ATE546760T1 - Verfahren zur herstellung lithographischer druckplatten - Google Patents
Verfahren zur herstellung lithographischer druckplattenInfo
- Publication number
- ATE546760T1 ATE546760T1 AT08102922T AT08102922T ATE546760T1 AT E546760 T1 ATE546760 T1 AT E546760T1 AT 08102922 T AT08102922 T AT 08102922T AT 08102922 T AT08102922 T AT 08102922T AT E546760 T1 ATE546760 T1 AT E546760T1
- Authority
- AT
- Austria
- Prior art keywords
- precursor
- lithographic printing
- printing plates
- producing lithographic
- heating
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002243 precursor Substances 0.000 abstract 7
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 238000001816 cooling Methods 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08102922A EP2105799B1 (de) | 2008-03-26 | 2008-03-26 | Verfahren zur Herstellung lithographischer Druckplatten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE546760T1 true ATE546760T1 (de) | 2012-03-15 |
Family
ID=39488349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT08102922T ATE546760T1 (de) | 2008-03-26 | 2008-03-26 | Verfahren zur herstellung lithographischer druckplatten |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20110059401A1 (de) |
| EP (1) | EP2105799B1 (de) |
| CN (1) | CN101981508B (de) |
| AT (1) | ATE546760T1 (de) |
| BR (1) | BRPI0908914A2 (de) |
| ES (1) | ES2378413T3 (de) |
| PL (1) | PL2105799T3 (de) |
| WO (1) | WO2009118281A1 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8377629B2 (en) | 2008-07-16 | 2013-02-19 | Agfa Graphics Nv | Method for preparing lithographic printing plate precursors |
| WO2011118457A1 (ja) | 2010-03-26 | 2011-09-29 | 富士フイルム株式会社 | 平版印刷版原版及びその製造方法 |
| ES2588075T3 (es) * | 2013-01-11 | 2016-10-28 | Agfa Graphics Nv | Método de fabricación de una plancha de impresión litográfica |
Family Cites Families (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5910395A (en) | 1995-04-27 | 1999-06-08 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| DE10022786B4 (de) | 1999-05-12 | 2008-04-10 | Kodak Graphic Communications Gmbh | Auf der Druckmaschine entwickelbare Druckplatte |
| US6071675A (en) | 1999-06-05 | 2000-06-06 | Teng; Gary Ganghui | On-press development of a lithographic plate comprising dispersed solid particles |
| US6245481B1 (en) | 1999-10-12 | 2001-06-12 | Gary Ganghui Teng | On-press process of lithographic plates having a laser sensitive mask layer |
| US6548222B2 (en) | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
| US6576401B2 (en) | 2001-09-14 | 2003-06-10 | Gary Ganghui Teng | On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator |
| US6482571B1 (en) | 2000-09-06 | 2002-11-19 | Gary Ganghui Teng | On-press development of thermosensitive lithographic plates |
| US6387595B1 (en) | 2000-10-30 | 2002-05-14 | Gary Ganghui Teng | On-press developable lithographic printing plate having an ultrathin overcoat |
| US6451510B1 (en) * | 2001-02-21 | 2002-09-17 | International Business Machines Corporation | Developer/rinse formulation to prevent image collapse in resist |
| US6723493B2 (en) * | 2001-06-04 | 2004-04-20 | Gary Ganghui Teng | Negative lithographic printing plate comprising a specific compound in the photosensitive layer |
| JP3869306B2 (ja) * | 2001-08-28 | 2007-01-17 | 東京エレクトロン株式会社 | 現像処理方法および現像液塗布装置 |
| EP1288720B1 (de) | 2001-08-29 | 2012-02-01 | FUJIFILM Corporation | Verfahren zur Herstellung einer Druckplatte |
| US6902865B2 (en) | 2002-07-22 | 2005-06-07 | Gary Ganghui Teng | Non-alkaline aqueous development of thermosensitive lithographic printing plates |
| US20060234161A1 (en) * | 2002-10-04 | 2006-10-19 | Eric Verschueren | Method of making a lithographic printing plate precursor |
| CN1839354B (zh) * | 2003-07-17 | 2010-09-29 | 柯达彩色绘图有限责任公司 | 处理成像材料的设备及方法 |
| EP1668418A1 (de) | 2003-09-22 | 2006-06-14 | Agfa-Gevaert | Fotopolymer-druckplatten-vorläufer |
| CN1882879B (zh) | 2003-09-22 | 2010-08-11 | 爱克发印艺公司 | 可光聚合的组合物 |
| EP2278404A3 (de) | 2004-05-19 | 2011-04-27 | Agfa Graphics N.V. | Verfahren zur Herstellung einer photopolymeren Druckplatte |
| EP2618215B1 (de) | 2004-05-31 | 2017-07-05 | Fujifilm Corporation | Verfahren zur Herstellung einer Lithografiedruckplatte |
| EP1621339B1 (de) | 2004-07-29 | 2008-09-10 | FUJIFILM Corporation | Verfahren zur Herstellung lithographischer Druckplatten |
| EP1630618B1 (de) | 2004-08-24 | 2008-03-19 | FUJIFILM Corporation | Verfahren zur Herstellung einer lithographischen Druckplatte |
| EP1696275B1 (de) * | 2005-02-23 | 2014-04-02 | FUJIFILM Corporation | Verfahren zum Auffrischen eines Entwicklers in einem automatischen Entwicklergerät für eine lichtempfindliche lithografische Druckplattenvorstufe und automatisches Entwicklergerät für eine lichtempfindliche lithografische Druckplattenvorstufe |
| US7300740B2 (en) | 2005-02-28 | 2007-11-27 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
| JP4792326B2 (ja) | 2005-07-25 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版の作製方法および平版印刷版原版 |
| JP4815270B2 (ja) | 2005-08-18 | 2011-11-16 | 富士フイルム株式会社 | 平版印刷版の作製方法及び作製装置 |
| DE602005017147D1 (de) | 2005-08-26 | 2009-11-26 | Agfa Graphics Nv | photopolymer Druckplattenvorläufer |
| EP1767349B1 (de) * | 2005-09-27 | 2008-07-23 | Agfa Graphics N.V. | Verfahren zur Herstellung einer lithographischen Druckplatte |
| EP2772805A1 (de) | 2005-11-18 | 2014-09-03 | Agfa Graphics Nv | Verfahren zur Herstellung einer Flachdruckplatte |
| EP1788441B1 (de) | 2005-11-18 | 2010-07-07 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Lithografiedruckform |
| DE602005026136D1 (de) | 2005-11-18 | 2011-03-10 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
| DE602005022594D1 (de) * | 2005-11-18 | 2010-09-09 | Agfa Graphics Nv | Verfahren zur Herstellung einer Lithografiedruckform |
| ES2322655T5 (es) | 2005-11-18 | 2019-06-27 | Agfa Nv | Método para fabricar una plancha de impresión litográfica |
| ATE422253T1 (de) | 2005-11-18 | 2009-02-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithografiedruckform |
| US8088559B2 (en) | 2005-11-18 | 2012-01-03 | Agfa Graphics Nv | Method of making a photopolymer printing plate |
| EP1788449A1 (de) | 2005-11-21 | 2007-05-23 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Lithografiedruckform |
| ES2324542T3 (es) | 2005-11-21 | 2009-08-10 | Agfa Graphics N.V. | Metodo para fabricar una plancha de impresion litografica. |
| EP1793275B1 (de) | 2005-12-02 | 2013-07-03 | Fujifilm Corporation | Verfahren zur Herstellung einer Lithografiedruckplatte und Lithografiedruckplattenvorläufer |
| JP4820640B2 (ja) | 2005-12-20 | 2011-11-24 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| EP1843203A1 (de) | 2006-04-03 | 2007-10-10 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Fotopolymerdruckform |
| ATE482083T1 (de) | 2006-07-25 | 2010-10-15 | Fujifilm Corp | Lithographiedruckplattenvorläufer und verfahren zur herstellung einer lithographiedruckplatte |
-
2008
- 2008-03-26 AT AT08102922T patent/ATE546760T1/de active
- 2008-03-26 EP EP08102922A patent/EP2105799B1/de not_active Not-in-force
- 2008-03-26 PL PL08102922T patent/PL2105799T3/pl unknown
- 2008-03-26 ES ES08102922T patent/ES2378413T3/es active Active
-
2009
- 2009-03-23 US US12/933,879 patent/US20110059401A1/en not_active Abandoned
- 2009-03-23 CN CN2009801106123A patent/CN101981508B/zh not_active Expired - Fee Related
- 2009-03-23 BR BRPI0908914A patent/BRPI0908914A2/pt not_active IP Right Cessation
- 2009-03-23 WO PCT/EP2009/053355 patent/WO2009118281A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009118281A1 (en) | 2009-10-01 |
| US20110059401A1 (en) | 2011-03-10 |
| CN101981508B (zh) | 2013-07-17 |
| ES2378413T3 (es) | 2012-04-12 |
| EP2105799B1 (de) | 2012-02-22 |
| PL2105799T3 (pl) | 2012-07-31 |
| EP2105799A1 (de) | 2009-09-30 |
| BRPI0908914A2 (pt) | 2018-07-10 |
| CN101981508A (zh) | 2011-02-23 |
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