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BR9808899A - Bases fotoativáveis contendo nitrogênio à base de alfa-amino alquenos - Google Patents

Bases fotoativáveis contendo nitrogênio à base de alfa-amino alquenos

Info

Publication number
BR9808899A
BR9808899A BR9808899-8A BR9808899A BR9808899A BR 9808899 A BR9808899 A BR 9808899A BR 9808899 A BR9808899 A BR 9808899A BR 9808899 A BR9808899 A BR 9808899A
Authority
BR
Brazil
Prior art keywords
compounds
photoactivable
containing nitrogen
alpha
reactions
Prior art date
Application number
BR9808899-8A
Other languages
English (en)
Other versions
BR9808899B1 (pt
Inventor
Sean Colm Turner
Gisele Baudin
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR9808899A publication Critical patent/BR9808899A/pt
Publication of BR9808899B1 publication Critical patent/BR9808899B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyamides (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Paper (AREA)

Abstract

Patente de Invenção: <B>"BASES FOTOATIVáVEIS CONTENDO NITROGêNIO à BASE DE ALFA-AMINO ALQUENOS"<D>. A invenção refere-se a compostos orgânicos tendo um peso melecular de menos de 1000 compreendendo pelo menos uma unidade estrutural da fórmula (I) onde R~ 1~ é um radical aromático ou heteroaromático que é capaz de absorver luz na faixa de comprimento de onda de 200 a 650 nm e fazendo isso realiza clivagem da ligação carbono-nitrogênio adjacente. Os compostos representam fotoiniciadores para reações de base catalisável. Outros objetivos da invenção são composições de base polimerizável ou reticulável compreendendo compostos tendo uma unidade estrutural da fórmula I, um método de implementação de reações fotoquimicamente induzidas, com base catalisada, e o uso dos compostos como foto-iniciadores para reações de base catalisada.
BRPI9808899-8A 1997-03-18 1998-03-07 compostos orgánicos derivados de alfa-aminoalquenos, processo para sua preparação, composição, método de implementação de reações catalisadas por base, bem como substrato revestido. BR9808899B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH65297 1997-03-18
PCT/EP1998/001346 WO1998041524A1 (en) 1997-03-18 1998-03-07 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMINO ALKENES

Publications (2)

Publication Number Publication Date
BR9808899A true BR9808899A (pt) 2000-08-01
BR9808899B1 BR9808899B1 (pt) 2009-12-01

Family

ID=4192009

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI9808899-8A BR9808899B1 (pt) 1997-03-18 1998-03-07 compostos orgánicos derivados de alfa-aminoalquenos, processo para sua preparação, composição, método de implementação de reações catalisadas por base, bem como substrato revestido.

Country Status (12)

Country Link
US (1) US6087070A (pt)
EP (1) EP0970085B1 (pt)
JP (1) JP4308326B2 (pt)
KR (1) KR100527614B1 (pt)
CN (1) CN1128799C (pt)
AU (1) AU720834B2 (pt)
BR (1) BR9808899B1 (pt)
CA (1) CA2283446C (pt)
DE (1) DE69806739T2 (pt)
TW (1) TW466255B (pt)
WO (1) WO1998041524A1 (pt)
ZA (1) ZA982233B (pt)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000010964A1 (de) * 1998-08-21 2000-03-02 Ciba Specialty Chemicals Holding Inc. Photoaktivierbare stickstoffhaltige basen
JP2003528966A (ja) * 2000-03-28 2003-09-30 アクゾ ノーベル ナムローゼ フェンノートシャップ 光活性化可能なコーティング組成物及び環境温度で速い加工が可能な表面を有するコーティングを調製のために該組成物を用いる方法
DE60219812T8 (de) * 2001-10-17 2008-05-21 Ciba Specialty Chemicals Holding Inc. Photoaktivierbare stickstoffbasen
MXPA04009790A (es) * 2002-04-19 2004-12-13 Ciba Sc Holding Ag Curado de recubrimientos inducido por plasma.
EP1593728B1 (en) * 2004-05-03 2012-05-09 Rohm And Haas Company Michael addition compositions
EP1640388B1 (en) * 2004-09-24 2015-02-25 Rohm and Haas Company Biomass based Michael addition composition
BRPI0717655B1 (pt) * 2006-09-29 2018-12-18 Basf Se bases fotolatentes para sistema à base de isocianatos bloqueados
CN101641643B (zh) * 2007-04-03 2013-08-07 巴斯夫欧洲公司 可光活化的氮碱
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
JP5927750B2 (ja) 2013-07-18 2016-06-01 セメダイン株式会社 光硬化性組成物
EP3081612B1 (en) 2013-12-13 2018-11-14 Cemedine Co., Ltd. Photocurable composition having adhesive properties
CN107148458A (zh) 2014-10-29 2017-09-08 德莎欧洲公司 包含可活化的吸气剂材料的胶粘剂混合物
US10813831B2 (en) 2015-04-29 2020-10-27 Bsn Medical Gmbh Medical bathing device
BR112017023057B1 (pt) 2015-04-29 2023-03-28 Bsn Medical Gmbh Processo para preparação de no e processo cosmético
CN107531886B (zh) 2015-04-29 2020-08-07 3M创新有限公司 由多硫醇和聚环氧化合物制备聚合物网络的方法
EP3535341A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Polythiol sealant compositions
EP3535621A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
EP3535333A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
WO2018106531A1 (en) 2016-12-05 2018-06-14 Arkema Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
BR112019010869A2 (pt) 2018-04-26 2020-03-03 Henkel Ag & Co. Kgaa Composto de nitrogênio quaternário para uso como um catalisador latente em composições curáveis
EP3856849A1 (en) 2018-09-27 2021-08-04 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
DE3880868D1 (en) * 1987-03-26 1993-06-17 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
DE3825586A1 (de) * 1988-07-28 1990-02-01 Basf Ag Substituierte imidazolylmethyloxirane und substituierte imidazolylpropene, ihre herstellung und sie enthaltende fungizide
JP2583364B2 (ja) * 1990-06-19 1997-02-19 三菱電機株式会社 感光性樹脂組成物
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法

Also Published As

Publication number Publication date
CN1128799C (zh) 2003-11-26
EP0970085A1 (en) 2000-01-12
AU720834B2 (en) 2000-06-15
EP0970085B1 (en) 2002-07-24
KR100527614B1 (ko) 2005-11-15
DE69806739D1 (de) 2002-08-29
US6087070A (en) 2000-07-11
CA2283446C (en) 2008-05-06
KR20000076332A (ko) 2000-12-26
TW466255B (en) 2001-12-01
DE69806739T2 (de) 2003-03-13
ZA982233B (en) 1998-09-18
CA2283446A1 (en) 1998-09-24
WO1998041524A1 (en) 1998-09-24
AU7032798A (en) 1998-10-12
BR9808899B1 (pt) 2009-12-01
CN1251103A (zh) 2000-04-19
JP2001515500A (ja) 2001-09-18
JP4308326B2 (ja) 2009-08-05

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Legal Events

Date Code Title Description
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B15K Others concerning applications: alteration of classification

Free format text: ALTERADA DE INT.CL: C07D 487/04, C07C 211/27, C08K 5/3462, C08J 3/28, G03F 7/027

Ipc: C07D 487/04 (2008.04), C07C 211/09 (2008.04), C07C

B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 15/12/2009, OBSERVADAS AS CONDICOES LEGAIS.

B24H Lapse because of non-payment of annual fees (definitively: art 78 iv lpi)
B24F Patent annual fee: publication cancelled

Free format text: ANULADA A PUBLICACAO CODIGO 24.8 NA RPI NO 2259 DE 22/04/2014 POR TER SIDO INDEVIDA.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE AS 14A, 15A, 16A, 17A, 18A, 19A, 20A, 21A E 22A ANUIDADES.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2607 DE 22-12-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.