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AU503228B2 - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
AU503228B2
AU503228B2 AU15558/76A AU1555876A AU503228B2 AU 503228 B2 AU503228 B2 AU 503228B2 AU 15558/76 A AU15558/76 A AU 15558/76A AU 1555876 A AU1555876 A AU 1555876A AU 503228 B2 AU503228 B2 AU 503228B2
Authority
AU
Australia
Prior art keywords
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU15558/76A
Other versions
AU1555876A (en
Inventor
David Emil Carlson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27482789&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AU503228(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by RCA Corp filed Critical RCA Corp
Priority claimed from KR7601783A external-priority patent/KR810001312B1/en
Publication of AU1555876A publication Critical patent/AU1555876A/en
Application granted granted Critical
Publication of AU503228B2 publication Critical patent/AU503228B2/en
Priority claimed from KR1019800002296A external-priority patent/KR810001314B1/en
Anticipated expiration legal-status Critical
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/10Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/103Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02425Conductive materials, e.g. metallic silicides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02441Group 14 semiconducting materials
    • H01L21/0245Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02524Group 14 semiconducting materials
    • H01L21/02532Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/0262Reduction or decomposition of gaseous compounds, e.g. CVD
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/40Crystalline structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/18Photovoltaic cells having only Schottky potential barriers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/548Amorphous silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photovoltaic Devices (AREA)
  • Light Receiving Elements (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thin Film Transistor (AREA)
AU15558/76A 1975-07-28 1976-07-05 Semiconductor device Expired AU503228B2 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US59958875A 1975-07-28 1975-07-28
US599588 1975-07-28
US65926876A 1976-02-19 1976-02-19
US659268 1976-02-19
KR7601783A KR810001312B1 (en) 1975-07-28 1976-07-22 Semiconductor Device Having Amorphous Silicon Active Region
KR1019800002296A KR810001314B1 (en) 1975-07-28 1980-06-11 Semiconductor Device Having Amorphous Silicon Active Region

Related Child Applications (1)

Application Number Title Priority Date Filing Date
AU55718/80A Division AU5571880A (en) 1975-07-28 1980-02-19 A semiconductor device having an amorphous silicon active dev

Publications (2)

Publication Number Publication Date
AU1555876A AU1555876A (en) 1978-01-12
AU503228B2 true AU503228B2 (en) 1979-08-30

Family

ID=27482789

Family Applications (1)

Application Number Title Priority Date Filing Date
AU15558/76A Expired AU503228B2 (en) 1975-07-28 1976-07-05 Semiconductor device

Country Status (10)

Country Link
JP (1) JPS5216990A (en)
AU (1) AU503228B2 (en)
CA (1) CA1091361A (en)
DE (1) DE2632987C3 (en)
FR (1) FR2304180A1 (en)
GB (1) GB1545897A (en)
HK (1) HK49683A (en)
IT (1) IT1062510B (en)
NL (1) NL185884C (en)
SE (1) SE407870B (en)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4196438A (en) 1976-09-29 1980-04-01 Rca Corporation Article and device having an amorphous silicon containing a halogen and method of fabrication
EG13199A (en) * 1977-03-28 1981-06-30 Rca Corp A photo volataic device having increased absorption efficiency
DE2715471A1 (en) * 1977-04-06 1978-10-19 Siemens Ag Solar cell with semiconductor layer - vacuum deposited on a reflecting substrate
FR2394173A1 (en) * 1977-06-06 1979-01-05 Thomson Csf METHOD OF MANUFACTURING ELECTRONIC DEVICES WHICH INCLUDE A THIN LAYER OF AMORPHIC SILICON AND AN ELECTRONIC DEVICE OBTAINED BY SUCH A PROCESS
US4117506A (en) * 1977-07-28 1978-09-26 Rca Corporation Amorphous silicon photovoltaic device having an insulating layer
DE2746967C2 (en) * 1977-10-19 1981-09-24 Siemens AG, 1000 Berlin und 8000 München Electrophotographic recording drum
US4265991A (en) * 1977-12-22 1981-05-05 Canon Kabushiki Kaisha Electrophotographic photosensitive member and process for production thereof
JPS54109762A (en) * 1978-02-16 1979-08-28 Sony Corp Semiconductor device
US4226898A (en) * 1978-03-16 1980-10-07 Energy Conversion Devices, Inc. Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process
DE2915859C2 (en) 1978-04-20 1995-06-29 Canon Kk Photoelectric converter device
DE2954732C2 (en) * 1978-04-20 1996-06-27 Canon Kk Signal processing unit with photoelectric conversion
US4167015A (en) * 1978-04-24 1979-09-04 Rca Corporation Cermet layer for amorphous silicon solar cells
US4162505A (en) * 1978-04-24 1979-07-24 Rca Corporation Inverted amorphous silicon solar cell utilizing cermet layers
US4163677A (en) * 1978-04-28 1979-08-07 Rca Corporation Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier
JPS54145537A (en) * 1978-05-04 1979-11-13 Canon Inc Preparation of electrophotographic image forming material
JPS54150995A (en) * 1978-05-19 1979-11-27 Hitachi Ltd Photo detector
JPS54109390A (en) * 1978-05-22 1979-08-27 Yamazaki Shunpei Photovoltaic force generating semiconductor and method of fabricating same
JPS54160568A (en) * 1978-06-09 1979-12-19 Anelva Corp Thin film forming equipment for discharge chemical reaction
JPS5511330A (en) * 1978-07-08 1980-01-26 Shunpei Yamazaki Semiconductor device having continuous junction
US4166919A (en) * 1978-09-25 1979-09-04 Rca Corporation Amorphous silicon solar cell allowing infrared transmission
JPS5821827B2 (en) * 1979-02-09 1983-05-04 三洋電機株式会社 photovoltaic device
JPS5511397A (en) * 1979-06-05 1980-01-26 Shunpei Yamazaki Semiconductor device with continuous connection and its production method
JPS5650035A (en) * 1979-09-28 1981-05-07 Sony Corp Target of image pick-up tube
JPS56132653A (en) * 1980-03-21 1981-10-17 Seiko Epson Corp Electronic desk top calculator with amorphous solar cell
JPS56133883A (en) * 1980-03-24 1981-10-20 Seisan Gijutsu Shinko Kyokai Photoelectric transducer
JPS56138962A (en) * 1980-03-31 1981-10-29 Canon Inc Photoelectric converter
US4400409A (en) 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
JPS5721876A (en) * 1980-07-14 1982-02-04 Canon Inc Photosensor
JPS5756036A (en) * 1980-09-20 1982-04-03 Mitsubishi Electric Corp Plasma chemical vapor phase reactor
JPS57108782A (en) * 1980-12-26 1982-07-06 Seiko Epson Corp Detecting element of radiant rays
JPS57134218A (en) * 1981-02-13 1982-08-19 Riken Corp Manufacture of coupling main body
JPS5787275A (en) * 1981-09-12 1982-05-31 Canon Inc Information processor
JPS5898915A (en) * 1981-12-09 1983-06-13 Konishiroku Photo Ind Co Ltd Amorphous silicon semiconductor substrate
JPS57184257A (en) * 1982-04-26 1982-11-12 Shunpei Yamazaki Photoelectric converter
JPS59197127A (en) * 1984-03-16 1984-11-08 Shunpei Yamazaki Manufacture of semiconductor device
JPS6197863U (en) * 1985-12-05 1986-06-23
JPH05121339A (en) * 1992-03-26 1993-05-18 Semiconductor Energy Lab Co Ltd Apparatus for forming coating film
JPH0653137A (en) * 1992-07-31 1994-02-25 Canon Inc Formation of amorphous silicon hydride film
JPH0794431A (en) * 1993-04-23 1995-04-07 Canon Inc Substrate for amorphous semiconductor, amorphous semiconductor substrate having the same, and manufacture of amorphous semiconductor substrate
JPH06326024A (en) * 1993-05-10 1994-11-25 Canon Inc Manufacture of semiconductor substrate, and method of depositing amorphous film

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462311A (en) * 1966-05-20 1969-08-19 Globe Union Inc Semiconductor device having improved resistance to radiation damage
US4064521A (en) * 1975-07-28 1977-12-20 Rca Corporation Semiconductor device having a body of amorphous silicon

Also Published As

Publication number Publication date
GB1545897A (en) 1979-05-16
FR2304180B1 (en) 1982-07-30
HK49683A (en) 1983-11-11
IT1062510B (en) 1984-10-20
CA1091361A (en) 1980-12-09
JPS5337718B2 (en) 1978-10-11
DE2632987C2 (en) 1987-02-12
JPS5216990A (en) 1977-02-08
AU1555876A (en) 1978-01-12
FR2304180A1 (en) 1976-10-08
DE2632987C3 (en) 1993-12-02
SE7608314L (en) 1977-01-29
NL185884C (en) 1996-01-23
SE407870B (en) 1979-04-23
DE2632987A1 (en) 1977-02-10
NL7607571A (en) 1977-02-01
NL185884B (en) 1990-03-01

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