Applying Quantum Cascade Laser Spectroscopy in Plasma Diagnostics
"> Figure 1
<p>Principal sketch of the optical set-up used for temperature determination. The radiation of the QCLAS system was passed three times through the Pyrex discharge cell. The cell was 60 cm in length with an inner diameter of 20 mm. The experiments were performed under static gas conditions, <span class="html-italic">P<sub>initial</sub></span> = 1.33 mbar [<a href="#B50-photonics-03-00045" class="html-bibr">50</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 2
<p>Detected NO spectrum in the time domain measured by the QCLAS system. The spectrum (solid line) corresponds to 0.8<span class="html-italic">%</span> NO in air at a pressure of 1.33 mbar with an absorption length <span class="html-italic">L</span> = 180 cm. The dashed curve shows the baseline. The embedded diagram shows a simulated NO spectrum using the HITRAN database [<a href="#B50-photonics-03-00045" class="html-bibr">50</a>,<a href="#B83-photonics-03-00045" class="html-bibr">83</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 3
<p>Calculated temporal evolution of the temperature of NO diluted in air (symbols) for a 150 mA plasma pulse. Exponential functions have been fitted to the temperature rise during the pulse, <span class="html-italic">t</span><sub>2</sub>, as well as to the cooling period after the plasma pulse, <span class="html-italic">t</span><sub>3</sub> [<a href="#B50-photonics-03-00045" class="html-bibr">50</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 4
<p>Calculated gas temperatures during the plasma pulse as a function of the mean plasma current. The total pressure of the gas mixture containing 0.8<span class="html-italic">%</span> NO in air was 1.33 mbar [<a href="#B50-photonics-03-00045" class="html-bibr">50</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 5
<p>Schematic of the Pyrex tube coated internally with a TiO<sub>2</sub> sol-gel film and TiO<sub>2</sub> nano-particles, with two electrodes, placed outside the tube [<a href="#B51-photonics-03-00045" class="html-bibr">51</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 6
<p>Time evolution of the concentrations of C<sub>2</sub>H<sub>2</sub> (upper panel) and of CO<sub>2</sub> (lower panel) in phases 3 and 4 (initial gas mixture: 1% C<sub>2</sub>H<sub>2</sub> in Ar, <span class="html-italic">p</span> = 2.6 mbar). After-treatment: ∆—heating to 350 °C and ■—UV radiation exposure [<a href="#B51-photonics-03-00045" class="html-bibr">51</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 7
<p>Photo-catalytic decomposition (i) of CO (○) and formation of CO<sub>2</sub> (●) in phases 3 and 4 after an Ar plasma pre-treatment in phase 1 and (ii) decomposition of CO (<b>□</b>) and formation of CO<sub>2</sub> (■) after an O<sub>2</sub> plasma pre-treatment in phase 1 (Ar RF plasma: <span class="html-italic">p</span> = 0.26 mbar, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math> = 14 sccm, <span class="html-italic">t</span> = 40 min, O<sub>2</sub> RF plasma: <span class="html-italic">p</span> = 0.53 mbar, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math> = 14 sccm, <span class="html-italic">t</span> = 30 min, initial gas mixture: 1% CO in Ar, <span class="html-italic">p</span> = 1.3 mbar, UV light exposure in phase 4) [<a href="#B51-photonics-03-00045" class="html-bibr">51</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 8
<p>Experimental set-up used to study surface vibrational relaxation of N<sub>2</sub> [<a href="#B52-photonics-03-00045" class="html-bibr">52</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 9
<p>Time evolution of the absorption signals of CO<sub>2</sub> and N<sub>2</sub>O measured simultaneously in a pulsed dc discharge at <span class="html-italic">p</span> = 133 Pa, <span class="html-italic">I</span> = 50 mA, <span class="html-italic">τ</span> = 5 ms. A fit of the experimental data is also shown. [<a href="#B52-photonics-03-00045" class="html-bibr">52</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 10
<p>Characteristic relaxation frequencies (1/<span class="html-italic">τ</span><sub>rel</sub>) as a function of the concentration of IR tracers left after the discharge pulse. The solid lines show a linear fit of the experimental data [<a href="#B52-photonics-03-00045" class="html-bibr">52</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 11
<p>Effective relaxation frequency 1/<span class="html-italic">τ</span><sub>rel</sub> in a silica reactor, pretreated with a N<sub>2</sub>, O<sub>2</sub> or argon plasma, as a function of the concentration of the IR tracer N<sub>2</sub>O [<a href="#B52-photonics-03-00045" class="html-bibr">52</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 12
<p>Experimental set-up. OAP: off-axis parabolic mirror; QCL: quantum cascade laser; <span class="html-italic">R</span><sub>meas</sub> = 18.4 Ω; <span class="html-italic">U</span><sub>HV</sub>: HV pulse generator; <span class="html-italic">U</span><sub>meas</sub>: HV probe for voltage measurement. The electrodes are represented by the two black rods inside the T-shaped holder [<a href="#B64-photonics-03-00045" class="html-bibr">64</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 13
<p>(<b>a</b>) Temporal evolution of selected atomic species and (<b>b</b>) of electronically excited nitrogen molecules for the case of a current of 150 mA [<a href="#B64-photonics-03-00045" class="html-bibr">64</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 14
<p>Temporal evolution of the measured (symbols) and calculated (full line) NO density in synthetic air for <span class="html-italic">I</span> = 150 mA. The dashed line represents the gas temperature. The dashed-dotted line is the plasma pulse [<a href="#B64-photonics-03-00045" class="html-bibr">64</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 15
<p>Experimental arrangement of the inductively coupled plasma (ICP) reactor, Oxford Plasmalab system 100, combined with a Q-MACS Process fiber system containing two pulsed QCLs [<a href="#B58-photonics-03-00045" class="html-bibr">58</a>], © Springer Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 16
<p>Time dependent CO concentration with and without O<sub>2</sub> plasma pretreatment (CF<sub>4</sub> plasma, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math> = 12 sccm, <span class="html-italic">p</span> = 1.6 Pa). (Pretreatment: <span class="html-italic">t</span> = 3 min, <span class="html-italic">p</span> = 1.3 Pa, <span class="html-italic">P</span> = 1.5 kW, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math><sub>O2</sub> = 30 sccm) [<a href="#B58-photonics-03-00045" class="html-bibr">58</a>], © Springer Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 17
<p>Production rate of SiF<sub>4</sub> and the etching rate of SiCOH dependence on power (CF<sub>4</sub> plasma, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math> = 12 sccm, <span class="html-italic">p</span> = 0.93 Pa) [<a href="#B58-photonics-03-00045" class="html-bibr">58</a>], © Springer Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 18
<p>Schematics of a microscale atmospheric pressure RF plasma jet (<span class="html-italic">μ</span>-APPJ) source [<a href="#B65-photonics-03-00045" class="html-bibr">65</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 19
<p>Set-up of the <span class="html-italic">μ</span>-APPJ with adjacent absorption cell [<a href="#B65-photonics-03-00045" class="html-bibr">65</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 20
<p>Absolute concentration of NO <b>(blue</b> square) and N<sub>2</sub>O (<b>red</b> circle) produced by the micro plasma jet as a function of the absorbed power for a helium flow of 1.4 slm with constant 1400 ppm O<sub>2</sub> and 7100 ppm N<sub>2</sub> admixture. The dashed blue line and the dashed dot red line are the polynomial fit of NO and N<sub>2</sub>O densities, respectively [<a href="#B65-photonics-03-00045" class="html-bibr">65</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 21
<p>Comparison of absolute densities of nitrous species from the <span class="html-italic">μ</span>-APPJ obtained by molecular beam mass spectrometry (MBMS) (for <span class="html-italic">x</span> = 1 and 10 mm) and IR absorption (>100 mm) for a ratio of He/N<sub>2</sub>/O<sub>2</sub> = 99.58/0.35/0.07 at 1.4 slm gas flow. The connecting lines are to show the reader the different decay constants of the species [<a href="#B65-photonics-03-00045" class="html-bibr">65</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 22
<p>Schematic diagram of the spectroscopic experimental set-up based on a QCL absorption diagnostic system implementing the plasma jet. [<a href="#B54-photonics-03-00045" class="html-bibr">54</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 23
<p>Transmittance spectrum of NO<sub>2</sub> produced by the jet at atmospheric pressure combined with a real-time fit [<a href="#B54-photonics-03-00045" class="html-bibr">54</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 24
<p>Absolute concentration of NO<sub>2</sub> produced by the kinpen for different dry air admixtures [<a href="#B54-photonics-03-00045" class="html-bibr">54</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 25
<p>Experimental arrangement of the tunable diode lasers (TDLs), using a cw QCL, and the plasma-enhanced chemical vapor deposition (PECVD) system. Silane is monitored in the reactor volume (D<sub>1</sub>), in the chamber volume (D<sub>2</sub>), and in the pumping line (D<sub>3</sub>) of the PECVD system [<a href="#B57-photonics-03-00045" class="html-bibr">57</a>], Reproduced from [<a href="#B57-photonics-03-00045" class="html-bibr">57</a>], with the permission of AIP Publishing.</p> "> Figure 26
<p>Plasma termination in a PECVD reactor for process A (<b>a</b>) and process B (<b>b</b>). In process A, Q<sub>SiH4</sub>; Q<sub>H2</sub>, and p were 45 sccm, 1980 sccm, and 4 mbars, respectively. In process B, a pressure of 1 mbar was maintained in the reactor with a pure input SiH<sub>4</sub> flow rate of 120 sccm. Upon termination of the plasma, the SiH<sub>4</sub> recovers its undepleted value with a time constant of 390 ms (<b>a</b>) and 1.82 s (<b>b</b>) (as obtained from an exponential fitting procedure). The time constant is similar to the gas residence time of the respective process [<a href="#B57-photonics-03-00045" class="html-bibr">57</a>], Reproduced from [<a href="#B57-photonics-03-00045" class="html-bibr">57</a>], with the permission of AIP Publishing.</p> "> Figure 27
<p>Outline of the Oxford Plasmalab System 100 ICP etch chamber equipped with Q-MACS Process fiber system. CF<sub>2</sub> radicals were detected using a multipass cell just above the wafer [<a href="#B59-photonics-03-00045" class="html-bibr">59</a>], Reproduced from [<a href="#B59-photonics-03-00045" class="html-bibr">59</a>], with the permission of AIP Publishing.</p> "> Figure 28
<p>Time dependent CF<sub>2</sub> concentration while etching blank porous SiCOH (squares) and structured porous SiCOH (circles) using a CF<sub>4</sub> plasma with a rf power of 1000 W, bias power of 60 W, 1.33 Pa total pressure, and a gas flow rate of 25 sccm. The inset shows a schematic diagram of the lateral cross-section of a structured porous SiCOH wafer. The numbers in the upper curve represent the numbers given as the inset [<a href="#B59-photonics-03-00045" class="html-bibr">59</a>], Reproduced from [<a href="#B59-photonics-03-00045" class="html-bibr">59</a>], with the permission of AIP Publishing.</p> "> Figure 29
<p>Experimental arrangement of the PLANIMOR model reactor combined with QCLAS and OES spectrometers. The plane of the White cell is parallel to the screen and the sample holder (it is rotated by 90° for better illustration) [<a href="#B63-photonics-03-00045" class="html-bibr">63</a>], Reproduced from [<a href="#B63-photonics-03-00045" class="html-bibr">63</a>], with the permission of AIP Publishing.</p> "> Figure 30
<p>Example of an absorption spectrum at 1356.6 cm<sup>−1</sup> with absorption features of CH<sub>4</sub>, HCN, C<sub>2</sub>H<sub>2</sub> and NH<sub>3</sub> (<span class="html-italic">p</span> = 3 mbar, 10 sccm H<sub>2</sub> + 10 sccm N<sub>2</sub> + 0.5 sccm CH<sub>4</sub>, <span class="html-italic">P</span><sub>screen</sub> = 90 W) [<a href="#B63-photonics-03-00045" class="html-bibr">63</a>], Reproduced from [<a href="#B63-photonics-03-00045" class="html-bibr">63</a>], with the permission of AIP Publishing.</p> "> Figure 31
<p>Comparing treated (left) and untreated (right) C15 steel samples at <span class="html-italic">t</span> = 4 h, <span class="html-italic">P</span><sub>screen</sub> = 90 W, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math> = 20 sccm (H<sub>2</sub>:N<sub>2</sub> = 1:1), <span class="html-italic">p</span> = 3 mbar, and <span class="html-italic">T</span><sub>samples</sub> = 823 K [<a href="#B63-photonics-03-00045" class="html-bibr">63</a>], Reproduced from [<a href="#B63-photonics-03-00045" class="html-bibr">63</a>], with the permission of AIP Publishing.</p> "> Figure 32
<p>The concentrations of NH<sub>3</sub>, CH<sub>4</sub>, HCN and C<sub>2</sub>H<sub>2</sub> depending on the power of the screen plasma (<span class="html-italic">p</span> = 3 mbar, 10 sccm H<sub>2</sub> + 10 sccm N<sub>2</sub> + 0.2 sccm CH<sub>4</sub>) [<a href="#B63-photonics-03-00045" class="html-bibr">63</a>], Reproduced from [<a href="#B63-photonics-03-00045" class="html-bibr">63</a>], with the permission of AIP Publishing.</p> "> Figure 33
<p>Experimental arrangement of the distributed antenna array (DAA) microwave reactor combined with the AS spectrometer consisting of the IRMA system and an external cavity QCL (EC-QCL) and the OES unit [<a href="#B66-photonics-03-00045" class="html-bibr">66</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 34
<p>CO band stick spectrum containing 31 ground and hot band lines measured with an EC-QCL spectrometer. The intensities of the lines are normalized. In general, the intensities of the hot band lines are about 20 times smaller than the ground state lines, <span class="html-italic">p</span> = 0.35 mbar, <span class="html-italic">P</span> = 3 kW [<a href="#B66-photonics-03-00045" class="html-bibr">66</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 35
<p>Experimental data of absorption lines of CO, R(1) of the ground state and R(17) of the first hot band, together with Gaussian fits for temperature determination. The lines are superposed in position and normalized in intensity in order to compare their relative broadening, <span class="html-italic">p</span> = 0.35 mbar, <span class="html-italic">P</span> = 3 kW, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math> = 50 sccm, CH<sub>4</sub> admixture: 2.5%, CO<sub>2</sub> admixture: 1% [<a href="#B66-photonics-03-00045" class="html-bibr">66</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 36
<p>Gas temperature T<sub>gas</sub> determined from the Doppler broadening of CO lines as a function of their rotational quantum number for the R and P branches for the ground and the first, second and third excited vibrational levels, <span class="html-italic">p</span> = 0.25 mbar, <span class="html-italic">P</span> = 3 kW, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math> = 50 sccm, CH<sub>4</sub> admixture: 2.5%, CO<sub>2</sub> admixture: 1% [<a href="#B66-photonics-03-00045" class="html-bibr">66</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> "> Figure 37
<p>Boltzmann plot of the P and R branch of CO lines of the first hot band for two pressure values, <span class="html-italic">p</span> = 0.25 and 0.35 mbar, <span class="html-italic">P</span> = 3 kW, <math display="inline"> <semantics> <mrow> <mi>ϕ</mi> </mrow> </semantics> </math> = 50 sccm, CH<sub>4</sub> admixture: 2.5%, CO<sub>2</sub> admixture: 1% [<a href="#B66-photonics-03-00045" class="html-bibr">66</a>], © IOP Publishing. Reproduced with permission. All rights reserved.</p> ">
Abstract
:1. Introduction
2. Application of Pulsed QCLs in Low- and Atmospheric Pressure Plasmas
2.1. General Spectroscopic Issues
2.2. Methods for Determining Gas Temperatures in Plasmas
2.3. Study of Plasma Surface Interactions in Low-Pressure Plasmas
2.3.1. On the Reactivity of Plasma Treated Photo-Catalytic TiO2 Surfaces for Oxidation of C2H2 and CO
2.3.2. Surface Vibrational Relaxation of N2 Studied by Titration
2.4. Kinetic Studies of NO Formation in Pulsed Air-Like Low-Pressure dc Plasmas
2.5. Industrial Process Monitoring in Low-Pressure Plasmas
2.6. Plasma Chemistry Studies in Atmospheric Pressure Plasma Jets
2.6.1. On the Production of NO and N2O in a Microscale Atmospheric Pressure Plasma Jet
2.6.2. On the Dynamics of the NO2 Production of an Ar/Air Plasma Jet
3. Application of Continuous Wave QCLs
3.1. On Practical Silicon Deposition Rules Derived from Silane Monitoring
3.2. Monitoring of CF2 Concentrations as a Diagnostic Tool for Dielectric Etching Plasma Processes
4. Applications of External Cavity QCLs
4.1. Investigations of Plasma Nitriding and Nitrocarburizing Processes
4.2. Study of Low Pressure, Low Temperature H2-CH4-CO2 Microwave Plasmas Used for Large Area Deposition of Nanocrystalline Diamond Films
5. Summary and Conclusions
Acknowledgments
Author Contributions
Conflicts of Interest
References
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Species | Spectral Range (cm−1) | Type of Plasma | Application 1 | Pressure (mbar) 2 | Type of QCL | Tuning Method | Method of Absorpt 3 | Time Resolution | Year | Ref. |
---|---|---|---|---|---|---|---|---|---|---|
CH4 | ~1275 | MW | Res. | >50 | pulsed | intra | DAS/SP | 1 s | 2006 | [23] |
NO | 1897 | DC | Res. | 2.7 | pulsed | intra | DAS/SP | 5 µs | 2007 | [24] |
SiF4 | 1028 | RF | Ind. | 0.33 | pulsed | inter | DAS/DP | ~1 s | 2007 | [25] |
CH4 | 1253 | RF | Res. | 0.23 | pulsed | intra | DAS/SP | n.a. | 2008 | [26] |
CF3 | 1253 | Photolysis | Res. | 2.6 ... 5.4 | pulsed | intra | DAS/SP | 5 µs | 2008 | [27] |
C2H2 | ~1275 | Flame | Res. | 1013 | pulsed | intra | DAS/SP | n.a. | 2009 | [28] |
NF3 | 1028 | RF | Ind. | 0.33 | pulsed | inter | DAS/DP | ~1 s | 2009 | [29] |
C2H2 | ~1275 | MW | Res. | 199.5 | pulsed | intra | DAS/SP | 1 s | 2009 | [30] |
SiH4 | 2244 | VHF 4 | Res. (Ind.) | 3.5 ... 4.5 | cw | DAS/SP | n.a. | 2009 | [31] | |
BCl3 | 964 | MW | Res. | 2 | pulsed | inter | DAS/DP | 3 s | 2009 | [32] |
NO | 1900 | DPBPR 5 | Res. | 1013.25 | cw | DAS/SP | >1 s | 2009 | [33] | |
CF4 | 1271 | RF | Res. | 0.1 | pulsed | intra | DAS/DP | 5 ms | 2009 | [34,35,36] |
C3F8 | 1274 | 2010 | ||||||||
SiF4 | 1028 | MW | Res. (Ind.) | 0.2 ... 0.3 | pulsed | inter | DAS/DP | 1 s | 2010 | [37] |
C4F6 | 973 | pulsed | ||||||||
CH4 | 1303 | MW | Res. | 1.5 | cw | DAS/SP | 0.2 s | 2010 | [3] | |
HCN | 1304 | MW | Res. | 1.5 | cw | CEAS | >1 s | 2010 | [3] | |
NO | 1819 | MW | Res. | 1.5 | cw | CEAS | >1 s | 2010 | [3] | |
BCl3 | 964 | DC | Ind. | 2 | pulsed | inter | DAS/DP | 3 s | 2010 | [38] |
NO | 1897 | RF | Res. | 0.53 | pulsed | intra | DAS/SP | >1 s | 2010 | [5] |
NO2 | 1612 | |||||||||
CH4 | 1343 | RF | Res. | 0.1 | pulsed | inter | DAS/DP | >1 s | 2010 | [39] |
C2H2 | 1344 | RF | Res. | 0.055 | pulsed | inter | DAS/DP | >1 s | 2011 | [40] |
CO | 2078 | ICP-RF | Ind. | 0.009 | pulsed | inter | DAS/MP | >1 s | 2011 | [41] |
COF2 | ? | |||||||||
SiF4 | 1031 | |||||||||
BCl3 | 9635 | DC | Ind. | 2 | pulsed | inter | DAS/SP | <1 s | 2011 | [42] |
N2O | 2207 | DC | Res. | 1.33 | pulsed | intra | DAS/SP | <1 μs | 2011 | [15] |
NO | 1900 | |||||||||
NO2 | 1615 | |||||||||
CH4 | 1343 | ICP-RF | Res. | 0.43 | pulsed | inter | DAS/MP | >1 s | 2011 | [43] |
C2H2 | 1344 | |||||||||
NO | 1897 | DC | Res. | 0.53 | pulsed | intra | DAS/SP | >1 s | 2011 | [44] |
NO2 | 1612 | |||||||||
NO | 1897 | DC | Res. | 2.66 | pulsed | intra | DAS/DP | <1 μs | 2011 | [45] |
CO2 | 2325 | DC | Res. | 1.33 | pulsed | intra | DAS/DP | <1 μs | 2012 | [46] |
O3 | 1027 | VHF 4 | Res. | 1013.25 | pulsed | inter | DAS/MP | >1 s | 2012 | [47] |
CH4 | 1333 | RF | Res. | 0.06 | EC | DAS/MP | >1 s | 2012 | [48] | |
C2H2 | 1333 | |||||||||
C2H4 | 1413 | |||||||||
H2O | 1375 | |||||||||
HCN | 1383 | |||||||||
HNO3 | 1333 | |||||||||
CH4 | 1381 | MW | Res. | 0.5 | EC | DAS/MP | >1 s | 2012 | [49] | |
C2H2 | 1333 | |||||||||
H2O | 1375 | |||||||||
HCN | 1383 | |||||||||
NO | 1900 | DC | Res. | 1.33 | pulsed | DAS/DP | <1 μs | 2012 | [50] | |
C2H2 | 1345 | DC | Res. | 2.6 | pulsed | intra | DAS/DP | >1 s | 2013 | [51] |
CO | 2206 | |||||||||
CO2 | 2329 | |||||||||
CO | 2143 | DC | Res. | 1.33 | pulsed | intra | DAS/DP | <1 μs | 2013 | [52] |
CO2 | 2349 | |||||||||
N2O | 2224 | |||||||||
NO2 | 1641 | VHF 4 | Res. | 1013.25 | pulsed | ATTC 6 | DAS/SP | <1 μs | 2013 | [53] |
NO2 | 1612 | VHF 4 | Res. | 1013.25 | pulsed | inter | DAS/MP | >1 s | 2014 | [54] |
CH4 | 1347 | VHF 4 | Res. | 0.003 | cw | DAS/MP | >1 s | 2014 | [55] | |
C2H2 | ||||||||||
O3 | 1027 | VHF 4 | Res. | 1013.25 | pulsed | inter | DAS/MP | >1 s | 2015 | [56] |
SiH4 | 2244 | VHF 4 | Res. (Ind.) | 3.5 ... 4.5 | cw | DAS/SP | n.a. | 2015 | [57] | |
CO | 2078 | ICP-RF | Ind. | 0.009 | pulsed | inter | DAS/MP | >1 s | 2015 | [58] |
SiF4 | 1031 | |||||||||
CF2 | 1106 | ICP-RF | Ind. | 0.0133 | cw | DAS/MP | <1 s | 2015 | [59] | |
O3 | 1027 | VHF 4 | Res. | 1013.25 | pulsed | inter | DAS/MP | >1 s | 2015 | [60] |
NO2 | 1612 | |||||||||
O3 | 1027 | VHF 4 | Res. | 1013.25 | pulsed | inter | DAS/MP | >1 s | 2015 | [61] |
NO2 | 1612 | |||||||||
CH4 | 1356 | DC | Res. | 3 | EC | DAS/MP | >1 s | 2015 | [62] | |
C2H2 | 1357 | |||||||||
HCN | 1388 | |||||||||
NH3 | 1388 | |||||||||
CH4 | 1356 | DC | Res. | 3 | EC | DAS/MP | >1 s | 2015 | [63] | |
C2H2 | 1357 | |||||||||
HCN | 1388 | |||||||||
NH3 | 1388 | |||||||||
NO | 2207 | DC | Res. | 1.33 | pulsed | intra | DAS/DP | <1 μs | 2016 | [64] |
NO2 | 1900 | |||||||||
N2O | 1615 | |||||||||
NO | 1903 | RF | Res. | 1013.25 | pulsed | intra | DAS/MP | <1 μs | 2016 | [65] |
N2O | 2213 | |||||||||
CO | 2197 | MW | Res. | 0.25–0.55 | EC | DAS/MP | <1 s | 2016 | [66] | |
CO | 2197 | MW | Res. | 0.25–0.55 | EC | DAS/MP | <1 s | 2016 | [67] | |
CO | 2147 | MW | Res. | 0.25–0.5 | EC | DAS/MP | <1 s | 2016 | [68] |
Phase No. | 1 | 2 | 3 | 4 | |||
---|---|---|---|---|---|---|---|
Phase Name | Pre-Treatment (Plasma Activation) | Evacuation | Filling and Adsorption | After-Treatment (Stimulated Oxidation) | |||
Sub-Phase Name | Heating 350 °C | UV radiation | |||||
Precursor Gas | O2 | N2 | Ar | 1% C2H2 or 1% CO in Ar | Ar Buffer | ||
Pressure (mbar) | 1.25 | 0.75 | 0.26 | Pumping | 1.3–6.6 | 2.6 | |
Duration (min) | 10–30 | 10–30 | 10–20 | 10 | 5–30 | 25 | 35 |
Flowing (FC) or Static (SC) Conditions | FC | FC | FC | SC | SC |
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Röpcke, J.; Davies, P.B.; Hamann, S.; Hannemann, M.; Lang, N.; Van Helden, J.-P.H. Applying Quantum Cascade Laser Spectroscopy in Plasma Diagnostics. Photonics 2016, 3, 45. https://doi.org/10.3390/photonics3030045
Röpcke J, Davies PB, Hamann S, Hannemann M, Lang N, Van Helden J-PH. Applying Quantum Cascade Laser Spectroscopy in Plasma Diagnostics. Photonics. 2016; 3(3):45. https://doi.org/10.3390/photonics3030045
Chicago/Turabian StyleRöpcke, Jürgen, Paul B. Davies, Stephan Hamann, Mario Hannemann, Norbert Lang, and Jean-Pierre H. Van Helden. 2016. "Applying Quantum Cascade Laser Spectroscopy in Plasma Diagnostics" Photonics 3, no. 3: 45. https://doi.org/10.3390/photonics3030045