ATE427367T1 - Verfahren zur herstellung einer dunnen schicht von stabilisiertem fluorhaltigen silika, so beschichtetes substrat und so erhaltene ophthalmische linse - Google Patents
Verfahren zur herstellung einer dunnen schicht von stabilisiertem fluorhaltigen silika, so beschichtetes substrat und so erhaltene ophthalmische linseInfo
- Publication number
- ATE427367T1 ATE427367T1 AT03756536T AT03756536T ATE427367T1 AT E427367 T1 ATE427367 T1 AT E427367T1 AT 03756536 T AT03756536 T AT 03756536T AT 03756536 T AT03756536 T AT 03756536T AT E427367 T1 ATE427367 T1 AT E427367T1
- Authority
- AT
- Austria
- Prior art keywords
- sub
- producing
- thin layer
- coated substrate
- ophthalmic lens
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000377 silicon dioxide Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title 1
- 239000010410 layer Substances 0.000 abstract 4
- 239000007789 gas Substances 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 229910044991 metal oxide Inorganic materials 0.000 abstract 1
- 150000004706 metal oxides Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- 238000001947 vapour-phase growth Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G02B1/105—
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0210112A FR2843407B1 (fr) | 2002-08-08 | 2002-08-08 | Procede d'obtention d'une couche mince, stabilisee, de silice dopee au fluor, couche mince obtenue et leur application en optique ophtalmique |
| FR0210110A FR2843406A1 (fr) | 2002-08-08 | 2002-08-08 | Procede d'obtention d'une couche mince, stabilisee, de silice dopee au fluor, couche mince obtenue et leur application en optique ophtalmique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE427367T1 true ATE427367T1 (de) | 2009-04-15 |
Family
ID=31889633
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03756536T ATE427367T1 (de) | 2002-08-08 | 2003-08-07 | Verfahren zur herstellung einer dunnen schicht von stabilisiertem fluorhaltigen silika, so beschichtetes substrat und so erhaltene ophthalmische linse |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20060023311A1 (de) |
| EP (1) | EP1529124B1 (de) |
| JP (1) | JP4434949B2 (de) |
| KR (1) | KR101151813B1 (de) |
| AT (1) | ATE427367T1 (de) |
| DE (1) | DE60326959D1 (de) |
| WO (1) | WO2004016822A2 (de) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6355580B1 (en) | 1998-09-03 | 2002-03-12 | Micron Technology, Inc. | Ion-assisted oxidation methods and the resulting structures |
| FR2859487B1 (fr) * | 2003-09-04 | 2006-12-15 | Essilor Int | Procede de depot d'une couche amorphe contenant majoritairement du fluor et du carbone et dispositif convenant a sa mise en oeuvre |
| JP2007041292A (ja) * | 2005-08-03 | 2007-02-15 | Konica Minolta Opto Inc | 光学素子 |
| EP2003225B1 (de) * | 2006-03-31 | 2016-09-14 | Hoya Corporation | Ionwaffensystem, dampfablagerungsvorrichtung und verfahren zur linsenherstellung |
| FR2917510B1 (fr) | 2007-06-13 | 2012-01-27 | Essilor Int | Article d'optique revetu d'un revetement antireflet comprenant une sous-couche partiellement formee sous assistance ionique et procede de fabrication |
| JP2011505267A (ja) * | 2007-11-08 | 2011-02-24 | エム． セイガー、ブライアン | 改善された反射防止用被覆 |
| JP5036827B2 (ja) * | 2008-09-05 | 2012-09-26 | 株式会社シンクロン | 成膜方法及び撥油性基材 |
| JP4688230B2 (ja) * | 2008-10-09 | 2011-05-25 | 株式会社シンクロン | 成膜方法 |
| CA2793855A1 (en) * | 2010-03-22 | 2011-09-29 | Luxottica Us Holdings Corporation | Ion beam assisted deposition of ophthalmic lens coatings |
| WO2011139856A2 (en) | 2010-04-29 | 2011-11-10 | Battelle Memorial Institute | High refractive index composition |
| FR2965820B1 (fr) * | 2010-10-12 | 2012-11-16 | Essilor Int | Article comprenant une couche mesoporeuse protegee par un revetement faisant barriere au sebum et procede de fabrication |
| FR2968774B1 (fr) * | 2010-12-10 | 2013-02-08 | Essilor Int | Article d'optique comportant un revetement antireflet a faible reflexion dans le domaine ultraviolet et le domaine visible |
| US9188544B2 (en) * | 2012-04-04 | 2015-11-17 | Kla-Tencor Corporation | Protective fluorine-doped silicon oxide film for optical components |
| US20140272295A1 (en) * | 2013-03-14 | 2014-09-18 | Sdc Technologies, Inc. | Anti-fog nanotextured surfaces and articles containing the same |
| AU2013393576B2 (en) * | 2013-07-05 | 2018-10-04 | Essilor International | Optical article comprising an antireflective coating with a very low reflection in the visible region |
| TWI559026B (zh) * | 2015-06-24 | 2016-11-21 | 財團法人工業技術研究院 | 抗反射結構及其製造方法 |
| FR3045672B1 (fr) * | 2015-12-18 | 2018-03-16 | Corporation De L'ecole Polytechnique De Montreal | Article comprenant une couche organique-inorganique de bas indice de refraction |
| JP2019015764A (ja) | 2017-07-03 | 2019-01-31 | 東海光学株式会社 | プラスチック光学製品並びにプラスチック眼鏡レンズ及び眼鏡 |
| EP3693765B1 (de) * | 2019-02-05 | 2023-04-19 | Essilor International | Mit einer antireflexionsschicht mit verbesserten optischen eigenschaften beschichteter artikel |
| EP3693766B1 (de) | 2019-02-05 | 2024-10-30 | Corporation de L'Ecole Polytechnique de Montreal | Mit einer schicht mit niedrigem brechungsindex auf basis von fluorierten organosiliciumverbindungen beschichteter artikel |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03202461A (ja) * | 1989-12-29 | 1991-09-04 | Nissin Electric Co Ltd | 高絶縁酸化ケイ素薄膜の形成方法 |
| JPH05215929A (ja) * | 1992-02-03 | 1993-08-27 | Hitachi Cable Ltd | ガラス導波路の製造方法 |
| US5719705A (en) * | 1995-06-07 | 1998-02-17 | Sola International, Inc. | Anti-static anti-reflection coating |
| US6001728A (en) * | 1996-03-15 | 1999-12-14 | Applied Materials, Inc. | Method and apparatus for improving film stability of halogen-doped silicon oxide films |
| JP3836214B2 (ja) * | 1997-05-12 | 2006-10-25 | 凸版印刷株式会社 | 反射防止材及び光学部材 |
| JPH11264903A (ja) * | 1998-03-17 | 1999-09-28 | Canon Inc | 反射防止膜およびその製造方法 |
| US6300672B1 (en) * | 1998-07-22 | 2001-10-09 | Siemens Aktiengesellschaft | Silicon oxynitride cap for fluorinated silicate glass film in intermetal dielectric semiconductor fabrication |
| US6165915A (en) * | 1999-08-11 | 2000-12-26 | Taiwan Semiconductor Manufacturing Company | Forming halogen doped glass dielectric layer with enhanced stability |
| US6511923B1 (en) * | 2000-05-19 | 2003-01-28 | Applied Materials, Inc. | Deposition of stable dielectric films |
| FR2812664B1 (fr) * | 2000-08-01 | 2002-11-08 | Essilor Int | Procede de depot d'une couche de silice dopee au fluor et son application en optique ophtalmique |
-
2003
- 2003-08-07 EP EP03756536A patent/EP1529124B1/de not_active Expired - Lifetime
- 2003-08-07 DE DE60326959T patent/DE60326959D1/de not_active Expired - Lifetime
- 2003-08-07 JP JP2004528590A patent/JP4434949B2/ja not_active Expired - Fee Related
- 2003-08-07 US US10/523,951 patent/US20060023311A1/en not_active Abandoned
- 2003-08-07 AT AT03756536T patent/ATE427367T1/de not_active IP Right Cessation
- 2003-08-07 KR KR1020057002555A patent/KR101151813B1/ko not_active Expired - Fee Related
- 2003-08-07 WO PCT/FR2003/002487 patent/WO2004016822A2/fr not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1529124B1 (de) | 2009-04-01 |
| JP2005534995A (ja) | 2005-11-17 |
| DE60326959D1 (de) | 2009-05-14 |
| KR101151813B1 (ko) | 2012-06-01 |
| WO2004016822A2 (fr) | 2004-02-26 |
| AU2003285355A1 (en) | 2004-03-03 |
| WO2004016822A3 (fr) | 2004-04-08 |
| US20060023311A1 (en) | 2006-02-02 |
| JP4434949B2 (ja) | 2010-03-17 |
| KR20050062535A (ko) | 2005-06-23 |
| EP1529124A2 (de) | 2005-05-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |