CH504022A - Light-sensitive matls. contg. photopolymerisable cpds. - Google Patents
Light-sensitive matls. contg. photopolymerisable cpds.Info
- Publication number
- CH504022A CH504022A CH1680568A CH1680568A CH504022A CH 504022 A CH504022 A CH 504022A CH 1680568 A CH1680568 A CH 1680568A CH 1680568 A CH1680568 A CH 1680568A CH 504022 A CH504022 A CH 504022A
- Authority
- CH
- Switzerland
- Prior art keywords
- alkyl
- material according
- aryl
- light
- sensitive
- Prior art date
Links
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 13
- 125000003118 aryl group Chemical group 0.000 claims abstract description 13
- 239000011230 binding agent Substances 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 239000003112 inhibitor Substances 0.000 claims abstract description 5
- 125000002252 acyl group Chemical group 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 17
- 238000006116 polymerization reaction Methods 0.000 claims description 7
- QDKKMBYDKIBAME-UHFFFAOYSA-N 2-ethynylbenzene-1,4-diol Chemical class OC1=CC=C(O)C(C#C)=C1 QDKKMBYDKIBAME-UHFFFAOYSA-N 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 239000000975 dye Substances 0.000 claims description 2
- 239000000654 additive Substances 0.000 claims 1
- 230000001419 dependent effect Effects 0.000 claims 1
- 231100000489 sensitizer Toxicity 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 21
- 238000007639 printing Methods 0.000 description 16
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 229910052724 xenon Inorganic materials 0.000 description 8
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 7
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000004372 Polyvinyl alcohol Substances 0.000 description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 6
- 229920002451 polyvinyl alcohol Polymers 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 4
- 238000007792 addition Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 4
- 150000004056 anthraquinones Chemical class 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 229920002689 polyvinyl acetate Polymers 0.000 description 3
- 239000011118 polyvinyl acetate Substances 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- 239000001488 sodium phosphate Substances 0.000 description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 3
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 241000725982 Buccinulum pertinax Species 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 240000000275 Persicaria hydropiper Species 0.000 description 2
- 235000017337 Persicaria hydropiper Nutrition 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012777 electrically insulating material Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- 239000011814 protection agent Substances 0.000 description 2
- 150000004053 quinones Chemical class 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 2
- 235000019801 trisodium phosphate Nutrition 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- MDTBEPKITIPZQL-UHFFFAOYSA-N 2,6-dimethyl-4-propan-2-ylhepta-2,5-dienediamide Chemical compound C(C(C)C)(C=C(C(=O)N)C)C=C(C(=O)N)C MDTBEPKITIPZQL-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- PIYJQTKZHLLZQE-UHFFFAOYSA-N 2-methyl-n-[2-(2-methylprop-2-enoylamino)ethyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCCNC(=O)C(C)=C PIYJQTKZHLLZQE-UHFFFAOYSA-N 0.000 description 1
- YBKWKURHPIBUEM-UHFFFAOYSA-N 2-methyl-n-[6-(2-methylprop-2-enoylamino)hexyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCCCCCCNC(=O)C(C)=C YBKWKURHPIBUEM-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 244000215068 Acacia senegal Species 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 229920006097 Ultramide® Polymers 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- ULQMPOIOSDXIGC-UHFFFAOYSA-N [2,2-dimethyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)COC(=O)C(C)=C ULQMPOIOSDXIGC-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- KJCDXDTWIHMZIC-UHFFFAOYSA-N benzene-1,4-diol;propan-2-one Chemical compound CC(C)=O.OC1=CC=C(O)C=C1 KJCDXDTWIHMZIC-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- OOORLLSLMPBSPT-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,3-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC(C(=O)OCC=C)=C1 OOORLLSLMPBSPT-UHFFFAOYSA-N 0.000 description 1
- GBSAGTNCIUWLCF-UHFFFAOYSA-N butyl acetate;propan-2-one Chemical compound CC(C)=O.CCCCOC(C)=O GBSAGTNCIUWLCF-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- IQIJRJNHZYUQSD-UHFFFAOYSA-N ethenyl(phenyl)diazene Chemical compound C=CN=NC1=CC=CC=C1 IQIJRJNHZYUQSD-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical class [H]C#C* 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- YQCFXPARMSSRRK-UHFFFAOYSA-N n-[6-(prop-2-enoylamino)hexyl]prop-2-enamide Chemical compound C=CC(=O)NCCCCCCNC(=O)C=C YQCFXPARMSSRRK-UHFFFAOYSA-N 0.000 description 1
- VQGWOOIHSXNRPW-UHFFFAOYSA-N n-butyl-2-methylprop-2-enamide Chemical compound CCCCNC(=O)C(C)=C VQGWOOIHSXNRPW-UHFFFAOYSA-N 0.000 description 1
- XFHJDMUEHUHAJW-UHFFFAOYSA-N n-tert-butylprop-2-enamide Chemical compound CC(C)(C)NC(=O)C=C XFHJDMUEHUHAJW-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- SCOAVUHOIJMIBW-UHFFFAOYSA-N phenanthrene-1,2-dione Chemical class C1=CC=C2C(C=CC(C3=O)=O)=C3C=CC2=C1 SCOAVUHOIJMIBW-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical class OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- -1 vinyl halides Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F38/00—Homopolymers and copolymers of compounds having one or more carbon-to-carbon triple bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Light sensitive mixtures consisting of one or more polymerisable cpds. opt. a binder, and the usual sensitisers, dyestuffs and polymerisation inhibitors are characterised by contg. one or more ethynylquinols (I), and opt. one or more ethylenically unsatd. photopolymerisable cpds. - R = H, alkyl, aryl or acyl; R1 = H alkyl, aryl, or -CH=CHOR5; R5 = alkyl; R1 - R4 = alkyl or aryl; or R1/R2 and R3/R4 = parts of condensed aromatic rings, which may be substd. by NH2, NO2, OH, Cl or OR6; and R6 = alkyl. - The mixt. pref. contains 20-80% wt. cpd. (I), and 20-80% wt. binder, opt. together with an ethylenically unsatd. photopolymerisable cpd.
Description
Lichtempfindliches Material Die Erfindung betrifft ein lichtempfindliches Mate rial, welches ganz oder zum Teil aus einem lichtemp findlichen Gemisch, das eine oder mehrere polymeri sierbare Verbindungen enthält, besteht.
Es ist bekannt, als Aufzeichnungsmaterialien auf einen Träger aufgebrachte Schichten zu verwenden, in denen unter Einwirkung des Lichtes eine Photopoly merisation abläuft, die bei bildmässiger Belichtung die Möglichkeit bietet, gegebenenfalls nach entsprechender Entschichtung unveränderter Anteile ein negatives Bild der Vorlage zu erhalten.
Derartige Materialien bedienen sich meist äthyle- nisch ungesättigter Monomerer, die leicht zur Polymeri sation mit sich selbst oder mit anderen Verbindungen angeregt werden können. Zur Auslösung der Polymeri sation kann sowohl Wärmestrahlung als auch Licht des ultravioletten oder des sichtbaren Spektralbereiches Ver wendung finden. Zur Auslösung der Reaktion werden Initiatoren zugesetzt, Verbindungen, die unter der Strah lungseinwirkung eine Veränderung erfahren, sei es, dass sie in entsprechende reaktionsfähige Bruchstücke, Radi kale, Carbene und dgl. zerfallen, sei es, dass sie in ange regte Zustände übergehen, die äthylenische Doppelbin dungen angreifen können. Bekannte Starter dieser Art sind zum Beispiel Ketone, wie Benzophenon, Benzoin, Michlersches Keton, Chinone, z. B.
Anthrachinone oder Phenanthrenchinone, Peroxyde, Azide usw.
Ein Nachteil dieser Polymerisationsverfahren ist, dass häufig die entstehenden Bilder farblos und nicht direkt lesbar sind.
Ferner weisen die genannten Photostarter verschie dene Nachteile auf, die einer universellen Anwendung entgegenstehen, sei es, dass ihre Aktivität ungenügend ist, so dass lange Belichtungszeiten erforderlich sind und zu einer ungenügenden Aushärtung der Schicht an den vom Licht getroffenen Stellen führen, sei es, dass sie sehr schwer löslich sind und stark zur Kristallisation neigen, so dass ihrer Anwendung enge Grenzen gesetzt sind und bei längerer Lagerung der Schichten Störungen auftreten. Zweck der Erfindung ist daher die Schaffung eines lichtempfindlichen Materials, welches die genannten Nachteile nicht aufweist.
Das erfindungsgemässe, lichtempfindliche Material der eingangs genannten Art ist dadurch gekennzeichnet, dass es ein oder mehrere Äthinylchinole der Formel
EMI0001.0003
worin R H, ein Alkyl, ein Aryl oder ein Acyl, R' H, ein Alkyl, ein Alkenyl, ein Aryl oder gleich aromatischen verzweigte
EMI0001.0004
bedeuten, R1, R2, R3, R4 gleich oder verschieden sind und ein Al kyl, ein Aryl oder jeweils R1, R2 und R3, R4 Gliedar eines ankondensierten aromatischen Ringes bedeu ten, dar durch NH2, N02, OH, -O Alkyl oder Cl substituiert sein kann, wobei die Alkylreste grad- kattige oder verzweighte Alkyle mit 1 bis 8 Kohlen stoffatomen bedeuten, enthält.
Eine Anzahl der erfindungsgemässen Verbindungen sind in der folgenden Formeltabelle aufgeführt. Wegen ihrer Stabilität und besonders günstigen Polymerisa- tions- und photostartenden Eigenschaften sind insbe sondere Chinole, die sich von Anthrachinon herleiten und die zwei polymerisationsfähige Gruppen konjugiert enthalten, z. B. in Form der Eninylgruppe, bevorzugt, wie besonders die Verbindungen der Ziffern 1, 2 und 3 der Formeltabelle. Die hieraus hergestellten Kopier schichten ergeben besonders tief gefärbte, gut lesbare Negative. Jedoch liefern ganz allgemein die Verbindun gen der oben angegebenen Verbindungsklasse gute Er gebnisse.
Die an sich bekannten Verbindungen werden her gestellt durch Äthinierung, d. h. Anlagerung von Acety- lenen oder deren Monosubstitutionsprodukten in Form ihrer Alkalisalze an geeignete Chinone. Die Reaktion verläuft in flüssigem Ammoniak oder in aprotischen or ganischen Lösungsmitteln, z. B. Dioxan, und liefert in einer Stufe die Chinole, die gegebenenfalls an ihrer OH- Gruppe noch substituiert werden können (siehe W. Ried, Neuere Methoden der präparativen organischen Che mie , IV, Äthinierungsreaktionen, Verlag Chemie, Weinheim, Bergstrasse).
Die vorerwähnten Äthinylchinole können entweder als alleinige photopolymerisierbare Verbindungen in dem lichtempfindlichen Gemisch enthalten sein, wobei der besondere Vorteil gegeben ist, dass ein gesonderter Photostarter nicht erforderlich ist und direkt lesbare Bilder erhalten werden können, oder es ist möglich, wei tere an sich bekannte äthylenisch ungesättigte photo polymerisierbare Verbindungen zuzusetzen.
Wie gefun den wurde, kann der Anteil der einzelnen Komponenten in diesem Fall in weiten Grenzen variiert werden, es ist jedoch zweckmässig, wenn die Menge der äthylenisch ungesättigten photopolymerisierbaren Verbindung, be zogen auf das Gesamtschichtgewicht, etwa 0 bis 99 Gew.-%, die der Äthinylchinole etwa 0,1 bis 75, vor zugsweise 1 bis 20 oh, und die des Bindemittels etwa 0 bis 90, vorzugsweise 0 bis 70 %, neben den geringen Zusätzen von an sich bekannten Sensibilisatoren, Poly- merisationsinhibitoren und dergleichen in den üblichen Mengen von etwa 0,0001 bis etwa 5 0/o beträgt.
Sofern keine äthylenisch ungesättigten photopoly merisierbaren Verbindungen zugegen sind, beträgt der Anteil der Äthinylchinole etwa 20 bis 80 Gew.-%, ne ben 80 bis 20 Gew.-% Bindemittel.
Als äthylenisch ungesättigte photopolymerisierbare Verbindungen sind die für diese Zwecke an sich bekann ten Substanzen verwendbar, wie insbesondere Acryl- amide, z. B. N-tert.-Butylacrylamid, Diacetonacrylamid, N,N'-Methylen-bis-acrylamid, N,N-Hexamethylen-bis- acrylamid u. a.; Methacrylamide, z. B. N-n-Butylmeth- acrylamid, Isobutyliden-bis-methacrylamid, N,N'-Äthy- len-bis-methacrylamid, N,N'-Hexamethylen-bis-meth- acrylamid; Acrylsäureester, z. B.
Butylacrylat, Glycidyl- acrylat, Octylacrylat, Äthylenglycoldiacrylat, Triäthylen- glycoldiacrylat, Polyäthylenglycoldiacrylat, Trimethylol- propantriacrylat sowie Neopentylglycoldimethacrylat, Trimethylolpropantrimethacrylat und andere. Ferner Vinyläther, Vinylester, Allylverbindungen, Vinylhaloge- nide, wie beispielsweise Vinylchlorid.
Eine besonders bevorzugte Gruppe von polymeri sierbaren Monomeren, welche den Schichten einverleibt werden können, sind die Ester und Amide von Acryl säuren, welche die ungesättigte Gruppierung mindestens zweimal enthalten. Die Äthinylchinole haben gleichzei tig die Funktion einer photopolymerisierbaren Verbin dung als auch die eines Photostarters. Gegenüber ande ren an sich bekannten Verbindungen dieser Art haben sie den Vorteil, dass sie in organischen Solventien leicht löslich sind, nicht zur Kristallisation neigen, in mehreren Fällen sogar filmbildende Eigenschaften aufweisen, so dass sie auch in grösseren Mengen in den Schichten ver wendet werden können. Wie aus den folgenden Beispie len zu entnehmen ist, ist ihre polymerisationsauslösende Wirkung ausgezeichnet, so dass ein flüssiges Monomeres in wenigen Sekunden völlig durchpolymerisiert ist.
Da die Verbindungen Photostarter und Monomeres in einem Molekül darstellen, vermögen sie sich selbst zur Poly merisation anzuregen, was zur Folge hat, dass die ent stehenden Polymeren nicht Copolymere, sondern Homo polymere sind. Dadurch ergibt sich der Vorteil, dass diese Verbindungen auch ohne weitere Initiatoren oder Sensibilisatoren verwendet werden können. Da das ge bildete Polymere ferner, wie bereits erwähnt, farbig ist, werden deutlich sichtbare Bilder erhalten, wodurch die weitere Verarbeitung wesentlich erleichtert wird.
Als Bindemittel können alle in der einschlägigen Technik an sich bekannten Substanzen verwendet wer den, wie insbesondere Kresol- und/oder Phenol-Formal dehyd-Kondensationsprodukte (vorzugsweise sogenannte Novolake, z. B. Alnovol der Firma Chemische Werke Albert, Wiesbaden-Biebrich, Deutschland). Zweckmässig erscheint es, ein solches Bindemittel zu verwenden, das saure Gruppen enthält, so dass es in alkalischen Entwicklern löslich ist. So können Copoly- merisate aus Styrol und Maleinsäureanhydrid (z. B. LYTRON ) oder carboxylgruppenhaltige Polyvinylace- tate (z. B.
MOWILITH C+5), ferner Hydrogenphtha- late oder modifizierte Cellulosederivate Verwendung finden.
Es können aber auch neutrale Bindemittel einge setzt werden, z. B. Polyamide oder Polyacrylate, die dann eine Tauchentwicklung mit geeignetem Lösungs mittel benötigen.
Als Lichtquellen für die Auslösung der Photopoly merisation können alle gängigen, im Reprogewerbe üb lichen Typen von Bogenlampen, Quecksilberdampflam pen, Röhrenbelichtungsgeräten, Xenonlampen oder Mischlichtlampen Anwendung finden, sofern sie eine genügende Emission im langwelligen ultravioletten und angrenzenden sichtbaren Spektralbereich aufweisen.
Zur Herabminderung der polymerisationshemmen den Wirkung des molekularen Sauerstoffes, der Luft, kann die Diffusion desselben in die Schichten durch einen dünnen Überstrich von Polyvinylalkoholen be schränkt werden.
Die Herstellung des erfindungsgemässen Aufzeich nungsmaterials wird nach an sich in der Reproduktions technik üblichen Verfahren vorgenommen. Die Substan zen werden in gelöster Form, gegebenenfalls unter Zu satz von geeigneten Bindemitteln, unter Zufügung von Sensibilisatoren, Farbstoffen, Polymerisationsinhibitoren in bekannter Weise auf einen Träger aus Papier, Kunst stoff- oder Metallfolien aufgebracht.
Ausser zur Herstellung von Kopiermaterial und Flachdruckfolien können die erfindungsgemässen Ver bindungen verwendet werden zur Herstellung von Ätz- schichten, Hochdruckformen, gedruckten Schaltungen und dergleichen. Insbesondere für die letztgenannten Anwendungsformen kann es vorteilhaft sein, wenn das lichtempfindliche Schichtmaterial als solches in fester Form oder gelöst in geeigneten Solventien wie Äthyl- glycol, Butylacetat, Methyläthylketon u. a. vorliegt und erst unmittelbar vor der Verwendung auf den gewünsch ten Träger aufgebracht wird.
Die folgenden Beispiele sollen als Ausführungsform die Erfindung erläutern, ohne sie damit zu begrenzen. <I>Beispiel 1</I> 5 g 9-(w-Methoxy-buteninyl)-anthrachinol-9, gewon nen durch Äthinierung von Anthrachinon mit Methoxy- butenin in flüssigem Ammoniak, werden zusammen mit 1 g handelsüblichen Phenolharzes (Kresol-Formaldehyd- Kondensat) in 320 ml Aceton und 180 ml Butylacetat gelöst und mit dieser Lösung geeignete Trägerfolien aus mechanisch aufgerauhtem Aluminium homogen be schichtet und getrocknet. Die Folien werden unter einer Negativvorlage mit einer handelsüblichen Mischlicht lampe 5 min belichtet (z. B. Philips HPR 125 W, Ab stand Lampenrand/Schicht 35 cm).
Erhalten wird ein sofort lesbares, tief orangebraunes Negativbild.
Die Nichtbildstellen lassen sich anschliessend mit einem schwach alkalischen Entschichter (z. B. gemäss DAS 1193 366) leicht weglösen, wobei nur die durch polymerisierten Bildbereiche stehen bleiben. Nach Ein färben mit fetter Druckfarbe können mit einer solchen Druckfolie hohe Auflagen auf einer Offsetdruck maschine gedruckt werden, die eine ungewöhnlich gute Rasterwiedergabe zeigen.
<I>Beispiel 2</I> 250 mg 9-(w-Methoxy-Buteninyl)-2-Chlor-anthra- chinol-9, dargestellt durch Äthinierung von 2-Chlor- anthrachinon mit Methoxybutenin, werden mit 50 mg eines handelsüblichen Maleinsäure-Styrolcopolymerisats in 20 ml Aceton (enthaltend 20 % Butylacetat) gelöst. Mit dieser Lösung wird bei gedämpftem Licht eine Trä gerfolie aus elektrolytisch aufgerauhtem Aluminium (z. B. Rotablatt ) gleichmässig beschichtet und mit warmer Luft getrocknet. Unter einer Negativvorlage wird die so sensibilisierte Folie mit einer im Lichtpaus- gewerbe üblichen Xenonlampe (z. B. Xenokop ) 4 min belichtet.
Es wird ein scharfes, tief braun gefärbtes Ab bild der Vorlage auf hellem Grund erhalten. Mit einem schwach alkoholischen Entschichter (1%ige Na2SiO3- Lösung im Gemisch aus 20 Volumteilen Wasser, 20 Tei len Methanol, 10 Teilen Glycol, 10 Teilen Glycerin) las sen sich die Nichtbildbereiche wiederum leicht weglösen, und die fertige Druckschablone kann nach kurzem Überwischen mit einem üblichen Hydrophilierungsmittel mit fetter Farbe eingefärbt werden. Auch diese Druck folie zeigt eine ungewöhnlich gute Wiedergabe selbst der feinsten Raster. Ähnlich ist das Ergebnis bei Verwen dung des 9-Methoxybuteninyl-1-Chloranthrachinols (9) anstelle des 2-Chlor-Isomeren.
<I>Beispiel 3</I> Bei sonst gleichem Arbeitsgang wird als lichtemp findliche Verbindung 9-Phenäthinyl-5-aminoanthrachi- nol-9 zusammen mit einem durch Chloressigsäure modi fizierten Phenol-Formaldehydharz in analogen Mengen, wie unter Beispiel 1 beschrieben, eingesetzt. Belichtet wurde 5 min unter einer Xenonlampe und dabei ein braun gefärbtes, scharfes Bild auf hellgelbem Grund er halten. Die Druckschablone entspricht weitgehend den vorbeschriebenen Beispielen hinsichtlich Eigenschaften und Leistung.
Fast gleiche Qualität weisen Druckscha blonen auf, die unter Verwendung von 9-Buteninyl-2- Hydroxyanthrachinol oder 1-Buteninyl-2-Methyl-naph- thochinol(1) hergestellt wurden.
<I>Beispiel 4</I> 250 mg 9-Buteninyl-Anthrachinol-9 werden mit 400 mg Kresol-Formaldehydharz in 25 ml Aceton (mit 20 % Butylacetat) gelöst und, wie vorstehend beschrie ben, bei gedämpftem Licht auf einen Träger aus mecha nisch aufgerauhtem Aluminium gleichmässig aufge schichtet. Belichtung, Entwicklung und Vorbereitung der Platte zum Druck erfolgen in gleicher Weise, wie unter Beispiel 2 beschrieben. Die Färbung des erhaltenen Ab bildes der Vorlage ist hier etwas blasser als in den be schriebenen Fällen, in den Eigenschaften entspricht diese Kopierschicht denen der vorherigen Beispiele.
<I>Beispiel 5</I> Auf einen flachen Träger aus elektrisch isolierendem Material, z. B. Pertinax (Phenoplast-Schichtstoff mit Papiereinlage), der oberflächlich mit einer dünnen Haut aus metallischem Kupfer überzogen ist, schichtet man aus einer Schleuder, die mit ca. 120 U/min rotiert, in einem abgedunkelten Raum, die Sensibilisierungslösung gleichmässig auf.
Die Lösung wird aus 0,5 g 2-Chlor-9- (w-Methoxy-buteninyl)-anthrachinol-9 und 0,2 g des Kresol-Formaldehydpolykondensates in 20 ml Aceton- Butylacetatgemisch hergestellt. Der sensibilisierte und getrocknete Träger wird unter einer Negativvorlage eines elektrischen Schaltbildes belichtet, z. B. 5 min unter einer Xenonlampe und anschliessend, wie oben be schrieben, mit einem schwach alkalischen Entschichter zur Entfernung der Nichtbildbereiche überwischt. Da nach wird mit Wasser gespült, getrocknet und in einem Ätzmittel, z. B. 35 % Fe-(III)-chloridlösung, die frei liegende Kupferschicht weggeätzt.
Man erhält so, nöti genfalls nach nochmaligem Abspülen mit einem Lö sungsmittel, eine ausgezeichnete metallische Leiterbahn auf dem Träger, die als kopierte Schaltung Verwendung finden kann.
<I>Beispiel 6</I> Die in gleicher Weise, wie in Beispiel 5 beschrieben, hergestellte Sensibilisierungslösung wird auf eine gerei nigte Einstufenätz-Zinkplatte aufgebracht und die be schichtete Zinkplatte, ähnlich wie oben, jedoch unter einer Rastervorlage, belichtet und wie beschrieben ent wickelt. Zur Stabilisierung der Schicht kann man noch einen Erhitzungsschritt (z. B. 3 min 180 C) anschlies- sen. Die Zinkplatte wird nun in einer Einstufenätz- maschine mit Salpetersäure, die ein übliches Flanken schutzmittel enthält, tiefgelegt.
Die erhaltene Hoch druckplatte bzw. das Klischee zeigt eine hervorragende Schichthaftung auch in den Feinpartien des Rasters und kann nötigenfalls nach Behandlung mit einem Lösungs mittel zur Entfernung restlicher Schichtanteile für den Druck hoher Auflagen Verwendung finden.
<I>Beispiel 7</I> In einem kleinen Quarzkölbchen werden 30 mg 9- Phenäthinylanthrachinol-9 in 2 ml Triäthylenglycoldi- acrylat gelöst und durch Einleiten von Stickstoff die Lö sung von Sauerstoff befreit. Unter Kühlung mit etwas Eiswasser wird die Probe unter einer Kohlenbogenlampe (150 V, 18 Ampere, Abstand Kölbchen-Lampenrand 35 cm) belichtet.
Nach 3-5 sec Belichtungszeit ist der Kölbcheninhalt durchpolymerisiert und erstarrt. Ähn lich kann der Versuch durchgeführt werden unter Ver wendung von 0-Methyl-9-buteninyl-2-Methoxy-anthra- chinol(9) (Nr. 10 der Tabelle) oder von 0-Acetyl-9- buteninyl-anthrachinol(9) (Nr. 11 der Tabelle) und ebenso mit 2-Phenyl-l-Buteninyl-naphthochinol(1) (Nr. 12 der Tabelle).
Der Kölbcheninhalt ist auch hier in ganz kurzer Zeit nach Beginn der Belichtung erstarrt- <I>Beispiel 8</I> Auf einen Träger aus einer dünnen Aluminiumfolie, die oberflächlich mechanisch aufgerauht ist, wird eine Lösung von 400 mg eines handelsüblichen Maleinsäure- Styrolcopolymerisates (z. B.
LYTRON ), 200 mg eines Copolymerisates aus α-Methylstyrol und Vinyltoluol (PICOTEX ), 35 mg Polyvinylbutyral (MOWITAL ), 40 mg 9-Phenäthinyl-anthrachinol-9 und 500 mg Tri- äthylenglycoldiacrylat sowie 3 mg Hydrochinonmono methyläther in 9 ml Methyläthylketon mittels einer in der Reprotechnik üblichen Plattenschleuder gleichmäs- sig aufgebracht und getrocknet. Darauf wird ein dünner Überstrich von Polyvinylalkohol aufgebracht.
Diese so sensibilisierte Folie wird nun mit einer Xenonlampe (380 V, 25 Ampere) 5 min belichtet. Durch kurzes Überwischen mit einem schwach alkali schen Entwickler (1 % Lösung von Trinatriumphosphat in Wasser) werden die Nichtbildstellen der Schicht ent fernt und der Träger freigelegt. Um die Wasserführung des Trägers zu verbessern, kann noch mit einem Hydro- philierungsmittel überwischt und dann mit Druckfarbe eingefärbt werden. Von der erhaltenen Offsetplatte wer den einwandfreie Drucke in hoher Auflage erhalten.
<I>Beispiel 9</I> 60 mg 9-Phenäthinyl-2-chloranthrachinol-9, 450 mg eines carboxylgruppenhaltigen Polyvinylacetats ( Mowi- lith C+5 ), 30 mg Polyvinylacetat ( Mowilith 50 ), 20 mg eines Celluloseacetobutyrats ( Cellit BP 900 ), 500 mg Trimethylolpropantriacrylat und 3 mg Hydro chinonmonomethyläther, gelöst in 9 ml Methyläthyl- keton, werden in üblicher Weise auf eine Trägerfolie aus elektrolytisch aufgerauhtem Aluminium ( Rotablatt ) aufgeschichtet und getrocknet.
Nach Aufbringen eines die Diffusion des Sauerstoffs hemmenden dünnen Überstriches von Polyvinylalkohol belichtet man 5 min unter einer Rastervorlage mit einer Xenonlampe wie vorstehend beschrieben und entwik- kelt die Druckfolie durch Überwischen mit einer 3%- igen Lösung von Dinatriumphosphat. Nach Hydrophilie- rung und Einfärben in üblicher Weise kann die Platte zum Druck verwendet werden. Die Wiedergabe auch feinster Rasterpunkte ist ausgezeichnet, und infolge der Zähigkeit und hervorragenden Haftung der Schicht wer den hohe Auflagezahlen erreicht.
Gleiche Ergebnisse werden erhalten bei Verwendung von 9-Äthinyl-1-nitroanthrachinol(9) oder von 9-Bu- teninyl-1-nitro-4-amino-anthrachinol(9).
<I>Beispiele 10 und 11</I> Anstelle des in Beispiel 8 verwendeten erfindungs- gemässen Aktivators wird 9-Hexinyl-2-chloranthrachi- nol-9 oder auch 9-Hexinylanthrachinol(-9) eingesetzt, sonst gleichartig verfahren. Anstelle des in Beispiel 9 benutzten Aktivators kann ebenso das 9-(w-Methoxy- buteninyl)-2-chloranthrachinol Anwendung finden, die Bildelemente sind in diesem Falle nach der Belichtung mit besonders tiefer Farbe erkennbar, wodurch die Ver folgung des Entwicklungsvorganges erleichtert wird.
Beipsiel 12 Eine Trägerfolie aus elektrolytisch aufgerauhtem Aluminium wird mit einer 0,5%igen Lösung von Poly- vinylphosphorsäure in Methylglycol/Wasser (90:10) vor beschichtet. Nach dem Trocknen wird darauf aufge bracht eine Lösung von 200 mg 9-Hexinyl-2-chlor- anthrachinol-9, 2,5 g Polymethylmethacrylat, 2,5g Tri- methylolpropantriacrylat und 200 mg niedermolekula rem Polyglycol sowie 3 mg des Inhibitors in 20 ml Me- thyläthylketon. Nach Trocknen und Überschichten mit Polyvinylalkohol wird 11/2 min mit einer Xenonlampe unter einem 10stufigen Graukeil belichtet (UGRA-Keil, St. Gallen, Schweiz).
Die Nichtbildstellen werden durch Tauchen während einer Minute in eine Lösung von 5 0/0 Na3PO4. 12 H2O in stark verdünntem Isopropanol weg gelöst und anschliessend getrocknet, hydrophiliert und eingefärbt mit Druckfarbe. Der Stufenkeil wird dabei bis zur 4. Volltonstufe geschwärzt.
<I>Beispiel 13</I> 500 mg Polyamid ( Ultramid Ic der BASF) wer den durch längeres Rühren bei Raumtemperatur in einem Gemisch von 4 ml Methanol und 1 ml Wasser in Lösung gebracht. Hinzu wird eine Lösung aus 200 mg Äthylenbisacrylamid und 40 mg 9-Hexinyl-2-chlor- anthrachinol in 4 ml Methylglycol gefügt und damit eine Trägerfolie aus elektrolytisch aufgerauhtem Aluminium beschichtet. Überstrich mit Polyvinylalkohol und Be lichtung erfolgen wie in Beispiel 9. Um die Nichtbildbe reiche zu entfernen, wird die Druckfolie mit Wasser ab gespült und vorsichtig durch ein Bad mit verdünntem Methanol (85 0/o) geführt.
Die bildmässig entwickelte Schicht ist beim Verlassen des Bades sehr weich und verletzlich, trocknet aber rasch hart durch und ergibt dann nach der Hydrophilierung des freigelegten Trägers mit sehr verdünnter Phosphorsäure ein ausserordentlich widerstandsfähiges oleophiles Relief, das ausgezeichnete Abdrucke liefert. <I>Beispiel 14</I> 700 mg des von der Firma CIBA/Basel kommerziell angebotenen präpolymerisierten, in organischen Solven- tien noch löslichen Diallylisophthalatharzes ( Dapon M ) werden in 8 ml technischen Xylol gelöst und mit einer Lösung von 40 mg 9-Hexinyl-2-chloranthrachinol- 9 in 2 ml Methyläthylketon versetzt.
Mit dieser wird eine Trägerfolie aus mechanisch aufgerauhtem Aluminium beschichtet und nach Trocknen unter einer Strichvor lage mit einem Röhrenbelichtungsgerät (6 Leuchtstoff- röhren Philips TLA, Type 20 W/05 mit Glasabdeck scheibe) 6 min belichtet. Anschliessend erfolgt die Tauchentwicklung in technischem Xylol. Der freigelegte Träger kann nach dem Trocknen der Platte mit einer wässerigen Lösung aus 7 % Gummi-Arabicum und 0,3 % Borfluorwasserstoffsäure hydrophiliert werden. Nach der Einfärbung mit Druckfarbe ist die Platte druckfertig.
<I>Beispiel 15</I> Eine Lösung aus 350 mg eines Styrol-Maleinsäure copolymerisats ( Lytron ), 200 mg eines Copolymeri- sats aus α-Methylstyrol und Vinyltoluol ( Picotex ), 35 mg Polyvinylbutyral ( Mowital ), 500 mg Tri- methylolpropantriacrylat, 3 mg Hydrochinonmonome thyläther und 40 mg 9-Phenäthinylanthrachinol-9 in 7 ml Methyläthylketon wird gleichmässig auf eine ge reinigte Einstufenätzzinkplatte aufgebracht und die be schichtete Zinkplatte unter einer Rastervorlage, wie in Beispiel 8 beschrieben, belichtet und weiterbehandelt.
Die fertig entwickelte Platte kann noch einem Erhit- zungsschritt (1-2 min 100 C) unterworfen werden, um die Schicht weiter zu verfestigen; notwendig ist dies je doch nicht. Die Zinkplatte wird nun in einer Einstufen- ätzmaschine mit Salpetersäure, die ein Flankenschutz- mittel enthält, tiefgelegt. Die erhaltene Hochdruckplatte bzw. das Klischee zeigt eine ausgezeichnete Schichthaf tung, auch in den Feinpartien des Rasters, und kann nötigenfalls nach Behandlung mit einem Lösungsmittel zur Entfernung restlicher Schichtanteile für den Druck hoher Auflagen Verwendung finden.
<I>Beispiel 16</I> Die gleiche Sensibilisierungslösung wie in Beispiel 15, nur anstelle des 9-Phenäthinylanthrachinols-9 mit 200 mg 9-(w-Methoxybuteninyl)-2-chloranthrachinol, wird auf einem geeigneten flachen Träger aus elektrisch isolierendem Material, z. B. Pertinax (Phenoplast- schichtstoff mit Papiereinlage), der oberflächlich mit einer dünnen Haut aus metallischem Kupfer überzogen ist, in einem abgedunkelten Raum mittels einer mit ca. 120 U/min rotierenden Plattenschleuder aufgeschichtet. Der so sensibilisierte, getrocknete und mit einem dün nen Überzug von Polyvinylalkohol versehene Träger wird anschliessend unter einer Negativvorlage eines ent sprechenden elektrischen Schaltbildes belichtet, z. B.
5 min an einer Xenonlampe, und anschliessend die Nichtbildbereiche, wie beschrieben, mit einem schwach alkalischen Entwickler, z. B. 1 % Natriumphosphat lösung, durch kurzes Überwischen weggelöst. Nach Ab spülen und Trocknen wird an den Nichtbildbereichen die nun freiliegende Kupferschicht durch Baden in einer 35 % Eisen-III-chlorid-Lösung weggeätzt. Man erhält so nötigenfalls nach nochmaligem Abspülen mit einem Lösungsmittel eine saubere und originalgetreue metal lische Leiterbahn auf dem Träger, die als kopierte Schal tung Verwendung finden kann.
EMI0005.0008
EMI0005.0009
EMI0005.0010
Photosensitive material The invention relates to a photosensitive mate rial which wholly or partially consists of a lichtemp sensitive mixture containing one or more polymerizable compounds.
It is known to use layers applied to a carrier as recording materials in which, under the action of light, a photopolymerization takes place which, with imagewise exposure, offers the possibility of obtaining a negative image of the original after appropriate stripping of unchanged portions, if necessary.
Such materials usually make use of ethylenically unsaturated monomers, which can easily be stimulated to polymerize with themselves or with other compounds. Both thermal radiation and light in the ultraviolet or the visible spectral range can be used to initiate the polymerization. To trigger the reaction, initiators are added, compounds that undergo a change under the action of radiation, be it that they disintegrate into corresponding reactive fragments, radicals, carbenes and the like, be it that they pass into excited states that Ethylenic double bonds can attack. Known starters of this type are, for example, ketones such as benzophenone, benzoin, Michler's ketone, quinones, e.g. B.
Anthraquinones or phenanthrenequinones, peroxides, azides, etc.
A disadvantage of this polymerization process is that the resulting images are often colorless and not directly legible.
Furthermore, the mentioned photo starters have various disadvantages that prevent universal use, be it that their activity is insufficient, so that long exposure times are required and lead to insufficient curing of the layer at the points struck by the light, be it that they are very sparingly soluble and have a strong tendency to crystallize, so that their use is subject to narrow limits and disturbances occur if the layers are stored for a long time. The purpose of the invention is therefore to create a photosensitive material which does not have the disadvantages mentioned.
The light-sensitive material according to the invention of the type mentioned at the beginning is characterized in that it contains one or more ethynylquinols of the formula
EMI0001.0003
wherein R is H, an alkyl, an aryl or an acyl, R 'H, an alkyl, an alkenyl, an aryl or like aromatic branched one
EMI0001.0004
mean, R1, R2, R3, R4 are identical or different and an alkyl, an aryl or in each case R1, R2 and R3, R4 members of a fused aromatic ring are denoted by NH2, NO2, OH, -O alkyl or Cl can be substituted, the alkyl radicals being straight-chain or branched alkyls having 1 to 8 carbon atoms.
A number of the compounds according to the invention are listed in the following table of formulas. Because of their stability and particularly favorable polymerization and photostarting properties, there are special quinols which are derived from anthraquinone and which contain conjugated two polymerizable groups, e.g. B. in the form of the enynyl group, preferred, especially the compounds of the numbers 1, 2 and 3 of the formula table. The copy layers produced from this result in particularly deeply colored, easily legible negatives. However, in general, the compounds of the compound class given above provide good results.
The compounds known per se are made by ethynation, d. H. Addition of acetylenes or their monosubstitution products in the form of their alkali salts to suitable quinones. The reaction takes place in liquid ammonia or in aprotic or organic solvents, eg. B. dioxane, and provides the quinols in one stage, which can optionally be substituted on their OH group (see W. Ried, Newer Methods of Preparative Organic Chemistry, IV, ethinization, Verlag Chemie, Weinheim, Bergstrasse).
The above-mentioned ethynylquinols can either be contained as the sole photopolymerizable compounds in the photosensitive mixture, with the particular advantage that a separate photo starter is not required and directly readable images can be obtained, or it is possible to use other ethylenically unsaturated compounds known per se add photo-polymerizable compounds.
As has been found, the proportion of the individual components can be varied within wide limits in this case, but it is useful if the amount of the ethylenically unsaturated photopolymerizable compound, based on the total layer weight, about 0 to 99 wt .-%, the the ethynyl quinols about 0.1 to 75, preferably 1 to 20%, and that of the binder about 0 to 90, preferably 0 to 70%, in addition to the small additions of known sensitizers, polymerization inhibitors and the like in the usual amounts is from about 0.0001 to about 50 / o.
If no ethylenically unsaturated photopoly merizable compounds are present, the proportion of ethynyl quinols is about 20 to 80% by weight, and 80 to 20% by weight of binder.
As ethylenically unsaturated photopolymerizable compounds, the substances known per se for this purpose can be used, in particular acrylamides, eg. B. N-tert-butyl acrylamide, diacetone acrylamide, N, N'-methylene-bis-acrylamide, N, N-hexamethylene-bis-acrylamide and the like. a .; Methacrylamides, e.g. B. N-n-butyl methacrylamide, isobutylidene-bis-methacrylamide, N, N'-ethylene-bis-methacrylamide, N, N'-hexamethylene-bis-methacrylamide; Acrylic acid esters, e.g. B.
Butyl acrylate, glycidyl acrylate, octyl acrylate, ethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, trimethylol propane triacrylate and neopentyl glycol dimethacrylate, trimethylol propane trimethacrylate and others. Also vinyl ethers, vinyl esters, allyl compounds, vinyl halides, such as vinyl chloride.
A particularly preferred group of polymerizable monomers which can be incorporated into the layers are the esters and amides of acrylic acids which contain the unsaturated group at least twice. The ethynyl quinols simultaneously function as a photopolymerizable compound and as a photo starter. Compared to other known compounds of this type, they have the advantage that they are easily soluble in organic solvents, do not tend to crystallize, and in several cases even have film-forming properties so that they can also be used in larger quantities in the layers . As can be seen from the following examples, their polymerisation-triggering effect is excellent, so that a liquid monomer is completely polymerised in a few seconds.
Since the compounds represent photo starter and monomer in one molecule, they are able to stimulate themselves to polymerize, which means that the resulting polymers are not copolymers but homopolymers. This has the advantage that these compounds can also be used without further initiators or sensitizers. Since the polymer formed is also colored, as already mentioned, clearly visible images are obtained, which makes further processing considerably easier.
All substances known per se in the relevant technology can be used as binders, such as in particular cresol and / or phenol-formaldehyde condensation products (preferably so-called novolaks, e.g. Alnovol from Chemische Werke Albert, Wiesbaden-Biebrich, Germany ). It appears expedient to use such a binder which contains acidic groups so that it is soluble in alkaline developers. Copolymers of styrene and maleic anhydride (e.g. LYTRON) or polyvinyl acetate containing carboxyl groups (e.g.
MOWILITH C + 5), hydrogen phthalates or modified cellulose derivatives are also used.
But it can also be used neutral binders, z. B. polyamides or polyacrylates, which then require an immersion development medium with a suitable solvent.
All common types of arc lamps, mercury vapor lamps, tube exposure devices, xenon lamps or mixed light lamps can be used as light sources for triggering the photopolymerization, provided they have sufficient emission in the long-wave ultraviolet and adjacent visible spectral range.
To reduce the polymerization-inhibiting effect of the molecular oxygen, the air, the diffusion of the same into the layers can be limited by a thin coat of polyvinyl alcohol.
The production of the recording material according to the invention is carried out according to methods which are customary per se in reproduction technology. The substances are applied in a known manner to a carrier made of paper, plastic or metal foils in a known manner in dissolved form, optionally with the addition of suitable binders, with the addition of sensitizers, dyes, and polymerization inhibitors.
In addition to the production of copier material and planographic printing foils, the compounds according to the invention can be used for the production of etching layers, letterpress forms, printed circuits and the like. For the last-mentioned application forms in particular, it can be advantageous if the light-sensitive layer material as such in solid form or dissolved in suitable solvents such as ethyl glycol, butyl acetate, methyl ethyl ketone and the like. a. is present and is only applied to the desired carrier immediately before use.
The following examples are intended to illustrate the invention as an embodiment without thereby limiting it. <I> Example 1 </I> 5 g of 9- (w-methoxy-buteninyl) -anthraquinol-9, obtained by ethinating anthraquinone with methoxy-butenine in liquid ammonia, are mixed with 1 g of commercially available phenolic resin (cresol-formaldehyde - Condensate) dissolved in 320 ml of acetone and 180 ml of butyl acetate and, with this solution, suitable carrier films made of mechanically roughened aluminum are homogeneously coated and dried. The films are exposed for 5 minutes under a negative original using a commercially available mixed light lamp (e.g. Philips HPR 125 W, distance from lamp edge / layer 35 cm).
An immediately legible, deep orange-brown negative image is obtained.
The non-image areas can then be easily removed with a weakly alkaline stripper (e.g. according to DAS 1193 366), whereby only the image areas that have been polymerized remain. After a coloring with bold printing ink, long runs can be printed with such a printing film on an offset printing machine, which show an unusually good raster reproduction.
<I> Example 2 </I> 250 mg of 9- (w-methoxy-butenynyl) -2-chloro-anthraquinol-9, represented by ethynation of 2-chloro-anthraquinone with methoxybutenine, are mixed with 50 mg of a commercially available maleic acid -Styrene copolymer dissolved in 20 ml of acetone (containing 20% butyl acetate). With this solution, a carrier film made of electrolytically roughened aluminum (e.g. red leaf) is evenly coated in subdued light and dried with warm air. Under a negative original, the film sensitized in this way is exposed for 4 minutes with a xenon lamp (eg Xenokop) customary in the blueprint trade.
It is a sharp, deep brown colored image from the template on a light background. With a weakly alcoholic stripper (1% Na2SiO3 solution in a mixture of 20 parts by volume of water, 20 parts of methanol, 10 parts of glycol, 10 parts of glycerine), the non-image areas can again be easily removed, and the finished stencil can be wiped over with be colored with a conventional hydrophilizing agent with a greasy color. This print film also shows an unusually good reproduction of even the finest screens. The result is similar when using 9-methoxybuteninyl-1-chloroanthraquinol (9) instead of the 2-chloro isomer.
<I> Example 3 </I> With otherwise the same procedure, 9-phenethinyl-5-aminoanthraquinol-9 is used as the light-sensitive compound together with a phenol-formaldehyde resin modified by chloroacetic acid in amounts analogous to that described in Example 1 . It was exposed for 5 min under a xenon lamp and a brown-colored, sharp image on a light yellow background was obtained. The printing stencil largely corresponds to the examples described above in terms of properties and performance.
Printing templates produced using 9-butenynyl-2-hydroxyanthraquinol or 1-butenynyl-2-methylnaphthoquinol (1) are of almost the same quality.
<I> Example 4 </I> 250 mg of 9-buteninyl-anthraquinol-9 are dissolved with 400 mg of cresol-formaldehyde resin in 25 ml of acetone (with 20% butyl acetate) and, as described above, are applied to a support in subdued light Evenly layered mechanically roughened aluminum. Exposure, development and preparation of the plate for printing are carried out in the same way as described under Example 2. The color of the image obtained from the original is a little paler than in the cases described, the properties of this copy layer correspond to those of the previous examples.
<I> Example 5 </I> On a flat carrier made of electrically insulating material, e.g. B. Pertinax (phenolic laminate with paper insert), which is coated on the surface with a thin skin of metallic copper, is layered evenly from a centrifuge, which rotates at approx. 120 rpm, in a darkened room, the sensitizing solution.
The solution is prepared from 0.5 g of 2-chloro-9- (w-methoxy-buteninyl) -anthraquinol-9 and 0.2 g of the cresol-formaldehyde polycondensate in 20 ml of acetone-butyl acetate mixture. The sensitized and dried support is exposed under a negative original of an electrical circuit diagram, e.g. B. 5 min under a xenon lamp and then, as described above, wiped with a weakly alkaline stripper to remove the non-image areas. Since after is rinsed with water, dried and in an etchant, for. B. 35% Fe (III) chloride solution, etched away the exposed copper layer.
This gives, if necessary, after rinsing again with a solvent, an excellent metallic conductor track on the carrier, which can be used as a copied circuit.
<I> Example 6 </I> The sensitizing solution prepared in the same way as described in Example 5 is applied to a cleaned one-step etched zinc plate and the coated zinc plate is exposed similarly to the above, but under a grid template, and as described developed. To stabilize the layer, a further heating step (for example 3 min at 180 ° C.) can follow. The zinc plate is now deepened in a single-stage etching machine with nitric acid, which contains a standard flank protection agent.
The high printing plate or cliché obtained shows excellent layer adhesion even in the fine areas of the screen and, if necessary, after treatment with a solvent, can be used to remove remaining layer portions for printing high editions.
<I> Example 7 </I> In a small quartz bulb, 30 mg of 9-phenethylanthraquinol-9 are dissolved in 2 ml of triethylene glycol diacrylate and the solution is freed of oxygen by introducing nitrogen. While cooling with a little ice water, the sample is exposed under a charcoal arc lamp (150 V, 18 amperes, distance from the bulb to the edge of the lamp 35 cm).
After an exposure time of 3-5 seconds, the contents of the vial have polymerized and solidified. The experiment can be carried out similarly using 0-methyl-9-butenynyl-2-methoxy-anthraquinol (9) (No. 10 in the table) or 0-acetyl-9-butenynyl-anthraquinol (9) (No. 11 of the table) and also with 2-phenyl-l-butenynyl-naphthoquinol (1) (No. 12 of the table).
Here, too, the contents of the vial have solidified within a very short time after the start of exposure- <I> Example 8 </I> A solution of 400 mg of a commercially available maleic acid-styrene copolymer is applied to a carrier made of a thin aluminum foil, the surface of which is mechanically roughened. e.g.
LYTRON), 200 mg of a copolymer of α-methylstyrene and vinyltoluene (PICOTEX), 35 mg of polyvinylbutyral (MOWITAL), 40 mg of 9-phenäthinyl-anthraquinol-9 and 500 mg of triethylene glycol diacrylate and 3 mg of hydroquinone monomethyl ketone in 9 ml of methyl ether evenly applied and dried using a plate spinner common in repro technology. A thin coat of polyvinyl alcohol is then applied.
This film sensitized in this way is then exposed for 5 minutes with a xenon lamp (380 V, 25 amperes). Briefly wiping over with a weakly alkaline developer (1% solution of trisodium phosphate in water) removes the non-image areas of the layer and exposes the carrier. In order to improve the water flow of the carrier, a hydrophilizing agent can be wiped over and then colored with printing ink. From the offset plate obtained, who received the perfect prints in large numbers.
<I> Example 9 </I> 60 mg of 9-phenethyl-2-chloroanthraquinol-9, 450 mg of a polyvinyl acetate containing carboxyl groups (Mowilith C + 5), 30 mg of polyvinyl acetate (Mowilith 50), 20 mg of a cellulose acetate butyrate (Cellit BP 900), 500 mg of trimethylolpropane triacrylate and 3 mg of hydroquinone monomethyl ether, dissolved in 9 ml of methyl ethyl ketone, are coated in the usual way on a carrier film made of electrolytically roughened aluminum (red leaf) and dried.
After applying a thin overcoat of polyvinyl alcohol that inhibits the diffusion of oxygen, exposure is carried out for 5 min under a screen template with a xenon lamp as described above and the printing film is developed by wiping over a 3% solution of disodium phosphate. After hydrophilizing and coloring in the usual way, the plate can be used for printing. The reproduction of even the finest halftone dots is excellent, and because of the toughness and excellent adhesion of the layer, the number of copies is reached.
The same results are obtained when using 9-ethynyl-1-nitroanthraquinol (9) or 9-butenynyl-1-nitro-4-amino-anthraquinol (9).
Examples 10 and 11 Instead of the activator according to the invention used in Example 8, 9-hexynyl-2-chloroanthraquinol-9 or else 9-hexynylanthraquinol (-9) is used, otherwise the procedure is similar. Instead of the activator used in Example 9, 9- (w-methoxy-buteninyl) -2-chloroanthraquinol can also be used; in this case, the image elements are recognizable with a particularly deep color after exposure, which makes it easier to follow the development process.
Example 12 A carrier film made of electrolytically roughened aluminum is pre-coated with a 0.5% solution of polyvinyl phosphoric acid in methyl glycol / water (90:10). After drying, a solution of 200 mg of 9-hexynyl-2-chloro-anthraquinol-9, 2.5 g of polymethyl methacrylate, 2.5 g of trimethylolpropane triacrylate and 200 mg of low molecular weight polyglycol and 3 mg of the inhibitor in 20 ml is applied Methyl ethyl ketone. After drying and overlaying with polyvinyl alcohol, it is exposed for 11/2 min with a xenon lamp under a 10-step gray wedge (UGRA wedge, St. Gallen, Switzerland).
The non-image areas are immersed for one minute in a solution of 5% Na3PO4. 12 H2O dissolved away in highly diluted isopropanol and then dried, hydrophilized and colored with printing ink. The step wedge is blackened up to the 4th full tone level.
<I> Example 13 </I> 500 mg of polyamide (Ultramid Ic from BASF) are brought into solution by prolonged stirring at room temperature in a mixture of 4 ml of methanol and 1 ml of water. A solution of 200 mg of ethylene bisacrylamide and 40 mg of 9-hexynyl-2-chloro-anthraquinol in 4 ml of methylglycol is added and a carrier film made of electrolytically roughened aluminum is coated with it. Overcoating with polyvinyl alcohol and exposure are carried out as in Example 9. To remove the non-image areas, the printing film is rinsed with water and carefully passed through a bath with dilute methanol (85%).
The image-wise developed layer is very soft and vulnerable when leaving the bath, but dries quickly through hard and then, after hydrophilizing the exposed substrate with very dilute phosphoric acid, results in an extremely resistant oleophilic relief that provides excellent impressions. <I> Example 14 </I> 700 mg of the prepolymerized diallyl isophthalate resin (Dapon M) commercially available from the company CIBA / Basel, which is still soluble in organic solvents, are dissolved in 8 ml of technical xylene and mixed with a solution of 40 mg 9- Hexinyl-2-chloroanthraquinol 9 in 2 ml of methyl ethyl ketone was added.
This is used to coat a carrier film made of mechanically roughened aluminum and, after drying, exposed under a line template with a tube exposure device (6 Philips TLA fluorescent tubes, type 20 W / 05 with glass cover) for 6 min. This is followed by immersion development in technical xylene. After the plate has dried, the exposed support can be hydrophilized with an aqueous solution of 7% gum arabic and 0.3% hydrofluoric acid. After coloring with printing ink, the plate is ready for printing.
<I> Example 15 </I> A solution of 350 mg of a styrene-maleic acid copolymer (Lytron), 200 mg of a copolymer of α-methylstyrene and vinyl toluene (Picotex), 35 mg of polyvinyl butyral (Mowital), 500 mg of Tri - Methylolpropane triacrylate, 3 mg Hydroquinone monome thylether and 40 mg 9-Phenäthinylanthraquinol-9 in 7 ml methyl ethyl ketone is applied evenly to a cleaned one-stage zinc plate and the coated zinc plate under a grid template, as described in Example 8, exposed and further treated.
The fully developed plate can also be subjected to a heating step (1-2 min 100 C) in order to further solidify the layer; However, this is not necessary. The zinc plate is now deepened in a single-stage etching machine with nitric acid, which contains a flank protection agent. The letterpress plate or cliché obtained shows excellent layer adhesion, even in the fine areas of the screen, and, if necessary, after treatment with a solvent, can be used to remove the remaining layer portions for printing high editions.
<I> Example 16 </I> The same sensitizing solution as in Example 15, only instead of the 9-Phenäthinylanthraquinol-9 with 200 mg of 9- (w-methoxybuteninyl) -2-chloroanthraquinol, is on a suitable flat support made of electrically insulating material , e.g. B. Pertinax (phenolic laminate with paper insert), which is superficially coated with a thin skin of metallic copper, is layered in a darkened room using a plate spinner rotating at approx. 120 rpm. The so sensitized, dried and provided with a thin coating of polyvinyl alcohol is then exposed under a negative original of a corresponding electrical circuit diagram, z. B.
5 min on a xenon lamp, and then the non-image areas, as described, with a weakly alkaline developer, e.g. B. 1% sodium phosphate solution, dissolved away by briefly wiping it over. After rinsing and drying, the now exposed copper layer is etched away in the non-image areas by bathing in a 35% ferric chloride solution. If necessary, after rinsing again with a solvent, a clean and faithful metallic conductor track is obtained on the carrier, which can be used as a copied scarf device.
EMI0005.0008
EMI0005.0009
EMI0005.0010
Claims (1)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1597626 | 1967-11-09 | ||
SE08877/68A SE356610B (en) | 1968-06-28 | 1968-06-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH504022A true CH504022A (en) | 1971-02-28 |
Family
ID=25753441
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1680568A CH504022A (en) | 1967-11-09 | 1968-11-11 | Light-sensitive matls. contg. photopolymerisable cpds. |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS4643946B1 (en) |
CH (1) | CH504022A (en) |
DK (1) | DK125218B (en) |
ES (1) | ES360013A1 (en) |
Families Citing this family (158)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4130030B2 (en) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative compound |
US7282321B2 (en) | 2003-03-26 | 2007-10-16 | Fujifilm Corporation | Lithographic printing method and presensitized plate |
JP4291638B2 (en) | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | Alkali-soluble polymer and planographic printing plate precursor using the same |
US20050153239A1 (en) | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
EP1747500A2 (en) | 2004-05-19 | 2007-01-31 | Fuji Photo Film Co. Ltd. | Image recording method |
EP1602982B1 (en) | 2004-05-31 | 2013-12-18 | FUJIFILM Corporation | Planographic printing method |
JP4452572B2 (en) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | Photosensitive composition and image recording method using the same |
US7146909B2 (en) | 2004-07-20 | 2006-12-12 | Fuji Photo Film Co., Ltd. | Image forming material |
US7425406B2 (en) | 2004-07-27 | 2008-09-16 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
DE602005005403T2 (en) | 2004-08-24 | 2009-04-23 | Fujifilm Corp. | Process for the preparation of a lithographic printing plate |
JP2006062188A (en) | 2004-08-26 | 2006-03-09 | Fuji Photo Film Co Ltd | Color image forming material and original plate of lithographic printing plate |
JP4429116B2 (en) | 2004-08-27 | 2010-03-10 | 富士フイルム株式会社 | Planographic printing plate precursor and lithographic printing plate making method |
JP2006068963A (en) | 2004-08-31 | 2006-03-16 | Fuji Photo Film Co Ltd | Polymerizable composition, hydrophilic film using this composition and original lithographic printing plate |
JP5089866B2 (en) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | Planographic printing method |
US20060150846A1 (en) | 2004-12-13 | 2006-07-13 | Fuji Photo Film Co. Ltd | Lithographic printing method |
JP2006181838A (en) | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | Original plate of lithographic printing plate |
EP1798031A3 (en) | 2005-01-26 | 2007-07-04 | FUJIFILM Corporation | Lithographic printing plate precursor and lithographic printing method |
EP3086176A1 (en) | 2005-02-28 | 2016-10-26 | Fujifilm Corporation | A lithographic printing method |
JP4469741B2 (en) | 2005-03-03 | 2010-05-26 | 富士フイルム株式会社 | Planographic printing plate precursor |
EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
JP4538350B2 (en) | 2005-03-18 | 2010-09-08 | 富士フイルム株式会社 | Photosensitive composition, image recording material, and image recording method |
JP4574506B2 (en) | 2005-03-23 | 2010-11-04 | 富士フイルム株式会社 | Planographic printing plate precursor and its plate making method |
JP4524235B2 (en) | 2005-03-29 | 2010-08-11 | 富士フイルム株式会社 | Planographic printing plate precursor |
JP4474317B2 (en) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
JP4792326B2 (en) | 2005-07-25 | 2011-10-12 | 富士フイルム株式会社 | Planographic printing plate preparation method and planographic printing plate precursor |
JP4815270B2 (en) | 2005-08-18 | 2011-11-16 | 富士フイルム株式会社 | Method and apparatus for producing a lithographic printing plate |
JP4759343B2 (en) | 2005-08-19 | 2011-08-31 | 富士フイルム株式会社 | Planographic printing plate precursor and planographic printing method |
JP4694324B2 (en) | 2005-09-09 | 2011-06-08 | 富士フイルム株式会社 | Method for producing photosensitive lithographic printing plate |
JP5171005B2 (en) | 2006-03-17 | 2013-03-27 | 富士フイルム株式会社 | Polymer compound, method for producing the same, and pigment dispersant |
JP4777226B2 (en) | 2006-12-07 | 2011-09-21 | 富士フイルム株式会社 | Image recording materials and novel compounds |
US8771924B2 (en) | 2006-12-26 | 2014-07-08 | Fujifilm Corporation | Polymerizable composition, lithographic printing plate precursor and lithographic printing method |
JP2008163081A (en) | 2006-12-27 | 2008-07-17 | Fujifilm Corp | Laser-decomposable resin composition and pattern-forming material and laser-engravable flexographic printing plate precursor using the same |
JP4945432B2 (en) | 2006-12-28 | 2012-06-06 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
JP2009080445A (en) | 2007-01-17 | 2009-04-16 | Fujifilm Corp | Method for preparing lithographic printing plate |
JP4881756B2 (en) | 2007-02-06 | 2012-02-22 | 富士フイルム株式会社 | Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dye |
ATE471812T1 (en) | 2007-03-23 | 2010-07-15 | Fujifilm Corp | NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING PROCESS THEREFROM |
JP4860525B2 (en) | 2007-03-27 | 2012-01-25 | 富士フイルム株式会社 | Curable composition and planographic printing plate precursor |
JP2008238711A (en) | 2007-03-28 | 2008-10-09 | Fujifilm Corp | Hydrophilic member, and undercoating composition |
EP1974914B1 (en) | 2007-03-29 | 2014-02-26 | FUJIFILM Corporation | Method of preparing lithographic printing plate |
JP5030638B2 (en) | 2007-03-29 | 2012-09-19 | 富士フイルム株式会社 | Color filter and manufacturing method thereof |
EP1975710B1 (en) | 2007-03-30 | 2013-10-23 | FUJIFILM Corporation | Plate-making method of lithographic printing plate precursor |
EP1975706A3 (en) | 2007-03-30 | 2010-03-03 | FUJIFILM Corporation | Lithographic printing plate precursor |
JP5046744B2 (en) | 2007-05-18 | 2012-10-10 | 富士フイルム株式会社 | Planographic printing plate precursor and printing method using the same |
EP2006738B1 (en) | 2007-06-21 | 2017-09-06 | Fujifilm Corporation | Lithographic printing plate precursor |
US8426102B2 (en) | 2007-06-22 | 2013-04-23 | Fujifilm Corporation | Lithographic printing plate precursor and plate making method |
ATE484386T1 (en) | 2007-07-02 | 2010-10-15 | Fujifilm Corp | FLAT PRINTING PLATE PRECURSOR AND FLAT PRINTING PROCESS THEREFROM |
JP5213375B2 (en) | 2007-07-13 | 2013-06-19 | 富士フイルム株式会社 | Pigment dispersion, curable composition, color filter using the same, and solid-state imaging device |
EP2207062B1 (en) | 2007-07-17 | 2012-09-12 | FUJIFILM Corporation | Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors |
JP2009069761A (en) | 2007-09-18 | 2009-04-02 | Fujifilm Corp | Plate making method for planographic printing plate |
JP2009091555A (en) | 2007-09-18 | 2009-04-30 | Fujifilm Corp | Curable composition, image forming material and planographic printing plate precursor |
US20100286353A1 (en) | 2007-09-19 | 2010-11-11 | Fujifilm Corporation | Acetylene compound, salt thereof, condensate thereof, and composition thereof |
JP5002399B2 (en) | 2007-09-28 | 2012-08-15 | 富士フイルム株式会社 | Processing method of lithographic printing plate precursor |
JP4994175B2 (en) | 2007-09-28 | 2012-08-08 | 富士フイルム株式会社 | Planographic printing plate precursor and method for producing copolymer used therefor |
US7955781B2 (en) | 2007-09-28 | 2011-06-07 | Fujifilm Corporation | Negative-working photosensitive material and negative-working planographic printing plate precursor |
JP4890408B2 (en) | 2007-09-28 | 2012-03-07 | 富士フイルム株式会社 | Polymerizable composition, lithographic printing plate precursor using the same, alkali-soluble polyurethane resin, and method for producing diol compound |
JP4951454B2 (en) | 2007-09-28 | 2012-06-13 | 富士フイルム株式会社 | How to create a lithographic printing plate |
EP2042311A1 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method |
JP5055077B2 (en) | 2007-09-28 | 2012-10-24 | 富士フイルム株式会社 | Image forming method and planographic printing plate precursor |
JP5244518B2 (en) | 2007-09-28 | 2013-07-24 | 富士フイルム株式会社 | Planographic printing plate precursor and lithographic printing plate preparation method |
JP5322537B2 (en) | 2007-10-29 | 2013-10-23 | 富士フイルム株式会社 | Planographic printing plate precursor |
ATE526366T1 (en) | 2007-10-31 | 2011-10-15 | Fujifilm Corp | COLORED CURABLE COMPOSITION, COLOR FILTER, PRODUCTION METHOD THEREOF AND SOLID STATE IMAGE RECORDING DEVICE |
US8361702B2 (en) | 2007-11-08 | 2013-01-29 | Fujifilm Corporation | Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
WO2009063824A1 (en) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | Method of drying coating film and process for producing lithographic printing plate precursor |
JP2009139852A (en) | 2007-12-10 | 2009-06-25 | Fujifilm Corp | Method of preparing lithographic printing plate and lithographic printing plate precursor |
JP2009186997A (en) | 2008-01-11 | 2009-08-20 | Fujifilm Corp | Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method |
JP5155677B2 (en) | 2008-01-22 | 2013-03-06 | 富士フイルム株式会社 | Planographic printing plate precursor and its plate making method |
JP5500831B2 (en) | 2008-01-25 | 2014-05-21 | 富士フイルム株式会社 | Method for preparing relief printing plate and printing plate precursor for laser engraving |
JP5241252B2 (en) | 2008-01-29 | 2013-07-17 | 富士フイルム株式会社 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate |
JP5371449B2 (en) | 2008-01-31 | 2013-12-18 | 富士フイルム株式会社 | Resin, pigment dispersion, colored curable composition, color filter using the same, and method for producing the same |
JP2009184188A (en) | 2008-02-05 | 2009-08-20 | Fujifilm Corp | Lithographic printing original plate and printing method |
JP5150287B2 (en) | 2008-02-06 | 2013-02-20 | 富士フイルム株式会社 | Preparation method of lithographic printing plate and lithographic printing plate precursor |
JP5137618B2 (en) | 2008-02-28 | 2013-02-06 | 富士フイルム株式会社 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate |
EP2095970A1 (en) | 2008-02-29 | 2009-09-02 | Fujifilm Corporation | Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
JP5448352B2 (en) | 2008-03-10 | 2014-03-19 | 富士フイルム株式会社 | Colored curable composition, color filter, and solid-state imaging device |
JP5175582B2 (en) | 2008-03-10 | 2013-04-03 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
JP2009214428A (en) | 2008-03-11 | 2009-09-24 | Fujifilm Corp | Original plate of lithographic printing plate and lithographic printing method |
JP5334624B2 (en) | 2008-03-17 | 2013-11-06 | 富士フイルム株式会社 | Colored curable composition, color filter, and method for producing color filter |
EP2270110B1 (en) | 2008-03-17 | 2015-02-25 | FUJIFILM Corporation | Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display element, and solid image pickup element |
KR20090100262A (en) | 2008-03-18 | 2009-09-23 | 후지필름 가부시키가이샤 | Photosensitive resin composition, light-shielding color filter and manufacturing method thereof, and solid-state image pickup device |
JP5305704B2 (en) | 2008-03-24 | 2013-10-02 | 富士フイルム株式会社 | Novel compound, photopolymerizable composition, photopolymerizable composition for color filter, color filter and method for producing the same, solid-state imaging device, and lithographic printing plate precursor |
JP5422146B2 (en) | 2008-03-25 | 2014-02-19 | 富士フイルム株式会社 | Processing solution for preparing a lithographic printing plate and processing method of a lithographic printing plate precursor |
JP2009236942A (en) | 2008-03-25 | 2009-10-15 | Fujifilm Corp | Planographic printing plate precursor and plate making method of the same |
JP5264427B2 (en) | 2008-03-25 | 2013-08-14 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
JP2009258705A (en) | 2008-03-25 | 2009-11-05 | Fujifilm Corp | Original plate of lithographic printing plate |
JP2009236355A (en) | 2008-03-26 | 2009-10-15 | Fujifilm Corp | Drying method and device |
JP5183268B2 (en) | 2008-03-27 | 2013-04-17 | 富士フイルム株式会社 | Planographic printing plate precursor |
JP5173528B2 (en) | 2008-03-28 | 2013-04-03 | 富士フイルム株式会社 | Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device |
JP5322575B2 (en) | 2008-03-28 | 2013-10-23 | 富士フイルム株式会社 | Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method for producing relief printing plate |
JP2009244421A (en) | 2008-03-28 | 2009-10-22 | Fujifilm Corp | Plate-making method of lithographic printing plate |
JP5507054B2 (en) | 2008-03-28 | 2014-05-28 | 富士フイルム株式会社 | Polymerizable composition, color filter, method for producing color filter, and solid-state imaging device |
EP2105298B1 (en) | 2008-03-28 | 2014-03-19 | FUJIFILM Corporation | Negative-working lithographic printing plate precursor and method of lithographic printing using same |
JP5528677B2 (en) | 2008-03-31 | 2014-06-25 | 富士フイルム株式会社 | Polymerizable composition, light-shielding color filter for solid-state image sensor, solid-state image sensor, and method for producing light-shielding color filter for solid-state image sensor |
JP4914864B2 (en) | 2008-03-31 | 2012-04-11 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
JP5305793B2 (en) | 2008-03-31 | 2013-10-02 | 富士フイルム株式会社 | Relief printing plate and method for producing relief printing plate |
US20090260531A1 (en) | 2008-04-18 | 2009-10-22 | Fujifilm Corporation | Aluminum alloy plate for lithographic printing plate, lithographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support |
KR101441998B1 (en) | 2008-04-25 | 2014-09-18 | 후지필름 가부시키가이샤 | Polymerizable composition, light shielding color filter, black curable composition, light shielding color filter for solid-state imaging device, method of manufacturing the same, and solid-state imaging device |
JP5222624B2 (en) | 2008-05-12 | 2013-06-26 | 富士フイルム株式会社 | Black photosensitive resin composition, color filter, and method for producing the same |
JP5171506B2 (en) | 2008-06-30 | 2013-03-27 | 富士フイルム株式会社 | NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER, PROCESS FOR PRODUCING THE SAME, SOLID-STATE IMAGING ELEMENT, AND lithographic printing plate |
JP5296434B2 (en) | 2008-07-16 | 2013-09-25 | 富士フイルム株式会社 | Master for lithographic printing plate |
AU2009283446B2 (en) | 2008-08-22 | 2014-12-04 | Fujifilm Corporation | Process for producing lithographic printing plate |
JP5364513B2 (en) | 2008-09-12 | 2013-12-11 | 富士フイルム株式会社 | Developer for lithographic printing plate precursor and method for producing lithographic printing plate |
JP5398282B2 (en) | 2008-09-17 | 2014-01-29 | 富士フイルム株式会社 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, method for producing relief printing plate, and relief printing plate |
JP5466462B2 (en) | 2008-09-18 | 2014-04-09 | 富士フイルム株式会社 | Planographic printing plate precursor, method for producing a planographic printing plate, and planographic printing plate |
JP2010097175A (en) | 2008-09-22 | 2010-04-30 | Fujifilm Corp | Method of preparing lithographic printing plate and lithographic printing plate precursor |
JP5408942B2 (en) | 2008-09-22 | 2014-02-05 | 富士フイルム株式会社 | Planographic printing plate precursor and plate making method |
JP5449898B2 (en) | 2008-09-22 | 2014-03-19 | 富士フイルム株式会社 | Planographic printing plate precursor and printing method using the same |
WO2010035697A1 (en) | 2008-09-24 | 2010-04-01 | 富士フイルム株式会社 | Process for producing lithographic printing plate |
US8151705B2 (en) | 2008-09-24 | 2012-04-10 | Fujifilm Corporation | Method of preparing lithographic printing plate |
JP2010102322A (en) | 2008-09-26 | 2010-05-06 | Fujifilm Corp | Method for making lithographic printing plate |
JP5171514B2 (en) | 2008-09-29 | 2013-03-27 | 富士フイルム株式会社 | Colored curable composition, color filter, and method for producing color filter |
JP5127651B2 (en) | 2008-09-30 | 2013-01-23 | 富士フイルム株式会社 | Colored curable composition, color filter, method for producing the same, and solid-state imaging device |
JP5340102B2 (en) | 2008-10-03 | 2013-11-13 | 富士フイルム株式会社 | Dispersion composition, polymerizable composition, light-shielding color filter, solid-state imaging device, liquid crystal display device, wafer level lens, and imaging unit |
WO2010061869A1 (en) | 2008-11-26 | 2010-06-03 | 富士フイルム株式会社 | Method for manufacturing lithographic printing plate, developer for original lithographic printing plate, and replenisher for developing original lithographic printing plate |
EP2204698B1 (en) | 2009-01-06 | 2018-08-08 | FUJIFILM Corporation | Plate surface treatment agent for lithographic printing plate and method for treating lithographic printing plate |
JP5669386B2 (en) | 2009-01-15 | 2015-02-12 | 富士フイルム株式会社 | NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER, PROCESS FOR PRODUCING THE SAME, SOLID-STATE IMAGING ELEMENT, AND lithographic printing plate precursor |
JP5554106B2 (en) | 2009-03-31 | 2014-07-23 | 富士フイルム株式会社 | Colored curable composition, method for producing color filter, color filter, solid-state imaging device, and liquid crystal display device |
JP5535814B2 (en) | 2009-09-14 | 2014-07-02 | 富士フイルム株式会社 | Photopolymerizable composition, color filter, and method for producing the same, solid-state imaging device, liquid crystal display device, planographic printing plate precursor, and novel compound |
JP5701576B2 (en) | 2009-11-20 | 2015-04-15 | 富士フイルム株式会社 | Dispersion composition, photosensitive resin composition, and solid-state imaging device |
JP2012003225A (en) | 2010-01-27 | 2012-01-05 | Fujifilm Corp | Polymerizable composition for solder resist and method for forming solder resist pattern |
JP5525873B2 (en) | 2010-03-15 | 2014-06-18 | 富士フイルム株式会社 | Preparation method of lithographic printing plate |
JP2011221522A (en) | 2010-03-26 | 2011-11-04 | Fujifilm Corp | Method for manufacturing lithograph printing plate |
JP5049366B2 (en) | 2010-03-29 | 2012-10-17 | 富士フイルム株式会社 | Laser engraving flexographic printing plate precursor |
JP5791874B2 (en) | 2010-03-31 | 2015-10-07 | 富士フイルム株式会社 | COLORING COMPOSITION, INKJET INK, COLOR FILTER AND ITS MANUFACTURING METHOD, SOLID-STATE IMAGING DEVICE, AND DISPLAY DEVICE |
JP5457955B2 (en) | 2010-06-28 | 2014-04-02 | 富士フイルム株式会社 | Laser engraving resin composition, laser engraving relief printing plate precursor, laser engraving relief printing plate precursor, and relief printing plate making method |
JP5544239B2 (en) | 2010-07-29 | 2014-07-09 | 富士フイルム株式会社 | Polymerizable composition |
JP2012068357A (en) | 2010-09-22 | 2012-04-05 | Eastman Kodak Co | Lithographic printing plate precursor |
JP5274598B2 (en) | 2011-02-22 | 2013-08-28 | 富士フイルム株式会社 | Composition for laser engraving, relief printing plate precursor, method for making relief printing plate, and relief printing plate |
JP5705584B2 (en) | 2011-02-24 | 2015-04-22 | 富士フイルム株式会社 | Planographic printing plate making method |
JP5255100B2 (en) | 2011-07-29 | 2013-08-07 | 富士フイルム株式会社 | Laser engraving type flexographic printing plate precursor and manufacturing method thereof, and flexographic printing plate and plate making method thereof |
JP5438074B2 (en) | 2011-08-12 | 2014-03-12 | 富士フイルム株式会社 | Method for producing flexographic printing plate precursor for laser engraving |
EP2565037B1 (en) | 2011-08-31 | 2014-10-01 | Fujifilm Corporation | Process for producing flexographic printing plate precursor for laser engraving, and process for making flexographic printing plate |
JP5690696B2 (en) | 2011-09-28 | 2015-03-25 | 富士フイルム株式会社 | Planographic printing plate making method |
CN103135345A (en) | 2011-11-28 | 2013-06-05 | 富士胶片株式会社 | Resin composition for laser engraving, flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same |
JP5466689B2 (en) | 2011-11-30 | 2014-04-09 | 富士フイルム株式会社 | Resin composition for flexographic printing plate, flexographic printing plate precursor and production method thereof, and flexographic printing plate and production method thereof |
JP5922013B2 (en) | 2011-12-28 | 2016-05-24 | 富士フイルム株式会社 | Optical member set and solid-state imaging device using the same |
JP5976523B2 (en) | 2011-12-28 | 2016-08-23 | 富士フイルム株式会社 | Optical member set and solid-state imaging device using the same |
CN104093572A (en) | 2012-01-31 | 2014-10-08 | 富士胶片株式会社 | Resin composition for laser-engravable flexographic printing plate, original plate for laser-engravable flexographic printing plate and method for production thereof, and flexographic printing plate and method for production thereof |
JP5703417B2 (en) | 2012-03-29 | 2015-04-22 | 富士フイルム株式会社 | Planographic printing plate precursor and printing method thereof |
JP2013240998A (en) | 2012-04-27 | 2013-12-05 | Fujifilm Corp | Resin composition for laser engraving, process for producing relief printing plate precursor for laser engraving, relief printing plate precursor, process for making relief printing plate and relief printing plate |
JP5894943B2 (en) | 2012-08-31 | 2016-03-30 | 富士フイルム株式会社 | Dispersion composition, curable composition using the same, transparent film, microlens, method for producing microlens, and solid-state imaging device |
JP5909468B2 (en) | 2012-08-31 | 2016-04-26 | 富士フイルム株式会社 | Dispersion composition, curable composition using the same, transparent film, microlens, and solid-state imaging device |
EP2975461B1 (en) | 2013-03-14 | 2017-08-16 | Fujifilm Corporation | Concentrating method for platemaking waste fluid and recycling method |
JP2015047744A (en) | 2013-08-30 | 2015-03-16 | 富士フイルム株式会社 | Resin composition for laser engraving, manufacturing method of relief printing plate original plate for laser engraving, relief printing plate original plate, platemaking method of relief printing plate and relief printing plate |
JP2015047743A (en) | 2013-08-30 | 2015-03-16 | 富士フイルム株式会社 | Resin composition for laser engraving, manufacturing method of flexographic printing plate original plate for laser engraving, flexographic printing plate original plate, platemaking method of flexographic printing plate and flexographic printing plate |
EP3045320A4 (en) | 2013-09-13 | 2017-05-31 | Fujifilm Corporation | Method for manufacturing flexographic printing original plate for laser engraving, method for manufacturing flexographic printing plate, and laser engraving resin composition |
WO2015046297A1 (en) | 2013-09-26 | 2015-04-02 | 富士フイルム株式会社 | Resin composition for laser engraving, flexographic printing original plate for laser engraving, method for producing flexographic printing original plate for laser engraving, flexographic printing plate, and method for making flexographic printing plate |
JP2015123714A (en) | 2013-12-27 | 2015-07-06 | 富士フイルム株式会社 | Resin composition for laser-engraving, original plate for laser-engravable flexographic printing plate and method for producing the same, and platemaking method for flexographic printing plate |
JP6061911B2 (en) | 2014-02-27 | 2017-01-18 | 富士フイルム株式会社 | Resin composition for laser engraving, flexographic printing plate precursor for laser engraving and method for producing the same, and plate making method for flexographic printing plate |
TWI634135B (en) | 2015-12-25 | 2018-09-01 | 日商富士軟片股份有限公司 | Resin, composition, cured film, method for producing cured film, and semiconductor element |
TWI830588B (en) | 2016-08-01 | 2024-01-21 | 日商富士軟片股份有限公司 | Photosensitive resin composition, cured film, laminated body, manufacturing method of cured film, laminated body manufacturing method, and semiconductor element |
KR102365294B1 (en) | 2017-05-31 | 2022-02-21 | 후지필름 가부시키가이샤 | Method for producing photosensitive resin composition, polymer precursor, cured film, laminate, cured film, and semiconductor device |
WO2020066416A1 (en) | 2018-09-28 | 2020-04-02 | 富士フイルム株式会社 | Photosensitive resin composition, cured film, laminate, method for producing cured film, and semiconductor device |
CN113383273B (en) | 2018-12-05 | 2023-11-14 | 富士胶片株式会社 | Photosensitive resin composition, pattern forming method, cured film, laminate, and device |
KR102636334B1 (en) | 2018-12-05 | 2024-02-14 | 후지필름 가부시키가이샤 | Pattern formation method, photosensitive resin composition, cured film, laminate, and device |
JP7171890B2 (en) | 2019-03-15 | 2022-11-15 | 富士フイルム株式会社 | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and polymer precursor |
TWI859361B (en) | 2019-11-21 | 2024-10-21 | 日商富士軟片股份有限公司 | Pattern forming method, photocurable resin composition, laminate manufacturing method and electronic component manufacturing method |
TW202248755A (en) | 2021-03-22 | 2022-12-16 | 日商富士軟片股份有限公司 | Negative photosensitive resin composition, cured product, laminate, method for producing cured product, and semiconductor device |
EP4398289A4 (en) | 2021-08-31 | 2024-07-10 | FUJIFILM Corporation | METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND PROCESSING LIQUID |
-
1968
- 1968-11-04 DK DK534168A patent/DK125218B/en unknown
- 1968-11-08 ES ES360013A patent/ES360013A1/en not_active Expired
- 1968-11-09 JP JP8223368A patent/JPS4643946B1/ja active Pending
- 1968-11-11 CH CH1680568A patent/CH504022A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ES360013A1 (en) | 1970-10-16 |
DK125218B (en) | 1973-01-15 |
JPS4643946B1 (en) | 1971-12-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CH504022A (en) | Light-sensitive matls. contg. photopolymerisable cpds. | |
EP0374705B1 (en) | Photopolymerisable compounds, photopolymerisable mixtures containing them and photopolymerisable recording material manufactured therefrom | |
EP0137452B1 (en) | Light-sensitive compounds containing trichloromethyl groups, process for their preparation and light-sensitive mixture containing these compounds | |
DE2027467C3 (en) | Photopolymerizable copying compound | |
DE2039861C3 (en) | Photopolymerizable copying compound | |
DE2055157C3 (en) | Photopolymerizable mixture | |
DE2327513A1 (en) | LIGHT-SENSITIVE MIXTURE, IF NECESSARY, APPLIED TO A LAYER BASE | |
DE1572153B2 (en) | PHOTOPOLYMERIZABLE RECORDING MATERIAL | |
DE2821053C3 (en) | Light-curable recording material and image recording process which can be carried out therewith | |
EP0115021B1 (en) | Process for obtaining positive relief and printing formes | |
DE1797308C3 (en) | Photosensitive mixture | |
EP0003804A1 (en) | Photopolymerizable composition containing a monoazo dye | |
DE69129171T2 (en) | Process for the dimensional stabilization of photopolymer flexographic printing plates | |
EP0064733A1 (en) | Method for the production of relief copies | |
EP0053708B1 (en) | Process for the production of relief copies | |
EP0103218A1 (en) | 10-Phenyl-1,3,9-triazaanthracenes and photopolymerisable mixture containing these compounds | |
DE2306353A1 (en) | LIGHT SENSITIVE MATERIAL | |
DE3537380A1 (en) | PHOTOPOLYMERIZABLE MIXTURE AND CONTAINING PHOTOPOLYMERISABLE RECORDING MATERIAL | |
DE2710417C3 (en) | Photopolymerizable mixture and process for generating positive or negative images | |
DE69219752T2 (en) | Photoinitiator system and a photopolymerizable composition containing the same | |
DE1298414B (en) | Photosensitive mixture | |
DE1950120A1 (en) | Heterogeneous photopolymerizable mass | |
EP0102586B1 (en) | 1,3-diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixture containing these compounds | |
DE3000326A1 (en) | Photosensitive compsn. for printing plates - developable with aq. liq., comprising an epoxy!-acrylate! resin and a photoinitiator | |
DE2636581A1 (en) | PHOTORESIST AND PROCESS FOR ITS MANUFACTURING |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |