.
该低参考电压路径是由一启动信号(VSSEN)所控制,该启动讯号用来在阵列测试所指定的条件下,隔绝故障储存单元。该启动信号在低功率SRAM中也用来解码出哪些存储器储存单元或哪些区储存单元被启动(enabled),以及哪些故障储存单元被切断连接。切断故障储存单元通往低参考电压的路径,并用正常的备份储存单元取代故障储存单元可以减低由故障储存单元所产生的功率,而故障的备份储存单元也可以被禁止(disabled),藉此降低芯片的电流和功率。经由这个方法,将漏电流最小化,进而降低整个芯片所消耗的功率。The low reference voltage path is controlled by an enable signal (VSSEN), which is used to isolate faulty memory cells under the conditions specified by the array test. The enable signal is also used in low-power SRAMs to decode which memory cells or which bank cells are enabled and which faulty cells are disconnected. Cutting off the path of the faulty storage cell to the low reference voltage and replacing the faulty storage cell with a normal backup storage cell can reduce the power generated by the faulty storage cell, and the faulty backup storage cell can also be disabled (disabled), thereby reducing Chip current and power. Through this method, the leakage current is minimized, thereby reducing the power consumed by the entire chip.
至于本发明的详细构造、应用原理、作用与功效,则参照下列附图所作的说明即可得到完全的了解:As for the detailed structure of the present invention, application principle, function and effect, then can obtain complete understanding with reference to the explanation that following accompanying drawing is done:
附图说明 Description of drawings
图1是先前技术中一标准的六晶体管(6T)SRAM储存单元结构;Fig. 1 is a standard six-transistor (6T) SRAM memory cell structure in the prior art;
图2是为本发明的六晶体管SRAM储存单元结构,其中附带一低参考电压的启动信号(VSSEN)Fig. 2 is a six-transistor SRAM storage unit structure of the present invention, wherein a low reference voltage start signal (VSSEN) is attached
图3是为一方块图,说明如何解码该低参考电压启动信号(VSSEN),以禁止正常储存单元区中的故障储存单元,并启动在备用储存单元区中用来取代该故障储存单元的储存单元;FIG. 3 is a block diagram illustrating how to decode the low reference voltage enable signal (VSSEN) to disable a faulty memory cell in the normal memory cell area and activate a memory cell used to replace the faulty memory cell in the spare memory cell area. unit;
图4是表示对一低功率SRAM中的正常存储器储存单元,启动/禁止控制逻辑如何完成动作的电路图;Figure 4 is a circuit diagram showing how the enable/disable control logic works for a normal memory storage unit in a low-power SRAM;
图5是表示对一低功率SRAM中的备份存储器储存单元,启动/禁止控制逻辑如何完成动作的电路图;5 is a circuit diagram showing how the enable/disable control logic completes the action for the backup memory storage unit in a low-power SRAM;
图6是图标说明多个存储器储存单元如何连接到低参考电压启动信号(VSSEN);6 is a diagram illustrating how multiple memory storage cells are connected to a low reference voltage enable signal (VSSEN);
图7是本发明的操作流程图。Fig. 7 is a flowchart of the operation of the present invention.
附图标记说明:WL:字线;BL、BLB:位线对;N1-N4、P1、P2:晶体管;N11-N14、P11、P12:晶体管;10控制逻辑;12解码器;14晶体管装置(CMOS开关);16反相器;18晶体管装置(CMOS开关);20晶体管装置;22晶体管装置;24反相器;26保险丝;21晶体管装置;23晶体管装置;25反相器;27反相器;29保险丝;30-n0存储器储存单元行;40-46本发明操作流程图。Explanation of reference numerals: WL: word line; BL, BLB: bit line pair; N1-N4, P1, P2: transistor; N11-N14, P11, P12: transistor; 10 control logic; 12 decoder; 14 transistor device ( CMOS switch); 16 inverter; 18 transistor device (CMOS switch); 20 transistor device; 22 transistor device; 24 inverter; 26 fuse; 21 transistor device; 23 transistor device; 25 inverter; 27 inverter ; 29 fuse; 30-n0 memory storage unit row; 40-46 operation flow chart of the present invention.
具体实施方式 Detailed ways
请参阅图1,此为一标准六晶体管SRAM储存单元。对一个8M位容量的超低功率SRAM来说,当其字线(word line,WL)关闭时,存储器储存单元的待命电流在85℃下是小于20微安培,而在室温时待命电流约是1到2微安培间。Please refer to FIG. 1, which is a standard six-transistor SRAM memory cell. For an ultra-low power SRAM with 8M bit capacity, when its word line (word line, WL) is closed, the standby current of the memory storage unit is less than 20 microamperes at 85°C, and the standby current at room temperature is about Between 1 and 2 microamperes.
存取装置N3及N4对资料进出储存单元提供一可转换的路径。除了正在读出或写入外,字线WL选取讯号通常都是保持在低电位的状态。两字符线BL、BLB则提供该资料路径。字线和位线的选择是藉由解码器来完成。假设所存的逻辑「1」定义成触发器的左侧处于高电位的状态,也就是说N2是关闭的状态。Access devices N3 and N4 provide a switchable path for data to and from the storage unit. Except when reading or writing, the word line WL selection signal is usually kept at a low potential state. Two word lines BL, BLB provide the data path. Selection of wordlines and bitlines is done by decoders. Assume that the stored logic "1" is defined as the left side of the flip-flop is in a high potential state, that is to say, N2 is in a closed state.
图1的存储器储存单元的操作程序如下:该字线WL于待命状态时是在低电位的状态,当收到高参考电压时,将N4及N3打开。强制位线BL或BLB其中之一为低电位状态,同时另一位线仍维持高电位状态,以完成写入动作。举例来说,要写入一个逻辑「1」,位线BLB被强制成低电位的状态。该存储器储存单元设计成使得N1的漏极与N2的漏极可以带至临界电压(threshold voltage)之下。于是N2关闭,且N2的漏极电压因为电流从P2流到N4而上升;N1打开,字线WL可以回复到平常的待命低电位,同时存储器储存单元写入「1」。The operation procedure of the memory storage unit in FIG. 1 is as follows: the word line WL is in a low potential state in the standby state, and N4 and N3 are turned on when receiving a high reference voltage. One of the bit lines BL or BLB is forced to be in a low potential state, while the other bit line remains in a high potential state, so as to complete the writing operation. For example, to write a logic "1", the bit line BLB is forced to a low state. The memory storage cell is designed such that the drains of N1 and N2 can be brought below the threshold voltage. Then N2 is turned off, and the drain voltage of N2 rises due to the current flowing from P2 to N4; N1 is turned on, the word line WL can return to the normal standby low potential, and the memory storage unit writes "1" at the same time.
请参阅图2,其是本发明的六晶体管SRAM储存单元结构,其中附带一低参考电压的启动信号(VSSEN)。当存储器储存单元没有侦测到有故障在其中时,VSSEN就保持在高电位,而其所包括的NMOS晶体管处于导通状态;并将该储存单元启动,要读取一个逻辑「1」,位线对BLB、BL在一开始是处于高参考电压(VCC)下的高电位状态。当选定好存储器储存单元时,电流经由N11与N13到低参考电压(VSS),且流经P12与N14到字元线BL。N11保持开的状态。要读取一个逻辑「0」,当选定好存储器储存单元时,电流经由N12与N14到低参考电压VSS,且流经过P11与N13到字符线BLB。N12保持开的状态。当侦测到有故障在存储器储存单元中时,VSSEN就变成低电位的状态,而其NMOS晶体管就变成非导通状态,并且将储存单元从存储器中禁止。Please refer to FIG. 2 , which shows the structure of the six-transistor SRAM storage unit of the present invention, wherein a low reference voltage enable signal (VSSEN) is attached. When the memory storage unit does not detect a fault in it, VSSEN is kept at a high potential, and the NMOS transistor included in it is in a conductive state; and the storage unit is activated to read a logic "1", the bit The line pair BLB, BL is initially in a high potential state under a high reference voltage (VCC). When the memory storage cell is selected, the current flows through N11 and N13 to the low reference voltage (VSS), and flows through P12 and N14 to the word line BL. N11 remains on. To read a logic "0", when the memory cell is selected, current flows through N12 and N14 to the low reference voltage VSS, and flows through P11 and N13 to the word line BLB. N12 remains on. When a fault is detected in a memory cell, VSSEN goes low and its NMOS transistor becomes non-conductive, disabling the cell from the memory.
在存储器被制造后,通常会作是否存在任何故障储存单元的测试。先前技术要求对全部的子阵列(sub array)都去作检测。假如在测试的时候,一存储器储存单元或是一区的储存单元被侦测到有故障,整个子阵列都会被置换。而本发明则可以将范围缩小到位线对之行中,也就是只有一位线对之行会被删除。请参阅图3,其说明如何进行VSSEN的解码动作。信号EN为控制逻辑10的输出,而且连接到装置14的漏极(drain)端点。信号TMEN为解码器12的输出,而且连接到装置18的漏极端点。信号TESTMODE为反相器16的输出,该反相器16的输出连接到装置14及装置18的漏极(gate)端点。装置14及装置18的源极(source)端点连接到信号VSSEN。当侦测到电流超出预设的电流规格时,如果该阵列储存单元在正常储存单元的区间中,就以备份储存单元取代;而如果该阵列储存单元是在备用储存单元区间中,就禁止该储存单元。在正常储存单元区间中,信号EN除了在该储存单元被一备用的储存单元取代外,其它时候是在处于高电位的状态。在备用的储存单元的区间中,信号EN除了该储存单元被用来取代一故障储存单元外,其它时候是在处于低电位的状态。After the memory is manufactured, it is usually tested for the presence of any faulty memory cells. The prior art requires all sub-arrays to be tested. If a memory cell or a region of memory cells is detected to be faulty during testing, the entire subarray is replaced. However, the present invention can narrow the scope to the rows of bit line pairs, that is, only the rows of bit line pairs will be deleted. Please refer to FIG. 3 , which illustrates how to decode VSSEN. Signal EN is an output of
请参阅图4及图5,此二图分别表示保险丝如何用来设定OUTB及OUT的高低电位,从而设定图三中信号EN的高低电位。图4表示假如正常储存单元区间中的储存单元有故障,就会将保险丝26烧掉,使该储存单元禁止,也就是使VSSEN处于低电位。EN(对正常储存单元来说是OUTB)是反相器24的输出,同时也是装置22漏极。假如该储存单元是故障储存单元,打断连接到装置20及装置22的源极的保险丝26,使得通过反相器24的INITIALB反相变成EN。图5表示烧掉保险丝29使该储存单元启动,也就是使VSSEN处于高电位的状况,即可将备用储存单元取代正常的储存单元。EN(对备用储存单元来说是OUT)是反相器27的输出。反相器27的输入是反相器25的输出,同时也是装置23的漏极端点,假如该储存单元将被使用,连接到装置21及装置23的源极的保险丝29就使INITIALB通过变成EN。依照以上的方式,没有使用的阵列储存单元会被禁止,所以不会对待命电流有任何的影响。先前技术要求切断VDD及VSS两个电源供应路径。但如果应用本发明的方法,只要切断VSS电源供应路径,就只需要比较少的晶体管,藉此芯片的消耗功率及电路设计的成本就可以减到最小。Please refer to FIG. 4 and FIG. 5 , which respectively show how the fuse is used to set the high and low potentials of OUTB and OUT, thereby setting the high and low potentials of the signal EN in FIG. 3 . FIG. 4 shows that if the storage unit in the normal storage unit interval has a fault, the fuse 26 will be burned to disable the storage unit, that is, VSSEN will be at a low potential. EN (OUTB for normal memory cells) is the output of inverter 24 and also the drain of device 22 . If the memory cell is a faulty memory cell, blow fuse 26 connected to the source of device 20 and device 22 so that INITIALB through inverter 24 is inverted to EN. FIG. 5 shows that the storage unit is activated by burning the
请参阅图6,该图显示假如发现一故障储存单元,包含该故障储存单元的储存单元行就从阵列中被删除,然后加入一正常的备用储存单元行。在这个方法中,低参考电压启动信号(VSSEN)连接到每一存储器储存单元行,也就是30到n0,使得本发明比先前技术更为简单。Please refer to FIG. 6, which shows that if a faulty memory cell is found, the memory cell row including the faulty memory cell is deleted from the array, and then a normal spare memory cell row is added. In this approach, a low reference voltage enable signal (VSSEN) is connected to each memory cell row, ie, 30 to n0, making the present invention simpler than the prior art.
请参照图7,其为本发明的操作流程图。根据本发明,该方法包括以下步骤,Please refer to FIG. 7 , which is an operation flowchart of the present invention. According to the present invention, the method comprises the following steps,
40:提供一个SRAM储存单元阵列的SRAM,并且每一储存单元都连接到一高参考电压及一低参考电压;40: providing an SRAM of an array of SRAM storage cells, and each storage cell is connected to a high reference voltage and a low reference voltage;
42:侦测该SRAM阵列是否有缺陷储存单元;42: Detect whether the SRAM array has a defective storage unit;
44:当检测到SRAM阵列中有缺陷储存单元时,由正常的备用储存单元取代故障储存单元;44: When a defective storage unit in the SRAM array is detected, the faulty storage unit is replaced by a normal spare storage unit;
46:藉由低参考电压信号的变化将故障储存单元禁止,使低参考电压路径切断。46: Disable the fault storage unit by changing the low reference voltage signal, so as to cut off the low reference voltage path.
于是,故障储存单元的漏电流被降低,同时也不影响芯片其它部分的电源结构。Thus, the leakage current of the faulty memory cell is reduced without affecting the power structure of other parts of the chip.
但是以上所述,仅为发明的一较佳实施例而已,并非用来限定本发明实施的范围。即凡本发明申请专利范围所作的均等变化与修饰,皆为本发明专利范围所含盖。However, the above description is only a preferred embodiment of the invention, and is not intended to limit the implementation scope of the invention. That is, all equivalent changes and modifications made in the patent scope of the present invention are covered by the patent scope of the present invention.
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US7609579B2 (en) * | 2007-11-21 | 2009-10-27 | Etron Technology Inc. | Memory module with failed memory cell repair function and method thereof |
US9147457B2 (en) * | 2012-09-13 | 2015-09-29 | Qualcomm Incorporated | Reference cell repair scheme |
TWI545564B (en) * | 2015-03-24 | 2016-08-11 | 國立成功大學 | A non-volatile sram |
CN105244060B (en) * | 2015-09-25 | 2019-01-01 | 北京兆易创新科技股份有限公司 | A kind of test processing method and device based on chip |
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US5886375A (en) * | 1996-06-17 | 1999-03-23 | United Microelectronics Corporation | SRAM having improved soft-error immunity |
US5952678A (en) * | 1995-01-23 | 1999-09-14 | Mitsubishi Denki Kabushiki Kaisha | SRAM cell with no PN junction between driver and load transistors and method of manufacturing the same |
CN1402353A (en) * | 2001-08-10 | 2003-03-12 | 三菱电机株式会社 | Semiconductor memory |
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US5952678A (en) * | 1995-01-23 | 1999-09-14 | Mitsubishi Denki Kabushiki Kaisha | SRAM cell with no PN junction between driver and load transistors and method of manufacturing the same |
US5886375A (en) * | 1996-06-17 | 1999-03-23 | United Microelectronics Corporation | SRAM having improved soft-error immunity |
CN1402353A (en) * | 2001-08-10 | 2003-03-12 | 三菱电机株式会社 | Semiconductor memory |
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