CN100401462C - High-pressure device for closing a container in a clean room - Google Patents
High-pressure device for closing a container in a clean room Download PDFInfo
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- CN100401462C CN100401462C CNB2003801041564A CN200380104156A CN100401462C CN 100401462 C CN100401462 C CN 100401462C CN B2003801041564 A CNB2003801041564 A CN B2003801041564A CN 200380104156 A CN200380104156 A CN 200380104156A CN 100401462 C CN100401462 C CN 100401462C
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- 238000000034 method Methods 0.000 claims abstract description 87
- 230000008569 process Effects 0.000 claims abstract description 59
- 239000012530 fluid Substances 0.000 claims abstract description 46
- 238000007789 sealing Methods 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 208000002925 dental caries Diseases 0.000 claims description 8
- 238000005516 engineering process Methods 0.000 claims description 8
- 230000002708 enhancing effect Effects 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 4
- 230000003068 static effect Effects 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 2
- 239000001569 carbon dioxide Substances 0.000 claims description 2
- 239000003814 drug Substances 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 13
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 238000007599 discharging Methods 0.000 description 5
- 239000003344 environmental pollutant Substances 0.000 description 5
- 230000002349 favourable effect Effects 0.000 description 5
- 231100000719 pollutant Toxicity 0.000 description 5
- 239000002086 nanomaterial Substances 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000010720 hydraulic oil Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 230000002101 lytic effect Effects 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Pressure Vessels And Lids Thereof (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Reciprocating Pumps (AREA)
- Food Preservation Except Freezing, Refrigeration, And Drying (AREA)
- Actuator (AREA)
- Pistons, Piston Rings, And Cylinders (AREA)
Abstract
The invention relates to a very compact device and to a method for closing a container by means of a rotational symmetric lifting system, which contains a working piston and a guide cylinder and is operated essentially using the same fluid that is placed inside the container while serving as a process medium. The front face of the working piston forms, at least in part, the closure part of the container or is joined to the closure part in a fixed manner. Ideally, a supercritical fluid is used both as a working medium for driving the piston and as the process medium.
Description
Technical field
The present invention relates to seal by means of rotational symmetric reciprocating piston device a kind of very compact equipment and a kind of method of preposition container, this reciprocating piston device comprises that a working piston is with a guide cylinder and basically by be used for the identical fluid operation of closed container as process medium in container.Wherein the end face of working piston forms the closure member of container at least in part or is rigidly connected with closure member.At this, a kind of postcritical fluid is used for driven plunger as working media and uses ideally as process medium.
Background technology
In semiconductor manufacturing, optoelectronics industry and other industrial departments, developed more and more by means of micrometer structure or nanostructure or on the basis of micrometer structure or nanostructure, realize the product of main function.These micrometer structures and nanostructure are especially responsive especially for very little pollutant in its manufacture process.Therefore the element to manufacturing process proposes very high requirement about the discharging of permitting.Partly, the surperficial necessary cleaning measure for nanostructure is no longer possible by cleaning fluid commonly used or is difficult to.Therefore use supercritical fluid for a period of time in large quantities with improved wettability and clean-up performance.Pressure process is from 150 to 300bar being essential thus, and its requires special equipment.The high pressure complete set of equipments that mechanically is fit to is not suitable for or directly is not suitable for the clean room up to now.The present invention describes a kind of high pressure complete set of equipments that is used for using in the clean room, it only produces very little discharging during the load Fast transforms on high stress level, and is designed to a kind of very compact structure form.
Be higher than the reciprocating piston mechanism of 150bar for pressure, in various technology are used and in patent documentation and technical literature, describe fully.Fluid and gas are as working media, wherein for making water and preferably use hydraulic oil for the pressure that is higher than 160bar until about 160bar pressure.Inert gas and air are the gaseous working mediums of using always.For high-voltage applications, hydraulic oil has important favourable characteristic, and wherein these characteristics are lubricated, the little compressibility of sliding surface and high thermal endurance.
In addition, unfavorable effect that can not full remuneration in piston apparatus is the material corrosion and the leakage of working media.Friction and the material corrosion that causes of pressure for example wear and tear, vaporize and liquefy with small degree the of basic material own and especially take place on sealing device.Material corrosion in reciprocating piston mechanism depends on the radial compaction power and the temperature of manufacturing tolerance, encapsulant and the seal of the surface characteristic of sliding surface and member basically.
In addition, the leakage of a certain amount of working media of carrying secretly in each driving stroke is depended on the static pressure in surface characteristic, viscosity, the cylinder cavity and is depended on hermetically-sealed construction and its thrust radially on function.
High operating pressure requires having of face that contact with each other and slip mutually lubricated fully, and this causes corresponding leakage rate.This effect can minimize by appropriate sealing means and high-quality surface treatment.But the possibility that improves thrust in order to suppress to leak is limited, and along with the raising of pressure has also increased the damage and the erosion of encapsulant, this is same to produce the increase that causes leakage rate in discharging and short time.In addition, reach the limit of the operational mode that can bear mechanical load and economy.
Material corrosion by above-mentioned source is very disadvantageous for clean room's processing with leaking the pollutant that causes especially in the manufacturing field.Pure grade is for example stipulated at DIN 2083 or in Federal Specification 209D.The discharging of arbitrary type directly influences the workmanship in this technical process and by the high equipment and the cost minimization of tissue, this is relevant with corresponding cost.The pollutant that causes by mist of oil be especially difficulty with disadvantageous because the emission of oil-containing often is chemically active, and can only remove again by the material that contains lytic agent, it is again that do not expect in the clean room and very unfavorable on the other hand.
For the production chain of complexity, use be fit to and the not too suitable element in clean room therein, realize the separation on the space.In so-called " servicing area ", settle these to the unaccommodated equipment in clean room, and the equipment element of in so-called " absolute clean room ", settling the clean room to be fit to.The gate that these solutions need expend and mechanism's measure are so that stop the pollutant that comes from " servicing area ".
The use of reciprocating piston device in the clean room that is known that oil pressure has problem, and can be suitable for clean room's [Switzerland pollutes control 5 (1992), the 5th phase, the 8th page] by suitable suction.When using operated pressing tool to be used to make the CD sheet, oily bur appears on semi-finished product.Experiment shows that the source of this pollutant is a hydraulic oil.By sealing ring that sealing is installed on the push rod of instrument and the suitability that aspirates the compacting engine housing and can set up desired clean room from the air of sealing ring.
Another professional paper discloses a kind of pneumatic linear actuator [Dr.-ing.E.Fritz that does not have the structure of piston rod; The 1st piece, the fluid technique academic marketplace, the 2nd volume, the 283rd page reaches thereafter].The suitability of clean room reaches by following measure, promptly produces a part of vacuum in the space between cover tape and band.Vacuum adapter is installed on earthen pipe thus and is derived emission.In the reciprocating piston device of above-mentioned band suction, disadvantageously, need to install and must for good and all move extra being used to guarantee the minimized device of granule density.
Disclose a kind of processing unit in patent documentation US 5,314,574, it uses in the field of wafer manufacturing.A kind of reciprocating piston device is disclosed in described document, in order to reach the applicability of clean room, this reciprocating piston device separates required reciprocating piston bar and cylinder and process chamber by this way, promptly, extensible wavy metal cover is fixed between the base plate of the piston end plate that stretches out and process vessel, and described piston passes this base plate.Therefore, this wavy metal cover is enclosed within on piston rod and the piston cylinder and in each reciprocating motion process and folds and launch concertina.A kind of similar structure is disclosed in patent documentation US 5,259,407.Shortcoming in such device is that a large amount of air is in the extruding of the outside of wavy metal cover, because by the big relatively surface of folding generation, this surface extends substantially transversely to the moving direction setting and quickens when each reciprocating motion.In addition disadvantageously, high construction expenditure and be subjected to the vulnerability that reckons with of heavily stressed radiation fins material.
Disclose a kind of rotational symmetric device that is used to handle circular wafer in patent documentation US 5,169,408, wherein it comprises a pneumatic reciprocating piston device and a process vessel, puts into circular wafer and carry out actual processing in this process vessel.This reciprocating piston device also comprises the reciprocating piston of a plurality of pneumatic actuation, and one of them air rammer centrally is fixed on the part on top of process vessel, and is used for rising and the decline container parts.On the process vessel of bottom part, a plurality of reciprocating pistons are installed in rotation symmetrically outside rotation, and the container part with the bottom that is connected of descending of being used to rise.By patent documentation US5, the working media that uses in 169, the 408 disclosed devices is essentially the nitrogen G﹠W.This is invented disadvantageously expensive reciprocating piston device, and this reciprocating piston device is provided with more and more the reciprocating piston that coordination mutually drives for a reciprocating motion process.Especially when high pressure, need the operational mode of described piston absolute synchronization, this needs high regulate expenditure.The use of the reciprocating piston of described pneumatic actuation is limited to be used disclosed apparatus and method when the low pressure.
US6,067,728 discloses a kind of being used for by postcritical CO
2Come the apparatus and method of dry circular wafer, wherein describe a kind of pneumatic-provision for sealing of machinery.The sealing of container realizes by an air rammer and a leverage, wherein realizes precompressed by this structure.The locking of lid realizes by clip.After the pneumatic-mechanical close in process chamber, one and a plurality of static clips are positioned on the edge of lid symmetrically.The sealing of container during clip is mechanically promoted to surpass the edge of container cover and container bottom and guarantees to handle when interior voltage rise is high.
The shortcoming of foregoing invention is, many mobile members are arranged, and they can be counted as crucial aspect discharging, and they are because required stroke and limited number of stroke in the unit interval or possible process circulation consumingly.In addition, many processes also need expensive control.
Summary of the invention
The objective of the invention is to, by structure and solution technology, on the reciprocating piston device of reality, avoid the aspirator that adds and safety device and space dividing with a plurality of be the use of different process fluid and working fluid.Should reach these versions in addition, with the as far as possible little requirement that reaches the operation of reliable clean room with the least possible mobile member of moving.
The present invention reaches this purpose by a kind of high-tension apparatus that is used for the pressure vessel that sealing is connected with container under clean-room condition, this high-tension apparatus consist essentially of at least one guide cylinder as basic part and a working piston as closure member, and have a sealing surface between these two parts; And, in order to implement a kind of technical process by at least a process fluid, drive by means of a rotational symmetric reciprocating piston device, this reciprocating piston device comprises rotational symmetric working piston and guide cylinder that at least one moves, and working piston be arranged in have on the working piston end of guide cylinder at least one on the outer surface radial loop around enhancing portion, make the inner chamber between guide cylinder and working piston be divided at least two cylinder cavitys, and each cylinder cavity is led at least one hole in guide cylinder, and these holes directly or via pipe are connected with at least one valve, the input and the discharge of each cylinder cavity of this valve control guide cylinder, it is characterized in that, the fluid that is used for driving working piston is identical with the main component of the fluid that uses at closed container, wherein the head zone of working piston is connected with the closure member of container at least in part or is connected rigidly with this closure member, and this closure member moves along rotation equally basically with respect to working piston, and, container is arranged on the opposite of working piston end face, and the bottom surface of working piston is greater than the seal face that is provided with between the basic part of container and closure member.
The working piston that has enhancing portion is divided at least two cylinder cavitys with Work container.Also it is contemplated that such structure, wherein working piston has a plurality of enhancing portions and thus Work container is divided into a plurality of cylinder cavitys.Also it is contemplated that such structure, it comprises an other Work container, is connected on first Work container to its wiper seal and comprises rigidly connected another working piston of one and first working piston, and this another working piston has another enhancing portion.Obtain two Work containers thus and comprise four cylinder cavitys.The advantage of this structure is to be used for the bigger thrust of clossing pressure container.But be configured to by equipment of the present invention usually, make and have only a working piston that has an enhancing portion, Work container is divided into two cylinder cavitys.The seal force that obtains thus is normally enough.
In addition, at least one sliding surface in the sliding surface be harden and have one greater than 60% supporting than (Traegerverhaeltnis), these sliding surfaces are positioned at described cylinder surfaces on cylinder inner surface and piston face mutually opposed contiguously with piston face and be parallel to rotation ground mutually in those zones of motion, wherein, described supporting is than the ratio for projection and negative area in the surface texture, and/or this sliding surface hardens, and bites so that prevent sliding surface.
The preferred austenite material that uses is not limited to such material group at this by equipment of the present invention.
Be used to make the method description widely in the literature of high supporting ratio.For example honing, grinding or roll extrusion are available as possible method.Hardening of the surface at so pre-place can be handled (Kolsterisierung: do not lose corrosion proof austenitic stainless steel surface hardening) or hard plating realization by means of glow discharge nitriding, surperficial rich carbon.These methods are regarded as prior art and are provided by special company commercial.
For optimized control, openly a kind of of equipment method is by structure of the present invention, inserts at least one flow controller and/or valve that at least one is other in input channel and discharge line and/or discharge pipe.Guarantee thus, working piston the thrust on the end face during different load step that triggers by valve basically or unloading step always greater than the pressure in the process chamber.
Openly the work of equipment is carried out in this wise, and feasible manipulation by valve makes cavity and container below the working piston bottom surface add carrying object through penstock and hole, then
● working piston moves to the position of " container closure " from the initial position of " container is opened ", and closed container, and
● such control valve after technical process finishes in container, make the fluid unloading in the cylinder cavity of bottom and in the process chamber, and
● then by continuing control valve, the cylinder cavity in guide cylinder adds carrying object through penstock and hole, makes working piston move on to initial position " container is opened " again.
As mentioned above, a kind of advantageous method embodiment is, when the cylinder cavity of process chamber and bottom adds carrying object simultaneously, fluid, makes in the basic part of container and the thrust on the sealing surface between the closure member always greater than the pressure in container by throttling and/or be delayed in time by the input of pipeline in container.
Be similar to the optimization of said method, can find out further formation therein, promptly when the cylinder cavity of container and bottom unloads simultaneously, discharge by throttling and/or postpone in time from the fluid of bottom cylinder cavity, make in the basic part of container and the thrust on the sealing surface between the closure member always greater than the pressure in the process chamber.
By coupling directly be associated in process chamber and the cylinder cavity pressure and by the stream of misconnection fluid in each reciprocating step, control and adjusting have been simplified with respect to device, as its from the prior art clear known like that, and the reciprocating motion quantity more than also can under the situation of very high pressure, realizing.
A kind of embodiment of particularly advantageous method is, uses postcritical fluid as fluid, and described fluid is for example carbon dioxide (CO
2), compressed air, nitrogen or a kind of inert gas, perhaps the mixture by these supercritical fluids constitutes.Wherein can in described fluid, add a kind of clean material with little percentage.
Another favourable formation of this method is, uses a kind of volatile medium of selecting as fluid from following group, and this group is made of ethanol, methyl alcohol, isopropyl alcohol and materials similar or these mixtures of material, perhaps uses a kind of gas, and it is basically by CO
2, oxygen, nitrogen, a kind of inert gas or these gases mixture constitute.Wherein can in described fluid, add a kind of clean material with little percentage.
Advantageously, above-mentioned is suitable by equipment of the present invention and method, so that reaching the operating pressure that is higher than 160bar by rule on the end face of working piston and/or in the process chamber, and described equipment and method are moved being higher than under the pressure of 160bar.
Advantageously, be used for following technical process by equipment of the present invention and method, these technical processs are relevant with application, production or technology that semi-conductor industry and/or wafer are made.
Use and disclose process, application or the production technology of other favourable fields of equipment as optics industry, pharmacy and/or medical industry.Need a plurality of autoclaving, packaging process or pressing process just in medical science-pharmaceuticals industry, these technical processs can be simplified and be improved by means of disclosed equipment.
For this reason, a kind of equipment that can be applied in all industrial circles is advantageously disclosed highly beneficially with respect to known ground reciprocating piston device, pure property for technical process in these fields has extra high requirement, satisfies the requirement of high through-flow rate and high pressure simultaneously.Owing to save extra work fluid and described version and minimize moving process, it is very compact and firm, makes also have tangible advantage at economic aspect with respect to prior art.
Description of drawings
Fig. 1 to 3 illustrates this equipment with longitudinal sectional view.
Fig. 1 reciprocating piston device and regulon
Fig. 2 reciprocating piston device is in initial position (" container is opened ")
Fig. 3 reciprocating piston device (" container closure ")
Embodiment
To illustrate in greater detail this equipment and method by means of explanation and example.Fig. 1 illustrates reciprocating piston device and a regulon 20, all here penstocks and input and the discharge line regulon 20 of exemplarily flowing through.
The exemplary regulon that illustrates as valve 20, valve 26 and choke valve 27 of Fig. 2 and Fig. 3.In addition, they also are illustrated in conjunction with above-mentioned by the openly enforcement of method under the situation of equipment of the present invention.It carries out like this, makes the cavity and the pressure vessel 8 of 11 belows, bottom surface that are positioned at working piston 1 add carrying object through penstock and hole by control valve 20, this moment valve 26 closing presure pipelines 23, then
● working piston 1 (Fig. 2) moves to the position (Fig. 3) and the closed container of " container closure " from initial position " container is opened ", and,
● after technical process finished, control valve 20 like this, made that cylinder cavity 12 and the fluid in the process chamber 7 in the bottom unloads, and
● then, make that the top cylinder cavity 13 in guide cylinder adds carrying object through penstock 24 and hole 6, make working piston 1 move on to initial position " container is opened " again by continuing control valve.
Below will illustrate in greater detail the method for equipment of the present invention and its use by an example.
As shown in FIG. 2, this equipment comprises a device that is used for closed container, and it is made up of a static basic part and a mobilizable closure member basically.Between these two parts, a sealing surface is set.In the process chamber that between two parts, constitutes, realize described technical process with at least a process fluid.Seal by means of a rotational symmetric reciprocating piston device, this reciprocating piston device is made up of a mobile rotational symmetric working piston 1 and a guide cylinder 4.
The pistons end that is arranged in guide cylinder 4 have one on the outer surface radial loop around enhancing portion 3, make that the inner chamber between guide cylinder and working piston is divided into two cavitys.Each cavity in these two cavitys is led in each hole in guide cylinder, and wherein these aperture penstocks are connected with valve.Process fluid and working fluid import through input pipe 21, make and use same fluid basically for piston actuated and the technical process (Prozess) in process chamber (Prozessraum) 7.Wherein additive can be joined in the fluid, this is essential for the technical process in process chamber 7.
The end face of working piston is as the closure member of pressure vessel 8, and vertically moves along rotation.The bottom surface 11 of working piston 1 is greater than at the basic part of container and the seal face between the closure member.
As shown in Figures 2 and 3, above-mentioned equipment comprises a centre valve 20 and the choke valve 27 that is arranged in the discharge line 22, and is installed in the valve 26 in the input channel 23.
● when reciprocation cycle began, valve 26 cut out;
● by regulating described valve 20, the cylinder cavity 12 of bottom adds carrying object through penstock 25 and hole 5, and wherein fluid can be discharged from the cylinder cavity 13 on top through via hole 6 and penstock 24 simultaneously. Pipeline 23 and 24 seals by valve 20 and 26 when beginning.By in penstock 23 or in end face 10 or after the time of one section setting, reach the pressure of regulation
● valve 26 is opened and process chamber 7 adds carrying object through via hole 9 and penstock 29.The process fluid that loads flows out through via hole 30 and penstock 31.After technical process in process chamber 7 finishes
● come pressure in the uninstall process chamber 7 by regulating described valve 28, wherein fluid can be through the hole 9 and penstock 28 discharge.During uninstall process and and then,
● by regulating described valve 20, make the cylinder cavity 13 on top add carrying object, and the pressure in the while bottom cylinder cavity 12 discharge through penstock 25 and hole 5 through penstock 24 and hole 6.The working piston position and the process chamber that turn back to " container is opened " can be drained or load thus;
● after regulating described valve 28, it makes penstock 23 close, and reciprocation cycle arrives initial position again.
As mentioned above, the favourable function of cleaning chamber device is, when process chamber 7 and bottom cylinder cavity 12 add carrying object simultaneously,, make in the basic part of container and the thrust on the sealing surface between the closure member by throttling or postpone in time via the input of pipeline 23 to the pressure vessel 8 always greater than the pressure in the container.
Be similar to above-mentioned optimization, wherein favourable as can be seen formation, when the cylinder cavity 12 of pressure vessel 8 and bottom unloads simultaneously, discharge by throttling or postpone in time from the fluid of bottom cylinder cavity 12, make in the basic part of pressure vessel 8 and the thrust on the sealing surface between the closure member always greater than the pressure in the process chamber 7.
List of numerals
1 working piston, 17 seals
4 guide cylinders, 20 regulons/valve
5 holes, 21 input channels
6 holes, 22 discharge lines
8 pressure vessels 24 pass to/from the force pipe of top cylinder cavity
The road
9 holes 25 pass to/from the force pipe of bottom cylinder cavity
The road
The end face 26 valves/flow controller of 10 working pistons
The bottom surface 27 valves/flow controller of 11 working pistons
Cylinder cavity 29 penstocks on 13 tops
14 sliding surfaces, 30 holes
15 sliding surfaces, 31 penstocks
16 sliding surfaces
Claims (15)
1. high-tension apparatus that is used at clean room's inner sealing one closed container (8), this high-tension apparatus comprises that at least one Work container and working piston do and have a sealing surface between these two parts, and, this high-tension apparatus is in order to implement a kind of technical process and can be loaded a kind of at least process fluid and being driven by a rotational symmetric reciprocating piston device, this reciprocating piston device comprises at least one a rotational symmetric working piston (1) that moves and a guide cylinder (4), and working piston (1) on the pistons end that is arranged in guide cylinder (4), have at least one on the outer surface radial loop around enhancing portion (3), make the inner chamber between guide cylinder (4) and working piston (1) be divided into the cylinder cavity (12) of at least one bottom and the cylinder cavity (13) on a top, and each hole (5 at least in guide cylinder (4), 6) lead to these cylinder cavitys (12,13) each the cylinder cavity in, and these holes (5,6) directly or via pipeline (24,25) with at least one to guide cylinder (4) cylinder cavity (12,13) input is connected with the regulon (20) that discharge is controlled, and it is characterized in that:
-the fluid that is used for driving working piston (1) is identical with the main component of the fluid that uses at pressure vessel (8), and fluid or postcritical gas or volatile medium;
-wherein, the end face of working piston is connected rigidly with pressure vessel or with the closure member of container at least in part, and this closure member moves along rotation equally basically with respect to working piston, and pressure vessel is arranged on the opposite of working piston end face, and the bottom surface of working piston is greater than the seal face between the working piston of Work container and Work container, and
At least one sliding surface in the-sliding surface (14,15,16) has one and is higher than 60% supporting ratio, surface and these sliding surfaces that these sliding surfaces are defined as in the surface that contacts and slide between Work container inwall and working piston outer wall exist at least once, and, these sliding surfaces are positioned at cylinder surfaces and piston face on cylinder inner surface and piston face to be in contact with one another ground opposed and be parallel in those zones that rotation moves mutually, and wherein said supporting is than the ratio for projection in the surface texture and negative area.
2. according to the described equipment of claim 1, it is characterized in that, at least one sliding surface in the described sliding surface (14,15,16) hardens, and these sliding surfaces are positioned at cylinder surfaces and piston face on cylinder inner surface and piston face to be in contact with one another ground opposed and be parallel in those zones that rotation reciprocally moves.
3. according to the described equipment of claim 1, it is characterized in that ducted at least one pipeline that is connected with described hole is provided with a regulon in order to regulate, described pipeline is connected with pressure vessel, so that cylinder cavity and pressure vessel are loaded.
4. according to the described equipment of claim 3, it is characterized in that regulon comprises at least one valve.
5. according to the described equipment of claim 3, it is characterized in that regulon comprises fluid flow controller at least one static state or dynamic.
6. according to the described equipment of one of claim 3 to 5, it is characterized in that, when pressure vessel and cylinder cavity add carrying object simultaneously, to the input of container by throttling and/or postpone in time.
7. according to the described equipment of one of claim 3 to 5, it is characterized in that when in pressure vessel and the pressure in the cylinder cavity of bottom when unloading simultaneously, the fluid from the cylinder cavity of below, working cylinder bottom surface is discharged by throttling and/or postponed in time.
8. according to the described equipment of one of claim 1 to 5, it is characterized in that described fluid is postcritical fluid, comprise the mixture of carbon dioxide, compressed air, nitrogen, a kind of inert gas or these supercritical fluids.
9. according to the described equipment of one of claim 1 to 5, it is characterized in that described volatile medium is selected from the group that is made of ethanol, methyl alcohol, isopropyl alcohol or these mixtures of liquids, or use a kind of basically by CO
2, oxygen, nitrogen, a kind of inert gas or these gases the gas that constitutes of mixture.
10. according to the described equipment of one of claim 1 to 5, it is characterized in that, on the end face of working piston, reach the operating pressure that is higher than 160bar by rule.
11. one kind is used to use the method according to the described equipment of one of claim 1 to 10, it is characterized in that,
■ is by control valve, make the cavity of the below, bottom surface that is positioned at working piston and described container through penstock and hole with fluid-filled, then
The ■ working piston is opened at this initial position container from initial position " container is opened ", moves to the position of " container closure ", and close at this position container, and seal this container, and
■ handles in regulon after technical process finishes like this, makes in the cavity below the working piston bottom surface and the unloading of the fluid in the process chamber, and
■ then by continuing control valve, make the upper cavity in guide cylinder add carrying object through penstock and hole, thereby working piston moves on to initial position " container is opened " again.
12. in accordance with the method for claim 11, it is characterized in that, in container, reach the pressure that is higher than 160bar by rule.
13. the application according to described method of one of claim 1 to 12 or equipment is characterized in that, this equipment or method are used in combination with semi-conductor industry and/or the manufacturing application of wafer, production or technology.
14. the application according to described method of one of claim 1 to 12 or equipment is characterized in that, this equipment or method are used in combination with application, production or the technology of optics industry.
15. the application according to described method of one of claim 1 to 12 or equipment is characterized in that, this equipment or method are used in combination with application, production or the technology of pharmacy or medicine-pharmaceuticals industry.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10255231A DE10255231B4 (en) | 2002-11-26 | 2002-11-26 | High pressure device for closing a pressure vessel in the clean room |
| DE10255231.2 | 2002-11-26 | ||
| DE0255231.2 | 2002-11-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1717775A CN1717775A (en) | 2006-01-04 |
| CN100401462C true CN100401462C (en) | 2008-07-09 |
Family
ID=32308733
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003801041564A Expired - Fee Related CN100401462C (en) | 2002-11-26 | 2003-11-13 | High-pressure device for closing a container in a clean room |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US20070037399A1 (en) |
| EP (1) | EP1565656B1 (en) |
| JP (1) | JP2006508307A (en) |
| KR (1) | KR20050074639A (en) |
| CN (1) | CN100401462C (en) |
| AT (1) | ATE340410T1 (en) |
| AU (1) | AU2003298050A1 (en) |
| DE (2) | DE10255231B4 (en) |
| ES (1) | ES2268478T3 (en) |
| HK (1) | HK1086384A1 (en) |
| MY (1) | MY136175A (en) |
| TW (1) | TWI295344B (en) |
| WO (1) | WO2004048783A2 (en) |
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|---|---|---|---|---|
| DE102004032659B4 (en) * | 2004-07-01 | 2008-10-30 | Atotech Deutschland Gmbh | Apparatus and method for the chemical or electrolytic treatment of material to be treated and the use of the device |
| KR100721757B1 (en) * | 2006-06-08 | 2007-05-25 | 두산디앤디 주식회사 | Cleaning material pressurization device for wafer surface polishing equipment |
| CN101912750B (en) * | 2010-08-18 | 2012-09-05 | 郑州人造金刚石及制品工程技术研究中心有限公司 | Rotary propelling device |
| KR102358561B1 (en) * | 2017-06-08 | 2022-02-04 | 삼성전자주식회사 | Substrate processing apparatus and apparatus for manufacturing integrated circuit device |
| CN116498755B (en) * | 2023-06-27 | 2023-08-29 | 中北大学 | Supercritical carbon dioxide differential pressure control type quick switch valve |
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- 2003-11-13 ES ES03795731T patent/ES2268478T3/en not_active Expired - Lifetime
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- 2003-11-13 WO PCT/DE2003/003756 patent/WO2004048783A2/en active IP Right Grant
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- 2003-11-13 AU AU2003298050A patent/AU2003298050A1/en not_active Abandoned
- 2003-11-13 AT AT03795731T patent/ATE340410T1/en not_active IP Right Cessation
- 2003-11-13 EP EP03795731A patent/EP1565656B1/en not_active Expired - Lifetime
- 2003-11-13 KR KR1020057009298A patent/KR20050074639A/en not_active Withdrawn
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- 2003-11-25 TW TW092132981A patent/TWI295344B/en active
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Also Published As
| Publication number | Publication date |
|---|---|
| DE10255231B4 (en) | 2006-02-02 |
| EP1565656A2 (en) | 2005-08-24 |
| EP1565656B1 (en) | 2006-09-20 |
| WO2004048783A2 (en) | 2004-06-10 |
| DE10255231A1 (en) | 2004-06-09 |
| AU2003298050A1 (en) | 2004-06-18 |
| ATE340410T1 (en) | 2006-10-15 |
| KR20050074639A (en) | 2005-07-18 |
| TWI295344B (en) | 2008-04-01 |
| DE50305138D1 (en) | 2006-11-02 |
| ES2268478T3 (en) | 2007-03-16 |
| US20070037399A1 (en) | 2007-02-15 |
| JP2006508307A (en) | 2006-03-09 |
| MY136175A (en) | 2008-08-29 |
| TW200419078A (en) | 2004-10-01 |
| CN1717775A (en) | 2006-01-04 |
| AU2003298050A8 (en) | 2004-06-18 |
| WO2004048783A3 (en) | 2004-08-05 |
| WO2004048783A8 (en) | 2005-09-29 |
| HK1086384A1 (en) | 2006-09-15 |
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