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CN100369243C - Semiconductor package with heat dissipation structure - Google Patents

Semiconductor package with heat dissipation structure Download PDF

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Publication number
CN100369243C
CN100369243C CNB031558178A CN03155817A CN100369243C CN 100369243 C CN100369243 C CN 100369243C CN B031558178 A CNB031558178 A CN B031558178A CN 03155817 A CN03155817 A CN 03155817A CN 100369243 C CN100369243 C CN 100369243C
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fin
semiconductor package
package part
radiator structure
heat sink
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CN1585115A (en
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黄建屏
普翰屏
陈锦德
林长甫
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Siliconware Precision Industries Co Ltd
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Siliconware Precision Industries Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19105Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

The semiconductor package with a heat dissipation structure of the present invention includes: a substrate having a first surface and an opposite second surface; at least one chip, which is arranged on the substrate and electrically connected with the substrate; a plurality of solder balls, which are arranged on the second surface of the substrate; the heat dissipation structure comprises a first heat dissipation sheet with at least one first positioning part and at least one second heat dissipation sheet with at least one second positioning part and one hollow part; the second radiating fin is connected with the surface where the substrate and the chip are connected, the first radiating fin is connected with the second positioning part of the second radiating fin through the first positioning part, and the chip is coated in a space formed by surrounding the hollow parts of the first radiating fin and the second radiating fin and the substrate, so that the semiconductor packaging piece which is low in cost, thin and good in radiating is formed through a radiating structure formed by stacking the radiating fins.

Description

具有散热结构的半导体封装件 Semiconductor package with heat dissipation structure

技术领域technical field

本发明是关于一种具有散热结构的半导体封装件,特别是关于一种可降低成本与封装件高度的具有散热结构的半导体封装件。The invention relates to a semiconductor package with a heat dissipation structure, in particular to a semiconductor package with a heat dissipation structure which can reduce the cost and the height of the package.

背景技术Background technique

倒装芯片球栅阵列(Flip-Chip Ball Grid Array,FCBGA)半导体封装件是一种同时具有倒装芯片与球栅阵列的封装结构,图17就是现有具有散热片的倒装芯片封装件剖视图,如图所示,该封装件是使至少一芯片的作用表面(Active Surface)可通过多个焊点(Solder Bumps)电性连接至基板(Substrate)的一表面上,并在该基板的另一表面上植设多个作为输入/输出(I/O)端的焊球(Solder Ball);这种封装结构可使体积大幅缩减,同时也减去现有焊线(Wire)的设计,可降低阻抗、提升电性品质,避免信号在传输过程中的衰减,因此已成为芯片与电子组件的主流封装技术。A flip-chip ball grid array (Flip-Chip Ball Grid Array, FCBGA) semiconductor package is a packaging structure that has both a flip chip and a ball grid array. Figure 17 is a cross-sectional view of an existing flip-chip package with a heat sink. , as shown in the figure, the package is such that the active surface (Active Surface) of at least one chip can be electrically connected to one surface of the substrate (Substrate) through a plurality of solder joints (Solder Bumps), and on the other surface of the substrate A plurality of solder balls (Solder Ball) used as input/output (I/O) terminals are planted on one surface; this packaging structure can greatly reduce the volume, and at the same time, the design of the existing wire (Wire) can be subtracted, which can reduce the Impedance, improve electrical quality, and avoid signal attenuation during transmission, so it has become the mainstream packaging technology for chips and electronic components.

由于该倒装芯片球栅阵列封装的优越特性,使其多用于高集成度(Integration)的多芯片封装件中,以满足这种电子组件的体积与运算需求,但是这类电子组件由于其高频率运算特性,使其在运行过程产生的热量高于一般的封装件,因此,其散热效果的好坏就成为影响这类封装件品质的关键;对现有的倒装芯片球栅阵列封装件而言,它是直接将散热片(Heat Sink)粘覆在芯片的非作用表面(Non-active Surface)上,不需通过导热性较差的封装胶体(Encapsulant)传递热量,从而形成芯片-胶粘剂-散热片-外界的直接散热路径,与其它散热方式相比,它具有较好的散热功效。Due to the superior characteristics of the flip-chip ball grid array package, it is mostly used in highly integrated multi-chip packages to meet the volume and computing requirements of this electronic component, but this type of electronic component is due to its high The frequency calculation characteristics make it generate more heat than ordinary packages during operation. Therefore, the quality of its heat dissipation effect becomes the key to the quality of this type of package; for the existing flip-chip ball grid array package In other words, it directly sticks the heat sink (Heat Sink) on the non-active surface (Non-active Surface) of the chip, without transferring heat through the poor thermal conductivity encapsulant (Encapsulant), thus forming a chip-adhesive - Heat sink - the direct heat dissipation path to the outside world, which has better heat dissipation effect compared with other heat dissipation methods.

对于这类封装结构的散热片,现有技术如图18所示,直接用粘胶材料61将散热片60的支撑部60b粘接在基板62上,并将散热片60的平坦部60a用导热胶63粘接在芯片64的非作用表面64a上,通过外露的平坦部60a散逸芯片64的热量,例如美国专利第5,311,402号、第5,909,474号、第5,909,057号或第5,637,920号专利等现有技术,都揭示了这种近似结构,并根据其定位需求而逐渐发展出其它定位散热片的方式,例如以螺栓或其它定位件将散热片的支撑部锁固在基板上,从而强化散热片的附着力等。For heat sinks with this type of packaging structure, as shown in Figure 18 in the prior art, the support portion 60b of the heat sink 60 is directly bonded to the substrate 62 with an adhesive material 61, and the flat portion 60a of the heat sink 60 is used for heat conduction. The glue 63 is bonded on the non-active surface 64a of the chip 64, and dissipates the heat of the chip 64 through the exposed flat portion 60a, such as the prior art such as U.S. Patent No. 5,311,402, No. 5,909,474, No. 5,909,057 or No. 5,637,920 patent, Both have disclosed this approximate structure, and gradually developed other ways of positioning the heat sink according to its positioning requirements, such as locking the supporting part of the heat sink on the substrate with bolts or other positioning elements, so as to strengthen the adhesion of the heat sink wait.

然而,不论相关技术如何发展,也不论其如何改变散热片的定位方式或如何提升其散热效率,该散热片的平坦部与其周围支撑部的结构设计却始终未改变,这是由于在该倒装芯片封装件中,散热片是以罩盖形式覆盖在基板上,并通过散热片的平坦部与其周围支撑部围置出的容设空间将芯片包覆其中,因此,在这种结构限制下,该散热片的剖面形状必须设计成如图18所示的凹陷形状,并随着芯片数量与集成度的提高,适度增加容设空间的体积与封装件的高度。However, no matter how the related technology develops, and no matter how it changes the positioning method of the heat sink or how to improve its heat dissipation efficiency, the structural design of the flat part of the heat sink and its surrounding support parts has not changed all the time. In the chip package, the heat sink is covered on the substrate in the form of a cover, and the chip is covered by the accommodation space surrounded by the flat part of the heat sink and its surrounding support parts. Therefore, under the limitation of this structure, The cross-sectional shape of the heat sink must be designed as a concave shape as shown in FIG. 18 , and with the increase of the number of chips and the degree of integration, the volume of the accommodation space and the height of the package should be appropriately increased.

因此,该凹陷的容设空间设计已逐渐成为这类封装件改良上的限制,并成为现今封装件向高散热、低成本与小体积化方向发展的-大阻碍,也是此类技术在未来发展上有难以跨越的障碍;其原因是这种散热片都是以锻造(Forging)的方式制成,此锻压出的散热片上的容设空间而形成支撑部,例如图18A、图18B所示的方形散热片60,先将一板状铜或铝材料置入高温模具内,在其锻造温度范围内施加冲击力或加压,进而锻压出该方形凹陷区域65,并可在接置到基板62时将芯片64包覆在该凹陷区域65内,此制法受限于锻造机与锻锤(ForgingHammer)的操作与设备成本,形成产量上的一大负荷,也使制造成本随着散热片尺寸的变化而提高。Therefore, the accommodating space design of the recess has gradually become a limitation on the improvement of this type of package, and has become a major obstacle to the development of today's package in the direction of high heat dissipation, low cost and small volume, and it is also the future development of this type of technology. There are obstacles that are difficult to overcome; the reason is that this kind of heat sink is made by forging (Forging), and the accommodation space on the forged heat sink forms a supporting part, such as shown in Figure 18A and Figure 18B For the square heat sink 60, a plate-shaped copper or aluminum material is first placed into a high-temperature mold, and impact force or pressure is applied within the forging temperature range, and then the square concave area 65 is forged out, and can be connected to the substrate 62 When covering the chip 64 in the recessed area 65, this manufacturing method is limited by the operation and equipment cost of the forging machine and the forging hammer (Forging Hammer), which forms a large load on the output, and also makes the manufacturing cost increase with the size of the heat sink. improved by changes.

除此之外,由于锻锤的成形精度有限,使散热片的厚度比例(AspectRatio,t/T),如图18A、图18B所示具有一定的上限,无法使散热片60的总厚度T降低到接近容设空间65的高度t,目前的锻造制法仅能使厚度比例t/T最大约为0.5左右,也就是该散热片60的总厚度T将受要开设的容设空间65的高度t影响,若容设空间65所需的高度t提高至1mm,则制成散热片60的板状材料至少也需有2mm厚,才可进行锻造法的加工;因此,当由于基板62上接置的芯片64厚度或其堆栈的数量增加,使散热片60的容设空间65的高度t增加时,该散热片60的厚度T显然也需等倍放大,使整体的封装件尺寸难以缩小,不符合轻薄短小的发展趋势,且随着芯片64的高度增加而逐渐增厚的散热片60更不利于芯片64散热,严重影响封装件的散热效能。In addition, due to the limited forming accuracy of the forging hammer, the thickness ratio (AspectRatio, t/T) of the heat sink has a certain upper limit as shown in Figure 18A and Figure 18B, and the total thickness T of the heat sink 60 cannot be reduced. To the height t close to the accommodation space 65, the current forging method can only make the maximum thickness ratio t/T about 0.5, that is, the total thickness T of the heat sink 60 will be affected by the height of the accommodation space 65 to be opened. t influence, if the required height t of accommodating the space 65 is increased to 1mm, then the plate-shaped material made of the heat sink 60 must have a thickness of 2mm at least before the forging process can be carried out; therefore, when the substrate 62 is connected When the thickness of the installed chip 64 or the number of stacks increases to increase the height t of the accommodating space 65 of the heat sink 60, the thickness T of the heat sink 60 obviously needs to be enlarged by an equal multiple, making it difficult to reduce the size of the overall package. The heat sink 60 does not conform to the development trend of light, thin and short, and gradually thickens with the height of the chip 64, which is not conducive to the heat dissipation of the chip 64, and seriously affects the heat dissipation performance of the package.

如图19所示的封装件剖视图,当该封装件采用双芯片的堆栈结构时,与单芯片的封装件比较,该封装件的整体厚度除了增加增设的芯片66的厚度外,散热片60也因板材受限于锻造法而同时增加厚度,导致封装件的整体厚度大幅上升,既增加散热片的成本,也使散热效率下降,同时,也难符合电子工业的小尺寸发展趋势。As shown in the cross-sectional view of the package in Figure 19, when the package adopts a double-chip stack structure, compared with the single-chip package, the overall thickness of the package is not only increased by the thickness of the added chip 66, but also the heat sink 60 is also Because the thickness of the plate is limited by the forging method, the overall thickness of the package increases significantly, which not only increases the cost of the heat sink, but also reduces the heat dissipation efficiency. At the same time, it is difficult to meet the small size development trend of the electronics industry.

再有,以锻造法制造散热片,也受限于锻锤的种类与尺于,使散热片的尺寸与形状变化缺乏弹性,难以根据需要改变其造型和提高散热面积,如图20所示的封装件剖视图,是在散热片的平坦部60a上增设鳍片67(Fin),以提升散热片60与外界的接触面积,此设计即是因散热片60的设计限制,使鳍片67仅能形成在平坦部60a的正上方,而无法有其它方位的设计,进而也导致整体封装件厚度的大幅增加;另外,该封装件也可能如图21所示,在基板62上增设一被动组件68(Passive Component)以提高该封装件的电性效能,此时,该散热片60上开设的容设空间65体积需略为加大以容设被动组件68,然而,由于受锻造法的锻锤尺寸的限制,该散热片60将无法根据基板62上的布局变化而任意改变其尺寸与形状,可能使其增加不必要的区域,并需重新进行新尺寸的批量制造,形成线路布局与设计上的牵制。In addition, the forging method is also limited by the type and size of the forging hammer, which makes the size and shape of the heat sink inflexible, making it difficult to change its shape and increase the heat dissipation area as required, as shown in Figure 20 The cross-sectional view of the package is to add fins 67 (Fin) on the flat part 60a of the heat sink to increase the contact area between the heat sink 60 and the outside world. It is formed directly above the flat part 60a, and cannot be designed in other directions, which in turn leads to a substantial increase in the thickness of the overall package; in addition, the package may also be shown in FIG. 21 by adding a passive component 68 on the substrate 62 (Passive Component) to improve the electrical performance of the package. At this time, the volume of the accommodating space 65 provided on the heat sink 60 needs to be slightly increased to accommodate the passive component 68. However, due to the forging hammer size of the forging method Due to the limitation of the heat sink 60, the size and shape of the heat sink 60 will not be changed arbitrarily according to the layout changes on the substrate 62, which may increase unnecessary areas and require batch manufacturing of a new size, resulting in gaps in circuit layout and design. contain.

同时,这种现有制法是在高温下利用锻锤的瞬间冲压力而锻压出散热片的容设空间,因此,当制程完成后,该散热片的容设空间边缘会因应力集中而有残留应力(Residual Stress)的产生,使该铜或铝材料的晶格组成产生破坏,所以,当接置有该散热片的封装件在后续可靠度测试或长期使用后,将可能如图22所示,在该散热片的平坦部60a与支撑部60b的交界处出现残留应力导致的裂缝69,进而发生裂缝延伸而破坏该散热片的结构。At the same time, this existing manufacturing method uses the instantaneous stamping force of the forging hammer to forge the accommodation space of the heat sink at high temperature. The generation of residual stress (Residual Stress) will cause damage to the lattice composition of the copper or aluminum material. Therefore, after the subsequent reliability test or long-term use of the package connected to the heat sink, it may be as shown in Figure 22 It is shown that cracks 69 caused by residual stress appear at the junction of the flat portion 60a and the supporting portion 60b of the heat sink, and then the cracks extend to destroy the structure of the heat sink.

此外,现有散热片设计与其制法的缺点还不仅是这些,当散热片接置在基板上时,是通过环绕在该平坦部周围的支撑部而粘着在该基板上,而平坦部与支撑部又是一体成型的材料,因此,当封装件进行后续高温制程时,由于散热片与芯片的热膨胀系数(Coefficient ofThermal Expansion,CTE)相距很大,散热片的平坦部的热变形量将略大于芯片,此时由于平坦部的周围受到支撑部的束缚,将使其热应变难以释放而造成如图23所示的变形,使平坦部60a与芯片64或导热胶63间产生分层70而降低散热效能,甚至导致散热片60的支撑部60b与基板62间的分层(图未标),使散热片60在受震时脱落。In addition, the disadvantages of the existing heat sink design and its manufacturing method are not limited to these. When the heat sink is placed on the substrate, it is adhered to the substrate through the support portion surrounding the flat portion, and the flat portion and the support The part is an integrally formed material. Therefore, when the package undergoes a subsequent high-temperature process, the thermal deformation of the flat part of the heat sink will be slightly larger than At this time, because the periphery of the flat part is bound by the support part, it will be difficult to release the thermal strain and cause the deformation as shown in Figure 23, so that the flat part 60a and the chip 64 or the thermally conductive glue 63 will have a delamination 70 and reduce the temperature. The heat dissipation performance even leads to delamination (not shown) between the supporting portion 60 b of the heat sink 60 and the substrate 62 , so that the heat sink 60 falls off when subjected to shock.

由此可知,对倒装芯片封装件的最初散热需求而言,该散热片设计确实为一合适的解决方向,然而,随着电子工业逐步朝向高集成度、高散热、低成本与小体积等趋势发展,这种散热片因其结构与制法的限制,已成为进一步发展的主要障碍,同时,限于现有锻造技术的瓶颈,若只针对这种散热片进行结构改良,也难以完全克服现有问题,这就形成了产业升级上的困境。It can be seen that for the initial heat dissipation requirements of flip-chip packages, the heat sink design is indeed a suitable solution direction. However, as the electronics industry gradually moves towards high integration, high heat dissipation, low cost and small size, etc. With the development of the trend, this kind of heat sink has become the main obstacle to further development due to the limitation of its structure and manufacturing method. At the same time, it is limited to the bottleneck of the existing forging technology. If there is a problem, this creates a dilemma in industrial upgrading.

综上所述,如何开发出一种具有散热结构的半导体封装件,使新式散热结构无须以锻造方式制造,同时也不具有厚度比例的限制,同时还可提高散热效率、增加尺寸变化的弹性,且不会在成型过程中产生应力集中,是相关研发领域需迫切面对的课题。To sum up, how to develop a semiconductor package with a heat dissipation structure, so that the new heat dissipation structure does not need to be manufactured by forging, and there is no restriction on the thickness ratio, and at the same time, it can improve the heat dissipation efficiency and increase the flexibility of dimensional changes. And it will not cause stress concentration during the molding process, which is an urgent issue in the related research and development fields.

发明内容Contents of the invention

为克服上述现有技术的缺点,本发明的一目的在于提供一种无须用锻造方法制造的散热片、且可降低成本的具有散热结构的半导体封装件。In order to overcome the above disadvantages of the prior art, an object of the present invention is to provide a semiconductor package with a heat dissipation structure that does not require a heat sink manufactured by a forging method and can reduce costs.

本发明的还一目的在于提供一种可降低封装件高度的具有散热结构的半导体封装件。Another object of the present invention is to provide a semiconductor package with a heat dissipation structure that can reduce the height of the package.

本发明的另一目的在于提供一种不具有厚度比例限制的具有散热结构的半导体封装件。Another object of the present invention is to provide a semiconductor package with a heat dissipation structure that does not have a thickness ratio limitation.

本发明的再一目的在于提供一种可增大散热面积以提高散热效率的具有散热结构的半导体封装件。Another object of the present invention is to provide a semiconductor package with a heat dissipation structure that can increase the heat dissipation area to improve heat dissipation efficiency.

本发明的又一目的在于提供一种可避免散热片应力集中的具有散热结构的半导体封装件。Another object of the present invention is to provide a semiconductor package with a heat dissipation structure that can avoid the stress concentration of the heat sink.

本发明的且另一目的在于提供一种可避免封装件变形或分层的具有散热结构的半导体封装件。Another object of the present invention is to provide a semiconductor package with a heat dissipation structure that can avoid deformation or delamination of the package.

本发明的且再一目的在于提供一种可提升散热片附着力的具有散热结构的半导体封装件。Another object of the present invention is to provide a semiconductor package with a heat dissipation structure that can improve the adhesion of the heat sink.

本发明的且又一目的在于提供一种可增加散热片尺寸形状的变化弹性的具有散热结构的半导体封装件。Yet another object of the present invention is to provide a semiconductor package with a heat dissipation structure that can increase the flexibility of changing the size and shape of the heat sink.

为达上述及其它目的,本发明提供的具有散热结构的半导体封装件包括:具有第一表面及与其相对的第二表面的基板;至少一接置在基板的第一表面上且电性连接至基板的芯片;一散热结构,包括第一散热片和第二散热片,该第一散热片具有第一定位部,而该第二散热片具有至少一个第二定位部及至少一个镂空部;其中,第二散热片接置在基板的第一表面上,第一散热片通过第一定位部接置在第二散热片的第二定位部上,并将芯片包覆在该第一散热片、第二散热片的镂空部与基板围置成的空间中;以及多个植接在基板的第二表面上的焊球。In order to achieve the above and other purposes, the semiconductor package with a heat dissipation structure provided by the present invention includes: a substrate having a first surface and a second surface opposite to it; at least one is placed on the first surface of the substrate and electrically connected to The chip of the substrate; a heat dissipation structure, including a first heat dissipation fin and a second heat dissipation fin, the first heat dissipation fin has a first positioning portion, and the second heat dissipation fin has at least one second positioning portion and at least one hollow portion; wherein , the second heat sink is placed on the first surface of the substrate, the first heat sink is placed on the second positioning portion of the second heat sink through the first positioning portion, and the chip is wrapped on the first heat sink, In the space surrounded by the hollow part of the second cooling fin and the substrate; and a plurality of solder balls planted on the second surface of the substrate.

上述的第一散热片与第二散热片均是平板状散热片,且第一散热片为一顶层散热片,第二散热片则包括一底层散热片与至少一夹层散热片,通过形成于表面上的定位部而相互堆栈定位在基板上;其中,散热片及定位部以低成本的冲压方法冲制(Stamp)而成,分别形成在每一散热片的周缘位置,第一定位部与第二定位部分别为可相互嵌合定位的凸缘与凹孔的组合。The above-mentioned first heat sink and second heat sink are flat heat sinks, and the first heat sink is a top heat sink, and the second heat sink includes a bottom heat sink and at least one interlayer heat sink, formed on the surface The positioning parts on the top are stacked and positioned on the substrate; wherein, the heat sink and the positioning part are stamped by a low-cost stamping method (Stamp), and are respectively formed at the peripheral position of each heat sink, the first positioning part and the second positioning part The two positioning parts are respectively a combination of flanges and concave holes that can be fitted and positioned with each other.

此外,本发明的散热结构可根据封装件的需求而有各种实施方式,例如,该第一散热片与第二散热片的内缘或外缘可在堆栈后相互对齐,也可在堆栈后令其内缘或外缘相互错位排列,同时,当具有多个夹层散热片时,则每一个夹层散热片的内缘或外缘也可用相互对齐或相互错位的排列方式堆栈在底层散热片上。In addition, the heat dissipation structure of the present invention can be implemented in various ways according to the requirements of the package. For example, the inner or outer edges of the first heat dissipation fin and the second heat dissipation fin can be aligned with each other after stacking, or can be aligned after stacking. The inner or outer edges of the interlayer heat sinks are misaligned. At the same time, when there are multiple interlayer heat sinks, the inner or outer edges of each interlayer heat sink can also be stacked on the bottom heat sink in a mutually aligned or mutually misplaced arrangement.

再有,第一散热片的面积可视需要加大,以提高封装件的散热效能,而第一散热片上可增设一散热风扇,或堆栈至少一增层散热片,并令该增层散热片上对应芯片的位置形成至少一镂空部,以加速芯片散热。In addition, the area of the first heat sink can be enlarged as needed to improve the heat dissipation performance of the package, and a heat dissipation fan can be added on the first heat sink, or at least one build-up heat sink can be stacked, and the build-up heat sink can At least one hollow part is formed corresponding to the position of the chip to accelerate the heat dissipation of the chip.

第二散热片与基板接触的表面上也可用冲压制法开设多个开槽,供敷设在基板上的粘胶材料填充,提升第二散热片的附着力,该开槽的内壁表面可设计成阶梯表面或倾斜表面,以增加粘胶材料与开槽的粘着面积,避免散热片受震后脱落。A plurality of slots can also be opened by stamping method on the surface of the second heat sink in contact with the substrate, which can be filled with the adhesive material laid on the substrate to improve the adhesion of the second heat sink. The inner wall surface of the slot can be designed as Stepped surface or inclined surface to increase the adhesion area between the adhesive material and the slot, so as to prevent the heat sink from falling off after being shaken.

综上所述,由于本发明的散热结构中的各散热片都是堆栈而成,且均为平板状设计,所以其内部并无残留应力的集中;同时,由于该堆栈式散热片的每一散热片均具有极小的厚度,且也可视需要改变堆栈层数,所以该散热结构不受厚度比例(Aspect Ratio)上的限制,还可大幅降低现有封装件的高度。因此,通过本发明的散热结构,可舍弃现有的散热片与其锻造制法,充分解决现有散热片的容设空间与锻造制法上的发展限制,还满足了封装技术对高集成度、高散热、低成本与小体积化等的需求。To sum up, since the cooling fins in the heat dissipation structure of the present invention are all stacked and designed in a flat plate shape, there is no concentration of residual stress inside; at the same time, since each of the stacked cooling fins The heat sinks have a very small thickness, and the number of stacked layers can also be changed according to the needs, so the heat dissipation structure is not limited by the thickness ratio (Aspect Ratio), and the height of the existing package can also be greatly reduced. Therefore, through the heat dissipation structure of the present invention, the existing heat sink and its forging method can be discarded, the development limitations of the existing heat sink space and the forging method are fully resolved, and the requirements of packaging technology for high integration, Demand for high heat dissipation, low cost and small size.

附图说明Description of drawings

图1是本发明的具有散热结构的半导体封装件的实施例1剖视图;1 is a cross-sectional view of Embodiment 1 of a semiconductor package with a heat dissipation structure of the present invention;

图2A至图2C是本发明的实施例1的顶层散热片、夹层散热片与底层散热片示意图;2A to 2C are schematic diagrams of the top heat sink, interlayer heat sink and bottom heat sink of Embodiment 1 of the present invention;

图3A至图3C是本发明的实施例1的第一定位部、第二定位部与第三定位部的成型制法示意图;3A to 3C are schematic diagrams of the forming method of the first positioning part, the second positioning part and the third positioning part according to Embodiment 1 of the present invention;

图4是本发明的具有散热结构的半导体封装件的实施例2剖视图;4 is a sectional view of Embodiment 2 of the semiconductor package with heat dissipation structure of the present invention;

图5是本发明的具有散热结构的半导体封装件的实施例3剖视图;5 is a cross-sectional view of Embodiment 3 of the semiconductor package with heat dissipation structure of the present invention;

图6是本发明的具有散热结构的半导体封装件的实施例4剖视图;6 is a cross-sectional view of Embodiment 4 of the semiconductor package with heat dissipation structure of the present invention;

图7是本发明的具有散热结构的半导体封装件的实施例5剖视图;7 is a cross-sectional view of Embodiment 5 of the semiconductor package with heat dissipation structure of the present invention;

图8A及图8B是本发明的具有散热结构的半导体封装件的实施例6剖视图;8A and 8B are cross-sectional views of Embodiment 6 of the semiconductor package with heat dissipation structure of the present invention;

图9是本发明的具有散热结构的半导体封装件的实施例7剖视图;9 is a cross-sectional view of Embodiment 7 of the semiconductor package with heat dissipation structure of the present invention;

图10是本发明的具有散热结构的半导体封装件的实施例8剖视图;10 is a cross-sectional view of Embodiment 8 of a semiconductor package with a heat dissipation structure of the present invention;

图11A是本发明的具有散热结构的半导体封装件的实施例9剖视图;11A is a cross-sectional view of Embodiment 9 of the semiconductor package with heat dissipation structure of the present invention;

图11B是图11A所示的夹层散热片的示意图;Fig. 11B is a schematic diagram of the interlayer heat sink shown in Fig. 11A;

图12A是本发明的具有散热结构的半导体封装件的实施例9剖视图;12A is a cross-sectional view of Embodiment 9 of the semiconductor package with heat dissipation structure of the present invention;

图12B是图12A所示夹层散热片的示意图;Fig. 12B is a schematic diagram of the interlayer heat sink shown in Fig. 12A;

图13是本发明的具有散热结构的半导体封装件的实施例10剖视图;13 is a cross-sectional view of Embodiment 10 of the semiconductor package with heat dissipation structure of the present invention;

图14A及图14B是本发明的具有散热结构的半导体封装件的实施例11剖视图;14A and 14B are cross-sectional views of Embodiment 11 of the semiconductor package with heat dissipation structure of the present invention;

图15是具有本发明另一散热片定位部的实施例的封装件剖视图;Fig. 15 is a cross-sectional view of a package having another embodiment of a heat sink positioning portion of the present invention;

图16A至图16C是本发明另一散热片定位部的形成位置示意图;16A to 16C are schematic diagrams of the formation positions of another heat sink positioning part of the present invention;

图17是现有具有散热片的倒装芯片封装件剖视图;17 is a sectional view of a conventional flip-chip package with a heat sink;

图18A是图18所示的方形散热片示意图;Fig. 18A is a schematic diagram of the square heat sink shown in Fig. 18;

图18B是图18A所示方形散热片剖视图;Fig. 18B is a cross-sectional view of the square heat sink shown in Fig. 18A;

图19是现有具有双芯片堆栈结构的倒装芯片封装件剖视图;Fig. 19 is a cross-sectional view of a conventional flip-chip package with a double-chip stack structure;

图20是现有具有散热鳍片的倒装芯片封装件剖视图;20 is a sectional view of a conventional flip-chip package with heat dissipation fins;

图21是现有接置有被动组件的倒装芯片封装件剖视图;Fig. 21 is a cross-sectional view of a conventional flip-chip package with passive components;

图22是现有倒装芯片封装件的散热片出现裂缝的示意图;以及FIG. 22 is a schematic diagram of a crack in the heat sink of a conventional flip-chip package; and

图23是现有倒装芯片封装件的散热片发生分层的示意图。FIG. 23 is a schematic diagram of the delamination of the heat sink of the conventional flip-chip package.

具体实施方式Detailed ways

实施例1Example 1

图1是本发明的具有散热结构的半导体封装件的较佳实施例剖视图,它是倒装芯片球栅阵列封装件(FCBGA),包括作为芯片承载件(ChipCarrier)的基板10,通过凸块11(Bump)电性连接至基板10且接置在基板10的第一表面10a上的芯片12,填充在凸块11周围的底部填料(Under fill)绝缘材料13,接置在基板10的第一表面10a上的底层散热片20,多个堆栈在底层散热片20上的夹层散热片25,堆栈在最顶层的夹层散热片25上的顶层散热片30,以及植接在基板10的第二表面10b且与多个凸块11电性连接的多个焊球14;其中,底层散热片20是利用敷设在基板第一表面10a上的粘胶材料16粘接在基板10上,而顶层散热片30则通过导热胶15与芯片12的非作用表面12a粘接,以散逸芯片12的热量,同时,多个夹层散热片25与底层散热片20,如图1所示,分别具有第一镂空部26与第二镂空部21,借其堆栈关系在基板10上定义出一空间,并将芯片12包覆在由顶层散热片30、第一镂空部26、第二镂空部21与基板10围置的容设空间中。Fig. 1 is the cross-sectional view of the preferred embodiment of the semiconductor package with heat dissipation structure of the present invention, it is a flip-chip ball grid array package (FCBGA), including a substrate 10 as a chip carrier (ChipCarrier), through a bump 11 (Bump) electrically connected to the substrate 10 and placed on the chip 12 on the first surface 10a of the substrate 10, filled with an underfill (Under fill) insulating material 13 around the bump 11, placed on the first surface of the substrate 10 The bottom heat sink 20 on the surface 10a, a plurality of interlayer heat sinks 25 stacked on the bottom heat sink 20, the top layer heat sink 30 stacked on the topmost interlayer heat sink 25, and the second surface of the substrate 10 10b and a plurality of solder balls 14 electrically connected to a plurality of bumps 11; wherein, the bottom heat sink 20 is bonded on the substrate 10 by using the adhesive material 16 laid on the first surface 10a of the substrate, and the top heat sink 30 is bonded to the non-active surface 12a of the chip 12 through the thermally conductive adhesive 15 to dissipate the heat of the chip 12. At the same time, a plurality of interlayer heat sinks 25 and the bottom heat sink 20, as shown in FIG. 26 and the second hollow part 21 define a space on the substrate 10 by means of their stacking relationship, and wrap the chip 12 in a space surrounded by the top heat sink 30 , the first hollow part 26 , the second hollow part 21 and the substrate 10 in the accommodation space.

顶层散热片30、夹层散热片25与底层散热片20分别如图2A、图2B、图2C所示为平板型散热片,选用镀有镍的铜或铝材料,以发挥其良好的导热效能,同时,该材料的热膨胀系数也与常用的基板材料(例如环氧树脂、聚亚酰胺、BT树脂或FR4树脂等)相近,所以也使底层散热片20与基板10间因温度变化而产生翘曲或分层的可能性降至最低;此外,每一散热片的厚度均在10密尔(mil)以下,以发挥本发明薄型化与高设计弹性的功效,夹层散热片25的堆栈数量则根据芯片12的厚度或配置层数而定,使顶层散热片30可平整地粘置在芯片12的非作用表面12a上。The top heat sink 30, the interlayer heat sink 25 and the bottom heat sink 20 are flat heat sinks as shown in Fig. 2A, Fig. 2B, and Fig. 2C respectively, and copper or aluminum materials coated with nickel are selected for use to exert their good thermal conductivity. At the same time, the coefficient of thermal expansion of this material is also similar to that of commonly used substrate materials (such as epoxy resin, polyimide, BT resin or FR4 resin, etc.), so it also causes warping between the bottom heat sink 20 and the substrate 10 due to temperature changes. Or the possibility of delamination is minimized; in addition, the thickness of each heat sink is all below 10 mils (mil), to bring into play the effect of thinning and high design flexibility of the present invention, the stacking quantity of interlayer heat sink 25 is then according to Depending on the thickness of the chip 12 or the number of layers, the top heat sink 30 can be evenly adhered to the non-active surface 12 a of the chip 12 .

由图2B、图2C可知,该夹层散热片25与底层散热片20的中央分别开设有一第一镂空部26与一第二镂空部21,第一、第二镂空部26、21的形状为方形,以便其相互堆栈后每一镂空部的边缘可相互对齐,而在基板10上围置出一个方形空间,将芯片12包覆在该空间内,同时,如图2B所示,该夹层散热片25有两种设计尺寸,当其相互堆栈时将此大小两种尺寸的夹置片相互间隔堆栈,以令其外缘在堆栈后呈错位排列而两两互不对齐,并如图1的剖视图一般,增加封装件周围各侧的散热面积。As can be seen from Fig. 2B and Fig. 2C, the center of the interlayer heat sink 25 and the bottom heat sink 20 are respectively provided with a first hollow part 26 and a second hollow part 21, and the shapes of the first and second hollow parts 26, 21 are square , so that the edges of each hollow portion can be aligned with each other after they are stacked together, and a square space is surrounded on the substrate 10, and the chip 12 is wrapped in the space. At the same time, as shown in FIG. 2B, the interlayer heat sink 25 has two design sizes. When they are stacked with each other, the sandwiching pieces of this size and two sizes are stacked at intervals so that their outer edges are misaligned after stacking and are not aligned with each other, as shown in the cross-sectional view of Figure 1. Typically, the heat dissipation area is increased on each side around the package.

此外,顶层散热片30、夹层散热片25与底层散热片20的四个角缘分别有第一定位部32、第二定位部27与第三定位部22,其中,该第一定位部32是一凸缘,而第二定位部27则包括相互对应的一凹孔与一凸缘,第三定位部22为一孔洞,且上述各凸缘、凹孔与孔洞的位置与尺寸相互对应,当各散热片堆栈时相互嵌合定位并粘着各散热片;因此,如图1的剖视图所示,该夹层散热片25即是利用第二定位部27的凸缘嵌合在底层散热片20的第三定位部22的孔洞中,而每一夹层散热片25也分别利用第二定位部27的凸缘与凹孔的相互嵌合关系来堆栈定位,最后,再通过顶层散热片30的第一定位部32的凸缘,嵌合在最顶层夹层散热片25的第二定位部27的凹孔中,即完成本发明的散热片的堆栈定位。In addition, the four corners of the top heat sink 30, the interlayer heat sink 25 and the bottom heat sink 20 respectively have a first positioning part 32, a second positioning part 27 and a third positioning part 22, wherein the first positioning part 32 is a flange, and the second positioning portion 27 includes a concave hole and a flange corresponding to each other, the third positioning portion 22 is a hole, and the positions and sizes of the above-mentioned flanges, concave holes and holes correspond to each other, when When each cooling fin is stacked, it is mutually fitted and positioned and adhered to each cooling fin; therefore, as shown in the cross-sectional view of FIG. In the holes of the three positioning parts 22, each interlayer heat sink 25 is also stacked and positioned by the mutual fitting relationship between the flange of the second positioning part 27 and the concave hole, and finally, through the first positioning of the top heat sink 30 The flange of the part 32 fits in the concave hole of the second positioning part 27 of the top interlayer heat sink 25, that is, the stack positioning of the heat sink of the present invention is completed.

图3A、图3B、图3C分别显示第一定位部32、第二定位部27与第三定位部22的成形方法,它是利用低成本的冲压(Stamp)制法,以预定尺寸的冲压头(Punch)冲制出所需的定位部,如图3C所示,通过水平冲压头40在平板状底层散热片20上冲压出贯穿散热片20的孔洞22a,孔洞22a的尺寸大小根据冲压头40的尺寸而定,通过贯穿散热片20的孔洞22a,也可令敷设在底层散热片20与基板10间的粘胶材料16受压而填入第三定位部22的孔洞22a中,从而强化底层散热片20的粘着性;同时,图3B是以水平冲压头40冲压夹层散热片25的上表面25a,使其上表面25a形成未贯穿散热片25的凹孔27a,受冲压的材料则受压挤而形成散热片下表面25b的凸缘27b,此时,凸缘27b的位置将对应凹孔27a的位置,其尺寸恰可嵌合在底层散热片20的孔洞22a中;另外,图3A则与图3B相同,借一水平冲压头40冲压顶层散热片30的上表面30a,也同样可在该顶层散热片30上形成一组相对应的凸缘32b与凹孔32a,并借凸缘32b嵌合在最顶层夹层散热片25的凹孔27a上;需注意的是,由于该顶层散热片30、夹层散热片25与底层散热片20需相互堆栈以定位在基板10上,故第一定位部32、第二定位部27与第三定位部22的冲制位置需一定的精度,以便堆栈与嵌合,使夹层散热片25与底层散热片20的第一镂空部26与第二镂空部21内缘能确实对齐而将芯片12包覆其中。3A, FIG. 3B, and FIG. 3C show the forming methods of the first positioning portion 32, the second positioning portion 27, and the third positioning portion 22 respectively. (Punch) punch out the required positioning part, as shown in Figure 3C, punch out the hole 22a that runs through the heat sink 20 on the flat bottom heat sink 20 by the horizontal punch head 40, the size of the hole 22a is according to the punch head 40 Depending on the size, by passing through the hole 22a of the heat sink 20, the adhesive material 16 laid between the bottom heat sink 20 and the substrate 10 can also be pressed and filled into the hole 22a of the third positioning part 22, thereby strengthening the bottom layer The adhesiveness of heat sink 20; Simultaneously, Fig. 3B is to stamp the upper surface 25a of interlayer heat sink 25 with horizontal stamping head 40, make its upper surface 25a form the concave hole 27a that does not pass through heat sink 25, the material that is subjected to stamping is then pressed Extruded to form the flange 27b of the lower surface 25b of the heat sink, at this time, the position of the flange 27b will correspond to the position of the concave hole 27a, and its size can just fit in the hole 22a of the bottom heat sink 20; in addition, Fig. 3A 3B, by stamping the upper surface 30a of the top heat sink 30 with a horizontal stamping head 40, a group of corresponding flanges 32b and concave holes 32a can be formed on the top heat sink 30, and the flange 32b Fitted on the concave hole 27a of the top interlayer heat sink 25; it should be noted that since the top heat sink 30, the interlayer heat sink 25 and the bottom heat sink 20 need to be stacked on each other to be positioned on the substrate 10, so the first positioning Part 32, the second positioning part 27 and the third positioning part 22 need a certain precision in punching position, so as to stack and fit, make the first hollow part 26 and the second hollow part of the interlayer heat sink 25 and the bottom heat sink 20 The inner edge of the chip 21 can be properly aligned to enclose the chip 12 therein.

通过上述的堆栈式散热片设计与其冲压制法,即可避免形成一体成型的现有散热片的凹陷容设空间,也无须采用锻造制法,可直接通过低成本的冲压制法,轻易制得具有高设计弹性的散热结构;同时,由于该堆栈式散热片的每一散热片20、25、30均具有极小的厚度,且也可视需要改变堆栈层数(改变夹层散热片25的配置数目即可),故该散热结构并不具有厚度比例(Aspect Ratio)上的限制,可如图1所示,令其整体散热结构的高度T接近芯片容设空间的厚度t,仅略高出一个顶层散热片30的厚度,大幅降低现有封装件的高度,可达到封装件的薄型化需求;此外,也可根据基板10上的芯片布局而任意改变各散热片的尺寸或面积,以发挥其高设计弹性的功效,或适度提高该封装件的散热效能;再者,本发明的散热结构中的各散热片20、25、30由于都是堆栈而成,且均为平板状设计而没有其它加工,所以其内部并无残留应力的集中,且在接置后也没有受束缚而无法自由变形的区域,故无论是经历后续高温制程或各种可靠性测试,都不会因环境温度变化而变形或分层,充分解决了现有技术上的所有缺点。Through the above-mentioned stacked heat sink design and its stamping method, it is possible to avoid the recessed accommodation space of the existing heat sink formed in one piece, and it is not necessary to use forging manufacturing method, and it can be directly produced by low-cost stamping method. There is a heat dissipation structure with high design flexibility; at the same time, since each heat sink 20, 25, 30 of the stacked heat sink has a very small thickness, and the number of stacked layers can also be changed as required (changing the configuration of the interlayer heat sink 25 number), so the heat dissipation structure does not have a limitation on the thickness ratio (Aspect Ratio). As shown in Figure 1, the height T of the overall heat dissipation structure is close to the thickness t of the chip accommodation space, only slightly higher than The thickness of a top-layer heat sink 30 greatly reduces the height of the existing package, which can meet the thinning requirements of the package; in addition, the size or area of each heat sink can be arbitrarily changed according to the chip layout on the substrate 10, so as to maximize The effect of its high design flexibility may moderately improve the heat dissipation performance of the package; moreover, the heat dissipation fins 20, 25, and 30 in the heat dissipation structure of the present invention are all stacked and formed in a flat design without Other processing, so there is no concentration of residual stress inside, and there is no bound area that cannot be freely deformed after placement, so whether it is subjected to subsequent high-temperature processes or various reliability tests, it will not change due to ambient temperature The deformation or delamination fully solves all the shortcomings of the prior art.

实施例2Example 2

本发明的散热片配置除上述实施例1外,也有其它可达到同等功效的设计,例如图4所示的本发明实施例2剖视图,与实施例1相同,设计具有大小两种尺寸的夹层散热片25,但是上述实施例1的多个夹层散热片25的第一镂空部26内缘相互对齐,令散热片外缘呈错位排列,增加封装件两侧的散热面积,本实施例的设计是使多个夹层散热片25的外缘25c相互对齐,令夹层散热片25的内缘25d(即第一镂空部26的边缘)相互错位排列,且本实施例中每一夹层散热片25的内缘25d虽呈错位排列,但其各内缘25d间仍可围置成包覆芯片12的容设空间,且其内缘25d也不会接触芯片12的两个侧表面。In addition to the above-mentioned embodiment 1, the heat sink configuration of the present invention also has other designs that can achieve the same effect. For example, the sectional view of embodiment 2 of the present invention shown in FIG. 25, but the inner edges of the first hollows 26 of the plurality of interlayer heat sinks 25 in the above-mentioned embodiment 1 are aligned with each other, so that the outer edges of the heat sinks are arranged in a misaligned manner, and the heat dissipation area on both sides of the package is increased. The design of this embodiment is The outer edges 25c of the plurality of interlayer heat sinks 25 are aligned with each other, and the inner edges 25d of the interlayer heat sinks 25 (that is, the edges of the first hollow portion 26) are mutually misaligned, and the inner edges of each interlayer heat sink 25 in this embodiment Although the edges 25d are arranged in a dislocation manner, each inner edge 25d can still enclose an accommodating space covering the chip 12 , and the inner edges 25d will not contact the two side surfaces of the chip 12 .

实施例3Example 3

本发明的实施例3即是结合上述实施例1与实施例2,如图5的剖视图所示,为各层散热片的内、外缘25d、25c均呈错位排列的半导体封装件,这种设计由于具有更大的散热面积与更多的散热路径,所以也具有更佳的散热效率。Embodiment 3 of the present invention is a combination of Embodiment 1 and Embodiment 2 above. As shown in the cross-sectional view of FIG. The design also has better heat dissipation efficiency due to a larger heat dissipation area and more heat dissipation paths.

实施例4Example 4

本发明实施例4是将上述各层散热片如图6所示的剖视图排列,令每一顶层散热片30、夹层散热片25与底层散热片20都具有相同的尺寸,并使其在堆栈后的内、外缘25d、25c完全切齐,而成为一周缘平整的半导体封装件,同样也可发挥本发明的功效。Embodiment 4 of the present invention arranges the heat sinks of the above layers as shown in Figure 6 in cross-sectional view, so that each top heat sink 30, interlayer heat sink 25 and bottom heat sink 20 all have the same size, and make them stacked The inner and outer edges 25d, 25c are completely aligned to form a semiconductor package with a flat periphery, which can also exert the effect of the present invention.

实施例5Example 5

图7所示是本发明的实施例5剖视图,其增加顶层散热片30的尺寸,使其面积远大于底层、夹层散热片20、25的面积,以加大散热表面,并通过导热胶15的传热而提高芯片12的散热效能,这种顶层散热片30的尺寸或形状并无设计上的限制,足以充分满足散热上的最大需求,不像现有技术那样,受限于制程而无法改变散热片表面的面积,也不需增设不利于薄性化封装趋势的现有散热鳍片,充分发挥本发明的高设计弹性功效。Figure 7 is a cross-sectional view of Embodiment 5 of the present invention, which increases the size of the top heat sink 30 to make its area much larger than that of the bottom layer and interlayer heat sinks 20, 25, so as to increase the heat dissipation surface and pass through the heat-conducting adhesive 15. Heat transfer improves the heat dissipation performance of the chip 12. There is no design limitation on the size or shape of the top heat sink 30, which is sufficient to fully meet the maximum demand for heat dissipation. Unlike the prior art, which is limited by the manufacturing process and cannot be changed The area of the surface of the heat sink does not need to be added to the existing heat dissipation fins, which is not conducive to the trend of thin packaging, so that the high design flexibility of the present invention can be fully utilized.

实施例6Example 6

本发明堆栈的散热片种类除上述的底层、夹层、顶层散热片20、25、30外,也可在顶层散热片30上额外堆栈多个增层散热片45,以进一步提高散热效能。实施例6如图8A所示,该增层散热片45为不具有镂空部的板状散热片,且其也以错位的方式排列,以增加散热面积;此外,多个增层散热片45也可如图8B的剖视图所示,分别在其中央开设一镂空部46,以使顶层散热片30上对应导热胶15(芯片12)的中央位置30c,露出增层散热片45的镂空部46外,以加速芯片12散热的速度。In addition to the bottom layer, interlayer, and top layer heat sinks 20, 25, and 30 of the stacked heat sinks of the present invention, a plurality of build-up heat sinks 45 can also be stacked on the top layer heat sink 30 to further improve heat dissipation performance. Embodiment 6 As shown in FIG. 8A , the layer-building fins 45 are plate-shaped fins without hollows, and they are also arranged in a dislocation manner to increase the heat dissipation area; in addition, multiple layer-building fins 45 are also As shown in the cross-sectional view of FIG. 8B , a hollow portion 46 is provided in the center thereof, so that the central position 30c of the top heat sink 30 corresponding to the thermal conductive adhesive 15 (chip 12 ) exposes the hollow portion 46 of the build-up heat sink 45 , to accelerate the speed of heat dissipation of the chip 12.

实施例7Example 7

当本发明的散热结构用于具有堆栈芯片的封装件时,其效果更优于现有技术。如图9所示的本发明实施例7的剖视图,其是具有双层堆栈芯片的封装件,此时由于该堆栈式散热结构没有厚度比例的限制,所以顶层散热片30的厚度不会因芯片堆栈数目增加而加厚,同时,夹层散热片25也可配合堆栈芯片的尺寸而改变其镂空部26的设计,如图所示改变容设空间的形状,从而缩短最顶层芯片120的热量传递路径。When the heat dissipation structure of the present invention is used in a package with stacked chips, its effect is better than that of the prior art. As shown in Figure 9, the cross-sectional view of Embodiment 7 of the present invention is a package with double-layer stacked chips. At this time, since the stacked heat dissipation structure has no thickness ratio restrictions, the thickness of the top heat sink 30 will not vary depending on the chip. The number of stacks increases and the thickness increases. At the same time, the interlayer heat sink 25 can also change the design of the hollow part 26 according to the size of the stacked chips, and change the shape of the accommodation space as shown in the figure, thereby shortening the heat transfer path of the top chip 120. .

实施例8Example 8

此外,当基板上除芯片外另增设其它被动组件时,也可利用本发明的散热结构的设计弹性,达到最低的材料成本与最佳的散热功效。图10所示是本发明实施例8,其改变夹层散热片25的镂空部26的尺寸,使散热结构的侧边面积不会因被动组件17而增加过多,同时也可充分缩短被动组件17的散热路径,充分解决现有散热片的问题。In addition, when other passive components are added on the substrate besides the chip, the design flexibility of the heat dissipation structure of the present invention can also be used to achieve the lowest material cost and the best heat dissipation effect. Figure 10 shows Embodiment 8 of the present invention, which changes the size of the hollow part 26 of the interlayer heat sink 25, so that the side area of the heat dissipation structure will not be increased too much due to the passive component 17, and the passive component 17 can also be sufficiently shortened. The heat dissipation path fully solves the problem of the existing heat sink.

实施例9Example 9

对于具有多芯片(Multi-Chip)设计的封装件,也可利用本发明的散热结构设计,令多个芯片都容设在镂空部围置成的容设空间中,例如图11A所示的本发明实施例9,即是通过图11B所示的夹层散热片25,利用其大面积的镂空部26设计包覆该两个芯片12,但是该镂空部26的设计并非仅限于一个,也可如图12A、图12B,分别在每一夹层散热片25与底层散热片20上开设两个镂空部26a、26b,以分别容设基板10上的两个芯片12,增加芯片12热量的传递路径选择,达到进一步提高散热速度的功效。For a package with a multi-chip design, the heat dissipation structure design of the present invention can also be used to allow multiple chips to be accommodated in the accommodation space surrounded by the hollow part, such as the present invention shown in Figure 11A Embodiment 9 of the invention uses the interlayer heat sink 25 shown in Figure 11B to cover the two chips 12 with its large-area hollow part 26, but the design of the hollow part 26 is not limited to one, and can also be used as 12A and 12B, two hollow parts 26a, 26b are respectively provided on each interlayer heat sink 25 and the bottom heat sink 20 to accommodate the two chips 12 on the substrate 10 respectively, increasing the heat transfer path selection of the chips 12 , to achieve the effect of further improving the heat dissipation speed.

实施例10Example 10

另外,本发明也可如图13所示的实施例10设计,延长底层散热片20、夹层散热片25与顶层散热片30的侧边长度,并在顶层散热片30的延长区域30d上增设一强迫式(Forced)散热风扇50,借该风扇50抽排芯片12产生的热量,并可利用多层夹层散热片25形成的多重路径加速散热。In addition, the present invention can also be designed in embodiment 10 as shown in FIG. The forced heat dissipation fan 50 is used to exhaust the heat generated by the chip 12 , and the multiple paths formed by the multi-layer interlayer heat sink 25 can be used to accelerate heat dissipation.

实施例11Example 11

本发明的散热结构不是用现有的锻造法制造,所以除上述各功效外,也可在底层散热片上开设其它定位机构,以解决现有散热片受震动后容易脱落的问题,实施例11就是在底层散热片20与基板10接触的表面上,利用冲压头冲制出一开槽51,使基板第一表面上10a的粘胶材料16受压而填入开槽51中,开槽51可如图14A的剖视图所示,形成阶梯状的内壁表面51a,以增加粘胶材料16与底层散热片20的粘着面积,提高散热片20的附着力,该开槽51也可如图14B的剖视图,形成锥状的倾斜内壁表面51b,也同样具有强化散热片20粘着的功效。The heat dissipation structure of the present invention is not manufactured by the existing forging method, so in addition to the above-mentioned functions, other positioning mechanisms can also be provided on the bottom heat sink to solve the problem that the existing heat sink is easy to fall off after being shaken. Embodiment 11 is On the surface where the bottom heat sink 20 is in contact with the substrate 10, a slot 51 is punched out with a stamping head, so that the adhesive material 16 on the first surface 10a of the substrate is pressed and filled into the slot 51, and the slot 51 can be As shown in the cross-sectional view of Figure 14A, a stepped inner wall surface 51a is formed to increase the adhesion area between the adhesive material 16 and the bottom heat sink 20, and improve the adhesion of the heat sink 20, the groove 51 can also be shown in the cross-sectional view of Figure 14B , the tapered inclined inner wall surface 51b also has the effect of strengthening the adhesion of the heat sink 20 .

上述各实施例均是通过各层平板状散热片的设计,利用其定位部相互堆栈,达到不同封装件的功效要求,但是相互堆栈的定位部仅以实施例1的说明为例,并非本发明的唯一实施方式,如图15所示的半导体封装件剖视图(以实施例1的结构为例),其定位部的冲压方向即与上述各实施例相反,但是同样可用于本发明的各实施例中,其中,形成于顶层散热片30角缘的第一定位部52为一孔洞52a,形成于夹层散热片25的第二定位部47包括相互对应的一凸缘47a与一凹孔47b,形成于底层散热片20的第三定位部42则为一凸缘42a,以便相互对应,可在各散热片堆栈时进行嵌合定位;除了这一定位部的等效实施例外,其它无须使用锻造制法而形成于散热片上的各式定位机构也都适用于本发明的散热结构中。Each of the above-mentioned embodiments is based on the design of each layer of flat heat sink, and uses its positioning parts to stack each other to meet the functional requirements of different packages. However, the stacked positioning parts are only described in Example 1 as an example, not the present invention. The only implementation mode of the semiconductor package shown in Figure 15 (taking the structure of Embodiment 1 as an example), the punching direction of the positioning part is opposite to that of the above-mentioned embodiments, but it can also be used in each embodiment of the present invention Among them, the first positioning portion 52 formed on the corner edge of the top heat sink 30 is a hole 52a, and the second positioning portion 47 formed on the interlayer heat sink 25 includes a flange 47a and a concave hole 47b corresponding to each other, forming The third positioning portion 42 of the bottom heat sink 20 is a flange 42a, so as to correspond to each other, and can be fitted and positioned when the heat sinks are stacked; except for the equivalent embodiment of this positioning portion, it is not necessary to use forging All kinds of positioning mechanisms formed on the heat dissipation fins are also applicable to the heat dissipation structure of the present invention.

此外,上述各实施例的定位部均形成于各散热片的角缘位置,这种位置设计除配合底层散热片20与夹层散热片25的镂空部26、21设计外,也可使散热片的定位力更为均匀稳固,但是该位置也非本发明的唯一设计,如图16A、图16B、图16C所示形成于各散热片20、25、30边缘上的定位部22、27、32,也可发挥近似的定位功效,同样可用于本发明中。In addition, the positioning parts of the above-mentioned embodiments are all formed at the corner positions of the heat sinks. This position design can not only cooperate with the design of the hollow parts 26, 21 of the bottom heat sink 20 and the interlayer heat sink 25, but also make the heat sink The positioning force is more uniform and stable, but this position is not the only design of the present invention, as shown in Figure 16A, Figure 16B, and Figure 16C, the positioning parts 22, 27, 32 formed on the edges of the heat sinks 20, 25, 30, Approximate positioning effects can also be brought into play, and can also be used in the present invention.

综上所述,本发明的具有散热结构的半导体封装件,确提供了一种新式散热结构,无须用锻造法制造,可降低成本,且也不受厚度比例的限制,充分符合封装技术的薄型化要求;同时,该散热结构也可根据需要改变散热片形状或增大其散热面积,还可避免变形与分层,并充分兼顾其粘着稳固性,已完全克服上述现有的所有技术瓶颈。In summary, the semiconductor package with heat dissipation structure of the present invention does provide a new type of heat dissipation structure, which does not need to be manufactured by forging, can reduce costs, and is not limited by the thickness ratio, and fully meets the thin profile of packaging technology. At the same time, the heat dissipation structure can also change the shape of the heat sink or increase its heat dissipation area according to needs, and can also avoid deformation and delamination, and fully take into account its adhesion stability, which has completely overcome all the above-mentioned existing technical bottlenecks.

Claims (22)

1. the semiconductor package part with radiator structure is characterized in that, this semiconductor package part comprises:
Substrate has a first surface and an opposing second surface;
At least one chip connects to put on the first surface of substrate and with substrate and electrically connects;
Radiator structure, comprise first fin and second fin, this first fin has at least one first location division, and this second fin has at least one second location division and at least one hollow-out parts, this first fin is a top layer fin, this second fin then comprises a bottom fin and at least one interlayer fin, wherein, second fin connects to be put on the first surface of substrate, first fin is borrowed first location division to connect and is put on second location division of second fin, and this chip is coated on this first fin, the hollow-out parts of second fin and substrate enclose in the space that is set to; And
A plurality of soldered balls connect and put on the second surface of substrate.
2. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this first fin and second fin are the tabular fin.
3. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this first location division is a flange, and second location division comprises a shrinkage pool and a flange.
4. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this first location division is a shrinkage pool, and second keeper comprises a flange and a shrinkage pool.
5. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this first location division and second location division form with the staking punch punching out respectively.
6. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this first location division and second location division are formed at the peripheral position of first fin and second fin respectively.
7. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this first fin aligns mutually with the edge of second fin.
8. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, the edge of this first fin and second fin is arranged in the dislocation mode.
9. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, when having a plurality of interlayer fin, it is that the mode storehouse that aligns mutually with the edge is on the bottom fin.
10. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, when having a plurality of interlayer fin, it is that mode storehouse with mutual dislocation is on the bottom fin.
11. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that the area of this first fin is greater than the area of second fin.
12. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this first fin not with surface that second fin contacts on, going back storehouse has at least one layer fin that increase.
13. the semiconductor package part with radiator structure as claimed in claim 12 is characterized in that, this increases on layer fin position that should chip is had at least one hollow-out parts.
14. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this radiator structure comprises that also one connects the radiator fan of putting on first fin surface.
15. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, has a plurality of flutings on the surface of this second fin and substrate contacts.
16. the semiconductor package part with radiator structure as claimed in claim 15 is characterized in that, the inner wall surface of this fluting is a ladder surface.
17. the semiconductor package part with radiator structure as claimed in claim 15 is characterized in that, the inner wall surface of this fluting is an inclined surface.
18. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this chip is the first surface electric connection by conductive projection and substrate.
19. the semiconductor package part with radiator structure as claimed in claim 18 is characterized in that, this semiconductor package part also comprises the insulating material that is filled in around this conductive projection.
20. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this semiconductor package part also comprises the heat-conducting glue of bonding first fin and chip.
21. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that this semiconductor package part also comprises the mucilage materials between the first surface that is filled in second fin and substrate.
22. the semiconductor package part with radiator structure as claimed in claim 1 is characterized in that, this semiconductor package part is the flip chip ball grid array semiconductor package part.
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CN101466244B (en) * 2007-12-21 2012-06-20 鸿富锦精密工业(深圳)有限公司 Radiator
CN102881667A (en) * 2012-10-08 2013-01-16 日月光半导体制造股份有限公司 Semiconductor Package Structure
CN104733405A (en) * 2015-04-15 2015-06-24 江苏晟芯微电子有限公司 Pin-type heat-radiating semiconductor packaging structure
CN110943053A (en) * 2019-11-22 2020-03-31 中国电子科技集团公司第十三研究所 Ceramic airtight packaging device and packaging method
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