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BR0315651A - Co-iniciadores do ácido arilacético hetero-substituìdos para composições iv-sensìveis - Google Patents

Co-iniciadores do ácido arilacético hetero-substituìdos para composições iv-sensìveis

Info

Publication number
BR0315651A
BR0315651A BR0315651-6A BR0315651A BR0315651A BR 0315651 A BR0315651 A BR 0315651A BR 0315651 A BR0315651 A BR 0315651A BR 0315651 A BR0315651 A BR 0315651A
Authority
BR
Brazil
Prior art keywords
heterosubstituted
initiators
sensitive compositions
arylacetic acid
free radical
Prior art date
Application number
BR0315651-6A
Other languages
English (en)
Inventor
Heidi M Munnelly
Paul R West
Hans-Joachim Timpe
Ursula Muller
Jianbing Huang
Original Assignee
Kodak Polychrome Graphics Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Llc filed Critical Kodak Polychrome Graphics Llc
Publication of BR0315651A publication Critical patent/BR0315651A/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

"CO-INICIADORES DO áCIDO ARILACéTICO HETEROSUBSTITUìDOS PARA COMPOSIçõES IV-SENSìVEIS". Uma composição IV-sensível compreendendo, além de um ligante polimérico, um sistema polimerizável de radical livre consistindo de no mínimo um membro selecionado de monómeros polimerizáveis de radicais livres insaturados, oligómeros que são radicais livres polimerizáveis e polímeros contendo ligações C=C na estrutura e/ou nos grupos de cadeia lateral e um sistema iniciador, onde o sistema iniciador compreende os seguintes componentes: (a) no mínimo um material capaz de absorver a radiação IV, (b) no mínimo um composto capaz de produzir radicais e (c) no mínimo um composto co-iniciador do ácido aril acético hetero-substituído indicado pelas seguintes estruturas gerais: onde X é nitrogênio, oxigênio ou enxofre, Ar é qualquer anel arila substituido ou não substituido e R é qualquer substituinte.
BR0315651-6A 2002-10-30 2003-10-23 Co-iniciadores do ácido arilacético hetero-substituìdos para composições iv-sensìveis BR0315651A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/283,757 US20040091811A1 (en) 2002-10-30 2002-10-30 Hetero-substituted aryl acetic acid co-initiators for IR-sensitive compositions
PCT/US2003/033820 WO2004041544A1 (en) 2002-10-30 2003-10-23 Hetero-substituted aryl acetic acid co-initiators for ir-sensitive compositions

Publications (1)

Publication Number Publication Date
BR0315651A true BR0315651A (pt) 2005-08-30

Family

ID=32228800

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0315651-6A BR0315651A (pt) 2002-10-30 2003-10-23 Co-iniciadores do ácido arilacético hetero-substituìdos para composições iv-sensìveis

Country Status (8)

Country Link
US (1) US20040091811A1 (pt)
EP (1) EP1556227B1 (pt)
JP (1) JP4253694B2 (pt)
CN (2) CN100333926C (pt)
AU (1) AU2003284918A1 (pt)
BR (1) BR0315651A (pt)
DE (1) DE60304889T2 (pt)
WO (1) WO2004041544A1 (pt)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003502449A (ja) 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US7261998B2 (en) * 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
US7056639B2 (en) * 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
KR20040075866A (ko) 2001-11-15 2004-08-30 허니웰 인터내셔날 인코포레이티드 포토리소그래피용 스핀-온 무반사 코팅
US7172850B2 (en) * 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
JP4458778B2 (ja) * 2003-02-20 2010-04-28 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版
JP2005059446A (ja) 2003-08-15 2005-03-10 Fuji Photo Film Co Ltd 平版印刷版原版及び平版印刷方法
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8088549B2 (en) * 2007-12-19 2012-01-03 Eastman Kodak Company Radiation-sensitive elements with developability-enhancing compounds
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2196851A1 (en) 2008-12-12 2010-06-16 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
EP2284005B1 (en) 2009-08-10 2012-05-02 Eastman Kodak Company Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
US8426104B2 (en) * 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
JP5205505B2 (ja) 2010-12-28 2013-06-05 富士フイルム株式会社 平版印刷版原版及びその平版印刷方法
JP5244987B2 (ja) 2011-02-28 2013-07-24 富士フイルム株式会社 平版印刷版原版及びその製版方法
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP2899034B1 (en) 2012-09-20 2019-07-03 FUJIFILM Corporation Original planographic printing plate, and plate making method
EP2735903B1 (en) 2012-11-22 2019-02-27 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a hyperbranched binder material
EP2778782B1 (en) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negative working radiation-sensitive elements
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
EP3928983B1 (en) * 2020-06-24 2023-09-27 Eco3 Bv A lithographic printing plate precursor

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4366228A (en) * 1980-09-05 1982-12-28 Eastman Kodak Company Photopolymerizable compositions featuring novel co-initiators
CA1216998A (en) 1980-09-10 1987-01-20 Donald P. Specht Photopolymerization compositions comprising amine- substituted photosensitizers and n-heterocyclic compounds bearing an n-oxy substituent
JP2677457B2 (ja) * 1991-01-22 1997-11-17 日本ペイント株式会社 光重合性組成物
US5629354A (en) * 1995-02-28 1997-05-13 Eastman Kodak Company Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator
US5821030A (en) * 1995-07-20 1998-10-13 Kodak Polychrome Graphics Lithographic printing plates having a photopolymerizable imaging layer overcoated with an oxygen barrier layer
EP0893731B1 (en) * 1997-07-25 2004-01-28 Eastman Kodak Company Silver halide light sensitive emulsion layer having enhanced photographic sensitivity
US5919600A (en) * 1997-09-03 1999-07-06 Kodak Polychrome Graphics, Llc Thermal waterless lithographic printing plate
US6352811B1 (en) * 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
DE19906823C2 (de) * 1999-02-18 2002-03-14 Kodak Polychrome Graphics Gmbh IR-Empfindliche Zusammensetzung und deren Verwendung zur Herstellung von Druckplatten
US6309792B1 (en) * 2000-02-18 2001-10-30 Kodak Polychrome Graphics Llc IR-sensitive composition and use thereof for the preparation of printing plate precursors
US6864040B2 (en) * 2001-04-11 2005-03-08 Kodak Polychrome Graphics Llc Thermal initiator system using leuco dyes and polyhalogene compounds
US6884568B2 (en) * 2000-10-17 2005-04-26 Kodak Polychrome Graphics, Llc Stabilized infrared-sensitive polymerizable systems
US20030118939A1 (en) * 2001-11-09 2003-06-26 Kodak Polychrome Graphics, L.L.C. High speed negative working thermal printing plates
US6887642B2 (en) * 2002-04-05 2005-05-03 Kodak Polychrome Graphies Llc Multi-layer negative working imageable element

Also Published As

Publication number Publication date
DE60304889T2 (de) 2006-10-26
AU2003284918A1 (en) 2004-06-07
CN1708409A (zh) 2005-12-14
JP4253694B2 (ja) 2009-04-15
CN101135853B (zh) 2011-04-20
EP1556227A1 (en) 2005-07-27
CN100333926C (zh) 2007-08-29
DE60304889D1 (de) 2006-06-01
US20040091811A1 (en) 2004-05-13
JP2006505009A (ja) 2006-02-09
WO2004041544A1 (en) 2004-05-21
EP1556227B1 (en) 2006-04-26
CN101135853A (zh) 2008-03-05

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]