[go: up one dir, main page]

AU1801700A - Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device - Google Patents

Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device

Info

Publication number
AU1801700A
AU1801700A AU18017/00A AU1801700A AU1801700A AU 1801700 A AU1801700 A AU 1801700A AU 18017/00 A AU18017/00 A AU 18017/00A AU 1801700 A AU1801700 A AU 1801700A AU 1801700 A AU1801700 A AU 1801700A
Authority
AU
Australia
Prior art keywords
exposure
cleaning optical
exposure apparatus
manufacturing
optical device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU18017/00A
Inventor
Yasushi Mizuno
Kiyoshi Motegi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU1801700A publication Critical patent/AU1801700A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H10P76/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU18017/00A 1998-12-28 1999-12-27 Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device Abandoned AU1801700A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP37262798 1998-12-28
JP10/372627 1998-12-28
PCT/JP1999/007321 WO2000041225A1 (en) 1998-12-28 1999-12-27 Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device

Publications (1)

Publication Number Publication Date
AU1801700A true AU1801700A (en) 2000-07-24

Family

ID=18500770

Family Applications (1)

Application Number Title Priority Date Filing Date
AU18017/00A Abandoned AU1801700A (en) 1998-12-28 1999-12-27 Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device

Country Status (3)

Country Link
KR (1) KR20010085194A (en)
AU (1) AU1801700A (en)
WO (1) WO2000041225A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6544914B1 (en) 1999-03-25 2003-04-08 Asahi Glass Company, Limited Synthetic quartz glass for optical member, process for producing the same, and method of using the same
US6571057B2 (en) 2000-03-27 2003-05-27 Nikon Corporation Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices
WO2003036696A1 (en) * 2001-10-24 2003-05-01 Nikon Corporation Method and instrument for measuring concentration, method and unit for exposure to light, and method for manufacturing device
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
US6828569B2 (en) * 2001-11-19 2004-12-07 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
AU2003246243A1 (en) * 2002-07-03 2004-01-23 Nikon Corporation Method of exposure and aligner
JP4510433B2 (en) * 2003-12-03 2010-07-21 キヤノン株式会社 Exposure apparatus and cleaning method
KR100634376B1 (en) * 2004-07-07 2006-10-16 삼성전자주식회사 Substrate drying device
JP2006049758A (en) * 2004-08-09 2006-02-16 Nikon Corp Exposure apparatus control method, and exposure method and apparatus using the same
US9573111B1 (en) 2012-07-09 2017-02-21 Kla-Tencor Corporation High purity ozone generator for optics cleaning and recovery
CN109792132B (en) * 2016-11-29 2021-05-11 极光先进雷射株式会社 Laser processing system and laser processing method
CN108816963B (en) * 2018-08-01 2024-02-06 中山普宏光电科技有限公司 Ultraviolet light and ultraviolet laser double-light-source cleaning equipment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1007907A3 (en) * 1993-12-24 1995-11-14 Asm Lithography Bv LENS SYSTEM WITH HOLDER MADE IN gasfilled lens elements and photolithographic DEVICE WITH SUCH A SYSTEM.
JP3823408B2 (en) * 1997-01-10 2006-09-20 株式会社ニコン Optical element manufacturing method and optical element cleaning method
JPH10303097A (en) * 1997-04-23 1998-11-13 Nikon Corp Projection exposure apparatus, exposure method, semiconductor device manufacturing method, and projection optical system manufacturing method

Also Published As

Publication number Publication date
WO2000041225A1 (en) 2000-07-13
KR20010085194A (en) 2001-09-07

Similar Documents

Publication Publication Date Title
AU4459701A (en) Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method
AU2746799A (en) Scanning exposure method, scanning exposure apparatus and its manufacturing method, and device and its manufacturing method
AU5447499A (en) Exposure apparatus and exposure method, and device and method for producing the same
AU3957599A (en) Laser-excited plasma light source, exposure apparatus and its manufacturing method, and device manufacturing method
AU1078700A (en) Exposure method and exposure apparatus
AU1051899A (en) Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses
AU2549899A (en) Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
AU1179200A (en) Exposure method and device
AU2001270205A1 (en) Method and apparatus for wafer cleaning
AU4947499A (en) Method and apparatus for splicing
AU2002253574A1 (en) Exposure method and apparatus
AU2076099A (en) Exposure method and device
AU5529499A (en) Exposure apparatus and its manufacturing method, and device producing method
AU1555001A (en) Exposure method and apparatus
AU4312701A (en) Method and apparatus for optical transmission
AUPP365298A0 (en) An optical apparatus
AU4143000A (en) Exposure method and apparatus
EP0785472A3 (en) Scan type projection exposure apparatus and device manufacturing method using the same
AU2327800A (en) Exposure method and apparatus
AU4949900A (en) Exposure method and apparatus
AU4779600A (en) Container for holder exposure apparatus, device manufacturing method, and device manufacturing apparatus
AU1554901A (en) Exposure method and exposure apparatus
AU2002214269A1 (en) Optical device, exposure device and device manufacturing method
AU1073101A (en) Method and apparatus for semiconductor cleaning
AU2962099A (en) Exposure method, exposure apparatus, method of producing the same, device, and method of fabricating the same

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase