AU3193900A - Exposure system and aberration measurement method for its projection optical system, and production method for device - Google Patents

Exposure system and aberration measurement method for its projection optical system, and production method for device

Info

Publication number: AU3193900A
Authority: AU; Australia
Prior art keywords: projection optical; aberration measurement; optical system; production method; measurement method
Prior art date: 1999-03-18
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU31939/00A

Inventor

Jun Ishikawa

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-03-18

Filing date

2000-03-17

Publication date

2000-10-04

2000-03-17 Application filed by Nikon Corp filed Critical Nikon Corp

2000-10-04 Publication of AU3193900A publication Critical patent/AU3193900A/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

AU31939/00A 1999-03-18 2000-03-17 Exposure system and aberration measurement method for its projection optical system, and production method for device Abandoned AU3193900A (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP11/73657		1999-03-18
JP7365799		1999-03-18
PCT/JP2000/001643 WO2000055890A1 (en)	1999-03-18	2000-03-17	Exposure system and aberration measurement method for its projection optical system, and production method for device

Publications (1)

Publication Number	Publication Date
AU3193900A true AU3193900A (en)	2000-10-04

Family

ID=13524581

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU31939/00A Abandoned AU3193900A (en)	1999-03-18	2000-03-17	Exposure system and aberration measurement method for its projection optical system, and production method for device

Country Status (2)

Country	Link
AU (1)	AU3193900A (en)
WO (1)	WO2000055890A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE60136790D1 (en) *	2000-10-05	2009-01-15	Asml Holding Nv	Photolithographic system with mounted and removable sensor
EP1355140A4 (en)	2000-12-28	2006-11-15	Nikon Corp	Imaging characteristics measuring method, imaging characteriatics adjusting method, exposure method and system, program and recording medium, and device producing method
KR20040007444A (en)	2001-02-06	2004-01-24	가부시키가이샤 니콘	Exposure system and exposure method, and device production method
TWI220998B (en)	2001-02-13	2004-09-11	Nikon Corp	Exposure method, exposure apparatus and manufacture method of the same
DE10120446C2 (en)	2001-04-26	2003-04-17	Zeiss Carl	Projection exposure system and method for compensating imaging errors in a projection exposure system, in particular for micro-lithography
JP2003045794A (en) *	2001-05-10	2003-02-14	Nikon Corp	Optical characteristic measurement method, projection optical system adjustment method, exposure method, exposure apparatus manufacturing method, and mask inspection method
JP4661015B2 (en) *	2001-09-26	2011-03-30	株式会社ニコン	Wavefront aberration measuring apparatus, wavefront aberration measuring method, exposure apparatus, and device manufacturing method
TWI223132B (en)	2002-01-29	2004-11-01	Nikon Corp	Image formation state adjustment system, exposing method and exposing device and data recording medium
JP2003257812A (en)	2002-02-27	2003-09-12	Nikon Corp	Evaluation method of imaging optical system, adjustment method of imaging optical system, exposure apparatus and exposure method
WO2003075328A1 (en)	2002-03-01	2003-09-12	Nikon Corporation	Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method
JP4327412B2 (en) *	2002-06-06	2009-09-09	株式会社日立製作所	Wavefront aberration measuring apparatus and exposure apparatus
US10527518B2 (en)	2016-08-22	2020-01-07	Mitsubishi Electric Corporation	Wavefront measurement device and optical system assembly device
JP7123403B2 (en) *	2019-04-04	2022-08-23	株式会社Ｑｄレーザ	Image inspection equipment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5424552A (en) *	1991-07-09	1995-06-13	Nikon Corporation	Projection exposing apparatus
JP3634550B2 (en) *	1997-04-03	2005-03-30	株式会社ルネサステクノロジ	Aberration measurement method for projection lens
JPH10281934A (en) *	1997-04-07	1998-10-23	Nikon Corp	Method for measuring imaging characteristics of projection optical system and projection exposure apparatus using the method

2000
- 2000-03-17 AU AU31939/00A patent/AU3193900A/en not_active Abandoned
- 2000-03-17 WO PCT/JP2000/001643 patent/WO2000055890A1/en not_active Ceased

Also Published As

Publication number	Publication date
WO2000055890A1 (en)	2000-09-21

Similar Documents

Publication	Publication Date	Title
AU4459701A (en)	2001-10-15	Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method
AU3849199A (en)	1999-12-06	Aberration measuring instrument and measuring method, projection exposure apparatus provided with the instrument and device-manufacturing method using the measuring method, and exposure method
AU2002357307A1 (en)	2003-06-30	System and method for measuring optical distance
AU2003298221A1 (en)	2004-07-14	Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine
AU6012800A (en)	2001-02-13	Optical inspection system
AU2002360198A1 (en)	2003-07-09	Apparatus, method and system for intravascular photographic imaging
AU3325500A (en)	2000-10-09	Position determining device, position determining method and exposure device, exposure method and alignment determining device, and alignment determining method
AU3193800A (en)	2000-12-05	Exposure method, illuminating device, and exposure system
AU2001268283A1 (en)	2001-12-24	Optical inspection system
AU2002354091A1 (en)	2003-06-23	Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
AU2002344559A1 (en)	2003-06-10	Projection optical system, exposure device, and exposure method
AU2002245395A1 (en)	2002-08-19	A system and method for high resolution optical imaging, data storage, lithography, and inspection
AU2003221102A1 (en)	2003-10-27	Projection optical system, exposure system and exposure method
AU3193900A (en)	2000-10-04	Exposure system and aberration measurement method for its projection optical system, and production method for device
AU2691800A (en)	2000-09-14	Exposure system, lithography system and conveying method, and device production method and device
AU4461901A (en)	2001-11-07	Method and apparatus for measurement, and method and apparatus for exposure
AU2002224059A1 (en)	2002-06-03	Method and apparatus for measuring aberration of projection optical system, and method and apparatus for exposure
AU1177900A (en)	2001-06-06	Optical inspection apparatus
AU2003289427A1 (en)	2004-07-22	Aberration measuring method, exposure method and exposure system
AU2000274441A1 (en)	2002-04-08	Optical measurement apparatus and method for optical measurement
AU1801700A (en)	2000-07-24	Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device
AU6022400A (en)	2001-02-13	Exposure method, exposure system, light source, and method of device manufacture
GB2346220B (en)	2001-05-23	Method for measuring an aberration of a projection optical system
AU2001286245A1 (en)	2002-04-02	Exposure system, exposure method, and production method for device
AU2003213455A1 (en)	2003-09-22	Shape measuring method, interference measuring device, porduction method for projection optical system, and porjectionj aligner

Legal Events

Date	Code	Title	Description
2002-02-28	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase