AU503228B2 - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- AU503228B2 AU503228B2 AU15558/76A AU1555876A AU503228B2 AU 503228 B2 AU503228 B2 AU 503228B2 AU 15558/76 A AU15558/76 A AU 15558/76A AU 1555876 A AU1555876 A AU 1555876A AU 503228 B2 AU503228 B2 AU 503228B2
- Authority
- AU
- Australia
- Prior art keywords
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02425—Conductive materials, e.g. metallic silicides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02441—Group 14 semiconducting materials
- H01L21/0245—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/40—Crystalline structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/18—Photovoltaic cells having only Schottky potential barriers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Photovoltaic Devices (AREA)
- Light Receiving Elements (AREA)
- Electrodes Of Semiconductors (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US59958875A | 1975-07-28 | 1975-07-28 | |
US599588 | 1975-07-28 | ||
US65926876A | 1976-02-19 | 1976-02-19 | |
US659268 | 1976-02-19 | ||
KR7601783A KR810001312B1 (en) | 1975-07-28 | 1976-07-22 | Semiconductor Device Having Amorphous Silicon Active Region |
KR1019800002296A KR810001314B1 (en) | 1975-07-28 | 1980-06-11 | Semiconductor Device Having Amorphous Silicon Active Region |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU55718/80A Division AU5571880A (en) | 1975-07-28 | 1980-02-19 | A semiconductor device having an amorphous silicon active dev |
Publications (2)
Publication Number | Publication Date |
---|---|
AU1555876A AU1555876A (en) | 1978-01-12 |
AU503228B2 true AU503228B2 (en) | 1979-08-30 |
Family
ID=27482789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU15558/76A Expired AU503228B2 (en) | 1975-07-28 | 1976-07-05 | Semiconductor device |
Country Status (10)
Country | Link |
---|---|
JP (1) | JPS5216990A (en) |
AU (1) | AU503228B2 (en) |
CA (1) | CA1091361A (en) |
DE (1) | DE2632987C3 (en) |
FR (1) | FR2304180A1 (en) |
GB (1) | GB1545897A (en) |
HK (1) | HK49683A (en) |
IT (1) | IT1062510B (en) |
NL (1) | NL185884C (en) |
SE (1) | SE407870B (en) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4196438A (en) | 1976-09-29 | 1980-04-01 | Rca Corporation | Article and device having an amorphous silicon containing a halogen and method of fabrication |
EG13199A (en) * | 1977-03-28 | 1981-06-30 | Rca Corp | A photo volataic device having increased absorption efficiency |
DE2715471A1 (en) * | 1977-04-06 | 1978-10-19 | Siemens Ag | Solar cell with semiconductor layer - vacuum deposited on a reflecting substrate |
FR2394173A1 (en) * | 1977-06-06 | 1979-01-05 | Thomson Csf | METHOD OF MANUFACTURING ELECTRONIC DEVICES WHICH INCLUDE A THIN LAYER OF AMORPHIC SILICON AND AN ELECTRONIC DEVICE OBTAINED BY SUCH A PROCESS |
US4117506A (en) * | 1977-07-28 | 1978-09-26 | Rca Corporation | Amorphous silicon photovoltaic device having an insulating layer |
DE2746967C2 (en) * | 1977-10-19 | 1981-09-24 | Siemens AG, 1000 Berlin und 8000 München | Electrophotographic recording drum |
US4265991A (en) * | 1977-12-22 | 1981-05-05 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member and process for production thereof |
JPS54109762A (en) * | 1978-02-16 | 1979-08-28 | Sony Corp | Semiconductor device |
US4226898A (en) * | 1978-03-16 | 1980-10-07 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process |
DE2915859C2 (en) | 1978-04-20 | 1995-06-29 | Canon Kk | Photoelectric converter device |
DE2954732C2 (en) * | 1978-04-20 | 1996-06-27 | Canon Kk | Signal processing unit with photoelectric conversion |
US4167015A (en) * | 1978-04-24 | 1979-09-04 | Rca Corporation | Cermet layer for amorphous silicon solar cells |
US4162505A (en) * | 1978-04-24 | 1979-07-24 | Rca Corporation | Inverted amorphous silicon solar cell utilizing cermet layers |
US4163677A (en) * | 1978-04-28 | 1979-08-07 | Rca Corporation | Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier |
JPS54145537A (en) * | 1978-05-04 | 1979-11-13 | Canon Inc | Preparation of electrophotographic image forming material |
JPS54150995A (en) * | 1978-05-19 | 1979-11-27 | Hitachi Ltd | Photo detector |
JPS54109390A (en) * | 1978-05-22 | 1979-08-27 | Yamazaki Shunpei | Photovoltaic force generating semiconductor and method of fabricating same |
JPS54160568A (en) * | 1978-06-09 | 1979-12-19 | Anelva Corp | Thin film forming equipment for discharge chemical reaction |
JPS5511330A (en) * | 1978-07-08 | 1980-01-26 | Shunpei Yamazaki | Semiconductor device having continuous junction |
US4166919A (en) * | 1978-09-25 | 1979-09-04 | Rca Corporation | Amorphous silicon solar cell allowing infrared transmission |
JPS5821827B2 (en) * | 1979-02-09 | 1983-05-04 | 三洋電機株式会社 | photovoltaic device |
JPS5511397A (en) * | 1979-06-05 | 1980-01-26 | Shunpei Yamazaki | Semiconductor device with continuous connection and its production method |
JPS5650035A (en) * | 1979-09-28 | 1981-05-07 | Sony Corp | Target of image pick-up tube |
JPS56132653A (en) * | 1980-03-21 | 1981-10-17 | Seiko Epson Corp | Electronic desk top calculator with amorphous solar cell |
JPS56133883A (en) * | 1980-03-24 | 1981-10-20 | Seisan Gijutsu Shinko Kyokai | Photoelectric transducer |
JPS56138962A (en) * | 1980-03-31 | 1981-10-29 | Canon Inc | Photoelectric converter |
US4400409A (en) | 1980-05-19 | 1983-08-23 | Energy Conversion Devices, Inc. | Method of making p-doped silicon films |
JPS5721876A (en) * | 1980-07-14 | 1982-02-04 | Canon Inc | Photosensor |
JPS5756036A (en) * | 1980-09-20 | 1982-04-03 | Mitsubishi Electric Corp | Plasma chemical vapor phase reactor |
JPS57108782A (en) * | 1980-12-26 | 1982-07-06 | Seiko Epson Corp | Detecting element of radiant rays |
JPS57134218A (en) * | 1981-02-13 | 1982-08-19 | Riken Corp | Manufacture of coupling main body |
JPS5787275A (en) * | 1981-09-12 | 1982-05-31 | Canon Inc | Information processor |
JPS5898915A (en) * | 1981-12-09 | 1983-06-13 | Konishiroku Photo Ind Co Ltd | Amorphous silicon semiconductor substrate |
JPS57184257A (en) * | 1982-04-26 | 1982-11-12 | Shunpei Yamazaki | Photoelectric converter |
JPS59197127A (en) * | 1984-03-16 | 1984-11-08 | Shunpei Yamazaki | Manufacture of semiconductor device |
JPS6197863U (en) * | 1985-12-05 | 1986-06-23 | ||
JPH05121339A (en) * | 1992-03-26 | 1993-05-18 | Semiconductor Energy Lab Co Ltd | Apparatus for forming coating film |
JPH0653137A (en) * | 1992-07-31 | 1994-02-25 | Canon Inc | Formation of amorphous silicon hydride film |
JPH0794431A (en) * | 1993-04-23 | 1995-04-07 | Canon Inc | Substrate for amorphous semiconductor, amorphous semiconductor substrate having the same, and manufacture of amorphous semiconductor substrate |
JPH06326024A (en) * | 1993-05-10 | 1994-11-25 | Canon Inc | Manufacture of semiconductor substrate, and method of depositing amorphous film |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3462311A (en) * | 1966-05-20 | 1969-08-19 | Globe Union Inc | Semiconductor device having improved resistance to radiation damage |
US4064521A (en) * | 1975-07-28 | 1977-12-20 | Rca Corporation | Semiconductor device having a body of amorphous silicon |
-
1976
- 1976-07-05 AU AU15558/76A patent/AU503228B2/en not_active Expired
- 1976-07-05 IT IT25040/76A patent/IT1062510B/en active
- 1976-07-06 GB GB28052/76A patent/GB1545897A/en not_active Expired
- 1976-07-08 NL NL7607571A patent/NL185884C/en not_active IP Right Cessation
- 1976-07-08 CA CA256,565A patent/CA1091361A/en not_active Expired
- 1976-07-21 SE SE7608314A patent/SE407870B/en not_active IP Right Cessation
- 1976-07-22 DE DE2632987A patent/DE2632987C3/en not_active Expired - Lifetime
- 1976-07-26 FR FR7622688A patent/FR2304180A1/en active Granted
- 1976-07-27 JP JP51090124A patent/JPS5216990A/en active Granted
-
1983
- 1983-11-03 HK HK496/83A patent/HK49683A/en unknown
Also Published As
Publication number | Publication date |
---|---|
GB1545897A (en) | 1979-05-16 |
FR2304180B1 (en) | 1982-07-30 |
HK49683A (en) | 1983-11-11 |
IT1062510B (en) | 1984-10-20 |
CA1091361A (en) | 1980-12-09 |
JPS5337718B2 (en) | 1978-10-11 |
DE2632987C2 (en) | 1987-02-12 |
JPS5216990A (en) | 1977-02-08 |
AU1555876A (en) | 1978-01-12 |
FR2304180A1 (en) | 1976-10-08 |
DE2632987C3 (en) | 1993-12-02 |
SE7608314L (en) | 1977-01-29 |
NL185884C (en) | 1996-01-23 |
SE407870B (en) | 1979-04-23 |
DE2632987A1 (en) | 1977-02-10 |
NL7607571A (en) | 1977-02-01 |
NL185884B (en) | 1990-03-01 |
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