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SEMICONDUCTING MATERIALS

1 Introduction
1.1. Properties of Semiconducting materials
1.2. Elemental and Compound semiconductors
2 Intrinsic Semiconductors – Electrons and Holes
3 Carrier Concentration in an Intrinsic Semiconductor
3.1. Density of Electrons
3.2. Density of Holes
3.3. Density of intrinsic Carrier Concentration
3.4. Fermi Energy Level
3.5. Electrical Conductivity
3.6. Determination of Band gap in intrinsic semiconductor
4 Extrinsic Semiconductor

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4.1. n- type Semiconductor

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4.2. p- type Semiconductor
5 Carrier Concentration and Fermi level Calculation in n- type Semiconductor
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5.1. Fermi energy level
5.2. Density of electron Concentration
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5.3. Electrical Conductivity
5.4. Variation of carrier concentration with temperature in n – type
semiconductor
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6 Carrier Concentration and Fermi level Calculation in p- type Semiconductor

6.1. Carrier Concentration
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6.2. Fermi Energy level

7 Variation of carrier concentration with temperature in P- type Semiconductor
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8 Hall Effect
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8.1. Statement
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8.2. Theory
8.3. Calculation of Hall Coefficient
8.4. Applications of Hall Effect

1 INTRODUCTION
Based on electrical resistance

The resistivity of a semiconductor is lesser then an insulator but more than

that of a conductor. It is in the order of 10-4 to 0.5 ohm metre.

Based on energy band

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A semiconductor has nearly empty conduction band and almost filled valance
band with very small energy gap (≈ 1eV).

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1.1. GENERAL PROPERTIES OF SEMICONDUCTORS
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They are formed by covalent bonds.
They have an empty conduction band at 0K They have almost filled valance band
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They have small energy gap They posses crystalline structure
They have negative temperature co efficient of resistance
If the impurities are added to a semiconductor, its electrical conductivity
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increases. Similarly, if the temperature of the semiconductor increased, its

electrical conductivity increases.
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1.2. ELEMENTAL AND COMPOUND SEMICONDUCTORS

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The semiconductors are classified mainly into two types based on composition of
materials.
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Elemental semiconductors
Compound semiconductors
Elemental semiconductors

These semiconductors are made from a single element of fourth group elements
of the periodic table.
They are also known as indirect band gap semiconductors

Example –Germanium, silicon

Compound semiconductors

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Semiconductors which are formed by combining third and fifth group

elements or second and sixth group elements in the periodic table are known as
compound semiconductors. These compound semiconductors are also known as
direct band gap semiconductors.

Example –1. Combination of third and fifth group elements

Gallium phosphide (GaP)

Gallium arsenide (GaAs)

Indium phosphide (InP)

Indium arsenide (InAs)

2. Combination of second and sixth group elements Magnesium oxide (MgO)

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Magnesium silicon (MgSi) Zinc oxide (ZnO)
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Zinc sulphide (ZnS)
Types of semiconductors
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Based on the purity semiconductors are classified in to the following two types.
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Intrinsic semiconductors

Extrinsic semiconductors
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Intrinsic semiconductors
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A semiconductor in extremely pure form, without the addition of

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impurities is known as intrinsic semiconductors. Its electrical conductivity can be

changed due to thermal excitation.

At 0K the valance band is completely filled and the conduction band is

empty. The carrier concentration (i.e) electron density (or) hole density increases
exponentially with increase in temperature.

Extrinsic semiconductors

A semiconductor in extremely impure form, with the addition of impurities

is known as extrinsic semiconductors.

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2 INTRINSIC SEMICONDUCTORS –
ELECTRONS AND HOLES
We know that, at 0K intrinsic pure semiconductor behaves as insulator. But as
temperature increases some electron move from valance band to conduction band
as shown in fig. therefore both electrons in conduction band and holes in valance
band will contribute to electrical conductivity. Therefore the carrier concentration
(or) density of electrons (ne) and holes (nh) has to be calculated.

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Assume that electron in the conduction band as a free electron of mass

m*e and the hole in the valance band behave as a free particle of mass m* h. The
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electrons in the conduction band have energies Lying

from Ec to ∞ and holes-∞intotheEv valanceasshownb Ec represents the
lowest energy level of conduction band Ev represents the highest energy level of
the valance band.

3. CARRIER CONCENTRATION IN AN
INTRINSIC SEMICONDUCTOR
3.1. DENSITY OF ELECTRONS IN CONDUCTION BAND

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We know Fermi function, probability of finding an electron in a given energy

state is

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Substituting equation 4 & 3 in equation 1 we have Density of electrons in
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conduction band within the limits Ec to ∞ as

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Since to move an electron from valavce band to conduction band the energy
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required is greater then 4 KBT (i.e) E –EF >>KBT (or) (E - EF) / KBT >>1
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Let us assume that E –Ec = x KBT

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Or E = Ec + x KBT pz
Differentiating we get dE = KBT. dx,
Limits: when E = Ec; x = 0
When E = ∞; x = ∞
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Limits are 0 to ∞
Equation 6 can be written as
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3.2. DENSITY OF HOLES IN VALANCE BAND

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We know F(E) represents the probability of filled states. As the maximum

probability 1, the probability of un filled states will be [1 –F(E)].
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Example, if F(E) = 0.8 then 1 –F(E) = 0.2

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(i.e) 80% chance of finding an electron in valance band and 20% chance of
finding a hole in valance band.

Let the maximum energy in valance band be Ev and the minimum energy be -∞.
Theref density of hole in valance band nh is given by

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Let us assume that

Ev –E = x KBT,
Differentiating we get dE = - KBT. dx,
Limits: when E = ∞;
When Ev –(-∞) = x; x = ∞
when E = Ev; x = 0
Limits are ∞ to 0
Equation 11 becomes

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3.3. DENSITY OF INTRINSIC CARRIER CONCENTRATION
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In an intrinsic semiconductor, the concentration of electrons in the conduction

band is equal to the concentration of holes in the valance band.
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Where Ec –Ev = Eg is the forbidden energy gap.

3.4. FERMI ENERGY LEVEL

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For an intrinsic semiconductor number of electrons (i.e) electron density will be

the same as that of the number of holes (i.e) hole density.
(i.e) n e = n h
Equating equations 7& 12

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If m*h = m*e, then log m*h / m*e = 0 since log 1 = 0

(i.e) the Fermi energy level lies in the midway between Ec and Ev as shown fig
(since at 0K, T = 0).

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But in actual case m*h m*e and the Fermi energy level slightly increases with
increase in temperature as shown in fig.

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Mobility
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When an electric field is applied to a semiconductor, the charge carrier

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namely electrons and holes attain drift velocity Vd. The drift velocity attained by
the charge carrier is proportional to electric field strength E.

Drift velocity Vd is proportional to E

(i.e) Vd α E

Vd = μ E

Where μ is proportionality constant and it is known as the mobility of the charge

carrier being considered. Mobility μ is defined as the velocity of a charge carrier
produced unit field strength.

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The electron and hole nobilities are denoted by the symbols μe and μh .

3.5.ELECTRICAL CONDUCTIVITY

Electrical conductivity of a semiconductor is different from that of a

conductor. The charge carriers in a conductor are electrons. In the case of a
semiconductor, both electron and holes are charge carriers.

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On the basis of free electron theory of solids, the electrical conductivity of metal
is given by

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σ =μ ne ----(1) pz
Using the equation 1, the electrical conductivity of a semiconductor due to
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electrons in the conduction band is given by
σe = n e e μ e -----(2)
Where n e is the number of electrons per unit volume; e is the charge of an electron
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μe is the electron mobility.

Similarly, the electrical conductivity of a semiconductor due to holes in the
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valance band is given by

σh = n h e μ h ----(3)
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where n h - is the hole density in the valance band; e - is the charge of a hole
μh –is the hole mobility
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Therefore the total electrical conductivit conductivities due to electrons and holes.

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σi = σ e + σ h ---------(4)
Substituting equations 2& 3 in the equation 4,

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We have pz
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For an intrinsic semiconductor, the number of electrons in the conduction band is

equal to the number of holes in the valance band,
(i.e) n e = n h = n i
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Where n i is the intrinsic carrier concentration.

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Hence, the electrical conductivity of an intrinsic semiconductor is given by

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σi = e[ n i μe + n i μh]
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Thus, the electrical conductivity depends upon the negative exponential of the
forbidden energy gap Eg and on the motilities’ of both electron and holes.

3.6. BAND GAP DETERMINATION

Electrical conductivity of an intrinsic semiconductor is given by

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This equation (6) is similar to the equation of a straight line, y = mx + c

In equation (6), y = log R; x = 1 / T; m = Eg / 2 KBT and c = logC
From the equation 6, it is noted that by measuring the resistance of an i
ntrinsic semiconductor at different temperatures, its forbidden energy gap Eg can
be determined.
If a graph is drawn between log R and 1 / T, the value of Eg is determined from
the slope of a straight line.

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Slope = Eg / 2k
Eg = 2k X slope ----(7)
From the graph slope = dy / dx
Substituting the expression for the slope in equation (7), we have

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Eg = 2k dy / dx

Where, k is the Boltzmann’s constant.

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4 EXTRINSIC SEMICONDUCTOR
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In a semiconducting material, if the charge carriers originate from impurity atoms

added to the original material, then this type of semiconductor is called extrinsic
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or impure semiconductor. It is also known as doped semiconductor.

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Doping
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The method of adding impurities to a pure semiconductor is known as

doping and impurity added is called doping agent or dopant.

The addition of impurities will increase the number of free electrons and
holes in a semiconductor and hence increases its electrical conductivity.

Advantages of extrinsic semiconductor

Conductivity is high.
Conductivity can be controlled to any desired value through the control of doping
concentration.
Conductivity is not a function of temperature.
Types of extrinsic semiconductor
The extrinsic semiconductors are classified into two types based on the
type of impurity added.

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(i). n –type semiconductor

(ii). P –type semiconductor

4.1. N –TYPE SEMICONDUCTOR

When a small amount of pentavalent impurity (group V element) is added

to a pure semiconductor, it becomes a n –semiconductor.. such impurities are
known as donor impurities because they donate the free electrons to the
semiconductor crystal.

A pentavalent impurity (arsenic) having five valance electrons is ad

ded to a pure

semiconducting material having four valance electrons (silicon or germanium).

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The four valance electrons of the impurity atoms bond with four valance
electrons of the
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semiconductor atom and remaining 1 electron of the impurity atom is left free as
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shown fig.
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Therefore number of free electrons increases, as the electrons are produced in

excess, they the majority charge carrier in n –type semiconductor and holes are
the majority charge carriers.
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Since electrons are donated in this type of semiconductor the energy level of these
donated electrons is called donor energy level (Ed) as shown in fig.
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Ed is very close to conduction band and hence even at room temperature the
electrons are easily excited to conduction band. The current flow in this type of
semiconductor is due to electrons.

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4.2. P –TYPE SEMICONDUCTOR

P –type semiconductor is obtained by doping an intrinsic semiconductor

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with trivalannt (3 electrons in valance band)impurity atoms like boron, gallium,

indium etc.,
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The three valance electrons of the impurity atom pairs with three valence
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electrons of the semiconductor atom and one position of the impurity atom
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remains vacant, this is called hole as shown in fig

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Therefore the number of holes increased with impurity atoms added to it.
Since holes are produced in excess, they are the majority charge carriers in p –
type semiconductor and electrons are the minority charge carriers.

Since the impurity can accept the electrons this energy level is called acceptor
energy level (Ea) and is present just above the valence band as shown in fig.

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Here the current conduction is mainly due to holes (holes are shifted from

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one covalent bond to anther). pz
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5 CARRIER CONCENTRATION IN N –TYPE

SEMICONDUCTOR
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5.1. FERMI ENERGY LEVEL

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The energy band structure of n –type semiconductor is shown in fig. At 0

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K, EF will lie exactly between Ec and Ed, but even at low temperature some
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electrons may go from Ed to Ec. Let us assume that Ec –EF > KBT. Then the
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density of electrons in conduction band can be written as

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Let Nd be the number of donor energy levels per cm 3 (i.e) density of state Z(Ed)

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dE. If some electrons donated from donor energy level to conduction band say
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for example if two electrons goes to conduction band then two vacant sites (holes)
will be created in Ed levels.
Thus in general we can write the density of holes in donor energy level as
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N(Ed) dE = Z(Ed) dE .(1 –F(Ed))

(i.e) n h = Nd .(1 –F(Ed)) ---(2)
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At equilibrium condition
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Number of electrons per unit volume in conduction band (electron density) =

Number of holes per unit volume in conduction band (hole density)
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Equating equation (1) and equation (5) we get

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Equation (7) shows that, at 0K, EF will lie expertly in the midway between Ec and
Ed.
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5.2 DENSITY OF ELECTRON CONCENTRATION (n)

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By substituting Ef value from equation (7) into expression

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5.3ELECTRICAL CONDUCTIVITY
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We know that electrical conductivity in semiconductor is given by
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σn = n e e μ e +n h e μ h
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where μh=0
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σn = n e e μ e
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This equation represent the electrical conductivity of n –type semiconductor.

5.4 VARIATION OF CARRIER CONCENTRATION WITH

TEMPERATURE IN N – TYPE SEMICONDUCTOR
When the temperature increased some electrons in Ed level may be shifted to
conduction band and hence some vacant sites will be created in Ed levels.
Therefore the Fermi level shifts down to separate that empty levels and the filled
valance band level as shown in fig.

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From the above figure it can be seen that for the same temperature, if the

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impurity atoms (i.e) doping level is increased, the electron concentration
increases and hence Fermi level increases.

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6 CARRIER CONCENTRATION AND FERMI
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LEVEL IN P –TYPE SEMICONDUCTOR

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6.1. CARRIER CONCENTRATION

For p –type at absolute zero EF will be exactly between Ea and Ev. At low
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temperature some electron from valence band fills the holes in the acceptor
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energy level as shown in figure.

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We know the density of holes in the valence band,

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Let Na be the number of acceptor energy levels per cm 3 which has energy Ea
above valence band. If some electrons are accepted by acceptor energy levels
from the valence band, say for example
if two electrons are accepted to fill the hole sites in the acceptor levels, then two
holes will be created in the valence band as shown in fig .

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Therefore in general the electron density in the acceptor energy level can be
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written as
N(Ea) dE = Z(Ea) dE F(Ea)
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At equilibrium condition
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Number of electrons per unit volume in conduction band (electron density) =

Number of holes per unit volume in conduction band (hole density)
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Equating equation (1) and equation (4) we get

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6.2. FERMI ENERGY LEVEL

At 0K, when T= 0 we can write equation (5)

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7 VARIATION OF FERMI LEVEL WITH

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TEMPERATURE AND IMPURITY

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CONCENTRATION IN P –TYPE
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SEMICONDUCTOR
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When the temperature is increased, some of the electrons in the valence

band will go to the acceptor energy level by breaking up the covalent bonds and
hence Fermi energy level shifted upward direction for doping level of Nd =
10 21 atoms / m3as shown in figure.

From the figure it can be seen that for the same temperature, if the impurity atoms
(i.e) doping level is increased say Nd = 10 24atoms /m3, the hole concentration
increases and hence the Fermi level decreases.

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Therefore at low temperature the Fermi energy level may be increased up
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to the level of intrinsic energy level (Ei).
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8 HALL EFFECT:
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Measurement of conductivity will not determine whether the conduction is

due to electron or holes and therefore it will be very difficult to distinguish
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between p –type and n- type semiconductors.

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Therefore Hall Effect is used to distinguish between the two types of

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charge carriers and their carrier densities and is used to determine the mobility of
charge carriers.
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8.1.STATEMENT

When a conductor (metal or semiconductor) carrying current (I) is placed

perpendicular to a magnetic field (B), a potential difference (electric field) is
developed inside the conductor in a direction perpendicular to both current and
magnetic field. This phenomenon is known as Hall Effect and the voltage thus
generated is called Hall voltage.

8.2. THEORY

Hall effect in n- type semiconductor

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Let us consider a n-type semiconductor material in the form of rectangular slab.

In such a material current flows in X –direction and magnetic field B applied in
Z- direction. As a result, Hall voltage is developed along Y –direction as shown
in figure.

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Since the direction of current is from left to right the electrons moves from
right to left in X-direction as shown in fig
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Now due to magnetic field applied the electron moves towards downward
direction with velocity v and cause negative charge to accumulate at face (1) of
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the material as shown in fig. therefore the potential difference is established

between the face (2) and face (1) of the specimen which gives rise to EH in the
negative Y direction.

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Here, the force due to potential difference = -e EH ---(1)

Force due magnetic field = - Bev ---(2)
At equilibrium equation (1) = equation (2)

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-e EH = - Bev
EH = Bv ---(3)

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We know the current density Jx in the X- direction is
Jx = -ne ev
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v = - Jx / ne e ---(4)
Substituting equation (4) in equation (3) we get
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EH = - B Jx / ne e ----(5)
EH = RH . Jx . B ----(6)
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Where RH is known as the Hall co –efficient, is given by

RH = - (1 / ne e) ----(7)
The negative sign indicates that the field is developed in the negative Y –
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direction.
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Hall effect in p –type semiconductor

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Let us consider a p –type semiconducting material for which the current is passed
along X – direction from left to right and magnetic field is applied along Z –
direction as shown in fig. since the direction of current is from left to right, the
holes will also move in the same direction as shown in fig.

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Now due to magnetic field applied the holes moves towards downward direction
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with velocity v and accumulates at the face (1). A potential difference is
established between face (1) and (2) in the positive Y - direction.
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Here, the force due to potential difference = -e EH ----(8)

Force due magnetic field = Bev ----(9)
At equilibrium equation (1) = equation (2)
e EH = Bev
EH = Bv --------------(10)
We know the current density Jx in the X- direction is
Jx = nh ev
v = Jx / nh e -----------(11)
Substituting equation (4) in equation (3) we get

EH = B Jx / nh e

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EH = RH . Jx . B

Where RH is known as the Hall co –efficient, is given by

RH = (1 / nh e) ----(12)
The positive sign indicates that the field is developed in the positive Y –direction

Hall coefficient in terms of hall voltage

If the thickness of the sample is t and the voltage developed is VH, then
Hall voltage VH = EH .t ---((13))
Substituting equation (6 )in equation (13), we have
VH = RH Jx B .t ----(14)
If b is the width of the sample then

Area of the sample = b.t

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Current density = Jx = Ix / bt -----(15)
Substituting equation (15) in equation (14) we get
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The sign for VH will be opposite for n and p type semiconductors.

Mobility of charge carriers

We know that Hall coefficient,

RH = - (1 / ne e)

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The above expression is valid only for conductors where the velocity is
taken as the drift velocity.

But for semiconductor velocity is taken as average velocity so RH for n- type

semiconductor is modified as

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Substituting equation (3) in equation (2) we get
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For n –type semiconductor, the mobility of electron is

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Similarly for p –type semiconductor, the mobility of hole is

8.3. EXPERIMENTAL DETERMINATION OF HALL EFFECT

A semiconducting material is taken in the form of a rectangular slab of thickness

t and breadth b. A suitable current Ix ampere is passed through this sample along
X- axis by connecting it to a battery.

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This sample is placed in between two poles of an electro magnet such that
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magnetic field is applied along Z –axis.

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Due to Hall Effect, Hall voltage (VH) is developed in the sample. This voltage
measured by fixing two probes at the centers of the bottom and top faces faces of
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the sample. By measuring Hall voltage, Hall coefficient is determined from the
formula
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From the hall coefficient, carrier concentration and mobility can be

determined.

8.4. APPLICATIONS OF HALL EFFECT

It is used to determine whether the material is p-type or n-type semiconductor. (ie
) if RH is negative then the material n-type. If the RH is positive then the material
p-type.

It is used to find the carrier concentration

It is used to find the mobility of charge carriers μe, μh.

It is used to find the sign of the current carrying charges.

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It is used to design magnetic flux meters and multipliers on the basis of Hall
voltage. It is used to find the power flow in an electromagnetic wave.

SOLVED PROBLEMS
1.Calculate the intrinsic concentration of charge carriers at 300 K given that
m *e =0.12m o ,m *h =0.28mo and the value of brand gap = 0.67 eV. Solution:

Given:

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2.The intrinsic carrier density is 1.5 × 1016 m–3. If the mobility of electron and
hole are 0.13 and 0.05 m2 V–1 s–1, calculate the conductivity.
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3. The Intrinsic carrier density at room temperature in Ge is 2.37 ×

10 m if the electron and hole mobilities are 0.38 and 0.18 m2 V–1 s–
19 3

1 respectively, calculate the resistivity.

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4.The Hall coefficient of certain silicon specimen was found to be –7.35 × 10–
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5 m3 C–1 from 100 to 400 K. Determine the nature of the semiconductor. If the

conductivity was found to be 200 –1 m–1. Calculate the density and mobility of
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the charge carrier.

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Solution:
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5. In a P-type germanium, ni = 2.1 × 1019 m–3density of boran 4.5 × 1023 atoms

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/m3. The electron and hole mobility are 0.4 and 0.2 m2 v–1 s–1 respectively.
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What is its conductivity before and after addition of boron atoms.

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6. An N-type semiconductor has hall coefficient = 4.16 × 10–4 m3 C–1. The

.p

conductivity is 108 –1 m–1. Calculate its charge carrier density ‘ne’and electron
mobility at room temperature.
w

Solution:
w

Given:
w

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et
.n
pz
ee
ad
.p
w

7. In an N-type semiconductor, the concentration of electron is 2 × 10 22 m–3 .

Its electrical conductivity is 112 –1 m–1. Calculate the mobility of electrons.
w
w

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et
.n
pz
8. For an intrinsic Semiconductor with a band gap of 0.7 eV, determine the
position of EF at T = 300 K if m*h = 6m*e.
ee
ad
.p
w
w
w

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9.A semiconducting crystal with 12 mm long, 5 mm wide and 1 mm thick

has a magnetic density of 0.5 Wbm–2applied from front to back
perpendicular to largest faces. When a current of 20 mA flows length wise
through the specimen, the voltage measured across its width is found to
be 37μV . What is the Hall coefficient of this semiconductor?

Solution:
Given:

et
.n
pz
ee
ad
.p
w
w
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10. Find the resistance of an intrinsic Ge rod 1 mm long, 1 mm wide and

1 mm thick at 300 K. the intrinsic carrier density 2.5 ×1019 m–3 is at 300
K and the mobility of electron and hole are 0.39 and 0.19 m2 v–1 s–1.

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et
.n
pz
ee
ad
.p
w
w
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11. Hall coefficient of a specimen of depend silicon found to be 3.66 × 10 –

4 m3 C–1. The resistivity of the specimen is 8.93 × 10–3 m. Find the mobility and

density of the charge carriers.

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et
.n
pz
ee
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12. The intrinsic carrier density of a semiconductor is 2.1 × 10 19 m–3. The

.p

electron and hole mobilities are 0.4 and 0.2 m2V–1 s–1 respectively. Calculate
the conductivity.
w

Solution:
w
w

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13. The electron mobility and hole mobility in Si are 0.135 m2 V–1 s–1 and 0.048
m2 V–1 s–1 respectively at room temperature. If the carrier concentration is
1.5 × 1016 m–3. Calculate the resistivity of Si at room temperature.

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.n
pz
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.p
w
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ASSIGNMENT PROBLEMS

1. Find the resistance of an intrinsic germanium rod 1 cm long, 1mm wide and
1mm thick at 300 K. the intrinsic carrier density is 2.5 × 10 19 / m–3 at 300 K
and the mobility of electron and hole are 0.39 and 0.19 m2 V–1 S–1. (Ans: 4.31
× 103)

Calculate the position of Fermi level EF and the conductivity at 300 K for
germanium crystal containing 5 × 1022 arsenic atoms / m3. Also calculate the
conductivity if the mobility of the electron is 0.39 m2 V–1 S–1.

(Ans : EF is 0.16 eV below Ec = 3210 –1 m–1)

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In a Hall experiment a current of 25 A is passed through a long foil of silver

which is 0.1mm thick and 3cm wide. If the magnetic field of flux density 0.14
Wb/m2 is applied perpendicular to the foil, calculate the Hall voltage
development and estimate the mobility of electrons in silver. The conductivity
the Hall coefficient is (–8.4 × 10–11)m3 / coulomb. (Ans : 29.4 V and 57.7 ×
10–4 m2 V–1)

The intrinsic carrier density at room temperature in Ge is 2.37 × 1019 m3. If the
electron and hole motilities are 0.38 and 0.18 m2 V1 S1 respectively, calculate
the resistivity.
(Ans : 0471 m)

5. For silicon semiconductor with band gap1.12 eV, determine the position of
the Fermi level at 300 K, if m*e 0.12m0 and m*h0.28m0 (Ans : 0.576 eV)

et
.n
For an intrinsic semiconductor with gap width Eg = 0.7 eV, calculate the
concentration of intrinsic charge carriers at 300 K assuming that m*e m*h m0 .
pz
(Ans : 33.49 × 1018 / m3)
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A silicon plate of thickness 1mm, breadth 10mm, and length 100mm is placed
magnetic field of 0.5 wb/m2 acting perpendicular to its thickness. If A 10–
ad

2 current flows along its length, calculate the Hall voltage developed if the

Hall coefficient is 3.66 × 10–4 m3 / coulomb. (Ans : 3.7 × 106 C–1 m3)
.p

A N-type semiconductor has Hall coefficient = 4.16 × 10 –4 C–1 m3. The

w

conductivity is 108 ohm–1 m–1. Calculate its charge carrier density and electron
mobility at room temperature. (Ans : 0.038 m2 V–1 S–1)
w
w

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