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AU2002356608A1 - Method for the production of iii-v laser components - Google Patents

Method for the production of iii-v laser components

Info

Publication number
AU2002356608A1
AU2002356608A1 AU2002356608A AU2002356608A AU2002356608A1 AU 2002356608 A1 AU2002356608 A1 AU 2002356608A1 AU 2002356608 A AU2002356608 A AU 2002356608A AU 2002356608 A AU2002356608 A AU 2002356608A AU 2002356608 A1 AU2002356608 A1 AU 2002356608A1
Authority
AU
Australia
Prior art keywords
iii
production
laser components
laser
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002356608A
Other versions
AU2002356608A8 (en
Inventor
Armin Dadgar
Holger Jurgensen
Alois Krost
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aixtron SE
Original Assignee
Aixtron SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10206750A external-priority patent/DE10206750A1/en
Application filed by Aixtron SE filed Critical Aixtron SE
Publication of AU2002356608A8 publication Critical patent/AU2002356608A8/en
Publication of AU2002356608A1 publication Critical patent/AU2002356608A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/32308Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
    • H01S5/32341Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02373Group 14 semiconducting materials
    • H01L21/02381Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/02433Crystal orientation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02455Group 13/15 materials
    • H01L21/02458Nitrides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02538Group 13/15 materials
    • H01L21/0254Nitrides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0206Substrates, e.g. growth, shape, material, removal or bonding
    • H01S5/021Silicon based substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Chemical Vapour Deposition (AREA)
AU2002356608A 2001-12-21 2002-11-15 Method for the production of iii-v laser components Abandoned AU2002356608A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE10163714 2001-12-21
DE10163714.4 2001-12-21
DE10206750A DE10206750A1 (en) 2001-12-21 2002-02-19 Process for the manufacture of III-V laser components
DE10206750.3 2002-02-19
PCT/EP2002/012799 WO2003054921A2 (en) 2001-12-21 2002-11-15 Method for the production of iii-v laser components

Publications (2)

Publication Number Publication Date
AU2002356608A8 AU2002356608A8 (en) 2003-07-09
AU2002356608A1 true AU2002356608A1 (en) 2003-07-09

Family

ID=26010857

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002356608A Abandoned AU2002356608A1 (en) 2001-12-21 2002-11-15 Method for the production of iii-v laser components

Country Status (5)

Country Link
US (1) US20050025909A1 (en)
EP (1) EP1459365A2 (en)
JP (1) JP2005513797A (en)
AU (1) AU2002356608A1 (en)
WO (1) WO2003054921A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11308477B2 (en) 2005-04-26 2022-04-19 Spriv Llc Method of reducing fraud in on-line transactions
US11818287B2 (en) 2017-10-19 2023-11-14 Spriv Llc Method and system for monitoring and validating electronic transactions
US7825432B2 (en) 2007-03-09 2010-11-02 Cree, Inc. Nitride semiconductor structures with interlayer structures
US8362503B2 (en) 2007-03-09 2013-01-29 Cree, Inc. Thick nitride semiconductor structures with interlayer structures
US11354667B2 (en) 2007-05-29 2022-06-07 Spriv Llc Method for internet user authentication
DE102009051520B4 (en) 2009-10-31 2016-11-03 X-Fab Semiconductor Foundries Ag Process for the production of silicon semiconductor wafers with layer structures for the integration of III-V semiconductor devices
US11792314B2 (en) 2010-03-28 2023-10-17 Spriv Llc Methods for acquiring an internet user's consent to be located and for authenticating the location information
US9595805B2 (en) 2014-09-22 2017-03-14 International Business Machines Corporation III-V photonic integrated circuits on silicon substrate
US9395489B2 (en) 2014-10-08 2016-07-19 International Business Machines Corporation Complementary metal oxide semiconductor device with III-V optical interconnect having III-V epitaxially formed material
US9344200B2 (en) 2014-10-08 2016-05-17 International Business Machines Corporation Complementary metal oxide semiconductor device with III-V optical interconnect having III-V epitaxial semiconductor material formed using lateral overgrowth

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0174303B1 (en) * 1994-06-24 1999-02-01 가나이 쯔또무 Semiconductor device and manufacturing method
JP3557011B2 (en) * 1995-03-30 2004-08-25 株式会社東芝 Semiconductor light emitting device and manufacturing method thereof
JP3036495B2 (en) * 1997-11-07 2000-04-24 豊田合成株式会社 Method for manufacturing gallium nitride-based compound semiconductor
AU2430401A (en) * 1999-12-13 2001-06-18 North Carolina State University Methods of fabricating gallium nitride layers on textured silicon substrates, and gallium nitride semiconductor structures fabricated thereby
FR2810159B1 (en) * 2000-06-09 2005-04-08 Centre Nat Rech Scient THICK LAYER OF GALLIUM NITRIDE OR MIXED NITRIDE OF GALLIUM AND ANOTHER METAL, PROCESS FOR PREPARING THE SAME, AND ELECTRONIC OR OPTOELECTRONIC DEVICE COMPRISING SUCH A LAYER
US6649287B2 (en) * 2000-12-14 2003-11-18 Nitronex Corporation Gallium nitride materials and methods
JP3763753B2 (en) * 2001-06-05 2006-04-05 豊田合成株式会社 Group III nitride compound semiconductor device and method for manufacturing the same
JP2003152220A (en) * 2001-11-15 2003-05-23 Sharp Corp Semiconductor light emitting device manufacturing method and semiconductor light emitting device

Also Published As

Publication number Publication date
WO2003054921B1 (en) 2004-03-04
EP1459365A2 (en) 2004-09-22
AU2002356608A8 (en) 2003-07-09
WO2003054921A2 (en) 2003-07-03
WO2003054921A3 (en) 2003-12-24
JP2005513797A (en) 2005-05-12
US20050025909A1 (en) 2005-02-03

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase